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JPH0333792B2 - - Google Patents
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JPH0333792B2 - - Google Patents

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Publication number
JPH0333792B2
JPH0333792B2 JP60277888A JP27788885A JPH0333792B2 JP H0333792 B2 JPH0333792 B2 JP H0333792B2 JP 60277888 A JP60277888 A JP 60277888A JP 27788885 A JP27788885 A JP 27788885A JP H0333792 B2 JPH0333792 B2 JP H0333792B2
Authority
JP
Japan
Prior art keywords
quaternary ammonium
aqueous solution
ammonium hydroxide
ppm
exchange resin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP60277888A
Other languages
Japanese (ja)
Other versions
JPS62139890A (en
Inventor
Yasutoshi Kofuchi
Takashi Deo
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokuyama Corp
Original Assignee
Tokuyama Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokuyama Corp filed Critical Tokuyama Corp
Priority to JP60277888A priority Critical patent/JPS62139890A/en
Publication of JPS62139890A publication Critical patent/JPS62139890A/en
Publication of JPH0333792B2 publication Critical patent/JPH0333792B2/ja
Granted legal-status Critical Current

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  • Electrolytic Production Of Non-Metals, Compounds, Apparatuses Therefor (AREA)

Description

【発明の詳細な説明】 [産業上の利用分野] 本発明は、第四級アンモニウム塩から高純度の
水酸化第四級アンモニウムを得る新規な製造方法
に関する。
DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention relates to a novel production method for obtaining highly pure quaternary ammonium hydroxide from a quaternary ammonium salt.

[従来の技術および問題点] 水酸化第四級アンモニウム水溶液は、金属イオ
ンを含まない有機系アルカリ剤として、例えば
IC、LSI等の半導体装置の製造における半導体基
板の洗浄剤、レジストの除去剤等への用途が広が
りつつあるこれらの用途においては、半導体装置
の高集積化に伴い特に、金属イオン等のイオン性
物質が極めて少ない高純度の水酸化第四級アンモ
ニウム水溶液が要求される。
[Prior art and problems] Quaternary ammonium hydroxide aqueous solution is used as an organic alkaline agent that does not contain metal ions, for example.
The use of cleaning agents for semiconductor substrates, resist removers, etc. in the manufacture of semiconductor devices such as ICs and LSIs is expanding. A highly purified quaternary ammonium hydroxide aqueous solution containing extremely few substances is required.

一方、水酸化第四級アンモニウムの製造方法と
して、陽イオン交換膜を隔膜とする電解槽を用い
て陽極室に第四級アンモニウムクロライド、第四
アンモニウム硫酸塩などの第四級アンモニウム塩
の水溶液を供給し、電気分解して、陰極室で水酸
化第四級アンモニウムを得る方法が知られてい
た。
On the other hand, as a method for producing quaternary ammonium hydroxide, an aqueous solution of quaternary ammonium salts such as quaternary ammonium chloride and quaternary ammonium sulfate is charged into the anode chamber using an electrolytic cell using a cation exchange membrane as a diaphragm. It was known to supply quaternary ammonium hydroxide in the cathode chamber by electrolysis.

しかしながら、このような隔膜電解槽を用いた
製造方法においては、陰極室に供給した原料であ
る第四級アンモニウム塩の陰イオンが隔膜を透過
して陰極室に拡散するため、該陰極室で得られる
水酸化第四級アンモニウム水溶液中の不純イオン
の量が増大し、結果として得られる水酸化第四級
アンモニウム水溶液中の陰イオン不純物は数拾
ppm或はそれ以上の濃度となる。
However, in the production method using such a diaphragm electrolytic cell, the anions of the quaternary ammonium salt, which is the raw material supplied to the cathode chamber, permeate the diaphragm and diffuse into the cathode chamber. The amount of impurity ions in the resulting quaternary ammonium hydroxide aqueous solution increases, and the number of anionic impurities in the resulting quaternary ammonium hydroxide aqueous solution increases.
The concentration is ppm or higher.

他方、水酸化第四級アンモニウムを製造する他
の方法として、第四級アンモニウム塩水溶液をそ
のままOH型イオン交換樹脂層と接触させる方法
がある。しかしながら、このようなイオン交換方
法により、高純度の水酸化第四級アンモニウムを
得ようとした場合には、貫流交換容量を大きくす
る必要があり、大量のイオン交換樹脂を使用しな
ければならない。また、イオン交換樹脂の再生に
高純度の苛性ソーダおよび水を多量に必要とし、
かかる大量のイオン交換樹脂の再生は工業的に極
めて不利である。
On the other hand, as another method for producing quaternary ammonium hydroxide, there is a method in which an aqueous quaternary ammonium salt solution is directly brought into contact with an OH type ion exchange resin layer. However, when attempting to obtain highly pure quaternary ammonium hydroxide by such an ion exchange method, it is necessary to increase the flow-through exchange capacity, and a large amount of ion exchange resin must be used. In addition, large amounts of high-purity caustic soda and water are required to regenerate the ion exchange resin.
Recycling such a large amount of ion exchange resin is extremely disadvantageous industrially.

[問題を解決するための手段] 本発明者等は、上記問題を解決すべく研究を重
ねた結果、第四級アンモニウム塩水溶液を電気分
解して水酸化第四級アンモニウム水溶液を得た
後、これをOH型陰イオン交換樹脂と接触させる
ことにより、極めて効率よく前記不純イオンが除
去され、高純度の水酸化第四級アンモニウムが得
られることを見い出し、本発明を完成するに至つ
た。
[Means for Solving the Problem] As a result of repeated research in order to solve the above problem, the present inventors electrolyzed a quaternary ammonium salt aqueous solution to obtain a quaternary ammonium hydroxide aqueous solution. It has been discovered that by bringing this into contact with an OH type anion exchange resin, the impurity ions can be removed extremely efficiently and highly pure quaternary ammonium hydroxide can be obtained, leading to the completion of the present invention.

本発明は、第四級アンモニウム塩水溶液を隔膜
法電解槽で電気分解して水酸化第四級アンモニウ
ム水溶液を得た後、該水溶液を、水酸イオン以外
の陰イオンの含有量が10ppm以下の苛性アルカリ
による処理に続いて、比抵抗が10MΩ−cm以上の
純水を用い洗浄水中の金属イオンが0.01ppm以下
となるまで水洗して精製したOH型陰イオン交換
樹脂と接触させることにより、陰イオン不純物濃
度を0.2ppm以下とすることを特徴とする水酸化
第四級アンモニウム水溶液の製造方法である。
In the present invention, a quaternary ammonium salt aqueous solution is electrolyzed in a diaphragm electrolytic cell to obtain a quaternary ammonium hydroxide aqueous solution, and then the aqueous solution is converted into a quaternary ammonium salt aqueous solution containing 10 ppm or less of anions other than hydroxide ions. Following the treatment with caustic alkali, the anion is removed by washing with pure water with a specific resistance of 10 MΩ-cm or more until the metal ions in the washing water become 0.01 ppm or less and contacting it with a purified OH-type anion exchange resin. This is a method for producing an aqueous quaternary ammonium hydroxide solution, characterized in that the ionic impurity concentration is 0.2 ppm or less.

本発明において原料として用いられる第四級ア
ンモニウム塩は、アンモニウム基として、一般式 (但し、R1〜R4は、アルキル基またはその誘導
体、もしくは芳香族基またはその誘導体であり、
それぞれのRは同一でもよいし、異種のものでも
よい)を有する塩が特に制限なく使用される。上
記R1〜R4を具体的に例示すれば、メチル基、エ
チル基、プロピル基、ブチル基、ペンチル基、ヘ
キシル基、ヘプチル基、オクチル基、ノニル基お
よびデシル基等のアルキル基、メトキシメチル
基、メトキシエチル基、メトキシプロピル基等の
アルコキシアルキル基、フエニル基、トリル基、
キシリル基、ベンジル基、フエネチル基、スチリ
ル基等の芳香族基およびその誘導体が挙げられ
る。また、Xは、クロルイオン、ブロムイオン等
のハロゲンイオン、硫酸イオン、硝酸イオン、リ
ン酸イオン等の酸基が挙げられ、中でもハロゲン
イオンは、第四級アンモニウム塩水溶液の電気分
解において、隔膜からの透過量が多く本発明の方
法が特に有効である。
The quaternary ammonium salt used as a raw material in the present invention has the general formula (However, R 1 to R 4 are an alkyl group or a derivative thereof, or an aromatic group or a derivative thereof,
Each R may be the same or different.) A salt having R may be used without particular restriction. Specific examples of R 1 to R 4 include alkyl groups such as methyl, ethyl, propyl, butyl, pentyl, hexyl, heptyl, octyl, nonyl, and decyl, and methoxymethyl. groups, alkoxyalkyl groups such as methoxyethyl groups and methoxypropyl groups, phenyl groups, tolyl groups,
Aromatic groups such as xylyl group, benzyl group, phenethyl group, styryl group and derivatives thereof are mentioned. Further, X may be a halogen ion such as a chloride ion or a bromide ion, or an acid group such as a sulfate ion, a nitrate ion, or a phosphate ion. The method of the present invention is particularly effective because the amount of permeation is large.

本発明において用いる隔膜電解槽および電解方
法は、公知の電槽および方法か特に制限なく採用
される。即ち、陰、陽極間に隔膜を設けて陽極室
および陰極室を構成した隔膜電解槽を用いて、陽
極室に原料の第四級アンモニウム塩水溶液を供給
し、また陰極室に水また水酸化第四級アンモニウ
ム水溶液を供給して、該第四級アンモニウム塩の
電気分解を行う。かかる隔膜電解槽の隔膜として
は特に陽イオン交換膜を用いることが、陽極室に
おける第四級アンモニウム塩より生成する陰イオ
ンの陰極室への透析量を制御するために好まし
い。さらに、上記電解槽において、陰極室と陽極
室との間に隔膜で区画された中間室を形成し、該
中間室に水酸化第四級アンモニウム水溶液を供給
して電気分解する方法は、陰極室より得られる水
酸化第四級アンモニウム水溶液に陽極室からの陰
イオンの透過がより低減され、後のOH型陰イオ
ン交換樹脂の単位あたりの処理量を増すことがで
き好ましい態様である。なお、陽極室に供給する
第四級アンモニウム塩水溶液の濃度は、一般に
0.1〜50重量%、特に1〜10重量%が好ましい。
The diaphragm electrolytic cell and electrolytic method used in the present invention may be any known cell and method without particular limitation. That is, using a diaphragm electrolytic cell in which a diaphragm is provided between the negative and anode to form an anode chamber and a cathode chamber, a quaternary ammonium salt aqueous solution as a raw material is supplied to the anode chamber, and water or hydroxide is supplied to the cathode chamber. A quaternary ammonium aqueous solution is supplied to perform electrolysis of the quaternary ammonium salt. It is particularly preferable to use a cation exchange membrane as the diaphragm of such a diaphragm electrolytic cell in order to control the amount of anions produced from the quaternary ammonium salt in the anode chamber dialyzed into the cathode chamber. Furthermore, in the above electrolytic cell, an intermediate chamber partitioned by a diaphragm is formed between the cathode chamber and the anode chamber, and a quaternary ammonium hydroxide aqueous solution is supplied to the intermediate chamber for electrolysis. This is a preferred embodiment because the permeation of anions from the anode chamber into the resulting quaternary ammonium hydroxide aqueous solution is further reduced, and the throughput per unit of the OH type anion exchange resin can be increased. In addition, the concentration of the quaternary ammonium salt aqueous solution supplied to the anode chamber is generally
0.1 to 50% by weight, especially 1 to 10% by weight are preferred.

次に、本発明においては、電解槽の陰極室より
得られる水酸化第四級アンモニウム水溶液を水酸
イオン以外の陰イオンの含有量が10ppm以下の苛
性アルカリによる処理に続いて比抵抗が10MΩ−
cm以上の純水を用い、洗浄水中の金属イオンが
0.01ppm以下となるまで水洗して精製したOH型
陰イオン交換樹脂と接触させることが高純度の水
酸化第四級アンモニウムを得るために重要であ
る。
Next, in the present invention, the quaternary ammonium hydroxide aqueous solution obtained from the cathode chamber of the electrolytic cell is treated with caustic alkali containing 10 ppm or less of anions other than hydroxide ions, and then the resistivity is reduced to 10 MΩ-
Use pure water of cm or higher to remove metal ions in the wash water.
In order to obtain highly pure quaternary ammonium hydroxide, it is important to contact it with an OH type anion exchange resin that has been purified by washing with water until the concentration is 0.01 ppm or less.

上記OH型陰イオン交換樹脂としては、公知の
陰イオン交換樹脂が特に制限なく使用される。例
えば、スチレンとDVB共重合物をクロルメチル
化したあと、トリメチルアミンでアミノ化した
型の強塩基性陰イオン交換樹脂、トリメチルアミ
ンの代りにジメチルエタノールアミンを用いた
型の強塩基性陰イオン交換樹脂が好適である。
OH型イオン交換樹脂の形状も特に制限されるも
のではないが、一般に粒状、管状、シート状等で
ある。
As the OH type anion exchange resin, any known anion exchange resin can be used without particular limitation. For example, a strongly basic anion exchange resin in which a styrene and DVB copolymer is chloromethylated and then aminated with trimethylamine, or a strongly basic anion exchange resin in which dimethylethanolamine is used instead of trimethylamine is suitable. It is.
The shape of the OH type ion exchange resin is not particularly limited either, but it is generally granular, tubular, sheet-like, or the like.

陰極室より得られる第四級アンモニウム水溶液
と前記OH型イオン交換樹脂との接触方法は、該
樹脂の形状等に応じて適宜決定すればよい。例え
ば、粒状のイオン交換樹脂の場合には、充填塔に
該樹脂を充填し、これに水酸化第四級アンモニウ
ム水溶液を通過させる方法が一般的である。かか
る接触処理により、水酸化第四級アンモニウム水
溶液中の前記陰イオンが水酸イオンとイオン交換
され、極めて純度の高い水酸化第四級アンモニウ
ム水溶液が得られる。
The method of contacting the quaternary ammonium aqueous solution obtained from the cathode chamber with the OH type ion exchange resin may be appropriately determined depending on the shape of the resin and the like. For example, in the case of a granular ion exchange resin, a common method is to fill a packed column with the resin and pass an aqueous quaternary ammonium hydroxide solution through the column. Through this contact treatment, the anions in the quaternary ammonium hydroxide aqueous solution are ion-exchanged with hydroxide ions, and an extremely pure quaternary ammonium hydroxide aqueous solution is obtained.

本発明の目的、即ち、陰イオン不純物が
0.2ppm以下の極めて高純度の水酸化第四級アン
モニウムを得るために使用するOH型陰イオン交
換樹脂は、極めて高度な精製を施す必要があり、
本発明においては水酸イオン以外の陰イオンの含
有量が10ppm以下の苛性アルカリ、例えば水酸化
ナトリウム、水酸化カリウム、水酸化第四級アン
モニウム等で処理し、その後、比抵抗が10MΩ−
cm以上の純水を用いて洗浄水中の金属イオンが、
0.01ppm以下となるように洗浄して精製して用い
なければならない。
The purpose of the present invention is that anionic impurities are
The OH type anion exchange resin used to obtain extremely high purity quaternary ammonium hydroxide of 0.2 ppm or less requires extremely high degree of purification.
In the present invention, treatment is performed with a caustic alkali containing 10 ppm or less of anions other than hydroxide ions, such as sodium hydroxide, potassium hydroxide, quaternary ammonium hydroxide, etc., and then the resistivity is reduced to 10 MΩ-
Metal ions in the washing water are removed using pure water of cm or more.
It must be used after being washed and purified to a concentration of 0.01 ppm or less.

本発明において、前記電解槽の陰極室より得ら
れる水酸化第四級アンモニウム水溶液をOH型イ
オン交換樹脂と接触させる前あるいは後に、電気
透析槽の脱塩室に導き、第四級アンモニウムイオ
ンの透過量が増大しない範囲の電気量で電気透析
を行うことは、水酸化第四級アンモニウム水溶液
中に微量存在する金属イオンをも除去でき、より
好ましい態様である。また、本発明においてOH
型交換樹脂と接触させた後の水酸化第四級アンモ
ニウム水溶液を更に電気分解してもよく、この場
合には第2段の電気分解における不純イオンの拡
散量は著しく減少するため、OH型イオン交換樹
脂の再生剤として、前記した高純度のものを使用
しなくてもよいというメリツトを有する。
In the present invention, the quaternary ammonium hydroxide aqueous solution obtained from the cathode chamber of the electrolytic cell is introduced into the desalination chamber of the electrodialysis cell before or after contacting with the OH type ion exchange resin, and the quaternary ammonium ions are permeated. Conducting electrodialysis with an amount of electricity within a range that does not increase the amount of electricity is a more preferable embodiment, since even trace amounts of metal ions present in the aqueous quaternary ammonium hydroxide solution can be removed. In addition, in the present invention, OH
The quaternary ammonium hydroxide aqueous solution that has been brought into contact with the mold exchange resin may be further electrolyzed. In this case, the amount of impurity ions diffused in the second stage electrolysis is significantly reduced, so that OH type ions This method has the advantage that it is not necessary to use the above-mentioned highly purified regenerant for the exchanged resin.

[効果] 以上の説明より理解される如く、本発明の方法
によれば、第四級アンモニウム塩を原料とした水
酸化第四級アンモニウム水溶液の電解合成におい
て、陰極室に拡散する原料の第四級アンモニウム
塩の陰イオンを効率よく除去し、高度に精製され
た水酸化アンモニウム水溶液を高収率で得ること
が可能である。
[Effect] As understood from the above explanation, according to the method of the present invention, in the electrolytic synthesis of a quaternary ammonium hydroxide aqueous solution using a quaternary ammonium salt as a raw material, quaternary It is possible to efficiently remove the anion of the grade ammonium salt and obtain a highly purified aqueous ammonium hydroxide solution in high yield.

[実施例] 以下、本発明を更に具体的に説明するため、実
施例を示すが、本発明はこれに限定されるもので
はない。
[Examples] Examples are shown below to further specifically explain the present invention, but the present invention is not limited thereto.

実施例 陽イオン交換膜(徳山曹達製、ネオセプタC66
−10F)を隔膜とした2室型電解槽に(陽極Ti/
Pt、陰極SUS316)の陽極室に5%テトラメチル
アンモニウムクロライド水溶液を供給し、陰極室
には1%水酸化テトラメチルアンモニウムを入
れ、2A/dm2で通過した所次第に陰極室の濃度
が上昇し、約5%水酸化テトラメチルアンモニウ
ムが得られた所で電気分解を終了した。この5%
水酸化テトラメチルアンモニウム中のCl-を測定
した所、約40ppmであつた。
Example Cation exchange membrane (manufactured by Tokuyama Soda, Neocepta C66)
-10F) is used as a diaphragm in a two-chamber electrolytic cell (anode Ti/
A 5% tetramethylammonium chloride aqueous solution was supplied to the anode chamber of the Pt, cathode SUS316), and 1% tetramethylammonium hydroxide was placed in the cathode chamber, and the concentration in the cathode chamber gradually increased as it passed through at 2A/ dm2 . The electrolysis was terminated when about 5% tetramethylammonium hydroxide was obtained. This 5%
When Cl - in tetramethylammonium hydroxide was measured, it was approximately 40 ppm.

一方、型の市販陰イオン交換樹脂を充填塔に
入れ充分にコンデイシヨニングした後、食塩電解
(水銀法)にて製造した水酸イオン以外の陰イオ
ンの含有量が5ppm以下の高純度5%NaOH溶液
を用いてOH型にした。
On the other hand, a type of commercially available anion exchange resin is placed in a packed tower and thoroughly conditioned, followed by high purity 5. It was made into OH form using % NaOH solution.

次いで通常の混床式イオン交換樹脂塔を用いて
製造した超純粋(比抵抗10MΩ−cm以上)を用い
て再生剤NaOHの押出水洗をNa+イオンが原子
吸光分析にて0.01ppm以下になるまで行つた。前
記方法により得られた水酸化テトラメチルアンモ
ニウムを上記した方法で精製したOH型陰イオン
交換樹脂塔中を通過させて処理したところ、その
留出液中のCl-イオンは約0.2ppmまで減少してい
た。
Next, the regenerant NaOH was extruded and washed with water using ultra-pure resin (specific resistance 10 MΩ-cm or more) produced using a conventional mixed-bed ion exchange resin column until the Na + ions became 0.01 ppm or less as determined by atomic absorption spectrometry. I went. When the tetramethylammonium hydroxide obtained by the above method was passed through an OH type anion exchange resin column purified by the above method and treated, the Cl - ions in the distillate were reduced to about 0.2 ppm. was.

Claims (1)

【特許請求の範囲】[Claims] 1 第四級アンモニウム塩水溶液を隔膜法電解槽
で電気分解して水酸化第四級アンモニウム水溶液
を得た後、該水溶液を、水酸イオン以外の陰イオ
ンの含有量が10ppm以下の苛性アルカリによる処
理に続いて、比抵抗が10MΩ−cm以上の純水を用
い洗浄水中の金属イオンが、0.01ppm以下となる
まで水洗して精製したOH型陰イオン交換樹脂と
接触させることにより、陰イオン不純物濃度を
0.2ppm以下とすることを特徴とする水酸化第四
級アンモニウム水溶液の製造方法。
1. After obtaining a quaternary ammonium hydroxide aqueous solution by electrolyzing a quaternary ammonium salt aqueous solution in a diaphragm electrolytic cell, the aqueous solution is treated with a caustic alkali containing 10 ppm or less of anions other than hydroxide ions. Following the treatment, anionic impurities are removed by contacting purified OH-type anion exchange resin with purified water using pure water with a specific resistance of 10 MΩ-cm or more until the metal ions in the washing water become 0.01 ppm or less. concentration
A method for producing a quaternary ammonium hydroxide aqueous solution, characterized in that the concentration is 0.2 ppm or less.
JP60277888A 1985-12-12 1985-12-12 Method for producing high purity quaternary ammonium hydroxide aqueous solution Granted JPS62139890A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60277888A JPS62139890A (en) 1985-12-12 1985-12-12 Method for producing high purity quaternary ammonium hydroxide aqueous solution

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60277888A JPS62139890A (en) 1985-12-12 1985-12-12 Method for producing high purity quaternary ammonium hydroxide aqueous solution

Publications (2)

Publication Number Publication Date
JPS62139890A JPS62139890A (en) 1987-06-23
JPH0333792B2 true JPH0333792B2 (en) 1991-05-20

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
JP60277888A Granted JPS62139890A (en) 1985-12-12 1985-12-12 Method for producing high purity quaternary ammonium hydroxide aqueous solution

Country Status (1)

Country Link
JP (1) JPS62139890A (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2532173B2 (en) * 1990-06-29 1996-09-11 株式会社トクヤマ Developer for positive type photoresist

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Publication number Publication date
JPS62139890A (en) 1987-06-23

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