JPH03785B2 - - Google Patents
Info
- Publication number
- JPH03785B2 JPH03785B2 JP26750885A JP26750885A JPH03785B2 JP H03785 B2 JPH03785 B2 JP H03785B2 JP 26750885 A JP26750885 A JP 26750885A JP 26750885 A JP26750885 A JP 26750885A JP H03785 B2 JPH03785 B2 JP H03785B2
- Authority
- JP
- Japan
- Prior art keywords
- thin plate
- wafer
- rotating
- holder
- notch
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 230000002093 peripheral effect Effects 0.000 claims description 15
- 238000003825 pressing Methods 0.000 claims description 2
- 238000001035 drying Methods 0.000 description 5
- 239000000428 dust Substances 0.000 description 4
- 239000007788 liquid Substances 0.000 description 4
- 238000004140 cleaning Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Cleaning Or Drying Semiconductors (AREA)
Description
【発明の詳細な説明】
[産業上の利用分野]
本発明は薄板状物体の回転装置に関するもので
あり、更に詳しくは、周縁部の一部に切欠部を有
する円形の薄板状物体を、一対の円弧状の保持具
を用いることにより、切欠部の位置にかかわらず
確実かつ正確に保持できるようにしたものであ
る。Detailed Description of the Invention [Industrial Application Field] The present invention relates to a device for rotating a thin plate-like object, and more specifically, the present invention relates to a rotating device for a thin plate-like object. By using an arc-shaped holder, the notch can be held reliably and accurately regardless of its position.
[従来の技術]
薄板状物体としての例えばウエハは、半導体製
品の製造過程においてその洗浄後ウエハの表裏面
を同時に乾燥させる場合、あるいは表裏面にレジ
ストを塗布する場合、第3図に示す如くウエハ1
の周縁部を3個ないし4個のV字溝付きローラ状
保持具2で保持し、この状態でウエハ1をその中
心まわりに回転させている。[Prior Art] For example, when a wafer as a thin plate-like object is dried in the process of manufacturing a semiconductor product and the front and back surfaces of the wafer are simultaneously dried, or when a resist is applied to the front and back surfaces, the wafer is heated as shown in FIG. 1
The peripheral edge of the wafer 1 is held by three or four V-shaped grooved roller-shaped holders 2, and in this state the wafer 1 is rotated around its center.
[発明が解決しようとする問題点]
ところで、ウエハ1の周縁部の一部には結晶方
向を示すオリエンテーシヨンフラツトという切欠
部3が形成されており、上述した従来の回転装置
においては、搬送ラインにより搬送されてきたウ
エハ1が回転装置にセツトされたとき、上記切欠
部3が保持具2のところにくる場合がある。この
ように切欠部3が保持具2のところにくると、ウ
エハ1の保持状態が不確実となり、ウエハ1の中
心が回転中心からずれるおそれがある。そしてこ
のような位置ずれは回転にともない振動や騒音を
発生する原因になるとともに、保持具2とウエハ
1との摩擦を惹起し、これにより生じたゴミがウ
エハ1を汚染するという問題を生じていた。ま
た、ウエハ1の振動は回転装置のスピンドルやモ
ータ等の寿命を短縮するおそれもある。[Problems to be Solved by the Invention] By the way, a notch 3 called an orientation flat indicating the crystal direction is formed in a part of the peripheral edge of the wafer 1. When the wafer 1 transported by the transport line is set on the rotating device, the notch 3 may come to the holder 2. When the notch 3 comes to the holder 2 in this manner, the state in which the wafer 1 is held becomes uncertain, and there is a risk that the center of the wafer 1 may deviate from the center of rotation. Such positional misalignment not only causes vibration and noise as it rotates, but also causes friction between the holder 2 and the wafer 1, causing the problem that the generated dust contaminates the wafer 1. Ta. Further, the vibration of the wafer 1 may shorten the life of the spindle, motor, etc. of the rotating device.
なお、切欠部3が保持具2のところにこないよ
うに、ウエハ1の位置決め機構を備えているもの
もあるが、この場合は装置が複雑化するという問
題がある。 Note that some devices are equipped with a positioning mechanism for the wafer 1 so that the notch 3 does not reach the holder 2, but in this case there is a problem that the device becomes complicated.
本発明の目的は、このような従来技術の問題点
に鑑み、周縁部の一部に切欠部を有する円形の薄
板状物体を確実に、且つ安定的に保持し、薄板状
物体を回転させている際に、振動や騒音が発生せ
ず、保持具と保持されている物体の摩擦によりゴ
ミが発生したりするおそれのない、薄板状物体の
回転装置を提供することにある。 In view of the problems of the prior art, an object of the present invention is to reliably and stably hold a circular thin plate-like object having a notch in a part of its periphery, and to rotate the thin plate-like object. To provide a device for rotating a thin plate-like object, which does not generate vibration or noise and is free from the possibility of generating dust due to friction between a holder and the object being held.
[問題点を解決するための手段]
上記目的を達成するため本発明においては、周
縁部の一部に切欠部を有する円形の薄板状物体を
回転させる回転装置において、前記薄板状物体を
回転させる際に前記薄板状物体を保持する一対の
保持具に、前記薄板状物体の切欠部を含んで前記
薄板状物体の周縁部に当接可能な長さを有する円
弧状の溝部をそれぞれ設け、前記保持具を回転さ
せる回転軸の半径方向に前記保持具を移動させて
前記保持具の溝部を前記薄板状物体の周縁部にそ
れぞれ押付けることにより、前記薄板状物体を前
記保持具で保持すると共に、前記保持具のそれぞ
れには前記溝部から外側面に向けて貫通された孔
を設けるようにしている。[Means for Solving the Problems] In order to achieve the above object, the present invention provides a rotating device for rotating a circular thin plate-like object having a notch in a part of the peripheral edge, which rotates the thin plate-like object. In this case, a pair of holders for holding the thin plate-like object are each provided with an arc-shaped groove portion having a length that includes the notch of the thin plate-like object and can come into contact with the peripheral edge of the thin plate-like object, and The thin plate-shaped object is held by the holder by moving the holder in the radial direction of a rotating shaft for rotating the holder and pressing the grooves of the holder against the peripheral edges of the thin plate-shaped object, respectively. Each of the holders is provided with a hole extending from the groove toward the outer surface.
[作用]
この構成において、薄板状物体の切欠部が保持
具のところに位置しても、保持具は薄板状物体の
切欠部を含む周縁部に当接可能な長さの円弧状の
溝部を有し、これによって保持されるので、薄板
状物体は確実に、且つ安定的に保持される。した
がって、振動や騒音が発生したり、保持具と保持
されている物体の摩擦によりゴミが発生したりす
るおそれなく薄板状物体は回転される。しかも、
保持具には溝部から外側面に向けて貫通された孔
が設けられているため、薄板状物体の表面に液体
が付着しているような場合は、その貫通孔を介し
て液体が排除され、物体の乾燥は支障なく行なわ
れる。即ち、周縁部の一部に切欠部を有する円形
の薄板状物体の乾燥が、該物体を回転させること
により、確実に行なわれる。[Function] In this configuration, even if the notch of the thin plate-like object is located at the holder, the holder has an arc-shaped groove with a length that can come into contact with the peripheral edge including the notch of the thin plate-like object. Since the thin plate-like object is held by this, the thin plate-like object is held reliably and stably. Therefore, the thin plate-like object can be rotated without fear of generating vibrations or noise or generating dust due to friction between the holder and the object being held. Moreover,
The holder is provided with a hole that extends from the groove toward the outer surface, so if liquid adheres to the surface of the thin plate-like object, the liquid is removed through the through hole. Drying of the object takes place without any problems. That is, by rotating the circular thin plate-shaped object having a notch in a part of the peripheral edge, the drying can be performed reliably.
[実施例]
以下、具体的に図面を用いて実施例を説明す
る。[Examples] Examples will be specifically described below with reference to the drawings.
第1図および第2図は、本発明に従つて構成し
たウエハ(薄板状物体)1の回転装置であつて、
同図において7は一対の円弧状の保持具であり、
この一対の保持具7はそれぞれL字状のスライド
シヤフト8の先端部に取付けられている。スライ
ドシヤフト8の基端部は、回転軸9の上端部に対
して半径方向に摺動可能に取付けられており、図
示しない操作装置の操作によつてスライドシヤフ
ト8が半径方向に移動するように構成されてい
る。 1 and 2 show a rotating device for a wafer (thin plate-like object) 1 constructed according to the present invention,
In the figure, 7 is a pair of arc-shaped holders,
The pair of holders 7 are each attached to the tip of an L-shaped slide shaft 8. The base end of the slide shaft 8 is attached to the upper end of the rotating shaft 9 so as to be slidable in the radial direction, so that the slide shaft 8 can be moved in the radial direction by operating an operating device (not shown). It is configured.
保持具7は、詳しくはその内側面にV字状の溝
部10が長手方向に沿つて形成されており、この
溝部10をウエハ1の周縁部に押付けてウエハ1
を保持できるようになつている。また保持具7の
長さは、第1図に示す如く切欠部3を含むウエハ
1の周縁部に当接可能な長さで構成されている。
なお、保持具7にはその溝部10から外側面にか
けて複数の液抜き孔11が等間隔に形成されてお
り、ウエハ1表面の洗浄液が遠心力によつてこれ
ら液抜き孔11から半径方向外方にスムーズに排
出されるように構成されている。 More specifically, the holder 7 has a V-shaped groove 10 formed along its longitudinal direction on its inner surface, and the groove 10 is pressed against the peripheral edge of the wafer 1 to hold the wafer 1.
It is now possible to hold. The length of the holder 7 is such that it can come into contact with the peripheral edge of the wafer 1 including the notch 3, as shown in FIG.
A plurality of drain holes 11 are formed in the holder 7 at equal intervals from the groove 10 to the outer surface, and the cleaning liquid on the surface of the wafer 1 is drained radially outward from these drain holes 11 by centrifugal force. The structure is such that it can be discharged smoothly.
以上のような構成を有するウエハ1の回転装置
において、ウエハ搬送ライン(図示せず。)によ
つて搬送されてきたウエハ1は、一対の保持具7
の間にセツトされ、その後スライドシヤフト8を
半径方向内方に移動させることにより、一対の保
持具7の溝部10がウエハ1の周縁部に押付けら
れてウエハ1が保持される。 In the wafer 1 rotation apparatus having the above-described configuration, the wafer 1 transported by the wafer transport line (not shown) is held between the pair of holders 7
By moving the slide shaft 8 radially inward, the grooves 10 of the pair of holders 7 are pressed against the peripheral edge of the wafer 1, and the wafer 1 is held.
この際、ウエハ1が一対の保持具7の間にセッ
トされた状態でたとえウエハ1の切欠部3が保持
具7のところにきていても、切欠部3の両側の周
縁部が保持具7に当接するので、ウエハ1が確実
かつ正確に保持され、いわゆる心ずれを起こす心
配がない。 At this time, even if the notch 3 of the wafer 1 is at the holder 7 when the wafer 1 is set between the pair of holders 7, the peripheral edges on both sides of the notch 3 are Since the wafer 1 is in contact with the wafer 1, the wafer 1 is held securely and accurately, and there is no fear of so-called misalignment.
このようにして保持されたウエハ1は、回転に
よる遠心乾燥ないしレジスト塗布を行なつた後、
スライドシヤフト8を半径方向外方に移動させて
一対の保持具7を開き、搬送ラインに送られる。
なお、搬送ラインとしてはベルト、真空吸着ハン
ド、エアーベアリングまたはウオータベアリング
等の搬送手段を利用できる。 The wafer 1 held in this manner is subjected to centrifugal drying by rotation or resist coating, and then
The slide shaft 8 is moved radially outward to open the pair of holders 7 and sent to the conveying line.
Note that as the conveyance line, conveyance means such as a belt, a vacuum suction hand, an air bearing, or a water bearing can be used.
以上、本発明の一実施例につき述べたが、本発
明はウエハ1以外の薄板状物体の回転装置にも適
用可能である。 Although one embodiment of the present invention has been described above, the present invention is also applicable to devices for rotating thin plate-like objects other than the wafer 1.
[発明の効果]
以上説明したように本発明によれば、薄板状物
体の切欠部を含む周縁部に当節可能な長さの円弧
状の溝部を有しかつその溝部から外側面に向けて
貫通孔を有する保持具によつて薄板状物体を保持
するようにしたため、薄板状物体を確実且つ安定
的に保持し、振動や騒音の発生および摩擦による
塵埃の発生のおそれなく薄板状物体を回転させる
ことができ、しかも薄板状物体を乾燥させる場合
には、貫通孔を介して液体が排除され、乾燥を支
障なく行なうことができる。[Effects of the Invention] As explained above, according to the present invention, the thin plate-shaped object has an arc-shaped groove portion of a length that can be connected to the peripheral edge including the notch portion, and the groove portion extends from the groove portion toward the outer surface. Since the thin plate-shaped object is held by a holder with a through hole, the thin plate-shaped object can be held securely and stably, and the thin plate-shaped object can be rotated without the fear of generating vibrations, noise, or dust due to friction. Moreover, when drying a thin plate-like object, the liquid is expelled through the through-hole, and drying can be carried out without any problem.
第1図は本発明に従って構成したウエハの回転
装置の平面図、第2図は第1図の−線矢視断
面図、第3図は従来のウエハの回転装置の平面図
である。
1……ウエハ、3……切欠部、7……保持具、
8……スライドシヤフト、9……回転軸。
FIG. 1 is a plan view of a wafer rotation device constructed according to the present invention, FIG. 2 is a sectional view taken along the line -- in FIG. 1, and FIG. 3 is a plan view of a conventional wafer rotation device. 1... Wafer, 3... Notch, 7... Holder,
8...Slide shaft, 9...Rotary shaft.
Claims (1)
物体を回転させる回転装置において、前記薄板状
物体を回転させる際に前記薄板状物体を保持する
一対の保持具に、前記薄板状物体の切欠部を含ん
で前記薄板状物体の周縁部に当接可能な長さを有
する円弧状の溝部をそれぞれ設け、前記保持具を
回転させる回転軸の半径方向に前記保持具を移動
させて前記保持具の溝部を前記薄板状物体の周縁
部にそれぞれ押付けることにより、前記薄板状物
体を前記保持具で保持すると共に、前記保持具の
それぞれには前記溝部から外側面に向けて貫通さ
れた孔を設けたことを特徴とする薄板状物体の回
転装置。1. In a rotating device for rotating a circular thin plate-like object having a notch in a part of the peripheral edge, a pair of holders that hold the thin plate-like object when rotating the thin plate-like object are provided with a pair of holders for holding the thin plate-like object. An arc-shaped groove portion including a notch portion and having a length capable of coming into contact with the peripheral edge of the thin plate-like object is provided, and the holding device is moved in a radial direction of a rotation axis for rotating the holding device to hold the holding device. By pressing the grooves of the tool against the peripheral edges of the thin plate-like object, the thin plate-like object is held by the holder, and each of the holders has a hole penetrated from the groove toward the outer surface. A rotating device for a thin plate-like object, characterized in that it is provided with a.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP26750885A JPS62128142A (en) | 1985-11-29 | 1985-11-29 | Rotating device for thin plate objects |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP26750885A JPS62128142A (en) | 1985-11-29 | 1985-11-29 | Rotating device for thin plate objects |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62128142A JPS62128142A (en) | 1987-06-10 |
| JPH03785B2 true JPH03785B2 (en) | 1991-01-08 |
Family
ID=17445814
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP26750885A Granted JPS62128142A (en) | 1985-11-29 | 1985-11-29 | Rotating device for thin plate objects |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62128142A (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7350315B2 (en) * | 2003-12-22 | 2008-04-01 | Lam Research Corporation | Edge wheel dry manifold |
| JP5042655B2 (en) * | 2007-02-08 | 2012-10-03 | 昭和電工株式会社 | Substrate drying device and holder |
| JP6376778B2 (en) * | 2014-03-04 | 2018-08-22 | 株式会社Screenホールディングス | Substrate processing equipment |
-
1985
- 1985-11-29 JP JP26750885A patent/JPS62128142A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS62128142A (en) | 1987-06-10 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |