JPH0429638B2 - - Google Patents
Info
- Publication number
- JPH0429638B2 JPH0429638B2 JP59078487A JP7848784A JPH0429638B2 JP H0429638 B2 JPH0429638 B2 JP H0429638B2 JP 59078487 A JP59078487 A JP 59078487A JP 7848784 A JP7848784 A JP 7848784A JP H0429638 B2 JPH0429638 B2 JP H0429638B2
- Authority
- JP
- Japan
- Prior art keywords
- raw material
- lanthanum hexaboride
- single crystal
- growing
- lab
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B13/00—Single-crystal growth by zone-melting; Refining by zone-melting
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/10—Inorganic compounds or compositions
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Description
【発明の詳細な説明】
〔発明の利用分野〕
本発明は、回転楕円内面鏡で赤外線を集光させ
る浮遊帯溶融法を用いて結晶を育成する分野に係
り、特にLeB6単結晶を育成するときに、大形で
転位の少ない単結晶を育成させるに好適な方法に
関する。[Detailed Description of the Invention] [Field of Application of the Invention] The present invention relates to the field of growing crystals using the floating zone melting method in which infrared rays are focused using a spheroidal internal mirror, and in particular, to the field of growing LeB 6 single crystals. Sometimes it relates to a method suitable for growing a large single crystal with few dislocations.
六硼化ランタン(LaB6)で代表される硼化物
は仕事関数が低く、融点が高く、かつ高温での蒸
気圧が低いなどの特徴があり、輝度の高い電子線
源材料として用いられている。
Borides, represented by lanthanum hexaboride (LaB 6 ), have characteristics such as a low work function, high melting point, and low vapor pressure at high temperatures, and are used as high-brightness electron beam source materials. .
従来、LaB6単結晶の育成法としては、金属フ
ラツクス法、気相成長法、浮遊帯溶融法などが知
られているが高品質、大形の結晶育成には一般に
浮遊帯溶融法が適切である。その加熱源としては
通常、高周波加熱(特公昭58−52958)が用いら
れている。しかしながら高周波誘導加熱では溶融
した浮遊帯にうず電流による浮揚力が強く働き、
その影響で溶融帯の吹き上げが生じて、溶融帯の
形状が大きく変化する現象がある。そのため、溶
融帯を安定に保持することが著しく困難となる他
に、溶融帯の形状が加熱時間とともに変化するた
め、熱応力により結晶に欠陥が入りやすいなどな
どの問題があつた。 Conventionally, known methods for growing LaB 6 single crystals include the metal flux method, vapor phase growth method, and floating zone melting method, but the floating zone melting method is generally appropriate for growing high-quality, large-sized crystals. be. High frequency heating (Japanese Patent Publication No. 58-52958) is usually used as the heating source. However, in high-frequency induction heating, the buoyancy force due to eddy current acts strongly on the molten floating zone.
As a result, the molten zone blows up, causing a phenomenon in which the shape of the molten zone changes significantly. Therefore, it is extremely difficult to maintain the molten zone stably, and the shape of the molten zone changes with heating time, causing problems such as the tendency for defects to occur in the crystal due to thermal stress.
本発明の目的は、これらの欠点を解決すること
を目的とするもので、LaB6単結晶を浮遊帯溶融
法によつて育成するに際し、回転楕円内面鏡で赤
外線を集光させる装置を用いることによつて、大
形で転位密度が低い高品質な単結晶を提供するも
のである。
The purpose of the present invention is to solve these drawbacks, and to use a device that condenses infrared rays with a spheroidal internal mirror when growing LaB 6 single crystals by the floating zone melting method. This provides a large, high-quality single crystal with low dislocation density.
本発明は、回転楕円内面鏡で赤外線を集光させ
る装置を用いて溶解するため、LaB6が2600℃の
高融点であるにもかかわらず、溶融帯を安定に保
持できることに特長がある。これは高周波加熱装
置などでみられる浮揚力の影響を受けることなく
安定に結晶育成でき、結晶育成時の溶融部の直径
と長さの比率を望ましい0.8から2.0の値にするこ
とができるためである。
The present invention is characterized by the ability to maintain a molten zone stably despite LaB 6 having a high melting point of 2,600°C, since it is melted using a device that condenses infrared rays with a spheroidal inner mirror. This is because the crystal can be grown stably without being affected by the buoyancy force seen in high-frequency heating equipment, and the ratio of diameter to length of the molten part during crystal growth can be set to a desirable value of 0.8 to 2.0. be.
回転楕円内面鏡で赤外線を集光させる装置で
LaB6単結晶を育成するためには次に述べる事項
を配慮することが必要である。 A device that focuses infrared light using a spheroidal internal mirror.
In order to grow LaB 6 single crystals, it is necessary to consider the following matters.
育成雰囲気を保持するために通常、石英管が設
けられているが、LaB6は融点が2600℃と高温で
あるため、育成中石英管が輻射熱で変形する問題
がある。この変形を防ぐ目的で石英管の内径を大
きくすると、石英管壁が低温になるためLaB6の
蒸発物が石英管の内壁に付着し、赤外線の透過率
が変化する。その結果、育成中結晶の直径が変動
する問題が起こる。これに対しては、石英管の替
りに耐熱性の優れたサフアイア管を用いること
や、浮遊帯近傍の石英管部を球状に広げることで
上記欠点をなくすことを見い出した。石英管の球
状部の直径は35mm以下では変形が起こり、55mm以
上では内壁に蒸発物が付着した。 A quartz tube is usually provided to maintain the growth atmosphere, but since LaB 6 has a high melting point of 2600°C, there is a problem that the quartz tube is deformed by radiant heat during growth. If the inner diameter of the quartz tube is increased in order to prevent this deformation, the quartz tube wall becomes colder, and evaporated matter of LaB 6 adheres to the inner wall of the quartz tube, changing the transmittance of infrared rays. As a result, the problem arises that the diameter of the crystal varies during growth. We have found that the above-mentioned drawbacks can be overcome by using a sapphire tube with excellent heat resistance instead of the quartz tube, and by widening the quartz tube near the floating zone into a spherical shape. When the diameter of the spherical part of the quartz tube was less than 35 mm, deformation occurred, and when it was more than 55 mm, evaporated matter adhered to the inner wall.
次に原料棒および種結晶を固定するための材料
について説明する。LaB6は融点が高く、熱伝導
が大きいため、原料棒および種結晶を固定するた
めの材料は耐熱性に優れ、かつLaB6との反応が
生じない材料が必要である。本発明では、これら
の条件を満たす材料としてRe、Ta、W、Mo、
Cを用いれば昇温に伴う溶断、反応が防げること
を明らかにした。 Next, materials for fixing the raw material rod and the seed crystal will be explained. Since LaB 6 has a high melting point and high thermal conductivity, the material for fixing the raw material rod and seed crystal must have excellent heat resistance and be a material that does not react with LaB 6 . In the present invention, Re, Ta, W, Mo,
It was clarified that by using C, melting and reactions due to temperature rise can be prevented.
また白金族の線材を用いる場合には、原料棒を
固定する位置を溶融部分から40mm以上離すと溶断
することなく原料棒を固定できることを明らかに
した。 In addition, when using platinum group wire rods, it was revealed that the raw material rod could be fixed without melting if the raw material rod was fixed at a distance of 40 mm or more from the molten part.
以下、本発明を実施例により詳細に説明する。 Hereinafter, the present invention will be explained in detail with reference to Examples.
実施例 1
結晶育成に用いるLaB6の原料棒はLaB6粉末を
1ton/cm2のプレス圧で直径10mm、長さ100mmの丸
棒に成型し、アルゴン雰囲気中で温度2200℃、3
時間焼成して作製した。Example 1 The raw material rod of LaB 6 used for crystal growth is made of LaB 6 powder.
It was molded into a round bar with a diameter of 10 mm and a length of 100 mm using a press pressure of 1 ton/cm 2 and heated at a temperature of 2200℃ in an argon atmosphere for 3 days.
It was made by baking for hours.
赤外線を用いた育成炉の構造を第1図に示す。
原料棒6は直径0.2mmのRe線4で上部に設けてあ
る原料棒移動シヤフト7からつり下げた。下方の
シヤフトには種結晶5をセラミツクスのホルダー
にRe線で固定した。 Figure 1 shows the structure of a growth furnace using infrared rays.
The raw material rod 6 was suspended from a raw material rod moving shaft 7 provided at the top by a Re wire 4 having a diameter of 0.2 mm. A seed crystal 5 was fixed to a ceramic holder on the lower shaft with Re wire.
育成条件としては、原料棒と種結晶を5mm/h
で下に移動しながら、原料棒と種結晶を同一方向
に10rpmで回転した。姻成中の雰囲気はアルゴン
で行なつた。雰囲気ガス制御用の円筒状容器は内
径35mmのサフアイア管3を用いた。この条件下で
直径8mmの単結晶を育成した。育成時、溶融帯に
は高周波加熱時に認められる浮揚力は全く観察さ
れなかつた。 As for the growth conditions, the raw material rod and seed crystal are grown at 5mm/h.
The raw material rod and seed crystal were rotated in the same direction at 10 rpm while moving downward. The atmosphere during the marriage was argon. A sapphire tube 3 with an inner diameter of 35 mm was used as the cylindrical container for atmospheric gas control. A single crystal with a diameter of 8 mm was grown under these conditions. During growth, no buoyancy force observed during high-frequency heating was observed in the melted zone.
育成した結晶の転位密度をエツチング法で調べ
た結果、約1.0×104個/cm2であり、従来の高周波
加熱の1.2×105個/cm2の値により約1桁以上、転
位密度の少ない良質な単結晶が得られた。また雰
囲気ガス制御用の円筒状容器にサフアイア管を用
いたために、容器の変形はみられなかつた。 As a result of examining the dislocation density of the grown crystal using an etching method, it was found to be approximately 1.0×10 4 /cm 2 , which is approximately one order of magnitude higher than the value of 1.2×10 5 /cm 2 obtained by conventional high-frequency heating. A small number of high quality single crystals were obtained. Furthermore, since a sapphire tube was used for the cylindrical container for atmospheric gas control, no deformation of the container was observed.
LaB6の原料棒は溶融すると、10mmから8mmま
で収縮した。ここで溶融帯の長さを6mm以下にし
て結晶育成すると、凝固後、原料棒の中心部に未
溶解の芯部が存在していた。また溶融帯の長さを
20mm以上にしようとすると、溶融帯の下部が重力
でだれてしまい、安定な溶融帯を形成することが
できないことが分つた。 When the LaB 6 raw material rod was melted, it shrunk from 10 mm to 8 mm. When crystals were grown with the length of the molten zone being 6 mm or less, an unmelted core was present in the center of the raw material rod after solidification. Also, the length of the melt zone
It was found that if the thickness was increased to 20 mm or more, the lower part of the molten zone would sag due to gravity, making it impossible to form a stable molten zone.
以上の結果から、赤外線加熱で安定な結晶育成
を行うためには、溶融帯の直径と長さの比率を
0.8から2.0の範囲内とすることが好適である。 From the above results, in order to achieve stable crystal growth with infrared heating, the ratio of the diameter and length of the molten zone must be adjusted.
It is preferable to set it within the range of 0.8 to 2.0.
実施例 2
実施例1の育成条件を用いて、雰囲気ガス制御
用の円筒状容器にサフアイアのかわりに内径35mm
の透明石英管を用いて育成したところ、育成中に
石英管が変形および失透したために、赤外線の透
過が悪くなり溶融帯が固化し育成が続けられなか
つた。Example 2 Using the growth conditions of Example 1, a cylindrical container for atmospheric gas control with an inner diameter of 35 mm was used instead of saphire.
When the quartz tube was grown using a transparent quartz tube, the quartz tube was deformed and devitrified during the growth, resulting in poor infrared transmission and solidification of the molten zone, making it impossible to continue the growth.
変形を防ぐ目的で石英管の内径を55mmと大きく
して育成した結果、石英管の温度が低温となり、
石英管の内壁に蒸発物が付着し、赤外線の透過が
悪くなり原料棒を溶融することが困難となり同じ
く育成を続けることができなかつた。そこで石英
管の形状について検討した結果、第2図に示すよ
うに内径35mmの石英管を用いて溶融帯部分のみを
内径50mmの広がりを持つ球状とした球状石英容器
8を用いると、変形および蒸発物の付着が無い状
態で育成できた。 As a result of increasing the inner diameter of the quartz tube to 55 mm to prevent deformation, the temperature of the quartz tube became low.
Evaporated matter adhered to the inner wall of the quartz tube, impairing the transmission of infrared rays and making it difficult to melt the raw material rod, making it impossible to continue growing. As a result of considering the shape of the quartz tube, we found that using a spherical quartz tube 8 with an inner diameter of 35 mm and a spherical quartz tube with only the molten zone having an inner diameter of 50 mm, as shown in Figure 2, would prevent deformation and evaporation. It was possible to grow without any substances attached.
実施例 3
実施例1の条件で、原料棒のつり下げおよび種
結晶を固定するRe線のかわりにTa、W、Mo、
C線を用いて育成した結果、溶断することなく
Re線と同じ効果があることが分つた。Example 3 Under the conditions of Example 1, Ta, W, Mo,
As a result of growing using C wire, there was no melting.
It turns out that it has the same effect as Re rays.
実施例 4
実施例1の育成条件で、原料棒のつり下げおよ
び種結晶を固定するRe線のかわりに白金線を用
いて育成を行なつた。白金線を用いる場合には、
白金線で原料棒のつり下げおよび種結晶を固定す
る位置と溶融帯の距離が重要であることが分つ
た。上記の距離を35mmにした場合には、育成中に
白金線が溶断し原料棒が落下した。つぎに42mmと
長くした場合には白金線が溶断することなく育成
できた。Example 4 Growth was carried out under the growth conditions of Example 1, using a platinum wire instead of the Re wire for suspending the raw material rod and fixing the seed crystal. When using platinum wire,
It was found that the position of suspending the raw material rod with a platinum wire, the position of fixing the seed crystal, and the distance of the molten zone are important. When the above distance was set to 35 mm, the platinum wire was fused during growth and the raw material rod fell. Next, when the length was increased to 42 mm, the platinum wire could be grown without melting.
これは白金のみならずPd、Rhなどの白金族の
金属線すべてに共通して観察された。尚、以上の
実施例において、結晶を同一方向に回転させない
で結晶回転を止めて行なつても同様な結果が得ら
れた。 This was observed not only for platinum but also for all platinum group metal wires such as Pd and Rh. In the above examples, similar results were obtained even when the crystal rotation was stopped without rotating the crystal in the same direction.
以上述べたように、本発明によれば、溶融帯の
安定化がなされたので、大形化でしかも高品質な
LaB6単結晶を育成することができる。
As described above, according to the present invention, the molten zone is stabilized, so it is possible to increase the size and quality of the melted zone.
LaB 6 single crystals can be grown.
第1図は、本発明の一実施態様を示す装置の赤
外集光部の縦断面図、第2図は、石英容器の一例
を示す断面図である。
1……回転楕円内面鏡、2……キセノンラン
プ、3……サフアイア管、4……Re線、5……
種結晶、6……原料棒、7……原料棒移動シヤフ
ト、8……球状石英容器。
FIG. 1 is a longitudinal sectional view of an infrared condensing section of an apparatus showing one embodiment of the present invention, and FIG. 2 is a sectional view showing an example of a quartz container. 1...Spheroidal internal mirror, 2...Xenon lamp, 3...Saphire tube, 4...Re wire, 5...
Seed crystal, 6... Raw material rod, 7... Raw material rod moving shaft, 8... Spherical quartz container.
Claims (1)
融法で結晶化させる方法において、結晶体と原料
の回転方向を同一、あるいは静止した状態で溶融
部の直径と長さの比率を0.8から2.0とし、回転楕
円内面鏡で赤外線を集光させる装置を用いて結晶
育成することを特徴とする六硼化ランタン単結晶
の育成方法。 2 LaB6試料の外周上に雰囲気ガス制御用の円
筒状容器を設け、その容器にサフアイアからなる
材質を用いることを特徴とする特許請求の範囲第
1項記載の六硼化ランタン単結晶の育成方法。 3 雰囲気ガス制御用の円筒状容器が、浮遊帯近
傍の部分で球状の広がりを有することを特徴とす
る特許請求の範囲第1項記載の六硼化ランタン単
結晶の育成方法。 4 原料棒および種結晶をRe、Ta、W、Mo、
Cの線で固定およびつり下げることを特徴とする
特許請求の範囲第1項記載の六硼化ランタン単結
晶の育成方法。 5 原料棒に長さが40mm以上のものを用いること
を特徴とする特許請求の範囲第1項記載の六硼化
ランタン単結晶の育成方法。[Claims] 1. In a method of crystallizing a lanthanum hexaboride sintered body (LaB 6 ) by a floating zone melting method, the rotation direction of the crystal body and the raw material are the same, or the diameter of the molten part is the same as that of the raw material in a stationary state. A method for growing a lanthanum hexaboride single crystal, the length ratio being 0.8 to 2.0, and crystal growth using a device that focuses infrared light using a spheroidal internal mirror. 2. Growth of a lanthanum hexaboride single crystal according to claim 1, characterized in that a cylindrical container for atmospheric gas control is provided on the outer periphery of the LaB 6 sample, and a material made of sapphire is used for the container. Method. 3. The method for growing a lanthanum hexaboride single crystal according to claim 1, wherein the cylindrical container for atmospheric gas control has a spherical expansion in a portion near the floating zone. 4 Raw material rods and seed crystals are Re, Ta, W, Mo,
A method for growing a lanthanum hexaboride single crystal according to claim 1, characterized in that the lanthanum hexaboride single crystal is fixed and suspended by a line C. 5. A method for growing a lanthanum hexaboride single crystal according to claim 1, characterized in that a raw material rod having a length of 40 mm or more is used.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59078487A JPS60226495A (en) | 1984-04-20 | 1984-04-20 | Method for growing lanthanum hexaboride single crystal |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59078487A JPS60226495A (en) | 1984-04-20 | 1984-04-20 | Method for growing lanthanum hexaboride single crystal |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS60226495A JPS60226495A (en) | 1985-11-11 |
| JPH0429638B2 true JPH0429638B2 (en) | 1992-05-19 |
Family
ID=13663333
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP59078487A Granted JPS60226495A (en) | 1984-04-20 | 1984-04-20 | Method for growing lanthanum hexaboride single crystal |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS60226495A (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH07100640B2 (en) * | 1988-03-04 | 1995-11-01 | 宇部興産株式会社 | Single crystal manufacturing method |
| CN108048907B (en) * | 2017-12-14 | 2020-08-07 | 合肥工业大学 | Preparation method of large-size and high-performance lanthanum hexaboride single crystal |
| CN114908422B (en) * | 2022-06-29 | 2024-06-14 | 合肥工业大学 | Strontium-doped lanthanum hexaboride single crystal and preparation method thereof |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5310481Y2 (en) * | 1971-05-18 | 1978-03-20 | ||
| JPS56145197A (en) * | 1980-04-09 | 1981-11-11 | Nec Corp | Growing method of single crystal by floating-zone method |
| JPS5852958A (en) * | 1981-09-25 | 1983-03-29 | 松下冷機株式会社 | Refrigerator |
-
1984
- 1984-04-20 JP JP59078487A patent/JPS60226495A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS60226495A (en) | 1985-11-11 |
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