JPH0421259B2 - - Google Patents
Info
- Publication number
- JPH0421259B2 JPH0421259B2 JP2312984A JP2312984A JPH0421259B2 JP H0421259 B2 JPH0421259 B2 JP H0421259B2 JP 2312984 A JP2312984 A JP 2312984A JP 2312984 A JP2312984 A JP 2312984A JP H0421259 B2 JPH0421259 B2 JP H0421259B2
- Authority
- JP
- Japan
- Prior art keywords
- reflective film
- drying chamber
- disk
- digital signal
- resin substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000001035 drying Methods 0.000 claims description 15
- 230000003068 static effect Effects 0.000 claims description 4
- 239000011347 resin Substances 0.000 description 19
- 229920005989 resin Polymers 0.000 description 19
- 239000000758 substrate Substances 0.000 description 19
- 239000004065 semiconductor Substances 0.000 description 4
- 238000004544 sputter deposition Methods 0.000 description 4
- 238000003860 storage Methods 0.000 description 4
- 229910052786 argon Inorganic materials 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 238000007791 dehumidification Methods 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000005566 electron beam evaporation Methods 0.000 description 1
- 230000008030 elimination Effects 0.000 description 1
- 238000003379 elimination reaction Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000007733 ion plating Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000005240 physical vapour deposition Methods 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B23/00—Record carriers not specific to the method of recording or reproducing; Accessories, e.g. containers, specially adapted for co-operation with the recording or reproducing apparatus ; Intermediate mediums; Apparatus or processes specially adapted for their manufacture
- G11B23/0057—Intermediate mediums, i.e. mediums provided with an information structure not specific to the method of reproducing or duplication such as matrixes for mechanical pressing of an information structure ; record carriers having a relief information structure provided with or included in layers not specific for a single reproducing method; apparatus or processes specially adapted for their manufacture
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B23/00—Record carriers not specific to the method of recording or reproducing; Accessories, e.g. containers, specially adapted for co-operation with the recording or reproducing apparatus ; Intermediate mediums; Apparatus or processes specially adapted for their manufacture
- G11B23/50—Reconditioning of record carriers; Cleaning of record carriers ; Carrying-off electrostatic charges
- G11B23/505—Reconditioning of record carriers; Cleaning of record carriers ; Carrying-off electrostatic charges of disk carriers
- G11B23/507—Reconditioning of record carriers; Cleaning of record carriers ; Carrying-off electrostatic charges of disk carriers combined with means for reducing influence of physical parameters, e.g. temperature change, moisture
Landscapes
- Manufacturing Optical Record Carriers (AREA)
Description
【発明の詳細な説明】
産業上の利用分野
本発明は、ビデオデイスク，デイジタルオーデ
イオデイスク（たとえばコンパクトデイスク），
静止画，文書フアイルなどのデイジタル信号記録
再生デイスクの反射膜作成装置に関するものであ
る。DETAILED DESCRIPTION OF THE INVENTION Field of Industrial Application The present invention is applicable to video discs, digital audio discs (such as compact discs),
This invention relates to a reflective film forming apparatus for digital signal recording and reproducing disks for still images, document files, etc.
従来例の構成とその問題点
この種のデイジタル信号記録再生デイスクは、
その情報密度が極めて大きいことや、Ｓ／Ｎ，ダ
イナミツクレンジが大きいことなど情報媒体とし
て有望視され、ビデオデイスクやデイジタルオー
デイオデイスクとして商品化されている。Conventional structure and its problems This type of digital signal recording/reproducing disk is
Due to its extremely high information density and large S/N and dynamic range, it is seen as a promising information medium, and has been commercialized as video discs and digital audio discs.
第１図に一般的なデイジタルオーデイオデイス
クであるコンパクトデイスクの概要を示す。これ
はPCM変換されたデイジタル信号が樹脂基板に
ピツト列状に記録され、半導体レーザにより再生
されるものである。第１図において１はデイスク
全体、２は樹脂基板、３は樹脂基板の表面に刻ま
れたピツト列状のデイジタル信号、４はその表面
に作成された反射膜、５は反射膜上にコーテイン
グされた保護膜、６はデイスク読取面からの再生
用の半導体レーザである。 FIG. 1 shows an overview of a compact disk, which is a common digital audio disk. In this system, a PCM-converted digital signal is recorded in a pit array on a resin substrate, and then reproduced by a semiconductor laser. In Fig. 1, 1 is the entire disk, 2 is a resin substrate, 3 is a digital signal in the form of a row of pits carved on the surface of the resin substrate, 4 is a reflective film formed on the surface, and 5 is a coating on the reflective film. 6 is a semiconductor laser for reproduction from the disk reading surface.
ここで、反射膜４はデイジタル信号３を半導体
レーザ６により再生する場合に照射光を反射させ
るために必要なものである。 Here, the reflective film 4 is necessary for reflecting the irradiated light when the digital signal 3 is reproduced by the semiconductor laser 6.
第２図に真空蒸着法を用いた従来の反射膜作成
装置を示す。 FIG. 2 shows a conventional reflective film forming apparatus using a vacuum evaporation method.
真空容器７の中に樹脂基板２を第２図ｂのよう
にトレイ８上に並べ、フイラメント９を加熱する
ことによりAlなどの金属を樹脂基板２の表面に
蒸着することにより反射膜４を作成する。 The reflective film 4 is created by arranging the resin substrates 2 on a tray 8 in a vacuum container 7 as shown in FIG. do.
この場合、樹脂基板の表面には水分が吸着して
いるのが一般的であり、除湿が完全でない場合に
Alが酸化して、反射率の低下が生じたり、膜質
が悪くなり、高温多湿下の環境（例えば、40℃，
95％など）において膜質が劣化し反射膜としての
機能を果たさないなどの問題点を有していた。 In this case, moisture is generally adsorbed on the surface of the resin substrate, and if dehumidification is not complete,
Al oxidizes, causing a decrease in reflectance and poor film quality.
(95%, etc.) had problems such as the film quality deteriorated and it did not function as a reflective film.
発明の目的
本発明はこれらの問題点を解消するものであ
り、樹脂基板の表面に吸着した水分を除去し、膜
質の優れた反射膜を作成することができるデイジ
タル信号記録再生デイスクの反射膜作成装置を提
供するものである。Purpose of the Invention The present invention is intended to solve these problems, and to create a reflective film for a digital signal recording/reproducing disk that can remove moisture adsorbed on the surface of a resin substrate and create a reflective film with excellent film quality. It provides equipment.
発明の構成
本発明は、装置内に密閉された乾燥室を設け、
上記乾燥室の中に、複数枚のデイスクを収納した
容器を入れ、高温除湿乾燥したアルゴン（Ar），
窒素（N2），または空気を導入することにより、
上記デイスクの表面に吸着した水分を除去するこ
とにより膜質の優れた反射膜を作成する装置に関
するものである。Structure of the invention The present invention provides a sealed drying chamber in the device,
A container containing multiple disks is placed in the drying chamber, and the argon (Ar)
By introducing nitrogen (N 2 ) or air,
The present invention relates to an apparatus for creating a reflective film with excellent film quality by removing moisture adsorbed on the surface of the disk.
実施例の説明
第３図に本発明のデイジタル信号記録再生デイ
スクの反射膜作成装置の一実施例を示す。反射膜
作成方法としてスパツター法を用いたもので、装
置の機構を説明するための平面図にて示す。DESCRIPTION OF EMBODIMENTS FIG. 3 shows an embodiment of an apparatus for forming a reflective film for a digital signal recording/reproducing disk according to the present invention. A sputtering method is used as a method for forming a reflective film, and a plan view is shown to explain the mechanism of the device.
樹脂基板２が、20枚程度並べられ樹脂基板収納
容器１０に入れられている。次に、この樹脂基板
収納容器１０が反射膜作成装置１１に設けられた
乾燥室１２に運ばれる。上記乾燥室にはシヤツタ
ー１３が設けられ、上記収納容器１０が入ればシ
ヤツター１３が閉じ乾燥室１２は密閉される。こ
の乾燥室内に高温除湿乾燥された80℃のドライ
N2が導入され、約10分間流すことにより、樹脂
基板２の表面に吸着した水分は完全に除去され
る。次に樹脂基板２は、反射膜作成装置１１内の
予備室１４から順次取入れられ、ターンテーブル
１５が回転し、Alターゲツト１６よりスパツタ
ーされ、樹脂基板２上に反射膜を作成し、取出室
１７より順次取出される。 Approximately 20 resin substrates 2 are arranged in a resin substrate storage container 10. Next, this resin substrate storage container 10 is transported to a drying chamber 12 provided in a reflective film forming apparatus 11. The drying chamber is provided with a shutter 13, and when the storage container 10 is placed, the shutter 13 is closed and the drying chamber 12 is hermetically sealed. This drying room is heated to 80°C and is dehumidified.
By introducing N 2 and allowing it to flow for about 10 minutes, the moisture adsorbed on the surface of the resin substrate 2 is completely removed. Next, the resin substrates 2 are sequentially taken in from the preliminary chamber 14 in the reflective film forming apparatus 11, the turntable 15 is rotated, and sputtered from the Al target 16 to form a reflective film on the resin substrates 2. are taken out sequentially.
第４図は本発明の他の実施例であり、この場合
も反射膜作成としてはスパツター法を用い、装置
の機構を説明するため第４図ａは平面図、第４図
ｂは断面図にて示す。 FIG. 4 shows another embodiment of the present invention. In this case as well, the sputtering method was used to create the reflective film. In order to explain the mechanism of the device, FIG. 4a is a plan view, and FIG. 4b is a cross-sectional view. Shown.
樹脂基板２を収納した容器１８が反射膜作成装
置１９の乾燥室２０に入る。乾燥室は密閉され、
この中に高温除湿乾燥された80℃のクリーンエア
ーが、導入装置２１より導入され、樹脂基板２の
表面に吹き当てられ、樹脂表面に吸着した水分が
完全に除去される。同時にイオン発生機構による
除電装置２２により樹脂基板は除電される。次に
スパツター室２３でAlがターゲツト２４よりス
パツターされ膜質の優れた反射膜が作成される。 The container 18 containing the resin substrate 2 enters the drying chamber 20 of the reflective film forming apparatus 19. The drying room is sealed
Clean air at a temperature of 80° C., which has been dehumidified and dried at high temperature, is introduced into the air from the introduction device 21 and blown onto the surface of the resin substrate 2, thereby completely removing moisture adsorbed on the resin surface. At the same time, the resin substrate is neutralized by a static eliminating device 22 using an ion generation mechanism. Next, in a sputtering chamber 23, Al is sputtered from a target 24 to form a reflective film with excellent film quality.
樹脂基板２を除湿させるガスとしてはAr，N2
または空気などが適切であり、反射膜作成方法と
しては、真空蒸着，スパツター，電子ビーム蒸
着，イオンプレーテイングなどの物理蒸着が適し
ている。 Ar and N 2 are used as gases to dehumidify the resin substrate 2.
Alternatively, air is suitable, and physical vapor deposition such as vacuum evaporation, sputtering, electron beam evaporation, and ion plating is suitable as a method for forming the reflective film.
発明の効果
以上のように本発明によれば、装置内に密閉さ
れた乾燥室を設け、上記乾燥室の中に複数枚のデ
イスクを収納した容器をおき、高温除湿乾燥した
Ar，N2または空気を導入することにより、デイ
スク表面に吸着した水分を除去することができる
ため酸化物の少ない膜質の優れた反射膜を作成す
ることができる。さらに除電効果により静電吸着
によるピンホールなどの無い良質の膜が得られ
る。Effects of the Invention As described above, according to the present invention, a sealed drying chamber is provided in the device, a container containing a plurality of disks is placed in the drying chamber, and the disks are dried at high temperature and dehumidified.
By introducing Ar, N 2 or air, moisture adsorbed on the disk surface can be removed, making it possible to create an excellent reflective film with less oxide content. Furthermore, due to the static elimination effect, a high-quality film without pinholes caused by electrostatic adsorption can be obtained.
本発明の高温除湿乾燥したガスによるデイスク
表面の除湿は、赤外線ヒータなどによる基板加熱
法に比べて、極めて除湿効果が優れている。 The dehumidification of the disk surface using the high-temperature dehumidifying dry gas of the present invention has an extremely superior dehumidifying effect compared to the substrate heating method using an infrared heater or the like.
また、本発明によれば、装置内に乾燥室を設け
ることにより装置の小型化と自動化，量産化を図
ることができるという効果がある。 Furthermore, according to the present invention, by providing a drying chamber within the apparatus, the apparatus can be miniaturized, automated, and mass-produced.
第１図ａ，ｂ，ｃは一般的なデイジタル信号記
録再生デイスクの平面図、断面図および要部拡大
図、第２図ａ，ｂは従来のデイジタル信号記録再
生デイスクの反射膜作成装置の断面図および樹脂
基板の取付けを示す平面図、第３図は本発明の一
実施例を示す平面図、第４図ａ，ｂは本発明の他
の実施例を示す平面図と断面図である。
１……デイスク、２……樹脂基板、３……デイ
ジタル信号、４……反射膜、５……保護膜、６…
…半導体レーザ、１０，１８……樹脂基板収納容
器、１１，１９……反射膜作成装置、１２，２０
……乾燥室、１３……シヤツター、１４……予備
室、１５……ターンテーブル、１６，２４……タ
ーゲツト、１７……取出室、２１……高温除湿乾
燥空気導入装置、２２……除電装置、２３……ス
パツター室。
Figures 1a, b, and c are a plan view, sectional view, and enlarged view of essential parts of a general digital signal recording/reproducing disk, and Figures 2a, b are a cross section of a conventional reflective film forming device for a digital signal recording/reproducing disk. FIG. 3 is a plan view showing one embodiment of the invention, and FIGS. 4a and 4b are a plan view and a sectional view showing another embodiment of the invention. DESCRIPTION OF SYMBOLS 1... Disk, 2... Resin substrate, 3... Digital signal, 4... Reflective film, 5... Protective film, 6...
...Semiconductor laser, 10,18...Resin substrate storage container, 11,19...Reflection film production device, 12,20
... Drying room, 13 ... Shutter, 14 ... Preliminary room, 15 ... Turntable, 16, 24 ... Target, 17 ... Removal chamber, 21 ... High temperature dehumidifying dry air introduction device, 22 ... Static eliminator , 23... Sputter room.
Claims (1)
室の中に、複数枚のデイスクを収納した容器を保
持する工程で、高温除湿乾燥したアルゴン
（Ar），窒素（N2）などのガスまたは空気を導入
することにより、上記デイスクの表面に吸着した
水分を除去する機構を有することを特徴とするデ
イジタル信号記録再生デイスクの反射膜作成装
置。 ２ 乾燥室内に除電装置を設けたことを特徴とす
る特許請求の範囲第１項記載のデイジタル信号記
録再生デイスクの反射膜作成装置。[Scope of Claims] 1. A sealed drying chamber is provided in the apparatus, and a container containing a plurality of discs is held in the drying chamber. 1. An apparatus for forming a reflective film for a digital signal recording/reproducing disk, comprising a mechanism for removing moisture adsorbed on the surface of the disk by introducing a gas such as N 2 ) or air. 2. An apparatus for forming a reflective film for a digital signal recording/reproducing disk according to claim 1, characterized in that a static eliminator is provided in the drying chamber.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59023129A JPS60167147A (en) | 1984-02-09 | 1984-02-09 | Reflective film creation device for digital signal recording/reproducing disks |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59023129A JPS60167147A (en) | 1984-02-09 | 1984-02-09 | Reflective film creation device for digital signal recording/reproducing disks |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS60167147A JPS60167147A (en) | 1985-08-30 |
| JPH0421259B2 true JPH0421259B2 (en) | 1992-04-09 |
Family
ID=12101908
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP59023129A Granted JPS60167147A (en) | 1984-02-09 | 1984-02-09 | Reflective film creation device for digital signal recording/reproducing disks |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS60167147A (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2542189B2 (en) * | 1986-04-19 | 1996-10-09 | 富士写真フイルム株式会社 | Radiation image reader |
-
1984
- 1984-02-09 JP JP59023129A patent/JPS60167147A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS60167147A (en) | 1985-08-30 |
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