JPH032456B2 - - Google Patents
Info
- Publication number
- JPH032456B2 JPH032456B2 JP20849486A JP20849486A JPH032456B2 JP H032456 B2 JPH032456 B2 JP H032456B2 JP 20849486 A JP20849486 A JP 20849486A JP 20849486 A JP20849486 A JP 20849486A JP H032456 B2 JPH032456 B2 JP H032456B2
- Authority
- JP
- Japan
- Prior art keywords
- weight
- parts
- antistatic
- hydrogen
- properties
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000000178 monomer Substances 0.000 claims description 35
- 229920001577 copolymer Polymers 0.000 claims description 31
- 229920000642 polymer Polymers 0.000 claims description 16
- 125000001453 quaternary ammonium group Chemical group 0.000 claims description 16
- 229920001515 polyalkylene glycol Polymers 0.000 claims description 14
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 12
- 229910052739 hydrogen Inorganic materials 0.000 claims description 12
- 239000001257 hydrogen Substances 0.000 claims description 12
- 239000011342 resin composition Substances 0.000 claims description 12
- 125000000217 alkyl group Chemical group 0.000 claims description 10
- 125000004432 carbon atom Chemical group C* 0.000 claims description 9
- 229920002554 vinyl polymer Polymers 0.000 claims description 8
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 claims description 7
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 claims description 6
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 5
- 150000007522 mineralic acids Chemical class 0.000 claims description 3
- 150000007524 organic acids Chemical group 0.000 claims description 3
- 125000001424 substituent group Chemical group 0.000 claims description 3
- 150000001450 anions Chemical class 0.000 claims description 2
- 238000002156 mixing Methods 0.000 claims description 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 2
- 239000000113 methacrylic resin Substances 0.000 description 25
- 239000002202 Polyethylene glycol Substances 0.000 description 18
- 238000000034 method Methods 0.000 description 18
- 229920001223 polyethylene glycol Polymers 0.000 description 18
- LCGLNKUTAGEVQW-UHFFFAOYSA-N Dimethyl ether Chemical compound COC LCGLNKUTAGEVQW-UHFFFAOYSA-N 0.000 description 13
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 12
- 239000002216 antistatic agent Substances 0.000 description 9
- 230000000052 comparative effect Effects 0.000 description 8
- 239000008188 pellet Substances 0.000 description 8
- -1 alkyl methacrylates Chemical class 0.000 description 7
- 239000000203 mixture Substances 0.000 description 7
- 230000000704 physical effect Effects 0.000 description 7
- SOGAXMICEFXMKE-UHFFFAOYSA-N Butylmethacrylate Chemical compound CCCCOC(=O)C(C)=C SOGAXMICEFXMKE-UHFFFAOYSA-N 0.000 description 5
- 230000003750 conditioning effect Effects 0.000 description 5
- 238000002347 injection Methods 0.000 description 5
- 239000007924 injection Substances 0.000 description 5
- 229920001451 polypropylene glycol Polymers 0.000 description 5
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 description 4
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 4
- BAPJBEWLBFYGME-UHFFFAOYSA-N Methyl acrylate Chemical compound COC(=O)C=C BAPJBEWLBFYGME-UHFFFAOYSA-N 0.000 description 4
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 4
- 238000001746 injection moulding Methods 0.000 description 4
- 238000005259 measurement Methods 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- SJIXRGNQPBQWMK-UHFFFAOYSA-N 2-(diethylamino)ethyl 2-methylprop-2-enoate Chemical compound CCN(CC)CCOC(=O)C(C)=C SJIXRGNQPBQWMK-UHFFFAOYSA-N 0.000 description 3
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 3
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 3
- 238000000137 annealing Methods 0.000 description 3
- 239000003963 antioxidant agent Substances 0.000 description 3
- 239000003795 chemical substances by application Substances 0.000 description 3
- NEHMKBQYUWJMIP-UHFFFAOYSA-N chloromethane Chemical compound ClC NEHMKBQYUWJMIP-UHFFFAOYSA-N 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 230000001143 conditioned effect Effects 0.000 description 3
- VAYGXNSJCAHWJZ-UHFFFAOYSA-N dimethyl sulfate Chemical compound COS(=O)(=O)OC VAYGXNSJCAHWJZ-UHFFFAOYSA-N 0.000 description 3
- 230000001771 impaired effect Effects 0.000 description 3
- 238000004898 kneading Methods 0.000 description 3
- 238000000465 moulding Methods 0.000 description 3
- 238000006116 polymerization reaction Methods 0.000 description 3
- 229910052709 silver Inorganic materials 0.000 description 3
- 239000004332 silver Substances 0.000 description 3
- 239000000243 solution Substances 0.000 description 3
- 238000003756 stirring Methods 0.000 description 3
- 238000009864 tensile test Methods 0.000 description 3
- 238000005406 washing Methods 0.000 description 3
- HBXWUCXDUUJDRB-UHFFFAOYSA-N 1-octadecoxyoctadecane Chemical compound CCCCCCCCCCCCCCCCCCOCCCCCCCCCCCCCCCCCC HBXWUCXDUUJDRB-UHFFFAOYSA-N 0.000 description 2
- QHVBLSNVXDSMEB-UHFFFAOYSA-N 2-(diethylamino)ethyl prop-2-enoate Chemical compound CCN(CC)CCOC(=O)C=C QHVBLSNVXDSMEB-UHFFFAOYSA-N 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 2
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 2
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 description 2
- VQTUBCCKSQIDNK-UHFFFAOYSA-N Isobutene Chemical compound CC(C)=C VQTUBCCKSQIDNK-UHFFFAOYSA-N 0.000 description 2
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 2
- 125000005250 alkyl acrylate group Chemical group 0.000 description 2
- 150000001348 alkyl chlorides Chemical class 0.000 description 2
- 150000001412 amines Chemical class 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- DENRZWYUOJLTMF-UHFFFAOYSA-N diethyl sulfate Chemical compound CCOS(=O)(=O)OCC DENRZWYUOJLTMF-UHFFFAOYSA-N 0.000 description 2
- 229940008406 diethyl sulfate Drugs 0.000 description 2
- 239000000428 dust Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- SUPCQIBBMFXVTL-UHFFFAOYSA-N ethyl 2-methylprop-2-enoate Chemical compound CCOC(=O)C(C)=C SUPCQIBBMFXVTL-UHFFFAOYSA-N 0.000 description 2
- 238000001125 extrusion Methods 0.000 description 2
- 238000010528 free radical solution polymerization reaction Methods 0.000 description 2
- 239000012299 nitrogen atmosphere Substances 0.000 description 2
- KZCOBXFFBQJQHH-UHFFFAOYSA-N octane-1-thiol Chemical compound CCCCCCCCS KZCOBXFFBQJQHH-UHFFFAOYSA-N 0.000 description 2
- 230000000379 polymerizing effect Effects 0.000 description 2
- 150000003459 sulfonic acid esters Chemical class 0.000 description 2
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 2
- FFJCNSLCJOQHKM-CLFAGFIQSA-N (z)-1-[(z)-octadec-9-enoxy]octadec-9-ene Chemical compound CCCCCCCC\C=C/CCCCCCCCOCCCCCCCC\C=C/CCCCCCCC FFJCNSLCJOQHKM-CLFAGFIQSA-N 0.000 description 1
- DURPTKYDGMDSBL-UHFFFAOYSA-N 1-butoxybutane Chemical compound CCCCOCCCC DURPTKYDGMDSBL-UHFFFAOYSA-N 0.000 description 1
- DKZRLCHWDNEKRH-UHFFFAOYSA-N 1-nonoxynonane Chemical compound CCCCCCCCCOCCCCCCCCC DKZRLCHWDNEKRH-UHFFFAOYSA-N 0.000 description 1
- VKDHHIOILCFABI-UHFFFAOYSA-N 2-(2,2-dihydroxyethylamino)ethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCNCC(O)O VKDHHIOILCFABI-UHFFFAOYSA-N 0.000 description 1
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- JAHNSTQSQJOJLO-UHFFFAOYSA-N 2-(3-fluorophenyl)-1h-imidazole Chemical compound FC1=CC=CC(C=2NC=CN=2)=C1 JAHNSTQSQJOJLO-UHFFFAOYSA-N 0.000 description 1
- OEPOKWHJYJXUGD-UHFFFAOYSA-N 2-(3-phenylmethoxyphenyl)-1,3-thiazole-4-carbaldehyde Chemical compound O=CC1=CSC(C=2C=C(OCC=3C=CC=CC=3)C=CC=2)=N1 OEPOKWHJYJXUGD-UHFFFAOYSA-N 0.000 description 1
- JKNCOURZONDCGV-UHFFFAOYSA-N 2-(dimethylamino)ethyl 2-methylprop-2-enoate Chemical compound CN(C)CCOC(=O)C(C)=C JKNCOURZONDCGV-UHFFFAOYSA-N 0.000 description 1
- DPBJAVGHACCNRL-UHFFFAOYSA-N 2-(dimethylamino)ethyl prop-2-enoate Chemical compound CN(C)CCOC(=O)C=C DPBJAVGHACCNRL-UHFFFAOYSA-N 0.000 description 1
- OBMRSUNAEQGDLK-UHFFFAOYSA-N 2-(dipropylamino)ethyl 2-methylprop-2-enoate Chemical compound CCCN(CCC)CCOC(=O)C(C)=C OBMRSUNAEQGDLK-UHFFFAOYSA-N 0.000 description 1
- GOXQRTZXKQZDDN-UHFFFAOYSA-N 2-Ethylhexyl acrylate Chemical compound CCCCC(CC)COC(=O)C=C GOXQRTZXKQZDDN-UHFFFAOYSA-N 0.000 description 1
- WDQMWEYDKDCEHT-UHFFFAOYSA-N 2-ethylhexyl 2-methylprop-2-enoate Chemical compound CCCCC(CC)COC(=O)C(C)=C WDQMWEYDKDCEHT-UHFFFAOYSA-N 0.000 description 1
- WWJCRUKUIQRCGP-UHFFFAOYSA-N 3-(dimethylamino)propyl 2-methylprop-2-enoate Chemical compound CN(C)CCCOC(=O)C(C)=C WWJCRUKUIQRCGP-UHFFFAOYSA-N 0.000 description 1
- OAKUJYMZERNLLT-UHFFFAOYSA-N 4-(dimethylamino)butyl 2-methylprop-2-enoate Chemical compound CN(C)CCCCOC(=O)C(C)=C OAKUJYMZERNLLT-UHFFFAOYSA-N 0.000 description 1
- 229920005509 ACRYPET® VH Polymers 0.000 description 1
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 1
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 1
- JIGUQPWFLRLWPJ-UHFFFAOYSA-N Ethyl acrylate Chemical compound CCOC(=O)C=C JIGUQPWFLRLWPJ-UHFFFAOYSA-N 0.000 description 1
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 1
- 229920000297 Rayon Polymers 0.000 description 1
- RJFAYQIBOAGBLC-BYPYZUCNSA-N Selenium-L-methionine Chemical compound C[Se]CC[C@H](N)C(O)=O RJFAYQIBOAGBLC-BYPYZUCNSA-N 0.000 description 1
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 1
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 description 1
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 1
- 239000006096 absorbing agent Substances 0.000 description 1
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 125000006177 alkyl benzyl group Chemical group 0.000 description 1
- 150000001347 alkyl bromides Chemical class 0.000 description 1
- 150000008051 alkyl sulfates Chemical class 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 230000003078 antioxidant effect Effects 0.000 description 1
- 229940073608 benzyl chloride Drugs 0.000 description 1
- 238000012662 bulk polymerization Methods 0.000 description 1
- CQEYYJKEWSMYFG-UHFFFAOYSA-N butyl acrylate Chemical compound CCCCOC(=O)C=C CQEYYJKEWSMYFG-UHFFFAOYSA-N 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 125000004915 dibutylamino group Chemical group C(CCC)N(CCCC)* 0.000 description 1
- OWMBTIRJFMGPAC-UHFFFAOYSA-N dimethylamino 2-methylprop-2-enoate Chemical compound CN(C)OC(=O)C(C)=C OWMBTIRJFMGPAC-UHFFFAOYSA-N 0.000 description 1
- 239000000975 dye Substances 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 125000002573 ethenylidene group Chemical group [*]=C=C([H])[H] 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 239000001530 fumaric acid Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 1
- 239000003999 initiator Substances 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- 239000011976 maleic acid Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- QZIQJVCYUQZDIR-UHFFFAOYSA-N mechlorethamine hydrochloride Chemical compound Cl.ClCCN(C)CCCl QZIQJVCYUQZDIR-UHFFFAOYSA-N 0.000 description 1
- 150000002734 metacrylic acid derivatives Chemical class 0.000 description 1
- FQPSGWSUVKBHSU-UHFFFAOYSA-N methacrylamide Chemical compound CC(=C)C(N)=O FQPSGWSUVKBHSU-UHFFFAOYSA-N 0.000 description 1
- VUQUOGPMUUJORT-UHFFFAOYSA-N methyl 4-methylbenzenesulfonate Chemical compound COS(=O)(=O)C1=CC=C(C)C=C1 VUQUOGPMUUJORT-UHFFFAOYSA-N 0.000 description 1
- CZXGXYBOQYQXQD-UHFFFAOYSA-N methyl benzenesulfonate Chemical compound COS(=O)(=O)C1=CC=CC=C1 CZXGXYBOQYQXQD-UHFFFAOYSA-N 0.000 description 1
- 229940050176 methyl chloride Drugs 0.000 description 1
- MBABOKRGFJTBAE-UHFFFAOYSA-N methyl methanesulfonate Chemical compound COS(C)(=O)=O MBABOKRGFJTBAE-UHFFFAOYSA-N 0.000 description 1
- LVHBHZANLOWSRM-UHFFFAOYSA-N methylenebutanedioic acid Natural products OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 150000002825 nitriles Chemical class 0.000 description 1
- NWVVVBRKAWDGAB-UHFFFAOYSA-N p-methoxyphenol Chemical compound COC1=CC=C(O)C=C1 NWVVVBRKAWDGAB-UHFFFAOYSA-N 0.000 description 1
- 239000005022 packaging material Substances 0.000 description 1
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 description 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-N phosphoric acid Substances OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 1
- OJMIONKXNSYLSR-UHFFFAOYSA-N phosphorous acid Chemical compound OP(O)O OJMIONKXNSYLSR-UHFFFAOYSA-N 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 238000009832 plasma treatment Methods 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 229920001748 polybutylene Polymers 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- HJWLCRVIBGQPNF-UHFFFAOYSA-N prop-2-enylbenzene Chemical compound C=CCC1=CC=CC=C1 HJWLCRVIBGQPNF-UHFFFAOYSA-N 0.000 description 1
- 239000002964 rayon Substances 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 238000007493 shaping process Methods 0.000 description 1
- 239000002210 silicon-based material Substances 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 125000005504 styryl group Chemical group 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-N sulfuric acid Substances OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 239000004753 textile Substances 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- WVLBCYQITXONBZ-UHFFFAOYSA-N trimethyl phosphate Chemical compound COP(=O)(OC)OC WVLBCYQITXONBZ-UHFFFAOYSA-N 0.000 description 1
- 238000004506 ultrasonic cleaning Methods 0.000 description 1
Landscapes
- Compositions Of Macromolecular Compounds (AREA)
Description
〔産業上の利用分野〕
本発明は良好且つ永久的な帯電防止性を有する
透明性の優れた樹脂組成物に関する。
〔従来の技術〕
一般にメタクリル樹脂は電気抵抗値が大きく、
摩擦、はくり等によつて容易に帯電しやすく、そ
のためゴミやほこりを吸引して外観をそこねる等
成形品、シート、フイルム、繊維等の分野で様々
なトラブルの原因となつている。
また最近では、エレクトロニクス部品の運搬用
コンテナーや包装材で、信頼性の高い帯電防止材
料が求められている。
メタクリル樹脂に制電性を付与するには一般的
に
1 帯電防止剤の内部練り込み法
2 帯電防止剤の表面塗布法
の二種類の方法がもちいられている。他にもシリ
コン系化合物の表面塗布法、又はメタクリル樹脂
表面構造の改質、すなわちプラズマ処理等がある
が、いずれも高価なものとなる。
帯電防止剤の内部練り込み法では、一般的に低
分子の界面活性剤が用いられるが、この方法では
恒久的な帯電防止性を付与することが困難であ
り、表面に存在する帯電防止剤を水洗、摩擦等の
手段で除いてしまうと制電性が失なわれてしま
う。又、特開昭55−36237で見られる様に制電性
ゴムを用いる方法があるが、添加量を多くする必
要があり、そうするとメタクリル樹脂本来の耐熱
性等の物性が低下する上にこの方法では表面抵抗
率もたかだか1011Ω程度であるので満足できな
い。
帯電防止剤の表面塗布法は、表面抵抗率109Ω
程度と非常に良好な制電性を示すが、帯電防止剤
が表層のみにしか存在しないために水洗、摩擦等
によつて制電性は簡単に失われてしまう。その上
内部練り込み法と違つて表面塗布工程を必要とす
るのでコスト高となつてしまう。
〔発明が解決しようとする問題点〕
以上説明した様に、特別な工程を必要とせず、
少量の添加量で良好な制電性を永久的に示し且つ
メタクリル樹脂本来の物性も低下させない帯電防
止剤は従来提案されていない。
〔問題点を解決するための手段〕
本発明者等は、洗浄によつて制電性が低下せず
且つ良好な恒久制電性を有し、メタクリル樹脂本
来の透明性、耐熱性等の物性を落とさないメタク
リル樹脂を作ることを目的として鋭意検討の結
果、ある種の四級アンモニウム塩基を持ち且つ化
学的に結合されたポリアルキレングリコールを持
つ共重合体を少量添加することにより、メタクリ
ル樹脂に対して良好で且つ恒久的な制電性をメタ
クリル樹脂本来の物性を損なわずに付与出来るこ
とを見出した。
すなわち本発明は、メチルメタクリレート系重
合体()100重量部に対し、一般式
(ただし、R1は水素又はメチル基、R2〜R4は水
素又は置換基を有していても良い炭素数1〜9の
アルキル基、mは1〜10の整数、X-は一価の無
機又は有機の酸基か、無機酸又は有機酸の相応す
る等価物を表す。)
で表される四級アンモニウム塩基を有する単量体
成分20〜90重量%、共重合可能でポリアルキレン
グリコール成分を有する単量体成分10〜80重量
%、共重合可能なビニル系単量体成分0〜70重量
%からなる共重合体()を、0.1〜40重量部混
合してなる帯電防止性および透明性の優れた樹脂
組成物、
に関するものである。
上記四級アンモニウム塩基のカウンターアニオ
ン(X-)は一般式
R8SO3 -もしくはR8OSO3 -
(ただし、R8は水素又は炭素数1〜20のフエニ
ル基を含んでいてもよいアルキル基)
で表されるものが望ましい。
本発明におけるメチルメタクリレート系重合体
()は、メチルメタクリレート単位50重量%以
上と他の共重合性の単量体単位50重量%以下とか
らなる重合体である。メチルメタクリレートと共
重合性の単量体としては、エチルメタクリレー
ト、ブチルメタクリレート、2−エチルヘキシル
メタクリレート等のアルキルメタクリレート類、
メチルアクリレート、エチルアクリレート、ブチ
ルアクリレート、2−エチルヘキシルアクリレー
ト等のアルキルアクリレート類、スチレン、アク
リロニトリル、メタクリル酸、アルキル酸、イタ
コン酸、マレイン酸、フマル酸、ビニルトルエン
等が挙げられ、好ましくはメチルアクリレートな
どのアルキルアクリレート類およびスチレンが挙
げられる。
又、重合体()は25℃トルエン溶媒における
極限粘度が0.4〜0.8dl/gであることが好まし
い。
本発明における共重合体()中の四級アンモ
ニウム塩基を有するユニツトは、一般式
(ただし、R1は水素又はメチル基、R2〜R4は水
素又は置換器を有していてもよい炭素数1〜9の
アルキル基、mは1〜10の整数、X-は一価の無
機又は有機の酸基か、無機又は有機酸の相応する
等価物を表す。)で表され、
これはアミンを有するメタクリレートもしくは
アクリレートが四級化剤によつて四級化されたも
のである。アミンを有するメタクリレートもしく
はアクリレートとしては、ジメチルアミノメタク
リレート、ジエチルアミノエチルメタクリレー
ト、ジメチルアミノプロピルメタクリレート、ジ
メチルアミノエチルアクリレート、ジエチルアミ
ノエチルアクリレート、ジメチルアミノブチルメ
タクリレート、ジヒドロキシエチルアミノエチル
メタクリレート、ジプロピルアミノエチルメタク
リレート、ジブチルアミノエチルメタクリレート
等が挙げられる。
四級化剤としては、ジメチル硫酸、ジエチル硫
酸、ジプロピル硫酸等のアルキル硫酸類、p−ト
ルエンスルホン酸メチル、ベンゼンスルホン酸メ
チル等のスルホン酸エステル、ジメチル亜硫酸等
のアルキル亜硫酸、トリメチルホスフエイト等の
アルキルリン酸、アルキルベンジルクロライド、
アルキルクロライド、アルキルクロライド、アル
キルブロマイド等の各種ハライドが用いられ、特
にアルキル硫酸、スルホン酸エステルが耐熱分解
性の点より好ましい。一般式中のmは1〜10の整
数であるが、2〜6が特に好ましい。
本発明において使用される共重合可能でポリア
ルキレングリコール成分を有する単量体成分とし
ては、末端スチリルのポリアルキレングリコール
マクロマー、末端ビニルのポリアルキレングリコ
ールマクロマー等が使用できるが、特に好ましい
単量体成分は一般式
(ただし、R5は水素又はメチル基、R6は枝分か
れしていてもよい炭素数4以下のアルキル基、
R7は水素又は炭素数1〜20のアルキル基、nは
1〜500の整数)
で表され、これは末端メタクリレート又はアクリ
レートのポリアルキレングリコールマクロマーで
ある。その例としては、ポリエチレングリコール
(4)モノメタクリレート、ポリエチレングリコール
(23)モノメタクリレート、ポリエチレングリコ
ール(300)モノメタクリレート、ポリエチレン
グリコール(23)モノアクリレート、ポリプロピ
レングリコール(23)モノメタクリレート、ポリ
プロピレングリコール(23)モノアクリレート、
ポリエチレングリコール(23)モノメタクリレー
トモノメチルエーテル、ポリエチレングリコール
(23)モノメタクリレートモノブチルエーテル、
ポリプロピレングリコール(23)モノアクリレー
トモノメチルエーテル、ポリエチレングリコール
(23)モノメタクリレートモノノニルエーテル、
ポリエチレングリコール(23)モノメタクリレー
トモノステアリルエーテル、ポリプロピレングリ
コール(23)モノメタクリレートモノメチルエー
テル、ポリエチレングリコール(4)モノメタクリレ
ートモノメチルエーテル、ポリエチレングリコー
ル(9)モノメタクリレートモノメチルエーテル、ポ
リエチレングリコール(300)モノメタクリレー
トモノメチルエーテル、ポリエチレングリコール
(23)モノメタクリレートモノオレイルエーテル
等(カツコ内はポリアルキレングリコールユニツ
トの数)が挙げられる。
本発明における共重合可能なビニル系単量体と
しては、公知の単量体、例えばメタクリル酸アル
キルエステル、アクリル酸アルキルエステル、ア
クリル酸、メタクリル酸、アクリルアミド、メタ
クリルアミド、酢酸ビニル、不飽和ニトリル、芳
香族ビニル、アルキルビニルエーテル、アルキル
ビニルケトン、2−ヒドロキシアルキル(メタ)
アクリレート、塩化ビニル、塩化ビニリデン、イ
ソブテン、2−アシツドホスフオキシエチル(メ
タ)アクリレート等の1種又はそれ以上の単量体
が使用できる。
本発明における共重合体()の組成は、四級
アンモニウム塩基を有する単量体成分が20〜90重
量%、共重合可能でポリアルキレングリコール成
分を有する単量体成分が10〜80重量%、共重合可
能なビニル系単量体が0〜70重量%であり、より
好ましくは四級アンモニウム塩基を有する単量体
成分が30〜80重量%、共重合可能でポリアルキレ
ングリコール成分を有する単量体成分が20〜70重
量%、共重合可能なビニル単量体、又はビニリデ
ン単量体が0〜50重量%である。共重合体()
中の四級アンモニウム塩基を有する単量体成分が
20重量%未満では、メタクリル樹脂に良好な制電
性が付与できず、ポリアルキレングリコール成分
を有する単量体成分が10重量%未満では樹脂組成
物の透明性が低下する。
第三成分である共重合可能なビニル系単量体が
メタクリル樹脂と相溶性の良い成分であれば、ポ
リアルキレングリコール成分を有する単量体成分
を少なくしても得られる樹脂組成物の透明性を維
持でき、又共重合可能なビニル系単量体が極性の
高い単量体の場合は、四級アンモニウム塩基を有
する単量体成分を少なくしても得られる樹脂組成
物の制電性を維持できる。
共重合体()の製法については特別な限定は
なく、通常のラジカル発生開始剤および連鎖移動
剤の存在下で溶液重合、バルク重合等の手法を用
いることができるが、溶液重合が均一系のまま重
合できるので好ましい。又溶液重合の場合には、
単量体の一括添加、分割添加、滴下添加等種々の
添加方法を採用できる。
本発明における共重合体()の分子量は1000
以上であることが好ましい。分子量が1000未満の
場合には、良好な恒久制電性が得られない場合が
あり、可塑化効果によりメタクリル樹脂の耐熱性
が低下する傾向がある。
メチルメタクリレート系の重合体()100重
量部に対する共重合体()の添加量は0.1〜40
重量部が好ましく、特に望ましくは0.5〜40重量
部である。共重合体()の添加量が0.1重量部
未満であると良好な制電性を付与できず、40重量
部を超えるとメタクリル樹脂の本来の物性を大き
く損ねる上に、コスト高となる。共重合体()
の添加量は通常6重量部程度で十分であり、この
程度で表面抵抗値109Ω〜1012Ωとなる。
又、重合体()と共重合体()を混合する
には、各種の手法が適用でき、例えば共重合体
()の存在下に重合体()を重合する方法お
よび共重合体()と重合体()とを加熱溶融
混合する方法が考えられる。
本発明における帯電防止性および透明性の優れ
た樹脂組成物を成形するには、射出成形、押し出
し成形、プレス成形等の各種の成形法が適用でき
る。
本発明の樹脂組成物からの成形品が優れた制電
性を発現するのは、本発明において用いられる四
級アンモニウム塩基を有する共重合体の独特の性
質の為、射出成形、押し出し成形等の成形時に、
この共重合体が成形物表面付近へ濃縮したり、配
向したりすることによるものと思われる。この様
にして得られた成形品は、タツクその他の不具合
が無く、耐熱性も落ちず、恒久的な帯電防止性を
有する。
本発明においては他の帯電防止剤、滑剤、抗酸
化剤、紫外線吸収剤、染料、顔料、その他の添加
剤を追加的に添加することができる。抗酸化剤と
してはホスフアイト系のものが好ましい。
次に実施例によつて本発明を説明するが、本発
明は実施例によつて限定されるものではない。
なお、実施例中のすべての試料の電気的性質は
実施例1と同条件で調湿し測定した。電荷半減時
間はスタテイツクネオストメーター(宍戸商会
製)を使用し、印加電圧10000V、試料回転速度
1300rpm、印加時間30秒、測定温度23℃、測定湿
度65%の条件で測定し、電圧印加時の試料電圧を
初期電圧(V)、電圧印加後試料電圧が初期電圧
の半分になるまでの時間を電荷半減時間(sec)
とした。表面抵抗値は超絶縁抵抗計(タケダ理研
製、TR−8601)を使用し、測定温度23℃、測定
湿度65%の条件で印加電圧500Vで1分後の表面
抵抗値(Ω)を測定した。洗浄は30℃で超音波洗
浄を30分間行つた。耐熱性は試料をアニール後
ASTM D648に準じて、HDT(℃)を測定した。
強度はASTM D638に準じて引張試験を行い、
引張弾性係数および引張破壊強度を測定した。透
明度は積分球式ヘーズメーター(日本精密光学
製、SEP−H−SS)を使用し、曇価を測定した。
又、表面状態は銀条の有無を表し、〇は全く銀条
が現れず、△は少し銀条が見られたことを示す。
なお、メタクリル樹脂は三菱レイヨン製アクリ
ペツトVH(メチルメタクリレート メチルアク
リレート共重合体)を使用した。
実施例 1
撹拌羽根付き3Lガラス製フラスコに、ジエチ
ルアミノエチルメタクリレート374重量部、ハイ
ドロキノンモノメチルエーテル4重量部、メタノ
ール450重量部を入れ、撹はんしながらジメチル
硫酸252重量部、メタノール80重量部の混合物を
30℃以下になるように滴下し、滴下終了後30分撹
拌を続け、四級アンモニウム塩基を有するモノマ
ー(M−1)溶液を得た。四級アンモニウム塩基
を有するモノマー(M−1)溶液に、アゾビスイ
ソブチロニトリル6重量部、n−オクチルメルカ
プタン4重量部、メタノール480重量部、ポリエ
チレングリコール(23)モノメタクリレートモノ
メチルエーテル620重量部を加え、60℃で窒素雰
囲気下4時間重合させた、重合後そろまま真空乾
燥して制電性付与共重合体(T−1)を得た。
得られた制電性付与共重合体6重量部をメタク
リル樹脂100重量部に混合し、40φ押し出し機に
より230℃でペレツト化した。
得られたペレツトを射出成形(シリンダー温度
250℃、金型温度60℃)により10cm×10cm×2mm
の板にし、23℃、65%湿度で1日調湿後、制電
性、透明性を評価したところ表面抵抗率2.0×
1010Ω、電荷半減時間1秒、曇価1.5%であつた。
又、得られた板に水洗処理を行い、すぐに制電
性を評価したところ表面抵抗率1.5×1010Ω、電荷
半減時間1秒以下であつた。
又、ASTM D648に準じてHDT試片を作成し、
アニール後HDTを測定したところ100℃であり、
ASTM D638に準じて引張試験を行つたところ、
引張弾性係数3.1×104(Kg/cm2)、引張破壊強度
710(Kg/cm2)であつた。
比較例 1
メタクリル樹脂ペレツトを射出成形(シリンダ
ー温度250℃、金型温度60℃)により、10cm×10
cm×2mmの板にし、23℃、65%湿度で1日調湿
後、制電性透明性を評価したところ表面抵抗率
5.3×1016Ω、電荷半減時間1分以上、曇価1.5%
であつた。
又、ASTM D648に準じてHDT試片を作成し、
アニール後HDTを測定したところ100℃であり、
ASTM D638に準じて引張試験を行つたところ
引張弾性係数3.3×104(Kg/cm2)、引張破壊強度
730(Kg/cm2)であつた。
実施例 2〜5
実施例1で得られた制電性付与共重合体(制電
ポリマー)T−1を1〜35重量部メタクリル樹脂
100重量部に混合し、実施例1と同様な条件で押
し出し機によりペレツト化し、射出成形により10
cm×10cm×2mmの板にし、23℃、65%湿度で1日
調湿後、制電性その他を評価した結果を以下に示
す。
[Industrial Application Field] The present invention relates to a highly transparent resin composition that has good and permanent antistatic properties. [Prior art] Methacrylic resin generally has a high electrical resistance value,
It is easily charged with electricity due to friction, peeling, etc., and therefore attracts dirt and dust, causing various problems in the fields of molded products, sheets, films, fibers, etc., such as damaging the appearance. Recently, highly reliable antistatic materials are required for shipping containers and packaging materials for electronic components. In general, two methods are used to impart antistatic properties to methacrylic resin: 1. Internal kneading of an antistatic agent 2. Surface coating of an antistatic agent. There are other methods, such as surface coating of a silicon-based compound or modification of the surface structure of methacrylic resin, ie, plasma treatment, but both are expensive. In the method of internally kneading antistatic agents, low-molecular surfactants are generally used, but it is difficult to provide permanent antistatic properties with this method, and the antistatic agent present on the surface is If it is removed by washing with water, friction, or other means, the antistatic property will be lost. In addition, there is a method of using antistatic rubber as seen in JP-A-55-36237, but it is necessary to increase the amount of addition, which deteriorates the physical properties of methacrylic resin such as heat resistance, and this method However, the surface resistivity is also only about 10 11 Ω, which is not satisfactory. The surface application method of antistatic agent has a surface resistivity of 10 9 Ω.
However, since the antistatic agent is present only in the surface layer, the antistatic property is easily lost by washing with water, friction, etc. Moreover, unlike the internal kneading method, a surface coating process is required, resulting in high costs. [Problems to be solved by the invention] As explained above, no special process is required,
An antistatic agent that permanently exhibits good antistatic properties even when added in a small amount and does not deteriorate the inherent physical properties of the methacrylic resin has not been proposed so far. [Means for Solving the Problems] The present inventors have discovered that methacrylic resin has physical properties such as transparency and heat resistance that are inherent to methacrylic resin, and has good permanent antistatic properties that do not deteriorate due to washing. As a result of intensive research with the aim of creating a methacrylic resin that does not drop, we found that by adding a small amount of a copolymer that has a certain type of quaternary ammonium base and a chemically bonded polyalkylene glycol, it was possible to create a methacrylic resin that does not drop. It has been found that good and permanent antistatic properties can be imparted to methacrylic resin without impairing its inherent physical properties. That is, in the present invention, for 100 parts by weight of methyl methacrylate polymer (), (However, R 1 is hydrogen or a methyl group, R 2 to R 4 are hydrogen or an alkyl group having 1 to 9 carbon atoms that may have a substituent, m is an integer of 1 to 10, and X - is a monovalent 20-90 wt. Antistatic property and The present invention relates to a resin composition with excellent transparency. The counter anion (X - ) of the above quaternary ammonium base has the general formula R 8 SO 3 - or R 8 OSO 3 - (wherein R 8 is hydrogen or an alkyl group which may contain a phenyl group having 1 to 20 carbon atoms). ) is preferable. The methyl methacrylate polymer () in the present invention is a polymer comprising 50% by weight or more of methyl methacrylate units and 50% by weight or less of other copolymerizable monomer units. Examples of monomers copolymerizable with methyl methacrylate include alkyl methacrylates such as ethyl methacrylate, butyl methacrylate, and 2-ethylhexyl methacrylate;
Examples include alkyl acrylates such as methyl acrylate, ethyl acrylate, butyl acrylate, and 2-ethylhexyl acrylate, styrene, acrylonitrile, methacrylic acid, alkyl acids, itaconic acid, maleic acid, fumaric acid, vinyltoluene, etc., and preferably methyl acrylate. alkylacrylates and styrene. Further, the polymer () preferably has an intrinsic viscosity of 0.4 to 0.8 dl/g in a toluene solvent at 25°C. The unit having a quaternary ammonium base in the copolymer ( ) in the present invention has the general formula (However, R 1 is hydrogen or a methyl group, R 2 to R 4 are hydrogen or an alkyl group having 1 to 9 carbon atoms that may have a substituent, m is an integer of 1 to 10, and X - is a monovalent or the corresponding equivalent of an inorganic or organic acid), which is a methacrylate or acrylate with an amine that has been quaternized with a quaternizing agent. . Examples of methacrylates or acrylates having an amine include dimethylamino methacrylate, diethylaminoethyl methacrylate, dimethylaminopropyl methacrylate, dimethylaminoethyl acrylate, diethylaminoethyl acrylate, dimethylaminobutyl methacrylate, dihydroxyethylaminoethyl methacrylate, dipropylaminoethyl methacrylate, dibutylamino Examples include ethyl methacrylate. Examples of quaternizing agents include alkyl sulfates such as dimethyl sulfate, diethyl sulfate, and dipropyl sulfate, sulfonic acid esters such as methyl p-toluenesulfonate and methyl benzenesulfonate, alkyl sulfites such as dimethyl sulfite, and trimethyl phosphate. Alkyl phosphoric acid, alkyl benzyl chloride,
Various halides such as alkyl chloride, alkyl chloride, and alkyl bromide are used, and alkyl sulfuric acid and sulfonic acid ester are particularly preferred from the viewpoint of heat decomposition resistance. m in the general formula is an integer of 1 to 10, with 2 to 6 being particularly preferred. As the copolymerizable monomer component having a polyalkylene glycol component used in the present invention, a polyalkylene glycol macromer with a styryl terminal, a polyalkylene glycol macromer with a vinyl terminal, etc. can be used, but particularly preferred monomer components are is a general formula (However, R 5 is hydrogen or a methyl group, R 6 is an optionally branched alkyl group having 4 or less carbon atoms,
R 7 is hydrogen or an alkyl group having 1 to 20 carbon atoms, n is an integer of 1 to 500), and this is a polyalkylene glycol macromer with terminal methacrylate or acrylate. Examples include polyethylene glycol
(4) Monomethacrylate, polyethylene glycol (23) monomethacrylate, polyethylene glycol (300) monomethacrylate, polyethylene glycol (23) monoacrylate, polypropylene glycol (23) monomethacrylate, polypropylene glycol (23) monoacrylate,
Polyethylene glycol (23) monomethacrylate monomethyl ether, polyethylene glycol (23) monomethacrylate monobutyl ether,
Polypropylene glycol (23) monoacrylate monomethyl ether, polyethylene glycol (23) monomethacrylate monononyl ether,
Polyethylene glycol (23) monomethacrylate monostearyl ether, polypropylene glycol (23) monomethacrylate monomethyl ether, polyethylene glycol (4) monomethacrylate monomethyl ether, polyethylene glycol (9) monomethacrylate monomethyl ether, polyethylene glycol (300) monomethacrylate monomethyl ether , polyethylene glycol (23) monomethacrylate monooleyl ether (the number in the box is the number of polyalkylene glycol units). Examples of the copolymerizable vinyl monomer in the present invention include known monomers such as methacrylic acid alkyl ester, acrylic acid alkyl ester, acrylic acid, methacrylic acid, acrylamide, methacrylamide, vinyl acetate, unsaturated nitrile, Aromatic vinyl, alkyl vinyl ether, alkyl vinyl ketone, 2-hydroxyalkyl (meth)
One or more monomers such as acrylate, vinyl chloride, vinylidene chloride, isobutene, 2-acidophosphoxyethyl (meth)acrylate, etc. can be used. The composition of the copolymer () in the present invention is 20 to 90% by weight of a monomer component having a quaternary ammonium base, 10 to 80% by weight of a monomer component having a copolymerizable polyalkylene glycol component, The copolymerizable vinyl monomer is 0 to 70% by weight, more preferably the monomer component having a quaternary ammonium base is 30 to 80% by weight, and the monomer component is copolymerizable and has a polyalkylene glycol component. The amount of copolymerizable vinyl monomer or vinylidene monomer is 0 to 50% by weight. Copolymer ()
The monomer component having a quaternary ammonium base in
If the amount is less than 20% by weight, good antistatic properties cannot be imparted to the methacrylic resin, and if the amount of the monomer component having a polyalkylene glycol component is less than 10% by weight, the transparency of the resin composition will decrease. If the copolymerizable vinyl monomer that is the third component is a component that has good compatibility with the methacrylic resin, the transparency of the resin composition that can be obtained even if the monomer component containing the polyalkylene glycol component is reduced If the copolymerizable vinyl monomer is a highly polar monomer, the antistatic properties of the resulting resin composition can be maintained even if the monomer component having a quaternary ammonium base is reduced. Can be maintained. There are no particular limitations on the method for producing the copolymer (2), and techniques such as solution polymerization and bulk polymerization in the presence of ordinary radical-generating initiators and chain transfer agents can be used; This is preferred because it can be directly polymerized. In addition, in the case of solution polymerization,
Various addition methods such as bulk addition, divided addition, and dropwise addition of the monomer can be employed. The molecular weight of the copolymer () in the present invention is 1000
It is preferable that it is above. When the molecular weight is less than 1000, good permanent antistatic properties may not be obtained, and the heat resistance of the methacrylic resin tends to decrease due to the plasticizing effect. The amount of copolymer () added to 100 parts by weight of methyl methacrylate polymer () is 0.1 to 40 parts by weight.
It is preferably 0.5 to 40 parts by weight, particularly preferably 0.5 to 40 parts by weight. If the amount of the copolymer () added is less than 0.1 parts by weight, good antistatic properties cannot be imparted, and if it exceeds 40 parts by weight, the original physical properties of the methacrylic resin will be greatly impaired and the cost will increase. Copolymer ()
It is usually sufficient to add the amount of about 6 parts by weight, and this amount gives a surface resistance value of 10 9 Ω to 10 12 Ω. In addition, various methods can be applied to mix the polymer () and the copolymer (), such as a method of polymerizing the polymer () in the presence of the copolymer () and a method of polymerizing the polymer () in the presence of the copolymer (). A method of heating and melt-mixing the polymer () is considered. In order to mold the resin composition excellent in antistatic properties and transparency in the present invention, various molding methods such as injection molding, extrusion molding, and press molding can be applied. The reason why molded products made from the resin composition of the present invention exhibits excellent antistatic properties is due to the unique properties of the copolymer containing a quaternary ammonium base used in the present invention. During molding,
This seems to be due to the fact that this copolymer is concentrated or oriented near the surface of the molded article. The molded product thus obtained is free from tackiness and other defects, has no loss of heat resistance, and has permanent antistatic properties. In the present invention, other antistatic agents, lubricants, antioxidants, ultraviolet absorbers, dyes, pigments, and other additives may be additionally added. As the antioxidant, phosphite type antioxidants are preferred. Next, the present invention will be explained with reference to Examples, but the present invention is not limited by the Examples. The electrical properties of all the samples in Examples were measured under the same conditions as in Example 1, with humidity controlled. The charge half-life time was measured using a static neostometer (manufactured by Shishido Shokai) with an applied voltage of 10,000 V and a sample rotation speed.
Measured under the conditions of 1300 rpm, application time 30 seconds, measurement temperature 23℃, and measurement humidity 65%.The sample voltage when voltage is applied is the initial voltage (V), and the time it takes for the sample voltage to become half of the initial voltage after voltage application. charge half-life time (sec)
And so. The surface resistance value was measured using a super insulation resistance meter (manufactured by Takeda Riken, TR-8601) at a measurement temperature of 23℃ and a measurement humidity of 65% after 1 minute at an applied voltage of 500V. . For cleaning, ultrasonic cleaning was performed at 30°C for 30 minutes. Heat resistance is determined after annealing the sample.
HDT (°C) was measured according to ASTM D648.
The strength was determined by a tensile test according to ASTM D638.
The tensile elastic modulus and tensile breaking strength were measured. Transparency was measured by haze value using an integrating sphere haze meter (SEP-H-SS, manufactured by Nippon Seimitsu Kogaku).
The surface condition indicates the presence or absence of silver streaks; ◯ indicates that no silver streaks appear at all, and △ indicates that some silver streaks were observed. As the methacrylic resin, Acrypet VH (methyl methacrylate methyl acrylate copolymer) manufactured by Mitsubishi Rayon was used. Example 1 374 parts by weight of diethylaminoethyl methacrylate, 4 parts by weight of hydroquinone monomethyl ether, and 450 parts by weight of methanol were placed in a 3L glass flask equipped with a stirring blade, and while stirring, a mixture of 252 parts by weight of dimethyl sulfate and 80 parts by weight of methanol was added. of
The mixture was added dropwise to keep the temperature below 30°C, and stirring was continued for 30 minutes after the completion of the addition to obtain a monomer (M-1) solution containing a quaternary ammonium base. To the monomer (M-1) solution having a quaternary ammonium base, 6 parts by weight of azobisisobutyronitrile, 4 parts by weight of n-octyl mercaptan, 480 parts by weight of methanol, and 620 parts by weight of polyethylene glycol (23) monomethacrylate monomethyl ether. was added and polymerized at 60° C. for 4 hours under a nitrogen atmosphere. After the polymerization, the mixture was dried under vacuum to obtain an antistatic property-imparting copolymer (T-1). 6 parts by weight of the obtained antistatic property-imparting copolymer were mixed with 100 parts by weight of methacrylic resin, and pelletized at 230°C using a 40φ extruder. The pellets obtained are injection molded (cylinder temperature
250℃, mold temperature 60℃) 10cm x 10cm x 2mm
After conditioning the plate at 23℃ and 65% humidity for one day, antistatic properties and transparency were evaluated, and the surface resistivity was 2.0×.
The resistance was 10 10 Ω, the charge half-life time was 1 second, and the haze value was 1.5%. Further, the obtained plate was washed with water and the antistatic property was immediately evaluated, and the surface resistivity was 1.5×10 10 Ω, and the charge half-life time was 1 second or less. In addition, HDT specimens were prepared according to ASTM D648,
HDT was measured after annealing and was 100℃.
When a tensile test was conducted according to ASTM D638,
Tensile elastic modulus 3.1×10 4 (Kg/cm 2 ), tensile breaking strength
It was 710 (Kg/cm 2 ). Comparative Example 1 Methacrylic resin pellets were injection molded (cylinder temperature 250°C, mold temperature 60°C) into 10 cm x 10
A cm x 2 mm plate was conditioned for one day at 23℃ and 65% humidity, and the antistatic transparency was evaluated and the surface resistivity
5.3×10 16 Ω, charge half-life time over 1 minute, haze value 1.5%
It was hot. In addition, HDT specimens were prepared according to ASTM D648,
HDT was measured after annealing and was 100℃.
A tensile test according to ASTM D638 revealed a tensile modulus of elasticity of 3.3×10 4 (Kg/cm 2 ) and a tensile strength at break.
It was 730 (Kg/cm 2 ). Examples 2 to 5 1 to 35 parts by weight of the antistatic property imparting copolymer (antistatic polymer) T-1 obtained in Example 1 to methacrylic resin
100 parts by weight, pelletized using an extruder under the same conditions as Example 1, and injection molded into pellets.
A plate of cm x 10 cm x 2 mm was made into a plate, and after being conditioned for one day at 23°C and 65% humidity, the antistatic properties and other properties were evaluated.The results are shown below.
【表】
比較例 2
実施例1で得られた制電性付与共重合体T−1
50重量部をメタクリル樹脂100重量部に混合し、
実施例1と同様な条件で押出し賦形した後、射出
成形を行なつて10cm×10cm×2mmの平板を作成
し、23℃、65%湿度で1日調湿した後、制電性そ
の他物性を評価したところ下表に示すような結果
が得られた。[Table] Comparative Example 2 Antistatic property imparting copolymer T-1 obtained in Example 1
Mix 50 parts by weight with 100 parts by weight of methacrylic resin,
After extrusion shaping under the same conditions as in Example 1, injection molding was performed to create a 10 cm x 10 cm x 2 mm flat plate, and after conditioning at 23°C and 65% humidity for one day, antistatic properties and other physical properties were determined. When evaluated, the results shown in the table below were obtained.
【表】
上表から理解されるように、制電性付与添加量
がメタクリル樹脂100重量に対して50重量部とな
ると、制電性能は良好な値を示すものの、曇価が
増大し、透明性が失なわれる。又、樹脂の機械的
物性も低下する。
実施例 6〜27
実施例1と同様の手法により以下に示すM−2
〜M−6の四級アンモニウム塩基を有するモノマ
ーを得た。[Table] As can be understood from the above table, when the amount added to impart antistatic property is 50 parts by weight per 100 parts by weight of methacrylic resin, the antistatic performance shows a good value, but the haze value increases and the transparency Gender is lost. In addition, the mechanical properties of the resin also deteriorate. Examples 6 to 27 M-2 shown below by the same method as Example 1
A monomer having a quaternary ammonium base of ~M-6 was obtained.
【表】
ただし
DEMA……ジエチルアミノエチルメタクリレ
ート
DMMA……ジメチルアミノエチルメタクリレー
ト
DEA………ジエチルアミノエチルアクリレート
DES………ジエチル硫酸
DMS………ジメチル硫酸
Ts−OMe−p−トルエンスルホン酸メチル
MeCl……メチルクロライド
次いで実施例1と同様の手法によりM−2〜M
−6の四級アンモニウム塩基を有するモノマーを
使用して以下に示すT−2〜T−23の制電性付与
共重合体(制電ポリマー)を得た。[Table] However, DEMA……diethylaminoethyl methacrylate DMMA……dimethylaminoethyl methacrylate DEA……diethylaminoethyl acrylate DES……diethyl sulfate DMS……dimethyl sulfate Ts-OMe-p-methyl toluenesulfonate MeCl……methyl Chloride Then, by the same method as in Example 1, M-2 to M
Using a monomer having a quaternary ammonium base of -6, antistatic property-imparting copolymers (antistatic polymers) of T-2 to T-23 shown below were obtained.
【表】【table】
【表】
上表中、各種モノマーの使用量は制電性付与共
重合体中の重量%で示した(以下も同様)。制電
ポリマーT−23は2種のポリアルキレングリコー
ルモノマーを含んでいる。又、表中の略語の意味
は次の通りである:
E23MAM……ポリエチレングリコール(23)モ
ノメタクリレートモノメチルエーテル
E500MAM……ポリエチレングリコール(500)
モノメタクリレートモノメチルエーテル
E9MAM……ポリエチレングリコール(9)モノメタ
クリレートモノメチルエーテル
E23AM……ポリエチレングリコール(23)モノ
アクリレートモノメチルエーテル
P23MAM……ポリプロピレングリコール(23)
モノメタクリレートモノメチルエーテル
E23MAS……ポリエチレングリコール(23)モ
ノメタクリレートモノステアリルエーテル
B23MAM……ポリブチレングリコール(23)モ
ノメタクリレートモノメチルエーテル
PMMAMA……末端メタクリレートPMMA(20)
マクロマー
BMA……n−ブチルメタクリレート
得られた各種の制電性付与共重合体(制電ポリ
マー)をメタクリル樹脂100重量部に対して、そ
れぞれ次表中に示した割合(重量部)で混合し、
実施例1と同様な条件で押し出し機によりペレツ
ト化し、射出成形により10cm×10cm×2mmの板に
し、23℃、65%湿度で1日調湿後、制電性その他
を評価した結果を以下に示す。[Table] In the above table, the amounts of various monomers used are expressed in weight percent of the antistatic property-imparting copolymer (the same applies below). Antistatic polymer T-23 contains two polyalkylene glycol monomers. In addition, the meanings of the abbreviations in the table are as follows: E23MAM...Polyethylene glycol (23) monomethacrylate monomethyl ether E500MAM...Polyethylene glycol (500)
Monomethacrylate monomethyl ether E9MAM...Polyethylene glycol (9) Monomethacrylate monomethyl ether E23AM...Polyethylene glycol (23) Monoacrylate monomethyl ether P23MAM...Polypropylene glycol (23)
Monomethacrylate monomethyl ether E23MAS...Polyethylene glycol (23) Monomethacrylate monostearyl ether B23MAM...Polybutylene glycol (23) Monomethacrylate monomethyl ether PMMAMA...Terminal methacrylate PMMA (20)
Macromer BMA...n-butyl methacrylate The obtained various antistatic properties imparting copolymers (antistatic polymers) were mixed with 100 parts by weight of methacrylic resin in the proportions (parts by weight) shown in the table below. ,
The pellets were made into pellets using an extruder under the same conditions as in Example 1, made into 10 cm x 10 cm x 2 mm plates by injection molding, and after being conditioned for one day at 23°C and 65% humidity, the antistatic properties and other properties were evaluated.The results are shown below. show.
【表】【table】
【表】
実施例 28
実施例1で得られた制電性付与共重合体T−1
6重量%をメタクリル樹脂100重量部に混合し、
実施例1と同様な条件で押し出し機によりペレツ
ト化し、射出成形機により2mmのシートにし、23
℃、65%湿度で1日調湿後、制電性その他を評価
したところ表面抵抗値8.2×1010Ω、電荷半減時間
1.5秒、曇価2%以下であつた。
又、得られた板に水洗処理を行い、すぐに制電
性を評価したところ表面抵抗値4.3×1010Ω、電荷
半減時間1.5秒であつた。
比較例 3
実施例1で得られた四級アンモニウム塩基を有
するモノマー(M−1)溶液に、アゾビスイソブ
チロニトリル6重量部、n−オクチルメルカプタ
ン4重量部、メタノール480重量部を加え、60℃
で窒素雰囲気下4時間重合させた。重合後そのま
ま真空乾燥し制電性付与共重合体(T−24)を得
た。
得られた制電性付与共重合体6重量部をメタク
リル樹脂100重量部に混合し、押し出し機により
ペレツト化した。
得られたペレツトを実施例1と同様な条件によ
る射出成形により、10cm×10cm×2mmの板にし、
23℃、65%湿度で1日調湿後、制電性を評価した
ところ表面抵抗率8.0×1010Ω、電荷半減時間1.5
秒であつた。しかしながら曇価は30%であり、透
明性が損なわれていた。
比較例 4〜6
比較例4〜6においては、前述した比較例3で
得られた制電性付与共重合体T−24とM−1の四
級アンモニウム塩基を有するモノマーを使用し、
実施例1と同様な手法によつて得られ、下表に示
す組成を有する制電性付与共重合体T−25、T−
26を使用した。[Table] Example 28 Antistatic property imparting copolymer T-1 obtained in Example 1
6% by weight is mixed with 100 parts by weight of methacrylic resin,
Pelletize with an extruder under the same conditions as in Example 1, form a 2 mm sheet with an injection molder, and
After conditioning for one day at ℃ and 65% humidity, antistatic properties and other properties were evaluated, and the surface resistance value was 8.2×10 10 Ω, and the charge half-life time
1.5 seconds, and the haze value was 2% or less. Further, the obtained plate was washed with water and the antistatic property was immediately evaluated, and the surface resistance value was 4.3×10 10 Ω, and the charge half-life time was 1.5 seconds. Comparative Example 3 To the monomer (M-1) solution having a quaternary ammonium base obtained in Example 1, 6 parts by weight of azobisisobutyronitrile, 4 parts by weight of n-octylmercaptan, and 480 parts by weight of methanol were added, 60℃
Polymerization was carried out under a nitrogen atmosphere for 4 hours. After the polymerization, the mixture was directly vacuum-dried to obtain an antistatic property-imparting copolymer (T-24). 6 parts by weight of the obtained antistatic property-imparting copolymer were mixed with 100 parts by weight of methacrylic resin, and pelletized using an extruder. The obtained pellets were injection molded under the same conditions as in Example 1 to form a plate of 10 cm x 10 cm x 2 mm.
After conditioning for one day at 23℃ and 65% humidity, the antistatic properties were evaluated and the surface resistivity was 8.0×10 10 Ω, and the charge half-life time was 1.5.
It was hot in seconds. However, the haze value was 30%, and transparency was impaired. Comparative Examples 4 to 6 In Comparative Examples 4 to 6, the antistatic property imparting copolymer T-24 obtained in Comparative Example 3 and M-1, a monomer having a quaternary ammonium base, were used.
Antistatic property imparting copolymers T-25 and T- obtained by the same method as in Example 1 and having the compositions shown in the table below.
26 was used.
【表】
上表に示した制電性付与共重合体をメタクリル
樹脂100重量部に対して下表に示す割合(重量部)
で混合し、実施例1と同様な条件で押し出し機に
よりペレツト化し、射出成形により、10cm×10cm
×2mmの板にし、23℃、65%湿度で1日調湿後、
制電性及び透明性を評価した結果を以下に示す。
比較例4および6の制電ポリマーは制電性付与共
重合体の添加量を増大させても制電性能の発現が
認められない。又、比較例5のようにポリアルキ
レングリコールの共重合成分量が少ないと、帯電
防止性は良好であるが、透明性が阻害される。[Table] The ratio of the antistatic property imparting copolymer shown in the above table to 100 parts by weight of methacrylic resin as shown in the table below (parts by weight)
The pellets were mixed using an extruder under the same conditions as in Example 1, and then molded into pellets of 10 cm x 10 cm by injection molding.
After making it into a 2mm board and conditioning it for 1 day at 23℃ and 65% humidity,
The results of evaluating antistatic properties and transparency are shown below.
In the antistatic polymers of Comparative Examples 4 and 6, no antistatic performance was observed even when the amount of the antistatic property-imparting copolymer added was increased. Further, when the amount of copolymerized polyalkylene glycol is small as in Comparative Example 5, antistatic properties are good, but transparency is impaired.
本発明の樹脂組成物は良好且つ永久的な帯電防
止性を有し、メタクリル樹脂本来の透明性、強
度、耐熱性等の優れた物性も保持している。その
ため、ゴミ、ほこりを吸引して外観をそこねる等
の成形品、シート、フイルム、繊維等の分野で起
こる様々な帯電トラブルがなく且つエレクトロニ
クス関連等の高信頼性を必要とする産業分野にも
使用することができる。
The resin composition of the present invention has good and permanent antistatic properties, and also maintains excellent physical properties such as transparency, strength, and heat resistance inherent to methacrylic resin. Therefore, it is free from various charging problems that occur in the fields of molded products, sheets, films, textiles, etc., such as attracting dirt and dust and damaging the appearance, and can also be used in industrial fields that require high reliability such as electronics. can do.
Claims (1)
量部に対し、一般式 (ただし、R1は水素又はメチル基、R2〜R4は水
素又は置換基を有していても良い炭素数1〜9の
アルキル基、mは1〜10の整数、Xは一価の無機
又は有機の酸基か、無機酸又は有機酸の相応する
等価物を表す。) で表される四級アンモニウム塩基を有する単量体
成分20〜90重量%、共重合可能でポリアルキレン
グリコール成分を有する単量体成分10〜80重量
%、共重合可能なビニル系単量体成分0〜70重量
%からなる共重合体()を0.1〜40重量部混合
してなる帯電防止性および透明性の優れた樹脂組
成物。 2 重合体()と共重合体()が加熱溶融状
態で混合されたものであることを特徴とする特許
請求の範囲第1項記載の帯電防止性および透明性
の優れた樹脂組成物。 3 共重合可能でポリアルキレングリコール成分
を有する単量体成分が一般式 (ただし、R5は水素又はメチル基、R6は枝分か
れしていてもよい炭素数4以下のアルキル基、
R7は水素又は炭素数1〜20のアルキル基、nは
1〜500の整数) で表される単量体であることを特徴とする特許請
求の範囲第1項記載の帯電防止性および透明性の
優れた樹脂組成物。 4 四級アンモニウム塩基のカウンターアニオン
X-が一般式 R8SO3 -もしくはR8OSO3 - (ただし、R8は水素又は炭素数1〜20のフエニ
ル基を含んでいてもよいアルキル基) で表されることを特徴とする特許請求の範囲第1
項記載の帯電防止性および透明性の優れた樹脂組
成物。[Claims] 1. For 100 parts by weight of the methyl methacrylate polymer (), the general formula (However, R 1 is hydrogen or a methyl group, R 2 to R 4 are hydrogen or an alkyl group having 1 to 9 carbon atoms that may have a substituent, m is an integer of 1 to 10, and X is a monovalent 20 to 90% by weight of a monomer component having a quaternary ammonium group (representing an inorganic or organic acid group or a corresponding equivalent of an inorganic or organic acid), a copolymerizable polyalkylene glycol component Antistatic properties and transparency obtained by mixing 0.1 to 40 parts by weight of a copolymer () consisting of 10 to 80% by weight of a monomer component having the following properties and 0 to 70% by weight of a copolymerizable vinyl monomer component Excellent resin composition. 2. A resin composition with excellent antistatic properties and transparency according to claim 1, characterized in that the polymer () and the copolymer () are mixed in a heated molten state. 3 A monomer component that is copolymerizable and has a polyalkylene glycol component has the general formula (However, R 5 is hydrogen or a methyl group, R 6 is an optionally branched alkyl group having 4 or less carbon atoms,
Antistatic properties and transparency according to claim 1, characterized in that R 7 is a monomer represented by hydrogen or an alkyl group having 1 to 20 carbon atoms, and n is an integer of 1 to 500. A resin composition with excellent properties. 4 Counter anion of quaternary ammonium base
X - is represented by the general formula R 8 SO 3 - or R 8 OSO 3 - (wherein R 8 is hydrogen or an alkyl group which may contain a phenyl group having 1 to 20 carbon atoms) Claim 1
A resin composition with excellent antistatic properties and transparency as described in 1.
Priority Applications (6)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61208494A JPS6363739A (en) | 1986-09-04 | 1986-09-04 | Resin composition excellent in antistatic property and transparency |
| US07/087,524 US4859727A (en) | 1986-08-22 | 1987-08-20 | Antistatic thermoplastic resin composition |
| CA000545093A CA1335013C (en) | 1986-08-22 | 1987-08-21 | Antistatic thermoplastic resin composition |
| DE3788544T DE3788544T2 (en) | 1986-08-22 | 1987-08-21 | Antistatic thermoplastic molding compound. |
| EP87112178A EP0257592B1 (en) | 1986-08-22 | 1987-08-21 | Antistatic thermoplastic resin composition |
| KR1019870009191A KR910007310B1 (en) | 1986-08-22 | 1987-08-22 | Antistatic thermoplastic resin compositions |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61208494A JPS6363739A (en) | 1986-09-04 | 1986-09-04 | Resin composition excellent in antistatic property and transparency |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6363739A JPS6363739A (en) | 1988-03-22 |
| JPH032456B2 true JPH032456B2 (en) | 1991-01-16 |
Family
ID=16557087
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP61208494A Granted JPS6363739A (en) | 1986-08-22 | 1986-09-04 | Resin composition excellent in antistatic property and transparency |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6363739A (en) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5395870A (en) * | 1988-12-28 | 1995-03-07 | Asahi Kasei Kogyo Kabushiki Kaisha | Vinyl resin composition |
| US5574101A (en) * | 1993-12-07 | 1996-11-12 | Asahi Kasei Kogyo Kabushiki Kaisha | Acrylic resin composition |
| WO2003080001A1 (en) * | 2002-03-21 | 2003-10-02 | Basf Aktiengesellschaft | Cationic polymers and the use thereof in cosmetic formulations |
| JP4878124B2 (en) * | 2005-04-07 | 2012-02-15 | ロンシール工業株式会社 | Films and sheets formed from an antistatic acrylic resin composition |
| TWI456038B (en) * | 2010-04-01 | 2014-10-11 | Toyo Ink Mfg Co | Composition for antistatic coating |
| JP5118785B2 (en) | 2011-04-12 | 2013-01-16 | パナソニック株式会社 | MEMS pressure sensor |
-
1986
- 1986-09-04 JP JP61208494A patent/JPS6363739A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6363739A (en) | 1988-03-22 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| KR910007310B1 (en) | Antistatic thermoplastic resin compositions | |
| US4302558A (en) | Antistatic resin composition | |
| JPS592462B2 (en) | Antistatic resin composition | |
| US4877687A (en) | Synthetic resin molded article having antistatic property | |
| WO2007094195A1 (en) | Antistatic thermoplastic resin composition and molded article made from same | |
| JPH032456B2 (en) | ||
| JP2776537B2 (en) | Antistatic thermoplastic resin composition | |
| JPS59142242A (en) | Resin composition having excellent antistatic property | |
| JPH10204247A (en) | Permanent antistatic styrenic resin composition and molded article thereof | |
| JP3132890B2 (en) | ABS resin composition | |
| US5118744A (en) | Process for the preparation of a methacrylic resin cast plate having excellent antistatic property | |
| JPH01269508A (en) | Antistatic synthetic resin molded product and its manufacture | |
| JPS5839860B2 (en) | Antistatic resin composition | |
| JP2534201B2 (en) | Synthetic resin molded product with excellent antistatic properties | |
| JPH09291192A (en) | Antistatic resin composition and molded article thereof | |
| KR840001692B1 (en) | Antistatic resin compositi | |
| JPH09143323A (en) | Permanently antistatic resin composition | |
| JP3703584B2 (en) | Laminated body having resin composition layer | |
| JPH1160856A (en) | Styrene resin composition | |
| KR0167049B1 (en) | Thermoplastic Composition | |
| JPH032251A (en) | Permanently antistatic impact-resistant resin composition | |
| JPH05295244A (en) | Polyester-based and polycarbonate-based resin composition | |
| JPH10231432A (en) | Thermoplastic resin composition | |
| JPH01249853A (en) | Impact resistant resin composition having antistatic property | |
| JPH0517938B2 (en) |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |