Deprecated: The each() function is deprecated. This message will be suppressed on further calls in /home/zhenxiangba/zhenxiangba.com/public_html/phproxy-improved-master/index.php on line 456
JPH0332852B2 - - Google Patents
[go: Go Back, main page]

JPH0332852B2 - - Google Patents

Info

Publication number
JPH0332852B2
JPH0332852B2 JP57197966A JP19796682A JPH0332852B2 JP H0332852 B2 JPH0332852 B2 JP H0332852B2 JP 57197966 A JP57197966 A JP 57197966A JP 19796682 A JP19796682 A JP 19796682A JP H0332852 B2 JPH0332852 B2 JP H0332852B2
Authority
JP
Japan
Prior art keywords
lens
aperture
magnetic
sample
electrostatic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP57197966A
Other languages
Japanese (ja)
Other versions
JPS5987742A (en
Inventor
Tatsuya Adachi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Instruments Inc
Original Assignee
Seiko Instruments Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Instruments Inc filed Critical Seiko Instruments Inc
Priority to JP57197966A priority Critical patent/JPS5987742A/en
Publication of JPS5987742A publication Critical patent/JPS5987742A/en
Publication of JPH0332852B2 publication Critical patent/JPH0332852B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/04Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/10Lenses
    • H01J37/145Combinations of electrostatic and magnetic lenses

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)

Description

【発明の詳細な説明】 本発明は、イオンビーム露光装置・イオン源を
用いた分析装置等のイオン及び電子ビームを使用
した装置のレンズに関する新規な改良を行なうも
のである。
DETAILED DESCRIPTION OF THE INVENTION The present invention provides novel improvements in lenses for devices that use ion and electron beams, such as ion beam exposure devices and analyzers that use ion sources.

イオンビーム露光装置又は2次イオン質量分析
装置では細く絞つた1次イオンビームにより試料
表面を走査し、試料を加工したり、試料から得ら
れる2次信号を分析したりする。
In an ion beam exposure device or a secondary ion mass spectrometer, a finely focused primary ion beam scans the surface of a sample to process the sample and analyze secondary signals obtained from the sample.

イオンビームの収束には静電レンズが使用され
ることが多い、これは静電レンズが質量数の異な
つたイオンに対しても同じ電圧で収束できる特色
がある。
Electrostatic lenses are often used to focus ion beams, and this has the advantage that electrostatic lenses can focus ions with different mass numbers with the same voltage.

一方電子ビームをイオンビームと同一軸上から
試料に照射できると数々の有利な点が生れる。例
えばイオンと電子の物理的な特徴の差を利用して
電子ビームにより表面形状を観察しイオンビーム
により微細加工を行つたりすることができるし分
析装置においてはイオンビームにより2次イオン
質量分析を行ない電子ビームによりオージエ電子
分光を行つたりできる。この場合試料面における
加工、分析領域が微細であるから特に同一軸上か
ら電子及びイオンを照射できることが重要であ
る。電子ビームを収束させる場合静電レンズを使
用してもよいが、数十オングストロームまで収束
させようとするとレンズの工作精度がむずかくな
る。そこで通常磁気レンズが使用される。
On the other hand, if the electron beam can be irradiated onto the sample from the same axis as the ion beam, there are many advantages. For example, the difference in physical characteristics between ions and electrons can be used to observe the surface shape with an electron beam, and microfabrication can be performed with an ion beam. Auger electron spectroscopy can be performed using an electron beam. In this case, since the processing and analysis area on the sample surface is minute, it is particularly important to be able to irradiate electrons and ions from the same axis. An electrostatic lens may be used to converge the electron beam, but if you try to converge the electron beam down to several tens of angstroms, the precision of lens machining becomes difficult. Therefore, magnetic lenses are usually used.

本発明では前述のようなイオンと電子を共用す
る様な装置において極めて効果的な手段を提供す
ることを目的としている。
An object of the present invention is to provide extremely effective means for the above-mentioned device that shares ions and electrons.

荷電粒子を収束させるためのレンズは静電レン
ズでも磁気レンズでも光学レンズと同様1/a+
1/b=1/fの式が成立する。ここでaは光源
からレンズ中心までの距離、bはレンズ中心から
結像点までの距離、fは焦点距離である。
The lens for converging charged particles is 1/a+, whether it is an electrostatic lens or a magnetic lens, the same as an optical lens.
The formula 1/b=1/f holds true. Here, a is the distance from the light source to the lens center, b is the distance from the lens center to the imaging point, and f is the focal length.

即ちなるべく細く絞るためにはレンズ中心から
結像点(試料位置)までの距離を短くした方が良
い。しかしながら試料から得られる各種の情報の
検出器を試料近房に設置し効率を上げるためでき
るだけ試料に近ずけようとすると試料とレンズ下
面までの距離(ワーキングデイスタンス・動作距
離という)がある程度必要となつてくる。そこで
動作距離をある程度とり、なお静電レンズと磁気
レンズの両者を試料面に近ずけるには双方をうま
く結合せねばならない。
That is, in order to narrow down the aperture as narrowly as possible, it is better to shorten the distance from the center of the lens to the imaging point (sample position). However, if you want to install a detector for various information obtained from the sample in the chamber near the sample and bring it as close to the sample as possible to increase efficiency, a certain distance between the sample and the lower surface of the lens (referred to as working distance) is required. It's coming. Therefore, in order to maintain a certain operating distance and bring both the electrostatic lens and the magnetic lens close to the sample surface, it is necessary to combine them well.

以下第1図により本発明による荷電粒子レンズ
の好適な実施例について詳細に説明する。
A preferred embodiment of the charged particle lens according to the present invention will be described in detail below with reference to FIG.

第1図において、磁気レンズ巻線1、および磁
気回路2より磁気レンズを構成する、この場合4
はレンズ絞りの役目をする。また3及び5は、静
電レンズの上下電極で通常接地電位になる。又4
は中間電極として高電圧をかける。又絶縁物6に
より高圧を浮かし外部から真空中に電圧をもたら
す役目をする。
In FIG. 1, a magnetic lens is constituted by a magnetic lens winding 1 and a magnetic circuit 2, in this case 4.
acts as a lens aperture. Further, 3 and 5 are the upper and lower electrodes of the electrostatic lens, which are normally at ground potential. Also 4
acts as an intermediate electrode and applies a high voltage. Also, the insulator 6 serves to float high voltage and bring voltage into the vacuum from the outside.

図中4のレンズ絞り又は中間電極は、磁気レン
ズの場合100μから数百μの穴径で静電レンズの
場合は1mmから数mmであるから複数の穴をあけ真
空外から移動させ目的により最適の穴径を選択で
きるようにする。又静電レンズを構成する3枚の
電極3,4,5は磁性体ではない材料、例えばタ
ンタルとかモリブテン等を使用すればイオンによ
る損傷も少なくてよい。又、磁気レンズとして使
用する場合は中間電極4は接地するかこれに近い
電位にする。
The lens diaphragm or intermediate electrode (4) in the figure has a hole diameter of 100μ to several hundred μ in the case of a magnetic lens, and 1 mm to several mm in the case of an electrostatic lens, so it is best suited depending on the purpose by making multiple holes and moving it from outside the vacuum. Allows selection of hole diameter. Further, if the three electrodes 3, 4, and 5 constituting the electrostatic lens are made of a non-magnetic material, such as tantalum or molybdenum, damage caused by ions can be reduced. When used as a magnetic lens, the intermediate electrode 4 is grounded or at a potential close to this.

【図面の簡単な説明】[Brief explanation of drawings]

図面は本発明による荷電粒子用レンズを示す構
成図である。 1……磁気レンズ巻線、2……磁気回路、3…
…上電極、4……中間電極、5……下電極。
The drawing is a configuration diagram showing a charged particle lens according to the present invention. 1...Magnetic lens winding, 2...Magnetic circuit, 3...
...Upper electrode, 4...Middle electrode, 5...Lower electrode.

Claims (1)

【特許請求の範囲】[Claims] 1 コイル巻線及び一対の磁極より構成される磁
気レンズと、前記一対の磁極間に設けられた異な
る径をもつた複数の穴を有する絞りと、前記絞り
の上下に設けられた静電レンズ用電極と、外部か
ら前記絞りの所定の穴径を定位置に選択する手段
と、前記絞りに高電圧を印加する手段とからな
り、前記絞りに高電圧を印加することにより静電
レンズを構成することを特徴とする荷電粒子用レ
ンズ。
1. A magnetic lens composed of a coil winding and a pair of magnetic poles, an aperture having a plurality of holes with different diameters provided between the pair of magnetic poles, and an electrostatic lens provided above and below the aperture. It consists of an electrode, a means for externally selecting a predetermined hole diameter of the aperture in a fixed position, and a means for applying a high voltage to the aperture, and an electrostatic lens is configured by applying a high voltage to the aperture. A charged particle lens characterized by:
JP57197966A 1982-11-11 1982-11-11 Lens for charged particles Granted JPS5987742A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57197966A JPS5987742A (en) 1982-11-11 1982-11-11 Lens for charged particles

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57197966A JPS5987742A (en) 1982-11-11 1982-11-11 Lens for charged particles

Publications (2)

Publication Number Publication Date
JPS5987742A JPS5987742A (en) 1984-05-21
JPH0332852B2 true JPH0332852B2 (en) 1991-05-15

Family

ID=16383280

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57197966A Granted JPS5987742A (en) 1982-11-11 1982-11-11 Lens for charged particles

Country Status (1)

Country Link
JP (1) JPS5987742A (en)

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS535962A (en) * 1976-07-06 1978-01-19 Matsushita Electric Ind Co Ltd Electron microscope

Also Published As

Publication number Publication date
JPS5987742A (en) 1984-05-21

Similar Documents

Publication Publication Date Title
EP0769799B1 (en) Scanning electron microscope
JP4215282B2 (en) SEM equipped with electrostatic objective lens and electrical scanning device
US4912326A (en) Direct imaging type SIMS instrument
JPS6213789B2 (en)
JP5342728B2 (en) Collection of secondary electrons through the objective lens of a scanning electron microscope
US5008537A (en) Composite apparatus with secondary ion mass spectrometry instrument and scanning electron microscope
GB2217907A (en) Direct imaging type sims instrument having tof mass spectrometer mode
JPH1196957A (en) Particle beam device
US4810879A (en) Charged particle energy analyzer
JP4527289B2 (en) Particle optics including detection of Auger electrons
EP0293924B1 (en) Direct imaging monochromatic electron microscope
JP2810797B2 (en) Reflection electron microscope
US2372422A (en) Electron microanalyzer
JPS5958749A (en) Composite objective and radiation lens
EP0084850B1 (en) Apparatus for irradiation with charged particle beams
JPS6180744A (en) Ion micro-beam apparatus
JP2004513477A (en) SEM with adjustable final electrode for electrostatic objective
JP2003504803A (en) Method and apparatus for simultaneously depositing and monitoring a material on a target
JP2007519194A (en) Focusing lens for charged particle beam
JPS6334844A (en) Ion analysis method and device for insulating materials
JPH03173054A (en) Particle radiation device
JPH08148116A (en) Microscopic laser time-of-flight mass spectrometer
US5920073A (en) Optical system
US5451783A (en) Charged-particle analyser
JPH0332852B2 (en)