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JPH0342497B2 - - Google Patents
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JPH0342497B2 - - Google Patents

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Publication number
JPH0342497B2
JPH0342497B2 JP59134788A JP13478884A JPH0342497B2 JP H0342497 B2 JPH0342497 B2 JP H0342497B2 JP 59134788 A JP59134788 A JP 59134788A JP 13478884 A JP13478884 A JP 13478884A JP H0342497 B2 JPH0342497 B2 JP H0342497B2
Authority
JP
Japan
Prior art keywords
compound semiconductor
adhesive resin
substrate
electrode
magnetoresistive elements
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP59134788A
Other languages
Japanese (ja)
Other versions
JPS6113637A (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP59134788A priority Critical patent/JPS6113637A/en
Publication of JPS6113637A publication Critical patent/JPS6113637A/en
Publication of JPH0342497B2 publication Critical patent/JPH0342497B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/30Die-attach connectors
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/10Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
    • H10D62/117Shapes of semiconductor bodies
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W70/00Package substrates; Interposers; Redistribution layers [RDL]
    • H10W70/60Insulating or insulated package substrates; Interposers; Redistribution layers
    • H10W70/67Insulating or insulated package substrates; Interposers; Redistribution layers characterised by their insulating layers or insulating parts
    • H10W70/68Shapes or dispositions thereof
    • H10W70/682Shapes or dispositions thereof comprising holes having chips therein
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W70/00Package substrates; Interposers; Redistribution layers [RDL]
    • H10W70/60Insulating or insulated package substrates; Interposers; Redistribution layers
    • H10W70/67Insulating or insulated package substrates; Interposers; Redistribution layers characterised by their insulating layers or insulating parts
    • H10W70/68Shapes or dispositions thereof
    • H10W70/685Shapes or dispositions thereof comprising multiple insulating layers
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/071Connecting or disconnecting
    • H10W72/073Connecting or disconnecting of die-attach connectors
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/071Connecting or disconnecting
    • H10W72/073Connecting or disconnecting of die-attach connectors
    • H10W72/07331Connecting techniques
    • H10W72/07337Connecting techniques using a polymer adhesive, e.g. an adhesive based on silicone or epoxy
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/071Connecting or disconnecting
    • H10W72/075Connecting or disconnecting of bond wires
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/071Connecting or disconnecting
    • H10W72/075Connecting or disconnecting of bond wires
    • H10W72/07551Connecting or disconnecting of bond wires characterised by changes in properties of the bond wires during the connecting
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/50Bond wires
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/50Bond wires
    • H10W72/531Shapes of wire connectors
    • H10W72/536Shapes of wire connectors the connected ends being ball-shaped
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/50Bond wires
    • H10W72/531Shapes of wire connectors
    • H10W72/5363Shapes of wire connectors the connected ends being wedge-shaped
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/50Bond wires
    • H10W72/59Bond pads specially adapted therefor
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/851Dispositions of multiple connectors or interconnections
    • H10W72/874On different surfaces
    • H10W72/884Die-attach connectors and bond wires
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00Interconnections or connectors in packages
    • H10W72/90Bond pads, in general
    • H10W72/931Shapes of bond pads
    • H10W72/934Cross-sectional shape, i.e. in side view
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W90/00Package configurations
    • H10W90/701Package configurations characterised by the relative positions of pads or connectors relative to package parts
    • H10W90/751Package configurations characterised by the relative positions of pads or connectors relative to package parts of bond wires
    • H10W90/753Package configurations characterised by the relative positions of pads or connectors relative to package parts of bond wires between laterally-adjacent chips
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W90/00Package configurations
    • H10W90/701Package configurations characterised by the relative positions of pads or connectors relative to package parts
    • H10W90/751Package configurations characterised by the relative positions of pads or connectors relative to package parts of bond wires
    • H10W90/754Package configurations characterised by the relative positions of pads or connectors relative to package parts of bond wires between a chip and a stacked insulating package substrate, interposer or RDL

Landscapes

  • Wire Bonding (AREA)
  • Hall/Mr Elements (AREA)

Description

【発明の詳細な説明】 (イ) 産業上の利用分野 本発明はホール素子、磁気抵抗素子等の化合物
半導体装置に関する。
DETAILED DESCRIPTION OF THE INVENTION (a) Industrial Application Field The present invention relates to compound semiconductor devices such as Hall elements and magnetoresistive elements.

(ロ) 従来の技術 インジウムアンチモナイド(InSb)、インジウ
ムアーセナイド(InAs)の様にキヤリア移動度
の高い化合物半導体は、磁気を作用させると抵抗
値が変化するという性質を有しており、この種化
合物半導体装置を用いた磁気検出器が実用化され
ている。
(b) Conventional technology Compound semiconductors with high carrier mobility, such as indium antimonide (InSb) and indium arsenide (InAs), have the property that their resistance value changes when magnetism is applied to them. Magnetic detectors using this type of compound semiconductor device have been put into practical use.

第3図は上述した化合物半導体装置を用いた磁
気検出器の一般的な構成を示す正面断面図であ
り、図中21は筐体を示している。筐体21はプ
ラスチツク成形品であつて、上面に形成した開口
部21aはベリリウム−銅製の薄膜よりなる保護
板22にて閉鎖されている。保護板22は筐体2
1に一体にモールドされており、その外面には耐
摩耗性向上のために必要に応じてクロムメツキが
施される。
FIG. 3 is a front sectional view showing a general configuration of a magnetic detector using the above-described compound semiconductor device, and 21 in the figure indicates a housing. The housing 21 is a plastic molded product, and an opening 21a formed on the top surface is closed with a protective plate 22 made of a beryllium-copper thin film. The protective plate 22 is the housing 2
1, and its outer surface is chrome plated as necessary to improve wear resistance.

第4図に示すように、筐体21内にはこの保護
板22と適当な間隙を隔てて化合物半導体装置か
らなる検出器本体20が配設されている。この検
出器本体20はセンサユニツト23、マウント基
板28及び永久磁石29等にて構成されている。
センサユニツト23はフエライト製の厚肉の磁性
体基板24上に相互に電気的に接続したインジウ
ムアンチモナイド等の化合物半導体素子からなる
磁気抵抗素子26,27を接着用樹脂25を用い
て並設したものであり、この磁性体基板24はこ
れよりも薄肉のプラスチツク製のマウント基板2
8に穿設した穴28aに嵌合させてある。この状
態では磁性体基板24の下面はマウント基板28
下面のリン青銅製の底板28′を隔てて、底板2
8′下面に一磁極端面を固定した円柱状のバイア
ス用永久磁石29に対向し、また両面の両磁気抵
抗素子26,27はマウント基板28の上面より
も所要寸法上方に高く位置した状態となつてい
る。マウント基板28上にはセンサユニツト23
を囲繞し、且つ上面を磁気抵抗素子26,27表
面よりも高くした環状スペース30が設けられて
おり、保護板22の周縁に該スペーサ30の上面
を当接させて保護板22と磁気抵抗素子26,2
7との間隔が所定値になるようにしてある。そし
て各磁気抵抗素子26,27の電極とマウント基
板28上のプリント配線28bの一端部とは金線
製の複数の導線31a,31b(図面には2本の
み表われている)を用いて接続され、またプリン
ト配線28bの他端部はマウント基板28の周縁
部においてリード線32a,32b,32cの一
端に接続されている。これらリード線32a,3
2b,32cの他端はプラスチツク製の蓋部材3
3に貫設したリード板34a,34b,34cに
接続されている。
As shown in FIG. 4, a detector main body 20 made of a compound semiconductor device is disposed within the casing 21 with a suitable gap between the protective plate 22 and the detector main body 20 . The detector main body 20 is composed of a sensor unit 23, a mount board 28, a permanent magnet 29, and the like.
The sensor unit 23 has magnetoresistive elements 26 and 27 made of compound semiconductor elements such as indium antimonide that are electrically connected to each other on a thick magnetic substrate 24 made of ferrite, which are arranged side by side using an adhesive resin 25. This magnetic substrate 24 is made of a thinner plastic mount substrate 2.
It is fitted into a hole 28a drilled in 8. In this state, the lower surface of the magnetic substrate 24 is attached to the mount substrate 28.
The bottom plate 2 is separated by the phosphor bronze bottom plate 28' on the lower surface.
8' faces a cylindrical bias permanent magnet 29 with one magnetic pole end fixed to the lower surface, and both magnetic resistance elements 26 and 27 on both sides are positioned higher than the upper surface of the mount board 28 by a required dimension. ing. The sensor unit 23 is mounted on the mount board 28.
An annular space 30 is provided which surrounds the spacer and whose upper surface is higher than the surfaces of the magnetoresistive elements 26 and 27, and the upper surface of the spacer 30 is brought into contact with the periphery of the protection plate 22 to connect the protection plate 22 and the magnetoresistive elements. 26,2
7 is set to a predetermined value. The electrodes of each magnetoresistive element 26, 27 and one end of the printed wiring 28b on the mount board 28 are connected using a plurality of gold wire conductive wires 31a, 31b (only two are shown in the drawing). The other end of the printed wiring 28b is connected to one end of the lead wires 32a, 32b, and 32c at the peripheral edge of the mount board 28. These lead wires 32a, 3
The other ends of 2b and 32c are plastic lid members 3.
3 are connected to lead plates 34a, 34b, and 34c extending through the lead plate 3.

ところで、従来各種トランジスタ、IC製品に
おけるペレツト、即ち素子側の電極と、ステム、
即ち基板側のリード板との接続には金線を用いて
ペレツト側に対しては金線の端末を溶融して玉状
とし、これを電極に押圧して釘頭形状に接着す
る、所謂ネイルヘツドボンドをし、また基板側の
リード板に対しては金線の端末を加熱しつつ圧着
する、所謂ステイツチボンドをするのが一般的で
あり、磁気検出器においてもリード線はペレツト
側である磁性抵抗素子の電極に対してはネイルヘ
ツドボンドし、また基板側であるプリント配線に
対してはステツチボンドをすることが行なわれて
いる。
By the way, in conventional various transistors and IC products, pellets, that is, electrodes on the element side, stems,
In other words, a gold wire is used to connect the lead plate on the board side, and for the pellet side, the end of the gold wire is melted into a ball shape, and this is pressed to the electrode and glued in the shape of a nail head. In addition, it is common to heat and press the end of a gold wire to the lead plate on the board side, so-called stay bonding.In magnetic detectors, the lead wire is also attached to the pellet side. Nail head bonding is performed for the electrodes of a certain magnetoresistive element, and stitch bonding is performed for the printed wiring on the substrate side.

しかし上述した如き磁気検出器にあつてはその
感度は検出器本体20、特にその磁気抵抗素子2
6,27と被検物との離隔寸法と密接な関係があ
り、感度の向上を図るうえではこれを可及的に小
さくするのが望ましく、従つて保護板22の肉厚
は可及的に薄く、また保護板22と磁気抵抗素子
26,27の表面との離隔寸法は可及的に小さく
するのが望まれる。しかし上述の如きネイルヘツ
ドボンデイング方式を採用すると、ネイルヘツド
部分と金線部分とが連らなる部分、即ち首の部分
は弱く折り曲げると破断するおそれがあるため、
ネイルヘツド部分に連らなる金線部分は所要寸法
上方に立ち上らせ金線部分の中間にて曲げる必要
がある。このため導線31a,31bと保護板2
2との接触を避けるには磁気抵抗素子26,27
と保護板22内面との間に所定の間隔を隔てなけ
ればならずその短縮化には限界があり、磁気検出
器の感度向上を図る上での大きな障害となつてい
る。
However, in the case of the above-mentioned magnetic detector, its sensitivity is limited to the detector body 20, especially its magnetoresistive element 2.
6, 27 and the test object, and it is desirable to make this as small as possible in order to improve sensitivity. Therefore, the thickness of the protective plate 22 should be as small as possible. It is desirable that the protective plate 22 be thin and that the distance between the protective plate 22 and the surfaces of the magnetoresistive elements 26 and 27 be as small as possible. However, if the above-mentioned nail head bonding method is adopted, the part where the nail head part and the gold wire part are connected, that is, the neck part, may break if bent weakly.
The gold wire part connected to the nail head part needs to be raised upward by the required dimension and bent at the middle of the gold wire part. Therefore, the conductors 31a, 31b and the protective plate 2
To avoid contact with 2, magnetoresistive elements 26, 27
A predetermined distance must be left between the magnetic detector and the inner surface of the protective plate 22, and there is a limit to how short the distance can be shortened, which is a major obstacle in improving the sensitivity of the magnetic detector.

そこで、本出願人は、上述した欠点を解消する
ために、第5図に示す如く、複数の磁気抵抗素子
26,27及びこれを固定する基板24を備えた
化合物半導体装置からなる検出器本体20を有す
る磁気検出器において、前記磁気抵抗素子26,
27の電極とマウント基板28上の配線部28b
とを接続する導線31a′,31b′の配線部側端部
を配線部28bに対し、ネイルヘツドボンドする
と共に、導線31a′,31b′を磁気抵抗素子2
6,27上にステイツチボンドすることにより、
従来のネイルヘツドボンド方式とは逆であつて磁
気抵抗素子26,27表面と被検物との間隔を格
段に短縮して、検出感度の大幅な向上を図り得る
ようにした磁気検出器を先に提案した(実願昭57
−166690号に詳しい。) (ハ) 発明が解決しようとする問題点 しかしながら、上記した導線31a′,31b′を
磁気抵抗素子26,27上にステイツチボンドす
る方式では、磁気抵抗素子26,27がもろい化
合物半導体で形成されているという性質上、ステ
イツチボンドの際の熱圧着の応力により、磁気抵
抗素子26,27内部に亀裂が生じ易く、断線に
より不良やノイズ不良などの原因となつていた。
また、接着用樹脂25上に電極を延在して、接着
用樹脂25上でステイツチボンドして磁気抵抗素
子26,27にストレスがかからないようにする
こともできるが、この方式では接着用樹脂25が
軟かいため、充分に加圧することができなく、電
極と導線31a′,31b′との接続が不良になると
いう欠点がある。
Therefore, in order to eliminate the above-mentioned drawbacks, the present applicant proposed a detector main body 20 made of a compound semiconductor device including a plurality of magnetoresistive elements 26, 27 and a substrate 24 for fixing them, as shown in FIG. In the magnetic detector having the magnetoresistive element 26,
27 electrode and the wiring part 28b on the mount board 28
The ends of the conductive wires 31a' and 31b' on the wiring part side are nail-head bonded to the wiring part 28b, and the conductive wires 31a' and 31b' are connected to the magnetoresistive element 2.
By stitch bonding on 6,27,
The magnetic detector is the opposite of the conventional nail head bond method, and the distance between the surfaces of the magnetoresistive elements 26 and 27 and the object to be measured is significantly shortened, thereby significantly improving detection sensitivity. (1987)
−For details on issue 166690. ) (C) Problems to be Solved by the Invention However, in the method of static bonding the conductive wires 31a' and 31b' onto the magnetoresistive elements 26 and 27, the magnetoresistive elements 26 and 27 are formed of a fragile compound semiconductor. Due to the nature of the magneto-resistance elements 26 and 27, cracks are likely to occur inside the magnetoresistive elements 26 and 27 due to the stress of thermocompression bonding during staple bonding, causing wire breakage and noise defects.
It is also possible to extend the electrodes on the adhesive resin 25 and perform stitch bonding on the adhesive resin 25 to prevent stress from being applied to the magnetoresistive elements 26 and 27. Since the electrode 25 is soft, sufficient pressure cannot be applied, resulting in poor connection between the electrode and the conductive wires 31a' and 31b'.

(ニ) 問題を解消するための手段 本発明は上述した問題点を解消すべくなされた
もので、化合物半導体素子の引出し電極を、化合
物半導体素子を基板に固着する接着用樹脂まで延
在して設けると共に、少なくとも前記電極と接着
用樹脂との間にシリコン化合物からなる保護膜を
配設したことを特徴とする。
(d) Means for solving the problem The present invention has been made to solve the above-mentioned problems, and includes extending the lead electrode of the compound semiconductor element to the adhesive resin that fixes the compound semiconductor element to the substrate. In addition, a protective film made of a silicon compound is provided between at least the electrode and the adhesive resin.

(ホ) 作用 本発明は、少なくとも電極と接着用樹脂との間
にシリコン化合物ろ配設することにより、接着用
樹脂上に延在した電極と導線との接続が強固に行
うことができる。
(E) Effect In the present invention, by disposing a silicon compound filter between at least the electrode and the adhesive resin, the electrode extending on the adhesive resin and the conductive wire can be firmly connected.

(ヘ) 実施例 以下、本発明をその爺施例を示す図面に基いて
説明する。
(F) Embodiments The present invention will be described below with reference to drawings showing embodiments thereof.

第1図は本発明による化合物半導体装置を用い
た磁気検出器の検出器本体部分の拡大断面図であ
る。検出器本体20は化合物半導体装置からなる
センサユニツト23、マウント基板28、永久磁
石29等にて構成されている。センサユニツト2
3はフエライト製の厚肉の磁性体基板24上に相
互に電気的に接続されたインジウムアンチモナイ
ドなどの化合物半導体素子からなる磁気抵抗素子
26,27を接着用樹脂25を用いて並設され
る。また、磁気抵抗素子26,27上には接着用
樹脂25まで延在する引出し電極40,41が設
けられる。そして、本発明は引出し電極40,4
1と接着用樹脂25との間に酸化シリコン窒化な
どのシリコン化合物からなる保護膜42が設けら
れている。
FIG. 1 is an enlarged sectional view of a main body portion of a magnetic detector using a compound semiconductor device according to the present invention. The detector main body 20 is composed of a sensor unit 23 made of a compound semiconductor device, a mount substrate 28, a permanent magnet 29, and the like. Sensor unit 2
3, magnetoresistive elements 26 and 27 made of compound semiconductor elements such as indium antimonide are electrically connected to each other on a thick magnetic substrate 24 made of ferrite, and are arranged side by side using adhesive resin 25. Ru. Further, lead electrodes 40 and 41 extending to the adhesive resin 25 are provided on the magnetoresistive elements 26 and 27. The present invention also provides extraction electrodes 40, 4.
A protective film 42 made of a silicon compound such as silicon oxide nitride is provided between the adhesive resin 25 and the adhesive resin 25 .

このように構成したセンサユニツト23の磁性
体基板24をこれよりも薄肉のプラスチツク製の
マウント基板28に穿設した穴28aに嵌合して
固定する。この状態では磁性体基板24の下面は
マウント基板28下面のリン青銅製の底板28を
介して、バイアス用の永久磁石29に対向し、ま
た上面の磁気抵抗素子26,27はマウント基板
28上面より所要寸法高く位置している。マウン
ト基板28上には穴28aの周りにプリント配線
28bが設けられ、また周縁部にはセンサユニツ
ト23を囲繞し、且つ周縁部上面に磁気抵抗素子
26,27よりも高くした環状スペーサが設けら
れており、保護板22の周縁に該スペーサの上面
を当接させることにより保護板22と磁気抵抗素
子26,27との間隔が所定値になるようにして
ある。
The magnetic substrate 24 of the sensor unit 23 constructed in this way is fitted into a hole 28a formed in a thinner plastic mount substrate 28 and fixed. In this state, the lower surface of the magnetic substrate 24 faces the permanent magnet 29 for bias via the phosphor bronze bottom plate 28 on the lower surface of the mount substrate 28, and the magnetoresistive elements 26 and 27 on the upper surface are opposed to the phosphor bronze bottom plate 28 on the lower surface of the mount substrate 28. It is located higher than the required dimensions. A printed wiring 28b is provided around the hole 28a on the mount board 28, and an annular spacer that surrounds the sensor unit 23 and is higher than the magnetic resistance elements 26 and 27 is provided on the upper surface of the periphery. By bringing the upper surface of the spacer into contact with the periphery of the protection plate 22, the distance between the protection plate 22 and the magnetoresistive elements 26, 27 is set to a predetermined value.

そして各磁気抵抗素子26,27の電極とマウ
ント基板28上面のプリント配線28bの一端部
とを接続する導線31a′,31b′の一端31c′,
31c′は夫々第3図および第4図に示す従来の場
合とは逆にプリント配線28bの一端部に対して
ネイルヘツドボンドし、また端部31d′,31
d′は磁気抵抗素子26,27の引出し電極40,
41に対してステイツチボンドしてある。
One end 31c' of the conductive wire 31a', 31b' connects the electrode of each magnetoresistive element 26, 27 and one end of the printed wiring 28b on the upper surface of the mount board 28;
31c' is nail head bonded to one end of the printed wiring 28b, contrary to the conventional case shown in FIGS. 3 and 4, and the ends 31d', 31
d′ is the extraction electrode 40 of the magnetoresistive elements 26, 27;
It is state bonded to 41.

このように、接着用樹脂25と引出し電極4
0,41との間に保護膜42を介在せしめてい
る。従つて、接着用樹脂25上の電極40,41
にステイツチボンドする際に、保護膜42にてボ
ンテイング部分が堅固になつているので、十分な
加圧力を加えることができ、導線31a′,31
b′を電極40,41に十分な接着強度を持たして
接続できる。しかも、磁気抵抗素子26,27に
は、ストレスはかからないので、亀裂など生じれ
おそれはない。
In this way, the adhesive resin 25 and the extraction electrode 4
0 and 41, a protective film 42 is interposed between them. Therefore, the electrodes 40, 41 on the adhesive resin 25
When stitch-bonding the conductors 31a' and 31, sufficient pressure can be applied because the bonding part is made firm by the protective film 42.
b' can be connected to the electrodes 40, 41 with sufficient adhesive strength. Moreover, since no stress is applied to the magnetoresistive elements 26 and 27, there is no risk of cracks occurring.

つぎに、本発明によるセンサユニツト23の製
造方法の一例を第2図に従い簡単に説明する。
Next, an example of a method for manufacturing the sensor unit 23 according to the present invention will be briefly explained with reference to FIG.

インジウムアンチモナイドなどの化合物半導体
片50にフオトレジストのパターン51を形成す
る(第2図イ)。半導体片50を一定深さにまで
エツチングして掘り込む(第2図ロ)。そして、
フオトレジストを取り除いて、酸化シリコンある
いは窒化シリコンなどからなる保護膜42を
CVD法などにより形成する(第2図ハ)。接着用
樹脂25で半導体片50を基板24に貼りつける
(第2図ニ)。その後半導体片50の裏面を研摩し
て均一な厚さに形成して、化合物半導体素子から
なる磁気抵抗素子26,27を形成する(第2図
ホ)。然る後に、磁気抵抗素子26,27に接着
用樹脂25まで延在する引出し電極40,41を
設けてセンサユニツト23が形成される。
A photoresist pattern 51 is formed on a compound semiconductor piece 50 such as indium antimonide (FIG. 2A). The semiconductor piece 50 is etched and dug to a certain depth (FIG. 2B). and,
The photoresist is removed and a protective film 42 made of silicon oxide or silicon nitride is applied.
It is formed by CVD method etc. (Figure 2 C). The semiconductor piece 50 is attached to the substrate 24 using adhesive resin 25 (FIG. 2D). Thereafter, the back surface of the semiconductor piece 50 is polished to a uniform thickness to form magnetoresistive elements 26 and 27 made of compound semiconductor elements (FIG. 2(e)). Thereafter, the sensor unit 23 is formed by providing lead electrodes 40, 41 extending to the adhesive resin 25 on the magnetoresistive elements 26, 27.

尚、本実施例では、基板24と磁気抵抗素子2
6,27との間にも保護膜42が設けられている
が、必要に応じて取り除いても良い。
In this embodiment, the substrate 24 and the magnetoresistive element 2
A protective film 42 is also provided between 6 and 27, but it may be removed if necessary.

(ト) 発明の効果 以上説明したように、本発明は、少なくとも電
極と接着用樹脂との間にシリコン化合物を配設し
たので、接着用樹脂上に延在した電極に導線を接
着するのに充分な加圧力を加えることができ導線
を電極に充分な接着力で接着できると共に、磁気
抵抗素子などの化合物半導体素子には、ストレス
がかからないので、亀裂が発生するおそれもな
い。
(G) Effects of the Invention As explained above, in the present invention, since a silicon compound is disposed between at least the electrode and the adhesive resin, it is difficult to bond the conductive wire to the electrode extending on the adhesive resin. Sufficient pressure can be applied and the conductive wire can be bonded to the electrode with sufficient adhesive force, and since stress is not applied to compound semiconductor elements such as magnetoresistive elements, there is no risk of cracking.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明の化合物半導体装置を用いた磁
気検出器の要部拡大断面図、第2図は本発明の化
合物半導体装置の製造方法の一例を示す工程図で
ある。第3図ないし第5図は従来の化合物半導体
装置を用いた磁気検出器を示すもので、第3図は
正面断面図、第4図および第5図は要部拡大断面
図である。 24……基板、25……接着用樹脂、26,2
7……化合物半導体素子からなる磁気抵抗素子、
40,41……引出し電極、42……保護膜。
FIG. 1 is an enlarged sectional view of a main part of a magnetic detector using the compound semiconductor device of the present invention, and FIG. 2 is a process diagram showing an example of a method for manufacturing the compound semiconductor device of the present invention. 3 to 5 show a magnetic detector using a conventional compound semiconductor device, in which FIG. 3 is a front sectional view, and FIGS. 4 and 5 are enlarged sectional views of main parts. 24...Substrate, 25...Adhesive resin, 26,2
7... Magnetoresistive element made of a compound semiconductor element,
40, 41...Extraction electrode, 42...Protective film.

Claims (1)

【特許請求の範囲】[Claims] 1 化合物半導体素子を基板に接着用樹脂で固着
した化合物半導体装置において、前記化合物半導
体素子の引出し電極を前記接着用樹脂上まで延在
して設けると共に、少なくとも前記電極と接着用
樹脂表面との間にシリコン化合物からなる保護膜
を配設したことを特徴とする化合物半導体装置。
1. In a compound semiconductor device in which a compound semiconductor element is fixed to a substrate with an adhesive resin, an extraction electrode of the compound semiconductor element is provided to extend onto the adhesive resin, and at least a gap between the electrode and the surface of the adhesive resin is provided. 1. A compound semiconductor device characterized in that a protective film made of a silicon compound is disposed on the surface of the semiconductor device.
JP59134788A 1984-06-28 1984-06-28 Compound semiconductor device Granted JPS6113637A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59134788A JPS6113637A (en) 1984-06-28 1984-06-28 Compound semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59134788A JPS6113637A (en) 1984-06-28 1984-06-28 Compound semiconductor device

Publications (2)

Publication Number Publication Date
JPS6113637A JPS6113637A (en) 1986-01-21
JPH0342497B2 true JPH0342497B2 (en) 1991-06-27

Family

ID=15136559

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59134788A Granted JPS6113637A (en) 1984-06-28 1984-06-28 Compound semiconductor device

Country Status (1)

Country Link
JP (1) JPS6113637A (en)

Also Published As

Publication number Publication date
JPS6113637A (en) 1986-01-21

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