JPH0670697B2 - Organic nonlinear optical material - Google Patents
Organic nonlinear optical materialInfo
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- JPH0670697B2 JPH0670697B2 JP1235193A JP23519389A JPH0670697B2 JP H0670697 B2 JPH0670697 B2 JP H0670697B2 JP 1235193 A JP1235193 A JP 1235193A JP 23519389 A JP23519389 A JP 23519389A JP H0670697 B2 JPH0670697 B2 JP H0670697B2
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- Japan
- Prior art keywords
- nonlinear optical
- group
- polymer
- optical material
- organic nonlinear
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Description
【発明の詳細な説明】 (産業上の利用分野) 本発明は、高周波数逓倍素子、光シャッター及びEO変換
器等に利用される非線形光学材料に関し、さらに詳しく
は、主鎖にジイン基を持つ高分子からなる有機非線形光
学材料に関するものである。TECHNICAL FIELD The present invention relates to a non-linear optical material used for a high frequency multiplier, an optical shutter, an EO converter, and the like, and more specifically, has a diyne group in the main chain. The present invention relates to an organic nonlinear optical material composed of a polymer.
(従来技術) 従来から、非線形光学材料としてはリン酸二水素化カリ
ウム(KDP)やニオブ酸リチウム(LiNbO3)等の無機強
誘電体材料が光周波数逓倍素子として実用化されてい
る。一方、有機非線形光学材料はより大きい非線形光学
定数、より速い非線形光学応答や高い破壊しきい値等の
特徴を有し、従来のオプトエレクトロニクス分野の基幹
材料として注目されている。また、有機材料は材料化手
法の多様性及び分子修飾が可能といった利点も有してい
るため、有機非線形光学材料に関する研究は精力的に行
われている。三次の非線形光学効果を示す材料は、光強
度による屈折率の変化を利用した素子への応用が可能で
あり、光メモリーや光論理素子等への展開が期待でき
る。(Prior Art) Conventionally, inorganic ferroelectric materials such as potassium dihydrogen phosphate (KDP) and lithium niobate (LiNbO 3 ) have been put to practical use as optical frequency multipliers as nonlinear optical materials. On the other hand, organic non-linear optical materials have characteristics such as larger non-linear optical constants, faster non-linear optical response, and higher breakdown threshold, and are attracting attention as conventional basic materials in the field of optoelectronics. In addition, since organic materials also have the advantage that they can be made into various materials and can be modified with molecules, research on organic nonlinear optical materials is being actively conducted. A material exhibiting a third-order nonlinear optical effect can be applied to an element utilizing the change in the refractive index depending on the light intensity, and can be expected to be applied to an optical memory or an optical logic element.
(発明が解決しようとする問題点) 大きな三次の非線形光学効果を示す有機材料としては、
π電子共役系を有するポリアセチレン、ポリジアセチレ
ンや金属フタロシアニンがよく知られている。しかしこ
れらの材料は融解しないだけでなく一般の有機溶剤に溶
解しないために、膜厚制御が困難であり機械的強度に優
れた薄膜を得ることが困難である。そのため光学素子へ
の展開に限度があるのが実状である。(Problems to be Solved by the Invention) As an organic material exhibiting a large third-order nonlinear optical effect,
Polyacetylene, polydiacetylene, and metal phthalocyanine having a π-electron conjugated system are well known. However, since these materials do not melt and also do not dissolve in a general organic solvent, it is difficult to control the film thickness and it is difficult to obtain a thin film having excellent mechanical strength. Therefore, the reality is that there is a limit to the expansion to optical elements.
(問題点を解決するための手段) 本発明者らは、前記問題点に鑑みて鋭意検討した結果、
主鎖にジイン基を持つ高分子が非線形光学効果を示しア
ルキル基またはアルキレン基を導入することにより有機
溶剤に可溶となることを明かにした。さらにこれら高分
子の非線形光学効果が熱処理、光照射、又は放射線照射
により向上することを見いだした。すなわち本発明の一
般概念は、主鎖にジイン基を有し、且つアルキル基又は
アルキレン基を含む高分子非線型光学材料であって、換
言すると 一般式 C≡C−R−C≡Cn 〔式中、Rはアルキレン基あるいは、アルキルフェニレ
ン基またはアルコキシフェニレン基の如くアルキレン基
或いはアルキル基を含有する基である〕で表される主鎖
にジイン基を持つ高分子からなる有機非線形光学材料に
関し、更には、これら高分子を熱処理、光照射又は放射
線照射して得られる有機非線形光学材料に関する。(Means for Solving Problems) As a result of intensive investigations by the present inventors in view of the above problems,
It was clarified that a polymer having a diyne group in the main chain shows a nonlinear optical effect and becomes soluble in an organic solvent by introducing an alkyl group or an alkylene group. Furthermore, they have found that the nonlinear optical effect of these polymers is improved by heat treatment, light irradiation, or radiation irradiation. That is, the general concept of the present invention is a polymer nonlinear optical material having a diyne group in the main chain and containing an alkyl group or an alkylene group, in other words, a general formula C≡C—R—C≡C n [. In the formula, R is an alkylene group or a group containing an alkylene group or an alkyl group such as an alkylphenylene group or an alkoxyphenylene group] and relates to an organic nonlinear optical material comprising a polymer having a diyne group in the main chain. Furthermore, it relates to an organic nonlinear optical material obtained by subjecting these polymers to heat treatment, light irradiation or radiation irradiation.
上式の定義において、Rの例としてはヘキシレン基、p
−ジブトキシフェニレン基が挙げられる。In the definition of the above formula, an example of R is a hexylene group, p
A dibutoxyphenylene group.
これら高分子の内、Rがアルキレン基であるものは塩化
メチレン、テトラヒドロフラン等の一般の有機溶剤に可
溶であり、またp−ジブトキシフェニレン基であるもの
は1,3−ジメチルイミダゾリジノンに可溶であった。こ
れら高分子溶液から、スピンコートまたはキャスト法に
よりポリマーフィルムが得られた。Of these polymers, those in which R is an alkylene group are soluble in common organic solvents such as methylene chloride and tetrahydrofuran, and those in which p-dibutoxyphenylene group is 1,3-dimethylimidazolidinone. It was soluble. Polymer films were obtained from these polymer solutions by spin coating or casting.
上記一般式で表される材料は、一般的には二つの末端ア
セチレン基を持つモノマーを酸素による酸化カップリン
グ重合して得られる。The material represented by the above general formula is generally obtained by oxidative coupling polymerization of a monomer having two terminal acetylene groups with oxygen.
(発明の効果) 従来から知られている三次の非線形光学効果を示す材料
では加工性に劣っており機械的強度に優れた薄膜が得ら
れていない。本発明の高分子は機械的強度に優れ三次の
非線形光学効果を示す薄膜を実現できる。また、薄膜形
成に際し簡便なキャスト法やスピンコート法が利用でき
るため膜厚の制御等が容易にでき、さらにこの高分子は
ジイン基の固相反応を用いたフォトレジストであるため
パターニングが可能であり、これを用いることにより光
集積回路等の実現が可能となる。(Effects of the Invention) Conventionally known materials exhibiting a third-order nonlinear optical effect are inferior in workability and a thin film excellent in mechanical strength has not been obtained. The polymer of the present invention is excellent in mechanical strength and can realize a thin film exhibiting a third-order nonlinear optical effect. In addition, since a simple casting method or spin coating method can be used for forming a thin film, it is possible to easily control the film thickness, etc. Furthermore, since this polymer is a photoresist using a solid phase reaction of a diyne group, patterning is possible. By using this, an optical integrated circuit or the like can be realized.
(実施例) 以下に本発明を実施例によりさらに具体的に説明する。(Example) Hereinafter, the present invention will be described more specifically by way of examples.
実施例1 塩化第一銅100mg、N,N,N′,N′−テトラメチルエチレン
ジアミン1mlをピリジン(20ml)、クロロベンゼン(80m
l)の混合溶媒に溶解し、酸素を15分間吹き込んで予備
酸化した溶液に、モノマーである1,9−デカジイン(5
g)を加え酸素を吹き込みながら60℃、5時間重合し
た。反応溶液を塩酸を含んだメタノール500mlに投入
し、析出した沈澱をロ過しメタノール、純水、アセトン
で洗浄後、減圧乾燥して白色のポリ(1,9−デカジイ
ン)を得た(4.2g、収率84%)。Example 1 100 mg of cuprous chloride, 1 ml of N, N, N ′, N′-tetramethylethylenediamine were mixed with pyridine (20 ml) and chlorobenzene (80 m
l) was dissolved in the mixed solvent and pre-oxidized by blowing oxygen for 15 minutes into the solution, and the monomer 1,9-decadiyne (5
g) was added and polymerization was carried out at 60 ° C. for 5 hours while blowing oxygen. The reaction solution was poured into 500 ml of methanol containing hydrochloric acid, and the deposited precipitate was filtered, washed with methanol, pure water and acetone, and dried under reduced pressure to obtain white poly (1,9-decadiyne) (4.2 g , Yield 84%).
この高分子(3g)を1,2−ジクロロエタン(300ml)に溶
解し、石英ガラス上にキャストして高分子薄膜を得た。
さらに、この薄膜を150℃で48時間熱処理した。第1図
にこの高分子薄膜の熱処理前後での紫外可視吸収スペク
トルを示す。This polymer (3 g) was dissolved in 1,2-dichloroethane (300 ml) and cast on quartz glass to obtain a polymer thin film.
Further, this thin film was heat-treated at 150 ° C. for 48 hours. FIG. 1 shows the UV-visible absorption spectra of this polymer thin film before and after heat treatment.
三次の非線形光学効果は、光第三次高調波発生(THG)
の測定によった。Nd:YAGレーザーの基本波長(1064nm)
の光を高圧水素セル中に通して得られるラマンシフト光
(1907nm)を用いてTHGメーカーフリンジ法を行った。
測定は空気の影響を取り除くため減圧下で行った。Third-order nonlinear optical effect, optical third-harmonic generation (THG)
According to the measurement. Basic wavelength of Nd: YAG laser (1064nm)
The THG maker fringe method was carried out using Raman shift light (1907 nm) obtained by passing the light in a high-pressure hydrogen cell.
The measurement was performed under reduced pressure to remove the influence of air.
石英基板及び熱処理ポリ(1,9−デカジイン)/石英基
板のTHGメーカーフリンジの測定結果を第2図、第3図
に示す。参照試料である石英基板のフリンジパターンよ
り入射光強度を算出し、その強度から三次の非線形感受
率(χ(3))を計算した。その結果、ポリ(1,9−デカジ
イン)に対して1.2×10-12(esu)の値を得た。The measurement results of the THG maker fringe of the quartz substrate and the heat-treated poly (1,9-decadiyne) / quartz substrate are shown in FIGS. 2 and 3. The incident light intensity was calculated from the fringe pattern of the quartz substrate, which is a reference sample, and the third-order nonlinear susceptibility (χ (3) ) was calculated from the intensity. As a result, a value of 1.2 × 10 −12 (esu) was obtained for poly (1,9-decadiyne).
石英基板上に作製した熱処理ポリ(1,9−デカジイン)
(厚さ1.7μm)について第4図に示される装置を用い
て光の導波を行った。この装置は、プリズム底面で全反
射してくる光を入射角度を変えて測定するものである。
光源にはHe−Neレーザー(633nm)を用いた。光入射
は、プリズム(材質:FD−11)をカップリング法によりT
Eモードで行い、フィルム中に入射されずにプリズムの
底面で全反射した光の強度について測定した。第5図
に、入射角度との反射光強度の関係を示した。反射光強
度は三つの角度、図中のa、b、cで極小値をとりこれ
らの入射角度で高分子フィルム中に入射され導波してい
ることがわかった。Heat treated poly (1,9-decadiyne) produced on a quartz substrate
For the (thickness: 1.7 μm), light was guided using the device shown in FIG. This device measures the light totally reflected on the bottom surface of the prism by changing the incident angle.
A He-Ne laser (633 nm) was used as a light source. Light is incident on the prism (material: FD-11) by the coupling method.
The measurement was performed in the E mode, and the intensity of the light totally reflected by the bottom surface of the prism without being incident on the film was measured. FIG. 5 shows the relationship between the incident angle and the reflected light intensity. It was found that the reflected light intensity has a minimum value at three angles, a, b, and c in the figure, and is incident and guided in the polymer film at these incident angles.
実施例2 塩化第1銅50mg、N,N,N′,N′−テトラメチルエチレン
ジアミン0.5mlをピリジン(10ml)、クロロベンゼン(4
0ml)の混合溶媒に溶解し、酸素を15分間吹き込んで予
備酸化した溶液に、モノマーである1,4−ジエチニル−
2,5−ジブトキシベンゼン(500mg)を加え酸素を吹き込
みながら60℃、5時間重合した。反応溶液を塩酸を含ん
だメタノール300mlに投入し、析出した沈澱をロ過しメ
タノール、純水、アセトンで洗浄後、減圧乾燥して暗黄
色のポリ(1,4−ジエチニル−2,5−ジブトキシベンゼ
ン)PDEDBBを得た(420mg、収率84%)。第6A図、第6B
図にこの高分子(第6A図はポリマー、第6B図はモノマ
ー)の13C−NMRスペクトルを示す。Example 2 Cupric chloride (50 mg), N, N, N ', N'-tetramethylethylenediamine (0.5 ml) was added to pyridine (10 ml) and chlorobenzene (4 ml).
(0 ml) in a mixed solvent, and oxygen was blown therein for 15 minutes to preoxidize the solution, and the monomer 1,4-diethynyl-
2,5-Dibutoxybenzene (500 mg) was added and polymerization was carried out at 60 ° C. for 5 hours while blowing oxygen. The reaction solution was poured into 300 ml of methanol containing hydrochloric acid, and the deposited precipitate was filtered, washed with methanol, pure water and acetone, and dried under reduced pressure to give dark yellow poly (1,4-diethynyl-2,5-di- Butoxybenzene) PDEDBB was obtained (420 mg, yield 84%). 6A, 6B
The 13 C-NMR spectrum of this polymer (polymer in FIG. 6A and monomer in FIG. 6B) is shown in the figure.
このPDEDBBを(100mg)を1,3−ジメチルイミダゾリジノ
ン(100ml)に加え120℃に加熱して溶解させた。この溶
液を石英基板上にキャストすることにより厚さ1.5μm
の高分子フィルムを得た。第7図にこのフィルムの紫外
可視吸収スペクトルを示す。This PDEDBB (100 mg) was added to 1,3-dimethylimidazolidinone (100 ml) and heated to 120 ° C to dissolve it. By casting this solution on a quartz substrate, the thickness is 1.5 μm.
A polymer film of FIG. 7 shows the UV-visible absorption spectrum of this film.
三次の非線形光学効果は、光第三次好調波発生(THG)
の測定によった。Nd:YAGレーザーの基本波長(1064nm)
の光を高圧水素セル中に通して得られるラマンシフト光
(1907nm)を用いてTHGメーカーフリンジ法を行った。
測定は空気の影響を取り除くため減圧下で行った。Third-order nonlinear optical effect is generated by optical third-order harmonic generation (THG)
According to the measurement. Basic wavelength of Nd: YAG laser (1064nm)
The THG maker fringe method was carried out using Raman shift light (1907 nm) obtained by passing the light in a high-pressure hydrogen cell.
The measurement was performed under reduced pressure to remove the influence of air.
PDEDBB/石英基板のTHGメーカーフリンジの測定結果を第
8図に示す。参照試料である石英基板のフリンジパター
ンより入射光強度を算出し、その強度から三次の非線形
感受率(χ(3))を計算した。その結果、PDEDBBに対し
て9×10-11(esu)の値を得た。Fig. 8 shows the measurement results of the THG maker fringe on the PDEDBB / quartz substrate. The incident light intensity was calculated from the fringe pattern of the quartz substrate, which is a reference sample, and the third-order nonlinear susceptibility (χ (3) ) was calculated from the intensity. As a result, a value of 9 × 10 -11 (esu) was obtained for PDEDBB.
第1図は、石英基板上に作製したポリ(1,9−デカジイ
ン)フィルムの紫外可視吸収スペクトルを表す図面であ
る(A:熱処理前、B:熱処理後)。 第2図、第3図はそれぞれ石英基板、ポリ(1,9−デカ
ジイン)/石英基板のTHGメーカーフリンジの測定結果
を表す図面である。 第4A図、第4B図は、ポリ(1,9−デカジイン)の導波特
性の測定に用いた装置の図面である。 第5図は、ポリ(1,9−デカジイン)の導波特性を表す
図面である。 第6A図、第6B図は、PDEDBBのポリマー(第6A図)、モノ
マー(第6B図)の13C−NMRスペクトルを表す図面であ
る。 第7図は、PDEDBBの紫外可視吸収スペクトルを表す図面
である。 第8図は、PDEDBB/石英基板のTHGメーカーフリンジの測
定結果を表す図面である。FIG. 1 is a drawing showing an ultraviolet-visible absorption spectrum of a poly (1,9-decadiyne) film produced on a quartz substrate (A: before heat treatment, B: after heat treatment). FIG. 2 and FIG. 3 are drawings showing the measurement results of the THG maker fringe of a quartz substrate and a poly (1,9-decadiyne) / quartz substrate, respectively. FIGS. 4A and 4B are drawings of an apparatus used for measuring the waveguiding property of poly (1,9-decadiyne). FIG. 5 is a drawing showing the waveguiding characteristics of poly (1,9-decadiyne). 6A and 6B are drawings showing 13 C-NMR spectra of PDEDBB polymer (FIG. 6A) and monomer (FIG. 6B). FIG. 7 is a drawing showing an ultraviolet-visible absorption spectrum of PDEDBB. FIG. 8 is a drawing showing the measurement results of the THG maker fringe of PDEDBB / quartz substrate.
───────────────────────────────────────────────────── フロントページの続き (72)発明者 雀部 博之 埼玉県和光市広沢2番1号 理化学研究所 内 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Hiroyuki Sparrow Part 2-1, Hirosawa, Wako-shi, Saitama RIKEN
Claims (2)
はアルコシキフェニレン基である〕 で表される主鎖にジイン基を持つ高分子からなる有機非
線形光学材料。1. A polymer having a diyne group in the main chain represented by the general formula C≡C—R—C≡C n [wherein R is an alkylene group, an alkylphenylene group, or an alkoxyphenylene group] Organic nonlinear optical material consisting of molecules.
を熱処理、光照射、又は放射線照射して得られる有機非
線形光学材料。2. An organic nonlinear optical material obtained by heat-treating, light-irradiating, or irradiating the polymer non-linear optical material according to claim 1.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1235193A JPH0670697B2 (en) | 1989-09-11 | 1989-09-11 | Organic nonlinear optical material |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1235193A JPH0670697B2 (en) | 1989-09-11 | 1989-09-11 | Organic nonlinear optical material |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0398026A JPH0398026A (en) | 1991-04-23 |
| JPH0670697B2 true JPH0670697B2 (en) | 1994-09-07 |
Family
ID=16982460
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1235193A Expired - Lifetime JPH0670697B2 (en) | 1989-09-11 | 1989-09-11 | Organic nonlinear optical material |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0670697B2 (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5475133A (en) * | 1994-11-28 | 1995-12-12 | The Regents Of The University Of California | Bis-propargyl thermosets |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5642229A (en) * | 1979-06-25 | 1981-04-20 | University Patents Inc | New photooresist composition |
| JPS6160638A (en) * | 1984-08-31 | 1986-03-28 | Nippon Telegr & Teleph Corp <Ntt> | Organic nonlinear optical material |
| JPS61148432A (en) * | 1984-12-21 | 1986-07-07 | Agency Of Ind Science & Technol | Optical treatment |
| JPS61210332A (en) * | 1985-03-15 | 1986-09-18 | Nippon Telegr & Teleph Corp <Ntt> | Material for nonlinear optical element and formation of pattern |
| JPS6252505A (en) * | 1985-09-02 | 1987-03-07 | Nippon Telegr & Teleph Corp <Ntt> | Formation of light guide using organic crystalline compound |
| JPS62255475A (en) * | 1986-04-25 | 1987-11-07 | Agency Of Ind Science & Technol | Novel diacetylene compound polymerizable in solid phase |
| JPH0240243B2 (en) * | 1986-08-07 | 1990-09-11 | Kogyo Gijutsu Incho | BUNSHIHAIKOSEIHAKUMAKU |
| JPS63175835A (en) * | 1987-01-16 | 1988-07-20 | Nippon Telegr & Teleph Corp <Ntt> | Organic nonlinear optical material, optical device using the same and production thereof |
| JPS63279230A (en) * | 1987-05-11 | 1988-11-16 | Keisuke Sasaki | light modulation element |
| JP2728091B2 (en) * | 1988-01-25 | 1998-03-18 | 富士通株式会社 | Fabrication method of organic nonlinear optical film |
-
1989
- 1989-09-11 JP JP1235193A patent/JPH0670697B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0398026A (en) | 1991-04-23 |
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