JPH0333249B2 - - Google Patents
Info
- Publication number
- JPH0333249B2 JPH0333249B2 JP59016833A JP1683384A JPH0333249B2 JP H0333249 B2 JPH0333249 B2 JP H0333249B2 JP 59016833 A JP59016833 A JP 59016833A JP 1683384 A JP1683384 A JP 1683384A JP H0333249 B2 JPH0333249 B2 JP H0333249B2
- Authority
- JP
- Japan
- Prior art keywords
- silica coating
- insulating film
- liquid crystal
- crystal display
- coating material
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/133351—Manufacturing of individual cells out of a plurality of cells, e.g. by dicing
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/133345—Insulating layers
Landscapes
- Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Liquid Crystal (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Mathematical Physics (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Silicon Compounds (AREA)
- Non-Metallic Protective Coatings For Printed Circuits (AREA)
Description
（産業上の利用分野）
本発明は、液晶表示素子の製造方法に、より詳
細には、絶縁膜を形成するためのシリカコーテイ
ング工程に関する。
（従来技術）
絶縁膜は、液晶表示素子を構成する１つの要素
である。第１図は、液晶表示素子の図式的な断面
図である。ガラス基板１の上に電極２としてITO
膜が形成される。絶縁膜３が、さらにITO電極２
の上に形成される。液晶４は、こうしてITO電極
２を備えた二枚のガラス基板１を向いあわせ、か
つ、側面をシール５，５で封じて形成した空間に
注入される。なお、絶縁膜３には、配向処理が施
こされている。両電極２，２の間に電圧を印加す
ることにより、液晶４の配向が変化する。これに
より、液晶表示素子は、表示の機能を果す。
ところで、絶縁膜の素材としては、シリカコー
テイング材料（たとえば、東京応化OCD）が用
いられている。このシリカコーテイング材料を
ITO電極パターン付のガラス基板に塗布するシリ
カコーテイング工程として、従来は、第２図に示
す一連の工程フローからなる浸漬方式を用いてい
る。この方式においては、ITO電極２を形成した
ガラス基板１の上に、まず、シリカを塗布するべ
きでない部分にレジストを印刷する（工程11）。
次に、シリカコーテイング材料の液の中にガラス
基板１を浸漬する（工程12）。次に、ガラス基板
１上に形成したシリカコーテイング材料を仮乾燥
させ（工程13）、レジストを剥離し（工程14）、洗
浄する（工程15）。こうしてガラス基板上に形成
した絶縁膜は、次の工程で、焼成され、配向処理
される。
ところで、上記のフローでは、シリカコーテイ
ング材料を形成する工程12、13の前後の、レジス
トの塗布と剥離とのための本質的でない諸工程に
おいて、労力と時間とが大幅に費やされてきた。
さらに、浸漬装置自体も、大量の液を必要とする
ため、その品質の維持管理に手間がかけられてい
た。
（発明の目的）
本発明の目的は、液晶表示素子の製造方法にお
いて、簡略なシリカコーテイング工程からなる製
造方法を提供することである。
（発明の構成）
このため、本発明は、絶縁膜を形成するための
シリカコーテイング工程を含む液晶表示素子の製
造方法において、
絶縁パターンを凸部とする版のこの凸部に絶縁
膜の素材であるシリカコーテイング材料として約
10重量％のSiOx固形分と、ブチルセルソルブま
たはノルマルメチルピロリドン溶媒とより成る材
料を塗布し、ガラス基板上に上記版を接すること
により、ガラス基板上にシリカコーテイング材料
のパターンを転写することを特徴としている。
（実施例）
第３図−第５図を用いて、本発明の実施例を図
式的に示す。コーテイング材料の塗布は、ローラ
ー２１を用いるオフセツト印刷方式により行な
う。
絶縁膜のパターンをAPR版２２に作成する。
APR版２２の凸部２２ａ，２２ａ，２２ａが、
シリカコーテイング材料を塗布すべき部分であ
る。このAPR版２２をローラー２１の表面に取
り付ける。図示しないもう１個のローラーによつ
て、APR版の凸部２２ａ，２２ａ，２２ａにシ
リカコーテイング材料２３，２３，２３を塗布す
る。この状態でのローラー２１とAPR版２２を、
第４図の右側に示す。
印刷に用いるシリカコーテイグ材料としては、
従来の浸漬用シリカコーテイング材料は、低沸点
溶媒を用いているため、印刷時に揮発し安定性を
欠くので使用できない。
本実施例において使用したシリカコーテイング
材料は、約10重量％の固形分（SiOx）と残部の
溶媒（ブチルセルソルブ、ノルマルメチルピロリ
ドンなど）からなり、その粘度は、６〜10cpsで
ある。これらの溶媒を用いたことにより、印刷時
の揮発を防ぐとともに、粘度も印刷に適したもの
となつた。
基台２４の上に、ITO電極２，２，２のパター
ンを形成した基板１を固定する。次に、ローラ２
１を反時計方向に回転させながら左方向へ進行さ
せると、APR版の凸部２２ａ，２２ａ，２２ａ
のパターンが、第５図に示すように絶縁膜３，
３，３として転写される。
液晶表示素子の製造工程において、このシリカ
コーテイング工程以外では、従来と同じ方法を用
いる。
こうして製造した絶縁膜の厚さは、約200Åで
ある。また、表面段差計による観察（×105）は、
表面状態が、従来の浸漬方式を用いて製造した絶
縁膜と同じ程度に良好であることを示した。
次に、本実施例により製造した絶縁膜と液晶表
示素子の特性を試験した。表は、25℃における初
期特性評価の結果を示す。表において、iDCは、
消費電流、Vth（40℃）は、表示面の法線と40゜を
なす方向でのにじみ電圧、Vsat（０℃）は、表示
面のまうえからみた飽和電圧である。表に示した
結果より、従来の浸漬方式と本実施例の印刷方式
とは、表示特性の初期特性評価において同等であ
るとみなせる。
(Industrial Application Field) The present invention relates to a method for manufacturing a liquid crystal display element, and more particularly to a silica coating process for forming an insulating film. (Prior Art) An insulating film is one element constituting a liquid crystal display element. FIG. 1 is a schematic cross-sectional view of a liquid crystal display element. ITO as electrode 2 on glass substrate 1
A film is formed. The insulating film 3 is further connected to the ITO electrode 2
formed on top of. The liquid crystal 4 is injected into a space formed by placing the two glass substrates 1 provided with the ITO electrodes 2 facing each other and sealing the sides with seals 5, 5. Note that the insulating film 3 has been subjected to orientation treatment. By applying a voltage between both electrodes 2, 2, the orientation of the liquid crystal 4 changes. Thereby, the liquid crystal display element performs a display function. Incidentally, a silica coating material (for example, Tokyo Ohka OCD) is used as a material for the insulating film. This silica coating material
Conventionally, the silica coating process applied to a glass substrate with an ITO electrode pattern uses a dipping method consisting of a series of process flows shown in Figure 2. In this method, first, a resist is printed on the glass substrate 1 on which the ITO electrode 2 is formed, in areas where silica should not be applied (step 11).
Next, the glass substrate 1 is immersed in a liquid of silica coating material (step 12). Next, the silica coating material formed on the glass substrate 1 is temporarily dried (step 13), the resist is peeled off (step 14), and washed (step 15). The insulating film thus formed on the glass substrate is fired and subjected to orientation treatment in the next step. By the way, in the above flow, a large amount of labor and time has been spent on non-essential steps for resist application and peeling before and after steps 12 and 13 of forming the silica coating material.
Furthermore, since the immersion device itself requires a large amount of liquid, it takes time and effort to maintain its quality. (Object of the Invention) An object of the present invention is to provide a method of manufacturing a liquid crystal display element that includes a simple silica coating step. (Structure of the Invention) Therefore, the present invention provides a method for manufacturing a liquid crystal display element including a silica coating step for forming an insulating film, in which a material for the insulating film is applied to the convex part of a plate having an insulating pattern as a convex part. There is silica coating material as approx.
The pattern of the silica coating material can be transferred onto the glass substrate by applying a material consisting of 10% by weight of SiOx solids and butyl cellosolve or n-methylpyrrolidone solvent and contacting the above plate onto the glass substrate. It is a feature. (Example) An example of the present invention will be schematically shown using FIGS. 3 to 5. The coating material is applied by an offset printing method using rollers 21. An insulating film pattern is created on the APR plate 22.
The convex portions 22a, 22a, 22a of the APR plate 22 are
This is the area where the silica coating material should be applied. This APR plate 22 is attached to the surface of the roller 21. Silica coating material 23, 23, 23 is applied to the convex portions 22a, 22a, 22a of the APR plate by another roller (not shown). The roller 21 and APR plate 22 in this state,
Shown on the right side of Figure 4. Silica coating materials used for printing include:
Conventional silica coating materials for immersion cannot be used because they use low boiling point solvents, which volatilize during printing and lack stability. The silica coating material used in this example consists of about 10% by weight solids (SiOx) and the remainder a solvent (butyl cellosolve, n-methylpyrrolidone, etc.), and its viscosity is 6 to 10 cps. By using these solvents, volatilization during printing was prevented, and the viscosity became suitable for printing. A substrate 1 on which a pattern of ITO electrodes 2, 2, 2 is formed is fixed on a base 24. Next, roller 2
1 to the left while rotating counterclockwise, the convex portions 22a, 22a, 22a of the APR plate
The pattern of the insulating film 3, as shown in FIG.
It is transcribed as 3,3. In the manufacturing process of the liquid crystal display element, the same conventional methods are used except for this silica coating process. The thickness of the insulating film thus manufactured is approximately 200 Å. In addition, observation using a surface level difference meter (×10 5 ) is as follows:
The surface condition was shown to be as good as that of the insulating film produced using the conventional dipping method. Next, the characteristics of the insulating film and liquid crystal display element manufactured according to this example were tested. The table shows the results of initial characterization at 25°C. In the table, i DC is
The current consumption, V th (40°C), is the bleeding voltage in a direction that is 40° to the normal to the display surface, and V sat (0°C) is the saturation voltage when viewed from above the display surface. From the results shown in the table, it can be considered that the conventional dipping method and the printing method of this example are equivalent in initial characteristic evaluation of display characteristics.
【表】
次に、信頼性試験を行なつた。まず、95％湿度
中で55℃に保つたところ、240時間経過しても、
絶縁膜は劣化しなかつた。また、58℃で通電した
ところ、240時間を経過しても、安定性もよく、
表示特性は良好であつた。
以上の初期特性評価および信頼性試験の結果か
ら、従来の浸漬法による絶縁膜の特性と、本実施
例による絶縁膜の特性とは、同等であるとみなせ
る。
（発明の効果）
本発明によれば、シリカコーテイング材料とし
て、約10重量％のSiOx固形分と、ブチルセルソ
ルブまたはノルマルメチルピロリドン溶媒とより
成る材料を用いることにより、シリカコーテイン
グ材料は、液晶表示素子の絶縁膜の形成に印刷法
を導入することが可能な粘度となり、従来の浸漬
法に比較して、液晶表示素子の製造の諸工程にお
いて本質的でない工程である、レジストの塗布、
剥離といつた体くの労力および処理時間を必要と
する工程が省略することができ、液晶表示素子の
製造方法が大幅に簡略化され、さらに、工程の清
浄化およびコストダウンをもたらすことができ
る。[Table] Next, a reliability test was conducted. First, when kept at 55℃ in 95% humidity, even after 240 hours,
The insulating film did not deteriorate. In addition, when the current was applied at 58℃, the stability was good even after 240 hours.
The display characteristics were good. From the results of the above initial characteristic evaluation and reliability test, it can be considered that the characteristics of the insulating film obtained by the conventional immersion method and the characteristics of the insulating film according to this example are equivalent. (Effects of the Invention) According to the present invention, by using a material consisting of about 10% by weight of SiOx solid content and a butyl cellosolve or n-methylpyrrolidone solvent, the silica coating material can be used for liquid crystal display. The viscosity makes it possible to introduce the printing method to form the insulating film of the element, and compared to the conventional dipping method, it is possible to apply resist coating, which is a non-essential process in the manufacturing process of liquid crystal display elements.
Steps that require labor and processing time such as peeling can be omitted, greatly simplifying the manufacturing method of liquid crystal display elements, and furthermore, making the process cleaner and reducing costs. .
第１図は、液晶表示素子の図式的な断面図であ
る。第２図は、従来の浸漬方式によるシリカコー
テイング工程の工程図である。第３図は、本発明
の工程図である。第４図と第５図とは、それぞ
れ、本発明による実施例において、コーテイング
材料を塗布する前と後の状態を示す図式的な断面
図である。
１……ガラス基板、２……電極、３，３，３…
…絶縁膜、４……液晶、５……シール材、２１…
…ローラー、２２……絶縁膜のパターンを凸部と
した版、２２ａ，２２ａ，２２ａ……凸部、２
３，２３，２３……シリカコーテイング材料。
FIG. 1 is a schematic cross-sectional view of a liquid crystal display element. FIG. 2 is a process diagram of a silica coating process using a conventional dipping method. FIG. 3 is a process diagram of the present invention. 4 and 5 are schematic cross-sectional views, respectively, before and after applying a coating material in an embodiment according to the invention. 1... Glass substrate, 2... Electrode, 3, 3, 3...
...Insulating film, 4...Liquid crystal, 5...Sealing material, 21...
... Roller, 22 ... Plate with a pattern of insulating film as a convex portion, 22a, 22a, 22a ... Convex portion, 2
3, 23, 23...Silica coating material.
Claims (1)
工程を含む液晶表示素子の製造方法において、 絶縁パターンを凸部とする版のこの凸部に絶縁
膜の素材であるシリカコーテイング材料として約
10重量％のSiOx固形分と、ブチルセルソルブま
たはノルマルメチルピロリドン溶媒とより成る材
料を塗布し、ガラス基板上に上記版を接すること
により、ガラス基板上にシリカコーテイング材料
のパターンを転写することを特徴とする液晶表示
素子の製造方法。[Claims] 1. In a method for manufacturing a liquid crystal display element including a silica coating step for forming an insulating film, a silica coating material, which is a material of the insulating film, is applied to the convex part of a plate having an insulating pattern as a convex part. about
The pattern of the silica coating material can be transferred onto the glass substrate by applying a material consisting of 10% by weight of SiOx solids and butyl cellosolve or n-methylpyrrolidone solvent and contacting the above plate onto the glass substrate. A method for manufacturing a characteristic liquid crystal display element.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1683384A JPS60159825A (en) | 1984-01-31 | 1984-01-31 | Manufacture of liquid crystal display element |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1683384A JPS60159825A (en) | 1984-01-31 | 1984-01-31 | Manufacture of liquid crystal display element |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS60159825A JPS60159825A (en) | 1985-08-21 |
| JPH0333249B2 true JPH0333249B2 (en) | 1991-05-16 |
Family
ID=11927195
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1683384A Granted JPS60159825A (en) | 1984-01-31 | 1984-01-31 | Manufacture of liquid crystal display element |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS60159825A (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB9929615D0 (en) | 1999-12-15 | 2000-02-09 | Koninkl Philips Electronics Nv | Method of manufacturing an active matrix device |
| GB9929614D0 (en) | 1999-12-15 | 2000-02-09 | Koninkl Philips Electronics Nv | Method of manufacturing a transistor |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS55105223A (en) * | 1979-02-07 | 1980-08-12 | Hitachi Ltd | Forming method for inorganic oxide film |
| JPS5790616A (en) * | 1980-11-27 | 1982-06-05 | Seiko Epson Corp | Formation of orienting material film of liquid crystal cell |
| JPS57149919A (en) * | 1981-03-13 | 1982-09-16 | Yokogawa Hokushin Electric Corp | Electromagnetic flow meter |
-
1984
- 1984-01-31 JP JP1683384A patent/JPS60159825A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS60159825A (en) | 1985-08-21 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |