JPH0331487B2 - - Google Patents
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- Publication number
- JPH0331487B2 JPH0331487B2 JP63140142A JP14014288A JPH0331487B2 JP H0331487 B2 JPH0331487 B2 JP H0331487B2 JP 63140142 A JP63140142 A JP 63140142A JP 14014288 A JP14014288 A JP 14014288A JP H0331487 B2 JPH0331487 B2 JP H0331487B2
- Authority
- JP
- Japan
- Prior art keywords
- gas
- adsorption
- pipe
- desorption
- adsorption tower
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
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- Separation Of Gases By Adsorption (AREA)
- Oxygen, Ozone, And Oxides In General (AREA)
Description
【発明の詳細な説明】
[産業上の利用分野]
本発明は高純度ガスの製造に利用される圧力ス
イング吸着装置(以下単にPSA装置という)に
関し、詳細には製品ガスを高純度で吸着回収する
ことのできるPSA装置に関するものである。[Detailed Description of the Invention] [Field of Industrial Application] The present invention relates to a pressure swing adsorption device (hereinafter simply referred to as a PSA device) used in the production of high-purity gas. This relates to a PSA device that can perform
以下にはその代表例として原料空気からN2ガ
スを高純度に回収するPSA装置について説明す
るが、本発明装置の適用対象はこれによつて限定
解釈されてはならない。 A PSA device for recovering N 2 gas with high purity from raw material air will be described below as a representative example, but this should not be construed as limiting the scope of application of the device of the present invention.
[従来の技術]
加圧空気をPSA装置に導入してN2ガスを濃縮
回収する方法を大別すると、O2ガスを吸着剤に
吸着して除去する方法、及びN2ガスを吸着剤に
吸着させ更に脱着させて回収する方法の2つに分
類される。このうち後者はN2ガス吸着用合成ゼ
オライト系の吸着剤を使用し、N2ガス吸着後の
吸着塔を減圧することにより高純度のN2ガスを
脱着回収する方法であり、以下これに利用される
PSA装置について説明する。[Prior art] Methods for concentrating and recovering N 2 gas by introducing pressurized air into a PSA device can be roughly divided into methods in which O 2 gas is removed by adsorption to an adsorbent, and methods in which N 2 gas is removed by adsorption to an adsorbent. It is classified into two methods: adsorption and further desorption and recovery. The latter method uses a synthetic zeolite-based adsorbent for N 2 gas adsorption, and depressurizes the adsorption tower after adsorbing N 2 gas to desorb and recover high-purity N 2 gas. be done
The PSA device will be explained.
第2図は前処理塔2a,2bにおいてH2Oと
CO2を除去した後のO2/N2混合ガスを3塔式
PSA装置に供給してN2ガスを選択的に回収する
装置の概略説明図である。 Figure 2 shows H 2 O and
After removing CO 2 , the O 2 /N 2 mixed gas is transferred to a three-column system.
FIG. 2 is a schematic explanatory diagram of a device that selectively recovers N 2 gas by supplying it to a PSA device.
圧縮機9によつて加圧された空気は前処理塔2
a,2bのいずれかに送給され、該塔内に収納さ
れた吸着剤にH2O及びCO2成分を吸着させ、ここ
を通過したO2/N2混合ガスを3塔式PSA装置の
原料ガス供給管1aへ送に込む。原料ガス供給管
1aは自動開閉弁(以下単に弁という)V1〜V3
を介して吸着塔3a,3b,3cに接続され、各
塔の底部には弁V4〜V6を介して排ガス廃棄管4
aが連結される。該排ガス廃棄管4aは前処理塔
2a,2bに連結され、吸着塔3a,3b,3c
を通過したO2ガスを主成分とする排ガスは前処
理塔内に吸着されたH2O,CO2の脱着用パージガ
スとして利用される。また弁V4〜V6の介設点よ
り上流側各吸着塔3a,3b,3cの底部には脱
着用管5a,5b,5cが配設され、夫々弁V7
〜V9を介してそれより下流側で合流される。合
流された脱着用管5には真空ポンプ6が設けられ
て製品ガスホルダ20に連結され、脱着回収され
た高純度N2ガスを貯留する。製品ガスホルダ2
0には、洗浄用管8が配設され、該洗浄用管8は
分岐された後弁V13〜V15を介して吸着塔3a,
3b,3cの各頂部に連結される。また吸着塔3
a,3b,3cは連結配管10a,10b,10
cによつて夫々直列的に連結され、各々に弁V10
〜V12が設けられる。 The air pressurized by the compressor 9 is sent to the pretreatment tower 2
a or 2b, H 2 O and CO 2 components are adsorbed on the adsorbent housed in the tower, and the O 2 /N 2 mixed gas that has passed through is sent to the three-column PSA device. The raw material gas is fed into the raw material gas supply pipe 1a. The raw material gas supply pipe 1a is an automatic opening/closing valve (hereinafter simply referred to as a valve) V 1 to V 3
are connected to adsorption towers 3a, 3b, and 3c via valves V4 to V6 at the bottom of each tower.
a are connected. The exhaust gas waste pipe 4a is connected to pretreatment towers 2a, 2b, and adsorption towers 3a, 3b, 3c.
The exhaust gas mainly composed of O 2 gas that has passed through is used as a purge gas for desorption of H 2 O and CO 2 adsorbed in the pretreatment tower. Further, desorption pipes 5a , 5b, 5c are provided at the bottoms of the adsorption towers 3a, 3b, 3c upstream from the intervening points of the valves V4 to V6 , respectively.
It is joined downstream via ~V 9 . The combined desorption tube 5 is provided with a vacuum pump 6 and connected to the product gas holder 20 to store the desorbed and recovered high-purity N 2 gas. Product gas holder 2
0, a cleaning pipe 8 is disposed, and the cleaning pipe 8 is branched and then connected to the adsorption towers 3a and 3a through valves V13 to V15 .
It is connected to each top of 3b and 3c. Also, adsorption tower 3
a, 3b, 3c are connecting pipes 10a, 10b, 10
c, each connected in series by a valve V 10
~V 12 is provided.
第3図は、吸着塔3a,3b,3cの作動工程
を示すタイムスケジユール(時間は左から右方向
に進む)の例であり、吸着工程開始時から吸着工
程終了時までの作動工程を1工程サイクルとして
いる。この1工程サイクルは図示の如く吸着工
程、回収工程、洗浄工程及び脱着工程より構成さ
れる。まず吸着工程では脱着された吸着塔内を加
圧すると共に、O2/N2混合ガスを供給管1aか
ら加圧供給し、回収目的成分のN2ガスを吸着剤
に吸着させ不純成分ガス(主にO2ガス)を排ガ
ス廃棄管4aを介して放出させる。又脱着工程で
は吸着塔を真空ポンプ6によつて減圧し、吸着塔
内の吸着剤に吸着されたN2を脱着し、脱着用管
5を通して製品ガスホルダ20に回収貯留する。
次に回収工程及び洗浄工程を、吸着塔3aの場合
を例に挙げて説明すると第5図a及びbによつて
示される。即ち第5図aの状態においては、製品
ガスホルダ20側から供給される高純度N2ガス
は洗浄用管8を通つて吸着塔3c内の残留O2を
追放し、吸着工程の終了した吸着塔3aへ連結配
管10cを介して送り込まれる。このとき吸着塔
3aでは回収工程が行なわれ、吸着塔3cでは洗
浄工程が行なわれる。また第5図bの状態では、
吸着塔3aは洗浄工程を行ない、吸着塔3bは回
収工程を行なつている状態を示す。 Figure 3 is an example of a time schedule (time progresses from left to right) showing the operating steps of the adsorption towers 3a, 3b, and 3c. It is a cycle. As shown in the figure, this one-step cycle consists of an adsorption step, a recovery step, a washing step, and a desorption step. First, in the adsorption step, the inside of the adsorption tower after desorption is pressurized, and O 2 /N 2 mixed gas is supplied under pressure from the supply pipe 1a, so that the N 2 gas, which is the target component to be recovered, is adsorbed on the adsorbent, and the impurity component gas (main component gas) is and O 2 gas) is released through the exhaust gas waste pipe 4a. In the desorption step, the adsorption tower is depressurized by the vacuum pump 6, and N 2 adsorbed by the adsorbent in the adsorption tower is desorbed and collected and stored in the product gas holder 20 through the desorption pipe 5.
Next, the recovery step and the washing step will be explained using the adsorption tower 3a as an example, as shown in FIGS. 5a and 5b. That is, in the state shown in FIG. 5a, high-purity N 2 gas supplied from the product gas holder 20 passes through the cleaning pipe 8 to expel residual O 2 in the adsorption tower 3c, and the adsorption tower after the adsorption process is removed. 3a via the connecting pipe 10c. At this time, a recovery process is performed in the adsorption tower 3a, and a washing process is performed in the adsorption tower 3c. In addition, in the state shown in Figure 5b,
The adsorption tower 3a is shown performing a cleaning process, and the adsorption tower 3b is shown performing a recovery process.
[発明が解決しようとする課題]
上記のPSA装置は小規模の産業分野でも自家
生産型で利用できる様にするため小型化が進めら
れつつあり、吸着塔等を小型化すると共に、自動
開閉弁も小型で安価な真空用電磁弁が用いられる
様になつてきた。[Problem to be solved by the invention] The above-mentioned PSA equipment is being miniaturized so that it can be used in home production even in small-scale industrial fields. However, small and inexpensive vacuum solenoid valves have come into use.
第6図は真空用電磁弁の一例を示す断面説明図
であり、電磁コイル21の励起によつて摺動する
プランジヤ23の先端に弁体24を設け、弁座2
7に対して当接・離反できる様に構成されてい
る。第4図は上記構成の真空用電磁弁Z1,Z2を連
結配管10a,10bに設けたPSA装置による
吸着塔3bの脱着工程時の状態を示す説明図であ
る。このとき吸着塔3b内は真空ポンプ6によつ
て100Torr程度まで減圧され、この減圧域は上記
の真空用電磁弁Z1,Z2により遮断されている。と
ころが上記の真空用電磁弁Z1,Z2は第6図に示す
白抜き矢印F1→F2方向のガス流に対しては有効
な遮断性能を発揮するが、破線矢印Lに示す様な
逆方向のガス流れに対しては、弁体24がスプリ
ング22の反発力によつて押え付けられているだ
けなので、弁座27から押し戻されてガスリーク
を生じ易い。即ち第4図に示す例においては矢印
P方向にリークを生じ易く吸着塔3c中のO2/
N2ガスが脱着ガス中に混入し、回収製品ガスの
純度低下を引き起こす。 FIG. 6 is an explanatory cross-sectional view showing an example of a vacuum electromagnetic valve, in which a valve body 24 is provided at the tip of a plunger 23 that slides when the electromagnetic coil 21 is excited, and a valve seat 2 is provided.
It is configured so that it can come into contact with and separate from 7. FIG. 4 is an explanatory diagram showing the state during the desorption process of the adsorption tower 3b using the PSA apparatus in which the vacuum electromagnetic valves Z 1 and Z 2 having the above configuration are provided in the connecting pipes 10a and 10b. At this time, the pressure inside the adsorption tower 3b is reduced to about 100 Torr by the vacuum pump 6, and this reduced pressure region is shut off by the vacuum electromagnetic valves Z 1 and Z 2 . However, although the vacuum solenoid valves Z 1 and Z 2 described above exhibit effective blocking performance against gas flow in the direction of the white arrow F 1 →F 2 shown in FIG. With respect to gas flow in the opposite direction, the valve body 24 is only held down by the repulsive force of the spring 22, so it is likely to be pushed back from the valve seat 27 and cause gas leakage. That is, in the example shown in FIG. 4, leakage tends to occur in the direction of arrow P, and the O 2 /
N2 gas gets mixed into the desorption gas, causing a decrease in the purity of the recovered product gas.
そこで本発明者らは小型で安価な真空用電磁弁
を使用するPSA装置であつても、高純度の製品
ガスを回収できるようにする目的で種々研究を重
ね、本発明を完成した。 Therefore, the present inventors conducted various studies and completed the present invention with the aim of making it possible to recover high-purity product gas even with a PSA device that uses a small and inexpensive vacuum electromagnetic valve.
[課題を解決するための手段]
上記の目的を達成し得た本発明PSA装置は、
1対の真空用電磁弁を、互いに入口側が背中合わ
せとなる様に、前記連結配管の両端部近傍に直列
配設する点を要旨とするものである。[Means for Solving the Problems] The PSA device of the present invention that achieves the above objects has the following features:
The gist is that a pair of vacuum electromagnetic valves are arranged in series near both ends of the connecting pipe so that their inlet sides are back to back.
[作用及び実施例]
第1図は本発明の代表的な実施例を示す概略説
明図であり、各連結配管10a,10b,10c
には夫々2つの真空用電磁弁X1〜X3及びY1〜Y3
が配設される。上記の真空用電磁弁Y1〜Y3は吸
着塔3a,3b,3cの底部側へできるだけ接近
して設けられ、該弁Y1〜Y3の出口部26(第6
図)を吸着塔3a,3b,3cの底部に向けて配
設される。一方弁X1〜X3は上記の弁Y1〜Y3とは
逆向きに配設される。即ち連結配管10aにおい
て真空用電磁弁X1とY1は入口部25を互いに背
中合わせとなる様に設けられ、その開閉作動は同
一タイミングで同一の開閉制御がなされる。従つ
て吸着塔3aの脱着工程時に電磁弁X1において
矢印L方向のガスリーク(第6図参照)が生じて
も吸着塔3a側の電磁弁Y1においてこのガス流
が完全に遮断され、吸着塔3aの脱着工程中に吸
着塔3b,3c内のO2混入ガスが混り込むこと
は全くなくなる。[Operations and Examples] FIG. 1 is a schematic explanatory diagram showing a typical example of the present invention, in which each connecting pipe 10a, 10b, 10c
have two vacuum solenoid valves X 1 to X 3 and Y 1 to Y 3 respectively.
will be placed. The vacuum electromagnetic valves Y 1 to Y 3 are provided as close as possible to the bottom side of the adsorption towers 3a, 3b, and 3c , and the outlet portions 26 (sixth
(Fig.) is disposed toward the bottom of the adsorption towers 3a, 3b, and 3c. The one-way valves X 1 to X 3 are arranged in opposite directions to the above-mentioned valves Y 1 to Y 3 . That is, in the connecting pipe 10a, the vacuum electromagnetic valves X 1 and Y 1 are provided with their inlets 25 facing each other, and their opening and closing operations are controlled in the same manner at the same timing. Therefore, even if gas leaks in the direction of arrow L (see Fig. 6) from the solenoid valve X1 during the desorption process of the adsorption tower 3a, this gas flow is completely blocked by the solenoid valve Y1 on the adsorption tower 3a side, and the adsorption tower During the desorption step 3a, the O 2 gas in the adsorption towers 3b and 3c does not get mixed in at all.
(実施例)
第1図及び第2図に示す構成の小型PSA装置
において、原料空気供給量を3200N/hとして
5.5Kg/cm2Gで供給し、800N/hのN2ガスを回
収する実験を下記のPSA装置によつて行なつた。(Example) In a small PSA device with the configuration shown in Figures 1 and 2, the raw air supply amount was 3200N/h.
An experiment in which N 2 gas was supplied at 5.5 Kg/cm 2 G and recovered at 800 N/h was conducted using the following PSA device.
吸着塔内径:80mm
吸着塔高さ:1000mm
吸着剤 :合成ゼオライト13X型(改良型)
脱着圧力 :100Torr
この結果従来のPSA装置(第2図に示す)に
おいては、回収N2ガスの純度は99.9%が限界で
あつたが、本発明のPSA装置においては、99.997
%の高純度を達成した。Adsorption tower inner diameter: 80 mm Adsorption tower height: 1000 mm Adsorbent: Synthetic zeolite 13X type (improved type) Desorption pressure: 100 Torr As a result, in the conventional PSA device (shown in Figure 2), the purity of recovered N 2 gas is 99.9 %, but in the PSA device of the present invention, the limit was 99.997%.
% high purity was achieved.
上記の様に2つの真空用電磁弁を直列して配設
する箇所は上記の実施例に限らず、排ガス廃棄管
4aに設けられる自動開閉弁V4〜V6その他の自
動開閉弁配設箇所に適用しても良い。また回収ガ
ス分離用のPSA装置のみに限らず、その前段に
設けられる前処理装置において適用しても構わな
い。さらに上記のN2ガス回収の例に限らず、O2
ガス回収やH2ガスの精製等のPSA装置にも適用
できる。 The locations where the two vacuum solenoid valves are arranged in series as described above are not limited to the above embodiments, and the locations where the automatic on-off valves V 4 to V 6 provided in the exhaust gas disposal pipe 4a and other automatic on-off valves are provided. May be applied to Further, the present invention is not limited to the PSA device for separating recovered gas, but may be applied to a pretreatment device provided upstream of the PSA device. Furthermore, in addition to the above example of N 2 gas recovery, O 2
It can also be applied to PSA equipment for gas recovery, H2 gas purification, etc.
[発明の効果]
本発明により、小型の真空用電磁弁を適用する
PSA装置においても、製品ガスを高純度で回収
できる様になつた。[Effect of the invention] According to the present invention, a small vacuum solenoid valve is applied.
PSA equipment has also become able to recover product gas with high purity.
第1図は本発明の代表的な実施例を示す概略説
明図、第2図は従来例を示す概略説明図、第3図
は工程説明図、第4図は吸着塔3bの脱着工程状
態を示す説明図、第5図a,bは洗浄工程及び回
収工程を示すための説明図、第6図は真空用電磁
弁の例を示す断面説明図である。
1a…原料ガス供給管、2a,2b…前処理
塔、3a,3b,3c…吸着塔、4a…排ガス廃
棄管、5…脱着用管、6…真空ポンプ、8…洗浄
用管、9…圧縮機、10a,10b,10c…連
結配管、20…ケーシング、21…コイル、22
…スプリング、23…プランジヤ、24…弁体、
25…入口部、26…出口部、27…弁座。
Fig. 1 is a schematic explanatory diagram showing a typical embodiment of the present invention, Fig. 2 is a schematic explanatory diagram showing a conventional example, Fig. 3 is a process explanatory diagram, and Fig. 4 shows the desorption process state of the adsorption tower 3b. FIGS. 5a and 5b are explanatory views showing the cleaning process and the recovery process, and FIG. 6 is a cross-sectional view showing an example of a vacuum electromagnetic valve. 1a... Raw material gas supply pipe, 2a, 2b... Pretreatment tower, 3a, 3b, 3c... Adsorption tower, 4a... Exhaust gas disposal pipe, 5... Desorption pipe, 6... Vacuum pump, 8... Cleaning pipe, 9... Compression machine, 10a, 10b, 10c...connection piping, 20...casing, 21...coil, 22
...Spring, 23...Plunger, 24...Valve body,
25... Inlet part, 26... Outlet part, 27... Valve seat.
Claims (1)
管及び洗浄用管を接続すると共に、2つの吸着塔
同士を連結配管によつて直列接続する様に構成し
てなる圧力スイング吸着装置において、1対の真
空用電磁弁を、互いに入口側が背中合わせとなる
様に、前記連結配管の両端部近傍に直列配設され
てなることを特徴とする圧力スイング吸着装置。1. In a pressure swing adsorption device configured such that a raw material gas supply pipe, a desorption pipe, and a cleaning pipe are connected to each of a plurality of adsorption towers, and two adsorption towers are connected in series with each other by a connecting pipe, A pressure swing adsorption device characterized in that a pair of vacuum electromagnetic valves are arranged in series near both ends of the connecting pipe so that the inlet sides are back to back.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63140142A JPH01307426A (en) | 1988-06-06 | 1988-06-06 | Pressure-swinging adsorber |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63140142A JPH01307426A (en) | 1988-06-06 | 1988-06-06 | Pressure-swinging adsorber |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH01307426A JPH01307426A (en) | 1989-12-12 |
| JPH0331487B2 true JPH0331487B2 (en) | 1991-05-07 |
Family
ID=15261851
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP63140142A Granted JPH01307426A (en) | 1988-06-06 | 1988-06-06 | Pressure-swinging adsorber |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH01307426A (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP7023736B2 (en) | 2018-02-16 | 2022-02-22 | 大陽日酸株式会社 | Gas purification equipment, gas purification method, propene production equipment and propane production equipment |
| JP6965198B2 (en) * | 2018-03-30 | 2021-11-10 | 大陽日酸株式会社 | Gas purification equipment and gas purification method |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS607920A (en) * | 1983-06-29 | 1985-01-16 | Hitachi Ltd | Separation of mixed gas and its apparatus |
-
1988
- 1988-06-06 JP JP63140142A patent/JPH01307426A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPH01307426A (en) | 1989-12-12 |
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