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JPH0240243B2 - BUNSHIHAIKOSEIHAKUMAKU - Google Patents
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JPH0240243B2 - BUNSHIHAIKOSEIHAKUMAKU - Google Patents

BUNSHIHAIKOSEIHAKUMAKU

Info

Publication number
JPH0240243B2
JPH0240243B2 JP18665386A JP18665386A JPH0240243B2 JP H0240243 B2 JPH0240243 B2 JP H0240243B2 JP 18665386 A JP18665386 A JP 18665386A JP 18665386 A JP18665386 A JP 18665386A JP H0240243 B2 JPH0240243 B2 JP H0240243B2
Authority
JP
Japan
Prior art keywords
thin film
diffraction
angle
phenyl group
diacetylene
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP18665386A
Other languages
Japanese (ja)
Other versions
JPS6341515A (en
Inventor
Hiroshige Muramatsu
Akio Ueda
Kunio Okuhara
Kazuo Kodaira
Akira Itsubo
Takashi Kojima
Mitsutaka Myabayashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Chemical Corp
National Institute of Advanced Industrial Science and Technology AIST
Original Assignee
Agency of Industrial Science and Technology
Mitsubishi Petrochemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agency of Industrial Science and Technology, Mitsubishi Petrochemical Co Ltd filed Critical Agency of Industrial Science and Technology
Priority to JP18665386A priority Critical patent/JPH0240243B2/en
Publication of JPS6341515A publication Critical patent/JPS6341515A/en
Publication of JPH0240243B2 publication Critical patent/JPH0240243B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03CPHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00Photosensitive materials
    • G03C1/72Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705
    • G03C1/73Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705 containing organic compounds
    • G03C1/733Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705 containing organic compounds with macromolecular compounds as photosensitive substances, e.g. photochromic
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/35Non-linear optics
    • G02F1/355Non-linear optics characterised by the materials used
    • G02F1/361Organic materials
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/241Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material
    • G11B7/242Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers
    • G11B7/244Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising organic materials only
    • G11B7/245Record carriers characterised by shape, structure or physical properties, or by the selection of the material characterised by the selection of the material of recording layers comprising organic materials only containing a polymeric component

Landscapes

  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Optics & Photonics (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Non-Insulated Conductors (AREA)

Description

【発明の詳細な説明】[Detailed description of the invention]

(3‐1) 産業上の利用分野 本発明はエレクトロニクス、オプトエレクトロ
ニクス分野において、非線形光学デバイス、クロ
ミズムデバイス、光電変換デバイスなどに使用さ
れる分子配向性薄膜に関する。 (3‐2) 従来の技術 ジアセチレン化合物は、熱、光あるいはγ線な
どにより結晶性ポリマーを生成する極めて特異な
物質として知られ、導電性材料、クロミズム材
料、光電変換材料、非線形光学材料等として期待
されている。例えば、非線形光学効果により
10-12秒程度の超高速スウイツチ現象が予測され、
今後の光情報処理システムにおいて、有望視され
ている。 これらの分野、特に非線形光学分野に応用する
上で、良好な結晶性を有する薄膜の形状に加工す
ることが重要である。良好な結晶性薄膜、即ち、
分子配向性薄膜は光導波路としても活用可能であ
り、多様な応用展開が拡がる。 特開昭59−62608には、ジアセチレン化合物の
溶液又は懸濁液から基板上へのスプレー法又はス
ピンナー法、あるいはジアセチレン化合物の基板
上への真空蒸着法で作成したジアセチレンモノマ
ー薄膜を重合させることにより薄膜を製造する方
法が記載されている。 しかし、通常、ジアセチレン化合物をこれ等の
方法によつて得た薄膜の結晶性は極めて悪い。例
えば、クラツク、ドメイン構造、スタツキング不
良、平面の平担性の悪さなど欠陥が多い。 この点を改良し、単結晶薄膜を作成する方法が
Macromolecules 1985,18,2341−2344に報告
されている。ジアセチレン化合物を融点以上に加
熱し、剪断力を印加することにより配向させ結晶
化させる方法である。しかし、ジアセチレン化合
物は昇温することにより熱重合する場合もあり、
剪断配向化が不完全になり結晶性が向上しない等
の欠点を有する。 一方、疎水基と親水基とを有するジアセチレン
化合物をラングミアーブロジエツト法にて累積
し、薄膜を形成する方法も多数報告されている。
しかし、かかる方法によつて得られる薄膜もドメ
イン構造を有するなどの欠点があり結晶性は良好
でない。 (3‐3) 発明の目的 本発明は、特定の結晶面が特定方向に優先的に
配向結晶化し、非線形光学デバイス等のエレクト
ロニクス、オプトエレクトロニクス分野のデバイ
スに適する含フツ素ポリジアセチレン系分子配向
性薄膜を提供することを目的とする。 (3‐4) 発明の概要 本発明者らは鋭意技術的検討を行つた結果、一
般式R1−C≡C−C≡C−R2(R1,R2は、フエ
ニル基又は置換フエニル基、但し、R1又はR2
少なくとも一方はフツ素置換フエニル基である。)
で示される含フツ素ジアセチレンモノマーの重合
体からなり、広角X線回折より求めた回析パター
ンにおいて、回折角度2θ=2sin-1(nλ/2d)(nは
1以上の整数であり、n次のブラツグ反射に対応
し、dは結晶の面間隔を示す定数、及びλはX線
の波長を示す。)の関係にある回折ピークが3個
以上存在することを特徴とする分子配向性薄膜を
見出し、本発明に到達した。 (3‐5) 発明の具体的説明 〔含フツ素ジアセチレンモノマー〕 本発明に用いる含フツ素ジアセチレンモノマー
は、一般式R1−C≡C−C≡C−R2(R1,R2は、
フエニル基又は置換フエニル基、但し、R1又は
R2の少なくとも一方はフツ素置換フエニル基で
ある。)で示される。 具体的には、R1,R2は、フエニル基、ハロゲ
ン置換フエニル基、アルキル基置換フエニル基、
ハロゲン化アルキル基置換フエニル基を挙げるこ
とができる。フエニル基に置換するアルキル基又
はハロゲン化アルキル基の炭素数は1〜6の範囲
が好ましい。 好ましい置換フエニル基としては、2,3,
5,6−テトラフルオロ−4−n−ブチルフエニ
ル基、2,3,5,6−テトラフルオロ−4−
(n−ペンチル)フエニル基、ペンタフルオロフ
エニル基、2−トリフルオロメチルフエニル基、
2,5−ビス(トリフルオロメチル)フエニル
基、2,4−ビス(トリフルオロメチル)フエニ
ル基、3,5−ビス(トリフルオロメチル)フエ
ニル基を挙げることができる。さらに好ましく
は、R1=R2であり、両者とも上記のフツ素を含
有するフエニル基より成るジアセチレンモノマー
である。 本発明を阻害しない限り他のコモノマーを添加
することができる。そのようなコモノマーとして
は、ジフエニルジアセチレン等がある。コモノマ
ーの含有量は、一般に10モル%以下好ましくは5
モル%以下である。 〔分子配向性薄膜の作製〕 本発明における分子配向性薄膜は、前述のジア
セチレンモノマーを真空蒸着法等のドライプロセ
ス、あるいは融液剪断配向結晶化法
(Macromolecules1985,18,2341−2344)によ
り薄膜化し、その後重合することにより作製され
る。真空蒸着法の場合には次の条件で作製する。
蒸着圧力は10-1torr以下、好ましくは10-2torr以
下である。基板温度は45℃以下、好ましくは40℃
以下である。蒸発源温度(蒸発ボート上のジアセ
チレンモノマーの温度)は、ジアセチレンモノマ
ーの融点をTmとすると、(Tm−25)℃以下、好
ましくは(Tm−30)℃以下である。本発明の含
フツ素ジフエニルジアセチレンは昇華性を有する
化合物である。上記の制御された条件下でこの性
質を利用することにより、基板に沈着させつつ配
向結晶化させることが可能となる。基板の温度を
45℃より高くすると沈着たモノマーが再び昇華す
るなどの現象が現れ好ましくない。蒸発圧力をよ
り低く設定する時は、蒸発源温度をより低く設定
する(例えば10-6torrに対し、(Tm−50)℃、
10-4torrに対し(Tm−40)℃)など昇華速度を
上記の条件内で制御することが重要である。 本発明の代表的な含フツ素ジフエニルジアセチ
レンモノマーの融点を表1に示す。
(3-1) Industrial Application Field The present invention relates to a molecularly oriented thin film used in nonlinear optical devices, chromism devices, photoelectric conversion devices, etc. in the electronics and optoelectronics fields. (3-2) Prior art Diacetylene compounds are known as extremely unique substances that generate crystalline polymers when exposed to heat, light, or gamma rays, and are used as conductive materials, chromic materials, photoelectric conversion materials, nonlinear optical materials, etc. It is expected that For example, due to nonlinear optical effects,
An ultra-fast switch phenomenon of about 10 -12 seconds is predicted,
It is seen as promising for future optical information processing systems. For application in these fields, particularly in the field of nonlinear optics, it is important to process thin films with good crystallinity. Good crystalline thin film, i.e.
Molecularly oriented thin films can also be used as optical waveguides, opening up a wide variety of applications. JP-A No. 59-62608 describes the polymerization of diacetylene monomer thin films prepared by spraying or spinner methods from solutions or suspensions of diacetylene compounds onto substrates, or by vacuum evaporation methods of diacetylene compounds onto substrates. A method is described for producing thin films by. However, thin films obtained from diacetylene compounds by these methods usually have extremely poor crystallinity. For example, there are many defects such as cracks, domain structure, poor stacking, and poor flatness. A method to improve this point and create a single crystal thin film is now available.
Macromolecules 1985, 18 , 2341-2344. This is a method of heating a diacetylene compound above its melting point and applying a shearing force to orient and crystallize it. However, diacetylene compounds may undergo thermal polymerization by increasing the temperature.
It has drawbacks such as incomplete shear orientation and no improvement in crystallinity. On the other hand, many methods have been reported in which diacetylene compounds having a hydrophobic group and a hydrophilic group are accumulated by the Langmire-Blodget method to form a thin film.
However, the thin film obtained by this method also has drawbacks such as having a domain structure, and its crystallinity is not good. (3-3) Purpose of the Invention The present invention provides a fluorine-containing polydiacetylene-based molecular orientation system in which a specific crystal plane is preferentially oriented in a specific direction and is suitable for devices in the electronics and optoelectronics fields such as nonlinear optical devices. The purpose is to provide thin films. (3-4) Summary of the Invention As a result of intensive technical studies, the present inventors found that the general formula R 1 -C≡C-C≡C-R 2 (R 1 and R 2 are phenyl groups or substituted phenyl groups) (However, at least one of R 1 or R 2 is a fluorine-substituted phenyl group.)
In the diffraction pattern obtained by wide-angle X-ray diffraction, the diffraction angle 2θ = 2sin -1 (nλ/2d) (n is an integer of 1 or more, n A molecularly oriented thin film characterized by the presence of three or more diffraction peaks corresponding to the following Bragg reflection, where d is a constant indicating the interplanar spacing of the crystal, and λ is the wavelength of X-rays. They discovered this and arrived at the present invention. (3-5) Specific description of the invention [Fluorine-containing diacetylene monomer] The fluorine-containing diacetylene monomer used in the present invention has the general formula R 1 -C≡C-C≡C-R 2 (R 1 , R 2 is
Phenyl group or substituted phenyl group, provided that R 1 or
At least one of R 2 is a fluorine-substituted phenyl group. ). Specifically, R 1 and R 2 are phenyl group, halogen-substituted phenyl group, alkyl group-substituted phenyl group,
Mention may be made of phenyl groups substituted with halogenated alkyl groups. The number of carbon atoms in the alkyl group or halogenated alkyl group substituted on the phenyl group is preferably in the range of 1 to 6. Preferred substituted phenyl groups include 2, 3,
5,6-tetrafluoro-4-n-butylphenyl group, 2,3,5,6-tetrafluoro-4-
(n-pentyl) phenyl group, pentafluorophenyl group, 2-trifluoromethylphenyl group,
Examples include 2,5-bis(trifluoromethyl)phenyl group, 2,4-bis(trifluoromethyl)phenyl group, and 3,5-bis(trifluoromethyl)phenyl group. More preferably, R 1 =R 2 and both are diacetylene monomers comprising the above-mentioned fluorine-containing phenyl group. Other comonomers can be added as long as they do not interfere with the invention. Such comonomers include diphenyl diacetylene and the like. The comonomer content is generally 10 mol% or less, preferably 5
It is less than mol%. [Preparation of molecularly oriented thin film] The molecularly oriented thin film in the present invention is produced by forming the aforementioned diacetylene monomer into a thin film by a dry process such as a vacuum evaporation method or by a melt shear oriented crystallization method (Macromolecules 1985, 18 , 2341-2344). It is produced by oxidation and subsequent polymerization. In the case of vacuum evaporation method, it is produced under the following conditions.
The deposition pressure is 10 -1 torr or less, preferably 10 -2 torr or less. Substrate temperature is below 45℃, preferably 40℃
It is as follows. The evaporation source temperature (temperature of the diacetylene monomer on the evaporation boat) is (Tm-25)°C or less, preferably (Tm-30)°C or less, where Tm is the melting point of the diacetylene monomer. The fluorine-containing diphenyl diacetylene of the present invention is a compound having sublimation properties. By utilizing this property under the above-mentioned controlled conditions, it becomes possible to perform oriented crystallization while depositing on a substrate. The temperature of the board
If the temperature is higher than 45°C, phenomena such as the deposited monomer sublimating again occur, which is not preferable. When setting the evaporation pressure lower, set the evaporation source temperature lower (e.g., (Tm-50)℃ for 10 -6 torr,
It is important to control the sublimation rate within the above conditions, such as (Tm - 40) °C for 10 -4 torr. Table 1 shows the melting points of typical fluorine-containing diphenyl diacetylene monomers of the present invention.

〔分子配向性〕[Molecular orientation]

本発明においては、分子配向性は、X線広角回
折法によつて測定することができ、測定された回
折パターンにおいて、回折角度2θ=2sin-1(nλ/
2d)(ここでdは結晶の面間隔を示す定数、λは
X線の波長、nは1以上の整数であり、n次のブ
ラツグ反射に対応する。)の関係にある回折ピー
クが3個以上存在するか否かによつて判定され
る。 具体的には、強度が比較的強いピークであつ
て、最小回折角度にある回折ピークをn=1とし
て、その回折角度を2θ1とする。d0=λ/2sinθ1
よりd0を求める。次に2θ=2sin-1(nλ/2d0)より
n=2,3,4……に対応する回折角度θ2,θ3
θ4……を計算し、その角度に回折ピークが2個以
上実際に存在するかどうか判定する。存在すれば
結晶の面間隔d0である特定の結晶面が基板に対し
配向し、結晶を構成する分子も配向している分子
配向性薄膜であることが判定される。ここで回折
角度2θの計算値と実測値の一致は±0.3度以下、
好ましくは±0.2度以下である。 もし、回折ピークが存在しないときは、更に回
折角度の大きい回折ピークからd0を求め同様に回
折ピークの有無を判断し、存在すれば結晶面が配
向していると判定する。 結晶構造解析により結晶系、空間群、単位格子
定数、及び結晶軸間の角度が既知であれば結晶面
(h,k,l)に対応するdhklを計算し、次にdhkl
を用いてn=1,2,3,4……に対応する回折
角度を計算する。実測されている周期的な回折ピ
ークの回折角度と計算値を比較し、最終的にベス
トフイツトする(h0,k0,l0)を求める。これよ
り基板に対し配向している特定な結晶面が(h0
k0,l0)であり、分子が基板に対しどのように配
向しているかが判明する。 本発明においてはnの上限は特に限定されない
が、配向状態が良好であればn=5〜10次まで達
する。また場合によつては反射強度が小さく回折
ピークとして検出されない次数もある。例えば、
1,2,3,5次の回折ピークは認められるが4
次は認められない場合であり、このような場合も
本発明に含まれる。 本発明においては、回折角度2θ=2sin-1(nλ/
2d)に周期的に存在する回折ピーク以外に、1
つ以上の微小な回折ピークが存在することがあ
る。一般にこれ等の回折ピークは粉末法で測定し
た場合に対して強度が極めて小さく現れ、一般
に、薄膜での回折ピークの強度が、それに対応す
る粉末法での回折ピーク強度の1/5以下、より好
ましくは1/10以下である場合、本発明薄膜として
使用することに支障はない。 一般に、周期的に表れる回折ピークの3個以上
が他の回折ピークより強度が高いことが望まし
い。測定された回折ピークのすべてが一定の回折
角式を構成することが最も好ましい。 以下本発明を実施例により詳細に説明するが、
本発明はこれに限定されるものではない。 (4) 実施例 (4‐1) 実施例1 ジアセチレンモノマーとして2,2′,5,5′−
テトラキス(トリフルオロメチル)ジフエニルジ
アセチレン(融点=101〜102℃)を用いた。試料
約10mgをタングステンボードに入れ蒸発圧力=4
×10-4torr、基板温度=25℃、蒸発源温度=56℃
の条件下で、よく洗浄したポリメチルメタアクリ
レート(PMMA)(15×35mm)上に蒸着し、ジア
セチレンモノマー薄膜を作製した。多重反射干渉
法により膜厚は0.7μmであつた。この薄膜にキセ
ノンランプにバンドパスフイルター(UV−
D33S)を用いて得られる紫外光(240〜400nm)
を10mW/cm2、10分間照射し、モノマーを重合し
て赤色のポリジアセチレン薄膜を作製した。 この薄膜の広角X線回折パターンをグラフアイ
トモノクロメーターで単色化したCuK〓線(λ=
1.5418Å)を線源とする反射式デイフラクトメー
タ法により測定した。回折パターンを第1図に示
す。 回折ピークのうち最小な角度2θ1=6.71゜を有す
るものをn=1とする。d0=λ/2sinθ1よりd0
13.17Åとなる。次に2θ=2sin-1(nλ/2d0)より
n=2,3,4,5,6,7に対応する2θを求め
ると、13.44゜,20.22゜,27.08゜,34.03゜,41.12゜

48.37゜となる。この計算値に対応する実測値は
13.40゜,20.20゜,27.05゜,34.00゜,,41.10゜,48.
35゜で
あり極めてよく一致する。回折ピークが回折角度
2θ=2sin-1(nλ/2d)に周期的に7本存在するこ
とが判明した。又この場合n=1〜7以外の回折
ピークは全く認められなかつた。ただし、13゜及
び30゜前後のハローは基板のPMMAによるもので
ある。 以上よりこの薄膜はポリジアセチレン分子が基
板に対し特定の方向に配向し、結晶化している結
晶性の極めて優れた分子配向性薄膜であることが
判明した。 第2図に可視光吸収スペクトルを示す。ピーク
Aはπ−π*励起子に対応するピークであり、ピ
ークA′は励起子に付随するフオノンサイドバン
ドに対応する。ピークの鋭さは、この薄膜のπ電
子供役系の発達の良好さ、即ち、結晶性の良好さ
を示している。一方、この吸収スペクトルは薄膜
に対し、垂直に入射し、測定されているので、ポ
リジアセチレン分子が基板に対し平行に配向して
いることが推定される。 (4‐2) 比較例1 ジアセチレンモノマーとして実施例1と同一の
2,2′,5,5′−テトラキス(トリフルオロメチ
ル)ジフエニルジアセチレン(融点=101〜102
℃)を用いた。試料約10mgをタングステンボート
に入れ、蒸発圧力5torr、基板温度=25℃に設定
し、蒸着源温度を82℃に急速加熱し、PMMA(15
×35mm)上に蒸着した。この条件下ではジアセチ
レンモノマーは、薄膜状にならず、基板上にブツ
ブツ(比較的大きな島状)に付着するのみであつ
た。以上よりこの蒸着条件下では分子配向性薄膜
は得られないことが判明した。 (4‐3) 実施例2 ジアセチレンモノマーとして、R−C≡C−C
≡C−Rにおいて、Rが2,3,5,6−テトラ
フルオロ−4−n−ブチルフエニル基であるもの
を用いた(融点102〜103℃)。試料約8mgをタン
グステンボートに入れ、蒸発圧力=5×
10-6torr、基板温度=25℃、蒸発源温度=52℃の
条件下で、PMMA(15×35mm)上に蒸着し、ジア
セチレンモノマー薄膜を作製した。膜厚は0.6μm
であつた。この薄膜に実施例1と同様に紫外光を
10mW/cm2、12分間照射し、モノマーを重合して
青色のポリジアセチレン薄膜を作製した。この薄
膜の広角X線回折パターンを実施例1と同様に測
定した。第3図に回折パターンを示す。回折ピー
クのうち最小な角度2θ1=7.95゜を有するものをn
=1とする。d0=λ/2sinθ1よりd0=11.12とな
る。次に2θ=2sin-1(nλ/2d0)よりn=2,3,
4,5に対応する2θを求めると、15.93゜,24.01゜,
32.19゜,40.56゜となる。この計算値に対応する実
測値は、15.90゜,24.05゜、検出されず、40.70゜であ
り極めてよく一致する。ただしn=4に対応する
ピークは基板のPMMAのハローに重なり検出さ
れなかつた。またn=1,2,3,5に対応する
以外の回折ピークは全く認められなかつた。以上
よりこの薄膜はポリジアセチレン分子が基板に対
し特定の方向に配向し、結晶化している結晶性の
極めて優れた分子配向性薄膜であることが判明し
た。 第4図に可視光吸収スペクトルを示す。実施例
1と同様にπ−π*励起子に基づぐ鋭いピークが
認められる。ピークの鋭さは、この薄膜のπ電子
共役系の発達の良好さ、即ち、結晶性の良好さを
示している。一方、この吸収スペクトルは薄膜に
対し、垂直に入射し、測定されているので、ポリ
ジアセチレン分子が基板に対し平行に配行してい
ることが推定される。 (4‐4) 比較例2 ジアセチレンモノマーとして実施例2と同一の
ものを用いた(融点102〜103℃)。試料約20mgを
タングステンボートに入れ、蒸発圧力=1torr、
基板温度=25℃、蒸発源温度=80℃の条件下で、
PMMA(15×35mm)上に蒸着した。基板上に表面
凹凸の激しいザラザラの状態に沈着し、きれいな
薄膜状にはならなかつた。このものに実施例1と
同様に紫外線を取射し、重合させ、広角X線回折
パターンを測定した。その結果を第5図に示す。
第3図との比較により、このものは、単に微結晶
がランダムに沈着しているものと判定される。 (4‐5) 実施例3 ジアセチレンモノマーとして、R−C≡C−C
≡C−Rにおいて、Rが2,3,5,6−テトラ
フルオロ−4−(n−ペンチル)フエニル基であ
るもの(融点107〜109℃)を用いた。試料約15mg
をタングステンボートに入れ、蒸発圧力=1×
10-4torr、基板温度=20℃、蒸発源温度=55℃の
条件下で、よく洗浄したスライドグラス(15×35
mm)上に蒸着し、ジアセチレンモノマー薄膜を作
製した。膜厚は0.75μmであつた。この薄膜にγ
線84Mrad照射し、モノマーを重合して青色のポ
リジアセチレン薄膜を作製した。この薄膜の広角
X線回折パターンを実施例1と同様に測定した。
第6図に回折パターンを示す。回折ピークのうち
最小な角度2θ1=7.85゜を有するものをn=1とす
る。d0=λ/2sinθ1よりd0=11.26となる。次に2θ
=2sin-1(nλ/2d0)よりn=2,3に対応する2θ
を求めると15.74゜,23.70゜となる。この計算値に
対応する実測値は、15.80゜,23.90゜でありよく一
致する。以上のn=1,2,3に対応する主要な
回折ピーク以外にも回折角11.0゜、及び17.5゜付近
に微小な回折ピークが認められる(25゜付近のハ
ローはガラスによる)。しかし、この微小な回折
ピークの強度は粉末法で求めた回折ピークの強度
の1/10以下である。以上よりこの薄膜はポリジア
セチレン分子が基板に対し特定の方向に配向し結
晶化している結晶性の優れた分子配向性薄膜であ
ることが判明した。 (4‐6) 実施例4 ジアセチレンモノマーとしてR−C≡C−C≡
C−RにおいてRが2,4−ビス(トリフルオロ
メチル)フエニル基であるもの(融点145〜146
℃)を用いた。試料約12mgをタングステンボート
に入れ、蒸発圧力=5×10-6torr、基板温度=20
℃、蒸発源温度=60℃の条件下でスライドガラス
(15×35mm)に蒸着し、ジアセチレンモノマー薄
膜を作製した。膜厚は0.7μmであつた。この薄膜
に実施例1と同様に紫外光を10mW/cm2、60分間
照射し、モノマーを重合して青色のポリジアセチ
レン薄膜を作製した。この薄膜の広角X線回折パ
ターンを実施例1と同様に測定した。第7図に回
折パターンを示す。回折ピークのうち最小な角度
1=9.30を有するものをn=1とする。d0
λ/2sinθ1,d0=9.51となる。次に2θ=2sin-1
(nλ/2d0)よりn=2,3に対応する2θを求め
ると、18.60゜,28.05゜となる。この計算値に対応
する実測値は18.70゜,28.25゜であり、よく一致す
る。以上のn=1,2,3に対応する主要な回折
ピーク以外にも回折角10.9゜,13.2゜,16.0゜,22.5゜
付近に微小な回折ピークが認められる。しかし、
この微小な回折ピークの強度は粉末法で求めた回
折ピークの強度の1/5以下である。以上よりこの
薄膜はポリジアセチレン分子が基板に対し特定の
方向に配向し、結晶化している分子配向性薄膜で
あることが判明した。
In the present invention, molecular orientation can be measured by X-ray wide-angle diffraction, and in the measured diffraction pattern, the diffraction angle 2θ=2sin -1 (nλ/
2d) (where d is a constant indicating the interplanar spacing of the crystal, λ is the wavelength of the X-ray, and n is an integer greater than or equal to 1, which corresponds to the n-th order Bragg reflection.) There are three diffraction peaks with the following relationship. The determination is made based on whether or not there are more than one. Specifically, the diffraction peak that is relatively strong in intensity and located at the minimum diffraction angle is set to n=1, and its diffraction angle is set to 2θ 1 . d 0 =λ/2sinθ 1
Find d 0 from Next, from 2θ=2sin -1 (nλ/2d 0 ), the diffraction angles θ 2 , θ 3 , corresponding to n=2, 3, 4...
θ 4 ... is calculated, and it is determined whether two or more diffraction peaks actually exist at that angle. If the film exists, it is determined that the film is a molecularly oriented thin film in which a specific crystal plane having a crystal spacing d 0 is oriented with respect to the substrate, and the molecules constituting the crystal are also oriented. Here, the agreement between the calculated value and the measured value of the diffraction angle 2θ is less than ±0.3 degrees,
Preferably it is ±0.2 degrees or less. If there is no diffraction peak, d 0 is determined from a diffraction peak with a larger diffraction angle, and the presence or absence of a diffraction peak is determined in the same manner. If it is present, it is determined that the crystal plane is oriented. If the crystal system, space group, unit cell constant, and angle between crystal axes are known by crystal structure analysis, calculate d hkl corresponding to the crystal plane (h, k, l), then d hkl
The diffraction angles corresponding to n=1, 2, 3, 4... are calculated using The diffraction angle of the actually measured periodic diffraction peak is compared with the calculated value, and the final best fit (h 0 , k 0 , l 0 ) is determined. From this, a specific crystal plane oriented with respect to the substrate (h 0 ,
k 0 , l 0 ), which reveals how the molecules are oriented with respect to the substrate. In the present invention, the upper limit of n is not particularly limited, but if the orientation state is good, n reaches 5th to 10th order. In some cases, there are also orders whose reflection intensity is so small that they are not detected as diffraction peaks. for example,
Although 1st, 2nd, 3rd, and 5th order diffraction peaks are observed, 4
The following cases are not permitted, and such cases are also included in the present invention. In the present invention, the diffraction angle 2θ=2sin -1 (nλ/
In addition to the diffraction peaks that periodically exist in 2d), 1
There may be more than one small diffraction peak. In general, these diffraction peaks appear to have extremely low intensities when measured using the powder method, and in general, the intensity of the diffraction peak in a thin film is less than 1/5 of the corresponding diffraction peak intensity when measured using the powder method. If it is preferably 1/10 or less, there is no problem in using it as the thin film of the present invention. Generally, it is desirable that three or more periodically appearing diffraction peaks have higher intensity than other diffraction peaks. Most preferably, all of the measured diffraction peaks constitute a constant diffraction angle equation. The present invention will be explained in detail by examples below.
The present invention is not limited to this. (4) Example (4-1) Example 1 2,2',5,5'- as diacetylene monomer
Tetrakis(trifluoromethyl)diphenyl diacetylene (melting point = 101-102°C) was used. Approximately 10 mg of sample was placed in a tungsten board and evaporation pressure = 4
×10 -4 torr, substrate temperature = 25℃, evaporation source temperature = 56℃
A diacetylene monomer thin film was prepared by vapor deposition on well-washed polymethyl methacrylate (PMMA) (15 x 35 mm) under the following conditions. The film thickness was determined to be 0.7 μm by multiple reflection interferometry. A xenon lamp and a bandpass filter (UV-
UV light (240-400nm) obtained using D33S)
was irradiated at 10 mW/cm 2 for 10 minutes to polymerize the monomer and produce a red polydiacetylene thin film. The CuK〓 line (λ=
Measurements were made using a reflection diffractometer method using a radiation source of 1.5418 Å). The diffraction pattern is shown in FIG. Among the diffraction peaks, the one having the smallest angle 2θ 1 =6.71° is set as n=1. From d 0 = λ/2sinθ 1, d 0 =
It becomes 13.17Å. Next, find the 2θ corresponding to n=2, 3, 4, 5, 6, 7 from 2θ=2sin -1 (nλ/2d 0 ): 13.44°, 20.22°, 27.08°, 34.03°, 41.12°,
It becomes 48.37°. The actual value corresponding to this calculated value is
13.40°, 20.20°, 27.05°, 34.00°, 41.10°, 48.
The angle is 35°, which is a very good match. The diffraction peak is the diffraction angle
It was found that seven lines exist periodically at 2θ=2sin -1 (nλ/2d). Further, in this case, no diffraction peaks other than n=1 to 7 were observed. However, the halo around 13° and 30° is due to the PMMA of the substrate. From the above, it was found that this thin film was a molecularly oriented thin film with extremely excellent crystallinity, in which polydiacetylene molecules were oriented and crystallized in a specific direction with respect to the substrate. Figure 2 shows the visible light absorption spectrum. Peak A is a peak corresponding to a π-π * exciton, and peak A' corresponds to a phonon sideband associated with an exciton. The sharpness of the peak indicates the good development of the π-electron role system in this thin film, that is, the good crystallinity. On the other hand, since this absorption spectrum was measured with the light incident perpendicularly to the thin film, it is presumed that the polydiacetylene molecules are oriented parallel to the substrate. (4-2) Comparative Example 1 The same 2,2',5,5'-tetrakis(trifluoromethyl)diphenyl diacetylene as in Example 1 (melting point = 101-102) was used as the diacetylene monomer.
°C) was used. Approximately 10 mg of the sample was placed in a tungsten boat, the evaporation pressure was set to 5 torr, the substrate temperature was set to 25°C, the evaporation source temperature was rapidly heated to 82°C, and PMMA (15
x 35 mm). Under these conditions, the diacetylene monomer did not form into a thin film, but instead adhered only in patches (relatively large islands) on the substrate. From the above, it was found that a molecularly oriented thin film could not be obtained under these deposition conditions. (4-3) Example 2 As a diacetylene monomer, R-C≡C-C
In ≡C-R, R was a 2,3,5,6-tetrafluoro-4-n-butylphenyl group (melting point: 102 to 103°C). Approximately 8 mg of sample was placed in a tungsten boat, and evaporation pressure = 5×
A diacetylene monomer thin film was produced by vapor deposition on PMMA (15 x 35 mm) under the conditions of 10 -6 torr, substrate temperature = 25 °C, and evaporation source temperature = 52 °C. Film thickness is 0.6μm
It was hot. This thin film was exposed to ultraviolet light in the same manner as in Example 1.
It was irradiated at 10 mW/cm 2 for 12 minutes to polymerize the monomer and produce a blue polydiacetylene thin film. The wide-angle X-ray diffraction pattern of this thin film was measured in the same manner as in Example 1. Figure 3 shows the diffraction pattern. Among the diffraction peaks, the one with the smallest angle 2θ 1 = 7.95° is n
=1. From d 0 =λ/2sinθ 1 , d 0 =11.12. Next, from 2θ=2sin -1 (nλ/2d 0 ), n=2,3,
Finding 2θ corresponding to 4 and 5 is 15.93°, 24.01°,
They become 32.19° and 40.56°. The actual measured values corresponding to this calculated value are 15.90°, 24.05°, not detected, and 40.70°, which are in excellent agreement. However, the peak corresponding to n=4 overlapped with the halo of PMMA of the substrate and was not detected. Further, no diffraction peaks other than those corresponding to n=1, 2, 3, and 5 were observed. From the above, it was found that this thin film was a molecularly oriented thin film with extremely excellent crystallinity, in which polydiacetylene molecules were oriented and crystallized in a specific direction with respect to the substrate. Figure 4 shows the visible light absorption spectrum. As in Example 1, a sharp peak based on π-π * excitons is observed. The sharpness of the peak indicates the good development of the π-electron conjugated system in this thin film, that is, the good crystallinity. On the other hand, since this absorption spectrum was measured by entering the thin film perpendicularly, it is presumed that the polydiacetylene molecules are aligned parallel to the substrate. (4-4) Comparative Example 2 The same diacetylene monomer as in Example 2 was used (melting point 102-103°C). Approximately 20 mg of sample was placed in a tungsten boat, evaporation pressure = 1 torr,
Under the conditions of substrate temperature = 25℃ and evaporation source temperature = 80℃,
Deposited on PMMA (15 x 35 mm). It was deposited on the substrate in a rough state with severe surface irregularities, and did not form into a clean thin film. This material was irradiated with ultraviolet rays in the same manner as in Example 1 to polymerize, and the wide-angle X-ray diffraction pattern was measured. The results are shown in FIG.
By comparison with FIG. 3, it is determined that this is simply a randomly deposited microcrystal. (4-5) Example 3 As a diacetylene monomer, R-C≡C-C
In ≡C-R, a compound in which R is a 2,3,5,6-tetrafluoro-4-(n-pentyl)phenyl group (melting point: 107 to 109°C) was used. Sample approximately 15mg
into a tungsten boat, evaporation pressure = 1×
A well-washed slide glass (15 x 35
mm) to produce a diacetylene monomer thin film. The film thickness was 0.75 μm. This thin film has γ
A blue polydiacetylene thin film was produced by irradiating the monomer with 84 Mrad radiation and polymerizing the monomer. The wide-angle X-ray diffraction pattern of this thin film was measured in the same manner as in Example 1.
Figure 6 shows the diffraction pattern. Among the diffraction peaks, the one having the minimum angle 2θ 1 =7.85° is set as n=1. From d 0 =λ/2sinθ 1 , d 0 =11.26. Then 2θ
=2sin -1 (nλ/2d 0 ), 2θ corresponding to n=2,3
Calculating these results in 15.74° and 23.70°. The measured values corresponding to these calculated values are 15.80° and 23.90°, which are in good agreement. In addition to the main diffraction peaks corresponding to n=1, 2, and 3, small diffraction peaks are observed around diffraction angles of 11.0° and 17.5° (the halo around 25° is caused by glass). However, the intensity of this minute diffraction peak is less than 1/10 of the intensity of the diffraction peak determined by the powder method. From the above, it was found that this thin film was a molecularly oriented thin film with excellent crystallinity in which polydiacetylene molecules were oriented and crystallized in a specific direction with respect to the substrate. (4-6) Example 4 R-C≡C-C≡ as diacetylene monomer
CR in which R is a 2,4-bis(trifluoromethyl)phenyl group (melting point 145-146
°C) was used. Approximately 12 mg of sample was placed in a tungsten boat, evaporation pressure = 5 x 10 -6 torr, substrate temperature = 20
℃, evaporation source temperature = 60℃, and deposited on a slide glass (15 x 35 mm) to prepare a diacetylene monomer thin film. The film thickness was 0.7 μm. This thin film was irradiated with ultraviolet light at 10 mW/cm 2 for 60 minutes in the same manner as in Example 1, and the monomer was polymerized to produce a blue polydiacetylene thin film. The wide-angle X-ray diffraction pattern of this thin film was measured in the same manner as in Example 1. FIG. 7 shows the diffraction pattern. Minimum angle among diffraction peaks
The one having 2θ 1 =9.30 is set as n=1. d 0 =
λ/2sinθ 1 , d 0 =9.51. Then 2θ=2sin -1
If we calculate 2θ corresponding to n=2 and 3 from (nλ/2d 0 ), we get 18.60° and 28.05°. The actual measured values corresponding to this calculated value are 18.70° and 28.25°, which are in good agreement. In addition to the main diffraction peaks corresponding to n=1, 2, and 3, small diffraction peaks are observed around diffraction angles of 10.9°, 13.2°, 16.0°, and 22.5°. but,
The intensity of this minute diffraction peak is less than 1/5 of the intensity of the diffraction peak determined by the powder method. From the above, it was found that this thin film was a molecularly oriented thin film in which polydiacetylene molecules were oriented in a specific direction with respect to the substrate and crystallized.

【図面の簡単な説明】[Brief explanation of drawings]

第1図,第3図,第6図、第7図は、実施例
1,2,3,4における広角X線回折パターンを
示す。第2図,第4図は実施例1,2における可
視光吸収スペクトルを示す。第5図は比較例2に
おける広角X線回折パターンを示す。
FIG. 1, FIG. 3, FIG. 6, and FIG. 7 show wide-angle X-ray diffraction patterns in Examples 1, 2, 3, and 4. FIG. 2 and FIG. 4 show visible light absorption spectra in Examples 1 and 2. FIG. 5 shows a wide-angle X-ray diffraction pattern in Comparative Example 2.

Claims (1)

【特許請求の範囲】[Claims] 1 一般式R1−C≡C−C≡C−R2(R1,R2は、
フエニル基又は置換フエニル基、但し、R1又は
R2の少なくとも一方はフツ素置換フエニル基で
ある。)で示される含フツ素ジアセチレンモノマ
ーの重合体からなり、広角X線回折より求めた回
折パターンにおいて、回折角度2θ=2sin-1(nλ/
2d)(nは1以上の整数であり、n次のブラツグ
反射に対応し、dは結晶の面間隔を示す定数、及
びλはX線の波長を示す。)の関係にある回折ピ
ークが3個以上存在することを特徴とする分子配
向性薄膜。
1 General formula R 1 -C≡C-C≡C-R 2 (R 1 and R 2 are
Phenyl group or substituted phenyl group, provided that R 1 or
At least one of R 2 is a fluorine-substituted phenyl group. ), and in the diffraction pattern determined by wide-angle X-ray diffraction, the diffraction angle 2θ=2sin -1 (nλ/
2d) (n is an integer greater than or equal to 1 and corresponds to n-th order Bragg reflection, d is a constant indicating the interplanar spacing of the crystal, and λ indicates the wavelength of the X-ray). A molecularly oriented thin film characterized by the presence of more than one molecule.
JP18665386A 1986-08-07 1986-08-07 BUNSHIHAIKOSEIHAKUMAKU Expired - Lifetime JPH0240243B2 (en)

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JPH0240243B2 true JPH0240243B2 (en) 1990-09-11

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Publication number Priority date Publication date Assignee Title
JP2790146B2 (en) * 1988-09-19 1998-08-27 富士通株式会社 Fabrication method of organic nonlinear optical film
JPH0670697B2 (en) * 1989-09-11 1994-09-07 理化学研究所 Organic nonlinear optical material

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