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JPH0348097B2 - - Google Patents
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JPH0348097B2 - - Google Patents

Info

Publication number
JPH0348097B2
JPH0348097B2 JP12218285A JP12218285A JPH0348097B2 JP H0348097 B2 JPH0348097 B2 JP H0348097B2 JP 12218285 A JP12218285 A JP 12218285A JP 12218285 A JP12218285 A JP 12218285A JP H0348097 B2 JPH0348097 B2 JP H0348097B2
Authority
JP
Japan
Prior art keywords
lid
cassette
mask
lower lid
fork
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP12218285A
Other languages
Japanese (ja)
Other versions
JPS61282229A (en
Inventor
Shinji Tsutsui
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP60122182A priority Critical patent/JPS61282229A/en
Priority to US06/750,282 priority patent/US4611967A/en
Publication of JPS61282229A publication Critical patent/JPS61282229A/en
Publication of JPH0348097B2 publication Critical patent/JPH0348097B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/66Containers specially adapted for masks, mask blanks or pellicles; Preparation thereof
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691Handling of masks or workpieces
    • G03F7/70733Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
    • G03F7/70741Handling masks outside exposure position, e.g. reticle libraries

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Library & Information Science (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Packaging Frangible Articles (AREA)
  • Warehouses Or Storage Devices (AREA)
  • Sheets, Magazines, And Separation Thereof (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、防塵カセツトに関し、特に半導体製
造装置に都合良く使用されるフオトマスク又はレ
チクルの防塵カセツトに関する。
DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a dust-proof cassette, and particularly to a dust-proof cassette for a photomask or reticle conveniently used in semiconductor manufacturing equipment.

〔従来の技術〕[Conventional technology]

IC、LSI、超LSI等の半導体装置の製造工程に
おいて、解決しなければならない事項の一つとし
て、マスクまたはレチクル(以下、マスクと総称
する)への塵埃付着の問題がある。マスクに形成
された超微細な回路パターンを半導体ウエハに転
写する時、マスクに塵埃が付着していると、ウエ
ハに転写された回路パターンの損害につながり、
後工程を経て製品化された半導体装置の性能を低
下させるばかりでなく、最悪の場合、半導体装置
の機能全体を損わせてしまう。
In the manufacturing process of semiconductor devices such as ICs, LSIs, and VLSIs, one of the issues that must be solved is the problem of dust adhesion to masks or reticles (hereinafter collectively referred to as masks). When an ultra-fine circuit pattern formed on a mask is transferred to a semiconductor wafer, if dust adheres to the mask, it may cause damage to the circuit pattern transferred to the wafer.
This not only deteriorates the performance of the semiconductor device manufactured through post-processing, but also, in the worst case, impairs the entire function of the semiconductor device.

しかしながら、従来の半導体製造装置において
は、作業員がマスクをマスクホルダに直接装填し
なければならないため、人体からの塵埃がマスク
に付着する可能性が大きいものであつた。
However, in conventional semiconductor manufacturing equipment, since a worker must directly load a mask into a mask holder, there is a high possibility that dust from the human body will adhere to the mask.

このような問題点を解決するために、半導体製
造装置において、上蓋と下蓋でマスクを収納する
カセツトを構成し、先ず上蓋と下蓋を分離した後
に、マスクを該下蓋から取り出してマスクホルダ
ーに自動的に装填する装置が、例えば特開昭60−
5521号公報等で提案されている。
In order to solve these problems, in semiconductor manufacturing equipment, a cassette for storing a mask is constructed with an upper lid and a lower lid, and after the upper lid and lower lid are separated, the mask is taken out from the lower lid and placed in a mask holder. For example, a device for automatically loading
This is proposed in Publication No. 5521, etc.

[発明が解決しようとしている課題] ところで、この公報に示されたマスクカセツト
では、キヤリアにセツトされているカセツトの下
蓋を上蓋に対して引き抜くためのフオークに、フ
オークの下蓋支持面より上方に突出する係合片を
設けることが必要となる。また、このカセツトで
は、フオークで下蓋を抜き出すために、係合片が
下蓋の端部と接触した際に塵埃が発生すると、フ
オークの係合片はその下蓋支持面より上方に突出
しているので、その塵埃が下蓋内のマスクに付着
する可能性が高かつた。
[Problems to be Solved by the Invention] Incidentally, in the mask cassette disclosed in this publication, the fork for pulling out the lower cover of the cassette set in the carrier from the upper cover is provided with a fork located above the lower cover supporting surface of the fork. It is necessary to provide an engaging piece that protrudes from the side. In addition, in this cassette, when the engaging piece comes into contact with the edge of the lower cover in order to pull out the lower cover with a fork, dust is generated, and the engaging piece of the fork protrudes upward from the lower cover supporting surface. There was a high possibility that the dust would adhere to the mask inside the lower lid.

本発明は、このような事情に鑑みなされたもの
で、その目的は、マスクまたはレチクル等の基板
を収納すると共に、該基板の取出を自動的に且つ
塵埃が基板に付着することなく行なうことを可能
とする防塵カセツトを提供することにある。
The present invention was made in view of the above circumstances, and its purpose is to store a substrate such as a mask or reticle, and to take out the substrate automatically and without dust adhering to the substrate. The objective is to provide a dustproof cassette that makes it possible to

[課題を解決するための手段及び作用] 本発明は、上述したような目的を達成するため
に、マスクまたはレチクル等の基板を載置するた
めの下蓋と、下蓋を所定の引出し方向に引出せる
ように下蓋と重ね合される上蓋を有し、下蓋と上
蓋を重ね合せることにより基板を収納する密閉室
を形成すると共に、下蓋は引出し方向に沿つた側
壁の外側に突出片を備え、カセツトキヤリアに保
持されている際に突出片の下側に進入するフオー
クで突出片の下面が支持されることにより、カセ
ツトキヤリア内に上蓋を残したまま下蓋がカセツ
トキヤリア外に引出されるようになした防塵カセ
ツトにおいて、引出し方向に関してフオークの係
止部と係合する凸状の係合片を下蓋の突出片の下
方に設けている。
[Means and effects for solving the problem] In order to achieve the above-mentioned objects, the present invention provides a lower lid for placing a substrate such as a mask or a reticle, and a lower lid that is oriented in a predetermined drawing direction. It has an upper lid that is overlapped with the lower lid so that it can be pulled out, and by overlapping the lower lid and the upper lid, a sealed chamber for storing the substrate is formed, and the lower lid has a protruding piece on the outside of the side wall along the direction of the drawer. The lower surface of the protruding piece is supported by the fork that enters the underside of the protruding piece when it is held in the cassette carrier, so that the lower cover can be pulled out of the cassette carrier while leaving the upper cover inside the cassette carrier. In this dustproof cassette, a convex engagement piece that engages with a locking portion of the fork in the drawing direction is provided below the protruding piece of the lower lid.

本発明によれば、フオークの下蓋支持面より上
方に突出する部分をフオークに設ける必要がな
く、またフオークと下蓋の接触は常に下蓋の突出
片の下側のみで行なわれることになるので、フオ
ークと下蓋の接触により塵埃が発生しても、マス
クまたはレチクル等の基板に塵埃が付着すること
がない。
According to the present invention, there is no need to provide the fork with a portion that projects upward from the lower cover support surface of the fork, and the contact between the fork and the lower cover is always made only on the lower side of the protruding piece of the lower cover. Therefore, even if dust is generated due to contact between the fork and the lower cover, the dust will not adhere to a substrate such as a mask or reticle.

〔実施例〕〔Example〕

以下添付した図面を参照して本発明の好ましい
実施例について説明する。第1図は本発明の防塵
カセツトの上蓋構造を示した図である。上蓋1の
前壁2の中央部2aは両端部2bに比べて突き出
ており、一方引込んだ両端部2bにはそれぞれ可
撓性の逆L字形の係止部材3が一体的に取り付け
られている。この逆L字形の係止部材3の穴部3
bは、後述する下蓋10の前壁11の両端部11
bの対応する位置に形成された係止用突起12と
はまり合う。この係止用突起12と係止部材3に
より上蓋1と下蓋10は十分に密閉される。
Preferred embodiments of the present invention will be described below with reference to the accompanying drawings. FIG. 1 is a diagram showing the upper lid structure of the dustproof cassette of the present invention. The central part 2a of the front wall 2 of the top lid 1 protrudes compared to both ends 2b, and a flexible inverted L-shaped locking member 3 is integrally attached to each of the retracted ends 2b. There is. Hole 3 of this inverted L-shaped locking member 3
b indicates both ends 11 of the front wall 11 of the lower lid 10, which will be described later.
It fits into the locking protrusion 12 formed at the corresponding position of b. The upper lid 1 and the lower lid 10 are sufficiently sealed by the locking protrusion 12 and the locking member 3.

なお上蓋1の前壁2の中央部2aの面は係止部
材3の前面3aより突出しており万一防塵カセツ
トが落下しても係止部材が損傷しにくいようにな
つている。
The surface of the central portion 2a of the front wall 2 of the upper lid 1 protrudes from the front surface 3a of the locking member 3, so that even if the dustproof cassette falls, the locking member will not be easily damaged.

次に上蓋1の両側壁4について説明すれば、側
壁4はそれぞれ、前壁2の高さと同一の高さを有
する第1の側壁部4aと、上蓋1と下蓋10を重
ね合わせた状態で下蓋10の底部とほぼ同じ位置
まで延びるような高さを有する第2の側壁部4b
とから構成されている。
Next, to explain the side walls 4 of the upper lid 1, each side wall 4 has a first side wall portion 4a having the same height as the front wall 2, and a state in which the upper lid 1 and the lower lid 10 are overlapped. The second side wall portion 4b has a height that extends to approximately the same position as the bottom of the lower lid 10.
It is composed of.

第2の側壁部4bの内側には斜辺部4cから水
平方向(引き出し搬送方向)へ延びた案内溝5が
形成されている。なお搬送方向は第2図Aの矢印
方向である。
A guide groove 5 is formed inside the second side wall portion 4b and extends from the oblique side portion 4c in the horizontal direction (drawing and conveying direction). Note that the transport direction is the direction of the arrow in FIG. 2A.

ここで案内溝5には下蓋10の案内ピン22が
ゆるく嵌合する。
Here, the guide pin 22 of the lower lid 10 is loosely fitted into the guide groove 5.

なお案内溝5は第1図、第2図Bに示す如く側
壁部4bの厚さ方向に貫通しない構造としても良
いし或いは第2図Cに示す如く側壁部4b′を貫通
する構造としても良い。
The guide groove 5 may have a structure that does not penetrate the side wall 4b in the thickness direction as shown in FIGS. 1 and 2B, or may have a structure that penetrates the side wall 4b' as shown in FIG. 2C. .

これにより第2図B,Cに明らかなように下蓋
10は上蓋1によつて水平面内において搬送方向
に垂直方向の位置が規制される。
As a result, as is clear from FIGS. 2B and 2C, the position of the lower lid 10 in the direction perpendicular to the transport direction within the horizontal plane is restricted by the upper lid 1.

第3図は上蓋1と下蓋10が係止部材3によつ
て係止された状態を示す。
FIG. 3 shows a state in which the upper lid 1 and the lower lid 10 are locked by the locking member 3. As shown in FIG.

さて第1図に戻つて上蓋1の側壁部4bの下端
に設けられる突出片6は第11図に示されるよう
にカセツトを複数段に重ねて収納するためのキヤ
リヤの保持部材44に保持され且つ案内ピン22
が案内溝5の最奥部に位置したときの該位置を支
点として揺動可能となつている。
Now, returning to FIG. 1, the protruding piece 6 provided at the lower end of the side wall portion 4b of the upper lid 1 is held by a holding member 44 of a carrier for storing cassettes in multiple stages, as shown in FIG. Guide pin 22
When the guide groove 5 is located at the innermost part of the guide groove 5, the guide groove 5 can be pivoted about the position as a fulcrum.

これによつて上蓋1は係止部材3,12の係止
が解かれると案内ピン22が案内溝5の最奥部に
位置したときの位置22aを支点として回転され
所定回転角位置に設けられるストツパーによつて
回転が停止し斜設状態となる。
As a result, when the locking members 3 and 12 are released, the upper cover 1 is rotated about the position 22a when the guide pin 22 is located at the innermost part of the guide groove 5 as a fulcrum, and is set at a predetermined rotation angle position. Rotation is stopped by the stopper and the slanted state is established.

さて上蓋1の後壁7の内側下端部には段部8が
形成されており、段部8には上蓋1の両側壁4,
4の間に亘つて延びている。上蓋1と下蓋10と
が重ね合わされた状態で、後述する下蓋の後壁段
部16は下面16aが上蓋1の後壁段部8の上面
8aと接触し、支承される。
Now, a stepped portion 8 is formed at the inner lower end of the rear wall 7 of the upper lid 1, and the stepped portion 8 includes the side walls 4 of the upper lid 1,
It extends between 4. In a state where the upper lid 1 and the lower lid 10 are overlapped, a lower surface 16a of a rear wall stepped portion 16 of the lower lid, which will be described later, is in contact with an upper surface 8a of the rear wall stepped portion 8 of the upper lid 1, and is supported.

第2図Aは本発明の防塵カセツトの下蓋構造を
示した図である。上蓋1の前壁部2と同様に下蓋
10の前壁11の中央部は両端部11bに比べて
突き出ており、一方引込んだ両端部11bにはそ
れぞれ上蓋1の前壁両端部2bに取付けられた逆
L字形の係止部材3と係合する係止用突起12が
形成されている。次に下蓋10の両側部13につ
いて説明すれば、上蓋1と下蓋10を重ね合せた
とき上蓋1の第1の側壁部4aの下面4dを載置
させるための突出片14が側壁13の上端部から
延びている。この突出片14は、上蓋1と下蓋1
0とを重ね合わせたときカセツト内部を密封状態
とするために上蓋1の第1の側壁部4aの長さと
実質的に等しい長さを搬送方向に有するのが好ま
しい。
FIG. 2A is a diagram showing the lower lid structure of the dustproof cassette of the present invention. Similar to the front wall 2 of the upper lid 1, the central part of the front wall 11 of the lower lid 10 protrudes compared to both ends 11b, and the retracted ends 11b are connected to both ends 2b of the front wall of the upper lid 1, respectively. A locking protrusion 12 is formed to engage with the attached inverted L-shaped locking member 3. Next, to explain the both sides 13 of the lower lid 10, when the upper lid 1 and the lower lid 10 are stacked, the protruding pieces 14 on which the lower surface 4d of the first side wall 4a of the upper lid 1 is placed are located on the side wall 13. Extending from the top end. This protruding piece 14 includes the upper cover 1 and the lower cover 1.
In order to seal the inside of the cassette when the cassettes 0 and 0 are overlapped, it is preferable that the cassette has a length substantially equal to the length of the first side wall 4a of the upper lid 1 in the transport direction.

この突出片14の下面は後述する自動搬送の場
合フオーク部によつて載置される。
The lower surface of this protruding piece 14 is placed by a fork section in the case of automatic conveyance, which will be described later.

なお下蓋10の両側壁13,13には、上蓋1
の第2の側壁部4bに形成された案内溝5に収容
される案内ピン22が突出片14に隣接して配置
されている。
Note that the upper lid 1 is attached to both side walls 13, 13 of the lower lid 10.
A guide pin 22 accommodated in a guide groove 5 formed in the second side wall portion 4b is arranged adjacent to the protruding piece 14.

下蓋10の後壁15下端部には上蓋の後壁7の
内側下端部に形成された段部8と対応した形状を
有する段部16が形成されている。
A step 16 is formed at the lower end of the rear wall 15 of the lower lid 10 and has a shape corresponding to the step 8 formed at the inner lower end of the rear wall 7 of the upper lid.

更に下蓋10の内部中央付近にはマスク又はレ
チクルを載置させるための底部17から直立する
環状部18が配置されている。
Further, an annular portion 18 is arranged near the center of the interior of the lower lid 10 and stands upright from the bottom portion 17 on which a mask or reticle is placed.

環状部18と下蓋10の4つの壁11a,1
3,13,15のほぼ中央部とは直交するリブ1
9によつて連結されている。円形のマスク20は
露光装置においてマスクパターン面が下に向けら
れる関係上、通常パターンを形成された面を下に
向けて環状部18に載置されるため、環状部18
の内側のリブ19aは高さを低くし、マスク20
のパターン面と接触しないようにするのが好まし
い。又第2図Aに示すように環状部18の上端面
に突起25を等間隔に配置し、この突起25によ
つてマスク20を支持するようにしても良い。
The annular portion 18 and the four walls 11a, 1 of the lower lid 10
Rib 1 that is perpendicular to the approximately central portions of 3, 13, and 15.
connected by 9. Since the circular mask 20 is normally placed on the annular portion 18 with the patterned surface facing downward in the exposure apparatus, the annular portion 18
The inner rib 19a of the mask 20 has a lower height.
It is preferable to avoid contact with the patterned surface of the substrate. Further, as shown in FIG. 2A, projections 25 may be arranged at equal intervals on the upper end surface of the annular portion 18, and the mask 20 may be supported by the projections 25.

これに加えてマスク20のパターンを形成され
た面には塵埃が付着することを防止するためにペ
リクル膜を取りつけることが多く、この状態でパ
ターン面を下に向けてマスクを環状部18上に載
置する。この場合環状部18の内径はペリクル膜
の外径よりも大きくし、内側のリブ19aはペリ
クル膜の保持部材の厚さを考慮して十分低くする
必要がある。
In addition, a pellicle film is often attached to the patterned surface of the mask 20 to prevent dust from adhering to it. Place it. In this case, the inner diameter of the annular portion 18 must be larger than the outer diameter of the pellicle membrane, and the inner rib 19a must be made sufficiently low in consideration of the thickness of the pellicle membrane holding member.

環状部18の周囲にはリブ19の直交部19b
を中心として同心円状に位置決めピン21が直立
している。この位置決めピン21はマスク20を
環状部18に載置するときマスク20の位置を下
蓋10内のほぼ中央部に定めるのに役立つ。この
ためピン21の高さは、環状部18に置かれたマ
スク20の上面位置と等しいか或いは高く設立さ
れるのが都合良い。
Around the annular portion 18, there is a perpendicular portion 19b of the rib 19.
Positioning pins 21 stand upright in a concentric circle with the center as the center. This positioning pin 21 serves to position the mask 20 approximately at the center within the lower lid 10 when the mask 20 is placed on the annular portion 18 . For this reason, it is convenient that the height of the pin 21 is set equal to or higher than the upper surface position of the mask 20 placed on the annular portion 18.

次に本発明の防塵カセツトの上蓋1と下蓋10
の組み合わせ方および取りはずし方の原理説明を
第4図〜第7図を参照して説明する。なお自動搬
送系を用いた説明は第11図乃至第14図で行な
う。
Next, the upper lid 1 and the lower lid 10 of the dustproof cassette of the present invention
The principles of how to assemble and remove will be explained with reference to FIGS. 4 to 7. Note that the explanation using the automatic conveyance system will be given with reference to FIGS. 11 to 14.

位置決めピン21を参考にして下蓋10の環状
部18にマスク20を載置させた状態(第7図)
で、まず下蓋の両側壁13から延びた案内ピン2
2,22を上蓋1の第2の側壁部4b,4bに形
成された案内溝5,5に向けて挿し込むべく、下
蓋の後壁15を上蓋の後壁7に接近させる(第6
図)。案内ピン22,22が案内溝5,5内に収
容され、下蓋10の段部16の下面16aが上蓋
1の後壁段部8の上面8aに接触し支承されたら
(第5図)、案内ピン22,22を軸として上蓋1
を反時計方向に回動させる。その結果上蓋の逆L
字形係止部材3の端部と下蓋の係止用突起12と
が係合し、カセツトは第3図および第4図に示さ
れるような組み合わせ状態となる。上蓋と下蓋の
取りはずし方については第4図から第7図の順
に、前述した操作を逆におこなえば良い。
A state in which the mask 20 is placed on the annular portion 18 of the lower lid 10 with reference to the positioning pins 21 (Fig. 7)
First, remove the guide pins 2 extending from both side walls 13 of the lower cover.
2, 22 toward the guide grooves 5, 5 formed in the second side walls 4b, 4b of the upper lid 1, the rear wall 15 of the lower lid is brought closer to the rear wall 7 of the upper lid (6th
figure). When the guide pins 22, 22 are accommodated in the guide grooves 5, 5, and the lower surface 16a of the stepped portion 16 of the lower lid 10 contacts and is supported by the upper surface 8a of the rear wall stepped portion 8 of the upper lid 1 (FIG. 5), The upper cover 1 is rotated around the guide pins 22, 22.
Rotate counterclockwise. As a result, the upper lid is inverted L.
The ends of the letter-shaped locking members 3 and the locking protrusions 12 on the lower lid are engaged, and the cassette is in the assembled state as shown in FIGS. 3 and 4. To remove the upper cover and lower cover, the above-described operations may be performed in reverse order in the order shown in FIGS. 4 to 7.

さて次にマスクを自動的に搬送する自動搬送シ
ステムについて説明する。
Next, an automatic conveyance system for automatically conveying masks will be explained.

第8図において防塵カセツト31はカセツトキ
ヤリア32に積層されるが上下方向に移動するエ
レベーターユニツト34に支持されるフオークユ
ニツト33によつて所定の防塵カセツトしかもマ
スクが装置された下蓋のみが自動搬送される。
In FIG. 8, the dust-proof cassettes 31 are stacked on a cassette carrier 32, but a fork unit 33 supported by an elevator unit 34 that moves vertically automatically transports the predetermined dust-proof cassettes and only the lower lid with the mask attached. be done.

なお、フオークユニツト33の上下方向位置は
固定のインデツクス板35及びエレベーターユニ
ツト34に設けたフオトスイツチ36によつて第
15図A,Bに示す如く光電的に精密に定まり、
後述するフオークユニツト33の上下移動による
上蓋と下蓋の係止若しくは係止解除を安定したも
のとしている。
The vertical position of the fork unit 33 is precisely determined photoelectrically by a fixed index plate 35 and a photo switch 36 provided on the elevator unit 34, as shown in FIGS. 15A and 15B.
This ensures stable locking and unlocking of the upper and lower lids by vertical movement of a fork unit 33, which will be described later.

カセツトキヤリア32から抜きだされた所定防
塵カセツトの下蓋はエレベーターユニツト34で
上方のマスクアライメントステージ38へ運ばれ
てマスクハンドユニツト37によつてマスクが吸
着されて露光ステージへ運ばれる。
The lower lid of a predetermined dustproof cassette taken out from the cassette carrier 32 is carried by an elevator unit 34 to an upper mask alignment stage 38, where the mask is sucked by a mask hand unit 37 and carried to an exposure stage.

第9図は上述したマスクのフローを示してい
る。第9図で39はマスク、40はマスク位置検
出ユニツト、41はマスクローダー、42は露光
位置を示す。
FIG. 9 shows the flow of the mask described above. In FIG. 9, 39 is a mask, 40 is a mask position detection unit, 41 is a mask loader, and 42 is an exposure position.

第10図はフオークユニツト33の外観を示す
図である。
FIG. 10 is a diagram showing the appearance of the fork unit 33.

フオーク33a,33bは下蓋10の両側壁1
3よりやや大きな間隔を有し、下蓋10の突出片
14の下面を載置する。
The forks 33a and 33b are attached to both side walls 1 of the lower lid 10.
The lower surface of the protruding piece 14 of the lower lid 10 is placed on the lower surface of the protruding piece 14 of the lower lid 10.

第11図乃至第14図は上述のフオークユニツ
ト33を用いたマスクの自動搬送を示す。
FIGS. 11 to 14 show automatic mask conveyance using the fork unit 33 described above.

第11図はフオークユニツト33が所定の防塵
カセツトへ近づくよう水平方向に移動された状態
を示す。
FIG. 11 shows the fork unit 33 moved horizontally so as to approach a predetermined dustproof cassette.

なおこのとき防塵カセツトについては上蓋1の
突出片6がキヤリアの保持部材44に保持され又
上蓋1と下蓋10は係止部材3,12で一体化さ
れるため防塵カセツトは一体的にキヤリアによつ
て支持固定された状態である。
At this time, regarding the dust-proof cassette, the protruding piece 6 of the upper lid 1 is held by the carrier's holding member 44, and the upper lid 1 and the lower lid 10 are integrated by the locking members 3 and 12, so the dust-proof cassette is integrally attached to the carrier. Therefore, it is in a supported and fixed state.

なお下蓋の突出片14はキヤリアの案内用ベア
リング43によつて保持される。
Note that the protruding piece 14 of the lower lid is held by a guide bearing 43 of the carrier.

次に第12図はフオークユニツト33がエレベ
ーターユニツト34により上方へ数mmシフト(フ
オークユニツト33は下蓋10の突出片14の下
面を支持すると共に、フオークユニツト33中の
ベアリング46が係止部材3,12の係止を解除
する状態を示す。
Next, in FIG. 12, the fork unit 33 is shifted upward by several mm by the elevator unit 34 (the fork unit 33 supports the lower surface of the protruding piece 14 of the lower cover 10, and the bearing 46 in the fork unit 33 is moved upward by the locking member 34). , 12 are unlocked.

上蓋1はスプリング45の付勢力で支点22a
を中心に時計方向に回転し、不図示のストツパー
で回転方向位置が規制され図の如く斜めにもち上
がつた状態で停止する。
The upper lid 1 is supported at the fulcrum 22a by the urging force of the spring 45.
It rotates clockwise around , and its position in the rotational direction is regulated by a stopper (not shown), and it stops in a diagonally raised position as shown in the figure.

なお支点22aは、案内ピン22が案内溝5の
最奥部にあるときの位置である。
Note that the fulcrum 22a is the position when the guide pin 22 is at the innermost part of the guide groove 5.

第13図はフオークユニツト33が下蓋10を
載置して水平方向に後退する、すなわち下蓋10
を引き抜く状態を示す。なお第13図のフオーク
ユニツト33の上下方向位置は第12図と同じで
ある。
FIG. 13 shows that the fork unit 33 places the lower lid 10 and retreats in the horizontal direction, that is, the lower lid 10
This shows the state in which it is pulled out. The vertical position of the fork unit 33 in FIG. 13 is the same as in FIG. 12.

また、下蓋10を引き出す際には、下蓋10の
突出片14の下方に凸状に設けられた係合片51
(第11図参照)がフオーク33a,b(第8図参
照)に設けられた凹状の係止部50(第11図参
照)と係合するので、下蓋10はフオークユニツ
ト33上で引き出し方向の位置が規制される。
Further, when pulling out the lower lid 10, an engaging piece 51 provided in a convex shape below the protruding piece 14 of the lower lid 10
(see Fig. 11) engages with the concave locking portions 50 (see Fig. 11) provided on the forks 33a, b (see Fig. 8), so that the lower cover 10 is placed on the fork unit 33 in the drawing direction. location is regulated.

第14図はフオークユニツト33が後退位置に
達した状態を示す。
FIG. 14 shows a state in which the fork unit 33 has reached the retracted position.

この後下蓋10はエレベーターユニツト34に
より最上位置に運ばれ、マスクはマスクハンドユ
ニツト37の下に到達する。
Thereafter, the lower lid 10 is carried to the uppermost position by the elevator unit 34, and the mask reaches under the mask hand unit 37.

以上が自動搬送システムによるマスクの抜き取
りの順であるがマスクを防塵カセツト内に挿入す
る場合は前述したフローを逆に戻る。すなわちマ
スクは下蓋10に載置されてフオークユニツト3
3によつて防塵カセツトに近づくよう移動され下
蓋10の案内ピン22が上蓋1の案内溝5の最奥
部に達する。
The above is the order in which the mask is removed by the automatic transport system, but when inserting the mask into the dustproof cassette, the flow described above is reversed. That is, the mask is placed on the lower lid 10 and the fork unit 3
3, the guide pin 22 of the lower cover 10 reaches the innermost part of the guide groove 5 of the upper cover 1.

そしてフオークユニツト33が下方にシフトさ
れるとフオークシフト33の爪部47が係止部材
3を押し下げるため上蓋1は支点22aを中心に
反時計方向に回転し、上蓋1の係止部材3が下蓋
10の突起12と係合し、上蓋1と下蓋10は一
体化する。
When the fork unit 33 is shifted downward, the claw portion 47 of the fork shift 33 pushes down the locking member 3, so the top cover 1 rotates counterclockwise around the fulcrum 22a, and the locking member 3 of the top cover 1 moves downward. It engages with the protrusion 12 of the lid 10, and the upper lid 1 and the lower lid 10 are integrated.

そしてフオークユニツト33は下方にシフトさ
れた位置から水平に後退する。
The fork unit 33 then retreats horizontally from the downwardly shifted position.

ここでインデツクス板35とフオトスイツチ3
6によるフオークの上下位置検出を第15図A,
Bに示す。
Here, index board 35 and photo switch 3
Fig. 15A shows the detection of the vertical position of the fork using 6.
Shown in B.

固定のインデツクス板35に対し、4つのフオ
トスイツチ36a〜36dがエレベーターユニツ
ト34に設けられる。
Four photo switches 36a to 36d are provided in the elevator unit 34 for a fixed index plate 35.

第15図Aでフオトスイツチ36a′〜36d′は
上蓋1を閉じるためフオークユニツト33が下方
向に△だけシフトした位置を示す。
In FIG. 15A, the photo switches 36a' to 36d' show the positions in which the fork unit 33 has been shifted downward by Δ in order to close the top cover 1.

第15図Bは第15図Aの紙面垂直方向の図で
例えばフオトスイツチ36cの如く、投光部36
pからの光がインデツクス板35で遮光され受光
部36qに届かず出力が無い状態を示している。
FIG. 15B is a view taken in a direction perpendicular to the paper surface of FIG.
This shows a state in which the light from P is blocked by the index plate 35 and does not reach the light receiving section 36q, resulting in no output.

フオークユニツト33の上下方向低い位置(第
11図参照)はフオトスイツチ36b′と36c′で
検出される一方、フオークユニツト33の上下方
向高い位置(第12図乃至第14図参照)はフオ
トスイツチ36aと36dで検出される。
The vertically low position of the fork unit 33 (see FIG. 11) is detected by the photo switches 36b' and 36c', while the vertically high position of the fork unit 33 (see FIGS. 12 to 14) is detected by the photo switches 36a and 36d. Detected in

なお図中l1,l2は各々インデツクス板35の遮
光部、開口部の長さであつて両者は絶対値を異な
らしめており、(l1+l2)はカセツトキヤリア32
のカセツト収納位置の各間隔に一致する。
In the figure, l 1 and l 2 are the lengths of the light-shielding part and the opening of the index plate 35, respectively, and the two have different absolute values, and (l 1 + l 2 ) is the length of the cassette carrier 32.
corresponds to each interval of the cassette storage positions.

さて以上の実施例において種々の変形が可能で
ある。
Now, various modifications can be made to the above embodiment.

例えば第3図で上蓋1の前壁2及び下蓋10の
前壁11の当接面は平垣であるが第4図〜第7図
に示すように段違いの形状としても良い。又、上
蓋1の後壁は第11図乃至第14図に示されるよ
うに人間の手が入り易いように窪みをつけても良
い。これにより防塵カセツトをカセツトキヤリア
に手動でセツトするのが容易となる。
For example, in FIG. 3, the abutting surfaces of the front wall 2 of the upper lid 1 and the front wall 11 of the lower lid 10 are flat walls, but they may have different height shapes as shown in FIGS. 4 to 7. Further, the rear wall of the upper lid 1 may be recessed to allow easy access for human hands, as shown in FIGS. 11 to 14. This makes it easy to manually set the dustproof cassette in the cassette carrier.

更に上蓋と下蓋を重ね合わせてマスクをカセツ
ト内に収容したとき、マスクの位置がカセツト内
で不用意にずれマスク面が損傷するのを防止する
ために上蓋にマスク位置ずれ防止用パツド24
(第7図)を備えても良い。
Furthermore, when the upper and lower lids are overlapped and the mask is stored in the cassette, a pad 24 is provided on the upper lid to prevent the mask from shifting inadvertently and damaging the mask surface.
(Fig. 7) may also be provided.

なお防塵カセツトの上蓋、下蓋の材質としては
PEEK(Poly Ether Ether Ketone)という樹脂
が好ましい。これは万一、カセツトにゴミ、油等
が付着した場合、カセツトを洗浄するがPEEKは
種々の洗浄液によつておかされにくく、又機械的
強度もすぐれているからである。
The material for the top and bottom lids of the dustproof cassette is
A resin called PEEK (Poly Ether Ether Ketone) is preferred. This is because in the unlikely event that dirt, oil, etc. adhere to the cassette, the cassette must be cleaned, but PEEK is not easily damaged by various cleaning solutions, and it also has excellent mechanical strength.

なお上述の実施例でマスクは円形としたが、角
形であつても良いことは勿論である。
In the above embodiments, the mask is circular, but it goes without saying that it may also be square.

〔発明の効果〕〔Effect of the invention〕

上述した如く、本発明の防塵カセツトによれ
ば、フオークの下蓋支持面より上方に突出する部
分をフオークに設ける必要がなく、またフオーク
と下蓋の接触は常に下蓋の突出片の下側のみで行
なわれることになるので、フオークと下蓋の接触
により塵埃が発生しても、マスクまたはレチクル
等の基板に塵埃が付着することがない。従つて、
本発明の防塵カセツトによれば、マスクまたはレ
チクル等の基板の取出を自動的に且つ塵埃が基板
に付着することなく行なうことを可能にすること
ができる。
As described above, according to the dust-proof cassette of the present invention, there is no need to provide the fork with a part that projects upward from the lower cover support surface of the fork, and the contact between the fork and the lower cover is always on the lower side of the protruding piece of the lower cover. Even if dust is generated due to contact between the fork and the lower cover, the dust will not adhere to the substrate such as the mask or reticle. Therefore,
According to the dust-proof cassette of the present invention, it is possible to automatically take out a substrate such as a mask or a reticle without dust adhering to the substrate.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明の防塵カセツトの上蓋構造の斜
視図、第2図Aは本発明の防塵カセツトの下蓋構
造の斜視図、第2図B,Cは搬送方向から見た防
塵カセツトの断面図、第3図は本発明の防塵カセ
ツトを組み合わせた状態で示した図、第4図乃至
第7図はそれぞれ本発明の防塵カセツトの上蓋と
下蓋を分離して下蓋に載置される板状体を搬送す
る場合の原理説明図、第8図は自動搬送システム
の概略図、第9図は自動搬送システムによる板状
体の動き(フロー)を示す図、第10図は自動搬
送システムのフオーク部を示す図、第11図乃至
第14図は自動搬送システムを用いて防塵カセツ
トの上蓋と下蓋を分離して下蓋に載置される板状
体を自動搬送する場合の説明図、第15図A,B
はインデツクス板とフオトスイツチによるフオー
クの上下位置検出の説明図、 図中、1は上蓋、2は下蓋、13は側壁、14
は突出片、20はマスク、32はカセツトキヤリ
ア、33はフオークユニツト、50は係止部、5
1は係合片である。
Figure 1 is a perspective view of the upper lid structure of the dust-proof cassette of the present invention, Figure 2A is a perspective view of the lower lid structure of the dust-proof cassette of the present invention, and Figures 2B and C are cross-sections of the dust-proof cassette seen from the transport direction. Figures 3 and 3 show the dust-proof cassette of the present invention in a combined state, and Figures 4 to 7 show the dust-proof cassette of the present invention with its upper and lower lids separated and placed on the lower lid. An explanatory diagram of the principle of conveying a plate-shaped object. Figure 8 is a schematic diagram of the automatic conveyance system. Figure 9 is a diagram showing the movement (flow) of the plate-shaped body by the automatic conveyance system. Figure 10 is the automatic conveyance system. Figures 11 to 14 are explanatory diagrams in the case where the upper and lower lids of the dust-proof cassette are separated and the plate-shaped object placed on the lower lid is automatically transported using an automatic transport system. , Figure 15 A, B
is an explanatory diagram of how to detect the vertical position of the fork using the index board and photo switch. In the figure, 1 is the upper cover, 2 is the lower cover, 13 is the side wall, and 14
20 is a protruding piece, 20 is a mask, 32 is a cassette carrier, 33 is a fork unit, 50 is a locking part, 5
1 is an engagement piece.

Claims (1)

【特許請求の範囲】 1 マスクまたはレチクル等の基板20を載置す
るための下蓋10と、前記下蓋を所定の引出し方
向に引出せるように前記下蓋と重ね合される上蓋
1を有し、前記下蓋と前記上蓋を重ね合せること
により前記基板を収納する密閉室を形成すると共
に、前記下蓋は前記引出し方向に沿つた側壁13
の外側に突出片14を備え、カセツトキヤリア3
2に保持されている際に前記突出片の下側に進入
するフオーク33で前記突出片の下面が支持され
ることにより、前記カセツトキヤリア内に前記上
蓋を残したまま前記下蓋が前記カセツトキヤリア
外に引出されるようになした防塵カセツトにおい
て、 前記下蓋は前記引出し方向に関して前記フオー
クの係止部50と係合する凸状の係合片51を前
記突出片の下方に有することを特徴とする防塵カ
セツト。
[Claims] 1. A device comprising a lower lid 10 on which a substrate 20 such as a mask or a reticle is placed, and an upper lid 1 that is overlapped with the lower lid so that the lower lid can be pulled out in a predetermined drawing direction. By overlapping the lower lid and the upper lid, a sealed chamber for accommodating the substrate is formed, and the lower lid has a side wall 13 along the drawing direction.
A protruding piece 14 is provided on the outside of the cassette carrier 3.
2, the lower surface of the protruding piece is supported by the fork 33 that enters the lower side of the protruding piece, so that the lower cover can be inserted into the cassette carrier while leaving the upper cover in the cassette carrier. In the dustproof cassette that can be pulled out, the lower lid has a convex engaging piece 51 below the protruding piece that engages with the locking part 50 of the fork in the pulling direction. A dustproof cassette.
JP60122182A 1984-07-06 1985-06-05 Dust-proof cassette Granted JPS61282229A (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP60122182A JPS61282229A (en) 1985-06-05 1985-06-05 Dust-proof cassette
US06/750,282 US4611967A (en) 1984-07-06 1985-07-01 Cassette-type container for a sheet-like member

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60122182A JPS61282229A (en) 1985-06-05 1985-06-05 Dust-proof cassette

Publications (2)

Publication Number Publication Date
JPS61282229A JPS61282229A (en) 1986-12-12
JPH0348097B2 true JPH0348097B2 (en) 1991-07-23

Family

ID=14829605

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60122182A Granted JPS61282229A (en) 1984-07-06 1985-06-05 Dust-proof cassette

Country Status (1)

Country Link
JP (1) JPS61282229A (en)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2539447B2 (en) * 1987-08-12 1996-10-02 株式会社日立製作所 Production method by single-wafer carrier
JP2789198B2 (en) * 1988-09-06 1998-08-20 キヤノン株式会社 Mask loading mechanism
JP2536623B2 (en) * 1989-07-12 1996-09-18 日本電気株式会社 Automatic paper width adjustment mechanism
ES2101070T3 (en) * 1992-08-04 1997-07-01 Ibm PORTABLE SEALED PRESSURE CONTAINERS TO STORE A SLICE OF SEMICONDUCTOR IN A PROTECTIVE GASEOUS ENVIRONMENT.
US6619903B2 (en) * 2001-08-10 2003-09-16 Glenn M. Friedman System and method for reticle protection and transport
TWI851335B (en) * 2022-10-14 2024-08-01 家登精密工業股份有限公司 Container for non-rectangular reticle

Also Published As

Publication number Publication date
JPS61282229A (en) 1986-12-12

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