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JPH0354423B2 - - Google Patents
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JPH0354423B2 - - Google Patents

Info

Publication number
JPH0354423B2
JPH0354423B2 JP56179385A JP17938581A JPH0354423B2 JP H0354423 B2 JPH0354423 B2 JP H0354423B2 JP 56179385 A JP56179385 A JP 56179385A JP 17938581 A JP17938581 A JP 17938581A JP H0354423 B2 JPH0354423 B2 JP H0354423B2
Authority
JP
Japan
Prior art keywords
plasma
means consisting
container
gas
ray
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP56179385A
Other languages
Japanese (ja)
Other versions
JPS5880250A (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP56179385A priority Critical patent/JPS5880250A/en
Priority to US06/438,569 priority patent/US4538291A/en
Publication of JPS5880250A publication Critical patent/JPS5880250A/en
Publication of JPH0354423B2 publication Critical patent/JPH0354423B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05GX-RAY TECHNIQUE
    • H05G2/00Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
    • H05G2/001Production of X-ray radiation generated from plasma
    • H05G2/003Production of X-ray radiation generated from plasma the plasma being generated from a material in a liquid or gas state

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Plasma & Fusion (AREA)
  • X-Ray Techniques (AREA)

Description

【発明の詳細な説明】 本発明はX線源装置に関する。[Detailed description of the invention] The present invention relates to an X-ray source device.

従来、X線発生装置は銅等の水冷、回転ターゲ
ツトに電子線を照射して特性X線を得る方法が用
いられていた。
Conventionally, X-ray generators have used a method of obtaining characteristic X-rays by irradiating an electron beam onto a water-cooled, rotating target such as copper.

しかし、上記従来技術では高輝度のX線が得ら
れないという欠点がある。
However, the conventional technique described above has a drawback in that high-intensity X-rays cannot be obtained.

本発明はかかる従来技術の欠点をなくし、高輝
度のX線を得ることを目的とする。
The present invention aims to eliminate the drawbacks of the prior art and obtain high-intensity X-rays.

上記目的を達成するための本発明の基本的な構
成は、石英、セラミツク等絶縁材からなる中空容
器には2つの電極が取付けられ、且つ容器内には
Ar等のガス体が充填され、前記電極により前記
ガス体に電界と電流が印加されて、プラズマ状態
となすと共に、前記容器外には磁界を前記ブラズ
マに印加するコイル又は磁石を設けて、前記プラ
ズマをピンチさせる事を特徴とする。
The basic structure of the present invention to achieve the above object is that two electrodes are attached to a hollow container made of an insulating material such as quartz or ceramic, and
A gas such as Ar is filled, and an electric field and current are applied to the gas by the electrode to create a plasma state, and a coil or magnet is provided outside the container to apply a magnetic field to the plasma. It is characterized by pinching plasma.

以下実施例を用いて本発明を具体的に説明す
る。
The present invention will be specifically described below using Examples.

第1図は本発明の一実施例を示すX線ランプの
断面図である。
FIG. 1 is a sectional view of an X-ray lamp showing an embodiment of the present invention.

石英からなる容器1の両端には電極2,3が設
けられ、容器1内にはArガスが入れられて、電
極2,3にAc又はDCの電源を入力することによ
り、前記Arガスはプラズマ状態となる。該プラ
ズマに容器1外からのコイル4等により磁界を印
加すると、前記プラズマはピンチ現象を起こし、
高輝度のX線(λ≒10〓)を発生し、容器1に取
付けられたBeからなる窓5より外部へ放射され
る。
Electrodes 2 and 3 are provided at both ends of a container 1 made of quartz, and Ar gas is put into the container 1. By inputting AC or DC power to the electrodes 2 and 3, the Ar gas is turned into plasma. state. When a magnetic field is applied to the plasma by a coil 4 or the like from outside the container 1, the plasma causes a pinch phenomenon,
High-intensity X-rays (λ≒10〓) are generated and radiated to the outside through a window 5 made of Be attached to the container 1.

この様にガス・プラズマの外部磁界によるピン
チ効果を用いてX線源とすることにより高輝度の
X線源を得ることができる効果がある。
In this way, by using the pinch effect of gas plasma as an X-ray source due to the external magnetic field, it is possible to obtain a high-intensity X-ray source.

尚、本実施例では容器を閉方式としたが、容器
内のガスは絶えず供給しながら真空ポンプにより
吸引し、内部圧力を一定に保つ方式を用いても良
い。
In this embodiment, the container is closed, but a method may also be used in which the gas inside the container is constantly supplied and suctioned by a vacuum pump to keep the internal pressure constant.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明の一実施例を示すX線ランプの
断面図である。 1……絶縁容器、2,3……電極、4……磁
石、5……X線窓。
FIG. 1 is a sectional view of an X-ray lamp showing an embodiment of the present invention. 1... Insulating container, 2, 3... Electrode, 4... Magnet, 5... X-ray window.

Claims (1)

【特許請求の範囲】[Claims] 1 絶縁材からなり減圧された気体を充満した中
空容器からなる減圧ガス保持手段、該中空容器に
配設され前記気体をプラズマ化するための電源に
接続された電極からなるプラズマ発生手段、前記
プラズマをピンチさせるために磁界を発生させる
コイルからなるプラズマ発生手段及び前記中空容
器内で発生したX線を外部へ放射させるための
Beからなる窓からなるX線取り出し手段からな
ることを特徴とするX線源装置。
1. A reduced pressure gas holding means consisting of a hollow container made of an insulating material and filled with reduced pressure gas, a plasma generating means consisting of an electrode disposed in the hollow container and connected to a power source for turning the gas into plasma, and the plasma plasma generating means consisting of a coil that generates a magnetic field to pinch the
An X-ray source device comprising an X-ray extraction means consisting of a window made of Be.
JP56179385A 1981-11-09 1981-11-09 X-ray source device Granted JPS5880250A (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP56179385A JPS5880250A (en) 1981-11-09 1981-11-09 X-ray source device
US06/438,569 US4538291A (en) 1981-11-09 1982-11-02 X-ray source

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56179385A JPS5880250A (en) 1981-11-09 1981-11-09 X-ray source device

Publications (2)

Publication Number Publication Date
JPS5880250A JPS5880250A (en) 1983-05-14
JPH0354423B2 true JPH0354423B2 (en) 1991-08-20

Family

ID=16064929

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56179385A Granted JPS5880250A (en) 1981-11-09 1981-11-09 X-ray source device

Country Status (1)

Country Link
JP (1) JPS5880250A (en)

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57147855A (en) * 1981-03-06 1982-09-11 Fujitsu Ltd Discharge plasma x-ray generator

Also Published As

Publication number Publication date
JPS5880250A (en) 1983-05-14

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