JPH0464445B2 - - Google Patents
Info
- Publication number
- JPH0464445B2 JPH0464445B2 JP6812585A JP6812585A JPH0464445B2 JP H0464445 B2 JPH0464445 B2 JP H0464445B2 JP 6812585 A JP6812585 A JP 6812585A JP 6812585 A JP6812585 A JP 6812585A JP H0464445 B2 JPH0464445 B2 JP H0464445B2
- Authority
- JP
- Japan
- Prior art keywords
- superconducting
- thin film
- laser beam
- coil
- irradiation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000010409 thin film Substances 0.000 claims description 23
- 238000000034 method Methods 0.000 claims description 17
- 239000000463 material Substances 0.000 claims description 13
- 239000000758 substrate Substances 0.000 claims description 10
- 150000001875 compounds Chemical class 0.000 claims description 9
- 238000004519 manufacturing process Methods 0.000 claims description 7
- 239000010408 film Substances 0.000 claims description 5
- 230000001678 irradiating effect Effects 0.000 claims description 5
- 230000003287 optical effect Effects 0.000 description 6
- 229910052758 niobium Inorganic materials 0.000 description 5
- 239000004020 conductor Substances 0.000 description 4
- 239000006104 solid solution Substances 0.000 description 4
- 239000002887 superconductor Substances 0.000 description 4
- 238000004804 winding Methods 0.000 description 4
- 239000013078 crystal Substances 0.000 description 3
- 238000001556 precipitation Methods 0.000 description 3
- 238000010791 quenching Methods 0.000 description 3
- 238000002425 crystallisation Methods 0.000 description 2
- 230000008025 crystallization Effects 0.000 description 2
- 230000003247 decreasing effect Effects 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 230000020169 heat generation Effects 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 230000000171 quenching effect Effects 0.000 description 2
- 229910052720 vanadium Inorganic materials 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- 238000005481 NMR spectroscopy Methods 0.000 description 1
- -1 NbNC and MoC Chemical class 0.000 description 1
- 229910000577 Silicon-germanium Inorganic materials 0.000 description 1
- 229910052771 Terbium Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 238000000137 annealing Methods 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 229910052733 gallium Inorganic materials 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- WABPQHHGFIMREM-UHFFFAOYSA-N lead(0) Chemical compound [Pb] WABPQHHGFIMREM-UHFFFAOYSA-N 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000007578 melt-quenching technique Methods 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 150000002736 metal compounds Chemical class 0.000 description 1
- 239000013081 microcrystal Substances 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 239000003507 refrigerant Substances 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 238000011282 treatment Methods 0.000 description 1
- 238000005491 wire drawing Methods 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
- H01F41/02—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for manufacturing cores, coils, or magnets
- H01F41/04—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for manufacturing cores, coils, or magnets for manufacturing coils
- H01F41/041—Printed circuit coils
- H01F41/047—Printed circuit coils structurally combined with superconductive material
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F6/00—Superconducting magnets; Superconducting coils
- H01F6/06—Coils, e.g. winding, insulating, terminating or casing arrangements therefor
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Superconductors And Manufacturing Methods Therefor (AREA)
Description
【発明の詳細な説明】
[産業上の利用分野]
本発明は高性能の超電導コイルを簡単な方法で
生産性良く製造する方法に関するものである。DETAILED DESCRIPTION OF THE INVENTION [Industrial Application Field] The present invention relates to a method for manufacturing a high-performance superconducting coil in a simple manner and with high productivity.
[従来の技術]
電子顕微鏡や核磁気共鳴測定装置等の電磁気応
用機器或はシンクロトロン軌道放射装置などの小
型化が進むにつれて、これらの装置に使用される
電磁石に要求される性能はますます厳しくなつて
きており、こうした要求に適合し得るものとして
化合物超電導物質が脚光をあびている。即ち化合
物超電導物質としては例えばNb3Sn,Nb3Ge,
Nb3Si,Nb3Ga,Nb3A1,Nb3A1Ge,Nb3SiGe,
V3Ga,V3Ge,V3Si,V2Zr,V2Hf,NbN,
NbNC,MoC等の金属化合物が挙げられ、これ
らは臨界温度(Tc)や上部臨界磁界(Hc2)が
高い為、マグネツト用等の超電導材料として注目
されている。しかしながらこれらの化合物超電導
物質は一般に非常に硬くて脆い為、合金製導電体
の様な線状加工ができず、コイル状とするには特
殊な技術が要求される。そしてこれまでに研究さ
れ或は一部実用化されはじめている線材化法とし
ては(1)拡散法(表面拡散法、複合加工法、IN
SITU法、粉末法)、(2)蒸着法(真空蒸着、スパ
ツタリング、化学蒸着)、(3)析出法(bcc相から
の析出、非晶質相からの析出)等が知られてい
る。[Prior art] As electromagnetic application equipment such as electron microscopes and nuclear magnetic resonance measurement devices, and synchrotron orbital radiation devices become smaller, the performance required of the electromagnets used in these devices becomes increasingly strict. Compound superconducting materials are attracting attention as materials that can meet these demands. That is, examples of compound superconducting materials include Nb 3 Sn, Nb 3 Ge,
Nb 3 Si, Nb 3 Ga, Nb 3 A1, Nb 3 A1Ge, Nb 3 SiGe,
V 3 Ga, V 3 Ge, V 3 Si, V 2 Zr, V 2 Hf, NbN,
Examples include metal compounds such as NbNC and MoC, which are attracting attention as superconducting materials for magnets because of their high critical temperature (Tc) and high upper critical magnetic field (Hc 2 ). However, since these compound superconducting materials are generally very hard and brittle, they cannot be processed into wires like alloy conductors, and special techniques are required to form them into coils. The wire rod manufacturing methods that have been researched or are beginning to be put into practical use include (1) diffusion methods (surface diffusion method, composite processing method, IN
(SITU method, powder method), (2) vapor deposition method (vacuum vapor deposition, sputtering, chemical vapor deposition), (3) precipitation method (precipitation from bcc phase, precipitation from amorphous phase), etc.
[発明が解決しようとする問題点]
しかしながら上述の如き化合物超電導線材の製
法は概して製造工程が極めて煩雑である他、安定
した品質を確保することがむつかしく、しかもマ
グネツトとして実用化する為にはコイル状に巻回
しなければならないがその巻回操作が極めて困難
であるといつた難点があり、超電導コイルとして
の需要を拡大していくうえで大きな隘路となつて
いる。本発明はこうした状況のもとで、化合物超
電導物質製の安定した品質のコイル状物を簡単な
方法で安価に製造することのできる技術を提供し
ようとするものである。[Problems to be Solved by the Invention] However, the manufacturing process for compound superconducting wires as described above is generally extremely complicated, and it is difficult to ensure stable quality. It has to be wound into a shape, but the winding operation is extremely difficult, which is a major bottleneck in expanding demand for superconducting coils. Under these circumstances, the present invention aims to provide a technology that can produce a coil-shaped product made of a compound superconducting material with stable quality at a low cost by a simple method.
[問題点を解決する為の手段]
本発明に係る超電導コイルの製造方法は、A1
及び/又はCu等電気伝導度、熱伝導度に優れた
物質製の基板上に高エネルギービームの照射によ
り超電導性を発現し得る非晶質、混晶又は過飽和
固溶体の潜在的化合物超電導材料よりなる薄膜を
形成し、該薄膜上に高エネルギービームを渦巻状
に照射して該照射部を結晶性の超電導膜に変える
ところに要旨を有するものである。尚本発明で使
用される高エネルギービームとは、レーザ光線,
電子ビーム,イオンビーム等を総称するが、以下
レーザ光線で代表する。[Means for solving the problem] The method for manufacturing a superconducting coil according to the present invention includes A1
and/or consisting of a latent compound superconducting material such as amorphous, mixed crystal, or supersaturated solid solution that can exhibit superconductivity by irradiation with a high-energy beam on a substrate made of a material with excellent electrical conductivity and thermal conductivity such as Cu. The gist is that a thin film is formed and a high-energy beam is spirally irradiated onto the thin film to transform the irradiated portion into a crystalline superconducting film. The high-energy beam used in the present invention includes laser beams,
It is a general term for electron beams, ion beams, etc., but will be represented by laser beams below.
[作用]
本発明ではまずA1及び/又はCuなどの基板上
に前述の様な化合物超電導物質よりなる薄膜を形
成する。但し該薄膜の構成材料は内部組織が非晶
質,混晶又は過飽和固溶体でそれ自体では超電導
性を有しておらず、レーザ光線の照射によりはじ
めて超電導性を発現し得る潜在的超電導性の薄膜
として形成する。この様な潜在的超電導薄膜を得
る方法としては、例えばNb3Ge,V3Si,Nb3Si等
は低温基板上にスパツタリングすることにより、
容易に非晶質膜が得られる。また、V3Ge,Nb3
A1,Nb3(A1Ge)などについては、融体急冷法
により、過飽和固溶体が得られる。また、Nb3Sn
等の潜在的超電導膜は基板上に作成したNb膜に
Snをメツキすることによつても得られる。[Function] In the present invention, first, a thin film made of the above-mentioned compound superconducting material is formed on a substrate such as A1 and/or Cu. However, the constituent material of the thin film is a potentially superconducting thin film whose internal structure is amorphous, mixed crystal, or supersaturated solid solution, and does not have superconductivity by itself, but can only develop superconductivity when irradiated with a laser beam. form as. One way to obtain such a potential superconducting thin film is to sputter Nb 3 Ge, V 3 Si, Nb 3 Si, etc. onto a low-temperature substrate.
Amorphous films can be easily obtained. Also, V 3 Ge, Nb 3
For A1, Nb 3 (A1Ge), etc., supersaturated solid solutions can be obtained by the melt quenching method. Also, Nb 3 Sn
Potential superconducting films such as
It can also be obtained by plating Sn.
以上に述べた方法で基板上に薄膜を形成し、必
要によつてはNb3Ge,V3Si,Nb3Siなどについて
は焼鈍等の処理に付して混晶化を進めることによ
つて潜在的超電導薄膜とする。この薄膜は潜在的
な超電導性を有しているのみであつて超電導性を
顕在している訳ではなくしかも単なる薄膜状であ
るから、このままでは超電導コイルとしての特性
を発揮し得べくもない。本発明ではこの潜在的超
電導薄膜を特殊な方法でコイル状の超電導膜に加
工していくところに特徴を有するものであり、具
体的には後記実施例でも詳述する如く上記薄膜に
対しレーザ光線を渦巻状に照射する。レーザ光線
の照射された部分に存在する潜在的超電導体はレ
ーザ光線による局所加熱を受け、非晶質組織中に
微細結晶が成長し、臨界温度(Tc)、臨界電流
(Ic)及び臨界磁場(Hc2)が急激に高くなり、
潜在的超電導薄膜内に渦巻状の超電導顕在部が形
成される。そして、非照射部は超電導特性を生ず
ることなく潜在したままの言わば常電導部として
照射部から区別され、結局超電導部が渦巻状のラ
インとしてコイル状に形成されることになる。か
くして線材化加工等を全く要することなく超電導
コイルを得ることができる。 A thin film is formed on the substrate using the method described above, and if necessary, Nb 3 Ge, V 3 Si, Nb 3 Si, etc. can be subjected to treatments such as annealing to promote mixed crystallization. A potential superconducting thin film. Since this thin film only has latent superconductivity, not actual superconductivity, and is merely a thin film, it cannot exhibit the characteristics of a superconducting coil as it is. The present invention is characterized in that this potential superconducting thin film is processed into a coil-shaped superconducting film using a special method. Specifically, as will be described in detail in Examples below, the thin film is exposed to a laser beam. irradiates in a spiral pattern. The potential superconductor existing in the area irradiated by the laser beam is locally heated by the laser beam, and microcrystals grow in the amorphous structure, and the critical temperature (Tc), critical current (Ic) and critical magnetic field ( Hc2 ) suddenly increases,
A spiral superconducting manifest portion is formed within the latent superconducting thin film. The non-irradiated portion is distinguished from the irradiated portion as a so-called normal conducting portion that remains latent without producing superconducting characteristics, and the superconducting portion is eventually formed in the form of a coil as a spiral line. In this way, a superconducting coil can be obtained without requiring any wire processing or the like.
尚本発明では基板としてA1及び/又はCuを選
択しているが、これは次の様な理由によるもので
ある。 In the present invention, A1 and/or Cu is selected as the substrate for the following reasons.
超電導体にはクエンチという現象があり、これ
は発生した磁場の不安定性や、磁場と電流によつ
て生じるローレンツ力によつて超電導体が機械的
な歪を受けることなどで発熱が生じ常電導状態へ
移る現象である。超電導コイルにおいてこの現象
が生じると、常電導となつた高抵抗の導体に大電
流が流れ、導体の焼損など破局的な結果を招く。
そのため電気伝導率と熱伝導率の優れたA1,Cu
などの金属を超電導体に密着して設け、微小発熱
を冷媒に逃がしてクエンチを未然に防止すると共
に、万一クエンチが生じた場合には大電流をバイ
パスする役割をもたせることが必要である。 There is a phenomenon called quench in superconductors, which occurs when the superconductor undergoes mechanical strain due to the instability of the generated magnetic field or the Lorentz force generated by the magnetic field and current, causing heat generation and returning to a normal conducting state. This is a phenomenon that moves to When this phenomenon occurs in a superconducting coil, a large current flows through the high-resistance conductor that has become normal conductor, leading to catastrophic results such as burnout of the conductor.
Therefore, A1, Cu has excellent electrical conductivity and thermal conductivity.
It is necessary to provide a metal such as in close contact with the superconductor to prevent quenching by dissipating minute heat generation to the refrigerant, and to have the role of bypassing large currents in the event that quenching occurs.
[実施例]
以下本発明に係る超電導コイルの製法を実施例
図面に沿つて説明する。[Example] Hereinafter, a method for manufacturing a superconducting coil according to the present invention will be explained with reference to the drawings of the example.
第1図において1は回転盤、2は速度可変モー
タ、3は照射温度・渦巻間隔制御装置、4は光学
系走査装置、5はレーザ光線発生装置、6は反射
鏡、7は縮小光学系、Aは基板、Bは潜在的超電
導薄膜を夫々示す。本発明では前述の様な方法で
基板A上に潜在的超電導薄膜Bを形成した後、こ
れを回転盤1上に載置固定する。そして速度可変
モータ2により該回転盤1を回転させながら、レ
ーザ光線発生装置5から発射されたレーザ光線L
を反射鏡6から縮小光学系7を経て潜在的超電導
薄膜Bに集光して照射し、同時に光学系走査装置
4によつてレーザ光線Lの照射方向を矢印イ方向
へ徐々に移動させる。ここで速度可変モータ2の
回転速度wとレーザ光線Lの半径方向[矢印イ方
向]走査速度vを照射温度・渦巻間隔制御装置3
により調整すれば、レーザ光線L照射部の温度及
び渦巻間隔を任意にコントロールすることができ
る。即ちモータ2の回転速度wを大きくして潜在
的超電導薄膜Bにおけるレーザ光線Lの円周方向
走査速度を早くしてやれば照射温度は低下し、逆
に同走査速度を遅くしてやれば照射温度は上昇す
る。またレーザ光線Lの半径方向走査速度vを大
きくしてやればレーザ光線照射部BLの渦巻間隔
は広くなり、一方同走査速度vを小さくしてやれ
ばレーザ光線照射部BLの渦巻間隔は狭くなる。
従つて上記2つの走査速度w及vを適宜制御する
ことによつて、レーザ光線照射部BLに与える熱
処理の程度及び渦巻間隔(即ちコイル巻回密度)
を任意に調整することができる。このレーザ光線
照射によつて前述の如く該照射部BLにおける非
晶質、混晶又は過飽和固溶体の潜在的超電導組織
の微細結晶化が進んで超電導性が顕出し(換言す
れば超電導性が発現する最適条件となる様にレー
ザ光線照射温度を調整する)、例えば第2図(平
面図)及び第3図(横断面図)に示す如く、潜在
的超電導薄膜B層に超電導性のレーザ光線照射部
BLが渦巻状に形成され、一方非照射部BOは超電
導性を潜在するものの依然として常電導性のまま
であるから、薄膜Bには超電導性の顕出したレー
ザ光線照射部BLがコイル状に形成されることに
なる。従つて例えば第3図に示す如く超電導部
BLの最外周側及び最内周側に電極端子Ta,Tbを
接続してやれば、極低温雰囲気下で電流は超電導
部BLのみに流れることになり、超電導コイルと
しての機能を発揮し得ることになる。 In FIG. 1, 1 is a rotary disk, 2 is a variable speed motor, 3 is an irradiation temperature/vortex spacing control device, 4 is an optical system scanning device, 5 is a laser beam generator, 6 is a reflecting mirror, 7 is a reduction optical system, A indicates a substrate, and B indicates a potential superconducting thin film. In the present invention, after the latent superconducting thin film B is formed on the substrate A by the method described above, it is placed and fixed on the rotary disk 1. While the rotary disk 1 is rotated by the variable speed motor 2, a laser beam L is emitted from the laser beam generator 5.
is focused and irradiated onto the potential superconducting thin film B from the reflecting mirror 6 through the reduction optical system 7, and at the same time, the irradiation direction of the laser beam L is gradually moved in the direction of arrow A by the optical system scanning device 4. Here, the rotational speed w of the variable speed motor 2 and the scanning speed v of the laser beam L in the radial direction [direction of arrow A] are determined by the irradiation temperature/vortex spacing control device 3.
By adjusting this, the temperature of the laser beam L irradiation part and the spiral spacing can be arbitrarily controlled. That is, if the rotational speed w of the motor 2 is increased to increase the scanning speed of the laser beam L in the circumferential direction on the potential superconducting thin film B, the irradiation temperature will decrease, and conversely, if the scanning speed is decreased, the irradiation temperature will increase. . Furthermore, if the radial scanning speed v of the laser beam L is increased, the spiral interval of the laser beam irradiating part B L becomes wider, and on the other hand, if the same scanning speed v is decreased, the spiral interval of the laser beam irradiating part B L becomes narrower.
Therefore, by appropriately controlling the above two scanning speeds w and v, the degree of heat treatment applied to the laser beam irradiation section B L and the spiral spacing (i.e., the coil winding density) can be adjusted.
can be adjusted arbitrarily. As described above, this laser beam irradiation progresses the fine crystallization of the potential superconducting structure of the amorphous, mixed crystal, or supersaturated solid solution in the irradiated area B L , and superconductivity is manifested (in other words, superconductivity is expressed). For example, as shown in Figure 2 (top view) and Figure 3 (cross-sectional view), the potential superconducting thin film B layer is irradiated with a superconducting laser beam. Department
B L is formed in a spiral shape , while the non-irradiated part B O has latent superconductivity but still remains normal conductivity. It will be formed into a shape. Therefore, for example, as shown in FIG.
If electrode terminals Ta and Tb are connected to the outermost and innermost sides of B L , current will flow only to the superconducting part B L in an extremely low temperature atmosphere, and it can function as a superconducting coil. become.
尚上記のレーザ光線照射工程でモータ2を常時
定速で回転させると、潜在的超電導薄膜Bにレー
ザ光線Lを照射するときの外周側の周速度と内周
側の周速度が連続的に変わつてくる為、照射部の
熱処理温度が不均一になる。従つてレーザ光線の
照射に当たつては、外周側から内周側へ移行する
につれて徐々にモータ2の回転速度wを高め、レ
ーザ光線の走査速度が一定となる様にコントロー
ルすることが望まれる。またレーザ光線照射部
BLの渦巻間隙(即ちコイル巻回密度)は前述の
如くレーザ光線Lの半径方向走査速度vを調整す
ることによつて任意にコントロールすることがで
き、またレーザ光線照射部(超電導部)BL自体
の幅は縮小光学系の倍率を変えることによつて任
意に変更することができる。 In addition, if the motor 2 is always rotated at a constant speed in the above laser beam irradiation process, the circumferential speed on the outer circumferential side and the circumferential speed on the inner circumferential side will change continuously when the potential superconducting thin film B is irradiated with the laser beam L. As a result, the heat treatment temperature of the irradiated area becomes uneven. Therefore, when irradiating the laser beam, it is desirable to gradually increase the rotational speed w of the motor 2 as it moves from the outer circumferential side to the inner circumferential side, and to control the scanning speed of the laser beam to be constant. . Also, the laser beam irradiation part
The spiral gap (that is, the coil winding density) of B L can be arbitrarily controlled by adjusting the radial scanning speed v of the laser beam L as described above, and the laser beam irradiation part (superconducting part) B The width of L itself can be arbitrarily changed by changing the magnification of the reduction optical system.
本発明は例えば上記の様な装置及び方法によつ
て実施されるが、装置の構成自体は何ら本発明を
限定する性質のものではなく、要は基板上に形成
した潜在的超電導薄膜に対して高エネルギービー
ムを渦巻状に照射し得る機能を有する限りどの様
な装置を使用してもよい。又本発明によつて得ら
れる超電導コイルはドーナツ状の1枚物として使
用してもよく、或はこれを複数枚積層し各超電導
部をスルーホール或はリード線を介して直列に接
続して電磁力を高めることも勿論有効である。 The present invention is carried out by, for example, the above-described apparatus and method, but the structure of the apparatus itself does not limit the present invention in any way, and the point is that the potential superconducting thin film formed on the substrate Any device may be used as long as it has the function of spirally irradiating a high-energy beam. Furthermore, the superconducting coil obtained by the present invention may be used as a donut-shaped single piece, or a plurality of these may be stacked and each superconducting portion is connected in series via a through hole or a lead wire. Of course, it is also effective to increase the electromagnetic force.
[発明の効果]
本発明は以上の様に構成されており、以下に示
す様な多くの効果を享受することができる。[Effects of the Invention] The present invention is configured as described above, and can enjoy many effects as shown below.
(1) 伸線やテープ状加工等が全く不要であり、成
形加工の極めて困難な化合物超電導物質に対す
る適用が極めて簡単である。しかもコイリング
加工も不要であるから製造が簡単で極めて安価
に得ることがてできる。(1) There is no need for wire drawing or tape processing, and it is extremely easy to apply to compound superconducting materials that are extremely difficult to mold. Moreover, since coiling processing is not required, manufacturing is simple and can be obtained at extremely low cost.
(2) 極めて収束性の高い高エネルギービームを利
用する方法であるから加工精度が高く、品質の
安定した超電導コイルを得ることができる。し
かもコイル間隔や巻回密度の調整が極めて容易
であり、必要に応じた性能のものを得ることが
できる。(2) Since this method uses a high-energy beam with extremely high convergence, it is possible to obtain superconducting coils with high processing accuracy and stable quality. Moreover, it is extremely easy to adjust the coil spacing and winding density, and it is possible to obtain the performance that meets your needs.
(3) どの様なサイズ(内・外径)のコイルでも容
易に製造することができる。(3) Coils of any size (inner/outer diameter) can be easily manufactured.
(4) フオトリングラフイー法に代表されるエツチ
ング法の様にエツング液を使用する必要がない
ので、安全で2次公害等を生ずる恐れがない。(4) Unlike etching methods such as photolithography, it is not necessary to use an etching solution, so it is safe and does not cause secondary pollution.
第1図は本発明の実施例を示す概略説明図、第
2,3図は本発明で得た超電導コイルを例示する
もので、第2図は平面図、第3図は断面図であ
る。
A……基板、B……潜在的超電導薄膜、1……
回転盤、2……速度可変モータ、5……レーザ光
線発生装置、6……反射鏡、7……縮小光学系。
FIG. 1 is a schematic explanatory diagram showing an embodiment of the present invention, and FIGS. 2 and 3 illustrate a superconducting coil obtained by the present invention. FIG. 2 is a plan view, and FIG. 3 is a sectional view. A...Substrate, B...Potential superconducting thin film, 1...
Rotary disk, 2...Variable speed motor, 5...Laser beam generator, 6...Reflector, 7...Reducing optical system.
Claims (1)
い物質製の基板上に高エネルギービームの照射に
より超電導性を発現し得る非晶質の潜在的化合物
超電導材料よりなる薄膜を形成し、該薄膜上に高
エネルギービームを渦巻状に照射して該照射部を
結晶性の超電導膜に変えることを特徴とする超電
導コイルの製造方法。1. A thin film made of an amorphous latent compound superconducting material that can exhibit superconductivity by irradiation with a high-energy beam is formed on a substrate made of a material with good electrical and thermal conductivity such as A1 and/or Cu, and the thin film is A method for manufacturing a superconducting coil, which comprises irradiating a high-energy beam spirally onto the irradiated portion to transform the irradiated portion into a crystalline superconducting film.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6812585A JPS61225808A (en) | 1985-03-29 | 1985-03-29 | Manufacture of superconductive coil |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6812585A JPS61225808A (en) | 1985-03-29 | 1985-03-29 | Manufacture of superconductive coil |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61225808A JPS61225808A (en) | 1986-10-07 |
| JPH0464445B2 true JPH0464445B2 (en) | 1992-10-15 |
Family
ID=13364710
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP6812585A Granted JPS61225808A (en) | 1985-03-29 | 1985-03-29 | Manufacture of superconductive coil |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61225808A (en) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2660281B2 (en) * | 1987-02-24 | 1997-10-08 | 株式会社 半導体エネルギー研究所 | Superconductor fabrication method |
| JP2660280B2 (en) * | 1987-02-24 | 1997-10-08 | 株式会社 半導体エネルギー研究所 | Superconductor |
| JP2645489B2 (en) * | 1987-03-12 | 1997-08-25 | 株式会社 半導体エネルギー研究所 | Superconductor fabrication method |
| JPH0812819B2 (en) * | 1987-07-10 | 1996-02-07 | 株式会社半導体エネルギ−研究所 | Superconductor fabrication method |
| US4975416A (en) * | 1988-11-18 | 1990-12-04 | Sumitomo Electric Industries, Ltd. | Method of producing superconducting ceramic wire |
| US5229357A (en) * | 1988-11-18 | 1993-07-20 | Sumitomo Electric Industries, Ltd. | Method of producing superconducting ceramic wire and product |
-
1985
- 1985-03-29 JP JP6812585A patent/JPS61225808A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS61225808A (en) | 1986-10-07 |
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