Deprecated: The each() function is deprecated. This message will be suppressed on further calls in /home/zhenxiangba/zhenxiangba.com/public_html/phproxy-improved-master/index.php on line 456
JPH0453945B2 - - Google Patents
[go: Go Back, main page]

JPH0453945B2 - - Google Patents

Info

Publication number
JPH0453945B2
JPH0453945B2 JP62051897A JP5189787A JPH0453945B2 JP H0453945 B2 JPH0453945 B2 JP H0453945B2 JP 62051897 A JP62051897 A JP 62051897A JP 5189787 A JP5189787 A JP 5189787A JP H0453945 B2 JPH0453945 B2 JP H0453945B2
Authority
JP
Japan
Prior art keywords
temperature
minutes
alloy
annealing
strength
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP62051897A
Other languages
Japanese (ja)
Other versions
JPS63219540A (en
Inventor
Akira Sugawara
Naoyuki Kanehara
Takashi Kurokawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dowa Holdings Co Ltd
Original Assignee
Dowa Mining Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dowa Mining Co Ltd filed Critical Dowa Mining Co Ltd
Priority to JP5189787A priority Critical patent/JPS63219540A/en
Publication of JPS63219540A publication Critical patent/JPS63219540A/en
Publication of JPH0453945B2 publication Critical patent/JPH0453945B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Conductive Materials (AREA)

Description

【発明の詳細な説明】[Detailed description of the invention]

〔産業上の利用分野〕 本発明は、強度、弾性、電気伝導性に優れ且つ
曲げ加工性、メツキ信頼性、応力緩和特性に優れ
た電気・電子部品の端子・コネクター用高強度銅
合金の製造法に関する。 〔従来の技術および発明の背景〕 プラグ側およびソケツト側の導電端子を構成す
る端子・コネクター用材料は、その形状や大きさ
を問わず、強度、弾性、応力緩和特性、耐食性等
の様々な諸特性を兼備したうえ、加工が容易で且
つ安価な材料であることが要求される。かような
端子・コネクター用材料として従来より最も普通
に使用されているものに黄銅およびリン青銅があ
る。 黄銅は成形加工性が容易で且つ安価であるとい
う長所を持つが、耐食性、耐応力腐食割れ性が悪
くて、急激な進歩を遂げている最近の電気・電子
工業における端子・コネクター用材料としては信
頼性に欠ける場合がある。一方、リン青銅は強
度、弾性、耐食性および耐応力腐食割れ性は良好
であるが、特に強度が要求される場合にはSnを
5%以上含有するために高価であり、また導電率
や応力緩和特性が悪いという欠点をもつ。 特開昭60−184655号公報、特開昭61−159541号
公報、特開昭62−50428号公報等には適量のTiと
Niを含有させた銅基合金が示されている。この
種の合金はTi−Ni系の化合物をマトリツクス中
に分散析出させることによつて強度と導電率の向
上を図ることができる。 本発明は最近の電気・電子部品の進歩に伴つて
端子・コネクター用材料に対しても厳しく要求さ
るようになつた諸特性を併せもつ材料の開発を目
的としたものであり、特にTi、Ni、Znを適量含
有させると共にその製造条件を適正に規制するこ
とによつて、強度、弾性および電気伝導性が共に
良好で且つ曲げ加工性、半田メツキ耐熱密着性、
応力緩和特性等が優れた端子・コネクター用高強
度銅合金を提供するものである。 〔発明の要旨〕 本発明合金は、重量%において、Ni:1.0〜4.0
%、Ti;0.5〜2.0%、ただし、Ni/Tiの重量百分
率の比率が1.2〜3.3の範囲、Zn:0.1〜3.0%、さ
らに場合によつては、Zr、Mg、P、Bのうち1
種または2種以上を単独または総計で0.01〜0.5
%含み、残部がCuおよび不可避的不純物からな
り、Ni−Ti系金属間化合物が均一微細にCuマト
リツクス中に析出した組織を有し、以下の製造法
によつて、端子・コネクター、リードフレームに
要求される諸特性を併せて具備する合金とするこ
とができる。 すなわち本発明によれば、重量%において
Ni:1.0〜4.0%、Ti;0.5〜2.0%、ただしNi/Ti
の重量百分率の比率が1.2〜3.3の範囲、Zn:0.1〜
3.0%を含み、場合によつては更にZr、Mg、P、
Bのうち1種または2種以上を単独または総計で
0.01〜0.5%含み、残部がCuおよび不可避的不純
物からなる銅合金の板素材を製造し、これを900
℃以上の温度で溶体化処理し、最終板厚まで冷間
圧延する途中で700〜800℃の温度で1〜60分間の
焼鈍を少なくとも1回挟んで冷間圧延し、次いで
400〜600℃の温度で5〜720分間の時効処理を行
なうことを特徴とする端子・コネクター用高強度
銅合金の製造法を提供する。特に本発明合金にお
いて冷間圧延の途中に行なう該焼鈍は、後記の実
施例で示すように時効後の特性に有利に作用し、
良好な導電率と成形加工性をバランスよく具備し
た材料とすることができる。 〔発明の詳述〕 以下に、本発明合金の添加元素の含有量の範囲
選定理由と製造条件について個別に説明する。 本発明の銅基合金はNi−Ti系金属間化合物に
よる析出強化および分散強化を図つた点に基本的
な特徴があり、このためにNiとTiは本発明合金
において不可欠の元素である。 Ti含有量は0.5%(重量%、以下同じ)未満で
はNiとの共存下でも強度、弾性の向上効果が少
ない。一方、Ti含有量が2.0%を超えると析出物
が過度に多くなつて合金の延性、曲げ加工性、メ
ツキ信頼性を低下させる。したがつて、本発明合
金のTi含有量は0.5〜2.0%の範囲とする。 Niは、Tiと化合物を形成し、強度、弾性の向
上に寄与する元素である。また、鋳造組織を微細
にし且つ溶体化処理時の結晶粒粗大化を防止する
効果がある。このような効果を発揮するには、
1.0%以上の含有が必要であるが、4.0%を超えて
含有すると、電気および熱の伝導性の低下が顕著
となる。したがつてNi含有量は1.0〜4.0%の範囲
とする。 また、NiとTiはNi−Ti系金属間化合物として
析出するときに本発明の目的が達成される。この
Ni−Ti系金属間化合物の析出による強化を十分
に発揮するには、Ni/Tiの重量百分率による比
率を1.2〜3.3の範囲にすることが必要であること
がわかつた。Ni/Ti比が1.2より小さい場合には
TiとCuとの化合物であるTi−Cu系金属間化合物
が時効析出する。このTi−Cu系金属間化合物が
析出しても電気および熱の伝導性の向上は少な
い。また、溶体化処理時に結晶粒が粗大化し易
く、従つて曲げ加工時に表面肌荒れを生じ易くな
る。このようなことからNi/Ti比は1.2以上とす
る必要がある。他方、Ni/Ti比が3.3より大きい
場合には、マトリツクスに残留するNi量が多く
なつて電気および熱の伝導性を低下させる。この
ような理由から本発明合金の特性を十分に発揮す
るにはNi/Ti比を1.2〜3.3の範囲にすることが必
要である。 Znは、本発明合金のメツキ信頼性を向上させ
る。具体的にはSnメツキやSn−Pbメツキの耐熱
密着性を向上させる。電気・電子部品に対するメ
ツキはSnメツキやSn−Pbメツキが一般である
が、本発明合金のようにNiやTiを含有する材料
にこのメツキを施した場合には、通電や環境によ
つて長時間加熱された場合にNiやTiがメツキ界
面に拡散し、メツキのSnと反応して反応拡散層
を形成することがある。この反応拡散層は脆弱で
あるのでこれが生成するとメツキが剥離し易くな
り、メツキ信頼性を低下させる。Znを適量添加
するとNiやTiのCu中での拡散が抑制され、界面
の反応拡散層の形成を効果的に抑制できる。した
がつて、本発明合金においてZnはメツキ信頼性
の向上に有益に機能する。また、Znは脱酸作用
があるので溶湯の脱酸剤にもなるし、さらに溶湯
の流れ性を良くするので鋳造性も向上させる。こ
のようなZnの添加効果を発揮するには0.1%以上
の含有が必要であるが、3.0%を超えて含有する
と伝気電導性の低下が著しくなり、また応力腐食
割れ感受性が高まり耐食性が低下する。このよう
な理由からZnの含有量は0.1〜3.0%の範囲とす
る。 Zr、Mg、P、Bは、本発明合金の溶製時にお
ける脱酸剤として有益である。十分な脱酸は添加
元素であるNiやTiの酸化防止にもなり、また合
金の材料特性を向上させることができる。例え
ば、ZrやMgは本発明合金の強度、弾性の改善効
果があり、PやBは加工性の改善効果がある。こ
のような効果を得るには、これら元素の1種また
は2種以上を総計で0.01%以上添加すればよい。
しかし総計で0.5%を超えて含有すると電気伝導
性および曲げ加工性が低下してくる。したがつて
これらの1種または2種以上の元素の添加量は総
計で0.01〜0.5%の範囲とする。 このような成分組成に調整した本発明の銅基合
金はNi−Ti系金属間化合物を均一微細に分散析
出させることによつて近時の電気・電子部品の要
求を満足する諸特性を同時に具備した材料とする
ことができる。このような諸特性は加工の途中に
適切な熱処理条件を採用した製造法によつて有利
に発現させることができる。 以下にその製造法の詳細を説明する。 まず、Ni:1.0〜4.0%、Ti;0.5〜2.0%、ただ
し、Ni/Tiの重量百分率の比率が1.2〜3.3の範
囲、Zn:0.1〜3.0%、場合によつてはさらに、
Zr、Mg、P、Bのうち1種または2種以上を単
独または総計で0.01〜0.5%含み、残部がCuおよ
び不可避的不純物からなる鋳片を溶解鋳造によつ
て製造する。この溶解鋳造は不活性ガスあるいは
還元ガス雰囲気中で行なうのが望ましい。次いで
鋳片(鋳塊)を熱間圧延して熱延板を製造し、脱
スケールを行なう。 以下、この熱延板を900℃以上の温度で溶体化
処理し、最終板厚まで冷間圧延する途中で700〜
800℃の温度で1〜60分間の焼鈍を少なくとも1
回挟んで冷間圧延し、次いで400〜600℃の温度で
5〜720分間の時効処理を行なうのであるが、そ
の作用を順に説明する。 溶体化処理については900℃以上で行なうこと
が必要である。900℃未満の温度では十分に溶体
化せず、したがつて、熱延の工程で生じた粗大な
析出物が十分に消失しないので特性の向上が図れ
ない。また、900℃未満の温度では結晶粒の調整
も難しい。この溶体化処理の時期については、溶
体化処理によつて生じることもある板のうねり等
を消去し且つ適度の加工硬化を付与する意味で、
冷間圧延の前に実施するのがよい。 時効処理は、板材製造の最終工程で実施するの
であるが、これは400〜600℃の温度で5〜720分
間の条件で実施する。600℃を超える温度では析
出するNi−Ti系金属間化合物が凝集粗大化して
特性の向上が期待できなくなり、また400℃未満
の温度では析出するに要する時間が長くなり過ぎ
るので好ましくない。したがつて時効温度は400
〜600℃の範囲とする。時効時間については5分
未満では析出物の形成が不十分であり、720分を
超えるような長時間では析出物の成長のうえから
もまた経済性のうえからも好ましくない。 一方、冷間圧延では目標板厚にまで圧延するさ
いに、圧延途中で700〜800℃の温度で1〜60分間
の焼鈍を少なくとも1回挟んで冷間圧延すること
によつて、時効処理後の動電率および曲げ加工性
を一層向上させることができる。この中間焼鈍は
溶体化処理温度より低い温度で且つ時効処理温度
より高い温度で行う。すなわち700℃より低い温
度では時効析出が進んで材料が硬化しその後の圧
延性を低下させ且つ曲げ加工性が低下するので
700℃以上の温度で実施する。しかし800℃を超え
る温度では合金の軟化が著しくなり、また再結晶
しはじめることによる結晶粒の混粒が材料の曲げ
加工性を低下させる。したがつて焼鈍温度は700
〜800℃の範囲とする。焼鈍時間については1分
未満では導電率および曲げ加工性の向上効果が少
なく、60分を超えると合金の軟化が著しくなり適
度の硬さを維持できなくなるので1〜60分とす
る。 この中間焼鈍の効果は二段時効処理(一段目は
低い温度、二段目は高い温度で行なう時効処理)
の一段目のそれと似たところがあるが、組織挙動
や作用は基本的な違いがあると考えてよい。この
点は後記の実施例で説明する。 以上の熱処理を経ることによつて、Ni−Ti系
金属間化合物がCuマトリツクス中に微細且つ均
一に分散析出した組織の銅基合金の薄板が製造で
きる。この合金は、後記の実施例に示すように、
高強度、高弾性、高導電率を兼備し、且つ曲げ加
工性、メツキ信頼性、応力緩和特性等に優れるの
で、近年の電気・電子部品の軽薄短小化を可能に
する端子・コネクター用材料として好適なもので
ある。 実施例 1 第1表にその化学成分値(重量%)を示す銅基
合金No.1〜No.11を高周波溶解炉を用いて溶製し、
40mm×40mm×140mmの鋳塊に鋳造した。溶解鋳造
雰囲気は完全に不活性ガスでシールドした。各鋳
塊を40mm×40mm×10mmの大きさに切断し、この鋳
片を950℃で熱間圧延し、厚さ3mmの熱延板を得
た。これを面削したあと1mmまで冷延し、950℃
の温度で30分間の溶体化処理を行つた。 これを水急冷、酸洗したあと、厚さ0.4mmまで
中間焼鈍なしで冷間圧延し、500℃の温度で60分
間の時効処理を施し、この処理を終えた材料を試
験材とした。なお、前述の各熱処理についてはそ
の雰囲気を不活性ガスまたは還元性ガス雰囲気と
して材料表面および内部の酸化をできるだけ抑制
した。 得られた試験材を用いて、硬度、引張強さ、ば
ね限界値、導電率、曲げ加工性、半田密着性を調
べた結果を第2表の中間焼鈍なしの欄に示した。 また、各銅基合金No.1〜No.11の板厚1mmの溶体
化処理材を板厚0.4mmまで冷間圧延するさいに、
0.6mmまで一段目の冷延を行い、次いで750℃×30
分の中間焼鈍を行つてから0.4mmまで二段目の冷
延を行つた以外は、前記例と同じ条件で時効処理
材を製造し、同様の試験を行つた結果を第2表の
中間焼鈍ありの欄に示した。 硬度、引張強さ、ばね限界値および導電率の測
定はそれぞれJISZ2244、JISZ2241、JISH3130お
よびJISH0505に従つて行つた。曲げ加工性は
90°W曲げ試験(CES−M0002−6、R=0.4mm)
を行い、中央部山表面が良好なものを○、割れが
発生したものを×として評価した。半田密着性は
半田メツキ(デイツプ:Sn−40wt.%Pb、230℃
×5sec、弱活性ロジンフラツクス使用)をした
後、150℃の温度で720時間加熱保持後、密着曲げ
し、セロハンテープにてピーリングテストを行
い、メツキが剥離しないものを○、剥離したもの
を×として評価した。 第2表の結果から次のことが明らかである。 本発明によるNo.1〜No.7の合金は、硬度、引張
強さ、ばね限界値、導電率のバランスが優れ、且
つ曲げ加工性および半田密着性も良好である。し
たがつて端子・コネクター用高強度銅合金として
非常に優れた特性を有する合金であることがわか
る。 これに対し、Ni/Ti比が本発明で規定するよ
り大きい比較合金No.8は強度および弾性が低く、
またNi/Ti比が本発明で規定するより小さい比
較合金No.9は導電率が低い。したがつて、Niお
よびTiの量が本発明で規定する範囲にあつても
Ni/Ti比が本発明で規定する範囲外であれば材
料特性のバランスが悪くて本発明の目的が達成で
きない。 また、Znを添加していない比較合金No.10は半
田密着性が悪く、Ti含有量が本発明で規定する
量より多い比較合金No.11は曲げ加工性および半田
密着性が悪い。 そして、中間焼鈍を行なうと、行わない場合に
比べて導電率が非常に向上することが明らかであ
る。
[Industrial Application Field] The present invention is directed to the production of high-strength copper alloys for terminals and connectors of electrical and electronic components, which have excellent strength, elasticity, and electrical conductivity, as well as bending workability, plating reliability, and stress relaxation properties. Regarding the law. [Prior Art and Background of the Invention] Materials for terminals and connectors that make up the conductive terminals on the plug side and the socket side have various characteristics such as strength, elasticity, stress relaxation properties, and corrosion resistance, regardless of their shape and size. In addition to having these characteristics, it is required that the material be easy to process and inexpensive. Brass and phosphor bronze are the most commonly used materials for such terminals and connectors. Brass has the advantage of being easy to mold and inexpensive, but it has poor corrosion resistance and stress corrosion cracking resistance, making it unsuitable as a material for terminals and connectors in the rapidly progressing electrical and electronic industries. May lack reliability. On the other hand, phosphor bronze has good strength, elasticity, corrosion resistance, and stress corrosion cracking resistance, but especially when strength is required, it is expensive because it contains 5% or more of Sn, and it also has poor conductivity and stress relaxation. It has the disadvantage of poor characteristics. JP-A-60-184655, JP-A-61-159541, JP-A-62-50428, etc. contain an appropriate amount of Ti.
A copper-based alloy containing Ni is shown. This type of alloy can be improved in strength and electrical conductivity by dispersing and precipitating a Ti--Ni compound in the matrix. The purpose of the present invention is to develop materials that have the characteristics that have become more stringently required for materials for terminals and connectors as a result of recent advances in electrical and electronic components. By containing an appropriate amount of Zn and properly regulating its manufacturing conditions, it has good strength, elasticity, and electrical conductivity, as well as good bending workability, heat-resistant solder plating adhesion, and
The present invention provides a high-strength copper alloy for terminals and connectors with excellent stress relaxation properties. [Summary of the Invention] The alloy of the present invention has Ni: 1.0 to 4.0 in weight%.
%, Ti; 0.5 to 2.0%, provided that the weight percentage ratio of Ni/Ti is in the range of 1.2 to 3.3, Zn: 0.1 to 3.0%, and in some cases, one of Zr, Mg, P, and B.
Species or two or more species individually or in total 0.01-0.5
%, with the remainder consisting of Cu and unavoidable impurities, and has a structure in which Ni-Ti based intermetallic compounds are uniformly and finely precipitated in a Cu matrix.By the following manufacturing method, it can be made into terminals, connectors, and lead frames. It is possible to create an alloy that has all the required properties. That is, according to the invention, in weight %
Ni: 1.0~4.0%, Ti: 0.5~2.0%, however, Ni/Ti
The weight percentage ratio ranges from 1.2 to 3.3, Zn: 0.1 to
Contains 3.0%, and in some cases further Zr, Mg, P,
One or more of B, singly or in total
A copper alloy sheet material containing 0.01~0.5% and the balance consisting of Cu and unavoidable impurities is produced, and this is heated to 900%.
Solution treatment is carried out at a temperature of ℃ or above, followed by cold rolling with at least one annealing at a temperature of 700 to 800℃ for 1 to 60 minutes during cold rolling to the final plate thickness.
Provided is a method for producing a high-strength copper alloy for terminals and connectors, which is characterized by performing aging treatment at a temperature of 400 to 600°C for 5 to 720 minutes. In particular, in the alloy of the present invention, the annealing performed during cold rolling has an advantageous effect on the properties after aging, as shown in the examples below,
A material having good electrical conductivity and moldability in a well-balanced manner can be obtained. [Detailed Description of the Invention] Below, the reasons for selecting the content range of the additive elements of the alloy of the present invention and the manufacturing conditions will be individually explained. The basic feature of the copper-based alloy of the present invention is that precipitation strengthening and dispersion strengthening are achieved by Ni-Ti intermetallic compounds, and for this purpose Ni and Ti are essential elements in the alloy of the present invention. If the Ti content is less than 0.5% (weight %, the same applies hereinafter), the effect of improving strength and elasticity will be small even in the coexistence with Ni. On the other hand, if the Ti content exceeds 2.0%, the amount of precipitates increases excessively, reducing the ductility, bending workability, and plating reliability of the alloy. Therefore, the Ti content of the alloy of the present invention is in the range of 0.5 to 2.0%. Ni is an element that forms a compound with Ti and contributes to improving strength and elasticity. It also has the effect of making the casting structure finer and preventing coarsening of crystal grains during solution treatment. To achieve this effect,
It is necessary to contain 1.0% or more, but if the content exceeds 4.0%, the electrical and thermal conductivity decreases significantly. Therefore, the Ni content should be in the range of 1.0 to 4.0%. Further, the object of the present invention is achieved when Ni and Ti are precipitated as a Ni-Ti intermetallic compound. this
It has been found that in order to fully exhibit the strengthening effect due to the precipitation of Ni-Ti intermetallic compounds, it is necessary to set the Ni/Ti weight percentage ratio in the range of 1.2 to 3.3. If the Ni/Ti ratio is less than 1.2,
A Ti-Cu intermetallic compound, which is a compound of Ti and Cu, precipitates with aging. Even if this Ti-Cu based intermetallic compound precipitates, there is little improvement in electrical and thermal conductivity. Furthermore, crystal grains tend to become coarse during solution treatment, and therefore surface roughness tends to occur during bending. For this reason, the Ni/Ti ratio needs to be 1.2 or more. On the other hand, if the Ni/Ti ratio is greater than 3.3, the amount of Ni remaining in the matrix increases, reducing electrical and thermal conductivity. For these reasons, it is necessary to keep the Ni/Ti ratio in the range of 1.2 to 3.3 in order to fully exhibit the characteristics of the alloy of the present invention. Zn improves the plating reliability of the alloy of the present invention. Specifically, it improves the heat-resistant adhesion of Sn plating and Sn-Pb plating. Sn plating or Sn-Pb plating is commonly used for plating electrical and electronic parts, but when this plating is applied to a material containing Ni or Ti, such as the alloy of the present invention, it may not last long due to current flow or environment. When heated for a long time, Ni and Ti may diffuse to the plating interface and react with the Sn of the plating to form a reaction diffusion layer. Since this reaction-diffusion layer is fragile, when it is formed, the plating is likely to peel off, reducing the plating reliability. Adding an appropriate amount of Zn suppresses the diffusion of Ni and Ti in Cu, effectively suppressing the formation of a reaction-diffusion layer at the interface. Therefore, in the alloy of the present invention, Zn functions beneficially to improve plating reliability. In addition, since Zn has a deoxidizing effect, it also acts as a deoxidizing agent for molten metal, and it also improves the flowability of molten metal, thereby improving castability. In order to exhibit the effect of Zn addition, it is necessary to contain 0.1% or more, but if the content exceeds 3.0%, the electrical conductivity decreases significantly, and the susceptibility to stress corrosion cracking increases and the corrosion resistance decreases. do. For these reasons, the Zn content is set in the range of 0.1 to 3.0%. Zr, Mg, P, and B are useful as deoxidizing agents during melting of the alloy of the present invention. Sufficient deoxidation also prevents the oxidation of Ni and Ti, which are additive elements, and can also improve the material properties of the alloy. For example, Zr and Mg have the effect of improving the strength and elasticity of the alloy of the present invention, and P and B have the effect of improving the workability. In order to obtain such an effect, one or more of these elements may be added in a total amount of 0.01% or more.
However, if the content exceeds 0.5% in total, electrical conductivity and bending workability will decrease. Therefore, the total amount of one or more of these elements added is in the range of 0.01 to 0.5%. The copper-based alloy of the present invention, which has been adjusted to such a composition, simultaneously has various properties that satisfy the demands of modern electrical and electronic components by uniformly and finely dispersing and precipitating Ni-Ti intermetallic compounds. The material can be made of Such properties can be advantageously developed by a manufacturing method that employs appropriate heat treatment conditions during processing. The details of the manufacturing method will be explained below. First, Ni: 1.0 to 4.0%, Ti: 0.5 to 2.0%, however, the weight percentage ratio of Ni/Ti is in the range of 1.2 to 3.3, Zn: 0.1 to 3.0%, and in some cases further,
A slab containing 0.01 to 0.5% of one or more of Zr, Mg, P, and B, singly or in total, with the remainder being Cu and unavoidable impurities, is produced by melting and casting. This melting and casting is preferably carried out in an inert gas or reducing gas atmosphere. Next, the slab (ingot) is hot-rolled to produce a hot-rolled plate, and descaling is performed. Below, this hot-rolled sheet is solution-treated at a temperature of 900℃ or higher, and during cold rolling to the final thickness,
At least 1 annealing for 1-60 minutes at a temperature of 800℃
The material is sandwiched and cold rolled, and then subjected to an aging treatment at a temperature of 400 to 600°C for 5 to 720 minutes, and the effects thereof will be explained in order. Solution treatment must be performed at 900°C or higher. At temperatures below 900° C., the steel will not be sufficiently solutionized and, therefore, the coarse precipitates generated during the hot rolling process will not disappear sufficiently, making it impossible to improve the properties. Furthermore, it is difficult to adjust the crystal grains at temperatures below 900°C. Regarding the timing of this solution treatment, in order to eliminate the waviness of the plate that may occur due to solution treatment and to impart appropriate work hardening,
It is best to carry out before cold rolling. Aging treatment is carried out in the final step of sheet manufacturing, and is carried out at a temperature of 400 to 600°C for 5 to 720 minutes. If the temperature exceeds 600°C, the precipitated Ni-Ti intermetallic compound will aggregate and become coarse, and no improvement in properties can be expected, and if the temperature is less than 400°C, the time required for precipitation will be too long, which is not preferable. Therefore, the aging temperature is 400
~600℃ range. Regarding the aging time, if it is less than 5 minutes, the formation of precipitates will be insufficient, and if it is for a long time, such as exceeding 720 minutes, it is not preferable from the viewpoint of the growth of precipitates and from the economic point of view. On the other hand, in cold rolling, when rolling to the target thickness, cold rolling is performed with at least one annealing for 1 to 60 minutes at a temperature of 700 to 800 degrees Celsius during rolling. It is possible to further improve the electrokinetic rate and bending workability. This intermediate annealing is performed at a temperature lower than the solution treatment temperature and higher than the aging treatment temperature. In other words, at temperatures lower than 700°C, aging precipitation progresses and the material hardens, reducing subsequent rollability and bending workability.
Perform at a temperature of 700℃ or higher. However, at temperatures exceeding 800°C, the alloy becomes significantly softened, and recrystallization begins, resulting in mixed crystal grains that reduce the bending workability of the material. Therefore, the annealing temperature is 700
~800℃ range. Regarding the annealing time, if it is less than 1 minute, the effect of improving the electrical conductivity and bending workability will be small, and if it exceeds 60 minutes, the alloy will become significantly softened and an appropriate hardness cannot be maintained, so the annealing time is set to 1 to 60 minutes. The effect of this intermediate annealing is two-stage aging treatment (the first stage is aging treatment performed at a lower temperature and the second stage is performed at a higher temperature).
Although there are some similarities with the first stage, it can be considered that there are fundamental differences in tissue behavior and action. This point will be explained in Examples below. By performing the above heat treatment, a thin plate of a copper-based alloy having a structure in which a Ni-Ti intermetallic compound is finely and uniformly dispersed and precipitated in a Cu matrix can be manufactured. This alloy, as shown in the examples below,
It has high strength, high elasticity, and high conductivity, and has excellent bending workability, plating reliability, stress relaxation properties, etc., so it can be used as a material for terminals and connectors that enables the miniaturization of electrical and electronic components in recent years. It is suitable. Example 1 Copper-based alloys No. 1 to No. 11 whose chemical composition values (wt%) are shown in Table 1 were melted using a high-frequency melting furnace.
It was cast into a 40mm x 40mm x 140mm ingot. The melting and casting atmosphere was completely shielded with inert gas. Each ingot was cut into a size of 40 mm x 40 mm x 10 mm, and this ingot was hot rolled at 950°C to obtain a hot rolled plate with a thickness of 3 mm. After face milling, it was cold rolled to 1mm and heated to 950°C.
Solution treatment was carried out for 30 minutes at a temperature of . After quenching with water and pickling, this material was cold rolled to a thickness of 0.4 mm without intermediate annealing, and subjected to aging treatment at a temperature of 500°C for 60 minutes.The material after this treatment was used as a test material. In each of the heat treatments described above, the atmosphere was an inert gas or reducing gas atmosphere to suppress oxidation on the surface and inside of the material as much as possible. Using the obtained test materials, hardness, tensile strength, spring limit value, electrical conductivity, bending workability, and solder adhesion were investigated, and the results are shown in the column without intermediate annealing in Table 2. In addition, when cold rolling the solution-treated materials of each copper-based alloy No. 1 to No. 11 with a thickness of 1 mm to a thickness of 0.4 mm,
First stage cold rolling to 0.6mm, then 750℃ x 30
An aged material was manufactured under the same conditions as in the previous example, except that intermediate annealing was performed for 20 minutes, followed by second cold rolling to 0.4 mm, and the results of the same tests are shown in Table 2. Indicated in the Yes column. Hardness, tensile strength, spring limit value, and electrical conductivity were measured in accordance with JISZ2244, JISZ2241, JISH3130, and JISH0505, respectively. The bendability is
90°W bending test (CES-M0002-6, R=0.4mm)
The test pieces were evaluated as ◯ if the center ridge surface was good, and as × if cracks occurred. Solder adhesion was determined by solder plating (dip: Sn-40wt.%Pb, 230℃
×5sec, using weakly activated rosin flux), then heated and held at 150℃ for 720 hours, bent tightly, and performed a peeling test with cellophane tape. It was evaluated as ×. The following is clear from the results in Table 2. Alloys No. 1 to No. 7 according to the present invention have an excellent balance of hardness, tensile strength, spring limit value, and electrical conductivity, and also have good bending workability and solder adhesion. Therefore, it can be seen that this alloy has extremely excellent properties as a high-strength copper alloy for terminals and connectors. On the other hand, comparative alloy No. 8, which has a larger Ni/Ti ratio than specified in the present invention, has low strength and elasticity.
Comparative alloy No. 9, in which the Ni/Ti ratio is smaller than that specified in the present invention, has low electrical conductivity. Therefore, even if the amounts of Ni and Ti are within the range specified in the present invention,
If the Ni/Ti ratio is outside the range specified by the present invention, the material properties will be unbalanced and the object of the present invention cannot be achieved. Furthermore, comparative alloy No. 10 to which Zn was not added had poor solder adhesion, and comparative alloy No. 11, in which the Ti content was higher than the amount defined by the present invention, had poor bending workability and poor solder adhesion. It is clear that when intermediate annealing is performed, the electrical conductivity is significantly improved compared to when no intermediate annealing is performed.

【表】【table】

【表】 また、第1表の本発明合金No.1と市販のリン青
銅(C5191H材 0.4mmt)について応力緩和特性
の特定を行い、その結果を第3表に示した。その
試験は、試験片の中央部の応力が45Kgf/mm2にな
るようにU字曲げを行い、150℃の温度で500時間
保持後の曲げぐせを応力緩和率として次式により
算出した。 応力緩和率(%)={(L1−L2)/(L1−L0)}×
100 ただし、 L0:治具の長さ(mm) L1:開始時の試料長さ(mm) L2:処理後の試料端間の水平距離(mm)
[Table] In addition, the stress relaxation properties of the present invention alloy No. 1 shown in Table 1 and commercially available phosphor bronze (C5191H material 0.4 mm t ) were specified, and the results are shown in Table 3. In the test, U-shaped bending was performed so that the stress at the center of the test piece was 45 kgf/mm 2 , and the bending after holding at a temperature of 150° C. for 500 hours was calculated as the stress relaxation rate using the following formula. Stress relaxation rate (%) = {(L 1 − L 2 )/(L 1 − L 0 )}×
100 However, L 0 : Jig length (mm) L 1 : Sample length at start (mm) L 2 : Horizontal distance between sample edges after processing (mm)

【表】 第3表からは、本発明合金は従来の代表的な端
子・コネクター用材料であるリン青銅に比べて応
力緩和率が低く、応力緩和特性が優れていること
がわかる。 実施例 2 第1表のNo.7の化学成分を有する合金を製造条
件を変えて製造した。各製造条件は次のとおりで
ある。 (1) 実施例1の中間焼鈍なしのものに同じ。 (2) 実施例1の中間焼鈍ありのものに同じ。すな
わち板厚1mmの溶体化処理材を板厚0.4mmまで
冷間圧延するさいに、0.6mmまで一段目の冷延
を行い、次いで中間焼鈍を行つてから0.4mmま
で二段目の冷延を行つた以外は実施例1と同じ
とした。そのさいの中間焼鈍は750℃×30分で
ある。 (3) 溶体化処理を850℃×30分とした以外は実施
例1の中間焼鈍なしのものと同じ(溶体化処理
温度が低い比較例)。 (4) 溶体化処理を900℃×30分とし、そして時効
処理を390℃×60分とした以外は実施例1の中
間焼鈍なしのものと同じとした(時効処理温度
が低い比較例)。 (5) 溶体化処理を900℃×30分とし、そして時効
処理を610℃×30分とした以外は実施例1の中
間焼鈍なしのものと同じとした(時効処理温度
が高い比較例)。 (6) 中間焼鈍の条件を820℃×30分とした以外は
前記の(2)と同じとした。 (7) 中間焼鈍の条件を680℃×30分とした以外は
前記の(2)と同じとした。 得られた各材料を実施例1と同じ測定法で試験
し、硬度、引張強さ、ばね限界値、導電率および
曲げ加工性を調べ、その結果を第4表に示した。
Table 3 shows that the alloy of the present invention has a lower stress relaxation rate and superior stress relaxation properties than phosphor bronze, which is a typical conventional material for terminals and connectors. Example 2 An alloy having the chemical composition No. 7 in Table 1 was manufactured under different manufacturing conditions. Each manufacturing condition is as follows. (1) Same as Example 1 without intermediate annealing. (2) Same as Example 1 with intermediate annealing. In other words, when cold rolling a solution-treated material with a thickness of 1 mm to a thickness of 0.4 mm, the first stage of cold rolling is performed to 0.6 mm, then intermediate annealing is performed, and then the second stage of cold rolling is performed to 0.4 mm. The procedure was the same as in Example 1 except for the following. At that time, intermediate annealing was performed at 750°C for 30 minutes. (3) Same as Example 1 without intermediate annealing except that the solution treatment was performed at 850°C for 30 minutes (comparative example where the solution treatment temperature is low). (4) Same as Example 1 without intermediate annealing except that the solution treatment was 900°C x 30 minutes and the aging treatment was 390°C x 60 minutes (comparative example with low aging treatment temperature). (5) Same as Example 1 without intermediate annealing except that the solution treatment was 900°C x 30 minutes and the aging treatment was 610°C x 30 minutes (comparative example with high aging treatment temperature). (6) The conditions for intermediate annealing were the same as in (2) above, except that the conditions were 820°C x 30 minutes. (7) The conditions for intermediate annealing were the same as in (2) above, except that the conditions were 680°C x 30 minutes. Each of the obtained materials was tested using the same measuring method as in Example 1, and the hardness, tensile strength, spring limit value, electrical conductivity, and bending workability were investigated, and the results are shown in Table 4.

【表】 第4表から明らかなように、本発明法にしたが
つて製造した(2)の合金は、硬度、引張強さ、ばね
限界値および導電率のバランスに優れ且つ曲げ加
工性が良好であるのに対し、溶体化処理温度の低
い比較例(3)、時効温度の低い比較例(4)、時効温度
の高い比較例(5)のものは、強度、弾性、導電率の
バランスが悪く、また(3)と(5)のものは更に曲げ加
工性も悪いことがわかる。 そして、中間焼鈍温度の高い比較例(6)のもの
は、硬度、引張強さ、ばね限界値、曲げ加工性に
劣つている。これは、焼鈍温度が高すぎるために
Ni−Ti系化合物の析出核が生成せず、或いは生
成しても再固溶し、さらには再結晶が起こり始め
て混粒となり、強度や曲げ加工性に悪影響を及ぼ
していると考えられる。 他方、中間焼鈍温度の低い比較例(7)のもので
は、強度は優れるものの曲げ加工性が劣化してい
る。これは、焼鈍温度が低すぎ、Ni−Ti系化合
物が転位線上或いは粒界等に次々に析出し成長す
る温度域に入り、このため時効析出による内部ひ
ずみの上昇が過度に大きくなつてその後の冷間圧
延と時効処理によつても強度と導電率等は向上で
きても成形加工性は向上できないものと考えられ
る。なおこの比較例(7)とほぼ同等の温度を最終時
効温度とした場合にも、先の比較例(5)に見られる
ようにばね限界値と曲げ加工性が悪くなる。 このように溶体化処理後、時効処理前の冷間圧
延途中において本発明合金に700〜800℃×1〜60
分の中間焼鈍を行なうことは強度、弾性、電気伝
導性および成形加工性をバランス良く具備した端
子・コネクター材料を得る上で有益な作用を供す
る。かような作用が奏される理由としては、既に
900℃以上の温度で溶体化処理が行われているの
で、添加元素のNi、Ti等は十分に再固溶してお
り、また均一粒に結晶粒が調整されていること、
焼鈍前の過飽和固溶体の板材に圧延加工が加えら
れているので転位が導入され析出物の核生成場所
が多数存在すること、さらには、この焼鈍温度に
おいてNi−Ti系化合物の析出核の生成・析出・
成長が起きるが、引き続き行なう圧延加工と時効
処理によつて更に該化合物を均一且つ微細に析出
させることができ、このためマトリツクス中に固
溶するNi、Tiが可能な限り減少すること、等が
考えられる。 以上のように、本発明法によれば、高強度、高
弾性、高伝導性を有し、且つ曲げ加工性、メツキ
信頼性、応力緩和特性に優れた端子・コネクター
用高強度銅合金が得られ、近年の電気・電子部品
の軽薄短小化、回路の高密度化に十分に対応でき
る有益な材料を提供できる。
[Table] As is clear from Table 4, alloy (2) produced according to the method of the present invention has an excellent balance of hardness, tensile strength, spring limit value, and electrical conductivity, and has good bending workability. On the other hand, Comparative Example (3) with a low solution treatment temperature, Comparative Example (4) with a low aging temperature, and Comparative Example (5) with a high aging temperature have a good balance of strength, elasticity, and electrical conductivity. It can be seen that the bending properties of (3) and (5) are even worse. Comparative Example (6), which had a high intermediate annealing temperature, was inferior in hardness, tensile strength, spring limit value, and bending workability. This is because the annealing temperature is too high.
It is thought that the precipitation nuclei of the Ni-Ti-based compound are not generated, or even if they are generated, they are re-dissolved, and recrystallization begins to occur, resulting in mixed grains, which adversely affects the strength and bending workability. On the other hand, Comparative Example (7) in which the intermediate annealing temperature was low had excellent strength but poor bending workability. This is because the annealing temperature is too low and enters a temperature range where Ni-Ti compounds precipitate and grow one after another on dislocation lines or grain boundaries, and as a result, the increase in internal strain due to aging precipitation becomes excessively large. Even though cold rolling and aging treatment can improve strength, electrical conductivity, etc., it is thought that moldability cannot be improved. Note that even when the final aging temperature is set to approximately the same temperature as in Comparative Example (7), the spring limit value and bending workability deteriorate as seen in Comparative Example (5). In this way, after solution treatment and during cold rolling before aging treatment, the alloy of the present invention was heated at 700 to 800°C x 1 to 60°C.
Performing an intermediate annealing for 30 minutes provides a beneficial effect in obtaining a terminal/connector material having a good balance of strength, elasticity, electrical conductivity, and formability. The reason why such an effect is produced is that
Since the solution treatment is performed at a temperature of 900℃ or higher, the added elements such as Ni and Ti are sufficiently re-dissolved, and the crystal grains are adjusted to be uniform.
Since rolling is applied to the supersaturated solid solution plate material before annealing, dislocations are introduced and there are many places where precipitates can nucleate.Furthermore, at this annealing temperature, the formation and formation of precipitate nuclei of Ni-Ti compounds. Precipitation・
Although growth occurs, the compound can be precipitated uniformly and finely by subsequent rolling processing and aging treatment, and therefore Ni and Ti dissolved in the matrix are reduced as much as possible. Conceivable. As described above, according to the method of the present invention, a high-strength copper alloy for terminals and connectors that has high strength, high elasticity, and high conductivity, and has excellent bending workability, plating reliability, and stress relaxation properties can be obtained. This makes it possible to provide a useful material that can fully respond to the recent trends in the miniaturization of electrical and electronic components and the increased density of circuits.

Claims (1)

【特許請求の範囲】 1 重量%において、Ni:1.0〜4.0%、Ti;0.5
〜2.0%、ただし、Ni/Tiの重量百分率の比率が
1.2〜3.3の範囲、Zn:0.1〜3.0%を含み、残部が
Cuおよび不可避的不純物からなる銅合金の板素
材を製造し、これを900℃以上の温度で溶体化処
理し、最終板厚まで冷間圧延する途中で700〜800
℃の温度で1〜60分間の焼鈍を少なくとも1回挟
んで冷間圧延し、次いで400〜600℃の温度で5〜
720分間の時効処理を行なうことを特徴とする端
子・コネクター用高強度銅合金の製造法。 2 重量%において、Ni:1.0〜4.0%、Ti;0.5
〜2.0%、ただし、Ni/Tiの重量百分率の比率が
1.2〜3.3の範囲、Zn:0.1〜3.0%を含み、更にZr、
Mg、P、Bのうち1種または2種以上を単独ま
たは総計で0.01〜0.5%含み、残部がCuおよび不
可避的不純物からなる銅合金の板素材を製造し、
これを900℃以上の温度で溶体化処理し、最終板
厚まで冷間圧延する途中で700〜800℃の温度で1
〜60分間の焼鈍を少なくとも1回挟んで冷間圧延
し、次いで400〜600℃の温度で5〜720分間の時
効処理を行なうことを特徴とする端子・コネクタ
ー用高強度銅合金の製造法。
[Claims] 1% by weight: Ni: 1.0-4.0%, Ti: 0.5
~2.0%, however, if the Ni/Ti weight percentage ratio is
Range of 1.2-3.3, Zn: 0.1-3.0%, the balance
A copper alloy plate material consisting of Cu and unavoidable impurities is produced, and it is solution-treated at a temperature of 900°C or higher, and then cold-rolled to the final thickness at 700-800°C.
Cold rolled with at least one annealing for 1-60 minutes at a temperature of 400-600℃, then 5-60 minutes of annealing at a temperature of 400-600℃.
A method for manufacturing high-strength copper alloys for terminals and connectors, which is characterized by performing an aging treatment for 720 minutes. 2 In weight%, Ni: 1.0-4.0%, Ti: 0.5
~2.0%, however, if the Ni/Ti weight percentage ratio is
Range of 1.2 to 3.3, including Zn: 0.1 to 3.0%, and further Zr,
Producing a copper alloy plate material containing one or more of Mg, P, and B in an amount of 0.01 to 0.5% individually or in total, with the balance being Cu and unavoidable impurities;
This is solution treated at a temperature of 900°C or higher, and then rolled at a temperature of 700 to 800°C during cold rolling to the final thickness.
A method for producing a high-strength copper alloy for terminals and connectors, which comprises cold rolling with at least one annealing period of ~60 minutes, followed by aging treatment at a temperature of 400~600°C for 5~720 minutes.
JP5189787A 1987-03-09 1987-03-09 High-strength copper alloy for terminal and connector and its production Granted JPS63219540A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5189787A JPS63219540A (en) 1987-03-09 1987-03-09 High-strength copper alloy for terminal and connector and its production

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5189787A JPS63219540A (en) 1987-03-09 1987-03-09 High-strength copper alloy for terminal and connector and its production

Publications (2)

Publication Number Publication Date
JPS63219540A JPS63219540A (en) 1988-09-13
JPH0453945B2 true JPH0453945B2 (en) 1992-08-28

Family

ID=12899668

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5189787A Granted JPS63219540A (en) 1987-03-09 1987-03-09 High-strength copper alloy for terminal and connector and its production

Country Status (1)

Country Link
JP (1) JPS63219540A (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4728704B2 (en) * 2005-06-01 2011-07-20 古河電気工業株式会社 Copper alloy for electrical and electronic equipment
JP4646192B2 (en) * 2004-06-02 2011-03-09 古河電気工業株式会社 Copper alloy material for electrical and electronic equipment and method for producing the same

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60184655A (en) * 1984-03-02 1985-09-20 Hitachi Metals Ltd High-strength copper alloy having high electric conductivity
JPS61159541A (en) * 1984-12-28 1986-07-19 Hitachi Metals Ltd Copper alloy for lead frame
JPS6250428A (en) * 1985-08-29 1987-03-05 Furukawa Electric Co Ltd:The Copper alloy for electronic appliance

Also Published As

Publication number Publication date
JPS63219540A (en) 1988-09-13

Similar Documents

Publication Publication Date Title
KR900004109B1 (en) Leadframe materials for semiconductors, copper alloys for terminals and connectors, and manufacturing methods thereof
JPH0841612A (en) Copper alloy and its preparation
JPH09104956A (en) Manufacturing method of high strength and high conductivity copper base alloy
JP3383615B2 (en) Copper alloy for electronic materials and manufacturing method thereof
JP5135914B2 (en) Manufacturing method of high-strength copper alloys for electrical and electronic parts
JP3717321B2 (en) Copper alloy for semiconductor lead frames
JP2844120B2 (en) Manufacturing method of copper base alloy for connector
JP3511648B2 (en) Method for producing high-strength Cu alloy sheet strip
JP3049137B2 (en) High strength copper alloy excellent in bending workability and method for producing the same
JP3729733B2 (en) Copper alloy plate for lead frame
CN115652134A (en) High-strength high-bending-property copper-nickel-silicon alloy and preparation method thereof
CN115652135A (en) High-strength high-precision copper-nickel-silicon alloy and preparation method thereof
JPS6231059B2 (en)
JP7537643B2 (en) Copper alloy material and method for producing the same
JPH0534409B2 (en)
JPS6231060B2 (en)
JPH06108212A (en) Precipitation type copper alloy manufacturing method
JPH0559974B2 (en)
JPH0453945B2 (en)
JPH0418016B2 (en)
JPS6142772B2 (en)
JPH034612B2 (en)
JPH05311298A (en) Copper base alloy for connector and its manufacture
JPH0681090A (en) Production of precipitation type copper alloy
JPH0696757B2 (en) Method for producing high-strength, high-conductivity copper alloy with excellent heat resistance and bendability

Legal Events

Date Code Title Description
R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

EXPY Cancellation because of completion of term