JPH0311073B2 - - Google Patents
Info
- Publication number
- JPH0311073B2 JPH0311073B2 JP58026525A JP2652583A JPH0311073B2 JP H0311073 B2 JPH0311073 B2 JP H0311073B2 JP 58026525 A JP58026525 A JP 58026525A JP 2652583 A JP2652583 A JP 2652583A JP H0311073 B2 JPH0311073 B2 JP H0311073B2
- Authority
- JP
- Japan
- Prior art keywords
- turntable
- heating chamber
- shaft
- heated
- heating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
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- Constitution Of High-Frequency Heating (AREA)
Description
【発明の詳細な説明】
産業上の利用分野
本発明は、加熱庫底面に絞り等によつて隆起を
持たせることによつて、均一な加熱による調理性
の向上を図つた高周波加熱装置に関するものであ
る。DETAILED DESCRIPTION OF THE INVENTION Field of Industrial Application The present invention relates to a high-frequency heating device that improves cooking performance through uniform heating by providing a bulge on the bottom surface of the heating chamber by means of a diaphragm or the like. It is.
従来例の構成とその問題点
従来の例えば、軸により駆動されるターンテー
ブルを有する高周波加熱装置では、軸の駆動力を
伝達させるために、第1図に示すように、ターン
テーブル1に肉厚の大きい部分2を設け、軸の形
状で嵌合部3を設けている構造が一般的である。
また前記肉厚の大きい部分2は、成形しやすく、
十分な強度をもたせるため、調理に影響を及ぼす
程度の広範囲となることが多い。ターンテーブル
の比誘電率は空気の比誘電率よりも大きいので、
加熱庫底面と被加熱物のマイクロ波における見か
け上の距離が不均一となるため、均一な加熱がで
きなくなる。Structure of conventional example and its problems For example, in a conventional high-frequency heating device having a turntable driven by a shaft, in order to transmit the driving force of the shaft, the turntable 1 has a thick wall, as shown in FIG. It is common to have a structure in which a large portion 2 is provided, and a fitting portion 3 is provided in the shape of a shaft.
Further, the thick portion 2 is easy to mold,
In order to provide sufficient strength, it is often spread over a wide range to the extent that it affects cooking. The dielectric constant of the turntable is greater than that of air, so
Since the apparent distance between the bottom of the heating chamber and the object to be heated in the microwave is uneven, uniform heating cannot be achieved.
また軸により駆動されるターンテーブルを有す
る高周波加熱装置では、一般に偏荷重に耐えるた
めにターンテーブルを支え回転するローラーを備
えている。従来第2図に示すように、ローラー7
を加熱庫底面4に固定したり、リング状に配置さ
せるために、加熱庫底面4にローラー配置絞り8
を設けている。このため調理時に水、油等の異物
が駆動部9に流入し易い形状となつていて、異物
が混入した場合、モーターの絶縁破壊、軸の円滑
な回転の妨げ、調理台への流出が発生するなどの
原因となる。また、ローラー配置絞りのため、軸
6が加熱庫底面4からほとんど突出しているた
め、ターンテーブル1の出し入れ時に当つたり、
マイクロ波を受ける部分が大きいため、マイクロ
波を吸収して破損する危険性が高くなる。 Furthermore, a high-frequency heating device having a turntable driven by a shaft is generally equipped with a roller that supports and rotates the turntable in order to withstand uneven loads. Conventionally, as shown in FIG.
A roller aperture 8 is installed on the bottom surface 4 of the heating chamber in order to fix it on the bottom surface 4 of the heating chamber or to arrange it in a ring shape.
has been established. For this reason, the shape of the drive unit 9 allows foreign substances such as water and oil to easily flow into the drive unit 9 during cooking, and if foreign substances enter the drive unit, it may cause insulation breakdown of the motor, prevent smooth rotation of the shaft, or flow out onto the cooking table. It may cause such things as In addition, due to the roller arrangement, the shaft 6 almost protrudes from the bottom surface 4 of the heating chamber, so it may come into contact with the turntable 1 when it is taken out or put in.
Since the area exposed to microwaves is large, there is a high risk of damage due to absorption of microwaves.
発明の目的
本発明は上記従来の欠点を解消するもので、加
熱庫底面と被加熱物のマイクロ波における見かけ
上の距離を一定に保ち、均一な加熱を目的とす
る。Purpose of the Invention The present invention solves the above-mentioned conventional drawbacks, and aims at uniform heating by keeping the apparent distance between the bottom of the heating chamber and the object to be heated by microwaves constant.
発明の構成
上記目的を達するため、本発明の高周波加熱装
置は、ターンテーブルの肉厚の異なる部分と対応
して絞り等により隆起を設けることによつて、加
熱庫底面と被加熱物のマイクロ波における見かけ
上の距離をターンテーブルの厚みの異なる部分以
外と同等の距離にする構成とした。Structure of the Invention In order to achieve the above-mentioned object, the high-frequency heating device of the present invention provides ridges by means of apertures or the like corresponding to parts of the turntable with different wall thicknesses, so that microwaves can The structure is such that the apparent distance between the parts of the turntable is the same as that of parts other than parts of the turntable with different thicknesses.
加熱庫底面と被加熱物のマイクロ波における見
かけ上の距離をターンテーブルの肉厚部の変化に
関係なく一定に近い状態にすることによつて、被
加熱物の均一な加熱ができるという効果があり、
駆動部に異物の流入を防ぐ構造によつて、駆動力
の円滑な伝達が可能となるという効果があり、駆
動軸の加熱庫内の突出を小さくし、駆動軸の破損
を防ぐという効果を有するものである。 By keeping the apparent distance between the bottom of the heating chamber and the object to be heated in the microwave to a constant state regardless of changes in the thickness of the turntable, the object to be heated can be heated evenly. can be,
The structure that prevents foreign matter from entering the drive section has the effect of enabling smooth transmission of driving force, and has the effect of reducing the protrusion of the drive shaft into the heating chamber and preventing damage to the drive shaft. It is something.
実施例の説明
以下、本発明の一実施例について、図面に基づ
いて説明する。第3図Aは本発明の高周波加熱装
置のドアを開けた全貌であり、第3図Bは第3図
Aの本発明に関わる部分の断面図である。DESCRIPTION OF EMBODIMENTS An embodiment of the present invention will be described below with reference to the drawings. FIG. 3A is an overall view of the high-frequency heating device of the present invention with the door opened, and FIG. 3B is a sectional view of a portion of FIG. 3A related to the present invention.
第3図Bにおいて、10は高周波発振器であ
り、発振されたマイクロ波は導波管11を通過
し、加熱庫12に供給され、被加熱物5を加熱す
る。この場合均一に加熱するために被加熱物5を
回転させる方式があり、ターンテーブル1に、軸
6を介して、駆動部9の回転力を伝達させる。軸
との嵌合部3をつくるため他の部分よりも肉厚の
大きい部分2が必要となる。また偏荷重に耐える
ためローラー7を加熱庫底面4の絞り部8上に配
置している。被加熱物5の一部が加熱中に導波管
に入らないようにカバー13を備えている。肉厚
の大きな部分2の範囲で空間距離補正絞り14を
設け、前記絞り14に異物流入防止絞り15を軸
6を同心円上に設けている。 In FIG. 3B, 10 is a high frequency oscillator, and the oscillated microwave passes through a waveguide 11, is supplied to a heating chamber 12, and heats the object 5 to be heated. In this case, there is a method in which the object to be heated 5 is rotated in order to uniformly heat the object, and the rotational force of the drive unit 9 is transmitted to the turntable 1 via the shaft 6. In order to create a fitting portion 3 with the shaft, a portion 2 that is thicker than other portions is required. Further, in order to withstand uneven loads, rollers 7 are arranged on the constricted portion 8 of the bottom surface 4 of the heating chamber. A cover 13 is provided to prevent part of the object to be heated 5 from entering the waveguide during heating. A spatial distance correction diaphragm 14 is provided in the range of the thick portion 2, and a foreign matter inflow prevention diaphragm 15 is provided in the diaphragm 14 concentrically with the shaft 6.
空間距離補正絞り14は加熱庫底面4よりH3
だけ高く設定している。このH3の算出法は下記
のとおりである。 The spatial distance correction aperture 14 is H 3 from the bottom surface 4 of the heating chamber.
It is set high. The calculation method for H 3 is as follows.
第5図から、A部の被加熱物5と加熱庫底面4
との空間におきかえたマイクロ波における見かけ
上の距離H1は(ターンテーブルの空間に対する
比誘電率をεとすると)
H1=h1×√+h2 ……
h1:A部のターンテーブルの厚み
h2:A部のターンテーブルと加熱庫底面との距離
B部の被加熱物5と加熱庫底面4との空間にお
きかえたマイクロ波における見かけ上の距離H2
は
H2=(h1+h1′)×√+h2′ ……
h1:B部のターンテーブルとA部のターンテーブ
ルの厚みの差
h2′:B部のターンテーブルと絞る前の加熱庫底
面との距離
ターンテーブルの比誘電率は空間の比誘電率よ
り大きいのでB部がA部より下記のH3だけ大き
いことになる。、式より
H3=H2−H1=h1′√+h2′−h2
=h1′√+h2′−(h1′+h2′)
=h1′(√−1) ……
このようにしてH3だけ肉厚の大きい部分に対
応した加熱庫底面を他の底面より高くし、被加熱
物と加熱庫底面とのマイクロ波における見かけ上
の距離を一定に近づけることによつて均一な加熱
を行なうことが可能であるという効果を有する。 From FIG. 5, the object to be heated 5 in section A and the bottom surface 4 of the heating chamber
The apparent distance H 1 in the microwave when replaced in the space with Thickness h 2 : Distance between the turntable in section A and the bottom surface of the heating chamber. Apparent distance H 2 in the microwave when the space between the heated object 5 and the bottom surface 4 of the heating chamber in section B is replaced.
H 2 = (h 1 + h 1 ′) × √ + h 2 ′ ... h 1 : Difference in thickness between turntable in section B and turntable in section A h 2 ′: Turntable in section B and heating before squeezing Distance from the bottom of the refrigerator Since the relative permittivity of the turntable is greater than the relative permittivity of the space, part B is larger than part A by H3 below. From the formula, H 3 = H 2 −H 1 = h 1 ′√+h 2 ′−h 2 = h 1 ′√+h 2 ′−(h 1 ′+h 2 ′) = h 1 ′(√−1) …… In this way, by making the bottom surface of the heating chamber corresponding to the thicker part H3 higher than the other bottom surfaces, the apparent distance between the object to be heated and the bottom surface of the heating chamber in the microwave is kept constant. This has the effect that uniform heating can be performed.
実施例としてターンテーブル厚みh1=6mm、肉
厚の大きい部分h1′+h1=12mm、ターンテーブル
の空間に対する比誘電率をε≒4なので
式より
H3=6√4−6=6を得て、6mm加熱庫底面
を肉厚の大きい部分に対応して高く絞ることによ
つて均一加熱を得ることができた。 As an example, the thickness of the turntable is h 1 = 6 mm, the thick part h 1 ′ + h 1 = 12 mm, and the relative permittivity of the turntable space is ε≒4, so from the formula, H 3 = 6√4−6=6. By narrowing the bottom of the 6mm heating chamber to a height corresponding to the thick part, uniform heating could be achieved.
また、第4図のように空間補正絞り14と異物
流入防止絞り15を軸3を中心に円形に構成する
ことによつて、軸3の加熱庫底面4への突出部分
を、従来よりも小さくし、ターンテーブルの出し
入れ時に当つたり、マイクロ波を吸収して破損す
ることを極力防ぐという効果を有する。 In addition, by configuring the space correction diaphragm 14 and the foreign matter inflow prevention diaphragm 15 in a circular shape with the shaft 3 as the center as shown in FIG. This has the effect of preventing the turntable from being hit when taking it in and out, or from being damaged by absorbing microwaves.
他の実施例として第6図に示すような構造があ
る。ローラー7の位置規制とターンテーブル1を
取り出し調理台に置いた場合の足とするために他
の部分よりも円周上に肉厚の大きい部分2を備え
る場合、この肉厚の大きい部分2に対応して加熱
庫底面に隆起14を設けることによつて被加熱物
5と加熱庫底面4とのマイクロ波における見かけ
上の距離を一定に近づけることによつて均一加熱
をすることができるという効果を有する。 Another example is the structure shown in FIG. If a thicker part 2 is provided on the circumference than other parts to regulate the position of the roller 7 and to serve as a foot when the turntable 1 is taken out and placed on the cooking table, the thicker part 2 is Correspondingly, by providing the ridges 14 on the bottom surface of the heating chamber, the apparent distance between the object to be heated 5 and the bottom surface 4 of the heating chamber in the microwave is kept close to a constant value, thereby achieving uniform heating. has.
発明の効果
以上のように本発明によれば次の効果を得るこ
とができる。Effects of the Invention As described above, according to the present invention, the following effects can be obtained.
(1) 絞り等の隆起によつて加熱庫底面と被加熱物
のマイクロ波における見かけ上の空間距離をほ
ぼ一定にすることによつて、均一加熱が可能に
なる。(1) Uniform heating is possible by keeping the apparent spatial distance between the bottom of the heating chamber and the object to be heated in the microwave almost constant using a bulge such as an aperture.
(2) 絞り等の隆起を軸を中心に円形に構成するこ
とによつて、軸にターンテーブルが当つたり、
軸がマイクロ波を吸収することが原因で軸が破
損することを防ぐ。(2) By configuring the protuberances such as apertures in a circular shape around the shaft, it is possible to prevent the turntable from touching the shaft.
Prevents the shaft from being damaged due to the shaft absorbing microwaves.
(3) 軸を中心として異物流入防止の絞りを設け、
駆動部に水、油等の異物が流入しない構造とし
異物が原因となつて発生する駆動部の地絡を防
ぎ、駆動部の寿命を延し、加熱庫外に異物が流
出し、調理台、床などを汚すということを防ぐ
ことができる。(3) A restriction is provided around the shaft to prevent foreign matter from entering.
The structure prevents foreign substances such as water and oil from entering the drive unit, which prevents ground faults in the drive unit caused by foreign substances, extending the life of the drive unit, and preventing foreign substances from flowing out of the heating cabinet, preventing the cooking table, This can prevent staining the floor etc.
第1図a,bは誘電体で形成されたターンテー
ブルの正面および側面図、第2図は従来のターン
テーブルを駆動させる構成断面図、第3図A,B
は本発明の一実施例である高周波加熱装置の断面
図、第4図は第3図の本発明に関する拡大断面
図、第5図は被加熱物と加熱庫底面との距離関係
を示した拡大断面模擬図、第6図は本発明の他の
実施例の断面図である。
1……ターンテーブル、2……ターンテーブル
の肉厚の大きい部分、3……軸との嵌合部、4…
…加熱庫底面、5……被加熱物、6……軸、7…
…ローラー、8……ローラー配置絞り、9……駆
動部、10……高周波発振器、11……導波管、
12……加熱庫、13……カバー、14……空間
距離補正絞り、15……異物流入防止絞り。
Figures 1a and b are front and side views of a turntable made of dielectric material, Figure 2 is a sectional view of the configuration for driving a conventional turntable, and Figures 3A and B.
4 is an enlarged sectional view of the high-frequency heating device that is an embodiment of the present invention, FIG. 4 is an enlarged sectional view of the present invention of FIG. 3, and FIG. 5 is an enlarged view showing the distance relationship between the object to be heated and the bottom of the heating chamber. FIG. 6 is a cross-sectional view of another embodiment of the present invention. 1... Turntable, 2... Thick part of turntable, 3... Fitting part with shaft, 4...
...Bottom surface of heating chamber, 5...Object to be heated, 6...Shaft, 7...
... Roller, 8 ... Roller arrangement aperture, 9 ... Drive section, 10 ... High frequency oscillator, 11 ... Waveguide,
12... Heating chamber, 13... Cover, 14... Spatial distance correction diaphragm, 15... Foreign matter inflow prevention diaphragm.
Claims (1)
るターンテーブルと、前記ターンテーブルを駆動
する軸と、前記軸を支持する底面を有する加熱庫
を備え、前記ターンテーブルの肉厚の大きな部分
に対応して、ターンテーブルの厚みの差をh、比
誘電率をεとした時、絞り高さH≒h(√−1)
を有する隆起を前記加熱庫底面に設けることを特
徴とする高周波加熱装置。 2 前記隆起は、前記軸をその隆起の範囲内に形
成することを特徴とする特許請求の範囲第1項記
載の高周波加熱装置。 3 前記隆起は、前記軸を中心とする円形に構成
することを特徴とする特許請求の範囲第2項記載
の高周波加熱装置。[Scope of Claims] 1. A turntable that is made of a dielectric material and has portions with different wall thicknesses, a shaft that drives the turntable, and a heating chamber that has a bottom surface that supports the shaft; Corresponding to the thick part, when the difference in thickness of the turntable is h and the relative dielectric constant is ε, the aperture height H≒h (√-1)
A high-frequency heating device characterized in that a protuberance having the following properties is provided on the bottom surface of the heating chamber. 2. The high-frequency heating device according to claim 1, wherein the ridge forms the axis within a range of the ridge. 3. The high-frequency heating device according to claim 2, wherein the protrusion has a circular shape centered on the axis.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58026525A JPS59151796A (en) | 1983-02-18 | 1983-02-18 | High frequency heating device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58026525A JPS59151796A (en) | 1983-02-18 | 1983-02-18 | High frequency heating device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS59151796A JPS59151796A (en) | 1984-08-30 |
| JPH0311073B2 true JPH0311073B2 (en) | 1991-02-15 |
Family
ID=12195892
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP58026525A Granted JPS59151796A (en) | 1983-02-18 | 1983-02-18 | High frequency heating device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS59151796A (en) |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5428566Y2 (en) * | 1978-06-06 | 1979-09-13 | ||
| JPS615756Y2 (en) * | 1981-02-04 | 1986-02-21 |
-
1983
- 1983-02-18 JP JP58026525A patent/JPS59151796A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS59151796A (en) | 1984-08-30 |
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