JPH0425692B2 - - Google Patents
Info
- Publication number
- JPH0425692B2 JPH0425692B2 JP6595283A JP6595283A JPH0425692B2 JP H0425692 B2 JPH0425692 B2 JP H0425692B2 JP 6595283 A JP6595283 A JP 6595283A JP 6595283 A JP6595283 A JP 6595283A JP H0425692 B2 JPH0425692 B2 JP H0425692B2
- Authority
- JP
- Japan
- Prior art keywords
- film
- ray
- membrane
- graphic
- mask
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Description
【発明の詳細な説明】 本発明はＸ線露光用マスクの構造に関する。[Detailed description of the invention] The present invention relates to the structure of an X-ray exposure mask.
従来、Ｘ線露光用マスクは、第１図に平面図及
び断面図を示すごとく、シリコン等のフレーム１
の表面にポリイミド膜等からなるメンブラン膜２
が貼り付けられ、該メンブラン膜２の表面に金等
からなるＸ線阻止能を有する図形状膜３等がＸ線
転写図形の要部のみに形成されて成るのが通例で
あつた。 Conventionally, an X-ray exposure mask has a frame 1 made of silicon or the like, as shown in a plan view and a cross-sectional view in FIG.
Membrane film 2 made of polyimide film etc. on the surface of
It was customary that a graphic film 3 made of gold or the like and having an X-ray blocking ability was formed on the surface of the membrane film 2 only on the main part of the X-ray transferred pattern.
しかし、上記従来技術によるＸ線露光用マスク
では、メンブラン膜の図形状膜の図形に依存して
変形し、ひいては図形変形を引き起こすという欠
点があつた。 However, the conventional X-ray exposure mask described above has a drawback in that the membrane film is deformed depending on the shape of the graphic film, resulting in shape deformation.
本発明は、かかる従来技術の欠点をなくし、図
形変形のないＸ線露光用マスクを提供することを
目的とする。 An object of the present invention is to eliminate the drawbacks of the prior art and provide an X-ray exposure mask that does not cause shape deformation.
上記目的を達成するために本発明の基本的な構
成は、フレームにメンブラン膜を貼付け、該メン
ブラン膜表面にＸ線阻止能を有する図形状金属膜
を形成するＸ線露光用マスクに於て、転写図形及
び目合せマーク以外に、図形変形防止のため捨て
打ち図形状膜を形成することを特徴とする。 In order to achieve the above object, the basic configuration of the present invention is to provide an X-ray exposure mask in which a membrane film is attached to a frame and a graphic metal film having an X-ray blocking ability is formed on the surface of the membrane film. In addition to the transferred figure and the alignment mark, a discarded figure-shaped film is formed to prevent figure deformation.
以下、実施例により本発明を詳述する。 Hereinafter, the present invention will be explained in detail with reference to Examples.
第２図は本発明によるＸ線露光用マスクの一実
施例を示すＸ線マスクの平面図を断面図である。
フレーム１１にはメンブラン膜１２が貼付けら
れ、メンブラン膜１２表面にはＸ線阻止能を有す
る図形状膜１３と、図形変形防止用の図形状膜１
４を形成する。この場合、図形状膜１４はＸ線阻
止能を有する図形状膜１３と同様の金等の膜を用
い、又図形１４の巾や密度は内部図形１３と同様
にすることにしたが、膜１３と膜１４とは同一材
料である必要は必ずしもなく、又図形１４の巾や
密度は内部図形１３と必ずしも同様である必要は
無い。 FIG. 2 is a cross-sectional plan view of an X-ray mask showing an embodiment of the X-ray exposure mask according to the present invention.
A membrane film 12 is attached to the frame 11, and on the surface of the membrane film 12 there is a graphic film 13 having an X-ray blocking ability, and a graphic film 1 for preventing graphic deformation.
form 4. In this case, the pattern film 14 is made of the same gold film as the pattern film 13 having an X-ray blocking ability, and the width and density of the pattern 14 are the same as those of the internal pattern 13. It is not necessarily necessary that the film 14 and the film 14 be made of the same material, and the width and density of the figure 14 do not necessarily have to be the same as the internal figure 13.
上記の如く、Ｘ線マスクの図形変形防止用の図
形状膜を形成することにより、Ｘ線マスクの図形
変形を防止できる効果がある。 As described above, by forming the graphic film for preventing graphic deformation of the X-ray mask, it is possible to prevent graphic deformation of the X-ray mask.
第１図ａ，ｂは従来技術によるＸ線マスクの平
面図と断面図を示し、第２図ａ，ｂは本発明によ
るＸ線マスクの一実施例を示すＸ線マスクの平面
図と断面図である。
１，１１……フレーム、２，１２……メンブラ
ン膜、３，１３……図形状Ｘ線阻止能膜、１４…
…図形状変形防止膜。
1A and 1B show a plan view and a sectional view of an X-ray mask according to the prior art, and FIGS. 2A and 2B show a plan view and a sectional view of an X-ray mask showing an embodiment of the X-ray mask according to the present invention. It is. 1, 11...Frame, 2, 12...Membrane membrane, 3, 13...Graphic X-ray stopping ability membrane, 14...
...A film to prevent figure deformation.
Claims (1)
ラン膜表面にＸ線阻止能を有する図形状金属膜を
形成するＸ線露光用マスクに於て、転写図形及び
目合せマーク以外に、図形変形防止のための捨て
打ち図形状膜を形成することを特徴とするＸ線マ
スク。1. In an X-ray exposure mask in which a membrane film is attached to a frame and a graphic metal film with X-ray blocking ability is formed on the surface of the membrane film, in addition to the transferred graphics and alignment marks, there are An X-ray mask characterized by forming a film in the shape of a shot pattern.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58065952A JPS59191332A (en) | 1983-04-14 | 1983-04-14 | X-ray mask |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58065952A JPS59191332A (en) | 1983-04-14 | 1983-04-14 | X-ray mask |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS59191332A JPS59191332A (en) | 1984-10-30 |
| JPH0425692B2 true JPH0425692B2 (en) | 1992-05-01 |
Family
ID=13301825
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP58065952A Granted JPS59191332A (en) | 1983-04-14 | 1983-04-14 | X-ray mask |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS59191332A (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0746681B2 (en) * | 1986-10-28 | 1995-05-17 | 富士通株式会社 | Method of manufacturing mask for X-ray stepper |
| DE8717448U1 (en) * | 1987-02-06 | 1988-12-29 | Dr. Johannes Heidenhain Gmbh, 83301 Traunreut | Irradiation mask for lithographic pattern creation |
-
1983
- 1983-04-14 JP JP58065952A patent/JPS59191332A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS59191332A (en) | 1984-10-30 |
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