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JPH0240728B2 - - Google Patents
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JPH0240728B2 - - Google Patents

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Publication number
JPH0240728B2
JPH0240728B2 JP61004827A JP482786A JPH0240728B2 JP H0240728 B2 JPH0240728 B2 JP H0240728B2 JP 61004827 A JP61004827 A JP 61004827A JP 482786 A JP482786 A JP 482786A JP H0240728 B2 JPH0240728 B2 JP H0240728B2
Authority
JP
Japan
Prior art keywords
amorphous silicon
aluminum alloy
photosensitive drums
extruded aluminum
less
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP61004827A
Other languages
Japanese (ja)
Other versions
JPS62164845A (en
Inventor
Kenichiro Oochi
Kazuhiko Asano
Yoshihiro Tsuji
Sunao Aiura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kobe Steel Ltd
Original Assignee
Kobe Steel Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kobe Steel Ltd filed Critical Kobe Steel Ltd
Priority to JP482786A priority Critical patent/JPS62164845A/en
Publication of JPS62164845A publication Critical patent/JPS62164845A/en
Publication of JPH0240728B2 publication Critical patent/JPH0240728B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03GELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G5/00Recording-members for original recording by exposure, e.g. to light, to heat or to electrons; Manufacture thereof; Selection of materials therefor
    • G03G5/02Charge-receiving layers
    • G03G5/04Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor
    • G03G5/08Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor characterised by the photoconductive material being inorganic
    • G03G5/082Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor characterised by the photoconductive material being inorganic and not being incorporated in a bonding material, e.g. vacuum deposited
    • G03G5/08214Silicon-based

Landscapes

  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photoreceptors In Electrophotography (AREA)

Description

【発明の詳細な説明】[Detailed description of the invention]

[産業上の利用分野] 本発明はアモルフアスシリコン蒸着性に優れた
感光ドラム用押出アルミニウム合金に関し、さら
に詳しくは、精密切削時の表面仕上り性およびア
モルフアスシリコンの蒸着性を改善した感光ドラ
ム用押出アルミニウム合金に関する。 [従来技術] 一般に、アモルフアスシリコンの蒸着基盤とな
るアルミニウム合金パイプの表面仕上げは、特殊
な精密旋盤により行なわれより高い表面粗さ精度
が要求されている。 アモルフアスシリコンの蒸着基盤材料として
は、切削時ある程度の強度を必要とするためアモ
ルフアスシリコン蒸着性を兼ね備えたAl−Mg系
合金か主に使用されている。。 しかし、Al−Mg系合金においては、不純物と
して含有されるFeがAl−Fe系の硬質晶出物を形
成し、そのため、必要な粗さの表面精度が得られ
難く、そして、切削により削り取られたAl−Fe
系晶質物により切削面にスクラツチ状の疵が発生
するという問題がある。 従つて、従来においては、例えば、99.99wt%
という高純度のアルミニウム地金を使用して、
Fe含有量を極力低く抑えているが、高純度のア
ルミニウム地金はその製造が困難であることか
ら、素材コストが極めて高いという問題がある。 [発明が解決しようとする問題点] 本発明は上記に説明したように従来使用されて
いたアモルフアスシリコン蒸着基盤における感光
ドラム用アルミニウム合金の種々の問題点を解消
するためになされたものであり、本発明者が研究
および検討した結果、切削性に優れ、表面仕上り
性が優れ、さらに、アモルフアスシリコン蒸着性
にも優れた感光ドラム用押出アルミニウム合金を
開発したのである。 [問題点を解決するための手段] 本発明に係るアモルフアスシリコン蒸着性に優
れた感光ドラム用押出アルミニウム合金は、 (1) Mg0.8〜5.5wt%、 Mn0.3wt%を越え〜0.8wt%未満 を含有し、かつ、不純物として、 Cr≦0.20wt%、Fe≦0.35wt% Si≦0.20wt% に規制し、残部実質的にAlからなることを特
徴とするアモルフアスシリコン蒸着性に優れた
感光ドラム用押出アルミニウム合金を第1の発
明とし、 (2) Mg0.8〜5.5wt%、 Mn0.3wt%を越え〜0.8wt%未満 を含有し、そして、 Ti、Zrの1種または2種を総量で≦0.4wt% を含有し、かつ、不純物として、 Cr≦0.20wt%、Fe≦0.35wt%、 Si≦0.20wt% に規制し、残部実質的にAlからなることを特
徴とするアモルフアスシリコン蒸着性に優れた
感光ドラム用押出アルミニウム合金を第2の発
明とし、 (3) Mg0.8〜5.5wt%、 Mn0.3wt%を越え〜0.8wt%未満 を含有し、さらに、 Zn≦1.5wt% を含有し、かつ、不純物として、 Cr≦0.20wt%、Fe≦0.35wt%、 Si≦0.20wt% に規制し、残部実質的にAlからなることを特
徴とするアモルフアスシリコン蒸着性に優れた
感光ドラム用押出アルミニウム合金を第3の発
明とし、 (4) Mg0.8〜5.5wt%、 Mn0.3wt%を越え〜0.8wt%未満 を含有し、そして、 Ti、Zrの1種または2種を総量で≦0.4wt% を含有し、さらに、 Zn≦1.5wt% を含有し、かつ、不純物として、 Cr≦0.20wt%、Fe≦0.35wt%、 Si≦0.20wt% に規制し、残部実質的にAlからなることを特
徴とするアモルフアスシリコン蒸着性に優れた
感光ドラム用押出アルミニウム合金を第4の発
明とする4つの発明よりなるものである。 本発明に係るアモルフアスシリコン蒸着性に優
れた感光ドラム用押出アルミニウム合金は、特に
高純度のアルミニウム地金を使用することなく、
切削表面粗さを劣化させる硬質のAl−Fe系晶出
物を、Mn含有により軟かいAl−Fe−Mn系晶出
物を形成することにより、切削時必要な表面粗度
が得られるものであり、比較的低純度のアルミニ
ウム合金の使用で必要な表面粗度とアモルフアス
シリコン蒸着性が得られるものである。 先ず、本発明に係るアモルフアスシリコン蒸着
性に優れた感光ドラム用押出アルミニウム合金の
含有成分および成分割合について説明する。 Mgは強度向上のための必須の元素で、切削加
工時の撓み等による寸法等の不良防止に必要な強
度を付与するものであり、含有量が0.8wt%未満
ではこのような効果は少なく、また、5.5wt%を
越えて含有させると押出性および耐蝕性を害する
ようになる。よつて、Mg含有量は0.8〜5.5wt%
とする。 Mnは0.3wt%以上含有させることによりAl−
Fe−Mn系晶出物を形成して、表面欠陥となるAl
−Fe系晶出物を消滅させるか或いは減少するこ
とができ、また、0.8wt%を越えて含有させると
押出性および切削性を害し、工具寿命を短かくす
る。よつて、Mn含有量は0.3wt%を越え〜0.8wt
%未満とする。 Cr、Fe、Siは不純物であり、Fe含有量が
0.35wt%を越えて含有させると上記に説明した
Mnの効果がなくなり、Al−Fe系晶出物を形成し
て表面粗度を悪くし、Siは0.20wt%を越えて含有
させるとMg2Si系の晶出物を形成して表面粗度を
悪くし、Crも0.20wt%を越えて含有させるとAl
との間に晶出物を形成して表表粗度を悪くする。
よつて、Cr含有量は0.20wt%以下、Fe含有量は
0.35wt%以下、Si含有量は0.20wt%以下に規制す
る。 Ti、Zrは結晶粒微細化元素であり、Ti、Zrの
1種または2種の含有の総量がが0.4wt%を越え
て含有させると、AlとTi、Zrとの夫々で晶出物
を形成して表面粗度を悪化させる。よつて、Ti、
Zrの含有量は総量で0.4wt%以下とする。 Znは切削時に表面仕上り性を改善する効果が
著しく、かつ、工具のチツピングを起り難くする
元素であり、含有量が1.5wt%を越えて含有させ
ると耐蝕性を劣化させる。また、このような効果
を付与するためには含有量は少なくとも0.05wt%
以上は必要である。よつて、Zn含有量は1.5wt%
以下とする。 [実施例] 次に、本発明に係るアモルフアスシリコン蒸着
性に優れた感光ドラム用押出アルミニウム合金の
実施例を説明する。 実施例 第1表に示す含有成分および成分割合のアルミ
ニウム合金を常法に従つて溶解し、200mmφの鋳
塊に鋳造し、この鋳塊を555℃の温度で4時間の
均熱処理を行なつた後、押出および抽伸加工を行
ない、123mmφ、肉厚4.8mmの管を製作して供試材
とした。 切削条件 (1) 粗切削(NC旋盤) 工具:焼結ダイヤモンド工具(市販品) 切削速度:600m/min 切込み:0.25mm 送り:0.1mm/rev (2) 仕上切削(超精密旋盤) 工具:天然ダイヤモンド工具(字販品) 切削速度:600m/min 切込み:0.015mm 送り:0.03mm/rev 切削した全長300mmの製品の中央部で表面粗さ
計により、最大粗さ(Rmax)を調査した結果お
よびアモルフアスシリコン蒸着後のテープテスト
により蒸着性を判定した結果の夫々を第1表に示
す。 この第1表から、本発明に係るアモルフアスシ
リコン蒸着性に優れた感光ドラム用押出アルミニ
ウム合金は、切削仕上り精度(最大粗さ、
Rmax)0.05μm以下が容易に得られ、さらに、
切削後のアモルフアスシリコン蒸着性についても
テープテストの結果剥離せず、優れた蒸着性が得
られることがわかる。
[Industrial Application Field] The present invention relates to an extruded aluminum alloy for photosensitive drums that has excellent amorphous silicon deposition properties, and more specifically, an extruded aluminum alloy for photosensitive drums that has improved surface finish during precision cutting and amorphous silicon deposition properties. Concerning extruded aluminum alloys. [Prior Art] Generally, the surface finishing of an aluminum alloy pipe, which serves as a base for vapor deposition of amorphous silicon, is performed using a special precision lathe, and higher surface roughness accuracy is required. As a deposition base material for amorphous silicon, an Al-Mg alloy that has amorphous silicon deposition properties is mainly used because it requires a certain degree of strength during cutting. . However, in Al-Mg alloys, Fe contained as an impurity forms Al-Fe-based hard crystallized substances, making it difficult to obtain the required roughness of the surface and making it hard to remove by cutting. Al−Fe
There is a problem in that scratch-like flaws occur on the cut surface due to the system crystalline substances. Therefore, conventionally, for example, 99.99wt%
Using high-purity aluminum metal called
Although the Fe content is kept as low as possible, there is a problem in that the material cost is extremely high because high-purity aluminum metal is difficult to manufacture. [Problems to be Solved by the Invention] As explained above, the present invention has been made in order to solve various problems of the conventionally used aluminum alloy for photosensitive drums on amorphous silicon vapor deposited substrates. As a result of research and consideration by the present inventors, the present inventors have developed an extruded aluminum alloy for photosensitive drums that has excellent machinability, excellent surface finishing properties, and also excellent amorphous silicon deposition properties. [Means for Solving the Problems] The extruded aluminum alloy for photosensitive drums having excellent amorphous silicon deposition properties according to the present invention has the following features: (1) Mg of 0.8 to 5.5 wt%, Mn of more than 0.3 wt% to 0.8 wt%; %, and the impurities are regulated to Cr≦0.20wt%, Fe≦0.35wt%, Si≦0.20wt%, and the remainder consists essentially of Al.It has excellent amorphous silicon vapor deposition properties. The first invention is an extruded aluminum alloy for photosensitive drums, (2) containing 0.8 to 5.5 wt% of Mg, more than 0.3 wt% to less than 0.8 wt% of Mn, and one or two of Ti and Zr. It is characterized by containing seeds in a total amount of ≦0.4wt%, impurities that are regulated to Cr≦0.20wt%, Fe≦0.35wt%, and Si≦0.20wt%, with the remainder essentially consisting of Al. The second invention is an extruded aluminum alloy for photosensitive drums that has excellent amorphous silicon vapor deposition properties, (3) contains 0.8 to 5.5 wt% of Mg, more than 0.3 wt% to less than 0.8 wt% of Mn, and further contains Zn. Amorphous silicon vapor deposition characterized by containing ≦1.5wt% and regulating impurities as Cr≦0.20wt%, Fe≦0.35wt%, and Si≦0.20wt%, with the remainder essentially consisting of Al. The third invention provides an extruded aluminum alloy for photosensitive drums with excellent properties, (4) containing 0.8 to 5.5 wt% of Mg, more than 0.3 wt% to less than 0.8 wt% of Mn, and 1 of Ti and Zr. Contains a total of ≦0.4wt% of one or two types, further contains Zn≦1.5wt%, and impurities are regulated to Cr≦0.20wt%, Fe≦0.35wt%, and Si≦0.20wt%. However, the fourth invention is an extruded aluminum alloy for photosensitive drums which has excellent amorphous silicon deposition properties and is characterized in that the remainder substantially consists of Al. The extruded aluminum alloy for photosensitive drums that has excellent amorphous silicon deposition properties according to the present invention does not require the use of particularly high-purity aluminum base metal.
The required surface roughness during cutting can be obtained by forming soft Al-Fe-Mn-based crystallized substances by containing Mn, instead of the hard Al-Fe-based crystallized substances that deteriorate the cutting surface roughness. The required surface roughness and amorphous silicon deposition properties can be obtained by using a relatively low-purity aluminum alloy. First, the components and component ratios of the extruded aluminum alloy for photosensitive drums having excellent amorphous silicon deposition properties according to the present invention will be explained. Mg is an essential element for improving strength, and it provides the strength necessary to prevent dimensional defects due to bending during cutting, etc. If the content is less than 0.8wt%, this effect is small; Furthermore, if the content exceeds 5.5 wt%, extrudability and corrosion resistance will be impaired. Therefore, the Mg content is 0.8-5.5wt%
shall be. By containing 0.3wt% or more of Mn, Al−
Al forms Fe-Mn crystallized substances and becomes surface defects.
-Fe-based crystallized substances can be eliminated or reduced, and if the content exceeds 0.8 wt%, extrudability and machinability will be impaired and tool life will be shortened. Therefore, the Mn content exceeds 0.3wt% ~ 0.8wt
Less than %. Cr, Fe, and Si are impurities, and Fe content is
It was explained above that the content exceeds 0.35wt%.
The effect of Mn disappears and Al-Fe crystallized substances are formed, which worsens the surface roughness, and when Si is added in excess of 0.20wt%, Mg 2 Si-based crystallized substances are formed, which deteriorates the surface roughness. If Cr is included in excess of 0.20wt%, Al
Crystallized substances are formed between the two and deteriorate the surface roughness.
Therefore, the Cr content is 0.20wt% or less, and the Fe content is
The Si content is regulated to 0.35wt% or less, and the Si content to 0.20wt% or less. Ti and Zr are grain refining elements, and if the total amount of one or both of Ti and Zr exceeds 0.4wt%, Al, Ti, and Zr will form crystallized substances, respectively. formation and worsen surface roughness. By the way, Ti,
The total Zr content shall be 0.4wt% or less. Zn is an element that has a remarkable effect of improving surface finish during cutting and makes it difficult for tools to chip.If the content exceeds 1.5 wt%, corrosion resistance deteriorates. In addition, in order to impart such an effect, the content must be at least 0.05wt%.
The above is necessary. Therefore, the Zn content is 1.5wt%
The following shall apply. [Example] Next, an example of an extruded aluminum alloy for photosensitive drums having excellent amorphous silicon deposition properties according to the present invention will be described. Example An aluminum alloy having the components and proportions shown in Table 1 was melted according to a conventional method, cast into a 200 mm diameter ingot, and the ingot was soaked at a temperature of 555°C for 4 hours. Afterwards, extrusion and drawing were performed to produce a tube with a diameter of 123 mm and a wall thickness of 4.8 mm, which was used as a test material. Cutting conditions (1) Rough cutting (NC lathe) Tool: Sintered diamond tool (commercially available) Cutting speed: 600 m/min Depth of cut: 0.25 mm Feed: 0.1 mm/rev (2) Finish cutting (ultra precision lathe) Tool: Natural Diamond tool (for sale) Cutting speed: 600m/min Depth of cut: 0.015mm Feed: 0.03mm/rev The results of investigating the maximum roughness (Rmax) using a surface roughness meter at the center of the cut product with a total length of 300mm. Table 1 shows the results of determining the vapor deposition properties by a tape test after the amorphous silicon vapor deposition. From Table 1, it can be seen that the extruded aluminum alloy for photosensitive drums according to the present invention, which has excellent amorphous silicon vapor deposition properties, has a high cutting finish accuracy (maximum roughness,
Rmax) 0.05μm or less can be easily obtained, and furthermore,
As for the amorphous silicon vapor deposition properties after cutting, the results of the tape test showed that no peeling occurred, and that excellent vapor deposition properties were obtained.

【表】 [発明の効果] 以上説明したように、本発明に係るアモルフア
スシリコン蒸着性に優れた感光ドラム用押出アル
ミニウム合金は上記の構成であるから、高純度ア
ルミニウムを使用することなく優れた表面仕上り
性を有し、さらに、アモルフアスシリコンの蒸着
性が極めて優れている効果を有するものである。
[Table] [Effects of the Invention] As explained above, since the extruded aluminum alloy for photosensitive drums according to the present invention, which has excellent amorphous silicon vapor deposition properties, has the above structure, it has excellent properties without using high-purity aluminum. It has the effect of having excellent surface finishing properties and extremely excellent vapor deposition properties of amorphous silicon.

Claims (1)

【特許請求の範囲】 1 Mg0.8〜5.5wt%、 Mn0.3wt%を越え〜0.8wt%未満 を含有し、かつ、不純物として、 Cr≦0.20wt%、Fe≦0.35wt%、 Si≦0.20wt% に規制し、残部実質的にAlからなることを特徴
とするアモルフアスシリコン蒸着性に優れた感光
ドラム用押出アルミニウム合金。 2 Mg0.8〜5.5wt%、 Mn0.3wt%を越え〜0.8wt%未満 を含有し、そして、 Ti、Zrの1種または2種を総量で≦0.4wt% を含有し、かつ、不純物として、 Cr≦0.20wt%、Fe≦0.35wt%、 Si≦0.20wt% に規制し、残部実質的にAlからなることを特徴
とするアモルフアスシリコン蒸着性に優れた感光
ドラム用押出アルミニウム合金。 3 Mg0.8〜5.5wt%、 Mn0.3wt%を越え〜0.8wt%未満 を含有し、さらに、 Zn≦1.5wt% を含有し、かつ、不純物として、 Cr≦0.20wt%、Fe≦0.35wt%、 Si≦0.20wt% に規制し、残部実質的にAlからなることを特徴
とするアモルフアスシリコン蒸着性に優れた感光
ドラム用押出アルミニウム合金。 4 Mg0.8〜5.5wt%、 Mn0.3wt%を越え〜0.8wt%未満 を含有し、そして、 Ti、Zrの1種または2種を総量で≦0.4wt% を含有し、さらに、 Zn≦1.5wt% を含有し、かつ、不純物として、 Cr≦0.20wt%、Fe≦0.35wt%、 Si≦0.20wt% に規制し、残部実質的にAlからなることを特徴
とするアモルフアスシリコン蒸着性に優れた感光
ドラム用押出アルミニウム合金。
[Claims] 1 Contains 0.8 to 5.5 wt% Mg, more than 0.3 wt% to less than 0.8 wt% Mn, and contains as impurities Cr≦0.20wt%, Fe≦0.35wt%, Si≦0.20 An extruded aluminum alloy for photosensitive drums, which has excellent amorphous silicon vapor deposition properties, and is characterized in that the balance is essentially Al. 2 Contains 0.8 to 5.5 wt% of Mg, more than 0.3 wt% to less than 0.8 wt% of Mn, and contains one or both of Ti and Zr in a total amount of ≦0.4 wt%, and as an impurity. , Cr≦0.20wt%, Fe≦0.35wt%, and Si≦0.20wt%, with the remainder essentially consisting of Al, and the extruded aluminum alloy for photosensitive drums has excellent amorphous silicon deposition properties. 3 Contains Mg0.8 to 5.5wt%, Mn more than 0.3wt% to less than 0.8wt%, and further contains Zn≦1.5wt%, and as impurities, Cr≦0.20wt%, Fe≦0.35wt %, Si≦0.20wt%, and the remainder substantially consists of Al. An extruded aluminum alloy for photosensitive drums having excellent amorphous silicon deposition properties. 4 Contains Mg0.8 to 5.5wt%, Mn more than 0.3wt% to less than 0.8wt%, and contains one or both of Ti and Zr in a total amount of ≦0.4wt%, and furthermore, Zn≦ Amorphous silicon vapor depositable material containing 1.5wt% and regulated as impurities to Cr≦0.20wt%, Fe≦0.35wt%, Si≦0.20wt%, and the remainder substantially consists of Al. Extruded aluminum alloy for photosensitive drums with excellent properties.
JP482786A 1986-01-13 1986-01-13 Extruded aluminum alloy for photosensitive drum excellent in property of vapor-depositing amorphous silicon Granted JPS62164845A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP482786A JPS62164845A (en) 1986-01-13 1986-01-13 Extruded aluminum alloy for photosensitive drum excellent in property of vapor-depositing amorphous silicon

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP482786A JPS62164845A (en) 1986-01-13 1986-01-13 Extruded aluminum alloy for photosensitive drum excellent in property of vapor-depositing amorphous silicon

Publications (2)

Publication Number Publication Date
JPS62164845A JPS62164845A (en) 1987-07-21
JPH0240728B2 true JPH0240728B2 (en) 1990-09-13

Family

ID=11594531

Family Applications (1)

Application Number Title Priority Date Filing Date
JP482786A Granted JPS62164845A (en) 1986-01-13 1986-01-13 Extruded aluminum alloy for photosensitive drum excellent in property of vapor-depositing amorphous silicon

Country Status (1)

Country Link
JP (1) JPS62164845A (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01285953A (en) * 1988-05-13 1989-11-16 Nippon Light Metal Co Ltd Aluminum base body for organic photosensitive body

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60221545A (en) * 1984-03-19 1985-11-06 Kobe Steel Ltd Extruded aluminum alloy for photosensitive drum superior in cut surface finishing property
JPS60197854A (en) * 1984-03-21 1985-10-07 Sukai Alum Kk Rolled aluminum alloy plate for photosensitive drum
JPS60262936A (en) * 1984-06-11 1985-12-26 Kobe Steel Ltd Extrusion aluminum alloy superior in vapor deposition characteristic of amorphous silicon
JPS61177347A (en) * 1985-01-30 1986-08-09 Showa Alum Corp Aluminum alloy material for photosensitive drum of electrophotographic copying machine

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JPS62164845A (en) 1987-07-21

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