JPH0251875B2 - - Google Patents
Info
- Publication number
- JPH0251875B2 JPH0251875B2 JP4183585A JP4183585A JPH0251875B2 JP H0251875 B2 JPH0251875 B2 JP H0251875B2 JP 4183585 A JP4183585 A JP 4183585A JP 4183585 A JP4183585 A JP 4183585A JP H0251875 B2 JPH0251875 B2 JP H0251875B2
- Authority
- JP
- Japan
- Prior art keywords
- boat
- solid
- liquid interface
- melt
- cross
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000013078 crystal Substances 0.000 claims description 42
- 239000007788 liquid Substances 0.000 claims description 26
- 238000009826 distribution Methods 0.000 claims description 23
- 238000010438 heat treatment Methods 0.000 claims description 23
- 239000000155 melt Substances 0.000 claims description 17
- 238000004519 manufacturing process Methods 0.000 claims description 9
- 239000004065 semiconductor Substances 0.000 claims description 8
- 150000001875 compounds Chemical class 0.000 claims description 4
- 239000000126 substance Substances 0.000 claims description 4
- 238000000034 method Methods 0.000 description 20
- 230000017525 heat dissipation Effects 0.000 description 4
- 230000005855 radiation Effects 0.000 description 4
- 238000007711 solidification Methods 0.000 description 3
- 230000008023 solidification Effects 0.000 description 3
- 238000007796 conventional method Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000011810 insulating material Substances 0.000 description 2
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 1
- 229910000673 Indium arsenide Inorganic materials 0.000 description 1
- 229940125773 compound 10 Drugs 0.000 description 1
- 230000003111 delayed effect Effects 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 230000005496 eutectics Effects 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- RPQDHPTXJYYUPQ-UHFFFAOYSA-N indium arsenide Chemical compound [In]#[As] RPQDHPTXJYYUPQ-UHFFFAOYSA-N 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- ZLVXBBHTMQJRSX-VMGNSXQWSA-N jdtic Chemical compound C1([C@]2(C)CCN(C[C@@H]2C)C[C@H](C(C)C)NC(=O)[C@@H]2NCC3=CC(O)=CC=C3C2)=CC=CC(O)=C1 ZLVXBBHTMQJRSX-VMGNSXQWSA-N 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
- Recrystallisation Techniques (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Description
【発明の詳細な説明】
[産業上の利用分野]
本発明は、GaAs、InP、InAsなどの−族
化合物半導体単結晶の製造方法に係り、特に固液
境界面における横断面温度分布の改善を図つた半
導体単結晶の製造方法に関する。[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to a method for manufacturing -group compound semiconductor single crystals such as GaAs, InP, and InAs, and particularly to a method for producing a cross-sectional temperature distribution at a solid-liquid interface. The present invention relates to a method for manufacturing a semiconductor single crystal.
[従来の技術]
一般に、化合物半導体単結晶の製造方法とし
て、水平ブリツジマン法(H・B法)や特開昭58
−156599号公報に示すように温度傾斜法(G・F
法)はすでに知られている。これらの方法は融液
入れボートと加熱炉とが相対移動するか否かの相
異はあるものの、概略的に同じである。すなわ
ち、長尺のボート内で−族元素を化学当量の
割合で共融させて、ボートの長さ方向に形成した
温度勾配を一定に保持したまま固液境界面を長手
方向に移動し、種結晶から徐々に結晶固化させて
単結晶を製造するものである。[Prior art] In general, methods for manufacturing compound semiconductor single crystals include the horizontal Bridgeman method (H-B method) and the Japanese Patent Application Laid-open No. 58
-156599, the temperature gradient method (G・F
law) is already known. These methods are generally the same, although there is a difference in whether or not the melt-filling boat and the heating furnace move relative to each other. In other words, the - group elements are eutecticized in a proportion of chemical equivalents in a long boat, and the solid-liquid interface is moved longitudinally while maintaining a constant temperature gradient formed in the longitudinal direction of the boat. A single crystal is produced by gradually solidifying the crystal.
ところで、いずれの方法においても、高品質単
結晶を得るためには、ボート長手方向に形成した
温度勾配の制御の外に固液境界面における横断面
温度分布の制御がきわめて重要となる。すなわ
ち、高品質単結晶を得るためには、固液境界面に
おいて、単結晶の成長が融液上層の自由表面より
開始してボート底部に向けて進行し得る温度分布
を実現し、且つその状態を長期間中安定に保つこ
とが要請される。 In any method, in order to obtain a high-quality single crystal, it is extremely important to control the cross-sectional temperature distribution at the solid-liquid interface in addition to controlling the temperature gradient formed in the longitudinal direction of the boat. In other words, in order to obtain a high-quality single crystal, it is necessary to realize a temperature distribution at the solid-liquid interface that allows the growth of the single crystal to start from the free surface of the upper layer of the melt and proceed toward the bottom of the boat, and to maintain that state. is required to remain stable for a long period of time.
このため、上記した如き温度分布を得る従来方
法として、次の2つの方法が採用されていた。第
1の方法は固液境界面制御用ヒータをボートの周
方向に沿つて複数に分割させて設け、分割された
個々のヒータを個別に制御し、最適な横断面温度
分布を得るようにしたものである。 For this reason, the following two methods have been adopted as conventional methods for obtaining the above-mentioned temperature distribution. The first method is to divide the heater for controlling the solid-liquid interface into multiple parts along the circumferential direction of the boat, and control each divided heater individually to obtain the optimal cross-sectional temperature distribution. It is something.
第2の方法は、炉体の上方に、その長手方向に
沿つて放熱孔を設け、固液境界面における融液の
上層を低温化させて自由表面からの結晶成長を実
現化せんとするものである。 The second method is to provide heat dissipation holes above the furnace body along its longitudinal direction, thereby lowering the temperature of the upper layer of the melt at the solid-liquid interface and realizing crystal growth from the free surface. It is.
[発明が解決しようとする問題点]
しかしながら、上記第1及び第2の従来方法に
あつては次のような問題点があつた。[Problems to be Solved by the Invention] However, the first and second conventional methods described above have the following problems.
すなわち、第1の方法は、分割ヒータを個々に
制御することからヒータ構造が非常に複雑化する
ばかりでなく、ヒータの制御系も煩雑化し、設備
費の高騰を余儀なくされるばかりでなく構造複雑
なことから炉体寿命も短縮化していた。また、第
2の方法は、放熱孔の開度寸法が一定で固定され
ているため、結晶成長中に微妙な放熱量の制御が
できないという問題点があつた。この問題点を解
決するために放熱孔外部の雰囲気温度を制御し、
放熱孔からの放熱量を調整する方法も考えられる
が、これによれば設費が大掛りとなり、整備費の
高騰を招来する。 In other words, the first method not only makes the heater structure extremely complicated because the divided heaters are controlled individually, but also makes the heater control system complicated, which not only increases equipment costs but also makes the structure complicated. As a result, the life of the furnace body was also shortened. Further, in the second method, since the opening size of the heat dissipation hole is fixed, there is a problem that the amount of heat dissipation cannot be delicately controlled during crystal growth. To solve this problem, we controlled the ambient temperature outside the heat radiation hole,
A method of adjusting the amount of heat dissipated from the heat dissipation holes may be considered, but this would require large installation costs and lead to a rise in maintenance costs.
[発明の目的]
本発明は以上のような問題点に着目し、これを
有効に解決すべく創案されたものである。[Object of the Invention] The present invention has focused on the above-mentioned problems and has been devised to effectively solve the problems.
本発明の目的は、融液を入れるボートの下部に
設けた発熱体により固液境界面の横断面温度分布
を制御するようにし、もつて炉体構造を複雑化す
ることなく横断面温度を最適に保持できる−
族化合物半導体単結晶の製造方法を提供するにあ
る。 The purpose of the present invention is to control the cross-sectional temperature distribution of the solid-liquid interface using a heating element installed at the bottom of the boat containing the melt, thereby optimizing the cross-sectional temperature without complicating the furnace structure. can be held at −
The present invention provides a method for manufacturing a group compound semiconductor single crystal.
[発明の概要]
上記目的を達成する本発明の構成は、ボートの
下部に横断面温度分布制御用発熱体を配置し、こ
の発熱体により固液境界面のボート底部側の融液
を加熱し、固液境界面の横断面温度分布を制御し
て自由表面より下方に向けて単結晶成長させるよ
うにしたことを要旨とする。[Summary of the Invention] The configuration of the present invention that achieves the above object is that a heating element for controlling cross-sectional temperature distribution is arranged in the lower part of the boat, and the melt on the bottom side of the boat at the solid-liquid interface is heated by this heating element. The gist of this study is to control the cross-sectional temperature distribution of the solid-liquid interface to grow a single crystal downward from the free surface.
[実施例]
以下に、本発明方法を添付図面に基づいて詳述
する。[Example] Below, the method of the present invention will be explained in detail based on the accompanying drawings.
第1図は本発明方法を実施するための半導体の
製造装置の一例を示す側面図、第2図は第1図中
−線矢視拡大横断面図である。 FIG. 1 is a side view showing an example of a semiconductor manufacturing apparatus for carrying out the method of the present invention, and FIG. 2 is an enlarged cross-sectional view taken along the line -- in FIG.
図示する如く1は−族元素金属の融液Mを
収容するためのボートであり、このボート1は上
方が開放されて横断面ほぼ矩形状に成長された長
尺の容器として構成され、その一端に種結晶2を
取付けている。−族元素は化学当量の割合で
共融されて融液Mとしてボート1内に収容され
る。このボート1は両端が閉塞された透明石英管
の如き密閉容器3内に収容されている。この密閉
容器3の外周には、ボート1内収容物を加熱する
ためにその長手方向に沿つて巻回されたヒータ線
4と、その外周を被つて密閉容器3内を保温する
断熱材5とが順次形成されて炉体を構成してい
る。上記断熱材5の上部には、その長手方向に沿
つて放熱孔6が形成されており、ここからの放熱
によりボート1内の融液Mの上方を冷却して融液
Mの自由表面を冷却するようになつている。そし
て、上記ヒータ線4からの熱量を制御することに
よりボートの長さ方向に温度勾配を形成し、且つ
この勾配を一定に保持したままボート長手方向へ
移動させることにより固液境界面をも移動させ、
種結晶から徐々に結晶固化させる。この際、上記
の如くボート長手方向への温度勾配の制御は勿論
重要となるが、良好な単結晶を得るためには固液
境界面における横断面温度分布の制御も重要とな
る。 As shown in the figure, 1 is a boat for accommodating a melt M of - group element metal, and this boat 1 is configured as a long container that is open at the top and has a substantially rectangular cross section; Seed crystal 2 is attached to. - group elements are eutectic in a proportion of chemical equivalents and stored in the boat 1 as a melt M. This boat 1 is housed in a closed container 3 such as a transparent quartz tube with both ends closed. On the outer periphery of the airtight container 3, there is a heater wire 4 wound along the length of the boat 1 to heat the contents inside the boat 1, and a heat insulating material 5 covering the outer periphery of the heater wire 4 to keep the inside of the airtight container 3 warm. are sequentially formed to constitute the furnace body. A heat radiation hole 6 is formed in the upper part of the heat insulating material 5 along its longitudinal direction, and heat radiation from the hole cools the upper part of the melt M in the boat 1 and cools the free surface of the melt M. I'm starting to do that. By controlling the amount of heat from the heater wire 4, a temperature gradient is created in the longitudinal direction of the boat, and by moving the boat in the longitudinal direction while keeping this gradient constant, the solid-liquid interface is also moved. let me,
Gradually solidify the crystal from the seed crystal. At this time, it is of course important to control the temperature gradient in the longitudinal direction of the boat as described above, but in order to obtain a good single crystal, it is also important to control the cross-sectional temperature distribution at the solid-liquid interface.
そこで、この装置例には上記温度分布を改善す
るために、ボート1の下部に横断面温度分布制御
用発熱体7(以下「制御用発熱体」と記す)を設
けている。具体的には、この制御用発熱体7は例
えば所定の電気抵抗を有す炭化珪素ヒータ或はタ
ンタルヒータよりなり、ボート1の底部に相対向
する密閉容器3の外側にその長手方向に沿つて長
尺な一体物として配設されている。制御用発熱体
7には図示されない給電線が接続され、供給電流
を制御することにより発熱量をコントロールでき
るようになつている。また、ボート1に対応する
密閉容器3の例えば上側及び下側にはその長手方
向に沿つて温度検知手段としての多数の熱電対
(図示せず)が設けられており、この検出値に基
づいて温度勾配及び横断面温度分布を制御するよ
うになつている。 Therefore, in order to improve the above-mentioned temperature distribution, this device example is provided with a heating element 7 for controlling cross-sectional temperature distribution (hereinafter referred to as "control heating element") at the lower part of the boat 1. Specifically, the control heating element 7 is made of, for example, a silicon carbide heater or a tantalum heater having a predetermined electrical resistance, and is installed along the longitudinal direction of the closed container 3 facing the bottom of the boat 1. It is arranged as one long piece. A power supply line (not shown) is connected to the control heating element 7, so that the amount of heat generated can be controlled by controlling the supplied current. Further, a large number of thermocouples (not shown) as temperature detection means are provided along the longitudinal direction of the closed container 3 corresponding to the boat 1, for example, on the upper and lower sides thereof, and based on the detected values, The temperature gradient and cross-sectional temperature distribution are controlled.
次に、以上のように構成された装置例に基づい
て、本発明方法を具体的に説明する。 Next, the method of the present invention will be specifically explained based on an example of the apparatus configured as described above.
まず、ボート1内に例えばIn、Pなどの−
族元素を化学当量の割合で収容し、ヒータ線4に
通電することにより上記−族元素を共融させ
て融液Mとする。そして、ヒータ線4の通電量を
適宜制御し、途中に融液Mの凝固点を形成し、こ
の傾斜を一定に保持させたまま固液境界面8をボ
ート1の長手方向に沿つて矢印に示す如く移動さ
せることにより種結晶側から単結晶成長を開始
し、ボート長手方向に徐々に結晶固化させて単結
晶を製造する。この場合、密閉容器3の上方には
放熱孔6が形成されていることから融液Mの上側
すなわち自由表面側が冷却される傾向となり、従
つて、固液境界面8における上下方向横断面にあ
つてはその上方より下向に向けて次第に結晶固化
することになり、この際の横断面温度分布が非常
に重要となる。そこで、ボート1の下方に設けた
制御用発熱体7に通電してこれを加熱し、ボート
1の底部側をより高温として最適な横断面温度分
布を得る。すなわち、ボート1の底部の融液はそ
の上方自由表面よりも高温に保持されるために結
晶成長は自由表面より下方に向けて確実に行なわ
れることになり、且つ最適な横断面温度分布を得
るための微妙な発熱量制御は制御用発熱体7への
供給電流を制御することにより行う。第1図中ボ
ート1内の右側は成長した単結晶9を、左側は未
だ溶融している溶融化合物10を示す。横断面温
度分布の良否は例えばボート1の上下にその長手
方向に沿つて設けた多数の熱電対(図示せず)の
検出温度値に基づいて判断され、このフイードバ
ツク信号により上述の如く電流制御がなされる。
このように微妙な発熱量の制御は、ボート1の下
方に位置する制御用発熱体7により主に行なわれ
る。すなわち、結晶成長スタート時にあつては、
第3図に示す如く固液境界面の形状が若干凹面状
態となる傾向にあるためにこれを平面状に是正す
る必要から、成長スタート時にあつては制御発熱
体7のパワーを少し上げて発熱量を若干多くし、
ボート1内下部の結晶固化を少し遅延させる。こ
れにより、固液境界面の凹面状態が是正されて、
下方に直線状に傾斜した平面状固液境界面を得る
ことができる。 First, in boat 1, for example, In, P, etc.
The group elements are accommodated in a chemical equivalent ratio, and the - group elements are eutecticized to form a melt M by energizing the heater wire 4. Then, by appropriately controlling the amount of current applied to the heater wire 4, a solidification point of the melt M is formed in the middle, and the solid-liquid interface 8 is shown by the arrow along the longitudinal direction of the boat 1 while keeping this slope constant. By moving the boat in this manner, single crystal growth is started from the seed crystal side, and the crystal is gradually solidified in the longitudinal direction of the boat to produce a single crystal. In this case, since the heat radiation hole 6 is formed above the closed container 3, the upper side of the melt M, that is, the free surface side, tends to be cooled. As a result, the crystals gradually solidify from above to below, and the cross-sectional temperature distribution at this time is very important. Therefore, the control heating element 7 provided below the boat 1 is energized to heat it, thereby making the bottom side of the boat 1 higher in temperature to obtain an optimal cross-sectional temperature distribution. In other words, since the melt at the bottom of the boat 1 is held at a higher temperature than its upper free surface, crystal growth is ensured below the free surface, and an optimal cross-sectional temperature distribution is obtained. Fine control of the amount of heat generated is performed by controlling the current supplied to the control heating element 7. In FIG. 1, the right side of the boat 1 shows the grown single crystal 9, and the left side shows the still molten molten compound 10. The quality of the cross-sectional temperature distribution is determined, for example, based on the temperature values detected by a large number of thermocouples (not shown) installed above and below the boat 1 along its longitudinal direction, and this feedback signal is used to control the current as described above. It will be done.
Such delicate control of the amount of heat generated is mainly performed by the control heating element 7 located below the boat 1. That is, at the start of crystal growth,
As shown in Figure 3, the shape of the solid-liquid interface tends to be slightly concave, so it is necessary to correct this to a flat shape, so at the start of growth, the power of the control heating element 7 is slightly increased to generate heat. Increase the amount slightly,
The solidification of crystals in the lower part of the boat 1 is slightly delayed. This corrects the concave state of the solid-liquid interface,
A planar solid-liquid interface tilted linearly downward can be obtained.
そして、結晶固化がボート1の長手方向に進行
するに従つて、第4図に示す如く固液境界面は直
線状に傾斜してかなり理想状態に近づいてくる傾
向となるので、結晶が成長するに従つて、制御発
熱体7のパワーを徐々に絞つて発熱量を減少させ
るようにする。 Then, as the crystal solidification progresses in the longitudinal direction of the boat 1, the solid-liquid interface tends to be inclined linearly as shown in Figure 4, approaching the ideal state considerably, so that the crystals grow. Accordingly, the power of the control heating element 7 is gradually reduced to reduce the amount of heat generated.
このように、ボート1の下部に設けた制御用発
熱体7によりボート底部の融液の加熱量を制御す
るようにしたので、単結晶成長に最適な横断面温
度分布を実現することができるばかりでなく、且
つ結晶成長期間中その最適温度分布を一定に保持
することができ、高品質の単結晶を得ることがで
きる。 In this way, since the amount of heating of the melt at the bottom of the boat is controlled by the control heating element 7 provided at the bottom of the boat 1, it is possible to realize the optimum cross-sectional temperature distribution for single crystal growth. Moreover, the optimum temperature distribution can be kept constant during the crystal growth period, and a high quality single crystal can be obtained.
尚、前記装置例にあつては、ボート1の下部に
一体物となつた長尺な制御用発熱体7を固定して
設け、この発熱量を制御するようにしたが、これ
に限らず第5図に示す如く構成してもよい。すな
わち、ボート1の下部に単一の小型の制御用発熱
体7をボート1の長手方向に沿つて移動自在に設
け、この小型の制御用発熱体7自体を固液境界面
8の移動に追従させてボート長手方向に移動し、
これが固液境界面8の下方に常時位置するように
その移動を制御する。 In the above device example, the elongated control heating element 7 is fixedly provided at the bottom of the boat 1 to control the amount of heat generated. However, the present invention is not limited to this. It may be configured as shown in FIG. That is, a single small heating element 7 for control is provided at the bottom of the boat 1 so as to be movable along the longitudinal direction of the boat 1, and this small heating element 7 itself follows the movement of the solid-liquid interface 8. and move the boat longitudinally,
Its movement is controlled so that it is always located below the solid-liquid interface 8.
この装置例によれば、ボート1の下部全体に渡
つてヒータを設ける必要がなく小型の制御用発熱
体7で済み、前記装置例に比較してその構造を大
幅に簡略化することができる。 According to this device example, there is no need to provide a heater over the entire lower part of the boat 1, and a small control heating element 7 is sufficient, and the structure can be greatly simplified compared to the device example described above.
[発明の効果]
以上要するに、本発明方法によれば次のような
優れた効果を発揮することができる。[Effects of the Invention] In summary, according to the method of the present invention, the following excellent effects can be exhibited.
(1) ボートの下部に設けた制御用発熱体を加熱源
として、この熱量を制御することにより固液境
界面近傍の横断面温度分布を最適にでき且つそ
の状態を単結晶成長に必要な所定時間だけ安定
して保持できる。(1) By controlling the amount of heat using a control heating element installed at the bottom of the boat as a heat source, it is possible to optimize the cross-sectional temperature distribution near the solid-liquid interface and maintain the state to the specified level required for single crystal growth. It can be maintained stably for only a certain amount of time.
(2) 従つて、装置の構造を何ら複雑化させること
なく固液境界面近傍のボート底部の温度をより
高温に保持でき、確実に自由表面よりの結晶成
長が可能となるばかりでなく最適な横断面温度
分布を実現できることから高品質の半導体単結
晶を得ることができる。(2) Therefore, the temperature at the bottom of the boat near the solid-liquid interface can be maintained at a higher temperature without complicating the structure of the device, making it possible not only to reliably grow crystals from the free surface but also to achieve optimal growth. Since a cross-sectional temperature distribution can be realized, a high quality semiconductor single crystal can be obtained.
第1図は本発明方法を実施するための半導体単
結晶の製造装置の一例を示す側面図、第2図は第
1図中−線矢視拡大横断面図、第3図は従来
方法による結晶成長スタート時の固液境界状態を
示す部分断面図、第4図は結晶成長後半の固液境
界状態を示す部分断面図、第5図は本発明方法を
実施するための他の半導体単結晶の製造装置の一
例を示す側面図である。
尚、図中1はボート、2は種結晶、7は横断面
温度分布制御用発熱体、8は固液境界面、Mは融
液である。
FIG. 1 is a side view showing an example of a semiconductor single crystal manufacturing apparatus for carrying out the method of the present invention, FIG. 2 is an enlarged cross-sectional view taken along the line arrow in FIG. FIG. 4 is a partial cross-sectional view showing the solid-liquid boundary state at the start of crystal growth. FIG. 5 is a partial cross-sectional view showing the solid-liquid boundary state in the latter half of crystal growth. FIG. It is a side view showing an example of a manufacturing device. In the figure, 1 is a boat, 2 is a seed crystal, 7 is a heating element for controlling cross-sectional temperature distribution, 8 is a solid-liquid interface, and M is a melt.
Claims (1)
で共融させて融液を形成し、ボートの長さ方向に
形成した温度勾配を一定に保持したまま固液境界
面を移動し、種結晶から徐々に結晶固化させて単
結晶化させるに際して、上記ボートの下部に横断
面温度分布制御用発熱体を配置し、該発熱体によ
り固液境界面のボート底部側の融液を加熱し自由
表面より下方に向けて単結晶成長させるべく固液
境界面の横断面温度分布を制御するようにしたこ
とを特徴とする−族化合物半導体単結晶の製
造方法。1. In a boat, a melt is formed by eutecticizing the - group elements in a proportion of chemical equivalents, and the melt is moved along the solid-liquid interface while keeping the temperature gradient formed in the length direction of the boat constant, and a seed crystal is formed. In order to gradually solidify the crystal from the bottom to form a single crystal, a heating element for controlling the cross-sectional temperature distribution is placed at the bottom of the boat, and the heating element heats the melt on the bottom side of the boat at the solid-liquid interface, so that the free surface 1. A method for producing a - group compound semiconductor single crystal, characterized in that the cross-sectional temperature distribution of a solid-liquid interface is controlled in order to grow the single crystal further downward.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4183585A JPS61201688A (en) | 1985-03-05 | 1985-03-05 | Method for producing Group 3-5 compound semiconductor single crystal |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4183585A JPS61201688A (en) | 1985-03-05 | 1985-03-05 | Method for producing Group 3-5 compound semiconductor single crystal |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61201688A JPS61201688A (en) | 1986-09-06 |
| JPH0251875B2 true JPH0251875B2 (en) | 1990-11-08 |
Family
ID=12619317
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP4183585A Granted JPS61201688A (en) | 1985-03-05 | 1985-03-05 | Method for producing Group 3-5 compound semiconductor single crystal |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61201688A (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2716991B2 (en) * | 1989-01-31 | 1998-02-18 | 三菱化学株式会社 | III-Group V compound semiconductor single crystal and manufacturing method |
-
1985
- 1985-03-05 JP JP4183585A patent/JPS61201688A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS61201688A (en) | 1986-09-06 |
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