JPH0250466B2 - - Google Patents
Info
- Publication number
- JPH0250466B2 JPH0250466B2 JP26572885A JP26572885A JPH0250466B2 JP H0250466 B2 JPH0250466 B2 JP H0250466B2 JP 26572885 A JP26572885 A JP 26572885A JP 26572885 A JP26572885 A JP 26572885A JP H0250466 B2 JPH0250466 B2 JP H0250466B2
- Authority
- JP
- Japan
- Prior art keywords
- metal oxide
- conductive
- sulfoxylate
- oxide semiconductor
- derivative
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G5/00—Recording-members for original recording by exposure, e.g. to light, to heat or to electrons; Manufacture thereof; Selection of materials therefor
- G03G5/10—Bases for charge-receiving or other layers
- G03G5/104—Bases for charge-receiving or other layers comprising inorganic material other than metals, e.g. salts, oxides, carbon
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G5/00—Recording-members for original recording by exposure, e.g. to light, to heat or to electrons; Manufacture thereof; Selection of materials therefor
- G03G5/02—Charge-receiving layers
- G03G5/04—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor
- G03G5/05—Organic bonding materials; Methods for coating a substrate with a photoconductive layer; Inert supplements for use in photoconductive layers
- G03G5/0503—Inert supplements
- G03G5/0507—Inorganic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G5/00—Recording-members for original recording by exposure, e.g. to light, to heat or to electrons; Manufacture thereof; Selection of materials therefor
- G03G5/02—Charge-receiving layers
- G03G5/04—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor
- G03G5/05—Organic bonding materials; Methods for coating a substrate with a photoconductive layer; Inert supplements for use in photoconductive layers
- G03G5/0503—Inert supplements
- G03G5/051—Organic non-macromolecular compounds
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Photoreceptors In Electrophotography (AREA)
Description
「産業上の利用分野」
本発明は静電記録体、電子写真記録体、静電転
写体及び通電感熱記録体などに用いられる導電性
支持体に関するものである。
「従来の技術」
静電記録や電子写真記録などでは文字や図形を
電気信号や光信号を介して静電潜像に変換し、ト
ナーなどで可視化して記録されるが、これらの記
録体に用いられる支持体は、一般に何等かの低抵
抗処理が施される。
低抵抗処理の為に用いられる導電性物質の一種
として、無機塩や高分子電解質などのイオン導電
性物質が挙げられるが、外部環境の湿度変化によ
つてその抵抗値が大きく変化するため、その利用
範囲が限定される。その為、湿度変化の影響を受
け難い導電性物質として、結晶内に不純物を含み
電子導電性を示す酸化スズ、酸化亜鉛、酸化イン
ジウムなどの金属酸化物半導体が好ましく用いら
れる。
しかし、これらの金属酸化物半導体は、通常、
所望の抵抗値を得るのに多くの処理量を必要とす
るため、コスト的に問題がある。例えば、静電記
録体の導電性支持体では、およそ107Ω程度の抵
抗値が必要であるが、この値を得るのに酸化亜鉛
を約10g強程度塗被する必要がある。
また、通電感熱記録体の場合には、これらの金
属酸化物半導体で得られる抵抗値では不充分なた
め、ヨウ化銅のような導電性物質が用いられる。
しかし、ヨウ化銅はヨウ素を遊離するため、金属
が腐蝕したり、記録体に不必要な着色が生じる等
の欠点が付随する。
「発明が解決しようとする問題点」
かかる現状に鑑み本発明者等は、金属酸化物半
導体の導電性を向上せしめることにより、高価な
金属酸化物半導体の塗工量を減らし、結果的にコ
スト低減、製造工程の省エネ化を図ると共に、腐
蝕や着色といつた問題が付随するヨウ化銅の如き
導電性物質の使用を回避し得る技術について鋭意
研究の結果、還元性を示すスルホキシル酸塩誘導
体を金属酸化物半導体に併用すると、金属酸化物
半導体の導電性が著しく向上することを見出し本
発明を達成するに至つた。
「問題点を解決するための手段」
本発明は、金属酸化物半導体とスルホキシル酸
塩誘導体を含有する導電層を備えたことを特徴と
する導電性支持体である。
「作用」
本発明で用いられる金属酸化物半導体として
は、酸化亜鉛、二酸化錫、酸化カドミウム、二酸
化チタン、酸化インジウム等、さらには酸化チタ
ンの表面に導電性酸化錫を生成させたような、金
属酸化物半導体を主たる導電性成分とした複合体
(特開昭57−11825号)等が挙げられるが、これら
の中でも酸化亜鉛は比較的安価であり、取り扱い
の簡便さ、環境に与える影響の少なさといつた点
からも特に好ましく用いられる。
これらの金属酸化物半導体は、いずれも原子価
制御により導電性がコントロールされるが、例え
ば導電性酸化亜鉛は、酸化亜鉛に少量のアルミニ
ウム、インジウム、スズ等の不純物を添加、焼成
する方法で製造される(特開昭55−162477号)。
製造時の条件、例えば焼成温度や還元雰囲気の制
御によつても導電性をある程度制御できるが、得
られる酸化亜鉛粉末の着色状況や粒子の大きさか
ら、得られる導電性酸化亜鉛の抵抗値には自ずと
限界がある。
本発明の導電性支持体では、かかる金属酸化物
半導体にスルホキシル酸塩誘導体を併用するもの
であるが、スルホキシル酸塩誘導体の具体例とし
ては、下記一般式で表される誘導体が例示され
る。
MSO2・X・nH2O又は
MHSO2・X・nH2O
〔式中Mは1価又は2価の金属、Xは有機化合
物、nは0以上の整数を示す。〕
さらに、具体的にはNaHSO2、ZnSO2、
CoSO2、NaHSO2・CH2O・2H2O、ZnSO2・
CH2O・H2O等が例示される。これらの中でも、
次亜硫酸ソーダとホルマリンの反応で得られるナ
トリウム・ホルムアルデヒド・スルホキシレート
(NaHSO2・CH2O・2H2O)及び亜鉛ハイドロサ
ルフアイトにホルマリンを加え亜鉛粉末と共に反
応させて得られる亜鉛・ホルムアルデヒド・スル
ホキシレート(ZnSO2・CH2O・H2O)は、特に
優れた導電性向上効果をもたらすため、より好ま
しく用いられる。
これらのスルホキシル酸塩誘導体が、金属酸化
物半導体に対して優れた導電性向上効果をもたら
す原因については、必ずしも明らかではないが、
スルホキシル酸塩誘導体は強い還元性を呈するた
め、金属酸化物半導体の表面に吸着された気体分
子、特に酸素分子を効率良く除去し、結果的に、
吸着分子の影響で阻害されていた金属酸化物半導
体の導電性能が著しく向上するためではないかと
推測される。
なお、スルホキシル酸塩誘導体が強い還元性を
呈するのは、
のように、SO2基が酸素をうばい相手を強く還元
するためである。
本発明において、金属酸化物半導体に対するス
ルホキシル酸塩誘導体の併用割合は、金属酸化物
半導体100重量部に対して、20重量部以下の範囲
で調節されるのが望ましく、より好ましくは
0.001〜5重量部程度の範囲で調節される。なお、
0.001重量部より少ないと充分な改良効果が得ら
れず、逆に20重量部を超えると金属酸化物半導体
同志の接触が妨げられるため、やはり満足すべき
改良効果は得られない。
金属酸化物半導体とスルホキシル酸塩誘導体を
併用する際には、金属酸化物半導体表面に直接ス
ルホキシル酸塩誘導体が接触吸着するように併用
するのが好ましく、例えば金属酸化物半導体粉末
に対し、スルホキシル酸塩誘導体の溶解液を霧状
に噴霧して吸着させたり、金属酸化物半導体スラ
リー中にスルホキシル酸塩誘導体を混合添加する
方法などが採用される。
金属酸化物半導体を支持体に固定するための結
着剤としては、ポリビニルアルコール、ヒドロキ
シメチルセルロース、澱粉、スチレン・マレイン
酸共重合体等の水溶性高分子結着剤、ポリビニル
ベンジルアンモニウムクロライド等の如き高分子
電解質、アクリルエマルジヨン、スチレンブタジ
エンラテツクス等のエマルジヨン系結着剤等が好
ましく用いられるが、ブチルメタクリレート、ポ
リビニルブチラール、ポリエステル等の有機溶剤
系結着剤や電子線硬化型、光硬化型の樹脂等も使
用できる。
金属酸化物半導体に対する結着剤の配合割合
は、金属酸化物半導体100重量部に対して、5〜
60重量部程度の範囲で調節するのが望ましい。5
重量部より少ないと接着性が不足して金属酸化物
半導体が脱落する恐れがあり、逆に60重量部を超
える程多量に配合すると、金属酸化物半導体同志
の接触が阻害されて導電性が低下してしまう。
本発明の導電性支持体は、一般に金属酸化物半
導体と結着剤を含有する導電性塗液を適当な支持
体に塗布することによつて製造されるが、導電性
塗液中には例えば分散剤、消泡剤、染料などの各
種助剤を適宜添加することができる。
調整された導電性塗液は、例えば合成紙、紙、
フイルム、プラスチツク板などの適当な支持体の
片面又は両面に塗布されるが、塗布方法について
は特に限定されず、例えばバーコータ、ブレード
コータ、ロールコータ等各種公知のコータヘツド
を備えた塗布機によつて適宜塗布される。
かくして得られる本発明の導電性支持体は、ス
ルホキシル酸塩誘導体の併用によつて金属酸化物
半導体の導電性が著しく改良されているため、比
較的少ない塗布量でも、所望の導電性が得られ
る。従つて、高価な金属酸化物半導体の使用量を
大幅に低減でき、しかも塗布量の減少に伴い、乾
燥エネルギーの消費量も大幅に節約できるもので
ある。加えて、ヨウ化銅の如き導電性物質の使用
が回避されるため、腐蝕や着色といつた問題も解
消される。
〔実施例〕
以下に、実施例を挙げて本発明をより具体的に
説明するが、勿論これらに限定されるものではな
い。なお、例中の部数は全て重量部を示す。
実施例1〜2、比較例1
アルミニウムを不純物として添加、焼成して製
造された導電性酸化亜鉛100部と水100部を混合
し、更にスルホキシル酸塩誘導体としてナトリウ
ム・ホルムアルデヒド・スルホキシレートを1部
〔実施例1〕、亜鉛・ホルムアルデヒド・スルホキ
シレートを3部〔実施例2〕それぞれ添加してボ
ールミルで分散した。なお、スルホキシル酸塩誘
導体を添加しない例を比較例1とした。
かくして得られた3種類の分散液に、結着剤と
してポリビニルアルコール(クラレ社製、
PVA105)の10%水溶液をそれぞれ100部混合し
て導電性塗液とした。
58g/m2の上質紙の片面に、上記導電性塗液を
乾燥重量で5g/m2から15g/m2まで変化させな
がら塗布し、塗布量が12g/m2の時の表面抵抗値
を測定した。また、表面抵抗値が1×107Ωとな
るのに必要な塗布量を求め、それぞれ第1表に記
載した。
第1表の結果から明らかなように、本発明の各
実施例で得られた導電性支持体は、金属酸化物半
導体の導電性がスルホキシル酸塩誘導体の添加で
著しく向上しているため、少量の塗布量で充分所
望の導電性を有していた。
"Industrial Application Field" The present invention relates to a conductive support used in electrostatic recording media, electrophotographic recording media, electrostatic transfer media, electrically conductive heat-sensitive recording media, and the like. ``Conventional technology'' In electrostatic recording and electrophotographic recording, characters and figures are converted into electrostatic latent images via electrical signals and optical signals, and are visualized and recorded using toner. The supports used are generally subjected to some kind of low resistance treatment. Ionic conductive substances such as inorganic salts and polymer electrolytes are a type of conductive substance used for low-resistance processing, but their resistance value changes greatly depending on changes in the humidity of the external environment. The scope of use is limited. Therefore, metal oxide semiconductors such as tin oxide, zinc oxide, and indium oxide, which contain impurities in their crystals and exhibit electronic conductivity, are preferably used as conductive substances that are not easily affected by humidity changes. However, these metal oxide semiconductors usually
Since a large amount of processing is required to obtain a desired resistance value, there is a cost problem. For example, a conductive support for an electrostatic recording medium requires a resistance value of approximately 10 7 Ω, and to obtain this value it is necessary to coat approximately 10 g or more of zinc oxide. Further, in the case of an electrically conductive heat-sensitive recording medium, the resistance values obtained with these metal oxide semiconductors are insufficient, so a conductive substance such as copper iodide is used.
However, since copper iodide liberates iodine, it has disadvantages such as corrosion of the metal and unnecessary coloring of the recording medium. "Problems to be Solved by the Invention" In view of the current situation, the present inventors have aimed to improve the conductivity of metal oxide semiconductors to reduce the amount of expensive metal oxide semiconductors coated, resulting in lower costs. As a result of intensive research on technology that can reduce energy consumption and save energy in the manufacturing process, as well as avoid the use of conductive substances such as copper iodide, which are associated with problems such as corrosion and coloring, we have developed a sulfoxylate derivative that exhibits reducing properties. The present inventors have discovered that the conductivity of a metal oxide semiconductor is significantly improved when the metal oxide semiconductor is used in combination with the metal oxide semiconductor, and the present invention has been achieved. "Means for Solving the Problems" The present invention is a conductive support comprising a conductive layer containing a metal oxide semiconductor and a sulfoxylate derivative. "Function" Metal oxide semiconductors used in the present invention include zinc oxide, tin dioxide, cadmium oxide, titanium dioxide, indium oxide, etc., and metals such as titanium oxide with conductive tin oxide formed on the surface. Examples include composites containing oxide semiconductors as the main conductive component (Japanese Unexamined Patent Publication No. 11825/1983), but among these, zinc oxide is relatively inexpensive, easy to handle, and has little impact on the environment. It is particularly preferably used because of its saturation. The conductivity of all these metal oxide semiconductors is controlled by valence control, but conductive zinc oxide, for example, is manufactured by adding a small amount of impurities such as aluminum, indium, tin, etc. to zinc oxide and firing it. (Japanese Patent Application Laid-Open No. 162477/1983).
Conductivity can be controlled to some extent by controlling the manufacturing conditions, such as the firing temperature and reducing atmosphere, but the resistance value of the resulting conductive zinc oxide depends on the coloring and particle size of the resulting zinc oxide powder. Of course there are limits. In the conductive support of the present invention, a sulfoxylate derivative is used in combination with the metal oxide semiconductor, and specific examples of the sulfoxylate derivative include derivatives represented by the following general formula. MSO 2 .X.nH 2 O or MHSO 2 . ] Furthermore, specifically NaHSO 2 , ZnSO 2 ,
CoSO2 , NaHSO2・CH2O・2H2O , ZnSO2・
Examples include CH 2 O and H 2 O. Among these,
Sodium formaldehyde sulfoxylate (NaHSO 2 CH 2 O 2H 2 O) obtained by the reaction of sodium hyposulfite and formalin, and zinc formaldehyde sulfoxylate obtained by adding formalin to zinc hydrosulfite and reacting it with zinc powder. Sulfoxylate (ZnSO 2 .CH 2 O.H 2 O) is more preferably used because it provides a particularly excellent effect of improving conductivity. Although it is not necessarily clear why these sulfoxylate derivatives have an excellent conductivity-improving effect on metal oxide semiconductors,
Since sulfoxylate derivatives exhibit strong reducing properties, they efficiently remove gas molecules, especially oxygen molecules, adsorbed on the surface of metal oxide semiconductors, and as a result,
It is speculated that this is because the conductive performance of the metal oxide semiconductor, which had been inhibited by the influence of adsorbed molecules, is significantly improved. In addition, the reason why sulfoxylate derivatives exhibit strong reducing properties is that This is because the SO 2 group absorbs oxygen and strongly reduces the other party. In the present invention, the proportion of the sulfoxylate derivative in combination with the metal oxide semiconductor is desirably adjusted within a range of 20 parts by weight or less, more preferably, based on 100 parts by weight of the metal oxide semiconductor.
It is adjusted within a range of about 0.001 to 5 parts by weight. In addition,
If it is less than 0.001 part by weight, a sufficient improvement effect will not be obtained, and if it exceeds 20 parts by weight, contact between metal oxide semiconductors will be hindered, so that a satisfactory improvement effect will not be obtained. When using a metal oxide semiconductor and a sulfoxylate derivative in combination, it is preferable to use them together so that the sulfoxylate derivative is directly contacted and adsorbed onto the surface of the metal oxide semiconductor. Methods such as spraying a solution of a salt derivative in the form of a mist and adsorbing it, or mixing and adding a sulfoxylate derivative into a metal oxide semiconductor slurry are employed. As the binder for fixing the metal oxide semiconductor to the support, water-soluble polymer binders such as polyvinyl alcohol, hydroxymethylcellulose, starch, styrene-maleic acid copolymer, polyvinylbenzylammonium chloride, etc. Emulsion-based binders such as polymer electrolytes, acrylic emulsions, and styrene-butadiene latex are preferably used, but organic solvent-based binders such as butyl methacrylate, polyvinyl butyral, and polyester, and electron beam-curable and photo-curable binders are used. resins etc. can also be used. The blending ratio of the binder to the metal oxide semiconductor is 5 to 100 parts by weight of the metal oxide semiconductor.
It is desirable to adjust within a range of about 60 parts by weight. 5
If it is less than 60 parts by weight, there is a risk that the metal oxide semiconductor will fall off due to insufficient adhesion, whereas if it is added in an amount exceeding 60 parts by weight, the contact between the metal oxide semiconductors will be inhibited and the conductivity will decrease. Resulting in. The conductive support of the present invention is generally produced by applying a conductive coating liquid containing a metal oxide semiconductor and a binder to a suitable support. Various auxiliary agents such as a dispersant, an antifoaming agent, and a dye can be added as appropriate. The prepared conductive coating liquid can be applied to, for example, synthetic paper, paper,
The coating is applied to one or both sides of a suitable support such as a film or a plastic plate, but the coating method is not particularly limited. Appropriately applied. In the thus obtained conductive support of the present invention, the conductivity of the metal oxide semiconductor is significantly improved by the combined use of the sulfoxylate derivative, so that the desired conductivity can be obtained even with a relatively small coating amount. . Therefore, the amount of expensive metal oxide semiconductor used can be significantly reduced, and as the amount of coating is reduced, the amount of drying energy consumed can also be significantly reduced. Additionally, since the use of conductive materials such as copper iodide is avoided, problems such as corrosion and staining are also eliminated. [Example] The present invention will be described in more detail below with reference to Examples, but the present invention is of course not limited to these. Note that all parts in the examples indicate parts by weight. Examples 1 to 2, Comparative Example 1 100 parts of conductive zinc oxide produced by adding aluminum as an impurity and firing were mixed with 100 parts of water, and then 1 part of sodium formaldehyde sulfoxylate was added as a sulfoxylate derivative. [Example 1] and 3 parts of zinc/formaldehyde/sulfoxylate [Example 2] were added and dispersed using a ball mill. Note that Comparative Example 1 was an example in which no sulfoxylate derivative was added. Polyvinyl alcohol (manufactured by Kuraray Co., Ltd.,
100 parts of each 10% aqueous solution of PVA105) was mixed to prepare a conductive coating liquid. The above conductive coating liquid was applied to one side of 58 g/m 2 of high-quality paper while changing the dry weight from 5 g/m 2 to 15 g/m 2 , and the surface resistance value when the applied amount was 12 g/m 2 was calculated. It was measured. Further, the amount of coating required to achieve a surface resistance value of 1×10 7 Ω was determined and is listed in Table 1. As is clear from the results in Table 1, the electrical conductivity of the metal oxide semiconductor obtained in each example of the present invention was significantly improved by the addition of the sulfoxylate derivative, so that a small amount of the sulfoxylate derivative was added. It had sufficient desired conductivity with a coating amount of .
【表】
実施例3、比較例2
導電性酸化亜鉛の代わりに導電性酸化スズを使
用し、スルホキシル酸塩誘導体としてナトリウ
ム・ホルムアルデヒド・スルホキシレートを0.1
部混合した以外は実施例1と同様にして導電性塗
液を調製した。なお、スルホキシル酸塩誘導体を
添加しない例を比較例2とした。
得られた導電性塗液をポリエステルシートに膜
厚を変化させて塗布し、膜厚5μの時の表面抵抗
値を測定し、さらに表面抵抗値が1×107Ωとな
るのに必要な膜厚量を求め、それぞれ第2表に記
載した。[Table] Example 3, Comparative Example 2 Conductive tin oxide was used instead of conductive zinc oxide, and 0.1% of sodium formaldehyde sulfoxylate was used as the sulfoxylate derivative.
A conductive coating liquid was prepared in the same manner as in Example 1, except for partially mixing. Note that Comparative Example 2 was an example in which no sulfoxylate derivative was added. The obtained conductive coating liquid was applied to a polyester sheet at varying film thicknesses, the surface resistance value was measured when the film thickness was 5μ, and the film required to achieve a surface resistance value of 1×10 7 Ω The thickness was determined and listed in Table 2.
実施例1及び比較例1で得られた5種類の導電
性支持体を、それぞれスーパーキヤレンダーでベ
ツク平滑度が300秒となるように処理した。
ポリエステル樹脂(東洋紡績社製、バイロン
200)50部、炭酸カルシウム粉末(備北粉化社製、
ソフトン1800)50部及びメチルエチルケトン200
部を混合し、ボールミルで約1時間分散して調製
した誘電体層用塗液を、上記導電性支持体に乾燥
塗布量が5g/m2となるように塗布し5種類の静
電記録体を得た。
これを静電記録用フアクシミリ装置(松下電送
社製、UF―520)で記録し、その画像濃度をマク
ベス濃度計で測定し、その結果を第3表に記載し
た。
第3表の結果から明らかなように、画像濃度で
1.0以上の値を得るには、通常12g/m2前後の導
電性塗液を塗布する必要があるが、本発明の実施
例の導電性支持体では8g/m2以下の塗布量で満
足すべき画像濃度が得られた。
The five types of conductive supports obtained in Example 1 and Comparative Example 1 were each treated with a supercalender so that the Beck smoothness was 300 seconds. Polyester resin (manufactured by Toyobo Co., Ltd., Byron)
200) 50 parts, calcium carbonate powder (manufactured by Bihoku Funka Co., Ltd.,
Softon 1800) 50 parts and methyl ethyl ketone 200
A dielectric layer coating solution prepared by dispersing in a ball mill for about 1 hour was applied to the conductive support at a dry coating amount of 5 g/m 2 to form five types of electrostatic recording materials. I got it. This was recorded with an electrostatic recording facsimile device (UF-520, manufactured by Matsushita Densen Co., Ltd.), and the image density was measured with a Macbeth densitometer, and the results are shown in Table 3. As is clear from the results in Table 3, the image density
To obtain a value of 1.0 or more, it is usually necessary to apply a conductive coating liquid of around 12 g/m 2 , but with the conductive support of the embodiment of the present invention, a coating amount of 8 g/m 2 or less is sufficient. The desired image density was obtained.
Claims (1)
を含有する導電層を備えたことを特徴とする導電
性支持体。 2 スルホキシル酸塩誘導体が、ナトリウム・ホ
ルムアルデヒド・スルホキシレート又は亜鉛・ホ
ルムアルデヒド・スルホキシレートから選ばれる
少なくとも1種である請求の範囲第1項記載の導
電性支持体。 3 金属酸化物半導体が酸化亜鉛である請求の範
囲第1項記載の導電性支持体。[Scope of Claims] 1. A conductive support comprising a conductive layer containing a metal oxide semiconductor and a sulfoxylate derivative. 2. The conductive support according to claim 1, wherein the sulfoxylate derivative is at least one selected from sodium formaldehyde sulfoxylate and zinc formaldehyde sulfoxylate. 3. The conductive support according to claim 1, wherein the metal oxide semiconductor is zinc oxide.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP26572885A JPS62124563A (en) | 1985-11-26 | 1985-11-26 | Conductive substrate body |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP26572885A JPS62124563A (en) | 1985-11-26 | 1985-11-26 | Conductive substrate body |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62124563A JPS62124563A (en) | 1987-06-05 |
| JPH0250466B2 true JPH0250466B2 (en) | 1990-11-02 |
Family
ID=17421174
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP26572885A Granted JPS62124563A (en) | 1985-11-26 | 1985-11-26 | Conductive substrate body |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62124563A (en) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01153864A (en) * | 1987-12-11 | 1989-06-16 | Seiko Epson Corp | transmission gear |
| DE69319814T2 (en) * | 1992-08-28 | 1999-01-28 | Tomoegawa Paper Co., Ltd., Tokio/Tokyo | Electrostatic recording medium |
| JP5123736B2 (en) * | 2008-05-20 | 2013-01-23 | 株式会社リコー | Electrophotographic photoreceptor, image forming method, image forming apparatus, and process cartridge |
| JP2009210735A (en) * | 2008-03-03 | 2009-09-17 | Ricoh Co Ltd | Electrophotographic photoreceptor, image forming method and device, and process cartridge |
-
1985
- 1985-11-26 JP JP26572885A patent/JPS62124563A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS62124563A (en) | 1987-06-05 |
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