JPH0433096B2 - - Google Patents
Info
- Publication number
- JPH0433096B2 JPH0433096B2 JP58195704A JP19570483A JPH0433096B2 JP H0433096 B2 JPH0433096 B2 JP H0433096B2 JP 58195704 A JP58195704 A JP 58195704A JP 19570483 A JP19570483 A JP 19570483A JP H0433096 B2 JPH0433096 B2 JP H0433096B2
- Authority
- JP
- Japan
- Prior art keywords
- transition metal
- solid solution
- nitrogen
- oxygen
- radiation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J1/00—Details of electrodes, of magnetic control means, of screens, or of the mounting or spacing thereof, common to two or more basic types of discharge tubes or lamps
- H01J1/02—Main electrodes
- H01J1/30—Cold cathodes, e.g. field-emissive cathode
- H01J1/304—Field-emissive cathodes
Landscapes
- Cold Cathode And The Manufacture (AREA)
Description
【発明の詳細な説明】
本発明は電子ビーム露光機、高輝度電子ビーム
利用機器に使用するフイールド・エミツターに関
する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a field emitter used in an electron beam exposure machine and a device using a high-intensity electron beam.
従来のフイールド・エミツターの材料として
は、タングステンが使用されており、また遷移金
属炭化物の利用が試みられている。 Tungsten has been used as a material for conventional field emitters, and attempts have been made to use transition metal carbides.
しかし、タングステンを使用する場合は、タン
グステンが活性な金属であるために残留気体が表
面に吸着し、その吸着した原子が放射面上に拡散
及び移動する。そのため放射面の局所の仕事関数
が変化するので、放射する電算ビームの変動を引
き起す。通常タングステンの放射電流は約5%変
動する欠点がある。 However, when tungsten is used, since tungsten is an active metal, residual gas is adsorbed on the surface, and the adsorbed atoms diffuse and move onto the emitting surface. This changes the local work function of the radiation surface, causing fluctuations in the emitted computer beam. Typically, tungsten has the disadvantage that its radiation current varies by about 5%.
また、遷移金属炭化物を使用する場合は、タン
グステンに比較して残留気体との反応に不活性で
あるが、その活性度は放射面上の炭素欠陥の数と
密接に関係しており、欠陥の数が増加すれば表面
の活性度は増し、電子ビームの変動幅はタングス
テンの値に近づく。遷移金属炭化物MCx(ただ
し、Mは遷移金属を表わす)ではxが0.5〜0.96
に亘る非化学量論比の領域が熱力学的に存在し、
一般に熱平衡に近い状態で作成した結晶には4〜
20原子%の炭素欠陥が導入される。 In addition, when using transition metal carbides, they are inert compared to tungsten in reacting with residual gas, but their activity is closely related to the number of carbon defects on the emitting surface, and the number of defects increases. As the number increases, the surface activity increases and the fluctuation range of the electron beam approaches the value for tungsten. In transition metal carbide MC x (where M represents a transition metal), x is 0.5 to 0.96
Thermodynamically, there exists a region of non-stoichiometric ratios over
In general, crystals created in a state close to thermal equilibrium have a
20 atomic percent carbon defects are introduced.
本発明の目的は遷移金属炭化物では必然的に導
入される炭素欠陥による残留気体との反応に関し
てより不活発な放射面を作成し、安定な高輝度の
フイールド・エミツターを提供せんとするもので
ある。 The purpose of the present invention is to create a radiation surface that is more inert with respect to reaction with residual gas due to carbon defects inevitably introduced in transition metal carbides, and to provide a stable, high-brightness field emitter. .
本発明者らは、遷移金属炭化物の炭素欠陥を窒
素、及びまたは酸素を固溶させることによつて減
少させると、安定な高輝度フイールド・エミツタ
ーが得られることを究明し得た。 The present inventors have found that a stable high-brightness field emitter can be obtained by reducing carbon defects in transition metal carbides by incorporating nitrogen and/or oxygen into solid solution.
遷移金属炭化物、遷移金属酸化物及び遷移金属
窒化物はいずれも同じ岩塩型結晶構造をもち、化
学結合が似ているため、相互に固溶し、この固溶
により炭素欠陥の数を減少させることができる。
更に酸素の固溶は放射面の仕事関数を下げ、電子
が効率的に放射させる効果を奏し得られる。ま
た、窒素の固溶は熱伝導率を向上させ、放射面を
清浄化するためのフラツシユ加熱がより効率的に
行うことができる効果を奏し得られる。 Transition metal carbides, transition metal oxides, and transition metal nitrides all have the same rock salt crystal structure and have similar chemical bonds, so they form a solid solution with each other, and this solid solution reduces the number of carbon defects. I can do it.
Furthermore, the solid solution of oxygen lowers the work function of the radiation surface and has the effect of emitting electrons efficiently. In addition, the solid solution of nitrogen improves thermal conductivity and has the effect that flash heating for cleaning the radiation surface can be performed more efficiently.
炭素欠陥の数が少ない程安定な放射面となるこ
とから、一般式MxOyNz(ただし、Mは、V、
族の遷移金属の単独または2種類以上の固溶物
を表わす。)の化合物において、x+y+z=1
の値に近いことが望ましいが、必ずしも1ではな
くても固溶させることにより安定化することがで
きる。有効な組成の範囲は、次の通りである。 Since the smaller the number of carbon defects, the more stable the radiation surface becomes, the general formula M x O y N z (where M is V,
Represents a solid solution of transition metals of the group 1 or 2 or more. ), x+y+z=1
It is desirable that the value be close to 1, but it does not necessarily have to be 1 and can be stabilized by solid solution. Valid composition ranges are as follows.
0.5<x+y+z1
0.5x1、0y0.5、0z0.5
ただし、yとzが同時に0であることはない。
、V、族の遷移金属としては、Ti、Zr、Hf、
V、Nb、Ta、Mo、W、が挙げられ、これらの
単独または固溶物であつてもよい。0.5<x+y+z1 0.5x1, 0y0.5, 0z0.5 However, y and z are never 0 at the same time.
, V, group transition metals include Ti, Zr, Hf,
Examples include V, Nb, Ta, Mo, and W, and these may be used alone or as a solid solution.
ここで、x、y、zの限定理由は以下のとおり
である。炭化物MCxは、0.5<x1の組成範囲
内でNaCl型構造が安定であることが知られてい
る。これは、炭素原子サイトに原子空孔が50%で
きても結晶が安定であることを示している。安定
なフイールドエミツターは、この炭素原子空孔に
酸素原子あるいは窒素原子を導入することにより
得られる。したがつて、酸素原子あるいは窒素原
子の導入量は最大50%である。つまり、0y
0.5、0z0.5である。また、酸素、窒素の2
つの原子が同時に炭素原子空孔に入るのみなら
ず、炭素原子と置換して入ることもあり、この場
合には、炭素原子サイトの制限、すなわち、0.5
<x+y+z1を受ける。 Here, the reason for limiting x, y, and z is as follows. It is known that the NaCl type structure of carbide MC x is stable within the composition range of 0.5<x1. This shows that the crystal is stable even if 50% of vacancies are created at carbon atom sites. Stable field emitters can be obtained by introducing oxygen or nitrogen atoms into these carbon vacancies. Therefore, the amount of oxygen atoms or nitrogen atoms introduced is at most 50%. In other words, 0y
0.5, 0z0.5. Also, oxygen and nitrogen
Not only can two atoms enter the carbon atom vacancy at the same time, but they can also enter to replace a carbon atom, and in this case, the limit of the carbon atom site, i.e., 0.5
<Receive x+y+z1.
また前記の範囲内に酸素または窒素を炭素の欠
陥に個要させる方法は、真空中で酸素(又は窒
素)気体を導入して1000℃で加熱してもよいし、
1気圧の酸素(又は窒素)気体中にエミツターを
露光したのち、真空中で1000℃で加熱処理をして
もよい。更に結晶成長時に酸素(又は窒素)の気
体を結晶内に固溶しても同様の効果がえられる。 In addition, a method for applying oxygen or nitrogen to carbon defects within the above range may be by introducing oxygen (or nitrogen) gas in a vacuum and heating at 1000°C,
The emitter may be exposed to oxygen (or nitrogen) gas at 1 atm and then heat treated at 1000° C. in vacuum. Furthermore, a similar effect can be obtained by dissolving oxygen (or nitrogen) gas in the crystal during crystal growth.
次に実施例を挙げ、本発明のフイールド・エミ
ツターの優れた効果を奏することを明らかにす
る。 Next, Examples will be given to demonstrate the excellent effects of the field emitter of the present invention.
比較例
浮遊帯域法により組成を制御したTiC0.96単結
晶を作製し、<100>、<111>、<110>軸が放射軸
と一致するように切り出した。その先端を電解研
磨により0.1μ以下の曲率半径に整形し、10-9Paの
超高真空中でフイールド・エミツシヨンを調べ
た。Comparative Example A TiC 0.96 single crystal whose composition was controlled by the floating zone method was prepared and cut out so that the <100>, <111>, and <110> axes coincided with the radiation axis. The tip was shaped to a radius of curvature of less than 0.1μ by electrolytic polishing, and the field emission was examined in an ultra-high vacuum of 10 -9 Pa.
<100>チツプの表面は十数原子%の欠陥があつ
た。このチツプにおける放射電流の経時変化は第
1図に示す通りであつた。第1図が示すように、
この表面からの放射電流は、ステツプ及びスパイ
ク状に変動が発生し、また時間と共に減少した。
この傾向は<111>チツプ、<110>チツプでも観
測された。The surface of the <100> chip had defects of more than 10 atomic percent. The emitted current change over time in this chip was as shown in FIG. As shown in Figure 1,
The radiation current from the surface fluctuated in steps and spikes, and also decreased with time.
This trend was also observed for <111> and <110> chips.
実施例
比較例におけると同様にして<100>、<111>、
<110>のチツプを作製し、これを1気圧の大気
に酸素と窒素を吸着させた後、1000℃で10分間加
熱して焼鈍し、比較例と同様にしてフイールド・
エミツシヨシを調べた。この<100>チツプにお
ける放射電流の経時変化は第2図に示す通りであ
つた。この図が示すように、放射電流が極めて安
定で、10時間後でもその安定度が続いた。この傾
向は<111>チツプ、<110>チツプでも観測され
た。Example In the same manner as in the comparative example, <100>, <111>,
A chip of <110> was prepared, and after adsorbing oxygen and nitrogen in an atmosphere of 1 atm, it was annealed by heating at 1000°C for 10 minutes, and then field-treated in the same manner as the comparative example.
I looked into Emitsushiyoshi. The change in radiation current over time in this <100> chip was as shown in Figure 2. As this figure shows, the emitted current was extremely stable and remained stable even after 10 hours. This trend was also observed for <111> and <110> chips.
実用的においては遷移金属としての代表として
Tiを挙げたが、Zr、Hr、V、Nb、Ta、Mo、W
においても、同様な結果が得られる。 In practical terms, as a representative transition metal
I mentioned Ti, but Zr, Hr, V, Nb, Ta, Mo, W
Similar results can be obtained in .
以上のように、本発明のフイールド・エミツタ
ーは従来のものに比べ極めて放射電流を長期に亘
つて極めて安定である優れた効果を奏し得られ
る。 As described above, the field emitter of the present invention exhibits an excellent effect in that the emitted current is extremely stable over a long period of time compared to conventional ones.
第1図は従来の十数原子%の炭素欠陥を有する
フイールド・エミツターにおける放射電流の時間
変化図、第2図は本発明のフイールド・エミツタ
ーにおける放射電流の時間変化図を示す。
FIG. 1 shows a time change diagram of the radiation current in a conventional field emitter having carbon defects of more than 10 atomic percent, and FIG. 2 shows a time change diagram of the radiation current in the field emitter of the present invention.
Claims (1)
し、式中Mは、V、族の遷移金属の単独また
は2種以上の固溶物、0.5<x+y+z1、0.5
x1、0y0.5、0z0.5を表わす
が、yとzが同時に0であることはない。)で示
される遷移金属化合物からなることを特徴とする
フイールド・エミツター。1 The chemical composition of the material is the general formula MC x O y N z (where M is V, a solid solution of one or more group transition metals, 0.5<x+y+z1, 0.5
It represents x1, 0y0.5, 0z0.5, but y and z are never 0 at the same time. ) A field emitter characterized by being made of a transition metal compound represented by:
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58195704A JPS6086728A (en) | 1983-10-19 | 1983-10-19 | field emitter |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58195704A JPS6086728A (en) | 1983-10-19 | 1983-10-19 | field emitter |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6086728A JPS6086728A (en) | 1985-05-16 |
| JPH0433096B2 true JPH0433096B2 (en) | 1992-06-02 |
Family
ID=16345587
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP58195704A Granted JPS6086728A (en) | 1983-10-19 | 1983-10-19 | field emitter |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6086728A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2013039257A1 (en) | 2011-09-16 | 2013-03-21 | Ricoh Company, Ltd. | Latent electrostatic image developing toner |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6091528A (en) * | 1983-10-25 | 1985-05-22 | Natl Inst For Res In Inorg Mater | Field emitters made of transition metal compounds |
| AU7465798A (en) * | 1997-04-02 | 1998-10-22 | E.I. Du Pont De Nemours And Company | Metal-oxygen-carbon field emitters |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS559775A (en) * | 1978-07-08 | 1980-01-23 | Toyosha Co Ltd | Tilling device |
| JPS5661733A (en) * | 1979-10-24 | 1981-05-27 | Hitachi Ltd | Field emission cathode and its manufacture |
| JPS5760367U (en) * | 1980-09-26 | 1982-04-09 |
-
1983
- 1983-10-19 JP JP58195704A patent/JPS6086728A/en active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2013039257A1 (en) | 2011-09-16 | 2013-03-21 | Ricoh Company, Ltd. | Latent electrostatic image developing toner |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6086728A (en) | 1985-05-16 |
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