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JPH0333780B2 - - Google Patents
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JPH0333780B2 - - Google Patents

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Publication number
JPH0333780B2
JPH0333780B2 JP61056388A JP5638886A JPH0333780B2 JP H0333780 B2 JPH0333780 B2 JP H0333780B2 JP 61056388 A JP61056388 A JP 61056388A JP 5638886 A JP5638886 A JP 5638886A JP H0333780 B2 JPH0333780 B2 JP H0333780B2
Authority
JP
Japan
Prior art keywords
formic acid
potential
complexing agent
plating solution
range
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP61056388A
Other languages
Japanese (ja)
Other versions
JPS62214183A (en
Inventor
Mikio Ogata
Yaozo Kumagai
Tokuzo Kanbe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
National Institute of Advanced Industrial Science and Technology AIST
Original Assignee
Agency of Industrial Science and Technology
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agency of Industrial Science and Technology filed Critical Agency of Industrial Science and Technology
Priority to JP5638886A priority Critical patent/JPS62214183A/en
Publication of JPS62214183A publication Critical patent/JPS62214183A/en
Publication of JPH0333780B2 publication Critical patent/JPH0333780B2/ja
Granted legal-status Critical Current

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Description

【発明の詳細な説明】 〔技術分野〕 本発明は、ホルムアルデヒドを還元剤とする無
電解銅めつき液中に錯化剤と共に含まれるギ酸を
電解酸化し、炭酸ガスとして除去する方法に関す
るものである。
[Detailed Description of the Invention] [Technical Field] The present invention relates to a method for electrolytically oxidizing formic acid contained together with a complexing agent in an electroless copper plating solution using formaldehyde as a reducing agent and removing it as carbon dioxide gas. be.

〔従来技術〕[Prior art]

近年、電子機器産業、自動車産業等の発展に伴
つて、表面処理技術の一分野である無電解めつき
が目ざましい発展をとげている。このような無電
解めつき液として、EDTA、アルカノールアミ
ンやロツシエル塩等の錯化剤を含む無電解めつき
液が知られている。また、このめつき液は還元剤
としてホルマリンを含み、長時間連続的に使用さ
れると、液中にホルマリンの酸化物であるギ酸が
多量蓄積するようになり、この蓄積量がめつき液
中に0.8モル/以上になると、銅めつきの異状
析出が生じるようになる。従つて、めつき液の長
寿命化のためには、めつき液中からギ酸を連続的
に除去することが必要になり、この目的のため
に、ギ酸を電解酸化除去する方法が提案されてい
るが、ギ酸の酸化効率あるいは電流効率等の点で
未だ満足し得るものではなかつた。例えば、錯化
剤とギ酸を含むめつき液を定電位で電解していく
と、時間の経過と共に電流密度が減少し、作業性
が低下するし、一方、定電流で電解していくと、
時間の経過と共にアノード電位が上昇し、錯化剤
及び水の分解が起り、特に白金系電極を用いる時
には、ギ酸酸化の電流効率がゼロになるという問
題があつた。
BACKGROUND OF THE INVENTION In recent years, electroless plating, which is a field of surface treatment technology, has made remarkable progress with the development of the electronic equipment industry, the automobile industry, etc. As such an electroless plating solution, an electroless plating solution containing a complexing agent such as EDTA, alkanolamine, or Rothsiel's salt is known. In addition, this plating solution contains formalin as a reducing agent, and if it is used continuously for a long time, a large amount of formic acid, which is an oxide of formalin, will accumulate in the solution, and this accumulated amount will be added to the plating solution. When the amount is 0.8 mol/or more, abnormal copper plating precipitation occurs. Therefore, in order to extend the life of the plating solution, it is necessary to continuously remove formic acid from the plating solution, and for this purpose, a method for removing formic acid by electrolytic oxidation has been proposed. However, the oxidation efficiency of formic acid or current efficiency was not yet satisfactory. For example, if a plating solution containing a complexing agent and formic acid is electrolyzed at a constant potential, the current density will decrease over time, reducing workability.On the other hand, if a plating solution containing a complexing agent and formic acid is electrolyzed at a constant current,
With the passage of time, the anode potential increases, decomposition of the complexing agent and water occurs, and especially when a platinum-based electrode is used, there is a problem that the current efficiency of formic acid oxidation becomes zero.

〔目 的〕〔the purpose〕

本発明は、錯化剤を含む無電解銅めつき液から
それに含まれるギ酸を電解酸化して除去する際に
見られる前記問題を解決することを目的とする。
The present invention aims to solve the above-mentioned problems that occur when formic acid contained in an electroless copper plating solution containing a complexing agent is removed by electrolytic oxidation.

〔構 成〕 本発明によれば、ホルムアルデヒドを還元剤と
する無電解銅めつき液中に錯化剤と共に含まれる
ギ酸を電解酸化し、炭酸ガスとして除去するに際
し、アノード電位を、銀/塩化銀参照電極を基準
として、+0.5V〜+1.2Vの中間電位域、+1.3V〜
+1.8Vの錯化剤及び水の分解電位域、+0.5V〜+
1.2Vの中間電位域及び−0.25V〜+0.4Vのギ酸酸
化電位域の順序で順次変動させながら電解を行う
ことを特徴とする多段電位法による無電解銅めつ
き液中のギ酸の除去方法が提供される。
[Structure] According to the present invention, when formic acid contained together with a complexing agent in an electroless copper plating solution using formaldehyde as a reducing agent is electrolytically oxidized and removed as carbon dioxide gas, the anode potential is changed to silver/chloride. Intermediate potential range of +0.5V to +1.2V, +1.3V to +0.5V with respect to silver reference electrode
Complexing agent and water decomposition potential range of +1.8V, +0.5V to +
A method for removing formic acid in an electroless copper plating solution using a multi-stage potential method, which is characterized by performing electrolysis while sequentially varying the intermediate potential range of 1.2V and the formic acid oxidation potential range of -0.25V to +0.4V. is provided.

本発明におけるめつき液は、還元剤としてホル
マリンを含み、助剤として錯化剤を含む無電解銅
めつき液である。ここで錯化剤とは、めつき液中
の銅イオンの安定化に用いられるものであり、例
えば、高温めつき液に対しては、EDTA(エチレ
ンジアミン四酢酸又はその塩)や、アルカノール
アミン等が用いられ、また、低温めつき法ではロ
ツシエル塩等が用いられている。
The plating solution in the present invention is an electroless copper plating solution that contains formalin as a reducing agent and a complexing agent as an auxiliary agent. Here, the complexing agent is used to stabilize copper ions in the plating solution. For example, for high temperature plating solutions, EDTA (ethylenediaminetetraacetic acid or its salt), alkanolamine, etc. is used, and Rothsiel salt etc. are used in the low temperature plating method.

このようなホルムアルデヒドを含むめつき液に
おいては、めつきの進行と共に、めつき液中には
ホルマリンの酸化生成物であるギ酸が蓄積するよ
うになり、良質のめつき皮膜の形成を阻害する。
In such a plating solution containing formaldehyde, as plating progresses, formic acid, which is an oxidation product of formalin, accumulates in the plating solution, inhibiting the formation of a high-quality plating film.

本発明は、このようなギ酸の蓄積されためつき
液中から、ギ酸を電解酸化により炭酸ガスとして
除去し、再使用するものであるが、この場合、本
発明者らは種々研究の結果、アノード電位を、ギ
酸酸化電位と錯化剤及び水の分解電位との間の中
間電位域、錯化剤及び水の分解電位域、ギ酸酸化
電位域と錯化剤及び水の分解電位域との間の中間
電位域及びギ酸酸化電位域の順序で順次変動させ
ながら電解を行う時には、長時間にわたつて効率
よくギ酸の電解酸化を実施し得ることを見出し本
発明を完成するに致つたものである。
The present invention aims to remove formic acid from the formic acid accumulated in the matting solution as carbon dioxide gas by electrolytic oxidation and reuse it. The potential is defined as an intermediate potential range between the formic acid oxidation potential and the decomposition potential of the complexing agent and water, a decomposition potential range of the complexing agent and water, and a range between the formic acid oxidation potential range and the decomposition potential range of the complexing agent and water. The present inventors have discovered that electrolytic oxidation of formic acid can be carried out efficiently over a long period of time when electrolysis is carried out while sequentially varying the intermediate potential range and the formic acid oxidation potential range in that order, leading to the completion of the present invention. .

ギ酸酸化電位域は、ギ酸が効率よく電解酸化さ
れ、炭酸ガスとして除去される範囲の領域の電位
であり、銀/塩化銀電極に対し(以下に示す電位
はいずれもこの電極を対照とする)通常、0.25V
〜+0.4Vの電位である。この電位域に保持する
時間は、通常3〜15秒、好ましくは5〜12秒であ
る。
The formic acid oxidation potential range is the potential in the range where formic acid is efficiently electrolytically oxidized and removed as carbon dioxide gas, relative to the silver/silver chloride electrode (all potentials shown below are based on this electrode). Typically 0.25V
The potential is ~+0.4V. The time to maintain this potential range is usually 3 to 15 seconds, preferably 5 to 12 seconds.

錯化剤及び水の分解電位域は、錯化剤と水の電
解が起る領域の電位であり、通常、前記ギ酸酸化
電位域よりも高い電位域にあり、一般には、+
1.3V〜+1.8Vの範囲である。この電位域に保持
する時間は、0.5〜5秒、好ましくは1〜2秒で
ある。金電極やパラジウム電極をアノードとする
場合には、めつき液中に錯化剤が存在しても、錯
化剤及び水の分解電位域におけるギ酸酸化の電流
効率は20〜45%程度を示すが、白金電極の場合に
はその電流効率はゼロになる。
The decomposition potential range of the complexing agent and water is the potential in the region where electrolysis of the complexing agent and water occurs, and is usually in a higher potential range than the formic acid oxidation potential range, and is generally +
The range is 1.3V to +1.8V. The time to maintain this potential range is 0.5 to 5 seconds, preferably 1 to 2 seconds. When using a gold or palladium electrode as an anode, even if a complexing agent is present in the plating solution, the current efficiency of formic acid oxidation in the decomposition potential range of the complexing agent and water is approximately 20 to 45%. However, in the case of platinum electrodes, the current efficiency is zero.

前記ギ酸酸化電位と錯化剤及び水の分解電位と
の間の中間電位域では、ギ酸及び錯化剤、水の分
解は起らないが、良好なギ酸の酸化除去を行うに
は、アノード電位をこの中間電位域に一定時間保
持することが重要である。本発明の場合、+0.5V
〜+1.2Vの中間電位域に0.5〜5秒、好ましくは
1〜2秒間保持する。アノード電位をこの中間電
位域に保持せずに、ギ酸酸化電位域と錯化剤及び
水の分解電位域との間を直接変動させる場合に
は、ギ酸酸化電流が低下する等の欠点が生じる。
In the intermediate potential range between the formic acid oxidation potential and the decomposition potential of the complexing agent and water, decomposition of formic acid, the complexing agent, and water does not occur, but in order to perform good oxidation removal of formic acid, the anode potential It is important to maintain the voltage in this intermediate potential range for a certain period of time. In the case of the present invention, +0.5V
It is held in the intermediate potential range of ~+1.2V for 0.5 to 5 seconds, preferably 1 to 2 seconds. When the anode potential is not maintained in this intermediate potential range and is directly varied between the formic acid oxidation potential range and the complexing agent and water decomposition potential range, disadvantages such as a decrease in the formic acid oxidation current occur.

本発明で用いるアノードとしては、金やパラジ
ウム系電極等の白金系電極以外のものも使用可能
であるが、好ましくは白金系電極、例えば、通常
の白金電極、白金めつきチタン電極等が使用され
る。めつき液のpHは、通常、4〜12の範囲であ
り、好ましくは4〜6である。
As the anode used in the present invention, materials other than platinum-based electrodes such as gold or palladium-based electrodes can be used, but platinum-based electrodes such as ordinary platinum electrodes, platinum-plated titanium electrodes, etc. are preferably used. Ru. The pH of the plating solution is usually in the range of 4 to 12, preferably 4 to 6.

〔効 果〕〔effect〕

本発明のギ酸電解酸化法によれば、アノード電
位が前記のように多段的に変動されることから、
アノードは常に活性化され、高い電流効率でギ酸
を酸化分解することができる。
According to the formic acid electrolytic oxidation method of the present invention, since the anode potential is varied in multiple stages as described above,
The anode is constantly activated and can oxidize and decompose formic acid with high current efficiency.

〔実施例〕〔Example〕

次に本発明を実施例によりさらに詳細に説明す
る。
Next, the present invention will be explained in more detail with reference to Examples.

実施例 1 モデルめつき液として、ギ酸ナトリウム0.8モ
ル/と錯化剤としてEDTA0.05モル/を含む
pH4.5の水溶液を用いた。
Example 1 A model plating solution containing 0.8 mol/mol of sodium formate and 0.05 mol/ EDTA as a complexing agent.
An aqueous solution with a pH of 4.5 was used.

これらの水溶液を白金電極をアノードとして用
いて電解処理した。この場合、電解処理は、アノ
ード電位を、起点(−0.4V、1秒間)→中間電
位(+0.5V、1秒間)→酸素発生電位(1.6V、
1秒間)→中間電位(+0.5V、1秒間)→ギ酸
酸化電位(0V、10秒間)→起点(−0.4V、1秒
間)のように繰返し変動させることによつて行つ
た。前記のようにして電解処理を 時間行つた結
果、ギ酸は90%の電流効率で分解除去された。
These aqueous solutions were electrolytically treated using a platinum electrode as an anode. In this case, the electrolytic treatment changes the anode potential from the starting point (-0.4V, 1 second) to the intermediate potential (+0.5V, 1 second) to the oxygen evolution potential (1.6V,
This was carried out by repeatedly changing the potential (1 second) → intermediate potential (+0.5 V, 1 second) → formic acid oxidation potential (0 V, 10 seconds) → starting point (−0.4 V, 1 second). As a result of carrying out the electrolytic treatment as described above for a period of time, formic acid was decomposed and removed with a current efficiency of 90%.

なお、前記において、アノード電位をいつたん
起点にもどしたのは、電位操作上の都合によるも
ので、特に意味を持つものではない。
In the above description, the reason why the anode potential is returned to the starting point is for convenience in controlling the potential and has no particular meaning.

比較例 1 実施例1において、20A/dm2(+1.6ボルト)
の定電流で電解処理を行つたが、ギ酸酸化の電流
効率ゼロ%であつた。
Comparative example 1 In Example 1, 20A/dm 2 (+1.6 volts)
Although electrolytic treatment was carried out at a constant current of 1, the current efficiency of formic acid oxidation was 0%.

比較例 2 実施例1において、中間電位での電解処理(+
0.5V、1秒間)を行なわない以外は同様にして
電解処理を行つたところ、ギ酸酸化電流効率は90
%であつたが、それに要した時間は実施例1の場
合の2倍以上であつた。
Comparative Example 2 In Example 1, electrolytic treatment at intermediate potential (+
When electrolytic treatment was carried out in the same manner except that the voltage (0.5 V, 1 second) was not carried out, the formic acid oxidation current efficiency was 90.
%, but the time required was more than twice that of Example 1.

実施例 2 実施例1において、モデルめつき液として、ギ
酸ナトリウム0.8モル/、EDTA0.05モル/
及び硫酸銅0.04モル/を含むpH4.5の水溶液を
用いた以外は実施例1と同様にして実験を行つ
た。この場合、カソード電極には銅の析出が起つ
たが、白金電極(アノード電極)はこれによつて
は影響を受けず、実施例1と同様に、その表面状
態は常に活性に保持され、効率よくギ酸の電解酸
化が行われることが確認された。
Example 2 In Example 1, sodium formate 0.8 mol/, EDTA 0.05 mol/
An experiment was conducted in the same manner as in Example 1, except that an aqueous solution of pH 4.5 containing 0.04 mole of copper sulfate was used. In this case, copper was deposited on the cathode electrode, but the platinum electrode (anode electrode) was not affected by this, and as in Example 1, its surface state was always kept active and efficient. It was confirmed that electrolytic oxidation of formic acid was carried out well.

Claims (1)

【特許請求の範囲】[Claims] 1 ホルムアルデヒドを還元剤とする無電解銅め
つき液中に錯化剤と共に含まれるギ酸を電解酸化
し、炭酸ガスとして除去するに際し、アノード電
位を、銀/塩化銀参照電極を基準として、+0.5V
〜+1.2Vの中間電位域、+1.3V〜+1.8Vの錯化剤
及び水の分解電位域、+0.5V〜+1.2Vの中間電位
域及び−0.25V〜+0.4Vのギ酸酸化電位域の順で
順次変動させながら電解を行うことを特徴とする
多段電位法による無電解銅めつき液中のギ酸の除
去方法。
1. When formic acid contained together with a complexing agent in an electroless copper plating solution using formaldehyde as a reducing agent is electrolytically oxidized and removed as carbon dioxide gas, the anode potential is set to +0.0 with respect to the silver/silver chloride reference electrode. 5V
~ +1.2V intermediate potential range, +1.3V ~ +1.8V complexing agent and water decomposition potential range, +0.5V ~ +1.2V intermediate potential range, and -0.25V ~ +0.4V formic acid oxidation potential. A method for removing formic acid in an electroless copper plating solution using a multi-stage potential method, which is characterized in that electrolysis is performed while sequentially changing the range.
JP5638886A 1986-03-14 1986-03-14 Method for removing formic acid in electroless copper plating liquid by multi-stage potential method Granted JPS62214183A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5638886A JPS62214183A (en) 1986-03-14 1986-03-14 Method for removing formic acid in electroless copper plating liquid by multi-stage potential method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5638886A JPS62214183A (en) 1986-03-14 1986-03-14 Method for removing formic acid in electroless copper plating liquid by multi-stage potential method

Publications (2)

Publication Number Publication Date
JPS62214183A JPS62214183A (en) 1987-09-19
JPH0333780B2 true JPH0333780B2 (en) 1991-05-20

Family

ID=13025858

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5638886A Granted JPS62214183A (en) 1986-03-14 1986-03-14 Method for removing formic acid in electroless copper plating liquid by multi-stage potential method

Country Status (1)

Country Link
JP (1) JPS62214183A (en)

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6142532A (en) * 1984-08-03 1986-03-01 Mitsui Petrochem Ind Ltd Aromatic polyester

Also Published As

Publication number Publication date
JPS62214183A (en) 1987-09-19

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