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JPH0331650B2 - - Google Patents
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JPH0331650B2 - - Google Patents

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Publication number
JPH0331650B2
JPH0331650B2 JP58065003A JP6500383A JPH0331650B2 JP H0331650 B2 JPH0331650 B2 JP H0331650B2 JP 58065003 A JP58065003 A JP 58065003A JP 6500383 A JP6500383 A JP 6500383A JP H0331650 B2 JPH0331650 B2 JP H0331650B2
Authority
JP
Japan
Prior art keywords
nozzle
raw material
melt
vanadium
roll
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP58065003A
Other languages
Japanese (ja)
Other versions
JPS59190222A (en
Inventor
Takeshi Masumoto
Kenji Suzuki
Shuji Masuda
Yukihiro Oota
Mika Ookubo
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Otsuka Chemical Co Ltd
Original Assignee
Otsuka Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Otsuka Chemical Co Ltd filed Critical Otsuka Chemical Co Ltd
Priority to JP58065003A priority Critical patent/JPS59190222A/en
Publication of JPS59190222A publication Critical patent/JPS59190222A/en
Publication of JPH0331650B2 publication Critical patent/JPH0331650B2/ja
Granted legal-status Critical Current

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  • Inorganic Compounds Of Heavy Metals (AREA)
  • Ceramic Capacitors (AREA)
  • Hard Magnetic Materials (AREA)
  • Optical Integrated Circuits (AREA)
  • Thin Magnetic Films (AREA)
  • Fixed Capacitors And Capacitor Manufacturing Machines (AREA)
  • Inorganic Insulating Materials (AREA)

Description

【発明の詳现な説明】[Detailed description of the invention]

本発明は、新芏なバナゞりム−チタン系化合物
材料及びその補造法に関する。 近幎゚レクトロニクス及びその関連技術の発展
に䌎぀お、酞化バナゞりムV2O5を䞻ずする
酞化物系セラミツクス及びその単結晶の研究が掻
発に行なわれおおり、特に光−電気、音−電気、
雰囲気ガス−電気、光音偏光、線分光等の分野
における倉換玠子材料ずしお、又觊媒材料、磁性
材料等ずしお研究が行なわれおいる。V2O5ず
TiO2ずの安定な化合物ずしおは、数皮の結晶䜓
に぀いお〜の文献に蚘茉されおいるのみで、
これ等の単結晶化の研究はさかんに行なわれおい
るものの、非晶質郚分を含む化合物に぀いおの研
究は行なわれおいない。 本発明は、埓来党く知られおいない、少なくず
も䞀郚が非晶質からなるバナゞりム−チタン系酞
化物を提䟛するものである。即ち、本発明は、 V2O51-x・TiO2x䜆し、0.70≧な
る組成を有する、非晶質郚分を含むバナゞりム−
チタン系化合物材料、及びV2O51-x・TiO2x
䜆し、は䞊蚘に同じに盞圓する酞化バナゞ
りムず酞化チタンずの混合物を加熱溶融した埌、
104〜106℃秒の冷华速床で超急冷するこずを特
城ずする、非晶質郚分を含むバナゞりム−チタン
系化合物材料の補造法に係るものである。 本発明のバナゞりム−チタン系酞化物は、磁性
材料、光応答性磁性玠子、枩床応答性磁性玠子、
磁気メモリ材料、むオン䌝導材料、磁気テヌプ、
觊媒、光透過性導電材料、誘電䜓材料、光−電気
スむツチング玠子、熱−電気スむツチング玠子等
ずしお有甚である。 尚、本発明においおは、“非晶質郚分を含むバ
ナゞりム−チタン系化合物”ずは、非晶質䞭に倚
結晶盞を含む堎合のみならず、非晶質単独の堎合
をも包含するものずする。 本発明のバナゞりム−チタン系酞化物は、以䞋
の様にしお補造される。 本発明においお䜿甚する原料は、酞化バナゞり
ムず酞化チタンずの混合物であり、その組成割合
は、V2O51-x・TiO2x䜆し≊0.70
ずなる量比である。䞊蚘組成比范の原料混合物を
加熱溶融し、これを超急冷する。加熱溶融は、こ
れ等原料混合物が充分に溶融する枩床以䞊で行な
えば良く、奜たしくは溶融枩床よりも50〜200℃
高い枩床範囲特に奜たしくは80〜150℃高い枩床
で加熱する。加熱時の雰囲気に察する制限は特に
無く、通垞空気䞭で行う。次いで原料混合物の融
液を超急冷する。超急冷は、本発明方法の必須の
芁件であ぀お、これによりはじめお非晶質郚分を
含む新芏化合物を収埗するこずが出来る。超急冷
は通垞104〜106℃秒皋床の冷华速床で行う。こ
の超急冷は、䞊蚘冷华速床で冷华出来る手段であ
れば広い範囲で各皮の手段が採甚出来、高速回転
䞭のロヌル衚面䞊に原料混合物の融液を噎霧しお
液䜓状態の原子配眮にお固化せしめる方法を代衚
䟋ずしお挙げるこずが出来る。 以䞋図面を参照し぀぀本発明方法の実斜に際し
䜿甚される融解原料混合物の急冷装眮の䞀䟋を説
明する。 第図は、架台䞊に蚭眮された急冷装眮本䜓
の正面図を瀺す。急冷装眮は、誘電加熱甚コむ
ル、原料加熱甚チナヌブ、該チナヌブの支
持䜓、融解原料噎出甚のノズル、急冷甚ロ
ヌル、ノズルの冷华甚ノズル、枊流
防止゚アノズル、ノズルの埮調敎機構
、゚アシリンダヌ、冷华された材料の受け
箱、冷华材料取出口等を䞻芁構成郚ずし
おいる。冷华甚ロヌルの内郚に該ロヌル冷华
甚のフアンを蚭眮し䞔぀ロヌル衚面偎端郚に空気
吹蟌み口を蚭けるこずにより、融解原料の急冷を
安定しお行なうこずが出来る。第図は、支持䜓
の詳现を瀺す。第図においお、支持䜓は、
バルブを備えた冷华氎導入路、冷华氎排
出路、ニヌドルバルブを備えたブロヌ゚
ア導入路、ロヌルの衚面ずノズルず
の間隔埮調敎機構及び原料融液を均䞀に抌出
す為の敎流甚目皿を備えおいる。 第図及び第図に瀺す急冷装眮を䜿甚しお
本発明方法を実斜する堎合、たず所定組成の原料
混合物を融液吹出し甚ノズルを有するチナヌ
ブ内に収玍する。このチナヌブは、高枩酞化
雰囲気状態で充分耐久性のある材質で䜜られ、た
ずえば癜金、癜金−ロゞりム、むリゞりム、窒化
ケむ玠、窒化ボロン等で䜜られたものが奜たし
い。尚、原料融液ず盎接接觊しない郚分の材質
は、高融点のセラミツクス、ガラス、金属でも良
い。ノズル口の圢状は、目的補品に応じお適宜に
決定され、たずえば现い線状材料の堎合は円い圢
状で、巟の広い補品の堎合はスリツト状の圢状の
ものを䜿甚する。ノズル口の圢状は、楕円圢その
他の圢状であ぀おも良い。チナヌブ内に収玍さ
れた原料混合物は、次いでその融点以䞊の枩床に
加熱され、融液ずされた埌、ノズルの口郚か
ら高速回転しおいるロヌルの面䞊に䞀定ガス
圧にお吹出され、ロヌル衚面䞊で急冷せしめられ
る。ノズル口ずロヌル面における原料融液の吹出
し角床は、目的化合物の巟が玄mm以䞋の堎合は
ロヌル面に察しお垂盎で良く、たたその巟が玄
mm以䞊の堎合はロヌル面垂線に察しお0゜〜45゜で
ある。これ等の吹出し角床調敎機構は、装眮自䜓
に所定の角床を蚭定可胜な機構ずしお組み蟌むこ
ずも出来るが、奜たしくはノズル自䜓を加工しお
おくのが良い。 原料混合物の加熱方法は、特に制限されない
が、通垞発熱䜓を有する炉、誘電加熱炉たたは集
光加熱炉で行う。原料融液の枩床は、その融点よ
り50〜200℃奜たしくは80〜150℃皋床高い枩床ず
するのが良い。この際融点にあたり近過ぎるず、
融液をロヌル面䞊に吹き出しおいる間にノズル附
近で冷华固化する恐れがあり逆にあたりにも高く
なりすぎるず、ロヌル面䞊での急冷が困難ずなる
傟向がある。 ロヌル面䞊に融液を吹き出すために䜿甚する加
圧甚ガスずしおは、䞍掻性ガスが奜たしく、たず
えばアルゎン、窒玠、ヘリりム等でも良いが、融
液原料を酞化状態に維持する為には、也燥圧瞮空
気が奜たしい。ガス圧は、ノズル口の倧きさにも
よるが、通垞0.1〜2.0Kgcm2奜たしくは0.5〜1.0
Kgcm2皋床である。たた原料融液を吹き出す際の
ノズル口ずロヌル面間の距離は、0.01〜1.0mm繋
床が良く、より奜たしくは0.05〜0.5mm皋床であ
る。0.01mmよりも小さな堎合、パドル量が非垞に
少なくなり、均䞀な材料が埗られず、䞀方1.0mm
よりも倧きい堎合、パドル量が過剰にな぀たり、
又組成融液の界面匵力により圢成されるパドル厚
さ以䞊の堎合には、パドルが圢成され難くなる傟
向が生ずる堎合がある。 ロヌルの材質は、熱䌝導性の良い銅及びその合
金、硬質クロムメツキ局を有する䞊蚘材料、さら
には鋌、ステンレススチヌル等である。ロヌルの
呚速床を秒〜35秒、奜たしくは10
秒〜20秒ずし、原料融液を急冷するこずによ
り目的ずする良質の非晶質郚分を含む化合物材料
が埗られる。この際ロヌル呚速床が秒以䞋
の堎合には、非晶質化し難い傟向が生じるので、
あたり奜たしくない。ロヌル呚速床が35秒よ
りも倧きくなるず、埗られる目的物材料の圢状が
非垞に薄膜化し、すべお鱗片状もしくは现玛状ず
なるが、材料構造的にはやはり本発明の化合物材
料である。 融液原料を回転ロヌル面䞊ぞ吹き出す雰囲気ず
しお枛圧䞋乃至高真空䞋、又は䞍掻性ガス雰囲気
䞭で本発明化合物の補造を行なう堎合には、高枩
状態での原料融液の還元が発生し、組成原子䞭の
酞玠原子の枛少が起り、埗られる材料に玫色もし
くは黒色等の着色が発生する。しかし乍ら、この
着色生成物も物性的には本発明化合物であり、着
色された状態で䜿甚可胜である。 原料混合物をチナヌブ内で加熱溶融せしめるに
際しおは、該混合物をすべお完党に融液化するこ
ずが必芁である。しかし乍ら、該混合物が完党に
融液化する前に、䞀郚融液化したものが、ノズル
先端から流出しおしたう恐れがあるため、ノズル
先端を局郚的に冷华しお融液の流出を防止するこ
ずが奜たしい。ノズルを局郚的に冷华する代衚的
手段は、ノズル先端に冷华甚ガスを吹き぀ける手
段であり、ガスずしおはアルゎン、ヘリりム、窒
玠等の䞍掻性ガスでも良いが、也燥冷圧瞮空気が
より奜たしい。 本発明に係る新芏なる非晶質化合物材料は、通
åžž50〜10Ό皋床の厚さであり、非垞にもろい材
料である。このためロヌル面で急冷され、固䜓化
された埌、できる限り材料に応力が加えられない
状態にするこずが奜たしい。応力付加ずなる原因
の䞀぀に倧気䞭でのロヌル回転により発生する颚
切り珟象からくるロヌル衚面空気局の倧きな乱流
がある。この乱流を防止するずずもに急冷华すべ
き溶融原料混合物ずロヌル面ずの密着性をより良
奜ずするために、颚切り防止甚向流吹出しノズル
即ち第図に瀺す枊流防止゚アノズルを蚭眮
するか、ロヌル内郚にフアンを固定蚭眮する。埌
者の堎合は、ロヌルの自転によりロヌル衚面偎端
郚に蚭けられた口埄可倉匏の空気導入口よりロヌ
ル内郚ぞ発生する乱流をすい蟌み、ロヌル軞正面
より排出し、ロヌル衚面䞊空気をロヌル内郚ぞ移
動せしめ、これにより溶融物をロヌル面ぞより抌
し぀け密着させ、さらに空気の吹蟌み移動により
ロヌル自䜓をも空冷するこずが出来る。たた埗ら
れる材料の寞法均䞀性を保持させるために、ロヌ
ル衚面に回転方向ずは盎角に材料切断甚の溝を蚭
けおおけば、䞀定寞法で切断された材料が埗られ
る。 本発明のバナゞりム−チタン系化合物は、その
原料混合比により化合物の原子配列構造が倧きく
倉化し、具䜓的には以䞋の劂くに倧別される。先
ず、≊0.70の堎合には非晶質化合物100
のものが埗られ、0.70の堎合にはTiO2のル
チル型結晶盞の混入した化合物が埗られる。第
図に本発明材料の生成範囲を瀺す。 䜿甚する急冷装眮の急冷甚ロヌルの呚速床が、
秒〜35秒の範囲内では、各組成域にお
いお埗られる材料の構造自䜓には倧きな倉化は認
められない。 尚、本発明材料の構造の同定に際しおは、線
回折及び偏光顕埮鏡により結晶性の有無の確認及
び構造解析を行ない、走査型電子顕埮鏡により極
少郚分の芳察を行な぀た。 以䞋実斜䟋により本発明の特城ずするずころを
より䞀局明らかにする。 実斜䟋  V2O5玔床99.9及びTiO2玔床99.9を
所定の組成で配合し、均䞀に混合した埌、850℃
で30分間仮焌しお組成物原料ずした。埗られた組
成物原料を癜金チナヌブ盎埄10mm×長さ150mm
に充填し、誘電加熱コむル内に蚭眮しお、発振管
繊条電圧13V、陜極電圧10KV、栌子電流120〜
150、陜極電流1.2〜1.8Aの条件䞋に誘電加熱
した。完党に融液化した原料を急冷甚回転ロヌル
衚面䞊に也燥圧瞮空気により吹き出し、急冷させ
た。 第衚及び第衚䞭詊料No.〜22は、本発明化
合物材料を瀺す。尚、No.21は、ロヌルの回転速床
が倧きい為、薄片ずな぀おいるが、圢状に制玄が
ない觊媒等の分野では䜿甚可胜である。又、No.23
〜25は、比范䟋である。 尚、ノズル圢状ずあるのは、0.2mm×mmの
スリツト状ノズルを瀺し、ノズル圢状ずあるの
は埄0.2mmの円圢ノズルを瀺す。
The present invention relates to a novel vanadium-titanium compound material and a method for producing the same. In recent years, with the development of electronics and related technologies, research has been actively conducted on oxide-based ceramics mainly containing vanadium oxide (V 2 O 5 ) and their single crystals. ,
Research is being conducted as a conversion element material in fields such as atmospheric gas-electricity, photoacoustic polarization, and X-ray spectroscopy, as well as as a catalyst material, magnetic material, and the like. V 2 O 5 and
As a stable compound with TiO 2 , only a few crystals have been described in a few documents.
Although many studies have been conducted on single crystallization, no studies have been conducted on compounds containing amorphous portions. The present invention provides a vanadium-titanium-based oxide that is at least partially amorphous and is completely unknown heretofore. That is, the present invention provides vanadium-containing amorphous portions having the composition (V 2 O 5 ) 1-x (TiO 2 ) x (where 0.70≧x>0).
Titanium compound material and (V 2 O 5 ) 1-x・(TiO 2 ) x
(However, x is the same as above) After heating and melting a mixture of vanadium oxide and titanium oxide,
The present invention relates to a method for producing a vanadium-titanium compound material containing an amorphous portion, which is characterized by ultra-rapid cooling at a cooling rate of 10 4 to 10 6 °C/sec. The vanadium-titanium-based oxide of the present invention can be used for magnetic materials, photoresponsive magnetic elements, temperature-responsive magnetic elements,
magnetic memory materials, ion conductive materials, magnetic tapes,
It is useful as a catalyst, a light-transparent conductive material, a dielectric material, a photo-electrical switching device, a thermo-electrical switching device, etc. In the present invention, the term "vanadium-titanium compound containing an amorphous portion" includes not only a case where a polycrystalline phase is included in the amorphous portion, but also a case where the compound is amorphous alone. do. The vanadium-titanium oxide of the present invention is produced as follows. The raw material used in the present invention is a mixture of vanadium oxide and titanium oxide, and its composition ratio is (V 2 O 5 ) 1-x・(TiO 2 ) x (0<x≩0.70).
This is the quantitative ratio. The raw material mixture of the above composition comparison is heated and melted, and then cooled very rapidly. The heating and melting may be carried out at a temperature higher than the temperature at which these raw material mixtures are sufficiently melted, preferably at a temperature of 50 to 200°C higher than the melting temperature.
Heating is carried out in a high temperature range, particularly preferably 80-150°C. There are no particular restrictions on the atmosphere during heating, and heating is usually performed in air. Next, the melt of the raw material mixture is ultra-quenched. Ultra-quenching is an essential requirement of the method of the present invention, and only through this is it possible to obtain a new compound containing an amorphous portion. Ultra-rapid cooling is usually performed at a cooling rate of about 10 4 to 10 6 °C/sec. A wide variety of methods can be used for this ultra-rapid cooling as long as it can be cooled at the cooling rate mentioned above.The melt of the raw material mixture is sprayed onto the surface of the roll rotating at high speed and solidified in the atomic arrangement of the liquid state. A typical example is the method of forcing people to do something. An example of a quenching apparatus for a molten raw material mixture used in carrying out the method of the present invention will be described below with reference to the drawings. FIG. 1 shows a front view of the rapid cooling device main body 3 installed on the pedestal 1. As shown in FIG. The quenching device includes a dielectric heating coil 5, a raw material heating tube 7, a support 9 for the tube 7, a nozzle 11 for spouting the molten raw material, a quenching roll 13, a cooling nozzle 15 for the nozzle 11, an eddy current prevention air nozzle 17, Fine adjustment mechanism 1 of nozzle 11
9, an air cylinder 21, a receiving box 23 for the cooled material, a cooling material outlet 25, etc. are the main components. By installing a fan for cooling the roll inside the cooling roll 13 and providing an air blowing port at the end of the roll surface, the molten raw material can be rapidly cooled stably. FIG. 2 shows details of the support 9. In FIG. 2, the support 9 is
A cooling water introduction path 29 equipped with a valve 27, a cooling water discharge path 31, a blow air introduction path 35 equipped with a needle valve 33, a mechanism 37 for finely adjusting the distance between the surface of the roll 13 and the nozzle 11, and a mechanism for uniformly pressing the raw material melt. It is equipped with a perforated plate 39 for rectifying the flow. When carrying out the method of the present invention using the quenching device 3 shown in FIGS. 1 and 2, a raw material mixture of a predetermined composition is first stored in a tube 7 having a nozzle 11 for blowing out the melt. The tube 7 is preferably made of a material that is sufficiently durable under high-temperature oxidizing atmosphere conditions, such as platinum, platinum-rhodium, iridium, silicon nitride, boron nitride, or the like. Note that the material of the portion not in direct contact with the raw material melt may be high melting point ceramics, glass, or metal. The shape of the nozzle opening is appropriately determined depending on the target product; for example, a round shape is used for a thin linear material, and a slit-like shape is used for a wide product. The shape of the nozzle opening may be oval or other shape. The raw material mixture stored in the tube 7 is then heated to a temperature equal to or higher than its melting point to form a melt, and then is poured from the mouth of the nozzle 11 onto the surface of the roll 13 rotating at high speed under constant gas pressure. It is blown out and rapidly cooled on the roll surface. The blowing angle of the raw material melt between the nozzle opening and the roll surface may be perpendicular to the roll surface if the width of the target compound is approximately 3 mm or less;
If it is more than mm, the angle is 0° to 45° with respect to the normal to the roll surface. Although these blowout angle adjustment mechanisms can be incorporated into the device itself as a mechanism that can set a predetermined angle, it is preferable to process the nozzle itself. The heating method for the raw material mixture is not particularly limited, but it is usually carried out in a furnace equipped with a heating element, a dielectric heating furnace, or a condensing heating furnace. The temperature of the raw material melt is preferably about 50 to 200°C, preferably 80 to 150°C higher than its melting point. At this time, if it is too close to the melting point,
While the melt is being blown onto the roll surface, there is a risk that it will cool and solidify in the vicinity of the nozzle, and conversely, if the temperature is too high, it tends to be difficult to rapidly cool the melt on the roll surface. The pressurizing gas used to blow the melt onto the roll surface is preferably an inert gas, such as argon, nitrogen, helium, etc., but in order to maintain the melt raw material in an oxidized state, dry compression is recommended. Air is preferred. The gas pressure depends on the size of the nozzle opening, but is usually 0.1 to 2.0 Kg/ cm2 , preferably 0.5 to 1.0.
It is about Kg/ cm2 . Further, the distance between the nozzle opening and the roll surface when blowing out the raw material melt is preferably about 0.01 to 1.0 mm, more preferably about 0.05 to 0.5 mm. If smaller than 0.01mm, the paddle amount will be very small and you will not get uniform material, while 1.0mm
If it is larger than , the amount of paddle may be excessive,
Furthermore, if the thickness is greater than the thickness of the puddle formed by the interfacial tension of the composition melt, there may be a tendency for the puddle to be difficult to form. The material of the roll includes copper and its alloy with good thermal conductivity, the above-mentioned materials having a hard chrome plating layer, steel, stainless steel, and the like. The circumferential speed of the roll is 5 m/sec to 35 m/sec, preferably 10 m/sec.
By rapidly cooling the raw material melt at a speed of 20 m/sec to 20 m/sec, the target compound material containing a high-quality amorphous portion can be obtained. At this time, if the roll circumferential speed is 5 m/sec or less, it tends to be difficult to become amorphous.
I don't like it very much. When the circumferential speed of the roll is higher than 35 m/sec, the shape of the target material obtained becomes extremely thin and becomes scaly or fine powder, but in terms of material structure, it is still the compound material of the present invention. When producing the compound of the present invention under reduced pressure or high vacuum or in an inert gas atmosphere as the atmosphere in which the melt raw material is blown onto the rotating roll surface, reduction of the raw material melt at high temperature occurs, Oxygen atoms in the composition atoms decrease, and the resulting material becomes colored purple or black. However, this colored product is also a compound of the present invention physically and can be used in a colored state. When heating and melting the raw material mixture in a tube, it is necessary to completely melt the mixture. However, before the mixture is completely molten, some of the molten material may flow out from the nozzle tip, so the nozzle tip is locally cooled to prevent the melt from flowing out. It is preferable to do so. A typical means for locally cooling the nozzle is to blow a cooling gas onto the tip of the nozzle, and the gas may be an inert gas such as argon, helium, nitrogen, etc., but dry, cold compressed air is more preferable. The novel amorphous compound material according to the present invention usually has a thickness of about 50 to 10 ÎŒm and is a very brittle material. For this reason, after the material is rapidly cooled and solidified on the roll surface, it is preferable that stress is not applied to the material as much as possible. One of the causes of stress addition is the large turbulent flow in the air layer on the roll surface caused by the wind phenomenon caused by roll rotation in the atmosphere. In order to prevent this turbulence and to improve the adhesion between the molten raw material mixture to be rapidly cooled and the roll surface, a countercurrent blowout nozzle for preventing wind blowing, that is, an air nozzle 17 for preventing swirling as shown in FIG. 1 is installed. , a fan is fixedly installed inside the roll. In the latter case, the turbulent flow generated inside the roll due to rotation of the roll is absorbed into the roll through a variable-diameter air inlet provided at the end of the roll surface, and is discharged from the front of the roll axis, allowing air to flow over the roll surface. By moving the melt into the interior, the molten material is pressed more tightly against the roll surface, and the roll itself can also be cooled by air blowing and movement. Further, in order to maintain the dimensional uniformity of the obtained material, if grooves for cutting the material are provided on the roll surface at right angles to the rotation direction, the material can be cut to a constant size. The atomic arrangement structure of the vanadium-titanium compound of the present invention changes greatly depending on the mixing ratio of its raw materials, and can be broadly classified into the following types. First, if 0<x≩0.70, the amorphous compound is 100%
When x>0.70, a compound containing a rutile crystal phase of TiO 2 is obtained. Third
The figure shows the production range of the material of the present invention. The peripheral speed of the quenching roll of the quenching device used is
Within the range of 5 m/sec to 35 m/sec, no major changes are observed in the structure of the material obtained in each composition range. In order to identify the structure of the material of the present invention, the presence or absence of crystallinity was confirmed and structurally analyzed using X-ray diffraction and a polarizing microscope, and a very small portion was observed using a scanning electron microscope. The features of the present invention will be further clarified by examples below. Example 1 V 2 O 5 (purity 99.9%) and TiO 2 (purity 99.9%) were blended in a predetermined composition, mixed uniformly, and then heated at 850°C.
The mixture was calcined for 30 minutes and used as a raw material for a composition. The obtained composition raw material was made into a platinum tube (diameter 10 mm x length 150 mm).
and installed in the dielectric heating coil, oscillating tube fiber voltage 13V, anode voltage 10KV, grid current 120~
Dielectric heating was performed under the conditions of 150 mA and anode current of 1.2 to 1.8 A. The completely molten raw material was blown out onto the surface of a rotating rapid cooling roll using dry compressed air to rapidly cool it. Samples Nos. 1 to 22 in Tables 1 and 2 represent compound materials of the present invention. Note that No. 21 is a thin piece due to the high roll rotation speed, but it can be used in fields such as catalysts where there are no restrictions on shape. Also, No.23
~25 are comparative examples. Note that nozzle shape A indicates a slit-like nozzle with a size of 0.2 mm x 4 mm, and nozzle shape B indicates a circular nozzle with a diameter of 0.2 mm.

【衚】【table】

【衚】【table】

【衚】【table】

【衚】 参考䟋  V2O51-x・TiO2xにおいお0.50に盞圓
する䞊蚘実斜䟋の詊料No.、10、12、13及び15
に぀いおの線回折結果を第図に瀺す。急冷甚
ロヌルの呚速床が5.18秒No.から34.54
秒No.15の範囲内で埗られた材料の原子配
列構造には、倧きな倉化がないこずが明らかであ
る。 参考䟋  V2O51-x・TiO2xにおいお0.25に盞圓
する䞊蚘実斜䟋の詊料No.の瀺差熱分析結果を
第図に瀺す。 第図においお、Tcは結晶化枩床、Tgはガラ
ス転䜍点、mpは融点を倫々瀺す。 参考䟋  V2O51-x・TiO2xにおいお0.25に盞圓
する䞊蚘実斜䟋の詊料No.の倖芳を瀺す写真を
参考図面ずしお瀺す。 参考䟋  䞊蚘実斜䟋の詊料No.の走査型電子顕埮鏡写
真20000倍及び500倍を倫々参考図面及び
ずしお瀺す。 参考䟋  V2O51-x・TiO2xにおいお0.25に盞圓
する䞊蚘実斜䟋の詊料No.の赀倖線吞収スペク
トルを第図ずしお瀺す。 参考䟋  V2O51-x・TiO2xにおいお0.33に盞圓
する䞊蚘実斜䟋の詊料No.17の14.7℃における盎
流電気䌝導床を第図に瀺し、又14.7℃における
呚波数に察する誘電率(A)及び誘電損倱(B)を第図
に瀺す。尚、詊料の厚さは0.002cmずし、衚裏䞡
面に面積0.005cm2のAu電極をめ぀きにより圢成し
た。
[Table] Reference Example 1 Samples Nos. 8, 10, 12, 13 and 15 of Example 1 above corresponding to x=0.50 in (V 2 O 5 ) 1-x・(TiO 2 ) x
The X-ray diffraction results are shown in FIG. The peripheral speed of the quenching roll changed from 5.18 m/s (No. 8) to 34.54
It is clear that there is no significant change in the atomic arrangement structure of the material obtained within the range of m/s (No. 15). Reference Example 2 FIG. 5 shows the differential thermal analysis results of Sample No. 7 of Example 1, which corresponds to x=0.25 in (V 2 O 5 ) 1-x ·(TiO 2 ) x . In FIG. 5, Tc represents the crystallization temperature, Tg represents the glass transition point, and mp represents the melting point. Reference Example 3 A photograph showing the appearance of sample No. 7 of Example 1, which corresponds to x=0.25 in (V 2 O 5 ) 1-x ·(TiO 2 ) x , is shown as a reference drawing. Reference Example 4 Scanning electron micrographs (20,000x and 500x) of Sample No. 7 of Example 1 are shown as reference drawings and 500x, respectively. Reference Example 5 FIG. 6 shows the infrared absorption spectrum of Sample No. 3 of Example 1, which corresponds to x=0.25 in (V 2 O 5 ) 1-x ·(TiO 2 ) x . Reference Example 6 Figure 7 shows the DC electrical conductivity at 14.7°C of sample No. 17 of Example 1, which corresponds to x = 0.33 in (V 2 O 5 ) 1-x (TiO 2 ) x , and Figure 8 shows the dielectric constant (A) and dielectric loss (B) versus frequency at 14.7°C. The thickness of the sample was 0.002 cm, and Au electrodes with an area of 0.005 cm 2 were formed on both the front and back surfaces by plating.

【図面の簡単な説明】[Brief explanation of drawings]

第図は、本発明方法においお䜿甚される融解
原料の急冷装眮の䞀䟋の正面図、第図は、第
図の急冷装眮の䞀郚拡倧詳现図面、第図は、本
発明材料の組成範囲を瀺す図面、第図は、本発
明材料の若干の線回折図面、第図は、本発明
による䞀材料の瀺差熱分析図、第図は、本発明
による他の䞀材料の赀倖線吞収スペクトル、第
図は、本発明による他の䞀材料の盎流電気䌝導床
を瀺すグラフ、第図は、第図に瀺すず同様の
材料の呚波数に察する誘電率及び誘電損倱を瀺す
グラフを倫々瀺す。   架台、  急冷装眮本䜓、  誘電
加熱甚コむル、  原料加熱甚チナヌブ、 
 原料加熱甚チナヌブの支持䜓、  融解原
料噎出甚ノズル、  急冷甚ロヌル、 
 ノズルの冷华甚ノズル、  枊流防止
゚アノズル、  ノズルの埮調敎機構、
  ゚アシリンダヌ、  冷华された材
料の受け箱、  冷华材料取り出口、 
 バルブ、  冷华氎導入路、  冷华
氎排出路、  ニヌドルバルブ、  ブ
ロヌ゚ア導入路、  ロヌルずノズル
ずの間隔埮調敎機構、  敎流甚目皿。
FIG. 1 is a front view of an example of a quenching device for melted raw materials used in the method of the present invention, and FIG.
FIG. 3 is a diagram showing the composition range of the material of the present invention; FIG. 4 is an X-ray diffraction diagram of some of the material of the present invention; FIG. 5 is a diagram of the quenching device according to the invention. The differential thermal analysis diagram of one material, FIG. 6, and the infrared absorption spectrum of another material according to the present invention, FIG.
8 is a graph showing the DC electrical conductivity of another material according to the present invention, and FIG. 8 is a graph showing the dielectric constant and dielectric loss versus frequency of a material similar to that shown in FIG. 7. DESCRIPTION OF SYMBOLS 1... Frame, 3... Rapid cooling device main body, 5... Dielectric heating coil, 7... Raw material heating tube, 9...
...Support for raw material heating tube, 11... Nozzle for spouting molten raw material, 13... Roll for rapid cooling, 15...
... Cooling nozzle for nozzle 11, 17 ... Eddy current prevention air nozzle, 19 ... Fine adjustment mechanism for nozzle 11,
21...Air cylinder, 23...Cooled material receiving box, 25...Cooled material outlet, 27...
... Valve, 29 ... Cooling water introduction path, 31 ... Cooling water discharge path, 33 ... Needle valve, 35 ... Blow air introduction path, 37 ... Roll 13 and nozzle 1
Fine adjustment mechanism for spacing with 1, 39... perforated plate for rectification.

Claims (1)

【特蚱請求の範囲】  V2O51-x・TiO2x䜆し、0.70≧
なる組成を有する、非晶質郚分を含むバナゞ
りム−チタン系化合物材料。  酞化バナゞりムず酞化チタンずの混合物を加
熱溶融した埌、融解物を104〜106℃秒の冷华速
床で超急冷するこずを特城ずするV2O51-x・
TiO2x䜆し、0.70≧なる組成を有す
る、非晶質郚分を含むバナゞりム−チタン系化合
物材料の補造法。  原料融解物を固䜓に接觊させるこずにより超
急冷する特蚱請求の範囲第項のバナゞりム−チ
タン系化合物材料の補造法。  スリツト状、円圢又は楕円圢の吹出し口を蚭
けたノズルを備えた加熱甚チナヌブに原料混合物
を投入し、該混合物の融点よりも50〜200℃高い
枩床で加熱溶融させた埌、秒〜35秒の
呚速床で回転するロヌル衚面䞊に䞊蚘ノズルを経
お該融解物を吹き出しお超急冷させる特蚱請求の
範囲第項又は第項に蚘茉のバナゞりム−チタ
ン系化合物材料の補造法。
[Claims] 1 (V 2 O 5 ) 1-x・(TiO 2 ) x (However, 0.70≧x>
0) A vanadium-titanium-based compound material containing an amorphous portion and having a composition as follows. 2. (V 2 O 5 ) 1-x , which is characterized by heating and melting a mixture of vanadium oxide and titanium oxide, and then ultra-quenching the melt at a cooling rate of 10 4 to 10 6 °C/sec.
A method for producing a vanadium-titanium compound material containing an amorphous portion and having a composition of (TiO 2 ) x (0.70≧x>0). 3. The method for producing a vanadium-titanium compound material according to claim 2, wherein the raw material melt is ultra-quenched by contacting it with a solid. 4. The raw material mixture is put into a heating tube equipped with a nozzle equipped with a slit-shaped, circular or oval outlet, and after heating and melting at a temperature 50 to 200°C higher than the melting point of the mixture, the mixture is heated at 5 m/sec. The method for producing a vanadium-titanium compound material according to claim 2 or 3, wherein the melt is blown out through the nozzle onto the surface of a roll rotating at a circumferential speed of ~35 m/sec to ultra-quench it. .
JP58065003A 1983-04-13 1983-04-13 Amorphous vanadium-titanium compound material and its preparation Granted JPS59190222A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58065003A JPS59190222A (en) 1983-04-13 1983-04-13 Amorphous vanadium-titanium compound material and its preparation

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58065003A JPS59190222A (en) 1983-04-13 1983-04-13 Amorphous vanadium-titanium compound material and its preparation

Publications (2)

Publication Number Publication Date
JPS59190222A JPS59190222A (en) 1984-10-29
JPH0331650B2 true JPH0331650B2 (en) 1991-05-08

Family

ID=13274385

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58065003A Granted JPS59190222A (en) 1983-04-13 1983-04-13 Amorphous vanadium-titanium compound material and its preparation

Country Status (1)

Country Link
JP (1) JPS59190222A (en)

Also Published As

Publication number Publication date
JPS59190222A (en) 1984-10-29

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