JPH0248154B2 - INSATSUHAISENBANNOSEIZOHOHO - Google Patents
INSATSUHAISENBANNOSEIZOHOHOInfo
- Publication number
- JPH0248154B2 JPH0248154B2 JP13145984A JP13145984A JPH0248154B2 JP H0248154 B2 JPH0248154 B2 JP H0248154B2 JP 13145984 A JP13145984 A JP 13145984A JP 13145984 A JP13145984 A JP 13145984A JP H0248154 B2 JPH0248154 B2 JP H0248154B2
- Authority
- JP
- Japan
- Prior art keywords
- plating
- insulating substrate
- catalyst
- thermosetting resin
- holes
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Landscapes
- Printing Elements For Providing Electric Connections Between Printed Circuits (AREA)
Description
(産業上の利用分野)
本発明は、アデイテイブ法による印刷配線板の
製造方法に関するものである。
(従来の技術)
従来、CC―4法等のようなアデイテイブ法に
より無電解めつきして回路を形成し印刷配線板を
製造する場合、絶縁基板の表面に予め、めつき触
媒入り接着剤層を設けている。この場合、絶縁基
板にスルーホール用の孔が設けられているものに
あつては、孔を設けた後、無電解めつき処理をす
る前に、めつき触媒を孔に付着する処理を行なつ
ている。
(発明が解決しようとする課題)
ところで、通常、接着剤層と無電解めつき処理
により形成されためつきの回路との接着力を向上
するために、孔にめつき触媒を付着した後に、接
着剤層を粗化している。接着剤層の粗化は、絶縁
基板を硼弗化水素酸溶液や無水クロム酸硫酸系溶
液等の粗化液に浸漬することにより行なつている
が、この浸漬処理により孔に付着しためつき触媒
の大部分が洗い流されてしまう。従つて、後に無
電解めつき処理を行なつても孔の箇所に、めつき
が析出するのに時間が掛かり、析出しためつき膜
は薄く剥離強度が小さいという欠点があつた。そ
のため、半田デイツプ等により孔に半田めつきを
したりさらに電子部品を接続する場合等に、孔内
周面に設けられためつき膜が部分的に薄く、絶縁
基板内のガスが孔壁のめつき膜を剥離して孔内に
充満し、半田が孔内部から押し出されて入口の表
面のみを被う状態(以下ブローホールという)に
なる。このような状態になると、電子部品の接続
不良が発生し易くなり、また、接着力も低下し易
くなる欠点があつた。
また、無電解めつき法では接着剤層にめつきレ
ジストを設けるが、従来、めつき液の活性度が異
常に高くなつたり、接着剤の洗浄が不充分であつ
たりすると、めつきレジスト表面にめつきが析出
して短絡不良を生じる欠点がある。このような欠
点を防止するためには、無電解めつき処理後、付
着しためつきをエツチング液で溶解し、粗化液で
粗化し、再び無電解めつき処理を行なえばよい。
が、粗化工程を繰り返すために、孔内のめつき触
媒がさらに洗い流され好ましくない。
(課題を解決するための手段)
本発明は、上記の目的を達成するために、スル
ーホール用の孔を有しめつき触媒入り接着剤が塗
布された絶縁基板に無電解めつき法により所定の
回路を形成しうる印刷配線板の製造方法におい
て、絶縁基板を熱硬化性樹脂中に浸漬して孔壁面
にめつき触媒入り熱硬化性樹脂を塗布する工程
と、該工程後に5m/sec以下の風速の熱風によ
り孔壁面に付着した前記熱硬化性樹脂を加熱する
工程と、めつきレジスト層を形成した後粗化液に
絶縁基板を浸漬し接着剤層を粗化する工程とを施
す印刷配線板の製造方法を提供する。
(作用)
すなわち、本発明によれば、絶縁基板に設けら
れたスルーホール用の孔の壁面に予め、めつき触
媒入りの熱硬化性樹脂層を設け、これを半硬化あ
るいは硬化するのに、この樹脂が除去されない程
度の風速の熱風を用いているため、孔壁にはまん
べん無く熱硬化性樹脂が付着した状態になつてい
る。そしてこのように孔壁に熱硬化性樹脂が付着
した状態において、めつき触媒を付着する。従つ
て、その後に絶縁基板を粗化液に浸漬しても、孔
壁にはめつき触媒が十分に付着した状態を保持で
きるため、無電解めつき処理により、孔壁に十分
な厚さのめつきが短時間に析出し、めつき層が形
成される。しかも、絶縁基板内のガスが孔壁を通
して放出されるのを熱硬化性樹脂層により防止で
きるため、半田めつき処理等をした場合のブロー
ホールも防止できる。また、粗化処理と無電解め
つき処理とを繰り返しても孔壁に析出されるめつ
きには影響がないので、めつきレジストに付着し
ためつきにより生じる短絡不良を防止できる。
なお、本発明によれば、めつき触媒の含まれな
い熱硬化性樹脂層にめつき触媒を付着した場合や
めつき触媒入り熱硬化性樹脂層だけでめつき触媒
を付着しない場合に比べて、めつきの析出が早く
信頼性やブローホール発生率についてもより優れ
た効果がある。
(実施例)
以下、本発明を実施例に基づいて説明する。
先ず、第1図に示す通り、紙―フエノール樹脂
基材や紙―エポキシ樹脂基材からなる絶縁基板1
にパラジウム等のめつき触媒入りの接着剤を塗布
して接着剤層2を形成する。次に、第2図に示す
通り、この接着剤層2が形成された絶縁基板1を
パンチして所定のスルーホール用の孔3を形成す
る。孔3形成後、絶縁基板1の表面を整面し、高
圧水洗をしてパンチによる基板カスを除去する。
この水洗後の絶縁基板1を特にめつき触媒入り熱
硬化性樹脂のエマルジヨン中に浸漬し、第3図に
示す通り、孔3の壁面に厚さ2〜10μ程度の熱硬
化性の樹脂層4を設ける。熱硬化性樹脂として
は、エポキシ樹脂やウレタン樹脂、ポリエステル
樹脂等を用いるが、絶縁基板1がフエノール樹脂
系あるいはエポキシ樹脂系のものの場合には、エ
ポキシ樹脂が基板との密着性がよく好ましい、ま
た、硬化剤としては、アミン系のものが安定した
エマルジヨンが得られるので好ましい、そしてエ
マルジヨン中の固形分濃度としては0.3〜5wt%の
範囲のものが特に好ましい、すなわち、0.3wt%
未満の濃度では硬化剤としての効果が低くなつて
樹脂が硬化し難くなり、また5wt%より多いと孔
を塞ぐように樹脂が被覆されることがあり、除去
作業が必要となり作業上好ましくない。めつき触
媒は、パラジウム化合物あるいは錫化合物との併
用系のパラジウム系触媒を用い、樹脂分100重量
部に対して0.005〜0.5重量部添加したものが好ま
しく、0.005重量部未満では触媒効率が低く、0.5
重量部より多いと価格が高くなり製造コストが高
くなる。絶縁基板1をエマルジヨン中に浸漬した
後、絞りローラやバフにより表面のエマルジヨン
を除去する。表面のエマルジヨンを除去した後、
扇風機等により強制的に加熱された空気を5m/
sec以下の熱風により孔壁に付着した熱硬化性樹
脂を加熱乾燥して半硬化あるいは硬化状態にす
る。熱硬化性樹脂層4を半硬化等した後、絶縁基
板1をパラジウム系めつき触媒溶液中に浸漬して
第4図に示す通り、熱硬化性樹脂層4表面にめつ
き触媒5を付着する。熱硬化性樹脂層4表面にめ
つき触媒5を付着した後、めつきレジストインク
を所定のパターンに塗布・乾燥し、第5図に示す
通り、めつきレジスト層6を設け、同時に熱硬化
性樹脂層4を硬化する。めつきレジスト層6を形
成後、絶縁基板1を硼弗化水素酸溶液や無水クロ
ム酸硫酸系溶液からなる粗化液に浸漬し、第6図
に示す通り、接着剤層2を粗化する。接着剤層2
を粗化した後、絶縁基板1を無電解銅めつき溶液
中に浸漬し所定のパターンにめつきを析出して、
第7図に示す通り、回路7を形成する。回路7を
形成後、通常の方法で絶縁基板1を処理し、印刷
配線板を製造する。
次に、本発明と従来例とについて、スルーホー
ル用の孔内のめつき付着性、スルーホール信頼性
及びブローホール発生率を測定したところ表の通
りの結果が得られた。
(Industrial Application Field) The present invention relates to a method for manufacturing a printed wiring board using an additive method. (Prior art) Conventionally, when manufacturing a printed wiring board by forming a circuit by electroless plating using an additive method such as the CC-4 method, an adhesive layer containing a plating catalyst is applied on the surface of an insulating substrate in advance. has been established. In this case, if the insulating substrate has holes for through holes, after the holes are formed and before electroless plating, a plating catalyst is applied to the holes. ing. (Problem to be Solved by the Invention) By the way, in order to improve the adhesion between the adhesive layer and the plating circuit formed by electroless plating, after the plating catalyst is attached to the holes, the adhesive is The layer is roughened. The adhesive layer is roughened by dipping the insulating substrate in a roughening solution such as a borofluoric acid solution or an anhydrous chromic acid/sulfuric acid solution. Most of the catalyst will be washed away. Therefore, even if an electroless plating treatment is performed later, it takes time for the plating to precipitate at the holes, and the deposited plating film is thin and has a low peel strength. Therefore, when soldering the hole with solder dip or connecting electronic components, etc., the dipping film provided on the inner circumferential surface of the hole is partially thin, and the gas inside the insulating substrate can leak onto the hole wall. The solder film is peeled off and the hole is filled with solder, and the solder is pushed out from inside the hole and covers only the surface of the entrance (hereinafter referred to as a blowhole). In such a state, there are disadvantages in that connection failures of electronic components are likely to occur and adhesive strength is also likely to decrease. In addition, in the electroless plating method, a plating resist is provided on the adhesive layer, but conventionally, if the activity of the plating solution becomes abnormally high or if the adhesive is not washed sufficiently, the plating resist surface It has the disadvantage that it can cause a short circuit due to the precipitation of glare. In order to prevent such defects, after the electroless plating process, the adhered plating can be dissolved with an etching solution, roughened with a roughening solution, and then the electroless plating process can be performed again.
However, since the roughening process is repeated, the plating catalyst in the pores is further washed away, which is not preferable. (Means for Solving the Problems) In order to achieve the above-mentioned object, the present invention provides a method for applying a predetermined method by electroless plating to an insulating substrate having holes for through holes and coated with a plating catalyst-containing adhesive. A method for manufacturing a printed wiring board on which a circuit can be formed includes a step of immersing an insulating substrate in a thermosetting resin, plating the hole wall surface, and applying a catalyst-containing thermosetting resin; Printed wiring that is subjected to a step of heating the thermosetting resin attached to the hole wall surface with hot air at a wind speed, and a step of immersing the insulating substrate in a roughening liquid after forming a plating resist layer to roughen the adhesive layer. A method for manufacturing a board is provided. (Function) That is, according to the present invention, a thermosetting resin layer containing a plating catalyst is previously provided on the wall surface of a through hole provided in an insulating substrate, and in order to semi-cure or harden the layer, Since hot air is used at a speed that does not remove the resin, the thermosetting resin is evenly adhered to the hole walls. Then, with the thermosetting resin attached to the hole walls in this manner, a plating catalyst is attached. Therefore, even if the insulating substrate is subsequently immersed in a roughening solution, the plating catalyst can remain sufficiently adhered to the pore walls, and the electroless plating process allows the pore walls to have a sufficient thickness. Plating precipitates in a short period of time, forming a plating layer. Moreover, since the thermosetting resin layer can prevent gas in the insulating substrate from being released through the hole walls, blowholes can be prevented when solder plating or the like is performed. Further, even if the roughening treatment and electroless plating treatment are repeated, there is no effect on the plating deposited on the hole walls, so it is possible to prevent short circuit failures caused by plating adhering to the plating resist. According to the present invention, compared to the case where a plating catalyst is attached to a thermosetting resin layer that does not contain a plating catalyst or the case where a plating catalyst is not attached only to a thermosetting resin layer containing a plating catalyst, The plating is deposited quickly, and the reliability and blowhole occurrence rate are also improved. (Examples) Hereinafter, the present invention will be described based on Examples. First, as shown in FIG. 1, an insulating substrate 1 made of a paper-phenol resin base material or a paper-epoxy resin base material is prepared.
An adhesive containing a plating catalyst such as palladium is applied to the adhesive layer 2 to form an adhesive layer 2. Next, as shown in FIG. 2, holes 3 for predetermined through holes are formed by punching the insulating substrate 1 on which the adhesive layer 2 is formed. After forming the holes 3, the surface of the insulating substrate 1 is leveled and washed with high-pressure water to remove substrate debris caused by punching.
The insulating substrate 1 after washing with water is immersed in an emulsion of thermosetting resin containing a plating catalyst, and as shown in FIG. will be established. Epoxy resin, urethane resin, polyester resin, etc. are used as the thermosetting resin, but when the insulating substrate 1 is made of phenol resin or epoxy resin, epoxy resin is preferable because of its good adhesion to the substrate. As the curing agent, an amine-based curing agent is preferable because a stable emulsion can be obtained, and the solid content concentration in the emulsion is particularly preferably in the range of 0.3 to 5 wt%, that is, 0.3 wt%.
If the concentration is less than 5% by weight, the effect as a curing agent will be reduced and the resin will be difficult to cure, and if the concentration is more than 5wt%, the resin may be coated so as to close the pores, making removal work necessary, which is undesirable for work. The plating catalyst is preferably a palladium-based catalyst used in combination with a palladium compound or a tin compound, and is preferably added in an amount of 0.005 to 0.5 parts by weight per 100 parts by weight of the resin.If it is less than 0.005 parts by weight, the catalyst efficiency is low; 0.5
If the amount exceeds parts by weight, the price and manufacturing costs will increase. After the insulating substrate 1 is immersed in the emulsion, the emulsion on the surface is removed using a squeezing roller or a buff. After removing the surface emulsion,
Air that is forcibly heated by an electric fan, etc. is
The thermosetting resin adhering to the hole wall is heated and dried by hot air of less than sec to a semi-cured or hardened state. After semi-curing the thermosetting resin layer 4, the insulating substrate 1 is immersed in a palladium-based plating catalyst solution to adhere the plating catalyst 5 to the surface of the thermosetting resin layer 4, as shown in FIG. . After adhering the plating catalyst 5 to the surface of the thermosetting resin layer 4, plating resist ink is applied in a predetermined pattern and dried to form a plating resist layer 6 as shown in FIG. The resin layer 4 is cured. After forming the plating resist layer 6, the insulating substrate 1 is immersed in a roughening solution consisting of a borofluoric acid solution or an anhydrous chromic acid/sulfuric acid solution to roughen the adhesive layer 2, as shown in FIG. . Adhesive layer 2
After roughening, the insulating substrate 1 is immersed in an electroless copper plating solution to deposit plating in a predetermined pattern.
As shown in FIG. 7, a circuit 7 is formed. After forming the circuit 7, the insulating substrate 1 is processed in a conventional manner to produce a printed wiring board. Next, the plating adhesion inside the through-hole, the through-hole reliability, and the blowhole occurrence rate were measured for the present invention and the conventional example, and the results shown in the table were obtained.
【表】
スルーホール用の孔内のめつき付着性は孔内壁
全面にめつきが析出するまでの時間、スルーホー
ル信頼性はMIL―107D(−65℃、30分〜125℃、
30分のサイクルによる熱衝撃テスト)により抵抗
値が10%増加するサイクル数、ブローホール発生
率は半田あげ条件を240℃、5秒とする。
なお、製造条件は、実施例1)が、
a) 絶縁基板:エポキシ樹脂積層板にめつき触
媒入り接着剤(日立化成工業社製HA―04)を
塗布硬化したもの。
b) 熱硬化性樹脂層形成工程:エポキシ樹脂エ
マルジヨン(カネボウNSC社製エポルジヨン
EA―1の固形分100重量部に対し硬化剤EB―
1を80重量部添加したもの)に、パラジウム液
PEC―8(日立化成工業社製めつき触媒)をパ
ラジウム濃度が樹脂分100重量部に対し0.03重
量部となるように添加した濃度1%の液中に浸
漬後、バフにより接着剤表面のエマルジヨンを
取り除き、さらに、100℃程度に加熱された風
速3m/secの熱風により加熱する。
c) めつき触媒付着工程:めつき触媒(日立化
成工業社製HS―101B)を塗布し、150℃の温
度で30分間加熱する。
d) めつきレジスト工程:めつきレジストイン
ク(日立化成工業社製HGM―02BK―1)を
スクリーン印刷し、温度160℃で30分間加熱し
て硬化する。
e) 粗化工程:硼弗化水素酸系粗化液により接
着剤層表面を粗化し、洗浄して乾燥する。
f) 無電解めつき工程:通常の無電解銅めつき
処理により銅層を形成し、形成後、塩化第2鉄
水溶液により銅層を除去し、銅層を除去後硼弗
化水素酸系粗化液により粗化処理しそして再び
無電解めつき処理により厚さ30μの銅層を形成
する。
実施例2)は、実施例1)において熱硬化性樹
脂の樹脂分100重量部に対してニトリルブタジエ
ン系ゴム(日本ゼオン社製ハイヤー1522)を10重
量部添加し、
実施例3)は、実施例1)において粗化液を弗
化ソーダ・クロム硫酸系とし、
実施例4)は、実施例1)においてb)の工程
でエマルジヨン除去後に100℃程度に加熱された
風速4.5m/secの熱風により加熱し、
実施例5)は、実施例1)においてb)の工程
でエマルジヨン除去後に100℃程度に加熱された
風速5m/secの熱風により加熱し、
実施例6)は、実施例1)においてb)の工程
でエマルジヨン除去後に100℃程度に加熱された
風速5.5m/secの熱風により加熱し、
従来例は、実施例1)においてb)の工程を省
略したものである。
表から明らかな通り、本発明によれば、従来例
に比べてスルーホール用の孔壁面のめつき付着性
は約1/12以下となりめつき析出速度が早くなる。
またスルーホールの信頼性は約3倍以上となる。
さらに、ブローホール発生率は1/50以下に減少す
る。なお、本発明によれば、熱風の風速は、5
m/secを越すとめつき付着性が急激に増加する
ことが明らかであり、5m/sec以下が好ましい。
(発明の効果)
以上の通り、本発明によれば、スルーホール用
の孔壁面にめつき触媒入り熱硬化性樹脂層をまん
べん無く設けさらにめつき触媒を付着することに
より孔壁面へのめつき析出が早くなり製造時間を
短縮できるとともにブローホールの発生率が低く
信頼性の高い印刷配線板の製造方法が得られる。[Table] The adhesion of plating inside the hole for through holes is the time until plating is deposited on the entire inner wall of the hole, and the through hole reliability is MIL-107D (-65℃, 30 minutes to 125℃,
The number of cycles at which the resistance value increases by 10% (thermal shock test with a 30-minute cycle) and the blowhole occurrence rate are determined by soldering conditions of 240°C and 5 seconds. The manufacturing conditions of Example 1) were as follows: a) Insulating substrate: An epoxy resin laminate plate was coated with a plating catalyst-containing adhesive (HA-04 manufactured by Hitachi Chemical Co., Ltd.) and cured. b) Thermosetting resin layer forming step: Epoxy resin emulsion (Epolsion manufactured by Kanebo NSC)
Hardening agent EB- for 100 parts by weight of solid content of EA-1
1) to which 80 parts by weight of 1) was added, palladium liquid
After immersing PEC-8 (a plating catalyst manufactured by Hitachi Chemical Co., Ltd.) in a 1% solution containing palladium at a concentration of 0.03 parts by weight per 100 parts by weight of resin, the emulsion on the adhesive surface was removed by buffing. is removed, and further heated with hot air heated to about 100°C at a wind speed of 3 m/sec. c) Plating catalyst deposition step: Apply a plating catalyst (HS-101B manufactured by Hitachi Chemical Co., Ltd.) and heat at a temperature of 150°C for 30 minutes. d) Plating resist process: Screen printing the plating resist ink (HGM-02BK-1 manufactured by Hitachi Chemical Co., Ltd.) and curing it by heating at a temperature of 160°C for 30 minutes. e) Roughening step: The surface of the adhesive layer is roughened using a borofluoric acid-based roughening liquid, washed and dried. f) Electroless plating process: A copper layer is formed by a normal electroless copper plating process, and after the formation, the copper layer is removed using a ferric chloride aqueous solution. A copper layer with a thickness of 30μ is formed by roughening with a chemical solution and then electroless plating again. In Example 2), 10 parts by weight of nitrile butadiene rubber (Higher 1522 manufactured by Nippon Zeon Co., Ltd.) was added to 100 parts by weight of the thermosetting resin in Example 1), and in Example 3), In Example 1), the roughening liquid was a sodium fluoride/chromium sulfate system, and in Example 4), hot air heated to about 100°C at a wind speed of 4.5 m/sec was used after removing the emulsion in step b) in Example 1). Example 5) was heated with hot air at a wind speed of 5 m/sec heated to about 100°C after the emulsion was removed in step b) in Example 1), and Example 6) was heated with Example 1). In step b), after removing the emulsion, heating was performed using hot air heated to about 100° C. at a wind speed of 5.5 m/sec, and the conventional example was obtained by omitting step b) in Example 1). As is clear from the table, according to the present invention, the plating adhesion of the through-hole wall surface is about 1/12 or less compared to the conventional example, and the plating precipitation rate is increased.
In addition, the reliability of through-holes is approximately three times higher.
Furthermore, the blowhole occurrence rate is reduced to less than 1/50. In addition, according to the present invention, the wind speed of the hot air is 5
It is clear that when the speed exceeds m/sec, the plating adhesion increases rapidly, and therefore 5 m/sec or less is preferable. (Effects of the Invention) As described above, according to the present invention, a thermosetting resin layer containing a plating catalyst is evenly provided on the hole wall surface of a through hole, and a plating catalyst is further attached to the hole wall surface. A method for manufacturing a printed wiring board which can accelerate plating deposition, shorten manufacturing time, and have a low blowhole occurrence rate and high reliability can be obtained.
第1図〜第7図は本発明実施例の製造工程を示
し、第1図は接着剤層を設けた絶縁基板の断面
図、第2図は孔を形成した絶縁基板の断面図、第
3図は孔壁にめつき触媒入り熱硬化性樹脂層を設
けた絶縁基板の断面図、第4図は熱硬化性樹脂層
にめつき触媒を付着した絶縁基板の断面図、第5
図はめつきレジスト層を設けた絶縁基板の断面
図、第6図は接着剤層を粗化した絶縁基板の断面
図、第7図は回路を設けた絶縁基板の断面図を示
す。
1…絶縁基板、2…接着剤層、3…孔、4…熱
硬化性樹脂層、5…めつき触媒、6…めつきレジ
スト層、7…回路。
1 to 7 show the manufacturing process of an embodiment of the present invention, FIG. 1 is a cross-sectional view of an insulating substrate provided with an adhesive layer, FIG. 2 is a cross-sectional view of an insulating substrate with holes formed, and FIG. The figure is a sectional view of an insulating substrate in which a thermosetting resin layer containing a plating catalyst is provided on the hole wall, FIG. 4 is a sectional view of an insulating substrate in which a plating catalyst is attached to a thermosetting resin layer, and FIG.
The figures are a cross-sectional view of an insulating substrate provided with a plating resist layer, FIG. 6 is a cross-sectional view of an insulating substrate with a roughened adhesive layer, and FIG. 7 is a cross-sectional view of an insulating substrate provided with a circuit. DESCRIPTION OF SYMBOLS 1... Insulating substrate, 2... Adhesive layer, 3... Hole, 4... Thermosetting resin layer, 5... Plating catalyst, 6... Plating resist layer, 7... Circuit.
Claims (1)
着剤が塗布された絶縁基板に、無電解めつき法に
より所定の回路及びスルーホールを形成する印刷
配線板の製造方法において、絶縁基板をめつき触
媒入り熱硬化性樹脂のエマルジヨン中に浸漬して
孔壁面にめつき触媒入りの熱硬化性樹脂を塗布す
る工程と、該工程後に5m/sec以下の風速の熱
風により孔壁面に付着した前記熱硬化性樹脂を加
熱する工程と、めつきレジスト層を形成した後粗
化液に絶縁基板を浸漬し接着剤層を粗化する工程
とを施すことを特徴とする印刷配線板の製造方
法。1. In a method for manufacturing a printed wiring board in which a predetermined circuit and through holes are formed by an electroless plating method on an insulating substrate having holes for through holes and coated with a plating catalyst-containing adhesive, an insulating substrate is plated. A step of applying the thermosetting resin containing a catalyst to the hole wall surface by immersing it in an emulsion of a catalyst-containing thermosetting resin, and after this step, the heat attached to the hole wall surface by hot air at a wind speed of 5 m/sec or less. A method for manufacturing a printed wiring board, comprising: heating a curable resin; and after forming a plating resist layer, immersing an insulating substrate in a roughening liquid to roughen an adhesive layer.
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13145984A JPH0248154B2 (en) | 1984-06-26 | 1984-06-26 | INSATSUHAISENBANNOSEIZOHOHO |
| US06/701,533 US4585502A (en) | 1984-04-27 | 1985-02-14 | Process for producing printed circuit board |
| DE19853505579 DE3505579A1 (en) | 1984-04-27 | 1985-02-18 | METHOD FOR PRODUCING A PRINTED CIRCUIT BOARD |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13145984A JPH0248154B2 (en) | 1984-06-26 | 1984-06-26 | INSATSUHAISENBANNOSEIZOHOHO |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6110296A JPS6110296A (en) | 1986-01-17 |
| JPH0248154B2 true JPH0248154B2 (en) | 1990-10-24 |
Family
ID=15058450
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP13145984A Expired - Lifetime JPH0248154B2 (en) | 1984-04-27 | 1984-06-26 | INSATSUHAISENBANNOSEIZOHOHO |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0248154B2 (en) |
-
1984
- 1984-06-26 JP JP13145984A patent/JPH0248154B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6110296A (en) | 1986-01-17 |
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