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JPH0235037B2 - - Google Patents
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JPH0235037B2 - - Google Patents

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Publication number
JPH0235037B2
JPH0235037B2 JP60196467A JP19646785A JPH0235037B2 JP H0235037 B2 JPH0235037 B2 JP H0235037B2 JP 60196467 A JP60196467 A JP 60196467A JP 19646785 A JP19646785 A JP 19646785A JP H0235037 B2 JPH0235037 B2 JP H0235037B2
Authority
JP
Japan
Prior art keywords
electrode
film
visible
water
hydrogen
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP60196467A
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Japanese (ja)
Other versions
JPS6256588A (en
Inventor
Masao Kaneko
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
RIKEN
Original Assignee
RIKEN
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Publication date
Application filed by RIKEN filed Critical RIKEN
Priority to JP60196467A priority Critical patent/JPS6256588A/en
Publication of JPS6256588A publication Critical patent/JPS6256588A/en
Publication of JPH0235037B2 publication Critical patent/JPH0235037B2/ja
Granted legal-status Critical Current

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  • Electrolytic Production Of Non-Metals, Compounds, Apparatuses Therefor (AREA)

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、水を可視光分解し、酸素と水素を得
る方法に関する。
DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention relates to a method of decomposing water with visible light to obtain oxygen and hydrogen.

〔従来の技術〕[Conventional technology]

従来n型の半導体電極に光照射して水を分解
し、半導体表面で酸素を、白金などの対極表面で
水素を発生させることは知られている。しかし、
水中で安定に使用できる半導体は酸化チタン、酸
化亜鉛などのようにバンドギヤツプ(Eg)の大
きい材料に限られ、有効な光は400nm以下の紫外
光領域のみに限られていた。400〜800nmの可視
光領域が利用できるn型半導体は全て水中光照射
条件下では不活性化してしまう。この理由は大別
として2つあり、1つはn−CdSやn−GaAsな
どのように界面に近いいわゆる欠乏層に生ずるホ
ールが半導体を酸化的に溶解してしまう場合であ
り、他はn−Siのように、ホールが酸化物皮膜を
作つてしまい、不活性化する場合である。このよ
うな可視域n型半導体を如何に安定化して使用す
るかは、この分野の重要な課題であつた。
It is conventionally known to irradiate an n-type semiconductor electrode with light to decompose water and generate oxygen on the semiconductor surface and hydrogen on the surface of a counter electrode such as platinum. but,
Semiconductors that can be used stably underwater are limited to materials with large band gaps (Eg) such as titanium oxide and zinc oxide, and effective light is limited to the ultraviolet light region of 400 nm or less. All n-type semiconductors that can utilize the visible light range of 400 to 800 nm are inactivated under underwater light irradiation conditions. There are two main reasons for this; one is that holes generated in the so-called depletion layer near the interface, such as in n-CdS and n-GaAs, dissolve the semiconductor in an oxidative manner; -This is the case with Si, where holes form an oxide film and become inactive. How to stabilize and use such a visible n-type semiconductor has been an important issue in this field.

〔発明が解決しようとする問題点〕[Problem that the invention seeks to solve]

したがつて本発明の目的は、可視域n型半導体
を用いて水を可視光分解し、酸素と水素を得る方
法を提供することである。
Therefore, an object of the present invention is to provide a method of decomposing water using visible light using a visible region n-type semiconductor to obtain oxygen and hydrogen.

〔問題点を解決するための手段〕[Means for solving problems]

本発明者は、トリス(2、2′−ビピリジン)ル
テニウム錯体(以下Ru(bpy)2+ 3と略す)をペン
ダント基に持つような高分子錯体薄膜を、可視域
n型半導体表面に被覆すると、水中光照射条件下
でも半導体が安定化されることを見出した(参考
文献としてラジエシユウオー(Rajeshwar)、金
子、山田、ジヤーナル・オブ・エレルトロケミカ
ル・ソサテイ(J.Electrochem.Soc.)、130巻、38
頁(1983年)、ラジエシユウオー(Rajeshwar)、
金子、山田、ナウフイー(Noufi)、ジヤーナ
ル・オブ・フイジカル・ケミストリー(J.Phys.
Chem.)、89巻、806頁(1985年)。さらに、鋭意
研究の結果、この膜中に水を酸化するための触媒
を共存させて用いると、水の可視光分解が可能に
なることを見出し、本発明を完成するに至つた。
The present inventor has proposed that a thin film of a polymer complex having a tris(2,2'-bipyridine)ruthenium complex (hereinafter abbreviated as Ru(bpy) 2+ 3 ) as a pendant group is coated on the surface of an n-type semiconductor in the visible region. found that the semiconductor was stabilized even under underwater light irradiation conditions (References: Rajeshwar, Kaneko, Yamada, Journal of Electrochem. Soc., vol. 130) , 38
Page (1983), Rajeshwar,
Kaneko, Yamada, Noufi, Journal of Physical Chemistry (J.Phys.
Chem.), vol. 89, p. 806 (1985). Furthermore, as a result of intensive research, the inventors discovered that visible light decomposition of water becomes possible when a catalyst for oxidizing water is used in the membrane, leading to the completion of the present invention.

本発明は、可視域n型半導体電極の表面に、ト
リス(2、2′−ビピリジン)ルテニウム錯体を
ペンダント基として有する高分子錯体の膜を被覆
し、該膜内には媒質として周期律第族の金属ま
たは金属酸化物を共存せしめ、この修飾した可視
域n型半導体電極を電解質水溶液に浸漬し、電極
表面に可視光を照射することにより水を分解し、
型半導体電極上で酸素を発生せしめ、対極上で水
素を発生せしめる方法である。
In the present invention, the surface of a visible n-type semiconductor electrode is coated with a film of a polymer complex having a tris(2,2'-bipyridine)ruthenium complex as a pendant group. This modified visible region n-type semiconductor electrode is immersed in an aqueous electrolyte solution, and the electrode surface is irradiated with visible light to decompose water.
This is a method in which oxygen is generated on a type semiconductor electrode and hydrogen is generated on a counter electrode.

以下本発明の詳細を説明する。 The details of the present invention will be explained below.

半導体を用いて水を可視光分解するためには、
半導体のEgは3eV以下でなければならず、かつ
その価電子帯、伝導帯の位置が、水の酸化還元電
位に適合している必要がある。このような理由
で、水の可視光分解が可能な半導体は限られてお
り、たとえばn型硫化カドミウム(n−CdS、
Eg=2.4eV)、n型セレン化カドミウム(n−
CdSe、Eg=1.7eV)、n型リン化ガリウム(n−
GaP、Eg=2.25eV)、n型リン化インジウム(n
−InP)などに限定される。前述のごとくこれら
の可視域半導体は全て、水中、光照射条件化では
劣化してしまうので、安定化することが必須条件
である。
In order to decompose water with visible light using a semiconductor,
The Eg of the semiconductor must be 3 eV or less, and the positions of its valence band and conduction band must match the redox potential of water. For this reason, there are a limited number of semiconductors that can decompose water with visible light, such as n-type cadmium sulfide (n-CdS,
Eg=2.4eV), n-type cadmium selenide (n-
CdSe, Eg=1.7eV), n-type gallium phosphide (n-
GaP, Eg=2.25eV), n-type indium phosphide (n
−InP), etc. As mentioned above, all of these visible range semiconductors deteriorate in water or under light irradiation conditions, so stabilization is an essential condition.

このような可視域n型半導体を安定化するため
に膜として被覆する高分子錯体はRu(bpy)2+ 3錯体
構造をペンダント基に有するもので、その代表的
な例は構造式で表わされる。
The polymer complex coated as a film to stabilize such a visible n-type semiconductor has a Ru(bpy) 2+ 3 complex structure as a pendant group, and a typical example thereof is represented by the structural formula .

たゞしここでMはスチレン、アクリル酸又はそ
の誘導体、N−ビニルピロリドン、4−ビニルピ
リジンなどの単量体、x、y、zはそれぞれの繰
り返し単位のモル分率で、xは0.01〜0.98の範
囲、yは0〜0.9の範囲、zは0〜0.98の範囲の
値を表わし、x+y+z=1である。この高分子
錯体は、4−メチル−4′−ビニル−2、2′−ビピ
リジンの単独重合体(z=0の場合)、または他
の単量体Mとの共重合体を、 cis−Ru(bpy)2Clと反応させることにより合成さ
れる。分子量は2000以上のものがよい。
However, here, M is a monomer such as styrene, acrylic acid or its derivative, N-vinylpyrrolidone, 4-vinylpyridine, etc., x, y, and z are the mole fractions of each repeating unit, and x is 0.01 to 0.98 range, y ranges from 0 to 0.9, z represents a value ranged from 0 to 0.98, and x+y+z=1. This polymer complex consists of a homopolymer of 4-methyl-4'-vinyl-2,2'-bipyridine (when z=0) or a copolymer with other monomer M, cis-Ru (bpy) Synthesized by reacting with 2 Cl. The molecular weight is preferably 2000 or more.

Mがスチレンのように水と親和性がない方が、
水中で安定な膜として使えるので良好な結果を与
える。Mがアクリル酸やその誘導体、N−ビニル
ピロリドン、4−ビニルピリジンのような水と親
和性の強い共重合体の場合は、膜は水中で溶解し
易いが、分子量を10000以上と高くすれば使用に
耐える。Ru(bpy)2+ 3をペンダント基に持つこのほ
かの高分子錯体、たとえばポリスチレンに2、
2′−ビピリジル基を導入した買錯体化を行なつて
得られる、下記式の組成を持つ化合物なども膜
材料として用いることができる。
If M has no affinity for water like styrene,
It can be used as a stable membrane in water and gives good results. If M is a copolymer with strong affinity for water, such as acrylic acid or its derivatives, N-vinylpyrrolidone, or 4-vinylpyridine, the membrane will easily dissolve in water, but if the molecular weight is increased to 10,000 or more, Durable to use. Other polymer complexes with Ru(bpy) 2+ 3 as pendant groups, such as polystyrene with 2,
Compounds having the composition of the following formula, which are obtained by complexation into which a 2'-bipyridyl group is introduced, can also be used as membrane materials.

たゞしここでx、y、z、wは各繰り返し単位
のモル分率で、xは0.01〜0.5、yは0〜0.5、z
は0〜0.4、wは0.5〜0.9の範囲で、x+y+z+
w=1である。
However, x, y, z, w are the mole fractions of each repeating unit, x is 0.01 to 0.5, y is 0 to 0.5, z
is in the range of 0 to 0.4, w is in the range of 0.5 to 0.9, x+y+z+
w=1.

上記高分子錯体は、特公昭59−8361号公報記載
の方法により合成することができる。
The above-mentioned polymer complex can be synthesized by the method described in Japanese Patent Publication No. 59-8361.

これらの高分子錯体膜を半導体に被覆するに
は、半導体の常法によりエツチングした後、高分
子錯体の溶液を塗布して乾燥するいわゆるキヤス
ト法によるか、あるいはスピンコーテイング法な
ど、通常用いられる方法なら何でよい。膜厚は
1000Å〜50μm程度が適当である。本発明におい
ては膜中のRu(bpy)2+ 3錯体部は、半導体の光励起
により界面近くに生ずるホールと反応することに
より、ホールを半導体から取り出して水の酸化の
ための触媒に伝達する、いわゆる電荷リレー体と
しての役割を有する。
These polymer complex films can be coated on semiconductors by etching using conventional methods for semiconductors, followed by the so-called casting method in which a solution of the polymer complex is applied and dried, or by conventional methods such as spin coating. In that case, whatever is fine. The film thickness is
A suitable thickness is about 1000 Å to 50 μm. In the present invention, the Ru(bpy) 2+ 3 complex in the film reacts with holes generated near the interface due to photoexcitation of the semiconductor, thereby extracting the holes from the semiconductor and transmitting them to the catalyst for water oxidation. It has a role as a so-called charge relay body.

本発明において用いられる触媒としての、周期
律表第族の金属または金属酸化物としては、
Rt、PtO2、Ru、RuO2、Ir、IrO2、Rh、RhO2
Ni、NiO2、Fe2O3などが挙げられる。この触媒
は、光照射により半導体表面に生じたホールを受
けて、水を酸化して酸素を発生するために用いる
ものである。RuO2やPtO2などの酸化物が特に良
好な結果を与える。これらの触媒を高分子錯体膜
中に共存させるには、予め半導体表面に該触媒粉
末をのせた後、高分子錯体膜を被覆するか、ある
いは高分子錯体溶液に触媒微粉末を懸濁させて被
覆膜を作つてもよい。また、化学反応によつても
これらの触媒を膜中に共存せしめることができ
る。たとえば、高分子錯体を半導体上に被覆した
後に、RuO4水溶液に、たとえば常温で、2秒〜
20分間浸漬すると、RuO4は膜中に吸着されると
同時に還元されてRuO2となり、微粒子として膜
中に分散する。触媒量は少量過ぎても効果が低い
が、多過ぎると光を吸収する結果半導体に到達す
る光量が低下するので、やはり効率が落ちる。し
たがつて触媒の量は高分子錯体膜中0.05〜5重量
%が適当である。
The metal or metal oxide of Group 1 of the periodic table as a catalyst used in the present invention includes:
Rt, PtO2 , Ru, RuO2 , Ir, IrO2 , Rh, RhO2 ,
Examples include Ni, NiO 2 , Fe 2 O 3 and the like. This catalyst is used to receive holes generated on the semiconductor surface by light irradiation and oxidize water to generate oxygen. Oxides such as RuO 2 and PtO 2 give particularly good results. In order to coexist these catalysts in a polymer complex film, the catalyst powder is placed on the semiconductor surface in advance and then covered with the polymer complex film, or the fine catalyst powder is suspended in a polymer complex solution. A coating film may also be formed. Further, these catalysts can also be made to coexist in the membrane through chemical reactions. For example, after coating a semiconductor with a polymer complex, it is added to a RuO 4 aqueous solution for 2 seconds to 2 seconds at room temperature.
When immersed for 20 minutes, RuO 4 is adsorbed into the membrane and simultaneously reduced to RuO 2 and dispersed in the membrane as fine particles. If the amount of catalyst is too small, the effect will be low, but if it is too large, the amount of light reaching the semiconductor will decrease as a result of absorbing light, which will also reduce efficiency. Therefore, the appropriate amount of catalyst is 0.05 to 5% by weight in the polymer complex membrane.

本発明に用いられる電解質水溶液としては、電
解質として硝酸塩、硫酸塩、過塩素酸塩等を0.01
〜2M濃度で含む水溶液が挙げられる。ハロゲン
化塩はハロゲンイオンが酸化されてしまうので、
この場合には水の光分解ではなく、ハロゲン化水
素の光分解ということになる。
The electrolyte aqueous solution used in the present invention contains nitrates, sulfates, perchlorates, etc. at 0.01% as an electrolyte.
Examples include aqueous solutions containing ~2M concentrations. In halogenated salts, the halogen ions are oxidized, so
In this case, it is not photolysis of water but photolysis of hydrogen halide.

上記のようにして作製した修飾半導体電極を、
電解質水溶液中に浸漬して作用極とし、対極とし
ては通常白金を用い、電極電位を制御するために
甘コウ、銀−塩化銀などの参照電極を用い、いわ
ゆる三極式で光反応を行なうことが望ましい。
The modified semiconductor electrode prepared as above,
It is immersed in an aqueous electrolyte solution to serve as a working electrode, the counter electrode is usually platinum, and a reference electrode such as silver chloride or silver-silver chloride is used to control the electrode potential, and photoreactions are carried out in a so-called three-electrode manner. is desirable.

光源としては可視光なら何でもよく、太陽光、
ケイ光灯、白熱電灯、ハロゲンランプ、プロジエ
クター、キセノンランプ、水銀灯などが挙げられ
る。
Any visible light source can be used as a light source, such as sunlight,
Examples include fluorescent lamps, incandescent lamps, halogen lamps, projectors, xenon lamps, and mercury lamps.

用いるセルも特に制限されないが、酸素と水素
を別々に採取する場合は、作用極側と対極側を分
離した二室型セルを用いる。
The cell used is not particularly limited either, but when collecting oxygen and hydrogen separately, a two-chamber cell with separate working electrode and counter electrode sides is used.

〔発明の効果〕〔Effect of the invention〕

本発明によれば、可視域n型半導体を、水中光
照射条件下で安定に使用することができ、可視光
を照射して水を光分解し、酸素と水素を製造する
ことができる。
According to the present invention, a visible n-type semiconductor can be used stably under underwater light irradiation conditions, and water can be photolyzed by irradiating visible light to produce oxygen and hydrogen.

〔実施例〕〔Example〕

以下実施例を以て本発明を説明する。 The present invention will be explained below with reference to Examples.

実施例 1 n−CdS単結晶(表面積0.02cm2)の裏面にGa−
In合金を塗布し、ここに銅線を銀エポキシで接着
してオーミツクコンタクトをとる。電極表面以外
は絶縁性エポキシ樹脂で固め、CdS表面は濃塩酸
でエツチングする。高分子錯体において、Mが
スチレン、x=0.048、y=0.047、z=0.905の組
成の化合物をDMFに溶解し(濃度はRu錯体単位
で1mM)、この溶液を8μl/cm2の割合でCdSに滴
下し、拡げて風乾した後、温風にて乾燥し、膜と
する。この膜厚は約0.28μmと計算される。この
被覆CdSを、5mg/ml濃度のRuO4水溶液に浸
すと、RuO4が膜に吸着されると同時に還元され、
RuO2微粉末となつて膜中に分散される。このよ
うにして作製した修飾CdSを二室型セルに装着
し、セルには0.5M KNO3と0.1M HNO3を含む
水溶液を入れ、対極としては白金線を、参照電極
としては甘コウ電極を装着する。アルゴンガスを
1時間吹き込んでから密閉した後に、電極電位を
−0.4V(vs、SCE)に保ち、紫外および赤外光カ
ツトフイルターを附した500Wキセノンランプか
らの可視光をCdS表面に照射し、反応させた。光
反応にともなつてCdSおよび白金表面上に気泡が
発生するのが観察された。光電流は約400μA/cm2
の定常値を保つた。3時間反応後に、約7μlの水
素と3.5μlの酸素が発生した。流れた光電流に対
する水分解の効率は70%であつた。
Example 1 Ga-coated on the back side of n-CdS single crystal (surface area 0.02 cm 2 )
Apply In alloy and bond copper wire here with silver epoxy to make ohmic contact. Surfaces other than the electrode surface are solidified with insulating epoxy resin, and the CdS surface is etched with concentrated hydrochloric acid. In the polymer complex, a compound with a composition in which M is styrene, x = 0.048, y = 0.047, and z = 0.905 is dissolved in DMF (concentration is 1mM in Ru complex units), and this solution is mixed with CdS at a rate of 8μl/ cm2 . After spreading and air drying, dry with warm air to form a film. This film thickness is calculated to be approximately 0.28 μm. When this coated CdS is immersed in a RuO 4 aqueous solution with a concentration of 5 mg/ml, RuO 4 is adsorbed to the membrane and simultaneously reduced.
RuO 2 becomes fine powder and is dispersed in the film. The modified CdS prepared in this way was installed in a two-chamber cell, and an aqueous solution containing 0.5M KNO 3 and 0.1M HNO 3 was placed in the cell, a platinum wire was used as the counter electrode, and a sweet electrode was used as the reference electrode. Installing. After blowing in argon gas for 1 hour and sealing, the electrode potential was kept at −0.4 V (vs, SCE), and the CdS surface was irradiated with visible light from a 500 W xenon lamp equipped with an ultraviolet and infrared light cut filter. Made it react. Bubbles were observed to be generated on the CdS and platinum surfaces during the photoreaction. Photocurrent is approximately 400μA/cm 2
was maintained at a steady value. After 3 hours of reaction, approximately 7 μl of hydrogen and 3.5 μl of oxygen were evolved. The efficiency of water splitting with respect to the applied photocurrent was 70%.

実施例 2 実施例1において、n−CdSの代りにn−
CdSeを用い、500Wキセノンランプの代りに直射
太陽光を用いた他は実施例1と全く同様に光反応
を行ない、5時間反応後に10μlの水素と5μlの酸
素を得た。
Example 2 In Example 1, n-CdS was replaced with n-CdS.
A photoreaction was carried out in exactly the same manner as in Example 1, except that CdSe was used and direct sunlight was used instead of a 500W xenon lamp, and after 5 hours of reaction, 10 μl of hydrogen and 5 μl of oxygen were obtained.

実施例 3 実施例1において、RuO4水溶液の還元法によ
る代りにCdS電極の表面にRuO4粉末を強くこす
りつけてのせ、その上に実施例1と同様に高分子
錯体膜を被覆した電極を用い、0.5M KNO3のみ
を含む水溶液を用いたほかは実施例1と全く同様
に光反応を行ない。10時間反応後に16μlの水素と
8μlの酸素を得た。
Example 3 In Example 1, instead of using the RuO 4 aqueous solution reduction method, RuO 4 powder was strongly rubbed onto the surface of the CdS electrode, and an electrode coated with a polymer complex film was used on top of it in the same manner as in Example 1. The photoreaction was carried out in exactly the same manner as in Example 1, except that an aqueous solution containing only 0.5M KNO 3 was used. After 10 hours of reaction, add 16 μl of hydrogen and
8 μl of oxygen was obtained.

実施例 4 実施例1において、表面積0.5cm2のn−GaPを
用い、Inにより銅線とオーミツク接触をとり、エ
ツチングは塩酸−硝酸混液にて行ない、高分子錯
体としては式においてx=0.04、y=0.01、z
=0.21、w=0.74の組成のものを用い、クロロホ
ルム溶液(濃度はRu錯体単位で1mM)を
16μl/cm2の割合で用いて被覆膜を作製した以外は
実施例1と全く同様に光反応させ、5時間後に水
素10μl、酸素5μlを得た。
Example 4 In Example 1, n-GaP with a surface area of 0.5 cm 2 was used, making ohmic contact with the copper wire using In, etching was performed with a hydrochloric acid-nitric acid mixture, and as a polymer complex, x = 0.04 in the formula, y=0.01,z
= 0.21, w = 0.74, and a chloroform solution (concentration is 1mM in Ru complex units).
A photoreaction was carried out in exactly the same manner as in Example 1, except that a coating film was prepared using the mixture at a rate of 16 μl/cm 2 , and after 5 hours, 10 μl of hydrogen and 5 μl of oxygen were obtained.

実施例 5 実施例1において、高分子錯体としてMがメ
チルメタクリレート、x=0.1、y=0、z=0.9
のものを用い、電解質水溶液として1MK2SO4
0.01MH2SO4を含む水溶液を用い、電極電位を
0V(vs、SCE)にして150Wハロゲンランプを用
いたほかは実施例1と全く同様に光反応を行な
い、10時間反応後に水素18μl、酸素9μlを得た。
Example 5 In Example 1, M is methyl methacrylate as a polymer complex, x=0.1, y=0, z=0.9
using 1MK 2 SO 4 as an electrolyte aqueous solution.
Using an aqueous solution containing 0.01MH 2 SO 4 , the electrode potential was
A photoreaction was carried out in exactly the same manner as in Example 1 except that the voltage was set to 0 V (vs. SCE) and a 150 W halogen lamp was used, and after 10 hours of reaction, 18 μl of hydrogen and 9 μl of oxygen were obtained.

実施例 6 実施例3において、n−CdSとして0.2cm2の表
面積のものを用い、RuO2の代りにPtO2粉末を用
いたほかは実施例3と同様に光反応を行ない、5
時間反応後に水素48μlと酸素24μlを得た。
Example 6 A photoreaction was carried out in the same manner as in Example 3 except that n-CdS with a surface area of 0.2 cm 2 was used and PtO 2 powder was used instead of RuO 2 .
After the reaction time, 48 μl of hydrogen and 24 μl of oxygen were obtained.

Claims (1)

【特許請求の範囲】[Claims] 1 可視域n型半導体電極の表面に、トリス
(2、2′−ビピリジン)ルテニウム錯体をペン
ダント基として有する高分子錯体の膜を被覆し、
該膜内には媒質として周期律表第族の金属また
は金属酸化物を共存せしめ、この修飾した可視域
n型半導体電極を電解質水溶液に浸漬し、電極表
面に可視光を照射することにより水を分解し、半
導体電極上で酸素を発生せしめ、対極上で水素を
発生せしめる方法。
1. The surface of a visible n-type semiconductor electrode is coated with a film of a polymer complex having a tris(2,2'-bipyridine)ruthenium complex as a pendant group,
A metal or metal oxide belonging to group 3 of the periodic table is allowed to coexist in the film as a medium, and the modified visible n-type semiconductor electrode is immersed in an aqueous electrolyte solution, and the electrode surface is irradiated with visible light to remove water. A method in which oxygen is decomposed on a semiconductor electrode, and hydrogen is produced on a counter electrode.
JP60196467A 1985-09-05 1985-09-05 How to split water using visible light Granted JPS6256588A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60196467A JPS6256588A (en) 1985-09-05 1985-09-05 How to split water using visible light

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60196467A JPS6256588A (en) 1985-09-05 1985-09-05 How to split water using visible light

Publications (2)

Publication Number Publication Date
JPS6256588A JPS6256588A (en) 1987-03-12
JPH0235037B2 true JPH0235037B2 (en) 1990-08-08

Family

ID=16358285

Family Applications (1)

Application Number Title Priority Date Filing Date
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Country Status (1)

Country Link
JP (1) JPS6256588A (en)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AUPO129496A0 (en) * 1996-07-26 1996-08-22 Broken Hill Proprietary Company Limited, The Photoelectrochemical cell
US8188362B2 (en) 2005-03-10 2012-05-29 Ibaraki University Photophysicochemical cell
JP4803554B2 (en) * 2007-07-06 2011-10-26 国立大学法人茨城大学 Biophotochemical cell and its use
JP5546168B2 (en) * 2009-07-07 2014-07-09 株式会社バイオフォトケモニクス研究所 Photoelectrochemical measurement electrode
CN108588738B (en) * 2018-06-08 2019-06-14 东北石油大学 A method for efficient production of hydrogen and light hydrocarbons by utilizing solar thermal-electric coupling to degrade polypropylene
CN110628036A (en) * 2018-06-21 2019-12-31 潍坊学院 A highly conductive covalent-organic framework material
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