JPH0224392B2 - - Google Patents
Info
- Publication number
- JPH0224392B2 JPH0224392B2 JP58201565A JP20156583A JPH0224392B2 JP H0224392 B2 JPH0224392 B2 JP H0224392B2 JP 58201565 A JP58201565 A JP 58201565A JP 20156583 A JP20156583 A JP 20156583A JP H0224392 B2 JPH0224392 B2 JP H0224392B2
- Authority
- JP
- Japan
- Prior art keywords
- semiconductor laser
- submount
- thermal expansion
- thermal conductivity
- laser device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/02—Structural details or components not essential to laser action
- H01S5/024—Arrangements for thermal management
- H01S5/02476—Heat spreaders, i.e. improving heat flow between laser chip and heat dissipating elements
- H01S5/02492—CuW heat spreaders
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/02—Structural details or components not essential to laser action
- H01S5/022—Mountings; Housings
- H01S5/02208—Mountings; Housings characterised by the shape of the housings
- H01S5/02212—Can-type, e.g. TO-CAN housings with emission along or parallel to symmetry axis
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/02—Structural details or components not essential to laser action
- H01S5/024—Arrangements for thermal management
- H01S5/02469—Passive cooling, e.g. where heat is removed by the housing as a whole or by a heat pipe without any active cooling element like a TEC
Landscapes
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Optics & Photonics (AREA)
- Cooling Or The Like Of Semiconductors Or Solid State Devices (AREA)
- Semiconductor Lasers (AREA)
Description
(イ) 産業上の利用分野
この発明は半導体レーザー装置、特にその放熱
特性の改良に関するものである。
(ロ) 従来技術
半導体レーザー装置は電流駆動による大電力素
子であるため、動作中の発熱量が大きい。そのた
め、適切な放熱設計が行なわれていない場合に
は、通電使用中の発熱により性能の劣化、素子寿
命の低下、あるいは半導体レーザー素子の破壊を
まねく危険がある。具体的には半導体レーザー素
子は一般に第2図に示すような温度特性をもつ。
図から明らかなように、発光出力は、素子温度に
大きく依存する。温度20℃で光出力2mWを得る
には約30mAの電流が必要であるが、温度50℃で
使用する場合には30mAではレーザ発振にさえ達
することが出来ず、光出力2mWを得るには60m
A以上の駆動電流が必要となる。しかも、温度上
昇による光出力の低下を補なうために駆動電流を
増加してやれば、電流増加にともなう素子の発熱
量の増加がひきおこされ、さらに素子温度が上昇
するという悪循環を生じることになり、素子の急
速な劣化や、はなはだしい場合は素子の破壊にい
たる。
したがつて、半導体レーザー素子を支持するス
テムは、熱伝導率の高い材料を用いて熱放散を良
好にする必要がある。
また、上記ステムと半導体レーザー素子の熱膨
脹係数に差があると、発熱に伴つてひずみが発生
し、半導体レーザー素子に不必要なストレスが加
わる。このようなストレスは、半導体レーザー素
子の性能の劣化を加速し、更にはその破壊の原因
となるものである。
したがつて、ステムの材料としては、熱伝導率
が高く、しかも熱膨脹係数が半導体レーザー素子
のそれとできるだけ近いものであることが要求さ
れる。
そこで、従来は、第1図に示すように、半導体
レーザー素子1をサブマウント2を介してパツケ
ージのマウント用ブロツク3に取付け、そのサブ
マウント2の材料として、コバール(商品名)の
如き低熱膨脹特性を示す材料を使用することが行
なわれていた。
(ハ) 発明によつて解決しようとする問題点
サブマウント2の材料は、前述のとおり熱伝導
率が良好で、かつ熱膨脹係数が半導体レーザー素
子1のそれに近いことが要求される。
しかしながら、従来使用されているコバール
は、第1表に示すように、熱膨脹係数は半導体レ
ーザー素子1に非常に近いが、熱伝導率が低い問
題があり、このことが半導体レーザーの性能改良
の上で大きな障害となつていた。
(ニ) 問題点を解決するための手段
この発明はInAs、InP又はInSbを基板とする半
導体レーザー素子を用いた半導体レーザーを対象
とし、その場合のサブマウントの材料として、熱
膨脹係数が4.5〜7.5×10-6cm/cm・℃の範囲にあ
る次の金属、すなわち
(1) WにCuを均一に含有させた合金
(2) MoにCuを均一に含有させた合金
(3) W・Mo合金にCuを均一に含有させた合金
のいずれか一つを使用することとしたものであ
る。
上記の合金は溶浸法によつて製造することがで
きる。
サブマウントの材料が上記の熱膨脹係数の範囲
を越えると、半導体レーザー素子との熱膨脹係数
の不整合が大きくなり、素子に生じるストレスに
より、素子の破損又は発光効率の低下などが起こ
る。特に4.5cm/cm℃未満の場合には熱伝導度が
極端に小さくなり、放熱効果を発揮させることが
できない。
また、上記範囲の熱膨脹係数を満足する上記金
属材料のCu含有量を重量%で示せば次のとおり
である。
W+Cu:0.5〜25%(前記(1)の金属材料)
Mo+Cu:0.5〜20%(前記(2)の金属材料)
W・Mo+Cu:0.5〜25%(前記(3)の金属材料)
なお、上記金属材料の熱伝導率は、0.35〜
0.65cal/cm・sec・℃である。
この発明の金属材料と従来例(コバール)との
対比、及び素子基板の熱膨脹係数を参考までに示
せば、次の第1素に示すとおりである。
(a) Industrial Application Field This invention relates to a semiconductor laser device, and particularly to improvement of its heat dissipation characteristics. (b) Prior Art Since a semiconductor laser device is a high-power device driven by current, it generates a large amount of heat during operation. Therefore, if an appropriate heat dissipation design is not carried out, there is a risk that the heat generated during energized use may lead to performance deterioration, shortened element life, or destruction of the semiconductor laser element. Specifically, semiconductor laser elements generally have temperature characteristics as shown in FIG.
As is clear from the figure, the light emission output largely depends on the element temperature. Approximately 30 mA of current is required to obtain an optical output of 2 mW at a temperature of 20°C, but when used at a temperature of 50°C, 30 mA cannot even reach laser oscillation, and a current of 60 mA is required to obtain an optical output of 2 mW.
A drive current of A or more is required. Furthermore, if the drive current is increased to compensate for the decrease in optical output due to temperature rise, the increase in current will cause an increase in the amount of heat generated by the element, creating a vicious cycle in which the element temperature will further rise. , leading to rapid deterioration of the device and, in extreme cases, destruction of the device. Therefore, the stem supporting the semiconductor laser element needs to be made of a material with high thermal conductivity to improve heat dissipation. Furthermore, if there is a difference in the coefficient of thermal expansion between the stem and the semiconductor laser element, distortion occurs due to heat generation, and unnecessary stress is applied to the semiconductor laser element. Such stress accelerates the deterioration of the performance of the semiconductor laser device and even causes its destruction. Therefore, the material for the stem is required to have high thermal conductivity and a coefficient of thermal expansion as close as possible to that of the semiconductor laser element. Therefore, conventionally, as shown in FIG. 1, a semiconductor laser element 1 was attached to a mounting block 3 of a package via a submount 2, and the submount 2 was made of a material with low thermal expansion such as Kovar (trade name). The practice was to use materials that exhibit specific properties. (c) Problems to be Solved by the Invention As mentioned above, the material of the submount 2 is required to have good thermal conductivity and a coefficient of thermal expansion close to that of the semiconductor laser element 1. However, as shown in Table 1, the conventionally used Kovar has a coefficient of thermal expansion very close to that of semiconductor laser element 1, but it has a problem of low thermal conductivity, and this has made it difficult to improve the performance of semiconductor lasers. This was a major obstacle. (d) Means for solving the problem The present invention is directed to a semiconductor laser using a semiconductor laser element having a substrate of InAs, InP, or InSb, and the material of the submount in this case has a thermal expansion coefficient of 4.5 to 7.5. The following metals in the range of ×10 -6 cm/cm・℃, namely (1) Alloy of W containing Cu uniformly (2) Alloy of Mo containing Cu uniformly (3) W・Mo It was decided to use one of the alloys containing Cu uniformly. The above alloys can be manufactured by an infiltration method. If the material of the submount exceeds the above-mentioned range of coefficient of thermal expansion, the mismatch in coefficient of thermal expansion with the semiconductor laser element will become large, and the stress generated on the element will cause damage to the element or a decrease in luminous efficiency. In particular, when the temperature is less than 4.5 cm/cm°C, the thermal conductivity becomes extremely low and the heat dissipation effect cannot be exhibited. Further, the Cu content of the metal material satisfying the thermal expansion coefficient in the above range is as follows in weight %. W + Cu: 0.5 to 25% (metal material in (1) above) Mo + Cu: 0.5 to 20% (metal material in (2) above) W・Mo+Cu: 0.5 to 25% (metal material in (3) above) The thermal conductivity of metal materials is 0.35~
It is 0.65 cal/cm・sec・℃. A comparison between the metal material of the present invention and a conventional example (Kovar) and the coefficient of thermal expansion of the element substrate are shown in the following first element for reference.
【表】
上記第1表からわかるように、この発明の場合
は、熱膨脹係数が半導体レーザー装置の素子基板
のそれにきわめて近く、また熱伝導率は従来のコ
バールより約10倍程度、タングステン、モリブデ
ンに比べ約40〜70%改良されている。
(ホ) 実施例
InP基板上にInGaAsPをエピタキシヤル成長さ
せたダブルヘテロ構造を持つ半導体レーザー素子
を第2表に示す各種のサブマウント、ステムに固
着した半導体レーザー装置を製作し、その性能の
比較を行つた。[Table] As can be seen from Table 1 above, in the case of the present invention, the coefficient of thermal expansion is extremely close to that of the element substrate of a semiconductor laser device, and the thermal conductivity is about 10 times that of conventional Kovar, compared to tungsten and molybdenum. This is an improvement of about 40-70%. (e) Example Semiconductor laser devices in which a semiconductor laser device with a double heterostructure in which InGaAsP was epitaxially grown on an InP substrate were fixed to various submounts and stems shown in Table 2 were fabricated, and their performances were compared. I went to
【表】【table】
【表】
つまり本半導体レーザー装置の素子の温度上昇
は、従来のFe−Ni(コバール)を使用したものに
比べ約25〜35%低減し、また発光効率は60〜70
%、寿命は約100倍に伸びた。なおCuの含有量が
多い程放熱特性が良好になることが確認出来た。
(ヘ) 効果
以上のとおりであるから、この発明によれば、
放熱が良好でかつ発熱に伴うストレスの少ない半
導体レーザー装置を得ることができる。又、第3
図に示した如く、サブマウントとマウント用ブロ
ツク及びステムを一体にしたパツケージ構造も容
易にとりうることができた。[Table] In other words, the temperature rise of the element of this semiconductor laser device is reduced by about 25 to 35% compared to the conventional one using Fe-Ni (Kovar), and the luminous efficiency is 60 to 70%.
%, the lifespan has increased approximately 100 times. It was confirmed that the higher the Cu content, the better the heat dissipation characteristics. (f) Effects As described above, according to this invention,
A semiconductor laser device with good heat dissipation and less stress caused by heat generation can be obtained. Also, the third
As shown in the figure, we were able to easily create a package structure in which the submount, mounting block, and stem were integrated.
第1図aは、従来の半導体レーザ装置を示す上
面図、第1図bはAA′における断面図である。第
2図は半導体レーザの発光特性の一例を示す図面
である。第3図aは本発明の半導体レーザ装置の
一例を示す上面図、第3図bはBB′における断面
図である。図において各番号の意味するところは
次のとおりである。同一番号は、各図面における
相当部分を示す。
1:半導体レーザ素子、2:サブマウント、
3:マウント用ブロツク材、4:光取出窓、5:
キヤツプ、6:パツケージ本体すなわちステム、
7:第1のリード線、8:第2のリード線、9:
絶縁物、10:リードワイヤー。
FIG. 1a is a top view showing a conventional semiconductor laser device, and FIG. 1b is a sectional view taken at AA'. FIG. 2 is a drawing showing an example of the light emission characteristics of a semiconductor laser. FIG. 3a is a top view showing an example of the semiconductor laser device of the present invention, and FIG. 3b is a sectional view at BB'. The meanings of each number in the figure are as follows. The same numbers indicate corresponding parts in each drawing. 1: semiconductor laser element, 2: submount,
3: Mounting block material, 4: Light extraction window, 5:
Cap, 6: Package body or stem;
7: First lead wire, 8: Second lead wire, 9:
Insulator, 10: Lead wire.
Claims (1)
素子から成る半導体レーザー装置において、サブ
マウント及びステムの材料として、W、Mo若し
くはW−Mo合金のいずれかに溶浸法によりCuを
均一に含有させ、熱膨張係数を4.5〜7.5×10-6
cm/cm・℃の範囲に調整するとともに熱伝導性を
改良した合金を用い、かつサブマウントとステム
とを一体成形したことを特徴とする半導体レーザ
ー装置。1. In a semiconductor laser device consisting of a semiconductor laser element whose substrate is InAs, InP, or InSb, as the material for the submount and stem, Cu is uniformly contained in either W, Mo, or a W-Mo alloy by an infiltration method, Thermal expansion coefficient 4.5~7.5×10 -6
A semiconductor laser device characterized by using an alloy whose thermal conductivity is adjusted to within the range of cm/cm・℃ and having improved thermal conductivity, and in which a submount and a stem are integrally molded.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58201565A JPS6092686A (en) | 1983-10-26 | 1983-10-26 | Semiconductor laser |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58201565A JPS6092686A (en) | 1983-10-26 | 1983-10-26 | Semiconductor laser |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6092686A JPS6092686A (en) | 1985-05-24 |
| JPH0224392B2 true JPH0224392B2 (en) | 1990-05-29 |
Family
ID=16443159
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP58201565A Granted JPS6092686A (en) | 1983-10-26 | 1983-10-26 | Semiconductor laser |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6092686A (en) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4906086A (en) * | 1987-06-19 | 1990-03-06 | Honda Giken Kogyo Kabushiki Kaisha | Rearview mirror device for motorcycles |
| JP2009224454A (en) * | 2008-03-14 | 2009-10-01 | Disco Abrasive Syst Ltd | Method of manufacturing optical device |
| JP5443151B2 (en) | 2009-12-24 | 2014-03-19 | 株式会社ディスコ | Manufacturing method of composite substrate |
| JP2013236010A (en) * | 2012-05-10 | 2013-11-21 | Mitsubishi Electric Corp | Semiconductor device |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5891692A (en) * | 1981-11-27 | 1983-05-31 | Hitachi Ltd | Semiconductor laser device |
-
1983
- 1983-10-26 JP JP58201565A patent/JPS6092686A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6092686A (en) | 1985-05-24 |
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