JPH0690792B2 - Method for manufacturing Al substratum for magnetic disk - Google Patents
Method for manufacturing Al substratum for magnetic diskInfo
- Publication number
- JPH0690792B2 JPH0690792B2 JP62092816A JP9281687A JPH0690792B2 JP H0690792 B2 JPH0690792 B2 JP H0690792B2 JP 62092816 A JP62092816 A JP 62092816A JP 9281687 A JP9281687 A JP 9281687A JP H0690792 B2 JPH0690792 B2 JP H0690792B2
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- annealing
- strength
- manufacturing
- magnetic disk
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 12
- 238000000034 method Methods 0.000 title description 8
- 239000000758 substrate Substances 0.000 claims description 31
- 238000000137 annealing Methods 0.000 claims description 22
- 239000000126 substance Substances 0.000 claims description 15
- 238000001953 recrystallisation Methods 0.000 claims description 14
- 238000005482 strain hardening Methods 0.000 claims description 12
- 239000000463 material Substances 0.000 claims description 10
- 229910000838 Al alloy Inorganic materials 0.000 claims description 9
- 238000005097 cold rolling Methods 0.000 claims description 9
- 238000012545 processing Methods 0.000 claims description 8
- 239000012535 impurity Substances 0.000 claims description 7
- 239000000203 mixture Substances 0.000 claims description 6
- 238000005098 hot rolling Methods 0.000 claims description 5
- 238000002791 soaking Methods 0.000 claims description 3
- 238000005266 casting Methods 0.000 claims description 2
- 238000012937 correction Methods 0.000 claims description 2
- 238000004080 punching Methods 0.000 claims description 2
- 238000002844 melting Methods 0.000 claims 1
- 230000008018 melting Effects 0.000 claims 1
- 229910052742 iron Inorganic materials 0.000 description 6
- 230000001105 regulatory effect Effects 0.000 description 6
- 229910045601 alloy Inorganic materials 0.000 description 4
- 239000000956 alloy Substances 0.000 description 4
- 229910000765 intermetallic Inorganic materials 0.000 description 4
- 230000007547 defect Effects 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 229910052748 manganese Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 238000011160 research Methods 0.000 description 2
- 229910052725 zinc Inorganic materials 0.000 description 2
- 229910018084 Al-Fe Inorganic materials 0.000 description 1
- 229910018134 Al-Mg Inorganic materials 0.000 description 1
- 229910018192 Al—Fe Inorganic materials 0.000 description 1
- 229910018467 Al—Mg Inorganic materials 0.000 description 1
- 229910019064 Mg-Si Inorganic materials 0.000 description 1
- 229910019406 Mg—Si Inorganic materials 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- 238000005275 alloying Methods 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 230000001276 controlling effect Effects 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
Landscapes
- Magnetic Record Carriers (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
Description
【発明の詳細な説明】 （産業上の利用分野） 本発明は、コンピュータの外部メモリとして利用されて
いる磁気ディスク用で、高加工性、高強度のAlサブスト
レートの製造方法に関するものである。Description: TECHNICAL FIELD The present invention relates to a method for manufacturing an Al substrate for a magnetic disk used as an external memory of a computer, which has high workability and high strength.
（従来の技術） コンピュータに用いられる記録装置の１つに磁気ディス
クがあるが、この磁気ディスクは、Al合金からなる基板
の表面に磁性層を薄く被覆した構成を有し、この被覆さ
れた磁性層を微小に磁化することによって信号を記録す
るものである。2. Description of the Related Art A magnetic disk is one of recording devices used in a computer, and the magnetic disk has a structure in which a magnetic layer is thinly coated on a surface of a substrate made of an Al alloy. A signal is recorded by minutely magnetizing the layer.
一般に、磁性層を被覆する前のAl合金基板としては、粗
さや全体歪等の表面形状がよいこと、軽良性、耐食性に
優れ、適度の耐熱性、機械的強度を有すること等が要求
される。Generally, the Al alloy substrate before coating the magnetic layer is required to have a good surface shape such as roughness and overall strain, lightness, excellent corrosion resistance, moderate heat resistance, and mechanical strength. .
従来、このような特性を満たす磁気ディスク用Al合金基
板としては、第１表に示す化学成分のAA規格5086Al合金
が多用されていた。Conventionally, AA standard 5086 Al alloys having chemical components shown in Table 1 have been frequently used as Al alloy substrates for magnetic disks satisfying such characteristics.
しかし乍ら、近年の磁気ディスクの大容量化、高密度化
の趨勢は、１ビット当りの磁化領域の更なる微小化、磁
性層の薄膜化、磁気ヘッド浮上量の減少等が要請される
ようになってきた。 However, in recent years, the trend toward higher capacity and higher density of magnetic disks requires that the magnetized area per bit is further miniaturized, the magnetic layer is made thinner, and the flying height of the magnetic head is reduced. Has become.
このような要請に応えるためには、基板に関しては、基
板表面の欠陥を減少させることが不可欠である。ところ
で、基板表面の欠陥の原因の一つは、鋳造時に混入する
非金属介在物と合金化による晶出物（金属間化合物）が
考えられる。非金属介在物の量は移湯時のフィルターの
性能向上により減少可能であるが、晶出物のサイズ、数
等は、適宜添加する元素量や使用Al地金の純度等に依存
するため、最近では99.9％以上の高純度地金を使用した
Al合金が盛んに研究されている。（例えば、特公昭56-3
9699号公報参照）。In order to meet such a demand, it is indispensable to reduce defects on the surface of the substrate. By the way, one of the causes of defects on the substrate surface is considered to be non-metallic inclusions mixed during casting and crystallized substances (intermetallic compounds) due to alloying. The amount of non-metallic inclusions can be reduced by improving the performance of the filter at the time of transfer, but the size and number of crystallized substances depend on the amount of elements to be added and the purity of the Al metal used, etc. Recently used high purity metal of 99.9% or more
Al alloys are being actively studied. (For example, Japanese Patent Publication Sho 56-3
9699 gazette).
（発明が解決しようとする問題点） 純度99.9％〜99.99％の高純度のAl地金を使用して製造
された高記録密度用磁気ディスク用Alサブストレート
は、前記公報に示されているように、晶出物のサイズや
数においては充分効果が発揮されている。(Problems to be Solved by the Invention) An Al substrate for a magnetic disk for high recording density manufactured by using a high-purity Al ingot having a purity of 99.9% to 99.99% is disclosed in the above publication. Moreover, the effect is sufficiently exerted in the size and the number of crystallized substances.
しかし乍ら、高純度Al地金を使用した場合、 機械的強度の低下を招くため、サブストレート加工中
やメディア製造工程において、全体歪が劣化する。However, when a high-purity Al ingot is used, the mechanical strength is lowered, and the overall strain is deteriorated during the substrate processing and the media manufacturing process.
砥石による研削性が悪化し、研磨スピードが低下する
ため、生産性が劣る。The grindability deteriorates with the grindstone and the polishing speed decreases, resulting in poor productivity.
粗大結晶粒が生成されることがある。Coarse grains may be formed.
等の問題点がある。There are problems such as.
本発明の目的は、上記の如く、高純度Al地金を用いて磁
気ディスク用Alサブストレートを製造する際に発生する
上記問題点を解決し、高強度で高加工性の磁気ディスク
用Alサブストレートを製造できる方法を提供することに
ある。As described above, an object of the present invention is to solve the above problems that occur when manufacturing an Al substrate for a magnetic disk using a high-purity Al ingot, and to provide an Al substrate for a magnetic disk with high strength and high workability. It is to provide a method capable of manufacturing a straight.
（問題点を解決するための手段） 上記目的を達成するため、本発明者は、まず、Al地金の
成分並びに純度について鋭意研究したところ、適量のMg
とMnを必須成分とし、不純物としてのFeとSiの量を規制
するが、特にMnとFeの比（Mn-Fe）をコントロールする
ことにより、従来よりもMn量を増加させても晶出物の粗
大化を招くことがなく、表面性状を優れたものとし、し
かも加工硬化の促進による再結晶温度の上昇、したがっ
て、再結晶温度以下での焼鈍でも強度の低下を防止でき
ることが判明した。そこで、この知見に基づいて更に製
造条件を詳細に検討した結果、ここに本発明をなしたも
のである。(Means for Solving the Problems) In order to achieve the above object, the present inventor first conducted diligent research on the composition and purity of Al ingot, and found that an appropriate amount of Mg
And Mn are essential components, and the amount of Fe and Si as impurities is regulated. Especially, by controlling the ratio of Mn and Fe (Mn-Fe), even if the amount of Mn is increased more than before, crystallization It has been found that the surface quality is made excellent without causing coarsening of the steel, and that the recrystallization temperature is increased due to the acceleration of work hardening, and therefore the strength can be prevented from lowering even by annealing below the recrystallization temperature. Therefore, as a result of further detailed examination of the manufacturing conditions based on this finding, the present invention has been made here.
すなわち、本発明は、Mg:3〜６％及びMn:0.05〜１％を
必須成分として含有すると共に、不純物として、Feを0.
07％以下、Siを0.07以下に規制し、かつ、上記Mn量とFe
量との比（Mn/Fe）を３以上とする化学成分を有するAl
合金を溶製、鋳造し、均熱処理、熱間圧延を実施した
後、最終冷間加工率10〜40％の冷間圧延を実施してデイ
スク素材を得、次いで行うブランク打抜き後の歪橋正焼
鈍又はサブストレート加工での歪取焼鈍をそれぞれ該デ
ィスク素材の再結晶温度以下の温度で行うことを特徴と
する磁気ディスク用で耐力値17kg/mm2以上の強度を有す
るAlサブストレートの製造方法を要旨としている。That is, the present invention contains Mg: 3 to 6% and Mn: 0.05 to 1% as essential components, and Fe as an impurity of 0.
07% or less, Si is controlled to 0.07 or less, and the above Mn content and Fe
Al with a chemical composition that makes the ratio (Mn / Fe) to 3 or more
The alloy is melted, cast, soaked and hot-rolled, then cold-rolled at a final cold working rate of 10-40% to obtain a disk material, and then strain-bridged after blank punching. A method for producing an Al substrate for a magnetic disk having a strength of a proof stress value of 17 kg / mm 2 or more, characterized by performing stress relief annealing in annealing or substrate processing at a temperature not higher than the recrystallization temperature of the disk material. Is the gist.
以下に本発明を実施例に基づいて詳細に説明する。The present invention will be described in detail below based on examples.
まず本発明法におけるAl合金の化学成分の限定理由を説
明する。First, the reasons for limiting the chemical composition of the Al alloy in the method of the present invention will be explained.
MgはAlサブストレートの強度向上に最も有効な元素であ
るが、３％未満では充分な強度が得られず、６％を超え
ると、再結晶温度以下での焼鈍においてもAl−Mgの析出
物が成長する恐れがあり、また、熱間圧延時に割れを発
生するため、好ましくない。したがって、Mgの含有量は
３〜６％とする。Mg is the most effective element for improving the strength of Al substrate, but if it is less than 3%, sufficient strength cannot be obtained, and if it exceeds 6%, Al-Mg precipitates are formed even during annealing below the recrystallization temperature. Is likely to grow, and cracks are generated during hot rolling, which is not preferable. Therefore, the content of Mg is set to 3 to 6%.
Mnは次の目的で適量を添加する。すなわち、 加工硬化を促進させ、再結晶温度を上昇させる。An appropriate amount of Mn is added for the following purposes. That is, it accelerates work hardening and raises the recrystallization temperature.
焼鈍軟化曲線を緩やかにし、再結晶温度以下の温度で
の焼鈍による強度低下を抑制する。The annealing softening curve is made gentle to suppress the strength reduction due to annealing at a temperature equal to or lower than the recrystallization temperature.
結晶粒の粗大化を防止する。Prevents coarsening of crystal grains.
このように、Mnの添加は高純度Al地金を用いて製造した
Alサブストレートの特性改善に極めて有効であるにも拘
らず、従来の考え方では、Mnは晶出物を粗大化させる元
素として認識され、高純材に添加されることは少なかっ
た。Thus, the addition of Mn was produced using high-purity Al ingot.
Despite being extremely effective in improving the properties of Al substrates, Mn was recognized as an element that coarsens crystallized substances in the conventional way of thinking, and was rarely added to high-purity materials.
しかし、本発明においては、鋭意研究した結果、不純物
であるFe量（後述）を規制すると同時に、Mn量とFe量と
の比（Mn/Fe）を規定した場合、ある程度の量のMnは晶
出物を粗大化させることなく積極的に添加できることが
判明した。However, in the present invention, as a result of diligent research, when the amount of Fe as an impurity (described later) is regulated and the ratio of the amount of Mn and the amount of Fe (Mn / Fe) is specified, a certain amount of Mn is crystallized. It was found that the output could be positively added without coarsening.
すなわち、Mn/Feが３までは若干晶出物の粗大化傾向は
あるが、３を超えるとMn添加量が増加しても晶出物は成
長しないため、Mn/Fe≧３に規定する。但し、Mnの絶対
量が１％を超えると晶出物の成長が再び顕著になるた
め、１％以下とする。しかし、Mn量が0.05％未満では前
述のようなMn添加の効果が認められない。That is, when Mn / Fe is up to 3, there is a tendency of coarsening of crystallized substances, but when Mn / Fe exceeds 3, crystallized substances do not grow even if the amount of Mn added increases, so Mn / Fe ≧ 3 is specified. However, if the absolute amount of Mn exceeds 1%, the growth of crystallized substances becomes remarkable again, so the content is made 1% or less. However, if the amount of Mn is less than 0.05%, the effect of adding Mn as described above cannot be recognized.
したがって、Mnの含有量は、Mn/Fe≧３のもとで、0.05
〜１％とする。Therefore, the content of Mn is 0.05 when Mn / Fe ≧ 3.
-1%.
不純物として含まれるFe、SiはAl-FeやMg-Siのような晶
出物の発生をコントロールする上で規制が必要であり、
それぞれ0.07％を超えると目的とする晶出物サイズが得
られないことが判明した。したがって、Fe、Siはそれぞ
れ0.07％以下、好ましくは0.02％以下に規制する。但
し、Fe量は上記Mn/Si≧３となるように規制することは
云うまでもない。Fe and Si contained as impurities need to be regulated to control the generation of crystallized substances such as Al-Fe and Mg-Si.
It was found that the target crystallized size could not be obtained when the content of each exceeded 0.07%. Therefore, Fe and Si are restricted to 0.07% or less, preferably 0.02% or less. However, it goes without saying that the Fe content is regulated so that the above Mn / Si ≧ 3.
なお、その他の元素については、メッキ性の改善のため
にCu及びZnの１種又は２種をそれぞれ0.3％以下で含有
すること、或いは他の目的でCr、Zn及びTiの１種又は２
種以上をそれぞれ0.05％未満で含有することが許容され
る。また、他の不可避的な不純物元素を本発明の目的を
損なわない範囲で微量含んでいることも許容される。Regarding other elements, one or two of Cu and Zn should be contained at 0.3% or less for improving the plating property, or one or two of Cr, Zn and Ti should be contained for other purposes.
It is acceptable to contain less than 0.05% of each species. Further, it is acceptable to contain other unavoidable impurity elements in a trace amount so long as the object of the present invention is not impaired.
次に、本発明法の製造条件について説明する。ディスク
素材の製造工程においては、まず、Al地金として、Fe及
びSiがそれぞれ0.07％以下、好ましくは0.02％以下の高
純度Al地金を使用するのが好ましく、上記化学成分のAl
合金を通常の方法により溶製、鋳造し、得られた鋳塊に
均熱処理を施した後、熱間圧延を実施する。なお、これ
らのプロセス条件は特に制限されず、従来と同様であっ
てもよい。Next, the manufacturing conditions of the method of the present invention will be described. In the manufacturing process of the disk material, first, as the Al ingot, it is preferable to use a high-purity Al ingot in which Fe and Si are each 0.07% or less, preferably 0.02% or less.
The alloy is melted and cast by a usual method, the obtained ingot is subjected to soaking, and then hot-rolled. Note that these process conditions are not particularly limited and may be the same as conventional ones.
次いで、冷間圧延は、最終冷間加工率が10〜40％、好ま
しくは15〜30％にて実施し、ディスク素材を得る。この
場合、熱間圧延後、引き続いて上記最終冷間加工率によ
る冷間圧延を実施しても、或いは熱間圧延後、冷間圧
延、中間焼鈍を経てから、上記最終冷間加工率による冷
間圧延を実施してもよい。Then, cold rolling is carried out at a final cold working rate of 10 to 40%, preferably 15 to 30% to obtain a disk material. In this case, after hot rolling, even if cold rolling is performed at the final cold working rate, or after hot rolling, after cold rolling and intermediate annealing, the cold rolling is performed at the final cold working rate. Hot rolling may be performed.
最終冷間加工率が10％未満では充分な加工硬化が得られ
ず、最終強度も低いものとなる。また、40％を超えると
内部の転位や欠陥の密度を増加させ、再結晶温度を低下
させると共に焼鈍軟化曲線の急激な変化を招くので、好
ましくない。If the final cold working ratio is less than 10%, sufficient work hardening cannot be obtained and the final strength will be low. Further, if it exceeds 40%, the density of internal dislocations and defects is increased, the recrystallization temperature is lowered, and the annealing softening curve is rapidly changed, which is not preferable.
冷間圧延後は、従来と同様、得られたディスク素材をブ
ランク打抜きし、歪矯正焼鈍（ブランク焼鈍）を施し、
次いで粗加工、歪取焼鈍（サブストレート焼鈍）、仕上
加工を含むサブストレート加工を行う。サブストレート
焼鈍は場合により省略可能である。After cold rolling, the obtained disk material is blank-punched and subjected to strain straightening annealing (blank annealing),
Substrate processing including rough processing, strain relief annealing (substrate annealing), and finish processing is then performed. The substrate annealing can be omitted in some cases.
但し、歪矯正焼鈍及び歪取焼鈍はいずれも再結晶温度以
下の温度で行う必要がある。焼鈍温度は、ディスクブラ
ンク及びサブストレートの歪矯正及び歪取としては高温
焼鈍ほど効果が大きく、またメディア加工工程における
加熱及び長時間使用時での形状の安定性の面からは、上
記Al合金の場合、少なくとも260℃以上が好ましいが、
高強度の基盤を得るためには再結晶温度以下での焼鈍が
必要条件であり、加熱により再結晶させた場合、強度が
著しく低下し、本発明の目的（強度面では耐力値17kg/m
m2以上の高強度）は達成されない。再結晶温度は組成等
によって決まり、後述の実施例にその一例を示す。However, both the strain straightening annealing and the strain relief annealing must be performed at a temperature equal to or lower than the recrystallization temperature. The annealing temperature is more effective as high-temperature annealing for strain correction and strain relief of disk blanks and substrates, and in terms of shape stability during heating and long-term use in the media processing step, the Al alloy In this case, at least 260 ° C or higher is preferable,
In order to obtain a high-strength substrate, annealing at a recrystallization temperature or lower is a necessary condition, and when recrystallized by heating, the strength is remarkably reduced, and the object of the present invention (strength is a proof value of 17 kg / m
High strengths above m 2 ) are not achieved. The recrystallization temperature is determined by the composition and the like, and one example will be shown in Examples described later.
なお、保持時間は２〜８時間が望ましい。The holding time is preferably 2 to 8 hours.
次に、本発明の実施例を示す。Next, examples of the present invention will be described.
（実施例） 第２表に示す化学成分（wt％）を有するAl合金を通常の
方法により溶製、鋳造し、得られた鋳塊に均熱処理を施
した後、熱間圧延を行い、第３表に示す最終冷間加工率
の冷間圧延を実施し、ディスク素材を得た。(Example) An Al alloy having the chemical composition (wt%) shown in Table 2 was melted and cast by a usual method, the obtained ingot was subjected to soaking, and then hot-rolled. Cold rolling was carried out at the final cold working rate shown in Table 3 to obtain a disk material.
次いで、このディスク素材をブランク打抜きし、同表に
示す条件でブランク焼鈍を施した。その後、同表に示す
ように、研削→D/Tによるサブストレート加工を実施
し、その際、一部についてはサブストレート焼鈍を施し
た。得られたサブストレートは130φ×40φ×1.27tの寸
法であった。Next, this disk material was blank-punched and blank-annealed under the conditions shown in the table. Then, as shown in the same table, substrate processing was performed by grinding → D / T, and at that time, a part of the substrate was annealed. The obtained substrate had dimensions of 130φ × 40φ × 1.27t.
このサブストレートについて、強度及び平坦度を調べる
と共に、金属間化合物のサイズ等を調べた。その結果を
第４表に示す。なお、平坦度は、サブストレート加工
後、加熱（250℃×4hr、70℃×1000hrの２種類）を施し
て経時変化を促進させ、レーザー干渉計により測定し、
10個の平均値で示した。With respect to this substrate, the strength and flatness were examined, and the size of the intermetallic compound was examined. The results are shown in Table 4. The flatness is measured with a laser interferometer after heating the substrate (2 types of 250 ° C. × 4 hr, 70 ° C. × 1000 hr) to accelerate the change over time.
The average value of 10 was shown.
第４表より明らかなとおり、本発明範囲外の化学成分を
有する比較例のサブストレートは、本発明範囲内の条件
で冷間圧延や焼鈍を行っても、強度、平坦度、金属間化
合物のサイズ等のいずれかに問題がある。これに対し、
本発明例のサブストレートはいずれも強度が確保され、
優れた平坦度を有し、金属間化合物の問題もない。な
お、再結晶温度の一例を示すならば、第２表中の合金N
o.2について、冷間加工率を10〜60％に変化させた場
合、再結晶温度が変化し、その関係は以下のとおりであ
る。As is clear from Table 4, the substrates of Comparative Examples having chemical components outside the scope of the present invention show strength, flatness and intermetallic compounds even when cold rolling or annealing is performed under the conditions within the scope of the present invention. There is a problem with either size. In contrast,
The strength of all the substrates of the present invention example is secured,
It has excellent flatness and does not have the problem of intermetallic compounds. If one example of the recrystallization temperature is shown, the alloy N in Table 2
Regarding o.2, when the cold working rate was changed to 10 to 60%, the recrystallization temperature was changed, and the relationship is as follows.
（冷間加工率） （再結晶温度） 10％ 380℃ 20％ 340℃ 25％ 330℃ 30％ 320℃ 60％ 280℃ （発明の効果） 以上詳述したように、本発明によれば、Mg、Mnを必須成
分とし、不純物のFe、Siを規制し、特にMn/Fe比を規定
した特定の化学成分を有するAl合金から、特定の条件に
よる冷間圧延と焼鈍を含む製造プロセスによりAlサブス
トレートを製造するので、晶出物サイズが小さく、機械
的強度も高く、加工性（研磨性）に優れた磁気ディスク
用Alサブストレートを得ることができ、特に高記録密度
用の磁気ディスク用Alサブストレートの製造に好適であ
る。(Cold working rate) (Recrystallization temperature) 10% 380 ℃ 20% 340 ℃ 25% 330 ℃ 30% 320 ℃ 60% 280 ℃ (Effects of the Invention) As described in detail above, according to the present invention, Al having a specific chemical component in which Mg and Mn are essential components, impurities Fe and Si are regulated, and in particular the Mn / Fe ratio is regulated. Since the Al substrate is manufactured from the alloy by a manufacturing process that includes cold rolling and annealing under specific conditions, it has a small crystallized product size, high mechanical strength, and excellent workability (polishability) for magnetic disks. An Al substrate can be obtained, which is particularly suitable for manufacturing an Al substrate for a magnetic disk for high recording density.
Claims (1)
Mn:0.05〜１％を必須成分として含有すると共に、不純
物として、Feを0.07％以下、Siを0.07以下に規制し、か
つ、上記Mn量とFe量との比（Mn/Fe）を３以上とする化
学成分を有するAl合金を溶製、鋳造し、均熱処理、熱間
圧延を実施した後、最終冷間加工率10〜40％の冷間圧延
を実施してデイスク素材を得、次いで行うブランク打抜
き後の歪矯正焼鈍又はサブストレート加工での歪取焼鈍
をそれぞれ該ディスク素材の再結晶温度以下の温度で行
うことを特徴とする磁気ディスク用で耐力値17kg/mm2以
上の強度を有するAlサブストレートの製造方法。1. In weight% (hereinafter the same), Mg: 3-6% and
Mn: 0.05 to 1% is contained as an essential component, Fe is restricted to 0.07% or less and Si is 0.07 or less as impurities, and the ratio (Mn / Fe) of the above Mn content and Fe content is 3 or more. After melting and casting an Al alloy with a chemical composition of, soaking, and hot rolling, cold rolling with a final cold working rate of 10-40% is performed to obtain a disk material, and then performed. Strain correction annealing after blank punching or strain relief annealing in substrate processing is performed at a temperature not higher than the recrystallization temperature of the disk material, and has a strength of 17 kg / mm 2 or more for a magnetic disk. Manufacturing method of Al substrate.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62092816A JPH0690792B2 (en) | 1987-04-15 | 1987-04-15 | Method for manufacturing Al substratum for magnetic disk |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62092816A JPH0690792B2 (en) | 1987-04-15 | 1987-04-15 | Method for manufacturing Al substratum for magnetic disk |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS63257917A JPS63257917A (en) | 1988-10-25 |
| JPH0690792B2 true JPH0690792B2 (en) | 1994-11-14 |
Family
ID=14064946
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62092816A Expired - Lifetime JPH0690792B2 (en) | 1987-04-15 | 1987-04-15 | Method for manufacturing Al substratum for magnetic disk |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0690792B2 (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH081699B2 (en) * | 1988-10-28 | 1996-01-10 | 株式会社神戸製鋼所 | Method for manufacturing an alloy mirror-finished substrate for magnetic disk |
| JP2017039979A (en) * | 2015-08-20 | 2017-02-23 | Ｋｍアルミニウム株式会社 | Aluminum alloy |
| JP2024035895A (en) * | 2022-09-05 | 2024-03-15 | 株式会社Uacj | Aluminum alloy substrate for magnetic disks |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5495912A (en) * | 1978-01-13 | 1979-07-28 | Nippon Telegr & Teleph Corp <Ntt> | Aluminum substrate for magnetic disc and manufacture thereof |
| JPS60194050A (en) * | 1984-03-14 | 1985-10-02 | Showa Alum Corp | Production of aluminum alloy substrate for magnetic disk |
| JPS60195739A (en) * | 1984-03-16 | 1985-10-04 | Showa Alum Corp | Manufacture of aluminum material for vertically magnetized magnetic disk |
-
1987
- 1987-04-15 JP JP62092816A patent/JPH0690792B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPS63257917A (en) | 1988-10-25 |
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