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JPH0347550B2 - - Google Patents
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JPH0347550B2 - - Google Patents

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Publication number
JPH0347550B2
JPH0347550B2 JP58163175A JP16317583A JPH0347550B2 JP H0347550 B2 JPH0347550 B2 JP H0347550B2 JP 58163175 A JP58163175 A JP 58163175A JP 16317583 A JP16317583 A JP 16317583A JP H0347550 B2 JPH0347550 B2 JP H0347550B2
Authority
JP
Japan
Prior art keywords
pattern
recognition
substrate
mark
light
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP58163175A
Other languages
Japanese (ja)
Other versions
JPS6055480A (en
Inventor
Masao Ikehata
Yasuo Iguchi
Yoshiro Takahashi
Isao Shibata
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Oki Electric Industry Co Ltd
Original Assignee
Oki Electric Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Oki Electric Industry Co Ltd filed Critical Oki Electric Industry Co Ltd
Priority to JP58163175A priority Critical patent/JPS6055480A/en
Publication of JPS6055480A publication Critical patent/JPS6055480A/en
Publication of JPH0347550B2 publication Critical patent/JPH0347550B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Die Bonding (AREA)
  • Image Analysis (AREA)
  • Image Input (AREA)
  • Image Processing (AREA)
  • Wire Bonding (AREA)

Description

【発明の詳細な説明】 (技術分野) 本発明は高精度なパターン位置認識の方法に関
するものである。
DETAILED DESCRIPTION OF THE INVENTION (Technical Field) The present invention relates to a highly accurate pattern position recognition method.

(従来技術) 従来のパターン認識方法を第1図によつて説明
する。第1図において1は可動ステージ、2は基
板、3はパターン、4はパターン認識用テレビカ
メラ、5は支柱、6は落射照明装置を示してい
る。基板2の表面に形成されたパターン3は、落
射照明装置6によつて、基板2の表面側から照明
され、パターン認識用テレビカメラで撮影され電
気信号に変換され認識装置(図示せず)へ送られ
る。
(Prior Art) A conventional pattern recognition method will be explained with reference to FIG. In FIG. 1, 1 is a movable stage, 2 is a substrate, 3 is a pattern, 4 is a television camera for pattern recognition, 5 is a column, and 6 is an epi-illumination device. The pattern 3 formed on the surface of the substrate 2 is illuminated from the surface side of the substrate 2 by an epi-illumination device 6, photographed by a television camera for pattern recognition, converted into an electrical signal, and sent to a recognition device (not shown). Sent.

しかし、アルミナ基板上に形成された金厚膜な
どの導体パターンは、照明を反射して光り、認識
用テレビカメラを用いてパターン位置認識を行な
う際に、アルミナ基板と導体パターンとを識別す
ることが困難であつた。
However, a conductor pattern such as a thick gold film formed on an alumina substrate reflects light and shines, making it difficult to distinguish between the alumina substrate and the conductor pattern when recognizing the pattern position using a recognition television camera. was difficult.

他の方法として、基板との識別が容易なインク
等で基板表面にパターン位置認識用のマークを形
成する方法も考えられるが、この方法では、パタ
ーン形成と認識マーク形成が個別の工程で行なわ
れるので、認識用マークとパターンとの位置関係
が正確に得られない欠点があつた。
Another method is to form marks for pattern position recognition on the surface of the substrate using ink or the like that can be easily distinguished from the substrate, but in this method, pattern formation and recognition mark formation are performed in separate steps. Therefore, there was a drawback that the positional relationship between the recognition mark and the pattern could not be accurately obtained.

(発明の目的及び構成) 本発明の目的は識別性の良いパターン位置認識
方法を提供するにあり、その特徴は、透過光を用
いて直接導体パターンの位置を認識し、位置を認
識した導体パターンを用いてパターンとの位置を
正しく保つた位置に認識用マークを形成し、それ
以降のパターン認識を必要とする工程においては
導体パターンの位置認識を認識用マークを位置基
準として用いて行うものであり以下詳細に説明す
る。
(Objective and Structure of the Invention) An object of the present invention is to provide a method for recognizing the position of a conductor pattern with good discrimination. A recognition mark is formed at a position that maintains the correct position with the pattern, and in subsequent processes that require pattern recognition, the position of the conductor pattern is recognized using the recognition mark as a position reference. Yes, this will be explained in detail below.

(実施例) 第2図は、本発明の一実施例であつて、11は
可動ステージ、14はパターン認識用テレビカメ
ラ、15は支柱、16aは落射照明装置、16b
は透過照明装置、17は透明ステージ板、21は
アルミナ基板、22は導体パターンである。これ
を動作するには、基板21を透明ステージ板17
の上へ乗せ、透過照明装置で基板裏面から光を当
て、基板21の表面側に支柱15で支えてあるパ
ターン認識用テレビカメラで撮影する。厚膜印刷
に用いられるアルミナ基板は、光を透過するが、
導体パターンは光を透過しないので黒く見え容易
にパターンを識別することができる。なお上記基
板としては、アルミナ基板に限定されるものでは
なく、光透過性を有するものであればその他の材
質のものを用いても良い。
(Embodiment) FIG. 2 shows an embodiment of the present invention, in which 11 is a movable stage, 14 is a television camera for pattern recognition, 15 is a column, 16a is an epi-illumination device, 16b
17 is a transparent stage plate, 21 is an alumina substrate, and 22 is a conductor pattern. To operate this, the substrate 21 must be placed on the transparent stage plate 17.
The substrate 21 is placed on top of the substrate 21, and a transmission illumination device is used to shine light from the back side of the substrate, and a pattern recognition television camera supported by a support 15 on the front side of the substrate 21 is used to photograph the substrate. Alumina substrates used for thick film printing transmit light, but
Since the conductor pattern does not transmit light, it appears black and can be easily identified. Note that the substrate is not limited to an alumina substrate, and other materials may be used as long as they have light transmittance.

また、第3図に示すように、基板21の表面に
は導体パターン22と容易に識別できる低反射率
であるペースト等で目的とする認識マークよりも
大きなマーク23aを形成しておく。ついで第4
図に示すように基板裏面より光を当て、パターン
22を黒色の影として導体パターンの22の位置
認識を行なう。この認識結果を用い第3図に示す
マーク23aそのものをレーザーで整形し目的と
する認識用マーク23bを形成する。このように
して導体パターン22及び認識マーク23bが形
成された基板21上にデイスプレイ素子又はIC
チツプ等を搭載する場合、あるいは上記素子又は
チツプと導体パターンとのワイヤボンドを行う場
合等における導体パターン位置認識は、第1図に
示すような落射照明光のみを用いるパターン位置
認識装置を用いて行うことができる。第5図には
落射照明のみを用いて実際にパターン認識を行な
つている様子を示した。パターン22が光を反射
して、基板21と識別することが困難な場合に
も、レーザーで整形し、パターンとの位置関係を
正しく保つたパターン認識用マークを用いて容易
かつ正確にパターン位置を認識することが可能と
なり、上記素子、チツプ等の搭載、あるいはワイ
ヤボンドを行う際の位置合せを正確に行うことが
できる。なお、レーザーでマーク23aそのもの
を整形してパターン認識用マークを形成する時
に、基板裏面からの光でパターンを認識する必要
があるが、一直線で並んでいない少なくとも3箇
所のパターンを基板裏面からの光を利用してパタ
ーン認識を行なうことにより縦、横方向および回
転方向のズレを少なくすることができる。
Further, as shown in FIG. 3, a mark 23a larger than the intended recognition mark is formed on the surface of the substrate 21 using a paste or the like having a low reflectance and easily distinguishable from the conductive pattern 22. Then the fourth
As shown in the figure, light is applied from the back side of the substrate, and the position of the conductor pattern 22 is recognized by using the pattern 22 as a black shadow. Using this recognition result, the mark 23a shown in FIG. 3 itself is shaped with a laser to form the intended recognition mark 23b. A display element or an IC is placed on the substrate 21 on which the conductor pattern 22 and the recognition mark 23b are formed in this way.
Conductor pattern position recognition when mounting a chip or the like or when performing wire bonding between the above element or chip and a conductor pattern is performed using a pattern position recognition device that uses only epi-illumination light as shown in Figure 1. It can be carried out. FIG. 5 shows how pattern recognition is actually performed using only epi-illumination. Even if the pattern 22 reflects light and is difficult to distinguish from the substrate 21, the pattern position can be easily and accurately determined using a pattern recognition mark that is shaped with a laser and maintains the correct positional relationship with the pattern. This makes it possible to accurately align the elements, chips, etc. when mounting them or performing wire bonding. Note that when shaping the mark 23a itself with a laser to form a pattern recognition mark, it is necessary to recognize the pattern using light from the back side of the board. By performing pattern recognition using light, deviations in the vertical, horizontal, and rotational directions can be reduced.

(発明の効果) 本発明はパターンとの位置関係を正確に出した
認識マークを用いてパターン認識を行なうので厚
膜多層印刷やパターンとの位置関係を正確にする
必要のあるデイスプレイ素子の搭載やワイヤーボ
ンド、レーザートリミングなどの位置合わせに応
用できる。
(Effects of the Invention) The present invention performs pattern recognition using a recognition mark that accurately shows the positional relationship with the pattern, so it can be used for thick film multilayer printing or mounting a display element that requires accurate positional relationship with the pattern. Can be applied to alignment of wire bonding, laser trimming, etc.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は従来のパターン認識方法、第2図は本
発明の第1の実施例、第3図及び第4図、第5図
は本発明の第2の実施例を示した図である。 11……可動ステージ、21……基板、22…
…パターン、14……パターン認識用テレビカメ
ラ、15……支柱、16a……落射照明装置、1
6b……透過照明装置、17……透明ステージ
板、23a……容易に識別できるインクで形成し
た認識用マーク(整形前)、23b……23aを
レーザー等で整形した認識マーク。
FIG. 1 shows a conventional pattern recognition method, FIG. 2 shows a first embodiment of the present invention, and FIGS. 3, 4, and 5 show a second embodiment of the present invention. 11...Movable stage, 21...Substrate, 22...
...Pattern, 14...Television camera for pattern recognition, 15...Strut, 16a...Epi-illumination device, 1
6b...transmission illumination device, 17...transparent stage plate, 23a...recognition mark formed with easily recognizable ink (before shaping), 23b...recognition mark shaped by laser or the like on 23a.

Claims (1)

【特許請求の範囲】[Claims] 1 金厚膜などの反射率の高い材質から成る導体
パターンと反射率の低い材質から成るマークとが
その表面に形成された光透過性基板に対しその裏
面側から当該基板に光を照射し且つその表面側か
ら前記導体パターンの読み取りを行ない、その導
体パターン位置の認識結果に従つて前記マークそ
のものを整形することにより前記導体パターンと
の位置関係を正確に保つた認識マークの形成を行
い、以後のパターン位置認識を必要とする工程に
おいては前記基板表面側からの光照射及び前記基
板表面側からのパターン読み取りにより、前記導
体パターンの位置認識を前記認識マークを位置基
準として用いて行うことを特徴とするパターン位
置認識方法。
1. For a light-transmissive substrate on which a conductive pattern made of a material with high reflectance such as a thick gold film and a mark made of a material with low reflectance are formed, light is irradiated from the back side of the substrate, and The conductor pattern is read from the front side, and the mark itself is shaped according to the recognition result of the conductor pattern position, thereby forming a recognition mark that maintains an accurate positional relationship with the conductor pattern. In the process requiring pattern position recognition, the position of the conductive pattern is recognized by irradiating light from the front surface of the substrate and reading the pattern from the front surface of the substrate, using the recognition mark as a position reference. A pattern position recognition method.
JP58163175A 1983-09-07 1983-09-07 Pattern position recognizing method Granted JPS6055480A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58163175A JPS6055480A (en) 1983-09-07 1983-09-07 Pattern position recognizing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58163175A JPS6055480A (en) 1983-09-07 1983-09-07 Pattern position recognizing method

Publications (2)

Publication Number Publication Date
JPS6055480A JPS6055480A (en) 1985-03-30
JPH0347550B2 true JPH0347550B2 (en) 1991-07-19

Family

ID=15768666

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58163175A Granted JPS6055480A (en) 1983-09-07 1983-09-07 Pattern position recognizing method

Country Status (1)

Country Link
JP (1) JPS6055480A (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2852380B2 (en) * 1988-03-26 1999-02-03 株式会社半導体エネルギー研究所 Method for forming carbon or carbon-based coating
JPH01276730A (en) * 1988-04-28 1989-11-07 Matsushita Electric Ind Co Ltd Substrate recognition and device therefor
US5094878A (en) * 1989-06-21 1992-03-10 Nippon Soken, Inc. Process for forming diamond film

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56155802A (en) * 1980-05-06 1981-12-02 Fujitsu Ltd Recognition device

Also Published As

Publication number Publication date
JPS6055480A (en) 1985-03-30

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