JPH044104B2 - - Google Patents
Info
- Publication number
- JPH044104B2 JPH044104B2 JP61015101A JP1510186A JPH044104B2 JP H044104 B2 JPH044104 B2 JP H044104B2 JP 61015101 A JP61015101 A JP 61015101A JP 1510186 A JP1510186 A JP 1510186A JP H044104 B2 JPH044104 B2 JP H044104B2
- Authority
- JP
- Japan
- Prior art keywords
- film resistor
- abrasive
- thread
- film
- resistor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000006061 abrasive grain Substances 0.000 claims description 9
- 239000002952 polymeric resin Substances 0.000 claims description 4
- 229920001059 synthetic polymer Polymers 0.000 claims description 4
- 238000009966 trimming Methods 0.000 description 18
- 238000000034 method Methods 0.000 description 14
- 239000012212 insulator Substances 0.000 description 9
- 230000009191 jumping Effects 0.000 description 4
- 230000006866 deterioration Effects 0.000 description 3
- 239000000428 dust Substances 0.000 description 3
- 239000004677 Nylon Substances 0.000 description 2
- 239000003082 abrasive agent Substances 0.000 description 2
- 238000005452 bending Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 229920001778 nylon Polymers 0.000 description 2
- 238000007747 plating Methods 0.000 description 2
- 229920002647 polyamide Polymers 0.000 description 2
- 238000007790 scraping Methods 0.000 description 2
- 230000035882 stress Effects 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 230000002542 deteriorative effect Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 230000008646 thermal stress Effects 0.000 description 1
Landscapes
- Polishing Bodies And Polishing Tools (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Apparatuses And Processes For Manufacturing Resistors (AREA)
Description
【発明の詳細な説明】
産業上の利用分野
本発明は、碍子などの絶縁基体上に、炭素や金
属などの抵抗皮膜を被着させた皮膜抵抗器の抵抗
値の調整時に抵抗皮膜を部分的に削り取りトリミ
ングを行う皮膜抵抗器のトリミング方法に関する
ものである。DETAILED DESCRIPTION OF THE INVENTION Field of Industrial Application The present invention is a film resistor in which a resistance film of carbon, metal, etc. is deposited on an insulating substrate such as an insulator. The present invention relates to a method for trimming a film resistor, which involves scraping and trimming.
従来の技術
従来、この種の皮膜抵抗器のトリミング方法に
用いられる研削物には薄い円板状の切削砥石が用
いられており、これを用いた皮膜抵抗器のトリミ
ングは第4図に示すような方法で行われていた。
すなわち、皮膜抵抗器1の両端をチヤツク2及び
2′でつかみ、皮膜抵抗器1を回転させながら軸
方向に送り、それに上記の切削砥石3を高速回転
させながら当てることによつて、らせん状にトリ
ミングを行い、抵抗値を調整していた。4は軸4
aとベアリング4bからなるスピンドルで、上記
切削砥石3を回転される働きをするものである。
5は上記スピンドル4を収めてなるカツタホルダ
ーであり、またスピンドル4はモータ6、大プー
リー7、小プーリー8及びベルト9により回転駆
動される。Conventional technology Conventionally, a thin disk-shaped cutting wheel has been used as the grinding object used in this type of film resistor trimming method, and film resistor trimming using this grinding wheel is as shown in Figure 4. It was done in a certain way.
That is, by grasping both ends of the film resistor 1 with the chucks 2 and 2', feeding the film resistor 1 in the axial direction while rotating it, and applying the above-mentioned cutting wheel 3 to it while rotating at high speed, it is turned into a spiral shape. I trimmed it and adjusted the resistance value. 4 is axis 4
It is a spindle consisting of a bearing 4b and a bearing 4b, and serves to rotate the cutting wheel 3.
Reference numeral 5 designates a cutter holder that houses the spindle 4, and the spindle 4 is rotationally driven by a motor 6, a large pulley 7, a small pulley 8, and a belt 9.
そして、上記切削砥石3を皮膜抵抗器1に当て
るやり方としては、第5図に示すような構成が一
般的であつた。すなわち、切削砥石3を回転させ
るスピンドル4を収めたカツタホルダー5をカツ
タホルダー保持具13を介して支点10で支え、
おもり11の位置を調整することで切削砥石3を
皮膜抵抗器1に押し付ける力を調整し、カム12
によつて切削砥石3を皮膜抵抗器1に当てるタイ
ミングを取つていた。また、第5図において、1
4はおもりシヤフト、15はカムレバー、16は
支点である。 As a method of applying the cutting wheel 3 to the film resistor 1, a configuration as shown in FIG. 5 has been common. That is, the cutter holder 5 containing the spindle 4 for rotating the cutting whetstone 3 is supported by the fulcrum 10 via the cutter holder holder 13,
By adjusting the position of the weight 11, the force that presses the cutting wheel 3 against the film resistor 1 is adjusted, and the cam 12
The timing for applying the cutting wheel 3 to the film resistor 1 was determined by the following. Also, in Figure 5, 1
4 is a weight shaft, 15 is a cam lever, and 16 is a fulcrum.
発明が解決しようとする問題点
上記の円板状切削砥石及びそれを用いた従来の
皮膜抵抗器のトリミング方法には、以下に述べる
ような問題点があつた。Problems to be Solved by the Invention The above-mentioned disc-shaped cutting grindstone and the conventional film resistor trimming method using the same have the following problems.
(1) 切削砥石を高速回転させて皮膜抵抗器に当て
てトリミングを行うため、皮膜抵抗器に熱的ス
トレスや機械的ストレスを与え、溝の縁に細か
い亀裂などを残し、これらが電気的特性悪化の
要因になる。また、皮膜抵抗器の温度が上がる
ことにより、抵抗皮膜の温度特性のために抵抗
値が常温時とは異なる値となり、抵抗値調整時
の抵抗値計測誤差を生じ易い。(1) Trimming is performed by rotating a cutting wheel at high speed and applying it to the film resistor, which applies thermal and mechanical stress to the film resistor, leaving fine cracks on the edges of the grooves, which affect the electrical characteristics. It becomes a factor of deterioration. Furthermore, as the temperature of the film resistor increases, the resistance value becomes different from that at room temperature due to the temperature characteristics of the resistance film, which tends to cause a resistance value measurement error when adjusting the resistance value.
(2) 第5図に示したように、切削砥石3の刃先と
皮膜抵抗器1との接触がカツタホルダー5など
の自重のみによつて行われているため、特に溝
切り開始時に刃先のブレが生じて溝深さ及び溝
幅が変動する。また、切削砥石が皮膜抵抗器上
で弾んだ場合は溝跳びを起こす。これらのこと
は製品となつた皮膜抵抗器の電気的特性悪化の
原因となる。(2) As shown in Fig. 5, since the contact between the cutting edge of the cutting wheel 3 and the film resistor 1 is made only by the weight of the cutter holder 5, etc., the blade edge is unstable, especially when starting grooving. occurs and the groove depth and groove width fluctuate. Additionally, if the cutting wheel bounces on the film resistor, it will cause groove jumping. These factors cause deterioration of the electrical characteristics of the film resistor as a product.
(3) 上記(2)項の溝跳びや溝不良を防ぐには、ある
程度以上強く切削砥石を皮膜抵抗器に押し付け
なければならず、そのために数十μm程度の深
い溝ができることになる。この様子を示したの
が第6図であり、17は上述した深い溝であ
る。この第6図に示されるように、皮膜抵抗器
を構成する抵抗器碍子18の表面に存在する抵
抗皮膜19の部分の厚みは、抵抗器碍子18の
表面粗さを含め数μm以下である。したがつ
て、上記の深い溝17のために抵抗器本体の機
械的曲げ強度が極端に低下することになる。こ
れは例えば製品となつた皮膜抵抗器をインサー
トマシンでプリント基板に挿入する際に、皮膜
抵抗器が折れる原因となり好ましくない。ま
た、抵抗器碍子を深く削ることによりアルミナ
などからなる碍子の粉塵が多量に発生すること
になるが、この粉塵は人体に有害なばかりでな
く、他の機械の精密部に詰つたりして正常な機
能を阻害する。(3) In order to prevent the groove jumping and groove defects mentioned in item (2) above, it is necessary to press the cutting wheel against the film resistor with a certain degree of force, which results in the formation of grooves as deep as several tens of micrometers. This state is shown in FIG. 6, where 17 is the deep groove mentioned above. As shown in FIG. 6, the thickness of the portion of the resistance film 19 existing on the surface of the resistor insulator 18 constituting the film resistor, including the surface roughness of the resistor insulator 18, is several μm or less. Therefore, the mechanical bending strength of the resistor body is extremely reduced due to the deep groove 17 described above. This is undesirable because it may cause the film resistor to break, for example, when the film resistor is inserted into a printed circuit board using an insert machine. Also, by cutting the resistor insulator deeply, a large amount of insulator dust made of alumina etc. is generated, but this dust is not only harmful to the human body, but can also clog the precision parts of other machines. Interfere with normal function.
(4) 切削砥石が磨耗して径が小さくなると、溝状
態が悪化したり、切り始めと切り終りのタイミ
ングのズレによりトリミング後の抵抗値が目標
からはずれたりするため、カツタホルダーの位
置調整が必要であり、生産性の低下を招くこと
になる。(4) When the diameter of the cutting wheel becomes smaller due to wear, the condition of the groove deteriorates, and the resistance value after trimming deviates from the target due to the timing difference between the start and end of cutting, so it is important to adjust the position of the cutter holder. This is necessary and will lead to a decrease in productivity.
(5) 第6図に示すように溝のエツジが鋭くなるの
で、製品搬送時などにおいて他の皮膜抵抗器の
抵抗皮膜や端子キヤツプのメツキを傷付け易
く、溝のエツジ自身も欠けて抵抗値が変化した
り、他の皮膜抵抗器の端子キヤツプのメツキが
抵抗皮膜に付着したりして電気的特性が悪化す
る。(5) As shown in Figure 6, the edges of the grooves become sharp, so it is easy to damage the resistance film of other film resistors and the plating of the terminal caps during product transportation, and the edges of the grooves themselves are also chipped, reducing the resistance value. Otherwise, the plating of the terminal caps of other film resistors may adhere to the resistive film, deteriorating the electrical characteristics.
(6) チヤツクへの皮膜抵抗器のはさみ込みに失敗
し、偏心状態でチヤツキングして皮膜抵抗器が
偏心回転した場合には、切削砥石の刃先に衝撃
が加わり、刃の一部が欠ける原因となる。この
ようにして刃の一部が欠けた場合には溝状態が
著しく悪化し、そのまま気づかずにトリミング
を続けた場合は不良品を多量に生産してしまう
ことになる。(6) If the film resistor fails to be inserted into the chuck and the film resistor rotates eccentrically due to eccentric chucking, an impact will be applied to the cutting edge of the cutting wheel, causing part of the blade to chip. Become. If a part of the blade is chipped in this way, the condition of the groove will deteriorate significantly, and if trimming is continued without noticing, a large number of defective products will be produced.
(7) 切削砥石が一定以上磨耗したり、目つぶれを
起こした場合は、ドレツシングや交換が必要
で、その際に細かい調整を必要とし、生産性を
上げることに制約がある。(7) If the cutting wheel wears beyond a certain level or becomes clogged, it needs to be dressed or replaced, which requires fine adjustments and limits productivity.
本発明はこのような従来の問題点を解決するも
ので、皮膜抵抗器の表面のほぼ抵抗皮膜のみを削
り取り、トリミングを行うことのできる研摩糸を
用いた皮膜抵抗器のトリミング方法を提供しよう
とするものである。 The present invention aims to solve these conventional problems and provide a method for trimming a film resistor using an abrasive thread that can perform trimming by scraping off almost only the resistance film on the surface of the film resistor. It is something to do.
問題点を解決するための手段
この問題点を解決するために本発明は、合成高
分子樹脂中に研摩砥粒を添加して糸状になし、そ
の内部及び表面部分に研摩砥粒が分散固着されて
いる研摩糸を用いる方法である。Means for Solving the Problem In order to solve this problem, the present invention adds abrasive grains to a synthetic polymer resin to form a filament, and the abrasive grains are dispersed and fixed inside and on the surface of the filament. This is a method that uses abrasive threads.
作 用
本発明の方法で用いる研摩糸は糸状の研削物
で、それに含まれる砥粒のうち研摩糸の表面から
露出した部分が切れ刃となつて皮膜抵抗器の表面
の抵抗皮膜を削り取る働きをする。また、同じ研
摩糸をくり返し多数回トリミングに使用すると、
研摩糸の表面に露出した砥粒部分は少しずつ摩耗
するが、合成高分子樹脂も同時に少しずつ摩耗す
るので、研摩糸内部に含まれている砥粒が新しく
表面に現われ、研削力は保たれることになる。Function The abrasive thread used in the method of the present invention is a thread-like abrasive material, and the part of the abrasive particles contained therein that is exposed from the surface of the abrasive thread serves as a cutting edge to scrape off the resistance film on the surface of the film resistor. do. Also, if the same abrasive thread is used repeatedly for trimming,
The abrasive grains exposed on the surface of the abrasive thread wear out little by little, but the synthetic polymer resin also wears out little by little at the same time, so new abrasive grains contained inside the abrasive thread appear on the surface, maintaining the grinding power. It will be.
そして、研摩糸は糸状であるため、皮膜抵抗器
の表面から離れることなく走行させることが容易
にできるので溝跳びが生じることもなく、皮膜抵
抗器の表面の浅い部分(ほぼ抵抗皮膜の存在する
部分のみ)のトリミングが容易にできることとな
る。 Since the abrasive thread is in the form of a thread, it can be easily run without leaving the surface of the film resistor, so there is no groove jumping, and it can be used in shallow areas on the surface of the film resistor (approximately where the resistance film is present). This makes it easy to trim only parts of the image.
実施例
以下、本発明の一実施例について第1図から第
3図を参照しながら説明する。Embodiment An embodiment of the present invention will be described below with reference to FIGS. 1 to 3.
第1図において、20は本発明の方法で用いる
糸状の研削物としての研摩糸である。この研摩糸
20はポリアミド系の合成高分子樹脂である例え
ばポリアミド系のナイロン(デユポン社の商品
名)21の溶融状態のものに研摩砥粒22を重量
比で18%程度添加して均一に拡散させたものを紡
糸、延伸させ、糸状にしたもので、砥粒22とし
ては粒度が1000番程度の炭化ケイ素を主成分とし
たものを用いている。なお、第1図には研摩糸2
0の一部の拡大図を示しているが、本実施例の研
摩糸20は糸径が例えば0.3mmφで長尺のもので
ある。 In FIG. 1, reference numeral 20 indicates an abrasive thread as a thread-like abrasive material used in the method of the present invention. This abrasive thread 20 is made of a polyamide-based synthetic polymer resin, such as polyamide-based nylon (trade name of Dupont) 21, in a molten state, with abrasive grains 22 added at a weight ratio of about 18% and uniformly dispersed. The abrasive grains 22 are made of silicon carbide with a grain size of approximately No. 1000 as a main component. In addition, in Fig. 1, the abrasive thread 2
0, the abrasive thread 20 of this embodiment is long and has a thread diameter of, for example, 0.3 mmφ.
第2図は上記研摩糸を用いたトリミング方法の
一例を示しており、20は上記研摩糸、21は抵
抗皮膜をその表面に被着させた円筒形の皮膜抵抗
器、22及び22′は上記皮膜抵抗器21の両端
をつかみ回転させながら軸方向に送るチヤツク、
23はモータなどの駆動装置(図示せず)により
所定のスピードで送られる上記研摩糸20を上記
皮膜抵抗器21の表面に所定のテンシヨンを与え
ながら圧接し走行させるために上下に配置された
ガイドローラで、これらのガイドローラ23の外
周面には研摩糸20をその周面に沿つて走行させ
るために溝(図示せず)が設けられている。24
は上記ガイドローラ23を取り付けてなるガイド
ローラホルダーで、このガイドローラホルダー2
4は上記研摩糸20を皮膜抵抗器21に押し付け
ることができるように、皮膜抵抗器21に対して
前後(矢印A)方向に移動可能となつている。 FIG. 2 shows an example of a trimming method using the above-mentioned abrasive thread, where 20 is the above-mentioned abrasive thread, 21 is a cylindrical film resistor with a resistive film coated on its surface, and 22 and 22' are the above-mentioned abrasive threads. A chuck that grips both ends of the film resistor 21 and sends it in the axial direction while rotating it;
Reference numeral 23 denotes guides arranged above and below to allow the abrasive thread 20, which is sent at a predetermined speed by a drive device (not shown) such as a motor, to come into pressure contact with the surface of the film resistor 21 while applying a predetermined tension. These guide rollers 23 are provided with grooves (not shown) on their outer circumferential surfaces in order to allow the abrasive threads 20 to run along the circumferential surfaces thereof. 24
is a guide roller holder to which the guide roller 23 is attached, and this guide roller holder 2
4 is movable in the front and back (arrow A) directions with respect to the film resistor 21 so that the abrasive thread 20 can be pressed against the film resistor 21.
そして、皮膜抵抗器21をチヤツク22及び2
2′でつかみ、回転させながら軸方向へ送ると共
に、研摩糸20に所定のテンシヨンを与えながら
所定のスピードでガイドローラ23に沿つて走行
させておく。この状態でガイドローラ23に沿つ
て走行させておく。この状態でガイドローラ23
が取り付けられているガイドローラホルダー24
を皮膜抵抗器21の方へ一定量移動させて、研摩
糸20を皮膜抵抗器21に圧接させる。これによ
り、研摩糸20は抵抗皮膜をらせん状にトリミン
グする。 Then, the film resistor 21 is connected to the chucks 22 and 2.
2', and feed it in the axial direction while rotating it, and also run it along the guide roller 23 at a predetermined speed while applying a predetermined tension to the abrasive thread 20. In this state, the vehicle is allowed to run along the guide rollers 23. In this state, the guide roller 23
Guide roller holder 24 to which is attached
is moved a certain amount toward the film resistor 21, and the abrasive thread 20 is brought into pressure contact with the film resistor 21. This causes the abrasive thread 20 to helically trim the resistive coating.
第3図はこのようにしてトリミングされた皮膜
抵抗器の切り溝の状態を示す図であり、抵抗器表
面に浅い溝25が施されており、この浅い溝25
はほぼ抵抗皮膜26だけを削り取り、抵抗器碍子
27の表面は浅く削り取られているだけである。 FIG. 3 is a diagram showing the state of the cut grooves of a film resistor trimmed in this way.A shallow groove 25 is formed on the surface of the resistor, and this shallow groove 25
Almost only the resistive film 26 is scraped off, and the surface of the resistor insulator 27 is only shallowly scraped off.
発明の効果
本発明の皮膜抵抗器のトリミング方法によつて
得られる効果は下記に述べる通りである。Effects of the Invention The effects obtained by the film resistor trimming method of the present invention are as described below.
(1) 研摩糸によつて皮膜抵抗器の表面のほぼ抵抗
皮膜だけ、すなわち浅い部分のみを削り取るこ
とが可能で、研摩糸の走行スピードも従来用い
ていた切削砥石の周速の1/10程度(ほぼ300
m/分)で十分なことから、研削部の温度上昇
はほとんどない。このため、抵抗器に熱的スト
レスを与えることもなく、抵抗値調整時の計測
誤差を生じることもない。また、溝の縁に細か
い亀裂などの機械的ストレスを残すこともな
い。これらのことから電気的特性が悪化するこ
とはなくなる。(1) It is possible to scrape off almost only the resistance film on the surface of a film resistor, that is, only the shallow part, using the abrasive thread, and the running speed of the abrasive thread is about 1/10 of the circumferential speed of the conventional cutting wheel. (almost 300
m/min) is sufficient, so there is almost no temperature rise in the grinding part. Therefore, no thermal stress is applied to the resistor, and no measurement error occurs when adjusting the resistance value. Further, mechanical stress such as fine cracks does not remain on the edge of the groove. Due to these factors, the electrical characteristics will not deteriorate.
(2) 研摩糸は皮膜抵抗器の表面から離れることな
く走行させることが容易にできるため、溝跳び
が生じることがなく、かつ研摩糸に与えるテン
シヨン、走行スピード及び押し込み量を一定に
制御すれば、溝深さや溝幅などの溝状態は経時
的に不変となり、製品の電気的特性は良好に保
たれる。(2) Since the abrasive thread can be easily run without leaving the surface of the film resistor, groove jumping does not occur, and if the tension applied to the abrasive thread, running speed, and pushing amount are controlled at a constant level, Groove conditions such as groove depth and groove width remain unchanged over time, and the electrical characteristics of the product are maintained well.
(3) 皮膜抵抗器の抵抗値を調整するためのトリミ
ングは抵抗器表面の抵抗皮膜が存在する部分
(厚み数μm)のみ削り取ればよいが、研摩糸
を用いると浅い溝の研削が上述したように容易
である。このように削り取られた溝が浅いた
め、抵抗器本体の機械的曲げ強度が劣化せず、
インサートマシンでの基板への挿入時に衝撃に
よつて製品が破損することもない。また、皮膜
抵抗器の表面の浅い部分しか削らないため、碍
子はほとんど削られることがなく、これによつ
て発生する碍子の粉塵が極端に少ないものとな
る。(3) For trimming to adjust the resistance value of a film resistor, it is only necessary to scrape off the portion of the resistor surface where the resistance film is present (several μm thick), but when using abrasive thread, shallow grooves can be ground as described above. It's as easy as that. Because the grooves cut out in this way are shallow, the mechanical bending strength of the resistor body does not deteriorate.
The product will not be damaged by impact when inserted into the board with an insert machine. Furthermore, since only a shallow portion of the surface of the film resistor is scraped, the insulator is hardly scraped, and as a result, the amount of dust generated on the insulator is extremely reduced.
(4) 研摩糸が走行することによつて次々に新しい
部分が抵抗器表面に当ることになるので、研摩
糸の研削力は経時的に不変で溝状態が悪化する
ことはない。(4) As the abrasive thread runs, new parts come into contact with the resistor surface one after another, so the grinding force of the abrasive thread remains unchanged over time and the groove condition does not deteriorate.
(5) 従来のように溝のエツジが鋭くなることはな
いため、他の抵抗器を傷付けたり、溝のエツジ
自身が欠けたりしにくいことにより、抵抗器の
電気的特性の悪化が防げる。(5) Since the edges of the grooves do not become sharp as in conventional resistors, it is less likely to damage other resistors or chip the edges of the grooves themselves, thereby preventing deterioration of the resistor's electrical characteristics.
(6) 仮に、チヤツクへの皮膜抵抗器のはさみ込み
に失敗し、皮膜抵抗器が偏心回転した場合で
も、研摩糸は皮膜抵抗器の動きに合せて自由に
動けるため、研摩糸が破損することはない。(6) Even if you fail to insert the film resistor into the chuck and the film resistor rotates eccentrically, the abrasive thread can move freely according to the movement of the film resistor, so there is no risk of damage to the abrasive thread. There isn't.
(7) 碍子の表面の浅い部分のみ削り取られること
から、研摩糸の摩耗は少なく、交換の際も研摩
糸のみを掛け換えるだけでよく、細かい調整を
必要としない。したがつて、上記(5)へ(6)の点と
併せて生産性を高めることができる。(7) Since only the shallow part of the surface of the insulator is removed, there is little wear on the abrasive threads, and when replacing them, only the abrasive threads need to be replaced, and no detailed adjustments are required. Therefore, in combination with the above points (5) and (6), productivity can be increased.
第1図は本発明の研摩糸の一部分の拡大斜視
図、第2図は上記研摩糸を用いた皮膜抵抗器のト
リミング方法の一例を示す斜視図、第3図は第2
図に示された方法によりトリミングされた皮膜抵
抗器の表面状態を示す拡大断面図、第4図は従来
の皮膜抵抗器のトリミングに用いられていた研削
物である円板状の切削砥石及びそれを用いたトリ
ミング法を示す斜視図、第5図は第4図に示され
たトリミング法において切削砥石を皮膜抵抗器に
当てる機構例を示す図、第6図は切削砥石を用い
従来の方法でトリミングされた皮膜抵抗器の表面
状態を示す拡大断面図である。
20……研摩糸、21……ナイロン、22……
研摩砥粒。
FIG. 1 is an enlarged perspective view of a part of the abrasive thread of the present invention, FIG. 2 is a perspective view showing an example of a method for trimming a film resistor using the abrasive thread, and FIG.
An enlarged cross-sectional view showing the surface condition of a film resistor trimmed by the method shown in the figure. Fig. 4 shows a disc-shaped cutting whetstone, which is an abrasive used for conventional trimming of film resistors, and its grinding wheel. 5 is a perspective view showing a trimming method using a cutting wheel, FIG. 5 is a diagram showing an example of a mechanism for applying a cutting wheel to a film resistor in the trimming method shown in FIG. 4, and FIG. FIG. 3 is an enlarged cross-sectional view showing the surface state of a trimmed film resistor. 20...Abrasive thread, 21...Nylon, 22...
Abrasive grains.
Claims (1)
になしその内部及び表面部分に研摩砥粒が分散固
着されている研摩糸を用いて、抵抗皮膜をトリミ
ングすることを特徴とする皮膜抵抗器のトリミン
グ方法。1. A film resistor characterized in that the resistive film is trimmed using an abrasive thread in which abrasive grains are added to a synthetic polymer resin and the abrasive grains are dispersed and fixed to the inside and surface of the thread. How to trim the vessel.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61015101A JPS62173174A (en) | 1986-01-27 | 1986-01-27 | Abrasive string for film resistor trimming |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61015101A JPS62173174A (en) | 1986-01-27 | 1986-01-27 | Abrasive string for film resistor trimming |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62173174A JPS62173174A (en) | 1987-07-30 |
| JPH044104B2 true JPH044104B2 (en) | 1992-01-27 |
Family
ID=11879446
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP61015101A Granted JPS62173174A (en) | 1986-01-27 | 1986-01-27 | Abrasive string for film resistor trimming |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62173174A (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4106071B1 (en) * | 2007-03-15 | 2008-06-25 | 株式会社神戸工業試験場 | Fine specimen polishing equipment |
-
1986
- 1986-01-27 JP JP61015101A patent/JPS62173174A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS62173174A (en) | 1987-07-30 |
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