JPH0468601B2 - - Google Patents
Info
- Publication number
- JPH0468601B2 JPH0468601B2 JP25860388A JP25860388A JPH0468601B2 JP H0468601 B2 JPH0468601 B2 JP H0468601B2 JP 25860388 A JP25860388 A JP 25860388A JP 25860388 A JP25860388 A JP 25860388A JP H0468601 B2 JPH0468601 B2 JP H0468601B2
- Authority
- JP
- Japan
- Prior art keywords
- crystal
- wafer
- rutile
- yvo
- optical
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000013078 crystal Substances 0.000 claims description 21
- 230000003287 optical effect Effects 0.000 claims description 10
- QWVYNEUUYROOSZ-UHFFFAOYSA-N trioxido(oxo)vanadium;yttrium(3+) Chemical compound [Y+3].[O-][V]([O-])([O-])=O QWVYNEUUYROOSZ-UHFFFAOYSA-N 0.000 claims description 4
- 235000012431 wafers Nutrition 0.000 description 13
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 8
- 238000000034 method Methods 0.000 description 8
- 238000004519 manufacturing process Methods 0.000 description 7
- 239000000463 material Substances 0.000 description 4
- 239000002994 raw material Substances 0.000 description 4
- 239000000155 melt Substances 0.000 description 3
- 230000008033 biological extinction Effects 0.000 description 2
- 229910052797 bismuth Inorganic materials 0.000 description 2
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 2
- 238000004891 communication Methods 0.000 description 2
- 239000002223 garnet Substances 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 238000000926 separation method Methods 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000006698 induction Effects 0.000 description 1
- 238000003780 insertion Methods 0.000 description 1
- 230000037431 insertion Effects 0.000 description 1
- 229910052741 iridium Inorganic materials 0.000 description 1
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
Landscapes
- Crystals, And After-Treatments Of Crystals (AREA)
Description
【発明の詳細な説明】
(産業状の利用分野)
この発明は、光通信システムに関して光デバイ
スからの反射光による雑音発生を防止するための
光アイソレータの改良に関する。DETAILED DESCRIPTION OF THE INVENTION (Industrial Application Field) The present invention relates to an improvement in an optical isolator for preventing noise generation due to reflected light from an optical device in an optical communication system.
(従来の技術)
光アイソレータの偏光子、検光子材料としてル
チル(TiO2)単結晶が主に用いられている。ル
チル単結晶の製法は酸水素炎の中に原料粉末を落
下熔融させ、下方の種子結晶の上に成長させる、
いわゆるベルヌーイ法により、多く生産されてい
る。最近、原料棒と種子結晶を垂直に配置し、赤
外線集中加熱により熔融帶を形成し、これを移動
することで単結晶を育成する、フローテイングゾ
ーン法でも製造され始めたが、いずれの方法で
も、融体の重量と表面張力との関係で成長できる
結晶径が決まってしまうため、大形結晶の育成は
できなかった。(Prior Art) Rutile (TiO 2 ) single crystal is mainly used as a polarizer and analyzer material for optical isolators. The method for manufacturing rutile single crystals involves dropping raw material powder into an oxyhydrogen flame, melting it, and growing it on top of the seed crystals below.
It is produced in large quantities using the so-called Bernoulli method. Recently, the floating zone method has begun to be used, in which a raw material rod and a seed crystal are arranged vertically, a molten envelope is formed by concentrated infrared heating, and a single crystal is grown by moving the molten envelope. However, since the crystal size that can be grown is determined by the relationship between the weight of the melt and the surface tension, it was not possible to grow large crystals.
したがって、アイソレータの製作には10数ミリ
メートル程度の大きさのウエハーを用いてた。 Therefore, wafers approximately 10-odd millimeters in size were used to manufacture isolators.
(発明が解決しようとする問題点)
光通信などに用いられる光アイソレータでは光
の入射する方向に偏光子、通過する方に検光子と
呼ばれる偏光素子を用い、その間にビスマスガー
ネツト厚膜がフアラデー回転素子として貼り合わ
さって出来ている。大きさは通常1ないし数ミリ
角であるが、製造にあたっては大きなウエハーど
うし貼り合わせ、後で細かく切断するのが、都合
がよい。これは小型のデバイスを作製するときの
一般的手法であるが、アイソレータの場合貼り合
わせの際、結晶方位を厳密に設定する必要があり
これが工数のかかる作業なので、出来るだけ大き
いウエハーからの製作が望まれるわけである。(Problem to be solved by the invention) Optical isolators used in optical communications etc. use a polarizer in the direction in which light enters and a polarizing element called an analyzer in the direction in which light passes. It is made by bonding them together as a rotating element. The size is usually 1 to several millimeters square, but it is convenient for manufacturing to bond large wafers together and then cut them into pieces later. This is a common method when manufacturing small devices, but in the case of isolators, it is necessary to strictly set the crystal orientation when bonding, which is a time-consuming process, so it is recommended to manufacture from as large a wafer as possible. It is desired.
ところで、現在ルチルウエハーは上述のよう
に、製法の関係でウエハーの最大径は12〜15mm止
まりなのに対し、ビスマスガーネット厚膜ウエハ
ーは35〜50mmと大口径のものができている。した
がって、ルチルウエハーの口径が小さいことが、
問題となっていた。又、光学的品質にも問題があ
り、良品率は50%程度と低かった。 By the way, as mentioned above, the maximum diameter of rutile wafers is currently limited to 12 to 15 mm due to the manufacturing method, whereas bismuth garnet thick film wafers are manufactured in large diameters of 35 to 50 mm. Therefore, the small diameter of the rutile wafer
It was a problem. There were also problems with optical quality, and the yield rate was as low as about 50%.
(問題点を解決するための手段)
この発明は上記問題点を解決するために、引き
上げ法で育成したYVO4(イツトリウムバナデイ
ト)単結晶を偏光子および検光子材料として用い
るものである。YVO4は一般的な引き上げ装置で
良質の大形単結晶が育成できる。(Means for Solving the Problems) In order to solve the above problems, the present invention uses a YVO 4 (yttrium vanadate) single crystal grown by a pulling method as a polarizer and analyzer material. YVO 4 can grow high-quality, large-sized single crystals using general pulling equipment.
(作用)
YVO4の偏光材料としての性質は明らかでなか
ったが、本発明者らは良質の大形結晶を育成し測
定した結果、常光、異常光の分離、偏光の消光
度、耐候性などが良質のルチルとほぼ同一である
事を見出だした。(Function) The properties of YVO 4 as a polarizing material were not clear, but as a result of growing and measuring high quality large crystals, the present inventors found that the separation of ordinary light and extraordinary light, degree of extinction of polarized light, weather resistance, etc. It was found that the quality of rutile is almost the same as that of high quality rutile.
(実施例)
YVO4単結晶育成は一般的な引き上げ装置を用
いて、高周波誘導加熱方式で行つた。原料には
YVO4組成の粉末を用い、直径50mm、深さ50mm、
肉厚1.5mmのイリジウム製るつぼに500gの原料を
充填し、c軸方位の種子結晶を用いて毎時2〜3
mmの速度で引き上げた。この間、融液温度を毎時
20〜25℃の割合で下げ続けた。約10時間引き上げ
た後育成結晶を融液より引き離し、るつぼ温度が
800℃になるまで毎時50〜70℃の割合で徐冷し、
以降放冷した。育成炉より回収した結晶は直径25
mm、長さ35mmであった、この結晶をスライス装置
の試料台に固定し、c軸からa軸方向に45度傾け
たところで厚さ1.3〜1.4mmのウエハーを製作し
た。(Example) YVO 4 single crystal growth was performed using a general pulling device and a high frequency induction heating method. For raw materials
Using powder with YVO 4 composition, diameter 50mm, depth 50mm,
Fill an iridium crucible with a wall thickness of 1.5 mm with 500 g of raw material, and use a seed crystal in the c-axis orientation to
It was pulled up at a speed of mm. During this period, the melt temperature is changed every hour.
The temperature continued to decrease at a rate of 20-25°C. After raising the crystal for about 10 hours, the grown crystal is separated from the melt and the crucible temperature reaches
Cool slowly at a rate of 50 to 70°C per hour until it reaches 800°C.
After that, it was left to cool. The crystals recovered from the growth furnace have a diameter of 25
This crystal, which was 35 mm in length and 35 mm in length, was fixed on a sample stage of a slicing device and tilted at 45 degrees from the c-axis to the a-axis direction to produce a wafer with a thickness of 1.3 to 1.4 mm.
ウエハー両面を光学研磨で1.2mmの厚さに仕上
げ、光アイソレータ用の偏光材料としての評価を
行った。測定事項は常光、異常光の分離距離、挿
入損失、消光比としたが、このいずれも良質ルチ
ルと同等であった。 Both sides of the wafer were optically polished to a thickness of 1.2 mm, and evaluated as a polarizing material for optical isolators. The measurement items were the separation distance of ordinary light and extraordinary light, insertion loss, and extinction ratio, all of which were equivalent to good quality rutile.
さらに、イツトリウムバナデイトウエハーの両
面に波長1.3μmに対する無反射膜を施した後、ビ
スマスガーネツト厚膜を貼り合わせ、光アイソレ
ータを形成し、アイソレータ機能を測定したとこ
ろ、従来の良品と同等の性能を示した。 Furthermore, after coating both sides of the yttrium vanadate wafer with an anti-reflection film for a wavelength of 1.3 μm, a thick bismuth garnet film was bonded to form an optical isolator, and the isolator function was measured. demonstrated performance.
なお、本実施例では、直径50mmのるつぼで作製
した結晶ウエハーを用いたが、より大形のるつぼ
を用いれば、大形結晶ウエハーを得ることは可能
である。 Note that in this example, a crystal wafer produced in a crucible with a diameter of 50 mm was used, but it is possible to obtain a large crystal wafer by using a larger crucible.
(発明の効果)
本発明では、YVO4単結晶ウエハーを用いる
が、このイツトリウムバナデイトは従来のルチル
と異なり、引き上げ育成法で得られるので良質の
ものが安価に得られる。また、大形化も容易なの
で、大形のフアラデー回転素子ウエハーと貼り合
わせてアイソレータを製造する場合には特に生産
効率を高めることが出来、価格の低減に寄与す
る。(Effects of the Invention) In the present invention, a YVO 4 single crystal wafer is used, but unlike conventional rutile, this yttrium vanadate is obtained by a pulling growth method, so a high quality product can be obtained at a low cost. In addition, since it is easy to increase the size, production efficiency can be particularly improved when an isolator is manufactured by bonding it with a large-sized Faraday rotary element wafer, contributing to a reduction in price.
Claims (1)
なる光アイソレータにおいて、偏光子および検光
子にYVO4(イツトリウムバナデイト)単結晶ウ
エハーを用いることを特徴とする光アイソレー
タ。1. An optical isolator comprising a polarizer, a Faraday rotator, and an analyzer, characterized in that a YVO 4 (yttrium vanadate) single crystal wafer is used for the polarizer and the analyzer.
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP25860388A JPH02103505A (en) | 1988-10-13 | 1988-10-13 | Optical isolator |
| EP19890118833 EP0363914A3 (en) | 1988-10-13 | 1989-10-10 | Optical device with optical polarizer/analyzer formed of yttrium vanadate |
| US07/420,831 US5000546A (en) | 1988-10-13 | 1989-10-12 | Optical device with optical polarizer/analyzer formed of yttrium vanadate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP25860388A JPH02103505A (en) | 1988-10-13 | 1988-10-13 | Optical isolator |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH02103505A JPH02103505A (en) | 1990-04-16 |
| JPH0468601B2 true JPH0468601B2 (en) | 1992-11-02 |
Family
ID=17322568
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP25860388A Granted JPH02103505A (en) | 1988-10-13 | 1988-10-13 | Optical isolator |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH02103505A (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102096141B (en) * | 2010-12-23 | 2015-11-11 | 福建福晶科技股份有限公司 | A kind of α-BBO polarizing prism |
-
1988
- 1988-10-13 JP JP25860388A patent/JPH02103505A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPH02103505A (en) | 1990-04-16 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| FPAY | Renewal fee payment (prs date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20071102 Year of fee payment: 15 |
|
| FPAY | Renewal fee payment (prs date is renewal date of database) |
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| EXPY | Cancellation because of completion of term |