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JPH0381282B2 - - Google Patents
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JPH0381282B2 - - Google Patents

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Publication number
JPH0381282B2
JPH0381282B2 JP56060245A JP6024581A JPH0381282B2 JP H0381282 B2 JPH0381282 B2 JP H0381282B2 JP 56060245 A JP56060245 A JP 56060245A JP 6024581 A JP6024581 A JP 6024581A JP H0381282 B2 JPH0381282 B2 JP H0381282B2
Authority
JP
Japan
Prior art keywords
tcnq salt
tcnq
salt
substrate
temperature
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP56060245A
Other languages
Japanese (ja)
Other versions
JPS57173932A (en
Inventor
Shinichi Niwa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sanyo Electric Co Ltd
Original Assignee
Sanyo Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sanyo Electric Co Ltd filed Critical Sanyo Electric Co Ltd
Priority to JP56060245A priority Critical patent/JPS57173932A/en
Publication of JPS57173932A publication Critical patent/JPS57173932A/en
Publication of JPH0381282B2 publication Critical patent/JPH0381282B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass

Landscapes

  • Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
  • Apparatuses And Processes For Manufacturing Resistors (AREA)
  • Thermistors And Varistors (AREA)
  • Bipolar Transistors (AREA)

Description

【発明の詳細な説明】 本発明は有機半導体物質の処理方法に関する。[Detailed description of the invention] The present invention relates to a method for processing organic semiconductor materials.

この種物質は原理的に任意の形状に成形し得る
ので、例えば感温抵抗体材料、固体電解コンデン
サ用固体電解質材料、電池用固体電解質材料等と
して種々の分野への応用が期待されている。
Since this type of material can be formed into any shape in principle, it is expected to be applied in various fields, such as as a temperature-sensitive resistor material, a solid electrolyte material for solid electrolytic capacitors, a solid electrolyte material for batteries, etc.

特に本発明はTCNQ塩を固体電解コンデンサ
用固体電解質材料以外のもの、例えば前述の如く
感温抵抗体材料や電池用固体電解質材料等に適用
する際に用いて好適な処理方法を提供するもので
ある。
In particular, the present invention provides a treatment method suitable for applying TCNQ salt to materials other than solid electrolyte materials for solid electrolytic capacitors, such as temperature-sensitive resistor materials and solid electrolyte materials for batteries as described above. be.

有機半導体のうちで特に高電導度の有機半導体
として有名なものにTCNQ塩がある。ここに
TCNQとは7,7,8,8,テトラシアノキノ
ジメタンの略称であり、TCNQやTCNQ塩の性
質についてはJ.Am.Chem.Soc.、Vol.84、pp3377
〜3387(1962)に記載されている。
Among organic semiconductors, TCNQ salt is famous as an organic semiconductor with particularly high conductivity. Here
TCNQ is an abbreviation for 7,7,8,8,tetracyanoquinodimethane, and the properties of TCNQ and TCNQ salts can be found in J.Am.Chem.Soc., Vol.84, pp3377
~3387 (1962).

しかし乍ら、TCNQ塩は通常粉末状の結晶で
あり、その結晶自体高い電導度を示すものの、粉
末状であるがためにその成形に難がある。
However, TCNQ salt is usually a powdery crystal, and although the crystal itself exhibits high electrical conductivity, it is difficult to mold it because of its powdery state.

従来、提案されたTCNQ塩の成形方法は次の
3つに分類できる。
Conventionally proposed methods for forming TCNQ salt can be classified into the following three types.

(1) DMF(ジメチルホルムアミド)などの溶媒に
TCNQ塩を溶かした溶液を所定形状の基板に
塗布し、その後乾燥させて溶媒を飛散除去する
方法。
(1) In solvents such as DMF (dimethylformamide)
A method in which a solution containing TCNQ salt is applied to a substrate of a specified shape, and then dried to remove the solvent by scattering.

(2) TCNQ塩をボールミル等により微細化した
結晶をアルコール等に分散せしめ、それを上記
基板に塗布し乾燥する方法。
(2) A method in which fine crystals of TCNQ salt are made using a ball mill or the like and dispersed in alcohol, etc., and then applied to the above substrate and dried.

(3) TCNQ塩を上記基板に真空蒸着する方法。(3) A method of vacuum evaporating TCNQ salt onto the above substrate.

上記(1)の方法では、TCNQ塩に対する溶解度
の高いDMFを溶媒に用い、斯る溶媒を例えば100
℃に加熱したとしても、その溶解度は10%が限度
である。このことは平坦な基板に必要なだけの厚
みのTCNQ塩を付着したり、あるいは多孔質基
板にTCNQ塩を十分含浸的に付着するには何度
も塗布、乾燥を繰り返す必要のあることを意味し
ている。更に溶液を塗布した基板は上記乾燥の度
に高温中に放置されるが、このとき多かれ少なか
れTCNQ塩の変質が起こり、その電導度劣化を
招く。加えて、この様にして基板に付着形成され
るTCNQ塩は微細結晶からなるため、実際には
塗布溶液中にポリビニルピロリドンなどの凝固用
樹脂が添加されて上記微細結晶の付着強度の強化
が図られるが、斯る凝固用樹脂は電気的絶縁物で
あるため、上記電導度劣化と相俟つてTCNQ塩
の電導度を更に低いもの(800Ωcm程度〔25℃〕)
となす。
In method (1) above, DMF, which has high solubility for TCNQ salt, is used as a solvent, and such a solvent is
Even when heated to ℃, its solubility is limited to 10%. This means that it is necessary to apply and dry the TCNQ salt many times to apply the necessary thickness to a flat substrate, or to apply the TCNQ salt to a porous substrate with sufficient impregnation. are doing. Furthermore, the substrate coated with the solution is left at high temperatures each time it is dried, but at this time the TCNQ salt changes in quality to a greater or lesser extent, leading to deterioration of its conductivity. In addition, since the TCNQ salt deposited on the substrate in this way consists of fine crystals, a coagulating resin such as polyvinylpyrrolidone is actually added to the coating solution to strengthen the adhesion strength of the fine crystals. However, since such a coagulating resin is an electrical insulator, the conductivity of the TCNQ salt is even lower (approximately 800 Ωcm [at 25°C]), coupled with the deterioration of the conductivity described above.
Nasu.

上記(2)の方法では、TCNQ塩の微細化にも限
界があり、基板への付着強度が特に弱いので、基
板からTCNQ塩がはがれたりする。この付着強
度の強化は、上に述べた様に凝固用樹脂の採用に
よりある程度改善されるが、同様にTCNQ塩の
電導度の低下を招く。又、TCNQ塩からなる微
細結晶の分散溶液を用いるので、特に多孔質基板
への含浸率が悪く、超音波拡散含浸法を用いたと
してもその含浸率は低い。
In method (2) above, there is a limit to the miniaturization of the TCNQ salt, and the adhesion strength to the substrate is particularly weak, so the TCNQ salt may peel off from the substrate. This enhancement of adhesive strength can be improved to some extent by employing a coagulating resin as described above, but this also results in a decrease in the electrical conductivity of the TCNQ salt. Furthermore, since a dispersion solution of fine crystals made of TCNQ salt is used, the impregnation rate into a porous substrate is particularly poor, and even if an ultrasonic diffusion impregnation method is used, the impregnation rate is low.

上記(3)の方法では、真空蒸着作業の煩雑さはも
とより、特に多孔質基板への付着には全く不向き
である。
In the method (3) above, not only is the vacuum evaporation work complicated, but it is also completely unsuitable for attachment to porous substrates.

本発明は有機半導体物質の全く新規な処理方
法、より具体的には、TCNQ塩のみからなる液
体を作り出し、斯る液体を冷却固化する方法を提
供するもので、上記液体を所定形状の基板に接触
した状態で冷却固化させることにより任意形状の
TCNQ塩からなる半導体物質を得ることができ
る。
The present invention provides a completely new method for processing organic semiconductor materials, more specifically, a method for producing a liquid consisting only of TCNQ salt, cooling and solidifying the liquid, and applying the liquid to a substrate of a predetermined shape. By cooling and solidifying in contact, any shape can be formed.
A semiconductor material consisting of TCNQ salt can be obtained.

TCNQ塩のみからなる液体を得る最も実際的
な方法は、当初の形態である粉末状TCNQ塩を
加熱融解により液化することである。しかし乍ら
単なるTCNQ塩の加熱融解は、TCNQ塩を熱分
解してほとんど電気的絶縁物と化する。
The most practical way to obtain a liquid consisting only of TCNQ salt is to liquefy the powdered TCNQ salt in its original form by heating and melting it. However, simply heating and melting the TCNQ salt thermally decomposes the TCNQ salt and turns it into almost an electrical insulator.

本発明は、ある種のTCNQ塩、具体的には、
N−(イソプロピル)−キノリニウムやN−(n−
プロピル)−キノリニウムのTCNQ塩は加熱融解
しても、熱分解するまでに短時間ではあるが付着
作業にとつては十分な時間的余裕を呈し、従つて
斯る時間内に冷却固化すれば高い電導度を保持す
るTCNQ塩を得られるという全く新しい知見に
基づいている。
The present invention provides certain TCNQ salts, specifically:
N-(isopropyl)-quinolinium and N-(n-
Even if the TCNQ salt of quinolinium (propyl)-quinolinium is heated and melted, it takes a short time to thermally decompose, but there is enough time for the adhesion process. This is based on the completely new finding that it is possible to obtain TCNQ salts that retain their electrical conductivity.

即ち、N−(イソプロピル)−キノリニウム やN−(n−プロピル)−キノリニウム のTCNQ塩は約250℃で融解するが、融解後約1
分以内、好ましくは約20秒以内に冷却固化すれば
再度結晶化し、20〜30Ωcm(25℃)の高い電導度
を示す。尚、このとき、TCNQ塩はそれが液化
されてから冷却固化されるまでの間、約270℃以
下の温度に維持することが好ましい。約270℃以
上の温度で、又はその温度以下でも約1分以上、
最悪の場合約20秒以上の間上記TCNQ塩を液体
状態に保持すれば、TCNQ塩は激しく発煙し、
ほぼ電気的絶縁物となる。
That is, N-(isopropyl)-quinolinium and N-(n-propyl)-quinolinium TCNQ salt melts at about 250℃, but after melting about 1
If it is cooled and solidified within minutes, preferably within about 20 seconds, it will crystallize again and exhibit a high electrical conductivity of 20 to 30 Ωcm (25°C). At this time, it is preferable to maintain the TCNQ salt at a temperature of about 270° C. or lower from when it is liquefied until it is cooled and solidified. At a temperature of about 270℃ or more, or for about 1 minute or more at a temperature below that temperature,
In the worst case scenario, if the above TCNQ salt is kept in a liquid state for more than 20 seconds, the TCNQ salt will smoke violently.
Almost becomes an electrical insulator.

本発明により成形されたTCNQ塩は上記従来
法(1)や(2)の場合の如き微細結晶の集まりではな
く、ほぼ非晶質状態に近い。
The TCNQ salt formed according to the present invention is not a collection of fine crystals as in the case of the conventional methods (1) and (2), but is almost in an amorphous state.

本発明によれば、TCNQ塩を100%溶解した溶
液により基板へのTCNQ塩の付着をなすのと同
じことであるから、上記従来方法(1)とは全く異な
り、ほとんど1回の付着作業で、基板が箔状のみ
ならず多孔質の場合でも、必要な量のTCNQ塩
を形成することができ、量産性の向上はもとよ
り、乾燥の度にTCNQ塩が劣化するといつた従
来の欠点が克服される。更に、本発明によれば、
成形されたTCNQ塩は非晶質状態に近いから、
基板への付着力が十分大きく、従つて従来の如き
凝固用樹脂を用いる必要がなく、TCNQ塩の不
所望な電導度の低下を避けることができる。
According to the present invention, it is the same as attaching TCNQ salt to the substrate using a solution containing 100% TCNQ salt, so it is completely different from the conventional method (1) described above, and almost all the attaching work is done in one time. , it is possible to form the required amount of TCNQ salt even when the substrate is not only foil-like but also porous, which not only improves mass productivity but also overcomes the conventional drawback that TCNQ salt deteriorates every time it is dried. be done. Furthermore, according to the present invention,
Because the shaped TCNQ salt is close to an amorphous state,
The adhesion force to the substrate is sufficiently large, so that there is no need to use a conventional coagulating resin, and an undesired decrease in the conductivity of the TCNQ salt can be avoided.

以下本発明の処理方法の一例を説明する。まず
N−(イソプロピル)−キノリニウムのTCNQ塩
が準備される。斯るTCNQ塩の作成自体は前掲
の文献J.Am.Chem.Soc.、Vol.84、pp3374〜3387
(1962)の記載に基いて行えるが、簡単に述べれ
ば、ヨウ化イソプロピルとキノリンとを反応させ
てN−(イソプロピル)−キノリニウムヨウドを作
成すると共に、アセトニトリルにTCNQを溶か
したものを用意し、これらをほぼ等モル反応させ
ることにより粉末結晶状のN−(イソプロピル)−
キノリニウムのTCNQ塩が作られる。以後この
塩を単にTCNQ塩と称す。
An example of the processing method of the present invention will be explained below. First, a TCNQ salt of N-(isopropyl)-quinolinium is prepared. The preparation of such TCNQ salt itself is described in the above-mentioned document J.Am.Chem.Soc., Vol.84, pp3374-3387.
(1962), but to put it simply, isopropyl iodide and quinoline are reacted to create N-(isopropyl)-quinolinium iodide, and TCNQ is dissolved in acetonitrile. By reacting these in approximately equimolar amounts, powdered crystalline N-(isopropyl)-
The TCNQ salt of quinolinium is produced. Hereinafter, this salt will be simply referred to as TCNQ salt.

一方、基台の一例として多孔質基板を使用する
例について説明する。第1図に示す如く、アルミ
ニウム粉末の焼結体を陽極酸化処理し、酸化皮膜
を有する皮膜形成性金属としての多孔質基台1が
作成される。
On the other hand, an example in which a porous substrate is used as an example of a base will be described. As shown in FIG. 1, a porous base 1 as a film-forming metal having an oxide film is prepared by anodizing a sintered body of aluminum powder.

上記準備の後、実行される工程は、基台1に
TCNQ塩からなる固体電解質を含浸付着するこ
とである。即ち、準備されている粉末状の
TCNQ塩を第2図に示す如くアルミニウム容器
2に適度の加圧下で収納し、容器2を加熱するこ
とにより融解液化したTCNQ塩浴3が設けられ
る。この浴の温度は270℃以下に保持される。尚、
アルミニウム容器2へのTCNQ塩収納時の加圧
は本質的なものではない。
After the above preparation, the process to be executed is to
It is deposited by impregnation with a solid electrolyte consisting of TCNQ salt. That is, the prepared powder
As shown in FIG. 2, a TCNQ salt bath 3 is provided in which TCNQ salt is stored under moderate pressure in an aluminum container 2 and melted and liquefied by heating the container 2. The temperature of this bath is maintained below 270°C. still,
Pressurization when storing TCNQ salt in the aluminum container 2 is not essential.

続く工程では、第3図に示す如く、予め260℃
〜270℃に加熱保持されている基台1をTCNQ塩
浴3に漬浸し、直ちに引き上げて、室温下で放置
する。これにより、多孔質の基台1に含浸した
TCNQ塩が冷却固化し、目的の固体電解質とな
る。上記TCNQ塩の液化から冷却固化までの所
要時間は10秒程度である。
In the following process, as shown in Figure 3, the temperature is preliminarily heated to 260℃.
The base 1 heated and maintained at ~270°C is immersed in the TCNQ salt bath 3, immediately pulled up, and left at room temperature. This allows the porous base 1 to be impregnated with
The TCNQ salt solidifies on cooling and becomes the desired solid electrolyte. The time required from liquefaction to cooling solidification of the TCNQ salt is about 10 seconds.

次に本発明の実施例として、感温抵抗体を製造
する場合を説明する。まず第4図に示す如く、ガ
ラス基板10を準備し、斯る基板を第2図と同様
にTCNQ塩浴3に浸漬し、直ちに引上げて、室
温下で放置する。これにより第5図に示す如く、
基板10周囲にTCNQ塩からなる有機半導体膜
11が付着する。上記TCNQ塩浴3の保持温度
やTCNQ塩の液化から冷却固化までの時間は上
記処理の一例と同様である。
Next, as an example of the present invention, a case of manufacturing a temperature-sensitive resistor will be described. First, as shown in FIG. 4, a glass substrate 10 is prepared, and the substrate is immersed in the TCNQ salt bath 3 in the same manner as in FIG. 2, immediately taken out, and left at room temperature. As a result, as shown in Figure 5,
An organic semiconductor film 11 made of TCNQ salt is attached around the substrate 10. The holding temperature of the TCNQ salt bath 3 and the time from liquefaction to cooling solidification of the TCNQ salt are the same as in the above treatment example.

次いで、有機半導体膜11を有する基板10を
第6図に示す如く、通常の銅プリント回路12を
有する樹脂基板13上に固着するとともに、有機
半導体膜11の両端と銅プリント回路12とを導
電性塗料14にて結合し、目的とする感温抵抗体
が完成する。第7図に斯る抵抗体の温度特性を示
す。
Next, as shown in FIG. 6, the substrate 10 having the organic semiconductor film 11 is fixed onto a resin substrate 13 having an ordinary copper printed circuit 12, and both ends of the organic semiconductor film 11 and the copper printed circuit 12 are made conductive. They are bonded with paint 14, and the desired temperature-sensitive resistor is completed. FIG. 7 shows the temperature characteristics of such a resistor.

以上の説明より明らかな如く、本発明によれ
ば、TCNQ塩からなる有機半導体を所定形状の
感温抵抗体等の基体に容易に付着することがで
き、かつ斯る付着作業時にTCNQ塩の劣化もほ
とんど伴わない。
As is clear from the above description, according to the present invention, an organic semiconductor made of TCNQ salt can be easily attached to a substrate such as a temperature-sensitive resistor of a predetermined shape, and the deterioration of TCNQ salt can be avoided during the attachment process. There is almost no accompanying

【図面の簡単な説明】[Brief explanation of drawings]

第1図乃至第3図は本発明を説明する工程別図
であり、第1図は側面図、第2図および第3図は
断面図である。第4図乃至第6図は本発明の実施
例を示す工程別断面図、第7図は温度特性図であ
る。 3……TCNQ塩浴、11……有機半導体膜。
1 to 3 are step-by-step diagrams for explaining the present invention, with FIG. 1 being a side view, and FIGS. 2 and 3 being sectional views. FIG. 4 to FIG. 6 are cross-sectional views showing each process according to an embodiment of the present invention, and FIG. 7 is a temperature characteristic diagram. 3...TCNQ salt bath, 11...Organic semiconductor film.

Claims (1)

【特許請求の範囲】 1 (a) 容器に加熱融解可能なTCNQ塩を収納
し、該TCNQ塩を加熱して融解液化し、 (b) 該TCNQ塩を融解点以上で且つ熱分解する
熱分解温度より低い温度に保持してTCNQ塩
浴を作り、 (c) 基体を該TCNQ塩浴に浸漬し、該TCNQ塩
が熱分解するまでの時間内に該基体上の
TCNQ塩を冷却固化することを特徴とする有
機半導体物質の処理方法。
[Scope of Claims] 1 (a) Storing TCNQ salt that can be melted by heating in a container and heating the TCNQ salt to melt and liquefy it; (b) Pyrolysis in which the TCNQ salt is thermally decomposed above its melting point. (c) immersing a substrate in the TCNQ salt bath and depositing the salt on the substrate within a period of time until the TCNQ salt thermally decomposes;
A method for processing an organic semiconductor material, characterized by cooling and solidifying TCNQ salt.
JP56060245A 1981-04-20 1981-04-20 Treatment of organic semiconductor substance Granted JPS57173932A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56060245A JPS57173932A (en) 1981-04-20 1981-04-20 Treatment of organic semiconductor substance

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56060245A JPS57173932A (en) 1981-04-20 1981-04-20 Treatment of organic semiconductor substance

Publications (2)

Publication Number Publication Date
JPS57173932A JPS57173932A (en) 1982-10-26
JPH0381282B2 true JPH0381282B2 (en) 1991-12-27

Family

ID=13136590

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56060245A Granted JPS57173932A (en) 1981-04-20 1981-04-20 Treatment of organic semiconductor substance

Country Status (1)

Country Link
JP (1) JPS57173932A (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6190413A (en) * 1984-10-11 1986-05-08 日本ケミコン株式会社 Casing of electrolytic capacitor

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ZA804914B (en) * 1979-08-29 1981-08-26 Rohm & Haas The production of powdered resin and the powdered resin so produced

Also Published As

Publication number Publication date
JPS57173932A (en) 1982-10-26

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