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JPH0437537B2 - - Google Patents
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JPH0437537B2 - - Google Patents

Info

Publication number
JPH0437537B2
JPH0437537B2 JP57010040A JP1004082A JPH0437537B2 JP H0437537 B2 JPH0437537 B2 JP H0437537B2 JP 57010040 A JP57010040 A JP 57010040A JP 1004082 A JP1004082 A JP 1004082A JP H0437537 B2 JPH0437537 B2 JP H0437537B2
Authority
JP
Japan
Prior art keywords
slit
small
shadow mask
hole
shape
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP57010040A
Other languages
Japanese (ja)
Other versions
JPS58128636A (en
Inventor
Makoto Kudo
Hisashi Okada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Shibaura Electric Co Ltd filed Critical Tokyo Shibaura Electric Co Ltd
Priority to JP1004082A priority Critical patent/JPS58128636A/en
Publication of JPS58128636A publication Critical patent/JPS58128636A/en
Publication of JPH0437537B2 publication Critical patent/JPH0437537B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J29/00Details of cathode-ray tubes or of electron-beam tubes of the types covered by group H01J31/00
    • H01J29/02Electrodes; Screens; Mounting, supporting, spacing or insulating thereof
    • H01J29/06Screens for shielding; Masks interposed in the electron stream
    • H01J29/07Shadow masks for colour television tubes

Landscapes

  • Electrodes For Cathode-Ray Tubes (AREA)

Description

【発明の詳細な説明】[Detailed description of the invention]

発明の技術分野 本発明はカラー受像管に関し、特にシヤドウマ
スクの構造に関するもので有る。 発明の技術的背景と問題点 通常のシヤドウマスク形カラー受像管は第1図
に示す如くパネル1及びフアンネル2を接合した
外囲器よりなり、パネル1の内面には螢光膜3が
被着され、その後方にシヤドウマスク4が支持枠
5を介して係止されている。フアンネル2のネツ
ク部には電子銃6が配置され前記電子銃6から射
出された電子ビーム7は偏向ヨーク(図示せず)
により偏向され、シヤドウマスク4を通り螢光膜
3に達する。シヤドウマスク4のスリツト孔は垂
直軸方向にブリツジ部を介して多数配列されてお
り、各スリツト孔のマスク板厚方向断面はその開
口面積が電子銃側よりも螢光面側の方が大きくな
るようにされている。通常、蛍光面側が大孔側、
電子銃側が小孔側スリツトとも言う。衆知の如く
シヤドウマスクのスリツト孔形状は電子銃側小孔
側スリツト孔とほぼ同一と見倣すことができる
(以下、小孔側スリツト孔をスリツト孔と称す)。
第2−1図に通常のスリツト孔の拡大図を示す。
スリツト孔8の垂直軸方向の連結部即ちスリツト
短手方向のブリツヂ部9の形状はイ−ロ,ハ−
ニ,ホ−ヘ及びト−チの丸みを帯びており、スリ
ツト長手方向のスリツト部8′はイ−ホ′及び(ニ
−チ′の直線でかつ平行になつている。第2−2
図に螢光膜に到達した電子ビーム11と螢光膜の
位置関係及び螢光体の発光面積を示す。パネル内
面の螢光膜3は垂直軸に沿う細長い帯状の螢光体
細条G、B、R及び黒色光吸収細条10で形成さ
れている。偏向された前記3本の電子ビーム7は
前記シヤドウマスク4の前記スリツト孔8を通り
前記螢光体細条G,B,Rを夫々発色させる。こ
の電子ビーム形状11が前記スリツト孔8と実質
的に同一となることは衆知の通りである。通常螢
光体細条G,B,Rに到達した電子ビーム11と
螢光体細条G,B,Rの位置関係は前記パネル内
面3からシヤドウマスク4までの距離で決まり、
電子ビームは螢光体細条G,B,Rに対し内寄り
又は外寄りをする。第2−2図は電子ビーム11
が内寄りした場合を示し螢光体細条G,B,Rの
各々の実効発光面積が異なつてしまうことが判
る。これはカラー受像管画面全体を白色にした場
合前記の電子ビームの形状とズレにより局部的に
色ズレを起す要因となる。これをホワイトユニフ
オーミテイ特性と云う(以下WU特性と称す)。
即ちWU特性の余有度が少なくなつていることが
判る。又黒色光吸収細条10を塗布形成する場合
に於いても前記ブリツヂ部9の丸みによりくびれ
を発生させスクリーン品位を低下させている。 以上の如く通常のスリツト孔形状ではWU特性
の余有度アツプ及び黒色光吸収細条のくびれによ
るスクリーン品位の向上は望めなかつた。次にこ
のようなシヤドウマスクの製造法について述べ
る。シヤドウマスクは矩形形状の大小スリツトを
ネガ原版とし、写真蝕刻を用い、例えば板厚0.15
mmの金属板に感光膜を塗布し、前記一対のネガ原
版をプリントし次いで現像、乾燥バーニング処理
し、最終的に腐蝕液で腐蝕を行なうことにより得
られる。ネガ原版小スリツトと腐蝕後のスリツト
孔の寸法差をサイドエツチ量と称し、金属板の厚
みに対するサイドエツチ量は下表に示すようにな
る。
TECHNICAL FIELD OF THE INVENTION The present invention relates to a color picture tube, and particularly to the structure of a shadow mask. Technical Background and Problems of the Invention A conventional shadow mask type color picture tube consists of an envelope in which a panel 1 and a funnel 2 are joined together, as shown in FIG. , a shadow mask 4 is locked behind it via a support frame 5. An electron gun 6 is arranged at the neck portion of the funnel 2, and the electron beam 7 emitted from the electron gun 6 is deflected by a deflection yoke (not shown).
The light is deflected by the light beam, passes through the shadow mask 4, and reaches the fluorescent film 3. A large number of slit holes in the shadow mask 4 are arranged in the vertical axis direction with bridge portions in between, and the cross section of each slit hole in the mask plate thickness direction is such that the opening area is larger on the fluorescent surface side than on the electron gun side. It is being done. Usually, the phosphor screen side is the large hole side,
The electron gun side is also called the small hole side slit. As is well known, the shape of the slit hole in the shadow mask can be considered to be almost the same as the slit hole on the small hole side of the electron gun (hereinafter, the slit hole on the small hole side will be referred to as a slit hole).
Figure 2-1 shows an enlarged view of a normal slit hole.
The shape of the connecting part in the vertical axis direction of the slit hole 8, that is, the bridge part 9 in the short direction of the slit, is
The slit portions 8' in the longitudinal direction of the slits are straight and parallel to the slits 8' and 2-2.
The figure shows the positional relationship between the electron beam 11 that has reached the phosphor film and the phosphor film, and the light emitting area of the phosphor. The phosphor film 3 on the inner surface of the panel is formed by elongated strip-shaped phosphor strips G, B, R and black light absorbing strips 10 along the vertical axis. The three deflected electron beams 7 pass through the slit holes 8 of the shadow mask 4 and color the phosphor strips G, B, R, respectively. It is well known that the electron beam shape 11 is substantially the same as the slit hole 8. Normally, the positional relationship between the electron beam 11 that has reached the phosphor strips G, B, and R and the phosphor strips G, B, and R is determined by the distance from the panel inner surface 3 to the shadow mask 4,
The electron beam is directed in or out of the phosphor strips G, B, R. Figure 2-2 shows the electron beam 11
It can be seen that the effective light emitting area of each of the phosphor strips G, B, and R is different from each other. This is a cause of local color deviations due to deviations from the shape of the electron beams when the entire color picture tube screen is made white. This is called the white uniformity characteristic (hereinafter referred to as the WU characteristic).
In other words, it can be seen that the degree of surplus of the WU characteristic is decreasing. Also, when forming the black light absorbing strips 10 by coating, the roundness of the bridge portions 9 causes constrictions, which deteriorates the quality of the screen. As described above, with the usual slit hole shape, it was not possible to expect an increase in the margin of WU characteristics and an improvement in screen quality due to the constriction of the black light absorbing stripes. Next, a method for manufacturing such a shadow mask will be described. The shadow mask is made by using a negative master plate with large and small rectangular slits, and using photolithography, for example, the thickness of the plate is 0.15.
It is obtained by coating a photoresist film on a metal plate of 1.0 mm in diameter, printing the pair of negative master plates, developing, drying and burning, and finally etching with an etchant. The dimensional difference between the small slit in the negative master plate and the slit hole after corrosion is called the side etch amount, and the side etch amount relative to the thickness of the metal plate is shown in the table below.

【表】 第3図に通常のネガ原版小スリツト及び腐蝕後
のスリツト孔形状を示す。第3図イに示すように
矩形形状のネガ原版小スリツト12が腐蝕後に第
3図ロに示すようなスリツト孔13となりコーナ
部、、、に丸みを帯びた形状となる。こ
の原因はスリツト孔13のスリツト長手方向のス
リツト部、スリツト短手方向のブリツヂ部及びス
リツト孔コーナ部、、、で腐蝕速度に差
が有る為で有る。スリツト部は腐蝕面積が大きい
為腐蝕液の交換が早く腐蝕速度が速くなる。ブリ
ツヂ部はスリツト部に比し腐蝕面積が小さい分だ
け腐蝕液の交換が遅く腐蝕速度は遅くなる。コー
ナ部はスリツト部とブリツヂ部の境界となり、腐
蝕速度は一段と遅くなる。スリツト部とブリツヂ
部の腐蝕速度の違いは前表のサイドエツチ量から
も明らかで有る。以上の如く1個のスリツト孔内
において腐蝕速度が個々に異なる為前記シヤドウ
マスクの製造法の条件変更等によりスリツト孔コ
ーナ部の丸みを削除することは実用上極めて困難
で有る。上記の解決法として、ネガ原版の小スリ
ツト形状を変更することによりスリツト孔コーナ
部の腐蝕速度を早めることが考えられる。例えば
第4図イに示すネガ原版小スリツトのコーナ部に
ツノを付ける手法が有るが下記の問題点により実
用上難かしい。例えばシヤドウマスクで板厚0.15
mm、スリツト孔幅0.170mmを得るには前表のサイ
ドエツチ量0.075mmよりネガ原版小スリツト幅s
は0.095mmとなる。前記ネガ原版小スリツト孔の
ツノ幅bを前記小スリツト幅sの1/4とするツノ
幅bは略0.024mmとなりツノ幅bが小スリツト幅
sに比し非常に細い為ツノ部のサイドエツチ量も
略0.045mmでスリツト部、ブリツヂ部のサイドエ
ツチ量よりで小で有り、腐蝕速度もやはり遅くな
る。従がつて第4図ロに示すスリツト孔形状とな
つてしまう。又スリツト孔コーナ部の腐蝕速度を
早めるため、ツノ幅bを大きくすると腐蝕後ブリ
ツヂ部のツノ部が合致し単にネガ原版の小スリツ
ト長がツノ長a×2の分だけ長くした場合と同一
となる。従がつてネガ原版小スリツトにツノ部を
用いるだけではスリツト孔コーナ部の丸み補正が
不充分で有る。 発明の目的 本発明はシヤドウマスクのスリツト孔を実質的
に矩形となるように形成し、WU特性の余裕度ア
ツプ及びスクリーン品位の向上を目的とする。 発明の概要 本発明はシヤドウマスクの小孔側のスリツト孔
を垂直軸方向に長い節部を有する連結溝により連
結し、ブリツヂ部は連結溝により分岐された島状
部を有することにより、スリツト孔のコーナー部
の丸みを除去するものである。 発明の実施例 以下に本発明に適用されるシヤドウマスクのス
リツト孔形状についてその製造工程に沿つて詳細
に説明する。第5図イ,ロに本発明に適用される
シヤドウマスクの小孔側のネガ原版の小スリツト
形状を示す。ネガ原版の小スリツトブリツヂ部1
4に一対の補ドツト15を設けて小孔側のネガ原
版とし、この小孔側のネガ原版と補ドツトがなく
通常の矩形形状大スリツトを有する図示しない大
孔側のネガ原版とを一対のネガ原版として、これ
らネガ原版で、シヤドウマスク金属板を両側から
挟み、通常のシヤドウマスク製造法によりエツチ
ングが行なわれる。前記小スリツト補ドツト15
と小スリツト16の位置関係は金属板の厚さ(つ
まりサイドエツチ量)に関係し、例えば第5図イ
に示す如く板厚0.10mmの場合のネガ原版小スリツ
ト16と補ドツト15との関係は補ドツトが小ス
リツト長手方向の延長線より内側に入るようにさ
れる。又第5図ロは板厚0.18mmの場合で有るが補
ドツト15は小スリツト長手方向の延長線より外
側に入るようにされる。即ちサイドエツチ量によ
り補ドツト15と小スリツト16の位置関係が決
まる。前記補ドツト15の形状及び大きさはネガ
原版の小スリツト幅に関係なく飽くまでスリツト
孔コーナー部の腐蝕速度の補正量で補ドツトの長
さ(BL)及び幅(BS)が決められる。第6図に
このように形成されたスリツト孔の形状を示す。
小孔側のスリツト孔は、垂直軸方向に長くスリツ
ト孔のコーナー部を縦に繋ぐような2つの連結溝
18により連結され、前記連結溝18により腐蝕
時の腐蝕液交換が進み腐蝕速度は早まりスリツト
孔コーナ部はリ−ヌ、ル−オに示す形状となる。
又さらに前記スリツト孔コーナー部を腐蝕したい
場合は前記補ドツト15の長さ(BL)を長くし
前記連結溝の面積を大きくすることで容易にでき
る。 以上の如くシヤドウマスク小孔側において、ス
リツト孔コーナー部が連結溝18により連結さ
れ、丁度連結したスリツト孔を見るとブリツヂ部
付近にスリツト孔より局部的に広く突出したよう
な節部が形成される。そしてスリツト孔ブリツヂ
部19は2つの連結溝18によりシヤドウマスク
の小孔側金属板面上から弧島の状態で位置する即
ち連結溝がブリツヂ部により分岐せられた小孔側
スリツト孔形状が形成される。又本発明の実施例
として腐蝕促進部の形状を略三角形で説明したが
本発明の目的はスリツト孔コーナ部の丸み除去で
有り、腐蝕促進部形状が略四角形、略台形及び略
多角形等でも良いことは言う迄もない。 発明の効果 以上のように本発明によればシヤドウマスクの
スリツト孔の連結溝により腐蝕が促進され、スリ
ツト孔のコーナー部の丸みは除去されるのでスリ
ツト孔形状は実質的に矩形状となり、WU特性の
余裕度アツプ及びスクリーン品位の向上したカラ
ー受像管を提供することができる。
[Table] Figure 3 shows the small slits in a normal negative original plate and the shape of the slit holes after corrosion. As shown in FIG. 3A, the rectangular negative original plate small slit 12 becomes a slit hole 13 as shown in FIG. 3B after corrosion, and the corner portions have a rounded shape. This is because there is a difference in corrosion rate between the slit portion in the longitudinal direction of the slit hole 13, the bridge portion in the lateral direction of the slit, and the corner portion of the slit hole. Since the slit portion has a large corroded area, the corrosive solution can be exchanged quickly and the corrosion rate increases. Since the bridge portion has a smaller corroded area than the slit portion, the exchange of corrosive liquid is slower, and the corrosion rate is slower. The corner portion becomes the boundary between the slit portion and the bridge portion, and the corrosion rate becomes even slower. The difference in corrosion rate between the slit portion and the bridge portion is also clear from the amount of side etching in the previous table. As described above, since the corrosion rate differs from one slit hole to another, it is practically extremely difficult to eliminate roundness at the corners of the slit hole by changing the conditions of the manufacturing method of the shadow mask. One possible solution to the above problem is to change the shape of the small slits in the negative master to accelerate the corrosion rate at the corners of the slit holes. For example, there is a method of attaching horns to the corners of the small slits in the negative original as shown in FIG. 4A, but this method is difficult in practice due to the following problems. For example, with a shadow mask, the plate thickness is 0.15
mm, to obtain a slit hole width of 0.170 mm, use the side etching amount of 0.075 mm in the previous table to make the negative original plate small slit width s.
is 0.095mm. When the horn width b of the small slit hole in the negative master plate is set to 1/4 of the small slit width s, the horn width b is approximately 0.024 mm, and since the horn width b is very thin compared to the small slit width s, the amount of side etching of the horn portion is The amount of side etching is approximately 0.045mm, which is smaller than the amount of side etching at the slit and bridge parts, and the corrosion rate is also slower. As a result, the shape of the slit hole is shown in FIG. 4B. In addition, in order to accelerate the corrosion rate at the corner of the slit hole, if the horn width b is increased, the horns of the bridge portion will match after corrosion, and the result will be the same as when the small slit length of the negative original plate was simply lengthened by the horn length a x 2. Become. Therefore, simply using a corner portion for a small slit in a negative original plate is insufficient to correct the roundness of the corner portion of the slit hole. OBJECTS OF THE INVENTION The present invention aims to increase the margin of WU characteristics and improve screen quality by forming the slit holes of a shadow mask so as to have a substantially rectangular shape. Summary of the Invention The present invention connects the slit holes on the small hole side of a shadow mask by a connecting groove having a long node in the vertical axis direction, and the bridge portion has an island-shaped portion branched by the connecting groove. This removes the roundness of the corners. Embodiments of the Invention The slit shape of a shadow mask applied to the present invention will be explained in detail below along with its manufacturing process. Figures 5A and 5B show the shape of small slits in the negative master plate on the small hole side of the shadow mask applied to the present invention. Small slit bridge part 1 of negative original plate
4 is provided with a pair of auxiliary dots 15 to form a negative original on the small hole side, and this negative original on the small hole side is combined with a negative original on the large hole side (not shown) which has no auxiliary dots and has a normal rectangular large slit. A shadow mask metal plate is sandwiched between these negative master plates on both sides, and etching is performed using a normal shadow mask manufacturing method. Said small slit supplementary dot 15
The positional relationship between the small slit 16 and the small slit 16 is related to the thickness of the metal plate (that is, the amount of side etching). For example, as shown in FIG. The auxiliary dot is placed inside the longitudinal extension line of the small slit. Furthermore, although FIG. 5B shows a case where the plate thickness is 0.18 mm, the supplementary dots 15 are placed outside the longitudinal extension line of the small slit. That is, the positional relationship between the supplementary dots 15 and the small slits 16 is determined by the amount of side etching. Regarding the shape and size of the auxiliary dots 15, the length (BL) and width (BS) of the auxiliary dots are determined by the amount of correction for the corrosion rate at the corner of the slit hole, regardless of the width of the small slit in the negative original. FIG. 6 shows the shape of the slit hole thus formed.
The slit holes on the small hole side are connected by two connecting grooves 18 that are long in the vertical axis direction and vertically connect the corners of the slit holes, and the connecting grooves 18 facilitate the exchange of corrosive fluid during corrosion, increasing the corrosion rate. The corner portions of the slit holes have the shapes shown in Line and Roux.
Furthermore, if it is desired to corrode the corner portion of the slit hole, this can be easily done by increasing the length (BL) of the auxiliary dot 15 and increasing the area of the connecting groove. As described above, on the small hole side of the shadow mask, the corner portions of the slit holes are connected by the connecting groove 18, and when looking at the slit holes that have just been connected, a node portion that locally protrudes wider than the slit hole is formed near the bridge portion. . The slit hole bridge portion 19 is located in an archipelago shape from the metal plate surface on the small hole side of the shadow mask by the two connecting grooves 18, that is, a slit hole shape on the small hole side is formed in which the connecting grooves are branched by the bridge portion. Ru. In addition, although the shape of the corrosion-promoting part has been described as a substantially triangular shape in the embodiment of the present invention, the purpose of the present invention is to remove the roundness of the corners of the slit hole, and the shape of the corrosion-promoting part may be substantially quadrangular, substantially trapezoidal, substantially polygonal, etc. I can't say enough good things about it. Effects of the Invention As described above, according to the present invention, corrosion is promoted by the connecting grooves of the slit holes in the shadow mask, and the roundness of the corners of the slit holes is removed, so that the slit hole shape becomes substantially rectangular, and the WU characteristics It is possible to provide a color picture tube with increased margin and improved screen quality.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は通常のシヤドウマスク形カラー受像管
の概略断面図、第2−1図は第1図のカラー受像
管に用いられるシヤドウマスクのスリツト孔の拡
大図、第2−2図は螢光膜に到達した電子ビーム
と螢光膜の位置関係を説明するための模式図、第
3図イ,ロは、通常のネガ原版小スリツトと腐蝕
後のスリツト孔形状を示す概略拡大図、第4図
イ,ロは、従来のツノ形ネガ原版小スリツトと腐
蝕後のスリツト孔形状を示す概略拡大図、第5図
イ,ロは、本発明に適用されるネガ原版小スリツ
ト形状のを示す概略拡大図、第6図は本発明の小
孔側スリツト孔形状を示す概略拡大図である。 1……パネル、2……フアンネル、3……螢光
膜、4……シヤドウマスク、5……支持枠、6…
…電子銃、7……電子ビーム、8……スリツト
孔、9……ブリツヂ部、10……黒色光吸収細
条、11……螢光膜に到達した電子ビーム、12
……ネガ原版小スリツト、13……腐蝕後のスリ
ツト孔、14……ネガ原版小スリツトブリツヂ
部、15……ネガ原版小スリツト補ドツト、16
……ネガ原版小スリツト、17……腐蝕促進部、
18……連結溝、19……スリツト孔ブリツヂ
部。
Figure 1 is a schematic cross-sectional view of a normal shadow mask type color picture tube, Figure 2-1 is an enlarged view of the slit hole in the shadow mask used in the color picture tube shown in Figure 1, and Figure 2-2 is a phosphor film. Figures 3(a) and 3(b) are schematic diagrams for explaining the positional relationship between the arriving electron beam and the fluorescent film, and Figure 4(a) is a schematic enlarged diagram showing the small slits in a normal negative original plate and the shape of the slit holes after corrosion. , B are schematic enlarged views showing the conventional horn-shaped negative original plate small slit and the shape of the slit hole after corrosion, and Figures 5A and 5B are schematic enlarged views showing the negative original plate small slit shape applied to the present invention. , FIG. 6 is a schematic enlarged view showing the shape of the small hole side slit hole of the present invention. 1... Panel, 2... Funnel, 3... Fluorescent film, 4... Shadow mask, 5... Support frame, 6...
...Electron gun, 7...Electron beam, 8...Slit hole, 9...Bridge portion, 10...Black light absorption strip, 11...Electron beam reaching the fluorescent film, 12
...Small slit in negative original plate, 13...Slit hole after corrosion, 14...Small slit bridge part in negative original plate, 15...Small slit auxiliary dot in negative original plate, 16
...Negative original plate small slit, 17...Corrosion promotion part,
18... Connection groove, 19... Slit hole bridge portion.

Claims (1)

【特許請求の範囲】[Claims] 1 少なくとも蛍光体スクリーンと電子銃とこれ
らの間に配設され垂直軸方向にブリツヂ部を介し
て連結されてなる多数のスリツト孔を有するよう
エツチングにて製造されるシヤドウマスクとを具
備するカラー受像管に於いて、前記シヤドウマス
クの電子銃側のスリツト孔は矩形状をなし、垂直
軸方向に長い節部を有する連結溝により連結さ
れ、前記ブリツヂ部は、前記連結溝により分岐さ
れた島状部を有することを特徴とするカラー受像
管。
1. A color picture tube comprising at least a phosphor screen, an electron gun, and a shadow mask manufactured by etching so as to have a large number of slit holes arranged between them and connected via a bridge part in the vertical axis direction. The slit holes on the electron gun side of the shadow mask have a rectangular shape and are connected by a connecting groove having a long node in the vertical axis direction, and the bridge part has an island-like part branched by the connecting groove. A color picture tube comprising:
JP1004082A 1982-01-27 1982-01-27 Color picture tube Granted JPS58128636A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1004082A JPS58128636A (en) 1982-01-27 1982-01-27 Color picture tube

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1004082A JPS58128636A (en) 1982-01-27 1982-01-27 Color picture tube

Publications (2)

Publication Number Publication Date
JPS58128636A JPS58128636A (en) 1983-08-01
JPH0437537B2 true JPH0437537B2 (en) 1992-06-19

Family

ID=11739275

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1004082A Granted JPS58128636A (en) 1982-01-27 1982-01-27 Color picture tube

Country Status (1)

Country Link
JP (1) JPS58128636A (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW544705B (en) * 2001-03-06 2003-08-01 Matsushita Electric Industrial Co Ltd Color picture tube

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4300069A (en) * 1979-12-18 1981-11-10 Rca Corporation Color picture tube having improved slit type shadow mask and method of making same

Also Published As

Publication number Publication date
JPS58128636A (en) 1983-08-01

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