JPH0311082B2 - - Google Patents
Info
- Publication number
- JPH0311082B2 JPH0311082B2 JP60062675A JP6267585A JPH0311082B2 JP H0311082 B2 JPH0311082 B2 JP H0311082B2 JP 60062675 A JP60062675 A JP 60062675A JP 6267585 A JP6267585 A JP 6267585A JP H0311082 B2 JPH0311082 B2 JP H0311082B2
- Authority
- JP
- Japan
- Prior art keywords
- nylon
- barium titanate
- added
- raw material
- semiconductor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000004677 Nylon Substances 0.000 claims description 45
- 229920001778 nylon Polymers 0.000 claims description 45
- 239000004065 semiconductor Substances 0.000 claims description 34
- 239000002994 raw material Substances 0.000 claims description 27
- JRPBQTZRNDNNOP-UHFFFAOYSA-N barium titanate Chemical compound [Ba+2].[Ba+2].[O-][Ti]([O-])([O-])[O-] JRPBQTZRNDNNOP-UHFFFAOYSA-N 0.000 claims description 26
- 229910002113 barium titanate Inorganic materials 0.000 claims description 26
- 239000003795 chemical substances by application Substances 0.000 claims description 14
- 238000000034 method Methods 0.000 claims description 14
- 238000010304 firing Methods 0.000 claims description 13
- 239000000843 powder Substances 0.000 claims description 10
- 229910052751 metal Inorganic materials 0.000 claims description 7
- 239000002184 metal Substances 0.000 claims description 7
- 238000004519 manufacturing process Methods 0.000 claims description 6
- 239000002904 solvent Substances 0.000 claims description 5
- 239000010409 thin film Substances 0.000 claims description 5
- 239000010955 niobium Substances 0.000 claims description 4
- 229910052787 antimony Inorganic materials 0.000 claims description 3
- 229910052746 lanthanum Inorganic materials 0.000 claims description 3
- 229910052758 niobium Inorganic materials 0.000 claims description 3
- 229910052715 tantalum Inorganic materials 0.000 claims description 3
- 229910052727 yttrium Inorganic materials 0.000 claims description 3
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 claims description 2
- 150000001875 compounds Chemical class 0.000 claims description 2
- FZLIPJUXYLNCLC-UHFFFAOYSA-N lanthanum atom Chemical compound [La] FZLIPJUXYLNCLC-UHFFFAOYSA-N 0.000 claims description 2
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 claims description 2
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims description 2
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 claims description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 11
- 238000005470 impregnation Methods 0.000 description 4
- 150000002739 metals Chemical class 0.000 description 4
- 238000005245 sintering Methods 0.000 description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- 239000001301 oxygen Substances 0.000 description 3
- 229910052760 oxygen Inorganic materials 0.000 description 3
- 239000007858 starting material Substances 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 description 2
- 229910010413 TiO 2 Inorganic materials 0.000 description 2
- 229910002091 carbon monoxide Inorganic materials 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 230000007935 neutral effect Effects 0.000 description 2
- 230000001590 oxidative effect Effects 0.000 description 2
- 238000007569 slipcasting Methods 0.000 description 2
- 238000005979 thermal decomposition reaction Methods 0.000 description 2
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 description 1
- 229910021193 La 2 O 3 Inorganic materials 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 229910052788 barium Inorganic materials 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 238000001354 calcination Methods 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 235000019253 formic acid Nutrition 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- RLSSMJSEOOYNOY-UHFFFAOYSA-N m-cresol Chemical compound CC1=CC=CC(O)=C1 RLSSMJSEOOYNOY-UHFFFAOYSA-N 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000010534 mechanism of action Effects 0.000 description 1
- 229940100630 metacresol Drugs 0.000 description 1
- 239000012046 mixed solvent Substances 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 239000008188 pellet Substances 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 238000007493 shaping process Methods 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Landscapes
- Compositions Of Oxide Ceramics (AREA)
- Thermistors And Varistors (AREA)
Description
〔産業上の利用分野〕
本発明は、正温度係数(PTC)特性に優れた
チタン酸バリウム系半導体の製造方法に関するも
のである。
〔従来の技術〕
チタン酸バリウム(BaTiO3)にY、La、Sb
等の3価の金属あるいはNb、Ta等の5価の金属
を微量添加したチタン酸バリウム系半導体は、キ
ユリー点(Tc)以上の温度でその抵抗率(ρ)
が急激に増加する、いわるゆ正温度係数(PTC)
特性を示す。この特性を利用して、該半導体は電
流制御装置、あるいは自己制御機能を有するヒー
ター等に使用されている。
最近では、更に上記装置の応答性の改良や小型
化のために、室温抵抗率(ρr.t)が小さく、かつ
過電流あるいは過昇温時を制限ないし実質的に遮
断するためにTc以上の温度での抵抗率が大きい
半導体が望まれている。即ち、ρr.tができるだけ
小さく、しかもρmax/ρr.t(ρmaxはTc以上の温
度での抵抗率の最大値)の比ができるだけ大きい
PTC特性を有するものが要求されている。
従来、優れたPTC特性の半導体を得ようとす
る試みとして、前記3価または5価の金属を含む
半導体化剤の添加量の調整、あるいは焼成温度の
調整による方法がとられてきたが、これらの方法
ではρr.tが充分に低いものを得ることがむずかし
い。
また、ρr.tを低下させるために半導体の原料成
分の焼成を中性ないし還元性雰囲気で行なう方法
もあるが、この方法ではρr.tは低下するものの、
同時に高温域での抵抗率も低くなり、PTC特性
は消失してしまう。
更に、Mn2+等のイオンを形成する物質を半導
体の原料成分に添加して、ρmaxの大きいものを
得ようとする方法があるが、添加量の極く微量の
変化がρr.tを大きく変化させてしまうため、添加
量の調整が非常に困難である。
〔発明が解決しようとする問題点〕
本発明は、上記従来の問題点を克服して、
PTC特性に優れたチタン酸バリウム系半導体を
容易に製造する方法を提供しようとするものであ
る。
〔問題点を解決するための手段〕
本発明のチタン酸バリウム系半導体の製造方法
は、チタン酸バリウムと半導体化剤とから成る原
料成分にナイロンを粉末状、薄膜状、または溶媒
に溶解した溶液のうちの少なくとも1種の形状で
添加し、これを焼成することを特徴とするもので
ある。
本発明において、チタン酸バリウムは、
BaTiO3の構造式で表わされ、半導体の本体を成
すものである。また、半導体化剤は、このチタン
酸バリウムに微量添加され、通常絶縁体であるチ
タン酸バリウムの抵抗を下げて、半導体化させる
ものである。
該半導体化剤としては、イツトリウム(Y)、
ランタン(La)、アンチモン(Sb)等の3価の金
属あるいはニオブ(Nb)、タンタル(Ta)等の
5価の金属を有する化合物の通常使用されている
半導体化剤である。例えば、3価の金属を有する
ものとしては、Y2O3、La2O3、Sb2O3等が挙げら
れ、これらのうちの1種または2種以上を使用す
るまた5価の金属を有するものとしては、
Nb2O5、Ta2O5等が挙げられ、これらのうちの1
種または2種以上を使用する。上記半導体化剤の
配合量は、一般的に半導体を形成する場合の配合
量の範囲でよいが、好ましくはチタン酸バリウム
に対して0.2〜0.4原子%の半導体化剤を配合する
のが、室温抵抗率の低い半導体を得るためによ
い。
チタン酸バリウムと半導体化剤とを単に混合す
ることにより原料成分を形成してもよく、あるい
は、チタン酸バリウムは、Ba、Tiを含む炭酸塩、
酸化物、あるいは有機化合物、例えばBaCO3と
TiO2、BaTiO(C2O4)2・4H2O等を出発物質とし
て、これを加熱することにより得られるものであ
り、該出発物質と半導体化剤とを混合し、これに
仮焼等を施すことによりBaTiO3と半導体化剤と
が混合した本発明にかかる原料成分を形成しても
よい。
このチタン酸バリウムと半導体化剤とから成る
原料成分は粉末状のものでも、また予め所望の形
状に成形したものでもよい。
本発明では、上記原料成分にナイロンを添加す
る。添加するナイロンは、一般にポリアミドと総
称されるものであり、例えば6−ナイロン、6、
6−ナイロン、12−ナイロン等であり、これらの
単独、共重合体あるいはその変性したものなどい
ずれでもよい。またその形態は微粉末、フイルム
状あるいは溶媒に溶解した溶液等いずれでもよい
が、その中でも作業の容易性より微粉末もしくは
溶液が望ましい。
前記原料成分にナイロンを添加する工程として
は、ナイロンが均一に混合する方法であれば、い
ずれの方法でもよい。例えば、原料成分が粉末状
である場合、所定量のナイロンを、アルコール
類、ギ酸、メタクレゾール等のナイロンを溶解せ
しめる溶媒に溶解した溶液を原料成分に散布ある
いは原料成分と共に混練し、しかる後乾燥等によ
り有機溶媒を除去する方法、また、ナイロンを微
粉末あるいは薄膜状にして、これと原料成分とに
水や適当な混合溶媒を加えて混合し、しかる後水
や混合媒体を除去する方法等がある。また原料成
分を予め成形した後、ナイロンを溶解した有機溶
液をこの成形体に含浸し、しかる後有機溶媒を除
去する方法等がある。なお、上記含浸による方法
において、予め施す原料成分の成形は、プレス、
スリツプキヤスト等により行ない、更に含浸時に
成形体の変形を防ぐ目的で本焼結温度よりも低温
で仮焼結を行なつてもよい。
ナイロンを原料成分に添加する割合は、原料成
分に対して0.2〜8重量%の範囲内が望ましい。
該添加割合が0.2重量%未満あるいは8重量%を
越える場合には、半導体として充分に低い室温抵
抗率(ρr.t)のものが得られにくい。
次に、ナイロンを添加した原料成分をプレス、
スリツプキヤスト等により成形した後、酸化性雰
囲気で本焼成を施す。なお、ナイロンの添加を前
記含浸法で行なつた場合、原料成分はすでに成形
されているので、そのまま本焼成を施す。
この本焼成により、チタン酸バリウム系半導体
が得られる。
焼成雰囲気は、酸素もしくは大気中等の酸化性
雰囲気とする。中性あるいは還元性雰囲気では、
半導体のPTC特性を低下させてしまう。また、
焼成温度は1250〜1400℃の範囲内が望ましい。
1250℃未満では、半導体化が起きず、1400℃を越
える場合には、室温での抵抗率(ρr.t)が大きく
なるおそれがある。また焼成時間は1〜2時間の
範囲内でよい。
なお、この焼成により添加したナイロンは、蒸
発あるいは熱分解によりほとんどすべて半導体よ
り除去される。
〔発明の効果〕
本発明によれば、室温抵抗率(ρr.t)が小さ
く、しかもρmax/ρr.tが大きい、すなわちPTC
特性に優れたチタン酸バリウム系半導体を製造す
るとができる。
上記効果が得られる作用機構は明確ではない
が、以下のように推察することができる。
本発明において、添加したナイロンが、半導体
の焼成時に熱分解を起こし、発生期の窒素
(N2)、一酸化炭素(CO)等の活性なガスが発生
する。この活性なガスは、BaTiO3に作用し、こ
れに酸素欠陥を導入して全体の抵抗値、即ち室温
抵抗率を低下させる。更にこの活性ガスは、
BaTiO3と反応して、中間相の生成に寄与すると
考えられる。この中間相が不純物あるいは酸素の
粒界への拡散等によるバリアの形成を促し、
PTC特性を向上させていると考えられる。
また、本発明によれば、複雑な操作を必要とせ
ずに簡便にPTC特性に優れたチタン酸バリウム
系半導体を製造することができる。
〔実施例〕
以下、本発明の実施例を説明する。
実施例 1
BaTiO3の出発物質及び半導体化剤としての
BaCO3、TiO2、Y2O3をBa0.997Y0.003TiO3となる
組成割合で混合し、混合物を大気中、1100℃で
2hr仮焼し、その後粉砕して、粉末状の原料成分
を形成した。
可溶性ナイロン(東レ製、CM4000)を溶解し
たエタノール溶液を上記原料成分に添加し、ボー
ルミルにて混合した。なお、添加量は原料成分に
対してナイロンが0〜10重量%(以下ωt%とす
る)配合される範囲である(比較のため、ナイロ
ンを添加しないものも用意した。)
このナイロンを添加したものを乾燥して溶媒の
エタノールを蒸発させ、金型を用いて、直径20
mm、厚さ約3mmの円板状に成形し、この成形体を
大気中にて1300℃、1350℃の2種類の温度で1hr
焼成した。
得られた焼結体に電極としてNiを無電解メツ
キし、焼成体の電気抵抗を測定した電気抵抗の測
定は、室温から400℃までの範囲で大気中にて行
なつた。
その結果を第1図及び第2図に示す。ここで第
1図はナイロンの添加量と室温抵抗率(ρr.t)と
の関係を示し、図中曲線A、Bはそれぞれ焼成温
度が1300、1350℃のものである。
第1図より明らかなように、ナイロンを添加す
ることにより、室温抵抗率が低下し、特に0.2〜
8ωt%のナイロンを添加することにより室温抵抗
率が非常に低いものが得られることが分る。
また第2図は焼成温度が1350℃のもののPTC
特性曲線である。なお、曲線M、N、Oは、それ
ぞれナイロン添加量が0、0.4、8ωt%のものであ
る。なお、第1表に焼結温度1350℃で、ナイロン
添加量がそれぞれ0、0.4、4、8ωt%のものの
ρmax/ρr.tを示した。
第2図及び第1表より明らかなように、ナイロ
ンを添加することにより、ρmax/ρr.tの比が増
大していることが分る。
[Industrial Application Field] The present invention relates to a method for manufacturing a barium titanate semiconductor having excellent positive temperature coefficient (PTC) characteristics. [Conventional technology] Barium titanate (BaTiO 3 ) with Y, La, and Sb
Barium titanate-based semiconductors containing trace amounts of trivalent metals such as Nb, Ta, etc., exhibit a rapid increase in resistivity (ρ) at temperatures above the Curie point (Tc). Positive temperature coefficient (PTC)
Show characteristics. Utilizing this characteristic, the semiconductor is used in current control devices, heaters with self-control functions, and the like. Recently, in order to further improve the response and miniaturize the above-mentioned devices, the room temperature resistivity (ρr.t) is small, and in order to limit or substantially cut off overcurrent or overtemperature rise, Semiconductors with high resistivity at temperature are desired. In other words, ρr.t is as small as possible, and the ratio of ρmax/ρr.t (ρmax is the maximum value of resistivity at temperatures above Tc) is as large as possible.
Products with PTC characteristics are required. Conventionally, attempts have been made to obtain semiconductors with excellent PTC characteristics by adjusting the amount of the semiconducting agent containing the trivalent or pentavalent metal, or by adjusting the firing temperature. With this method, it is difficult to obtain a sufficiently low ρr.t. Additionally, in order to reduce ρr.t, there is a method of firing semiconductor raw material components in a neutral or reducing atmosphere, but although this method reduces ρr.t,
At the same time, the resistivity at high temperatures also decreases, and the PTC characteristics disappear. Furthermore, there is a method of adding a substance that forms ions such as Mn 2 + to the semiconductor raw material components to obtain a large ρmax, but a very small change in the amount added can greatly increase the ρr.t. This makes it extremely difficult to adjust the amount added. [Problems to be solved by the invention] The present invention overcomes the above conventional problems, and
The present invention aims to provide a method for easily manufacturing barium titanate-based semiconductors with excellent PTC characteristics. [Means for Solving the Problems] The method for manufacturing a barium titanate-based semiconductor of the present invention comprises adding nylon to raw materials consisting of barium titanate and a semiconducting agent in the form of a powder, a thin film, or a solution in which the semiconductor is dissolved in a solvent. It is characterized in that it is added in the form of at least one of the above and then fired. In the present invention, barium titanate is
It is represented by the structural formula BaTiO 3 and forms the main body of the semiconductor. Further, a semiconducting agent is added in a small amount to this barium titanate to lower the resistance of barium titanate, which is normally an insulator, and to make it a semiconductor. As the semiconductor agent, yttrium (Y),
It is a commonly used semiconductor converting agent for compounds containing trivalent metals such as lanthanum (La) and antimony (Sb) or pentavalent metals such as niobium (Nb) and tantalum (Ta). For example, those containing trivalent metals include Y 2 O 3 , La 2 O 3 , Sb 2 O 3 and the like. As it has,
Examples include Nb 2 O 5 , Ta 2 O 5 , etc., and one of these
Use one or more species. The amount of the above-mentioned semiconducting agent may be within the range of the amount generally used when forming a semiconductor, but it is preferable to mix 0.2 to 0.4 atomic percent of the semiconducting agent to barium titanate at room temperature. Good for obtaining semiconductors with low resistivity. The raw material component may be formed by simply mixing barium titanate and a semiconducting agent, or barium titanate may be formed by forming a carbonate containing Ba, Ti,
oxides or organic compounds, e.g. BaCO 3 and
It is obtained by heating TiO 2 , BaTiO(C 2 O 4 ) 2.4H 2 O, etc. as a starting material, and by mixing the starting material and a semiconducting agent, and then applying calcination, etc. A raw material component according to the present invention in which BaTiO 3 and a semiconducting agent are mixed may be formed by performing the following steps. The raw material component consisting of barium titanate and the semiconducting agent may be in powder form or may be previously formed into a desired shape. In the present invention, nylon is added to the above raw material components. The nylon to be added is generally referred to as polyamide, such as 6-nylon, 6-nylon,
These include 6-nylon and 12-nylon, and any of these may be used alone, as a copolymer, or as a modified version thereof. The form thereof may be fine powder, film, or solution dissolved in a solvent, but fine powder or solution is preferable from the viewpoint of ease of operation. The step of adding nylon to the raw material components may be any method as long as the nylon is mixed uniformly. For example, when the raw material is in powder form, a solution of a predetermined amount of nylon dissolved in a solvent that dissolves nylon, such as alcohol, formic acid, or metacresol, is sprinkled onto the raw material or kneaded with the raw material, and then dried. There is also a method in which nylon is made into a fine powder or thin film, water or a suitable mixed solvent is added to the raw material, and then the water or mixed medium is removed. There is. Alternatively, there is a method in which the raw material components are preformed, the molded body is impregnated with an organic solution in which nylon is dissolved, and then the organic solvent is removed. In addition, in the above-mentioned impregnation method, the shaping of the raw material components in advance is carried out by pressing,
The sintering may be carried out by slip casting or the like, and preliminary sintering may be carried out at a lower temperature than the main sintering temperature in order to prevent deformation of the compact during impregnation. The proportion of nylon added to the raw material components is preferably within the range of 0.2 to 8% by weight based on the raw material components.
If the addition ratio is less than 0.2% by weight or more than 8% by weight, it is difficult to obtain a sufficiently low room temperature resistivity (ρr.t) as a semiconductor. Next, press the raw materials to which nylon has been added,
After being formed by slip casting or the like, the final firing is performed in an oxidizing atmosphere. Note that when nylon is added by the impregnation method, the raw material components have already been shaped, so the main firing is performed as they are. Through this main firing, a barium titanate-based semiconductor is obtained. The firing atmosphere is an oxidizing atmosphere such as oxygen or air. In a neutral or reducing atmosphere,
It degrades the PTC characteristics of semiconductors. Also,
The firing temperature is preferably within the range of 1250 to 1400°C.
If the temperature is less than 1250°C, no semiconductor formation occurs, and if the temperature exceeds 1400°C, the resistivity (ρr.t) at room temperature may increase. Moreover, the firing time may be within the range of 1 to 2 hours. It should be noted that almost all of the nylon added by this firing is removed from the semiconductor by evaporation or thermal decomposition. [Effects of the Invention] According to the present invention, the room temperature resistivity (ρr.t) is small and ρmax/ρr.t is large, that is, PTC
A barium titanate-based semiconductor with excellent properties can be manufactured. Although the mechanism of action by which the above effects are obtained is not clear, it can be inferred as follows. In the present invention, the added nylon causes thermal decomposition during firing of the semiconductor, and active gases such as nascent nitrogen (N 2 ) and carbon monoxide (CO) are generated. This active gas acts on BaTiO 3 and introduces oxygen defects into it, reducing the overall resistance value, ie, the room temperature resistivity. Furthermore, this active gas is
It is thought that it reacts with BaTiO 3 and contributes to the formation of an intermediate phase. This intermediate phase promotes the formation of a barrier by diffusion of impurities or oxygen to grain boundaries,
It is thought that this improves the PTC characteristics. Further, according to the present invention, a barium titanate-based semiconductor having excellent PTC characteristics can be easily manufactured without requiring complicated operations. [Examples] Examples of the present invention will be described below. Example 1 BaTiO 3 as starting material and semiconducting agent
BaCO 3 , TiO 2 , and Y 2 O 3 were mixed at a composition ratio of Ba 0.997 Y 0.003 TiO 3 , and the mixture was heated in the air at 1100°C.
It was calcined for 2 hours and then ground to form a powdered raw material component. An ethanol solution in which soluble nylon (manufactured by Toray Industries, Ltd., CM4000) was dissolved was added to the above raw material components and mixed in a ball mill. The amount added is within the range of 0 to 10% by weight (hereinafter referred to as ωt%) of nylon based on the raw material components (for comparison, a product without nylon was also prepared). Dry the thing to evaporate the solvent ethanol and use a mold to make a diameter 20
The molded body was molded into a disk shape with a thickness of about 3 mm, and the molded body was heated in the atmosphere at two temperatures of 1300℃ and 1350℃ for 1 hour.
Fired. The obtained sintered body was electrolessly plated with Ni as an electrode, and the electrical resistance of the sintered body was measured.The electrical resistance was measured in the air at a temperature ranging from room temperature to 400°C. The results are shown in FIGS. 1 and 2. Here, FIG. 1 shows the relationship between the amount of nylon added and the room temperature resistivity (ρr.t), and curves A and B in the figure are for firing temperatures of 1300°C and 1350°C, respectively. As is clear from Figure 1, by adding nylon, the room temperature resistivity decreases, especially from 0.2 to
It can be seen that by adding 8ωt% nylon, a material with extremely low room temperature resistivity can be obtained. Figure 2 shows PTC with a firing temperature of 1350℃.
It is a characteristic curve. Note that the curves M, N, and O are those in which the amount of nylon added is 0, 0.4, and 8 ωt%, respectively. Table 1 shows ρmax/ρr.t at a sintering temperature of 1350°C and with nylon addition amounts of 0, 0.4, 4, and 8ωt%, respectively. As is clear from FIG. 2 and Table 1, the ratio of ρmax/ρr.t increases by adding nylon.
【表】
以上のように、本発明により製造されたチタン
酸バリウム系半導体は優れたPTC特性を有する
ことが分る。
実施例 2
本実施例では、ナイロンを薄膜ないし微粉末状
で添加した例を示す。
実施例1と同様な可溶性ナイロンのエタノール
溶液にイオン交換水を注入し、薄いフイルム状な
いし微粉末状のナイロンを形成した。
これを実施例1と同様な粉末状の原料成分に、
同様な条件下で添加した。なおナイロン添加量は
0.4ωt%とした。
このナイロンを添加したものを実施例1と同様
にして成形し、1350℃、1hr大気中にて焼成した。
形成されたチタン酸バリウム系半導体の抵抗を
測定したところ、ρr.tは3Ω・cmと低い値であり、
ρmax/ρr.tの比は1.8×103と高い値(ナイロン無
添加の場合ρmax/ρr.tは1.6×101である。)であ
り、PTC特性に優れたものであることが分る。
実施例 3
本実施例では、6−ナイロンまたは6、6−ナ
イロンを使用した例について示す。
6−ナイロンまたは6、6−ナイロンのペレツ
トを液体窒素中に浸漬した後、ハンマーミルにて
粉砕し、粒径約30μmの微粉末にした。
これを実施例1と同様な粉末状の原料成分に、
同様な条件で添加した。なお、ナイロン添加量は
1ωt%とした。
このナイロンを添加したものを実施例1と同様
にして成形し、1350℃、1hr大気中にて焼成した。
形成されたチタン酸バリウム系半導体の抵抗を
測定したところ、6−ナイロンを添加したものは
ρr.t=4.2Ω・cm、ρmax/ρr.t=2×103、6、6
−ナイロンを添加したものはρr.t=4.8Ω・cm、
ρmax/ρr.t=2.103であり、PTC特性に優れたも
のであることが分る。
実施例 4
本実施例では、ナイロン添加前に原料成分を成
形し、その後含浸法によりナイロンを添加した例
を示す。
実施例1と同様な原料成分を実施例1の同様な
円板状にプレス成形し、1100℃、大気中にて仮焼
結した。
また、上記仮焼結体に対して添加量が1ωt%と
なるように秤量した可溶性ナイロンをエタノール
に溶解した。
次に、この溶液に上記仮焼結体を浸漬し、溶液
を含浸せしめた。この仮焼結体を乾燥させ、エタ
ノールを蒸発させた後、大気中、1300℃で1hr焼
成した。
形成されたチタン酸バリウム系半導体の抵抗を
測定したところ、ρr.t=4Ω・cm、ρmax/ρr.t=
1.5×103であり、PTC特性に優れたものであるこ
とが分る。[Table] As described above, it can be seen that the barium titanate-based semiconductor manufactured according to the present invention has excellent PTC characteristics. Example 2 This example shows an example in which nylon was added in the form of a thin film or fine powder. Ion-exchanged water was injected into the same ethanol solution of soluble nylon as in Example 1 to form nylon in the form of a thin film or fine powder. This was mixed into powdered raw material components similar to those in Example 1.
Added under similar conditions. The amount of nylon added is
It was set to 0.4ωt%. This nylon-added product was molded in the same manner as in Example 1 and fired in the atmosphere at 1350°C for 1 hour. When we measured the resistance of the formed barium titanate semiconductor, we found that ρr.t was a low value of 3Ω・cm.
The ratio of ρmax/ρr.t is a high value of 1.8×10 3 (ρmax/ρr.t is 1.6×10 1 when nylon is not added), indicating that it has excellent PTC characteristics. . Example 3 This example shows an example using 6-nylon or 6,6-nylon. Pellets of 6-nylon or 6,6-nylon were immersed in liquid nitrogen and then ground in a hammer mill to form a fine powder with a particle size of about 30 μm. This was mixed into powdered raw material components similar to those in Example 1.
It was added under the same conditions. In addition, the amount of nylon added is
It was set to 1ωt%. This nylon-added product was molded in the same manner as in Example 1 and fired in the atmosphere at 1350°C for 1 hour. When the resistance of the formed barium titanate semiconductor was measured, the one with 6-nylon added had ρr.t=4.2Ω・cm, ρmax/ρr.t=2×10 3 , 6,6
−For those with nylon added, ρr.t=4.8Ω・cm,
ρmax/ρr.t= 2.103 , indicating that the PTC characteristics are excellent. Example 4 This example shows an example in which the raw material components were molded before adding nylon, and then nylon was added by an impregnation method. The same raw material components as in Example 1 were press-molded into the same disc shape as in Example 1, and pre-sintered at 1100°C in the atmosphere. Further, soluble nylon was weighed and dissolved in ethanol so that the amount added to the temporary sintered body was 1 ωt%. Next, the temporary sintered body was immersed in this solution to impregnate it with the solution. After drying this pre-sintered body and evaporating the ethanol, it was fired at 1300° C. for 1 hour in the air. When the resistance of the formed barium titanate semiconductor was measured, ρr.t=4Ω・cm, ρmax/ρr.t=
1.5×10 3 , which shows that it has excellent PTC characteristics.
第1図は実施例1におけるチタン酸バリウム系
半導体のナイロン添加量と室温抵抗率との関係を
示す図であり、第2図は実施例1におけるチタン
酸バリウム系半導体のPTC特性曲線を示す図で
ある。
FIG. 1 is a diagram showing the relationship between the amount of nylon added and the room temperature resistivity of the barium titanate-based semiconductor in Example 1, and FIG. 2 is a diagram showing the PTC characteristic curve of the barium titanate-based semiconductor in Example 1. It is.
Claims (1)
料成分にナイロンを粉末状、薄膜状、または溶媒
に溶解した溶液のうちの少なくとも1種の形状で
添加し、これを焼成することを特徴とするチタン
酸バリウム系半導体の製造方法。 2 上記ナイロンは、原料成分に対して0.2〜8
重量%添加する特許請求の範囲第1項記載のチタ
ン酸バリウム系半導体の製造方法。 3 上記半導体化剤は、イツトリウム、ランタ
ン、アンチモン等の3価の金属またはニオブ、タ
ンタル等の5価の金属を有する化合物である特許
請求の範囲第1項記載のチタン酸バリウム系半導
体の製造方法。[Claims] 1. Adding nylon in the form of at least one of a powder, a thin film, or a solution dissolved in a solvent to a raw material component consisting of barium titanate and a semiconducting agent, and firing this. A method for manufacturing a barium titanate semiconductor, characterized by: 2 The above nylon has a ratio of 0.2 to 8 based on the raw material components.
A method for producing a barium titanate-based semiconductor according to claim 1, in which the amount by weight is added. 3. The method for producing a barium titanate semiconductor according to claim 1, wherein the semiconductor agent is a compound containing a trivalent metal such as yttrium, lanthanum, and antimony, or a pentavalent metal such as niobium and tantalum. .
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60062675A JPS61220305A (en) | 1985-03-26 | 1985-03-26 | Manufacturing method of barium titanate semiconductor |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60062675A JPS61220305A (en) | 1985-03-26 | 1985-03-26 | Manufacturing method of barium titanate semiconductor |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61220305A JPS61220305A (en) | 1986-09-30 |
| JPH0311082B2 true JPH0311082B2 (en) | 1991-02-15 |
Family
ID=13207090
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP60062675A Granted JPS61220305A (en) | 1985-03-26 | 1985-03-26 | Manufacturing method of barium titanate semiconductor |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61220305A (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI409829B (en) * | 2010-09-03 | 2013-09-21 | Sfi Electronics Technology Inc | Zno varistor utilized in high temperature |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS511442B2 (en) * | 1972-09-05 | 1976-01-17 |
-
1985
- 1985-03-26 JP JP60062675A patent/JPS61220305A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS61220305A (en) | 1986-09-30 |
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