JPH048086B2 - - Google Patents
Info
- Publication number
- JPH048086B2 JPH048086B2 JP63157847A JP15784788A JPH048086B2 JP H048086 B2 JPH048086 B2 JP H048086B2 JP 63157847 A JP63157847 A JP 63157847A JP 15784788 A JP15784788 A JP 15784788A JP H048086 B2 JPH048086 B2 JP H048086B2
- Authority
- JP
- Japan
- Prior art keywords
- gas
- pipe
- adsorption tower
- adsorption
- tower
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000001179 sorption measurement Methods 0.000 claims description 66
- 238000011084 recovery Methods 0.000 claims description 34
- 239000002699 waste material Substances 0.000 claims description 10
- 239000003463 adsorbent Substances 0.000 claims description 9
- 230000008929 regeneration Effects 0.000 claims description 9
- 238000011069 regeneration method Methods 0.000 claims description 9
- 239000002994 raw material Substances 0.000 claims description 4
- 239000007789 gas Substances 0.000 claims 6
- 239000002912 waste gas Substances 0.000 claims 1
- 238000000034 method Methods 0.000 description 17
- 238000003795 desorption Methods 0.000 description 10
- 238000010586 diagram Methods 0.000 description 10
- 238000004140 cleaning Methods 0.000 description 6
- 229910021536 Zeolite Inorganic materials 0.000 description 3
- HNPSIPDUKPIQMN-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Al]O[Al]=O HNPSIPDUKPIQMN-UHFFFAOYSA-N 0.000 description 3
- 238000005406 washing Methods 0.000 description 3
- 239000010457 zeolite Substances 0.000 description 3
- 238000002474 experimental method Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000010926 purge Methods 0.000 description 1
- 230000001172 regenerating effect Effects 0.000 description 1
- 239000000741 silica gel Substances 0.000 description 1
- 229910002027 silica gel Inorganic materials 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02C—CAPTURE, STORAGE, SEQUESTRATION OR DISPOSAL OF GREENHOUSE GASES [GHG]
- Y02C20/00—Capture or disposal of greenhouse gases
- Y02C20/40—Capture or disposal of greenhouse gases of CO2
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P20/00—Technologies relating to chemical industry
- Y02P20/151—Reduction of greenhouse gas [GHG] emissions, e.g. CO2
Landscapes
- Separation Of Gases By Adsorption (AREA)
- Oxygen, Ozone, And Oxides In General (AREA)
Description
【発明の詳細な説明】
[産業上の利用分野]
本発明は高純度ガスの製造に利用される圧力ス
イング吸着装置(以下単にPSA装置という)に
関し、詳細には高純度の製品ガスを高回収率で回
収することのできるPSA装置に関するものであ
る。[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to a pressure swing adsorption device (hereinafter simply referred to as a PSA device) used in the production of high-purity gas, and in particular, the present invention relates to a pressure swing adsorption device (hereinafter simply referred to as a PSA device) used in the production of high-purity gas. This relates to a PSA device that can be recovered at a high rate.
以下には原料空気からN2ガスを高純度で回収
するPSA装置について例示的に説明するが、本
発明装置の適用対象はこれによつて限定解釈され
てはならない。 A PSA device for recovering N 2 gas with high purity from feed air will be exemplified below, but this should not be construed as limiting the scope of application of the device of the present invention.
[従来の技術]
第3図は前処理装置R及びN2ガスを選択的に
吸着回収するPSA装置Pによつて構成されるN2
ガス回収装置の概略説明図である。前処理装置R
の圧縮機9によつて加圧された原料空気は前処理
塔2a,2bのいずれかに送給され、吸着剤に
H2O及びCO2成分を吸着させた後、ここを通過し
たO2/N2混合ガスは3塔式PSA装置Pへ送り込
まれる。第6図は該前処理塔2a,2bの工程を
示す説明図であり、吸着工程及び脱着工程が周期
的に交互に行なわれる。[Prior Art] Fig. 3 shows an N 2 gas system comprising a pretreatment device R and a PSA device P that selectively adsorbs and recovers N 2 gas.
FIG. 2 is a schematic explanatory diagram of a gas recovery device. Pretreatment device R
The raw air pressurized by the compressor 9 is sent to either the pretreatment tower 2a or 2b and is applied to the adsorbent.
After adsorbing H 2 O and CO 2 components, the O 2 /N 2 mixed gas that has passed through this is sent to the three-column PSA device P. FIG. 6 is an explanatory diagram showing the steps of the pretreatment towers 2a and 2b, in which adsorption steps and desorption steps are carried out periodically and alternately.
前処理済ガス導出管21、一時貯留ホルダ11
及び原料ガス供給管1aを介してPSA装置Pに
供給される混合ガスは、自動開閉弁(以下単に弁
という)V1〜V3を介して吸着塔3a,3b,3
cのいずれかに導入される。各塔の底部には弁
V4〜V6を介して排ガス廃棄管4aが連結され、
該排ガス廃棄管4aは前処理塔2a,2bの再生
用ガス導入管22に連結され、吸着塔3a,3
b,3cを通過したO2を主成分とする排ガスは
前処理塔内に吸着されたH2OとCO2脱着のための
バージ用ガスとして利用される。また吸着塔3
a,3b,3c下部には分岐管を介して脱着用管
5が接続され、真空ポンプ6によつて脱着された
N2ガスは製品ガスホルダ20に貯留される。製
品ガスホルダ20には、洗浄用管8が配設され、
該洗浄用管8は分岐された後、弁V13〜V15を介
して吸着塔3a,3b,3cの各頂部に連結され
る。尚各吸着塔3a,3b,3cは連結配管10
a,10b,10cによつて直列的にも連結され
る。 Pretreated gas outlet pipe 21, temporary storage holder 11
The mixed gas supplied to the PSA device P via the raw material gas supply pipe 1a is passed through the adsorption towers 3a, 3b, 3 via automatic on-off valves (hereinafter simply referred to as valves) V1 to V3.
c. Valve at the bottom of each tower
The exhaust gas waste pipe 4a is connected via V 4 to V 6 ,
The exhaust gas waste pipe 4a is connected to the regeneration gas introduction pipe 22 of the pretreatment towers 2a, 2b, and
The exhaust gas mainly composed of O 2 that has passed through b and 3c is used as barge gas for desorption of H 2 O and CO 2 adsorbed in the pretreatment tower. Also, adsorption tower 3
A desorption tube 5 is connected to the lower part of a, 3b, and 3c via a branch pipe, and is desorbed by a vacuum pump 6.
N 2 gas is stored in the product gas holder 20 . A cleaning pipe 8 is installed in the product gas holder 20,
After the cleaning pipe 8 is branched, it is connected to the tops of the adsorption towers 3a, 3b, and 3c via valves V13 to V15 . Each adsorption tower 3a, 3b, 3c is connected to a connecting pipe 10.
They are also connected in series by a, 10b, and 10c.
第4図は、吸着塔3a,3b,3cの作動工程
を示す説明図であり、吸着工程開始時から脱着工
程終了時までの作動工程を1工程サイクルとして
いる。この1工程サイクルは図示の如く吸着工
程、回収工程、洗浄工程及び脱着工程より構成さ
れる。吸着工程では脱着の完了した吸着塔内を加
圧すると共に、O2/N2混合ガスを供給管1aか
ら加圧供給し、回収目的成分のN2ガスを吸着剤
に吸着させ不純成分ガス(主にO2ガス)を排ガ
ス廃棄管4a及び前処理装置Rを介して放出させ
る。又脱着工程では吸着塔を真空ポンプ6によつ
て減圧し、吸着塔内の吸着剤に吸着されたN2を
脱着し脱着用管5を通して製品ガスホルダ20に
回収貯留する。 FIG. 4 is an explanatory diagram showing the operating steps of the adsorption towers 3a, 3b, and 3c, and the operating steps from the start of the adsorption step to the end of the desorption step are defined as one step cycle. As shown in the figure, this one-step cycle consists of an adsorption step, a recovery step, a washing step, and a desorption step. In the adsorption process, the interior of the adsorption tower after desorption is completed is pressurized, and O 2 /N 2 mixed gas is supplied under pressure from the supply pipe 1a, so that the target N 2 gas to be recovered is adsorbed on the adsorbent, and the impurity component gas (main component gas) is and O 2 gas) is released through the exhaust gas waste pipe 4a and the pretreatment device R. In the desorption step, the adsorption tower is depressurized by the vacuum pump 6, and the N 2 adsorbed by the adsorbent in the adsorption tower is desorbed and collected and stored in the product gas holder 20 through the desorption pipe 5.
次に回収工程及び洗浄工程を、吸着等3aの場
合を例に挙げて説明すると第5図a及びbによつ
て示される。即ち第5図aの状態においては、洗
浄用管8を通して高純度N2ガスを吸着塔3cへ
送給し、塔内の残留O2成分を追放し、吸着工程
の終了した吸着塔3aへ連結配管10cを介して
送り込み、洗浄済み排ガス中のN2成分を回収す
る。このとき吸着塔3aでは回収工程が行なわ
れ、吸着塔3cでは洗浄工程が行なわれる。また
第5図bの状態では、吸着塔3aは洗浄工程を行
ない、吸着塔3bは回収工程を行なう。 Next, the recovery step and the washing step will be explained using the case of adsorption etc. 3a as an example, as shown in FIGS. 5a and 5b. That is, in the state shown in Fig. 5a, high-purity N 2 gas is supplied to the adsorption tower 3c through the cleaning pipe 8, the residual O 2 component in the tower is expelled, and the adsorption tower 3a is connected to the adsorption tower 3a where the adsorption process has been completed. The N 2 component in the cleaned exhaust gas is recovered by sending it through the pipe 10c. At this time, a recovery process is performed in the adsorption tower 3a, and a washing process is performed in the adsorption tower 3c. In the state shown in FIG. 5b, the adsorption tower 3a performs a cleaning process, and the adsorption tower 3b performs a recovery process.
[発明が解決しようとする課題]
上記吸着工程の初期において吸着塔3a,3
b,3cを通過した排ガス中のN2成分濃度は比
較的に低く、該排ガスを前処理装置Rの再生用パ
ージガスとして放出しても製品N2ガスの回収率
を著しく低下することはない。[Problem to be solved by the invention] At the initial stage of the adsorption process, the adsorption towers 3a, 3
The concentration of the N 2 component in the exhaust gas that has passed through b and 3c is relatively low, and even if the exhaust gas is released as a purge gas for regeneration of the pretreatment device R, the recovery rate of the product N 2 gas will not be significantly reduced.
しかしながら、回収工程で排ガス廃棄管4aへ
流入する排ガスは吸着工程終了後の2つの吸着塔
を[第5図a,bに示す]を直列的に通過するも
のの、N2ガスの濃度は高く(おおよそ90%)、こ
の排ガスを前処理装置Rを経由して放出してしま
うと、N2ガスの回収率を著しく低下させること
になる。尚吸着工程終期における排ガス中のN2
ガス濃度も比較的高く、これを放散させることは
回収率の低下につながる。 However, although the exhaust gas flowing into the exhaust gas waste pipe 4a in the recovery process passes through two adsorption towers in series [shown in Figure 5 a and b] after the adsorption process, the concentration of N 2 gas is high ( (approximately 90%), and if this exhaust gas is released via the pretreatment device R, the recovery rate of N 2 gas will be significantly reduced. In addition, N2 in the exhaust gas at the end of the adsorption process
Gas concentration is also relatively high, and dissipating this leads to a decrease in recovery rate.
そこで本発明者らは、回収目的成分ガスの濃度
を高純度に保持したままで、回収率を向上させる
ことを目的として種々研究を重ね、本発明を完成
した。 Therefore, the present inventors have completed various studies with the aim of improving the recovery rate while maintaining the concentration of the target component gas to be recovered at a high purity, and have completed the present invention.
[課題を解決するための手段]
上記目的を達成し得た本発明は、排ガス廃棄管
と再生用ガス導入管を連結する配管を2系統に分
岐させ、さらに再合流せしめる構成とし、前記圧
力スイング吸着塔における回収成分ガスを吸着す
る吸着剤を収納した回収吸着塔を前記2系統のい
ずれか一方に設ける点を要旨とするものである。[Means for Solving the Problems] The present invention, which has achieved the above object, has a structure in which the pipe connecting the exhaust gas waste pipe and the regeneration gas introduction pipe is branched into two systems, and further joined together, and the pressure swing is The gist is that a recovery adsorption tower containing an adsorbent for adsorbing the recovered component gas in the adsorption tower is provided in one of the two systems.
[作用及び実施例]
第1図は本発明の代表的な実施例を示す概略説
明図である、第3図に示した従来例と比較すると
本発明の特徴的な構成は下記の通りである。即ち
排ガス廃棄管4aと再生用ガス導入管22の間
を、バイパス管12と回収吸着塔配管13の2系
統によつて並列的に接続し、該回収吸着塔配管1
3には回収吸着塔14及び弁X2,X3を設け、前
記バイパス管12には弁X1を配設する。上記回
収吸着塔14内には回収目的成分であるN2を選
択的に吸着する合成ゼオライトを装填する。[Operations and Examples] Fig. 1 is a schematic explanatory diagram showing a typical embodiment of the present invention.Compared with the conventional example shown in Fig. 3, the characteristic configuration of the present invention is as follows. . That is, the exhaust gas waste pipe 4a and the regeneration gas introduction pipe 22 are connected in parallel by two systems: the bypass pipe 12 and the recovery adsorption tower pipe 13, and the recovery adsorption tower pipe 1
3 is provided with a recovery adsorption tower 14 and valves X 2 and X 3 , and the bypass pipe 12 is provided with a valve X 1 . The recovery adsorption tower 14 is loaded with synthetic zeolite that selectively adsorbs N2 , which is the target component to be recovered.
上記バイパス管12及び回収吸着塔配管13は
第2図A〜Cに示す様に使用される。即ち排ガス
廃棄管4a内を通過する排ガス中にN2成分が少
ないときには、弁X2,X3を閉鎖して弁X1を開放
し、バイパス管12を介してこの排ガスを再生用
ガス導入管22経由で前処理塔2a,2bへ送給
する。 The bypass pipe 12 and recovery adsorption column pipe 13 are used as shown in FIGS. 2A to 2C. That is, when there is little N2 component in the exhaust gas passing through the exhaust gas waste pipe 4a , valves X 2 and 22 to the pretreatment towers 2a and 2b.
一方吸着塔3a,3b,3cのいずれかにおい
て回収工程を行なつているとき(第4図参照)、
或は吸着工程の後期即ち排ガス廃棄管4a内を流
れる排ガス中に高濃度のN2ガスが混入している
ときには、弁X1を閉じて弁X2,X3を開放し、第
2図Bに示す如く排ガスを回収吸着塔14へ導入
し、排ガス中のN2成分を吸着剤に吸着させ、該
回収吸着塔14を通過したガスのみを再生用ガス
導入管22へ導く。 On the other hand, when the recovery process is performed in any of the adsorption towers 3a, 3b, and 3c (see Fig. 4),
Alternatively, in the latter stage of the adsorption process, that is, when high concentration N 2 gas is mixed in the exhaust gas flowing in the exhaust gas disposal pipe 4a, valve X 1 is closed and valves X 2 and X 3 are opened, as shown in FIG. 2B. As shown in the figure, the exhaust gas is introduced into the recovery adsorption tower 14, the N 2 component in the exhaust gas is adsorbed by the adsorbent, and only the gas that has passed through the recovery adsorption tower 14 is led to the regeneration gas introduction pipe 22.
上記の弁X1〜X3の開閉制御は第4図の工程ス
ケジユールに合わせて時間的に制御する手段とし
ても良いし、或は排ガス廃棄管4aにN2ガス濃
度測定器を配置し、該測定器の検出値に応じて弁
X1〜X3を開閉制御できる様に構成しても構わな
い。 The above-mentioned opening / closing control of the valves X 1 to X 3 may be controlled temporally in accordance with the process schedule shown in FIG. Valve depending on the detection value of the measuring device
It may be configured so that opening and closing of X 1 to X 3 can be controlled.
また回収吸着塔14内に吸着されたN2成分は
次に述べる方法によつて脱着して吸着剤の再生を
はかると共に、N2成分を再び回収する。即ち第
2図Cに示す様に、脱着工程が完了して減圧状態
にある吸着塔(例えば3a)と回収吸着塔14
を、弁X2,V4を開放することによつて連通する。
このとき弁X1,X3は閉鎖とする。この作動によ
り回収吸着塔14内の吸着剤は減圧再生されると
共に、脱着されたN2成分は吸着塔3a内に吸着
されて再回収されることになる。この作動の後吸
着塔3aにおいては吸着工程が開始され、第4図
に示す工程順序に従つて運転が繰返される。 Further, the N 2 component adsorbed in the recovery adsorption tower 14 is desorbed by the method described below to regenerate the adsorbent and recover the N 2 component again. That is, as shown in FIG. 2C, the adsorption tower (for example, 3a) and the recovery adsorption tower 14 are in a reduced pressure state after the desorption process is completed.
are communicated by opening valves X 2 and V 4 .
At this time, valves X 1 and X 3 are closed. Through this operation, the adsorbent in the recovery adsorption tower 14 is regenerated under reduced pressure, and the desorbed N 2 component is adsorbed in the adsorption tower 3a and recovered again. After this operation, the adsorption process is started in the adsorption tower 3a, and the operation is repeated according to the process sequence shown in FIG.
尚該回収吸着塔14の再生方法は上記の例に限
らず、別に真空ポンプ及びガスホルダを回収吸着
塔14に直列接続し、該回収吸着塔14を使用し
ないときに減圧してN2成分を脱着できる様に構
成し、該ガスホルダと吸着塔3a,3b,3cを
別の配管を経由して接続し、吸着工程のいずれか
の時点で吸着塔3a,3b,3c側へ送給しても
構わない。 Note that the method for regenerating the recovery adsorption tower 14 is not limited to the above example; a vacuum pump and a gas holder are separately connected in series to the recovery adsorption tower 14, and when the recovery adsorption tower 14 is not in use, the pressure is reduced to desorb the N2 component. The gas holder and the adsorption towers 3a, 3b, 3c may be connected via separate piping, and the gas may be fed to the adsorption towers 3a, 3b, 3c at any point in the adsorption process. do not have.
またバイパス管12と回収吸着塔配管13の再
生用ガス導入管22側の合流点の下流部に、排ガ
ス貯留用のガスホルダを配設しておき、バイパス
管12及び回収吸着塔配管13を夫々通過する排
ガスを均圧化すると共に、弁Z7,Z8を介して逆流
されてくる可能性があるO2/N2混合ガスを減圧
して吸着塔3a,3b,3c側へ逆流しない様に
することが推奨される。 Further, a gas holder for storing exhaust gas is provided downstream of the confluence of the bypass pipe 12 and the recovery adsorption tower piping 13 on the side of the regeneration gas introduction pipe 22, and the gas holder is provided for storing exhaust gas. At the same time, the pressure of the O 2 /N 2 mixed gas that may flow back through valves Z 7 and Z 8 is reduced to prevent it from flowing back to the adsorption towers 3a, 3b, and 3c. It is recommended that you do so.
(実験例)
第1図及び第3図に示した装置を使つて下記の
条件でN2ガスの回収実験を行ない、N2ガス回収
率の比較を行なつた。(Experimental Example) Using the apparatus shown in FIGS. 1 and 3, an N 2 gas recovery experiment was conducted under the following conditions, and the N 2 gas recovery rates were compared.
前処理塔内径:50mm
前処理塔高さ:1000mm
前処理塔着剤:合成ゼオライト13X型及びシリカ
ゲル
原料空気供給量:3200N/h
原料空気供給圧:5.0Kg/cm2G
吸着塔内径:80mm
吸着塔高さ:1000mm
吸着塔吸着剤:合成ゼオライト5A型
脱着圧力:100Torr
この実験によれば、第3図に示した従来装置で
は、回収率は約25%であつたが、本発明装置では
回収率を36%とすることができた。尚両装置とも
回収N2ガスの純度は99.99%であつた。Pretreatment tower inner diameter: 50mm Pretreatment tower height: 1000mm Pretreatment tower adhesive: Synthetic zeolite 13X type and silica gel Raw air supply amount: 3200N/h Raw material air supply pressure: 5.0Kg/cm 2 G Adsorption tower inner diameter: 80mm Adsorption Column height: 1000 mm Adsorption tower adsorbent: Synthetic zeolite 5A type Desorption pressure: 100 Torr According to this experiment, the recovery rate was about 25% with the conventional device shown in Figure 3, but the recovery rate with the device of the present invention was We were able to increase the rate to 36%. In both devices, the purity of the recovered N 2 gas was 99.99%.
[発明の効果]
本発明により回収目的成分濃度は高純度のまま
で、従来装置に比較して製品ガスの回収率を向上
できる様になつた。[Effects of the Invention] According to the present invention, the concentration of the target component to be recovered remains high in purity, and the recovery rate of product gas can be improved compared to conventional devices.
第1図は本発明の代表的な実施例を示す概略説
明図、第2図A,B,Cは本発明装置の作動状態
を示す説明図、第3図は従来の装置例を示す概略
説明図、第4図は第3図に示す吸着塔の工程を示
す説明図、第5図a,bは洗浄工程及び回収工程
を示す説明図、第6図は前処理塔の工程を示す説
明図である。
1a……加圧原料ガス導入管、2a,2b……
前処理塔、3a,3b,3c……吸着塔、4a…
…排ガス廃棄管、6……真空ポンプ、8……洗浄
用管、9……圧縮機、10……製品ガスホルダ、
10a,10b,10c……連結配管、12……
バイパス管、13……排ガスホルダ、14……回
収吸着塔、21……前処理済ガス導出管、22…
…再生用ガス導入管。
Fig. 1 is a schematic explanatory diagram showing a typical embodiment of the present invention, Fig. 2 A, B, and C are explanatory diagrams showing the operating state of the device of the present invention, and Fig. 3 is a schematic explanatory diagram showing an example of a conventional device. Figure 4 is an explanatory diagram showing the process of the adsorption tower shown in Figure 3, Figures 5a and b are explanatory diagrams showing the cleaning process and recovery process, and Figure 6 is an explanatory diagram showing the process of the pretreatment tower. It is. 1a... Pressurized raw material gas introduction pipe, 2a, 2b...
Pretreatment tower, 3a, 3b, 3c... adsorption tower, 4a...
...Exhaust gas waste pipe, 6...Vacuum pump, 8...Cleaning pipe, 9...Compressor, 10...Product gas holder,
10a, 10b, 10c...connection piping, 12...
Bypass pipe, 13... Exhaust gas holder, 14... Recovery adsorption tower, 21... Pretreated gas outlet pipe, 22...
...Gas introduction pipe for regeneration.
Claims (1)
スイング吸着塔に設ける加圧原料ガス導入管を連
結すると共に、前記圧力スイング吸着塔に設ける
排ガス廃棄管と前記前処理塔に設ける再生用ガス
導入管を連結してなる圧力スイング吸着装置にお
いて、前記排ガス廃棄管と再生用ガス導入管を連
結する配管を2系統に分岐させ、さらに再合流せ
しめる構成とし、前記圧力スイング吸着塔におけ
る回収成分ガスを吸着する吸着剤を収納した回収
吸着塔が前記2系統のいずれか一方に設けられて
なることを特徴とする圧力スイング吸着装置。1 Connect the pretreated gas outlet pipe provided in the pretreatment tower and the pressurized raw material gas introduction pipe provided in the pressure swing adsorption tower, and connect the exhaust gas waste pipe provided in the pressure swing adsorption tower and the regeneration gas provided in the pretreatment tower. In a pressure swing adsorption device formed by connecting inlet pipes, the pipe connecting the waste gas waste pipe and the regeneration gas inlet pipe is branched into two systems, which are then recombined, and the collected component gas in the pressure swing adsorption tower is A pressure swing adsorption apparatus characterized in that a recovery adsorption tower containing an adsorbent for adsorbing is provided in one of the two systems.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63157847A JPH026815A (en) | 1988-06-24 | 1988-06-24 | Pressure-swinging adsorber |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63157847A JPH026815A (en) | 1988-06-24 | 1988-06-24 | Pressure-swinging adsorber |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH026815A JPH026815A (en) | 1990-01-11 |
| JPH048086B2 true JPH048086B2 (en) | 1992-02-14 |
Family
ID=15658660
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP63157847A Granted JPH026815A (en) | 1988-06-24 | 1988-06-24 | Pressure-swinging adsorber |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH026815A (en) |
-
1988
- 1988-06-24 JP JP63157847A patent/JPH026815A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPH026815A (en) | 1990-01-11 |
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