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JPH034516B2 - - Google Patents
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JPH034516B2 - - Google Patents

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Publication number
JPH034516B2
JPH034516B2 JP56090802A JP9080281A JPH034516B2 JP H034516 B2 JPH034516 B2 JP H034516B2 JP 56090802 A JP56090802 A JP 56090802A JP 9080281 A JP9080281 A JP 9080281A JP H034516 B2 JPH034516 B2 JP H034516B2
Authority
JP
Japan
Prior art keywords
crystal
crucible
diameter
pulling
length
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP56090802A
Other languages
Japanese (ja)
Other versions
JPS57206809A (en
Inventor
Hideshi Kubota
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NTT Inc
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP9080281A priority Critical patent/JPS57206809A/en
Publication of JPS57206809A publication Critical patent/JPS57206809A/en
Publication of JPH034516B2 publication Critical patent/JPH034516B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B21/00Measuring arrangements or details thereof, where the measuring technique is not covered by the other groups of this subclass, unspecified or not relevant
    • G01B21/10Measuring arrangements or details thereof, where the measuring technique is not covered by the other groups of this subclass, unspecified or not relevant for measuring diameters
    • G01B21/12Measuring arrangements or details thereof, where the measuring technique is not covered by the other groups of this subclass, unspecified or not relevant for measuring diameters of objects while moving

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Length Measuring Devices With Unspecified Measuring Means (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)

Description

【発明の詳細な説明】[Detailed description of the invention]

本発明はるつぼの押上げを行う単結晶育成にお
いて結晶径を精密に検出する方法に関するもので
ある。 従来、引上げ方法により育成中の結晶径を検出
する方法としては、光学的方法によつて行われて
いた。それは成長中の結晶中の結晶近傍のレーザ
ービーム照射による反射または結晶周囲の液面に
生ずる高熱の発熱部(fusion ring)の輻射位置
を検出する方法、あるいはX線による透過像また
は結晶から放出される赤外線による像をTVでモ
ニターし、その映像信号から結晶径に比例した電
気信号を取り出す方法である。しかし、このよう
な光学的方法は結晶回転の偏心、反射光のゆら
ぎ、のぞき窓の曇り等に対して弱いことがその欠
点である。さらにX線の場合には装置が複雑にな
ること、およびX線の人体に及ぼす危険性がある
などの致命的な欠点がある。また、結晶材料によ
つてはこの光学的検出方法を用いることはできな
い。たとえば、化合物半導体には特有条件とし
て、圧力チヤンバー内の高圧ガスの熱対流が激し
いこと、融液を覆う液体カプセル層を通して観察
しなければならないことなどによつて、光学的検
出方法は不可能である。 一方、結晶重量検出と結晶長精密測定により結
晶径を検出する方法が試みられている。この方法
では光学的結晶経験出方法での欠点が克服され
る。しかし、融液の減少による液面の自然降下を
考慮すれば良い場合だけに適用できる方法であつ
た。一般には成長界面(液面)を定位置に保つこ
とは温度条件が安定になり育成に有利である。そ
こで界面を定位置に保つためにるつぼ上昇制御が
行われる場合がある。したがつて、上述の方法に
は適用限界があり、さらに発展させる必要があつ
た。 本発明は重量検出法および精密測長法を採用
し、融液減少による液面の降下及び液面降下を補
償するためのるつぼ上昇制御を考慮に入れ、結晶
径を育成中、実時間で精密測定すうることを目的
としている。特に本発明のさきの出願(特願昭56
−58646号(特公昭59−358765号)に対して液面
降下を補償するためのるつぼ上昇の補正を解決し
たことが特徴である。 実施例 1 第1図は本方法の第1実施例であつて、装置の
ブロツクダイアグラムを示す。1は重量センサー
で引上軸3と連結して結晶11の重量を検出す
る。もし、るつぼ押上げ軸5と連結させると融液
14の減少量から結晶重量を検出することにな
る。2は精密測長器で、引上軸と連動して結晶の
引上げ長を測定する。4も精密測長器で、るつぼ
押上げ軸5と連動してるつぼの上昇距離を測定す
る。6はるつぼの押上げ制御機構で、8のコンピ
ユーターによつて制押される。7は1,2,4の
重量センサーと測長器の出力を8のコンピユータ
ーに入力するためのインターフエースである。8
はコンピユーターで、その出力は9のインターフ
エースを通して押上げ機構6に出力される。なお
10は引上速度制御器、12は成長界面、13は
液体カプセル、14は融液、15はるつぼであ
る。この方法による結晶径検出の原理およびるつ
ぼの上昇制御について説明する。育成中の結晶断
面はほぼ円形となる。そこで結晶を径の異なる同
じ厚さを持つ円板ほ集合体であると見なす。円板
の厚さを出来るだけ微小にとればとるほど実物の
結晶に近い近似ができる。ここでは結晶が引上げ
方向に対して成長した微小長ΔLを円板の厚さと
する。ΔLは微小長であれのでゆつくりと変化す
る。その他の要因は無視できて重量センサーによ
る重量変化ΔWはすべて結晶の重量変化と見なす
ことができる。そこで結晶径(すなわち円板の
径)をD、結晶密度をρsとすれば重量変化ΔWは ΔW=ρs・π・(D/2)2・ΔL (1) 第2図は結晶育成中の液面の降下とるつぼの押
上げについて説明する図である。(前述の円板は
径D、厚さΔLの斜線部で示している。)16は種
結晶、17は結晶、18は結晶がΔL成長する前
の液面位置、19は液面18の時の成長界面の位
置がΔlだけ上に移つたことを示す。20は現在
の液面の位置、21は融液、22は円筒平底のる
つぼを示す。18は任意の時刻の液面の位置で、
引上げ機構によりΔlだけ引上げ、その間にるつ
ぼをΔxだけ押上げ、結晶がΔLだけ成長したこと
を示している。Δl、ΔL、Δxの関係は次式で表わ
せる。 ΔL=Δl/1−ρS/ρC(D/DC2−Δx (2) (ρs、ρLは結晶、融液の密度、Dは結晶径、Dc
るつぼの内径) 従つて(1)、(2)式より結晶径Dは次式で求まる。 D=D0{−(1−α+β)+〓(1−α+β)
2+4αβ/2αβ}1/2(3) ただし
The present invention relates to a method for accurately detecting crystal diameter in single crystal growth in which a crucible is pushed up. Conventionally, an optical method has been used to detect the diameter of a crystal being grown by a pulling method. It is a method that detects the reflection of laser beam irradiation near the crystal during growth, the radiation position of a high-temperature heat generating part (fusion ring) generated on the liquid surface around the crystal, or the transmission image of X-rays or the radiation emitted from the crystal. This method uses a TV to monitor the infrared image generated by the crystal, and extracts an electrical signal proportional to the crystal diameter from the video signal. However, the drawback of such an optical method is that it is susceptible to eccentricity of crystal rotation, fluctuation of reflected light, fogging of a viewing window, etc. Furthermore, in the case of X-rays, there are fatal drawbacks such as the complexity of the equipment and the danger that X-rays may pose to the human body. Furthermore, this optical detection method cannot be used depending on the crystal material. For example, conditions specific to compound semiconductors, such as the intense thermal convection of the high-pressure gas in the pressure chamber and the need to observe through a liquid encapsulant layer covering the melt, make optical detection methods impossible. be. On the other hand, a method of detecting the crystal diameter by detecting the crystal weight and precisely measuring the crystal length has been attempted. This method overcomes the drawbacks of optical crystal extraction methods. However, this method can only be applied in cases where it is sufficient to take into account the natural drop in the liquid level due to a decrease in the melt. Generally, keeping the growth interface (liquid level) in a fixed position stabilizes temperature conditions and is advantageous for growth. Therefore, crucible elevation control may be performed to maintain the interface in a fixed position. Therefore, the above-mentioned method has applicability limitations, and there is a need for further development. The present invention adopts the weight detection method and precision length measurement method, takes into account the drop in the liquid level due to melt reduction and the crucible elevation control to compensate for the drop in liquid level, and accurately adjusts the crystal diameter in real time during growth. The purpose is to be measurable. In particular, the earlier application for the present invention (patent application filed in 1983)
-58646 (Special Publication No. 59-358765) is characterized by solving the problem of correcting the rise of the crucible to compensate for the drop in liquid level. Embodiment 1 FIG. 1 shows a first embodiment of the present method, and shows a block diagram of the apparatus. Reference numeral 1 denotes a weight sensor connected to the pulling shaft 3 to detect the weight of the crystal 11. If it is connected to the crucible push-up shaft 5, the crystal weight will be detected from the amount of decrease in the melt 14. 2 is a precision length measuring device that measures the pulled length of the crystal in conjunction with the pulling axis. 4 is also a precision length measuring device, which measures the lifting distance of the crucible in conjunction with the crucible push-up shaft 5. 6 is a crucible push-up control mechanism, which is controlled by a computer 8. 7 is an interface for inputting the outputs of the weight sensors 1, 2, and 4 and the length measuring device to the computer 8. 8
is a computer, the output of which is sent to the push-up mechanism 6 through an interface 9. Note that 10 is a pulling speed controller, 12 is a growth interface, 13 is a liquid capsule, 14 is a melt, and 15 is a crucible. The principle of crystal diameter detection using this method and crucible elevation control will be explained. The cross section of the crystal during growth becomes approximately circular. Therefore, we consider a crystal to be an aggregate of disks with different diameters and the same thickness. The smaller the thickness of the disk, the closer the approximation to the actual crystal will be. Here, the minute length ΔL of the crystal grown in the pulling direction is defined as the thickness of the disk. Since ΔL is a minute length, it changes slowly. Other factors can be ignored, and the weight change ΔW measured by the weight sensor can be regarded as the weight change of the crystal. Therefore, if the crystal diameter (that is, the diameter of the disk) is D and the crystal density is ρ s , then the weight change ΔW is ΔW = ρ s・π・(D/2) 2・ΔL (1) Figure 2 shows the crystal growing. FIG. 2 is a diagram illustrating the lowering of the liquid level and the pushing up of the crucible. (The above-mentioned disk is shown as a hatched area with diameter D and thickness ΔL.) 16 is a seed crystal, 17 is a crystal, 18 is the liquid level position before the crystal grows ΔL, and 19 is when the liquid level is 18. This indicates that the position of the growth interface has shifted upward by Δl. Reference numeral 20 indicates the current liquid level position, 21 indicates the melt, and 22 indicates a cylindrical flat-bottomed crucible. 18 is the position of the liquid level at an arbitrary time,
The figure shows that the crystal was pulled up by Δl by the pulling mechanism, and the crucible was pushed up by Δx during that time, and the crystal grew by ΔL. The relationship between Δl, ΔL, and Δx can be expressed by the following formula. ΔL=Δl/1−ρ SC (D/D C ) 2 −Δx (2) (ρ s , ρ L are the densities of the crystal and melt, D is the crystal diameter, and D c is the inner diameter of the crucible) Therefore, the crystal diameter D can be found from equations (1) and (2) using the following equation. D=D 0 {-(1-α+β)+〓(1-α+β)
2 +4αβ/2αβ} 1/2 (3) However

【式】 α=Δx/Δl、β=ρs/ρL(D0/Dc2 (αの範囲は0≦d≦β/1−βである) すなわち、ΔW、Δl,Δxを精密に測定するこ
とにより結晶径Dが求まる。ΔW、Δl、Δxはそ
れぞれ第1図の各測定器1,2,4によつて検出
される。 また(2)式よりΔL=Δlとなる条件は次式で表わ
される。 α=β/1−β (4) この関係を保ち、るつぼを上昇すればD=D0
すなわち液面は定位置に制御される。以上原理に
ついて述べたので次に第1図に示す装置で実際上
の操作を説明する。 結晶の引上長Δlは0.2≦Δl≦0.5(mm)とした。
(第3図参照)精密側長器の精密は±1μであるの
で十分正確な測定が行える。一方、重量センサー
にはノイズが乗り易いのでフイルター等でノイズ
の処理を行う。ここでは次の操作を育成中繰返し
て行い、結晶径を連続して求めることができる。
まず、Δl引上げる間に結晶重量Wiをn回測定し、
Wi=(ΣWi)/nとして、前のΔlとして、前のΔl
引上げる間に測定した−1との差をΔW=
−−1とする。さらにΔl引上げる間のるつぼ
押上距離Δxを検出し、Δl、ΔW、Δxの値より(3)
式により結晶径を求める。これらの計算はすべて
コンピユーター8によつて行われる。次に(4)式に
より次のるつぼ押上げ距離Δxを求め、るつぼ押
上げ制押器6の入力として出力する。最初の動作
にもどる以上の操作により実時間での結晶径精密
測定を行うことおよび液面の定位置制置をして安
定した条件下での結晶育成を化合物半導体のInP
結晶について行うことができた。 実施例 2 第1実施例の第1図で精密測長器2,4を用い
るかわりに、時計と軸移動速度測定器(例えばタ
コジエネレータ)を用いる。時計で時刻t1、t2(t2
〓t1)を測定しΔt=t2−t1とし、結晶引上げ速度
vl、るつぼ押上げ速度vxとすれば前述の(2)式にお
けるΔl、Δxは次式で求まる。 Δl=vlΔt、Δx=vxΔt (5) 以下、動作原理は第1実施例と同一であるので
省略する。 以上説明したように本発明では次の利点があ
る。 (a) 育成中の結晶計を実時間で数値的に精密測定
が行える。 (b) るつぼ押上げを行う場合、るつぼ押上げ速度
が変化しても結晶径を精密に求めることができ
る。 (c) 結晶径が変化して融液の降下度が変化する場
合でもるつぼ押上げ速度を調整してほとんど定
位置に液面を保つことが可能なので安定した温
度条件で結晶育成ができる。 (d) 結晶径を検出できるので結晶径設定地を定
め、その偏差を育成条件にフイードバツクする
ことにより結晶自動育成が可能である。
[Formula] α=Δx/Δl, β=ρ sL (D 0 /D c ) 2 (The range of α is 0≦d≦β/1−β) In other words, ΔW, Δl, and Δx are precisely The crystal diameter D can be found by measuring. ΔW, Δl, and Δx are detected by the measuring instruments 1, 2, and 4 shown in FIG. 1, respectively. Also, from equation (2), the condition for ΔL=Δl is expressed by the following equation. α=β/1−β (4) If this relationship is maintained and the crucible is raised, D=D 0
That is, the liquid level is controlled to a fixed position. Having described the principle above, the actual operation of the apparatus shown in FIG. 1 will now be explained. The pulling length Δl of the crystal was set to 0.2≦Δl≦0.5 (mm).
(See Figure 3) The accuracy of the precision profilometer is ±1μ, allowing for sufficiently accurate measurements. On the other hand, the weight sensor is susceptible to noise, so the noise is processed using a filter or the like. Here, the following operation is repeated during the growth, and the crystal diameter can be continuously determined.
First, while pulling Δl, the crystal weight Wi was measured n times,
As Wi=(ΣWi)/n, as the previous Δl, as the previous Δl
The difference from -1 measured during pulling is ΔW=
--1. Furthermore, detect the crucible push-up distance Δx while raising Δl, and from the values of Δl, ΔW, and Δx (3)
Determine the crystal diameter using the formula. All these calculations are performed by the computer 8. Next, the next crucible push-up distance Δx is determined by equation (4) and outputted as an input to the crucible push-up presser 6. Returning to the initial operation By performing the above operations, we can accurately measure the crystal diameter in real time and control the liquid level in a fixed position to grow crystals under stable conditions.
I was able to do this for crystals. Embodiment 2 Instead of using the precision length measuring devices 2 and 4 in FIG. 1 of the first embodiment, a clock and a shaft movement speed measuring device (for example, a tachometer generator) are used. Time t 1 , t 2 (t 2
〓t 1 ) is measured and set as Δt = t 2 − t 1 , and the crystal pulling rate is
If v l and crucible push-up speed v x are given, Δl and Δx in the above equation (2) can be found by the following equation. Δl=v l Δt, Δx=v x Δt (5) Since the operating principle is the same as that of the first embodiment, the explanation will be omitted below. As explained above, the present invention has the following advantages. (a) Accurate numerical measurements of growing crystallometers can be performed in real time. (b) When pushing up the crucible, the crystal diameter can be determined accurately even if the crucible pushing speed changes. (c) Even if the crystal diameter changes and the degree of descent of the melt changes, it is possible to maintain the liquid level at almost the same position by adjusting the crucible push-up speed, allowing crystal growth under stable temperature conditions. (d) Since the crystal diameter can be detected, automatic crystal growth is possible by determining the crystal diameter setting location and feeding back the deviation to the growth conditions.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明の装置のブロツクダイアグラ
ム、第2図は本方法の動作原理を説明する図で第
3図は結晶の引上長と結晶径の誤差の関係を示し
た図である。 1……重量センサー、2,4……精密測長器、
3……結晶引上げ軸、5……るつぼ押上げ軸、6
……るつぼ押上制御機構、7,9……インターフ
エース、8……コンピユーター、10……引上げ
速度制御器、11……結晶、12……成長界面、
13……液体カプセル、14……融液、15……
るつぼ、16……種結晶、17……結晶、18…
…結晶がΔL成長する前の液面位置、19……液
面18の時の成長界面の位置、20……現在の液
面の位置、21……融液、22……円筒平底のる
つぼ。
FIG. 1 is a block diagram of the apparatus of the present invention, FIG. 2 is a diagram explaining the operating principle of the method, and FIG. 3 is a diagram showing the relationship between crystal pulling length and crystal diameter error. 1... Weight sensor, 2, 4... Precision length measuring device,
3... Crystal pulling axis, 5... Crucible pushing axis, 6
... Crucible push-up control mechanism, 7, 9 ... Interface, 8 ... Computer, 10 ... Pulling speed controller, 11 ... Crystal, 12 ... Growth interface,
13...liquid capsule, 14...melt liquid, 15...
Crucible, 16...Seed crystal, 17...Crystal, 18...
...Position of the liquid level before the crystal grows by ΔL, 19...Position of the growth interface when the liquid level is 18, 20...Position of the current liquid level, 21...Melt, 22...Cylindrical flat-bottomed crucible.

Claims (1)

【特許請求の範囲】 1 引上げ法による単結晶育成において、第1の
精密測長器を用いて結晶引き上げ長を測定し、単
位結晶引き上げ長Δlを0.2mm以上0.5mm以下とし、
単位結晶引き上げ長毎に第2の精密測長器による
るつぼの押上長Δxの測定と結晶重量の増加分
ΔWの検出を行い、結晶径Dを次式 D= D0{−(1−α+β)+√(1−α+β)2+4αβ/
2αβ}1/2 【式】 α=Δx/Δl、β=ρs/ρL(D0/Dc2 (但し、るつぼの内径Dcとし、ρs、ρLはそれぞれ
結晶、融液の密度とする) によりもとめることを特徴とする単結晶精密結晶
径検出方法。
[Claims] 1. In single crystal growth by the pulling method, the crystal pulling length is measured using a first precision length measuring device, and the unit crystal pulling length Δl is set to 0.2 mm or more and 0.5 mm or less,
For each unit crystal pulling length, measure the push-up length Δx of the crucible using a second precision length measuring device and detect the increase in crystal weight ΔW, and calculate the crystal diameter D using the following formula D = D 0 {-(1-α+β) +√(1-α+β) 2 +4αβ/
2αβ} 1/2 [Formula] α=Δx/Δl, β=ρ sL (D 0 /D c ) 2 (However, the inner diameter of the crucible is D c , and ρ s and ρ L are the crystal and melt, respectively. A single crystal precision crystal diameter detection method characterized by:
JP9080281A 1981-06-15 1981-06-15 Detecting method for diameter of single crystal and minute crystal Granted JPS57206809A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9080281A JPS57206809A (en) 1981-06-15 1981-06-15 Detecting method for diameter of single crystal and minute crystal

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9080281A JPS57206809A (en) 1981-06-15 1981-06-15 Detecting method for diameter of single crystal and minute crystal

Publications (2)

Publication Number Publication Date
JPS57206809A JPS57206809A (en) 1982-12-18
JPH034516B2 true JPH034516B2 (en) 1991-01-23

Family

ID=14008714

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9080281A Granted JPS57206809A (en) 1981-06-15 1981-06-15 Detecting method for diameter of single crystal and minute crystal

Country Status (1)

Country Link
JP (1) JPS57206809A (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4785762B2 (en) * 2007-01-30 2011-10-05 コバレントマテリアル株式会社 Single crystal manufacturing method

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5221471A (en) * 1975-08-11 1977-02-18 Toshiaki Inui Blind fabric by warp knitting and method of producing same
JPS52104474A (en) * 1976-02-28 1977-09-01 Fujitsu Ltd Control method for crystal growth

Also Published As

Publication number Publication date
JPS57206809A (en) 1982-12-18

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