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JPH0357453B2 - - Google Patents
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JPH0357453B2 - - Google Patents

Info

Publication number
JPH0357453B2
JPH0357453B2 JP57136521A JP13652182A JPH0357453B2 JP H0357453 B2 JPH0357453 B2 JP H0357453B2 JP 57136521 A JP57136521 A JP 57136521A JP 13652182 A JP13652182 A JP 13652182A JP H0357453 B2 JPH0357453 B2 JP H0357453B2
Authority
JP
Japan
Prior art keywords
beams
scanning direction
light receiving
detected
shifted
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP57136521A
Other languages
Japanese (ja)
Other versions
JPS5926006A (en
Inventor
Yoshiaki Matsunaga
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Minolta Co Ltd
Original Assignee
Minolta Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Minolta Co Ltd filed Critical Minolta Co Ltd
Priority to JP13652182A priority Critical patent/JPS5926006A/en
Publication of JPS5926006A publication Critical patent/JPS5926006A/en
Publication of JPH0357453B2 publication Critical patent/JPH0357453B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00Measuring arrangements characterised by the use of optical techniques

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Dot-Matrix Printers And Others (AREA)
  • Laser Beam Printer (AREA)
  • Photometry And Measurement Of Optical Pulse Characteristics (AREA)
  • Mechanical Optical Scanning Systems (AREA)
  • Facsimile Scanning Arrangements (AREA)

Description

【発明の詳細な説明】 本発明は、変調可能な複数のビームをポリゴン
ミラー等の走査装置を用いて偏向させて被走査面
上を同時に走査するマルチビーム走査装置に関す
るものであり、さらに詳しくは、被走査面上で印
字開始位置を決めるための記号(以下SOS信号と
いう。)を検知するビーム位置検知方法に係わる。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a multi-beam scanning device that simultaneously scans a surface to be scanned by deflecting a plurality of modulated beams using a scanning device such as a polygon mirror. , relates to a beam position detection method that detects a symbol (hereinafter referred to as an SOS signal) for determining the printing start position on a scanned surface.

上記マルチビーム走査装置はシングルビーム走
査装置に比べポリゴンミラーの回転数を低減する
ことができるので耐久性や振動の面から利点が大
きい。しかし、SOS信号の検知については各ビー
ム相互の関係が加わるので非常に難しくなる。
The above-mentioned multi-beam scanning device can reduce the number of rotations of the polygon mirror compared to a single-beam scanning device, so it has great advantages in terms of durability and vibration. However, detecting an SOS signal becomes extremely difficult due to the relationship between each beam.

一つの方法として、ビーム発生装置の相互位置
を正確に決めておいて各ビームのうちの1つのビ
ーム位置のみを検出し他のビームの位置は検知さ
れたビームの位置を補正してSOS信号とするやり
方が考えられる。
One method is to precisely determine the relative positions of the beam generators, detect the position of only one of each beam, and correct the position of the other beams to generate an SOS signal. I can think of a way to do it.

例えば、第1図に示すように100μm間隔で発
光部をもつ半導体レーザー1を主走査方向に対し
てθ傾けて設置し、第2図に示す焦点距離5mmの
コリメータレンズ2ポリゴンミラー3及び焦点距
離500mmのfθレンズ4とで被走査面上に投影する
場合を考えると、100μmのビーム間隔に対し被
走査面上で±30μmの誤差を許容するとしても、
ビームは100倍に拡大されるので半導体レーザー
1を傾ける角度θを sin-1(1/100±3/1000) の精度としなければならない。また、半導体レー
ザ1の各発光部を段階状にずらす場合は±0.3μm
の精度でずらさねばならない。このような高精度
での半導体レーザーの配置或いは、製作は非常に
難しいものである。
For example, as shown in Fig. 1, a semiconductor laser 1 having light emitting parts at intervals of 100 μm is installed at an angle of θ with respect to the main scanning direction, and a collimator lens 2 with a focal length of 5 mm and a polygon mirror 3 with a focal length of 5 mm as shown in Fig. 2 are used. Considering the case of projecting onto the scanned surface with a 500mm fθ lens 4, even if an error of ±30μm is allowed on the scanned surface for a beam interval of 100μm,
Since the beam is expanded 100 times, the angle θ at which the semiconductor laser 1 is tilted must be accurate to sin -1 (1/100±3/1000). In addition, when shifting each light emitting part of the semiconductor laser 1 in steps, ±0.3 μm
must be shifted with an accuracy of It is extremely difficult to arrange or manufacture semiconductor lasers with such high precision.

上記方法の変形として、第3図に示すように被
走査面上でのビームの相互位置を各ビーム毎に設
けたミラー5,5,5で調整することが考えられ
る。即ち、各ミラー5,5,5を主走査方向と平
行な軸のまわりに回動してビーム間隔を調整する
とともに副走査方向と平行な軸のまわりに回動し
て各ビームの主走査方向の位置を調整するのであ
る。しかし、この方法もミラー5,5,5の調整
という新たな調整要素が加わるうえにその調整が
非常に微妙なものであり、実際には難しい方法で
ある。
As a modification of the above method, it is conceivable to adjust the mutual positions of the beams on the scanned surface using mirrors 5, 5, 5 provided for each beam, as shown in FIG. That is, each mirror 5, 5, 5 is rotated around an axis parallel to the main scanning direction to adjust the beam interval, and also rotated around an axis parallel to the sub-scanning direction to adjust the main scanning direction of each beam. Adjust the position of the However, this method also adds a new adjustment element of adjusting the mirrors 5, 5, 5, and the adjustment is very delicate, making it a difficult method in practice.

そこで各ビーム毎に別々にビーム位置を検知す
ることが考えられるが、通常のレーザービームプ
リンタでは走査線の間にすきまができないように
するために被走査面上ではビームがオーバーラツ
プするように設定されている(第4図)。例えば、
ビーム間隔を100μmとした場合中心強度1/e2
定義したビーム径を被走査面上で200μm程度に
なるように設定する訳である。しかしこのような
オーバーラツプは、各ビーム毎に設けられた検知
装置が他のビームをも検知してしまい誤動作の原
因となる。
Therefore, it is possible to detect the beam position separately for each beam, but in normal laser beam printers, the beams are set to overlap on the scanned surface in order to prevent gaps between scanning lines. (Figure 4). for example,
When the beam interval is 100 μm, the beam diameter defined by the center intensity 1/e 2 is set to be about 200 μm on the surface to be scanned. However, such overlap causes the detection device provided for each beam to detect other beams as well, causing malfunctions.

本発明はこのような点に鑑みてなされたもので
あり、マルチビーム走査装置のビーム位置検知を
ビームがオーバーラツプしているにもかかわらず
各ビーム毎に精度よく検知できるビーム位置検知
方法を提供することを目的とする。
The present invention has been made in view of these points, and provides a beam position detection method that can accurately detect the beam position of each beam in a multi-beam scanning device even though the beams overlap. The purpose is to

上述の目的は、複数のビームを各ビームによる
被走査面の照射が隣り合うビームに対して主走査
方向にずれるように構成し、受光部により各ビー
ムを検知する毎に検知されたビームをその検知の
直後に消灯することによつて達成される。
The above purpose is to configure a plurality of beams so that the irradiation of the scanned surface by each beam is shifted in the main scanning direction with respect to the adjacent beam, and each time the light receiving unit detects each beam, the detected beam is This is achieved by turning off the light immediately after detection.

第5図は本発明の実施例を示す図で、複数のビ
ームB1,B2,B3,B4,B5を走査線上で主走査方
向にずれるようにし、これに対し1つの受光素子
Eを走査線上に垂直に配置したものである。この
受光素子Eは便宜的に第3図に示すように感光ド
ラム6の側方に配置され、応答性のよい、例えば
フオトダイドードを用いる。
FIG. 5 is a diagram showing an embodiment of the present invention, in which a plurality of beams B 1 , B 2 , B 3 , B 4 , B 5 are shifted in the main scanning direction on the scanning line, and one light receiving element E is arranged vertically on the scanning line. The light-receiving element E is conveniently arranged on the side of the photosensitive drum 6 as shown in FIG. 3, and uses a photodiode with good responsiveness, for example.

副走査方向にオーバーラツプした複数のビーム
Bは主走査方向に他のビームに影響を与えない距
離Dだけ夫々ずらされている。
The plurality of beams B overlapping in the sub-scanning direction are each shifted by a distance D in the main-scanning direction so as not to affect other beams.

ビームBはカウスビームであるのでこれを受光
素子Eで検知する際スレツシヨールドThをピー
クの中間にとるのがもつとも誤差の影響を受けに
くい。それ故前記距離Dは最低ビームの大きさの
半分は必要である。ここでビームの大きさとはビ
ーム強度が中心強度の1/e2になる大きさを言
う。尚実際にはセツテイングの誤差もありビーム
の大きさの2倍程度の距離Dをあけた方がよい。
Since the beam B is a caustic beam, when it is detected by the light receiving element E, the threshold Th is set in the middle of the peak, so that it is less susceptible to errors. Therefore, the distance D needs to be at least half the beam size. The beam size here refers to the size where the beam intensity is 1/e 2 of the center intensity. In reality, due to setting errors, it is better to leave a distance D of about twice the beam size.

第7図は第5図の実施例の制御の一例を示すタ
イムチヤートである。この場合ビームB1〜B5
最初に全て点灯される。そしてビームが受光素子
Eに検知される順に消灯されてゆき、受光素子E
からは各ビームのSOS信号が出力される。
FIG. 7 is a time chart showing an example of control in the embodiment shown in FIG. In this case, beams B 1 to B 5 are all turned on initially. Then, the beams are turned off in the order in which they are detected by the light receiving element E, and the light receiving element E
The SOS signal of each beam is output.

ビームの点滅制御はまた第8図のようにおこな
うこともできる。第8図のタイムチヤートにおい
ては、各ビームは前のビームが消灯されてから点
灯しそのビームが受光素子Eに検知されると消灯
する。従つて、あるビームが受光素子Eにさしか
かるとき他のビームは消灯しているので各ビーム
間の主走査方向の距離Dは第7図の制御方式より
短くすることができる。
The beam blinking control can also be performed as shown in FIG. In the time chart of FIG. 8, each beam is turned on after the previous beam is turned off, and when that beam is detected by the light receiving element E, it is turned off. Therefore, when a certain beam strikes the light receiving element E, the other beams are turned off, so the distance D between the beams in the main scanning direction can be made shorter than in the control system shown in FIG.

第9図はビーム数が多い場合のビームの配置例
を示すもので、ビームを副走査方向に2つのグル
ープ(B1,B2,B3,B4)と(B5,B6,B7,B8
に分けこのグループを副走査方向に2段に並べる
とともに主走査方向にずらしたものである。ここ
で各ビームの主走査方向の距離は2Dだけ離し各
グループを距離Dだけずらすようにする。
Figure 9 shows an example of beam arrangement when there are many beams, and the beams are arranged in two groups (B 1 , B 2 , B 3 , B 4 ) and (B 5 , B 6 , B 7 , B8 )
These groups are arranged in two stages in the sub-scanning direction and shifted in the main-scanning direction. Here, the distances in the main scanning direction of each beam are set to be 2D apart, and each group is shifted by a distance D.

上述の通り本発明は、少なくとも2つの変調可
能なビームによつて被走査面を同時に、かつ、各
ビームの照射が副走査方向においてオーバーラツ
プするように走査するマルチビーム走査装置にお
いて、各ビームによる被走査面の照射が主走査方
向にずれるように構成するとともに、少なくとも
2つのビームを同時に受光可能な大きさの受光部
により各ビームを順次検知し、各ビームが検知さ
れる毎にその検知されたビームを消灯するように
したものであるから、ビームが被走査面上で副走
査方向にオーバーラツプするにもかかわらず各ビ
ームの位置を正確に検知することができるもので
ある。
As described above, the present invention provides a multi-beam scanning device that simultaneously scans a surface to be scanned with at least two modulatable beams such that the irradiation of each beam overlaps in the sub-scanning direction. It is configured so that the illumination of the scanning surface is shifted in the main scanning direction, and each beam is sequentially detected by a light receiving part large enough to receive at least two beams at the same time, and each beam is detected each time. Since the beams are turned off, the position of each beam can be accurately detected even though the beams overlap in the sub-scanning direction on the scanned surface.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は複数の発光部をもつ半導体レーザーを
示す図、第2,3図はマルチビーム走査装置のビ
ーム位置検知の一例として本発明者により提案検
討された方法を説明する図、第4図は複数のビー
ムの発光部と被走査面上における相互の関係を示
す図、第5,9図は本発明各実施例のビームと受
光部との関係を説明する図、第6図はビームと受
光素子出力の関係を説明する図、第7,8図は本
発明のビーム位置検知方法の制御を説明する図で
ある。 1……半導体レーザー、2……コリメータレン
ズ、3……ポリゴンミラー、4……fθ……レン
ズ、5……ミラー、6……感光ドラム、B……ビ
ーム、E……受光素子。
Figure 1 is a diagram showing a semiconductor laser having multiple light emitting parts, Figures 2 and 3 are diagrams explaining a method proposed and considered by the present inventor as an example of beam position detection in a multi-beam scanning device, and Figure 4. 5 and 9 are diagrams illustrating the relationship between the beams and the light receiving section of each embodiment of the present invention, and FIG. FIGS. 7 and 8 are diagrams for explaining the relationship between the outputs of the light receiving elements, and diagrams for explaining the control of the beam position detection method of the present invention. 1... Semiconductor laser, 2... Collimator lens, 3... Polygon mirror, 4... fθ... Lens, 5... Mirror, 6... Photosensitive drum, B... Beam, E... Light receiving element.

Claims (1)

【特許請求の範囲】 1 少なくとも2つの変調可能なビームによつて
被走査面を同時に、かつ、各ビームの照射が副走
査方向においてオーバーラツプするように走査す
るマルチビーム走査装置において、 各ビームによる被走査面の照射が主走査方向に
ずれるように構成するとともに、 少なくとも2つのビームを同時に受光可能な大
きさの受光部により各ビームを順次検知し、各ビ
ームが検知される毎にその検知されたビームを消
灯するようにしたビーム位置検知方法。
[Scope of Claims] 1. In a multi-beam scanning device that simultaneously scans a scanned surface with at least two modulated beams such that the irradiation of each beam overlaps in the sub-scanning direction, It is configured so that the illumination of the scanning surface is shifted in the main scanning direction, and each beam is sequentially detected by a light receiving part large enough to receive at least two beams simultaneously, and each beam is detected each time. A beam position detection method that turns off the beam.
JP13652182A 1982-08-04 1982-08-04 Detection of beam position in multibeam scanner Granted JPS5926006A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13652182A JPS5926006A (en) 1982-08-04 1982-08-04 Detection of beam position in multibeam scanner

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13652182A JPS5926006A (en) 1982-08-04 1982-08-04 Detection of beam position in multibeam scanner

Publications (2)

Publication Number Publication Date
JPS5926006A JPS5926006A (en) 1984-02-10
JPH0357453B2 true JPH0357453B2 (en) 1991-09-02

Family

ID=15177117

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13652182A Granted JPS5926006A (en) 1982-08-04 1982-08-04 Detection of beam position in multibeam scanner

Country Status (1)

Country Link
JP (1) JPS5926006A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2022025022A1 (en) 2020-07-31 2022-02-03 日本食品化工株式会社 Enzyme agent for use in epimerization reaction catalyst for sugar, method for producing epimerization reaction product, and epimerization reaction product

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62262816A (en) * 1986-05-09 1987-11-14 Ricoh Co Ltd 2 beam detection method
DE69733279T2 (en) * 1997-02-06 2006-01-19 Optrand, Inc., Plymouth FUEL INJECTION UNITS WITH INTEGRATED FIBER OPTICAL PRESSURE SENSORS AND ASSOCIATED COMPENSATION AND MONITORING DEVICES
JP3535686B2 (en) * 1997-03-03 2004-06-07 株式会社リコー Multi-beam laser scanner
JPH1152262A (en) * 1997-08-07 1999-02-26 Hitachi Koki Co Ltd Optical scanning device

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57102609A (en) * 1980-12-18 1982-06-25 Canon Inc Method and device for scanning using plural number of beams

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2022025022A1 (en) 2020-07-31 2022-02-03 日本食品化工株式会社 Enzyme agent for use in epimerization reaction catalyst for sugar, method for producing epimerization reaction product, and epimerization reaction product

Also Published As

Publication number Publication date
JPS5926006A (en) 1984-02-10

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