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JPH0472204B2 - - Google Patents
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JPH0472204B2 - - Google Patents

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Publication number
JPH0472204B2
JPH0472204B2 JP14206084A JP14206084A JPH0472204B2 JP H0472204 B2 JPH0472204 B2 JP H0472204B2 JP 14206084 A JP14206084 A JP 14206084A JP 14206084 A JP14206084 A JP 14206084A JP H0472204 B2 JPH0472204 B2 JP H0472204B2
Authority
JP
Japan
Prior art keywords
lens
refractive power
lens group
meniscus
surface facing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP14206084A
Other languages
Japanese (ja)
Other versions
JPS6120920A (en
Inventor
Takamasa Hirose
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP14206084A priority Critical patent/JPS6120920A/en
Priority to GB08432300A priority patent/GB2153543B/en
Priority to DE3447489A priority patent/DE3447489C2/en
Publication of JPS6120920A publication Critical patent/JPS6120920A/en
Priority to US07/212,081 priority patent/US4891663A/en
Priority to US07/212,148 priority patent/US4977426A/en
Publication of JPH0472204B2 publication Critical patent/JPH0472204B2/ja
Granted legal-status Critical Current

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Description

【発明の詳細な説明】[Detailed description of the invention]

本発明は投影露光装置によつてIC,LSI等の集
積回路を製造するときの投影レンズに関し、特に
波長150nm〜400nmの範囲内の短波長の輝線に
近い発光スペクトルを放射する光源を用いて集積
回路のパターンをシリコンウエハー等に焼付ける
ときに有効な投影レンズに関するものである。 従来より投影露光装置を用いIC,LSI等の集積
回路のパターンをシリコンウエハーに焼付ける為
の投影レンズには非常に高い解像力が要求されて
いる。 一般に投影レンズによる投影像の解像力は使用
する波長が短かくなればなる程良くなる為に、な
るべく短波長を放射する光源が用いられている。
例えば現在水銀灯による波長436nm又は365nm
の光が投影露光装置に多く用いられている。そし
て投影レンズには高い解像力を得る為に収差を完
全に補正した理論限界値に近い解像力が得られる
ような光学系が要求されてきている。特にパター
ンを焼付ける為に解像力は画面中心に限らず全画
面にわたり理論的な限界値に近い解像力が得られ
るように収差補正がなされている。例えば集積回
路の製造においては集積回路のパターンの焼付工
程を複数回行う為に光学的な諸収差のうち歪曲収
差はほぼ完全に補正された投影レンズが用いられ
ている。 本発明は波長150nm〜400nm程度の範囲内で
の比較的狭い発光スペクトル分布を有する光源を
用いた投影露光装置における高性能な投影レンズ
の提供を目的とする。 特に本発明においては波長248.5nmを主たる発
光スペクトルとするエキシマレーザーを用いイン
ジエクシヨンロツキング等の手段によつて波長幅
を狭くした場合に特有の効果を発揮する投影レン
ズの提供を目的としている。 本発明の目的を達成する為の投影レンズの主た
る特徴は物体側より順に正、負そして正の屈折力
の第1,第2そして第3レンズ群の3つのレンズ
群を有し、前記第1レンズ群は負の屈折力の第1
−1レンズ群と正の屈折力の第1−2レンズ群の
2つのレンズ群を有しており前記第1−1レンズ
群は負の屈折力のレンズL111と物体側に凸面を向
けた負の屈折力のメニスカス形状のレンズL112
有し、前記第1−2レンズ群は両レンズ面が凸面
のレンズL121と少なくとも1枚の物体側に凸面を
向けた正の屈折力のメニスカス形状のレンズ群
L122を有し、前記第2レンズ群は物体側に凸面を
向けた負の屈折力のメニスカス形状のレンズL21
と負の屈折力のレンズL22と像面側に凸面を向け
た負の屈折力のメニスカス形状のレンズL23を有
し、前記第3レンズ群は像面側に凸面を向けた正
の屈折力のメニスカス形状のレンズL31と両レン
ズ面が凸面のレンズL32と少なくとも2枚の物体
側に凸面を向けた正の屈折力のレンズL33と物体
側の面が凸面の少なくとも1枚の正の屈折力のメ
ニスカス形状のレンズL34を有しており前記レン
ズL22の物体側と像面側のレンズ面の曲率半径を
各々R2F,R2Rとしたとき |R2F|<|R2R| ……(1) なる条件を満足することである。 本発明は前述のような構成を採ることにより良
好に収差補正を行つた投影レンズを達成してい
る。特に投影倍率1/5、撮影画角14×14mmの範囲
内において良好なる結像性能を得ている。 次に本発明の各構成要件について詳述する。 第1−1レンズ群を負の屈折力のレンズL111
物体側に凸面を向けた負の屈折力のメニスカス形
状のレンズL112で構成することにより画面全体に
わたり歪曲収差を良好に補正しマスクパターンを
歪みなく焼付けることを可能としている。そして
第1−1レンズ群の有する負の屈折力を2つのレ
ンズL111,L112に適切に分担させることにより広
画角化を図り焼付範囲を拡大させてスループツト
の向上を図つている。 レンズL111はレンズL112と同様に物体側に凸面
を向けたメニスカス形状で構成しても又は両レン
ズ面を凹面となるように構成しても良好なる収差
補正が可能である。 第1−2レンズ群を両レンズ面が凸面のレンズ
L121と少なくとも1枚の物体側に凸面を向けた正
の屈折力のメニスカス形状のレンズ群L122で構成
することにより第1−1レンズ群で発生する内向
性のコマ収差とハロー収差を補正し高解像力化を
図つている。 レンズ群L122は1枚のレンズで構成しても2枚
以上のレンズで構成しても良い。2枚以上のレン
ズで構成すればより良好にコマ収差とハロー収差
を補正することができる。 第2レンズ群を物体側に凸面を向けた負の屈折
力のメニスカス形状のレンズL21と負の屈折力の
レンズL22そして像面側に凸面を向けた負の屈折
力のメニスカス形状のレンズL23で構成すること
により第1−2レンズ群で発生する負の球面収差
及び画面中間から周辺にかけてのサジタルフレア
ーを補正している。特にレンズL22により第1−
2レンズ群で発生する負の球面収差及びハロー収
差を、又レンズL21とレンズL23により画面周辺で
のサジタルフレアーを補正している。 第2レンズ群を前述の如く構成すると軸外光線
の主光線より上方側の光束が補正過剰となり外向
性のコマ収差を発生させる原因となる。そこで第
3レンズ群を像面側に凸面を向けた正の屈折力の
メニスカス形状のレンズL31と両レンズ面が凸面
のレンズL32そして少なくとも2枚の正の屈折力
のメニスカス形状のレンズL33,L34で構成するこ
とにより第2レンズ群で発生した外向性のコマ収
差と画面中間から周辺にかけての像面湾曲及び歪
曲収差を合わせてバランス良く補正している。 条件(1)はレンズL22の物体側のレンズ面の屈折
力を像面側のレンズ面に比べて強める為のもので
ありこれにより開口数0.3近傍の球面収差及び画
面周辺のサジタルフレアーを良好に補正してい
る。条件(1)を外れると球面収差及びサジタルフレ
アーを良好に補正するのが困難となる。 レンズL22は両レンズ面が凹面であつても又は
像面側に凸面を向けたメニスカス形状であつても
条件(1)を満足するレンズ形状であれば良い。 特に第1−1レンズ群のレンズL111が両凹レン
ズで構成するときはレンズL22を像面側に凸面を
向けたメニスカス形状で構成するのが収差補正上
好ましい。 本発明においては更に次の諸条件を満足させる
のが好ましい。 前記第1,第2そして第3レンズ群の焦点距離
を各々123、前記第1−1レンズ群と前記
第1−2レンズ群の焦点距離を各々1112、前
記レンズL111の焦点距離を111、前記レンズL111
の物体側と像面側のレンズ面の曲率半径を各々
R1F,R1Rとするとき 0.85<|12|<2.2 ……(2) 0.75<|32|<1.4 ……(3) 1.4<|1112<2.5 ……(4) 1.2<11111<2.1 ……(5) |R1F|>|R1R| ……(6) なる諸条件を満足することである。 条件(2),(3)はレンズ性能の基本の1つとしての
各レンズ群の屈折力を適切に設定することにより
画面全体の像面湾曲を良好に補正するためであり
下限値を越えるとペツツバール和が大となり像面
が補正不足となり、上限値を越えると像面湾曲が
補正過剰となり画面全体の収差を良好に補正する
のが困難となる。 条件(4)は条件(2),(3)の屈折力配置のもとで第1
−1レンズ群による歪曲収差の補正と第1−2レ
ンズ群による内向性のコマ収差とハロー収差の補
正と共に画面全体の像面湾曲を少なくして高解像
力化を図る為のものである。条件(4)の下限値を越
えると像面湾曲が補正不足となり又上限値を越え
ると像面湾曲が補正過剰となつてくる。 条件(5)は負の屈折力の第1−1レンズ群の物体
側のレンズL111に対する負の屈折力の分担を適切
に設定し歪曲収差を良好に補正する為である。条
件(5)の下限値を越えると歪曲収差は補正不足とな
り又上限値を越えると歪曲収差は補正過剰となつ
てくる。 条件(6)はレンズL111の物体側のレンズ面の屈折
力を像面側のレンズ面の屈折力より弱くする為の
ものでありこれにより画面全体の歪曲収差を更に
良好に補正している。条件(6)を外れると歪曲収差
が補正不足となつてくるので好ましくない。 本発明において第3レンズ群のレンズL33とレ
ンズL34を3つ以上のレンズに分割して各レンズ
の屈折力の負担を少なくすれば画面全体にわたり
コマ収差及び像面湾曲を更に良好に補正すること
が出来より高解像力化が達成出来る。 後述する数値実施例では使用波長幅が非常に狭
い為に単一のガラスで構成した場合を示したが使
用波長幅に応じて複数のガラス例えばCaF2
MgF2等で構成しても良いことは当然である。 以上説明したように本発明によれば投影露光装
置において高解像力を有した高性能な投影レンズ
を達成することができる。 次に本発明の数値実施例1〜5の諸数値を示
す。数値実施例においてRiは物体側より順に第i
番目のレンズ面の曲率半径、Diは物体側より順に
第i番目のレンズ厚及び空間間隔、Niは物体側
より順に第i番目のレンズのガラスの屈折率であ
る。 硝材のSIO2は溶融石英であり波長248.5nmでの
屈折率は1.521130である。 数値実施例は投影倍率1/5、NA=0.3、画面範
囲14×14の場合である。又前述の各条件式と数値
実施例における諸数値との関係を表−1に示す。
The present invention relates to a projection lens used when manufacturing integrated circuits such as ICs and LSIs using a projection exposure apparatus, and in particular, the present invention relates to a projection lens used when manufacturing integrated circuits such as ICs and LSIs using a projection exposure apparatus, and in particular, the present invention relates to a projection lens used when manufacturing integrated circuits such as ICs and LSIs using a projection exposure apparatus. This invention relates to a projection lens that is effective when printing circuit patterns onto silicon wafers and the like. Conventionally, extremely high resolution has been required of projection lenses used to print patterns of integrated circuits such as ICs and LSIs onto silicon wafers using projection exposure equipment. Generally, the shorter the wavelength used, the better the resolution of the image projected by the projection lens, so a light source that emits as short a wavelength as possible is used.
For example, the current wavelength of mercury lamps is 436nm or 365nm.
This light is often used in projection exposure equipment. In order to obtain high resolving power, a projection lens is required to have an optical system that can completely correct aberrations and obtain resolving power close to the theoretical limit value. In particular, in order to print a pattern, aberrations are corrected so that resolving power close to the theoretical limit can be obtained over the entire screen, not just at the center of the screen. For example, in the manufacture of integrated circuits, the process of printing the integrated circuit pattern is performed multiple times, so a projection lens whose distortion among various optical aberrations is almost completely corrected is used. An object of the present invention is to provide a high-performance projection lens for a projection exposure apparatus using a light source having a relatively narrow emission spectrum distribution within a wavelength range of about 150 nm to 400 nm. In particular, the present invention aims to provide a projection lens that exhibits a unique effect when the wavelength width is narrowed by means such as injection locking using an excimer laser whose main emission spectrum is 248.5 nm. . The main feature of the projection lens for achieving the object of the present invention is that it has three lens groups, first, second, and third lens groups, each having positive, negative, and positive refractive powers in order from the object side. The first lens group has negative refractive power.
It has two lens groups, the -1 lens group and the 1-2 lens group with positive refractive power, and the 1-1 lens group has a lens L 111 with negative refractive power and a convex surface facing the object side. The first-second lens group includes a meniscus-shaped lens L 112 with negative refractive power, and the first-second lens group includes a lens L 121 with both lens surfaces convex and at least one meniscus with positive refractive power with the convex surface facing the object side. shaped lens group
L 122 , and the second lens group includes a meniscus-shaped lens L 21 with a negative refractive power and a convex surface facing the object side.
and a lens L 22 with a negative refractive power, and a meniscus-shaped lens L 23 with a negative refractive power with a convex surface facing the image side, and the third lens group has a positive refractive lens L 23 with a convex surface facing the image side. A lens L 31 with a power meniscus shape, a lens L 32 with both lens surfaces convex, at least two lenses L 33 with positive refractive power with a convex surface facing the object side, and at least one lens with a convex surface facing the object side. It has a meniscus-shaped lens L 34 with positive refractive power, and when the radii of curvature of the object-side and image-side lens surfaces of the lens L 22 are R 2F and R 2R , respectively, |R 2F |<|R 2R | ...(1) The following condition is satisfied. The present invention achieves a projection lens that satisfactorily corrects aberrations by employing the above-described configuration. Particularly good imaging performance has been achieved within the range of projection magnification of 1/5 and shooting angle of view of 14 x 14 mm. Next, each component of the present invention will be explained in detail. The 1st-1st lens group is composed of a lens L 111 with a negative refractive power and a meniscus-shaped lens L 112 with a negative refractive power with a convex surface facing the object side, which effectively corrects distortion over the entire screen and masks it. This makes it possible to print patterns without distortion. By appropriately distributing the negative refractive power of the 1-1st lens group to the two lenses L 111 and L 112 , the angle of view is widened, the printing range is expanded, and the throughput is improved. Like the lens L 112 , the lens L 111 can be configured to have a meniscus shape with a convex surface facing the object side, or both lens surfaces can be configured to have concave surfaces to achieve good aberration correction. The 1st-2nd lens group is a lens with both lens surfaces convex.
Composed of L 121 and at least one meniscus-shaped lens group L 122 with positive refractive power with a convex surface facing the object side, it corrects introverted coma aberration and halo aberration that occur in the 1-1 lens group. We are working on increasing the resolution. The lens group L 122 may be composed of one lens or two or more lenses. By using two or more lenses, coma aberration and halo aberration can be better corrected. The second lens group includes a meniscus-shaped lens L 21 with a negative refractive power with a convex surface facing the object side, a lens L 22 with a negative refractive power, and a meniscus-shaped lens with a negative refractive power with a convex surface facing the image side. L 23 corrects negative spherical aberration occurring in the first and second lens groups and sagittal flare from the center to the periphery of the screen. Especially with lens L 22 the first -
Negative spherical aberration and halo aberration occurring in the two lens groups are corrected, and sagittal flare at the periphery of the screen is corrected by lenses L21 and L23 . If the second lens group is configured as described above, the light flux above the principal ray of the off-axis rays will be overcorrected, causing extroverted coma aberration. Therefore, the third lens group includes a meniscus-shaped lens L 31 with positive refractive power with its convex surface facing the image plane side, a lens L 32 with both lens surfaces convex, and at least two meniscus-shaped lenses L with positive refractive power. 33 and L 34 , the extroverted coma aberration generated in the second lens group and the field curvature and distortion from the center to the periphery of the screen are corrected in a well-balanced manner. Condition (1) is to strengthen the refractive power of the lens surface on the object side of the lens L 22 compared to the lens surface on the image side, and this improves the spherical aberration near the numerical aperture of 0.3 and the sagittal flare around the screen. It has been corrected. If condition (1) is not met, it becomes difficult to satisfactorily correct spherical aberration and sagittal flare. The lens L 22 may have a lens shape that satisfies condition (1), even if both lens surfaces are concave or a meniscus shape with a convex surface facing the image plane side. In particular, when the lens L 111 of the 1-1st lens group is configured as a biconcave lens, it is preferable for the lens L 22 to be configured in a meniscus shape with a convex surface facing the image plane side in terms of aberration correction. In the present invention, it is preferable that the following conditions are further satisfied. The focal lengths of the first, second and third lens groups are 1 , 2 and 3 , respectively, the focal lengths of the 1-1st lens group and the 1-2nd lens group are 11 and 12 , respectively, and the lens L 111 The focal length of the lens is 111 , and the lens L is 111.
Let the radius of curvature of the lens surface on the object side and image side be respectively
When R 1F and R 1R , 0.85<| 1/2 |< 2.2 ……(2) 0.75<| 3/2 <1.4……(3) 1.4<| 11/122.5 ……(4) 1.2 < 111 / 11 <2.1 ...(5) |R 1F | > | R 1R | ...(6) It is to satisfy the following conditions. Conditions (2) and (3) are necessary to properly correct the field curvature of the entire screen by appropriately setting the refractive power of each lens group, which is one of the basics of lens performance. If the Petzval sum becomes large, the image plane will be under-corrected, and if the upper limit is exceeded, the field curvature will be over-corrected, making it difficult to satisfactorily correct the aberrations of the entire screen. Condition (4) is the first condition under the refractive power arrangement of conditions (2) and (3).
This is to correct distortion aberration by the -1 lens group, correct introverted coma aberration and halo aberration by the 1-2 lens group, and reduce the field curvature of the entire screen to achieve high resolution. If the lower limit of condition (4) is exceeded, the field curvature will be under-corrected, and if the upper limit is exceeded, the field curvature will be over-corrected. Condition (5) is for appropriately setting the share of negative refractive power for the object-side lens L 111 of the 1-1 lens group having negative refractive power, and for satisfactorily correcting distortion. When the lower limit of condition (5) is exceeded, distortion becomes under-corrected, and when the upper limit is exceeded, distortion becomes over-corrected. Condition (6) is to make the refractive power of the lens surface on the object side of lens L 111 weaker than the refractive power of the lens surface on the image side, thereby better correcting the distortion of the entire screen. . If condition (6) is not met, distortion becomes under-corrected, which is not preferable. In the present invention, by dividing lenses L 33 and L 34 of the third lens group into three or more lenses to reduce the burden on the refractive power of each lens, coma aberration and field curvature can be better corrected over the entire screen. As a result, higher resolution can be achieved. In the numerical examples described later, since the wavelength range used is very narrow, a case is shown in which a single glass is used. However, depending on the wavelength width used, multiple glasses such as CaF 2 ,
It goes without saying that it may be composed of MgF 2 or the like. As described above, according to the present invention, a high-performance projection lens with high resolution can be achieved in a projection exposure apparatus. Next, numerical values of numerical examples 1 to 5 of the present invention are shown. In the numerical example, R i is the i-th i in order from the object side.
The radius of curvature of the ith lens surface, D i is the thickness and spatial interval of the ith lens in order from the object side, and N i is the refractive index of the glass of the ith lens in order from the object side. The glass material SIO 2 is fused silica and has a refractive index of 1.521130 at a wavelength of 248.5 nm. The numerical example is a case where the projection magnification is 1/5, NA=0.3, and the screen range is 14×14. Further, Table 1 shows the relationship between each of the above-mentioned conditional expressions and various numerical values in the numerical examples.

【表】【table】

【表】【table】

【表】【table】

【表】【table】

【表】【table】

【表】【table】

【表】【table】

【表】【table】

【表】【table】 【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明の数値実施例1のレンズ断面
図、第2図〜第6図は各々本発明の数値実施例1
〜5の諸収差図である。 図中,,は各々第1,第2,第3レンズ
群、I11,I12は各々第1−1、第1−2レンズ群、
Yは像高、Mはメリデイオナル像面、Sはサジタ
ル像面である。
FIG. 1 is a sectional view of a lens according to numerical example 1 of the present invention, and FIGS. 2 to 6 are numerical example 1 of the present invention.
-5 various aberration diagrams. In the figure, , are the first, second, and third lens groups, respectively, and I 11 and I 12 are the 1-1 and 1-2 lens groups, respectively.
Y is the image height, M is the meridional image surface, and S is the sagittal image surface.

Claims (1)

【特許請求の範囲】 1 物体側より順に正、負そして正の屈折力の第
1,第2そして第3レンズ群の3つのレンズ群を
有し、前記第1レンズ群は負の屈折力の第1−1
レンズ群と正の屈折力の第1−2レンズ群の2つ
のレンズ群を有しており、前記第1−1レンズ群
は負の屈折力のレンズL111と物体側に凸面を向け
た負の屈折力のメニスカス形状のレンズL112を有
し、前記第1−2レンズ群は両レンズ面が凸面の
レンズL121と少なくとも1枚の物体側に凸面を向
けた正の屈折力のメニスカス形状のレンズ群L122
を有し、前記第2レンズ群は物体側に凸面を向け
た負の屈折力のメニスカス形状のレンズL21と負
の屈折力のレンズL22と像面側に凸面を向けた負
の屈折力のメニスカス形状のレンズL23を有し、
前記第3レンズ群は像面側に凸面を向けた正の屈
折力のメニスカス形状のレンズL31と両レンズ面
が凸面のレンズL32と物体側に凸面を向けた正の
屈折力のレンズL33と物体側の面が凸面の少なく
とも1枚の正の屈折力のメニスカス形状のレンズ
L34を有しており、前記レンズL22の物体側と像面
側のレンズ面の曲率半径を各々R2F,R2R、前記
第1,第2そして第3レンズ群の焦点距離を各々
f1,f2,f3、前記第1−1レンズ群と前記第1−
2レンズ群の焦点距離を各々f11,f12、前記レン
ズL111の焦点距離をf111、前記レンズL111の物体
側と像面側のレンズ面の曲率半径を各々R1F
R1Rとするとき |R2F|<|R2R| 0.85<|f1/f2|<2.2 0.75<|f3/f2|<1.4 1.4<|f11/f12|<2.5 1.2<f111/f11<2.1 |R1F|>|R1R| なる条件を満足することを特徴とする投影レン
ズ。
[Claims] 1. It has three lens groups: positive, negative, and first, second, and third lens groups with positive refractive power in order from the object side, and the first lens group has negative refractive power. 1-1
It has two lens groups: a lens group and a 1-2 lens group with positive refractive power, and the 1-1 lens group has a negative lens group L 111 with a negative refractive power and a negative lens group with a convex surface facing the object side. The first-second lens group has a meniscus-shaped lens L 112 with a refractive power of , and the first-second lens group includes a lens L 121 with both lens surfaces convex and at least one meniscus-shaped lens with a positive refractive power with a convex surface facing the object side. Lens group L 122
The second lens group includes a meniscus-shaped lens L 21 with a negative refractive power with a convex surface facing the object side, a lens L 22 with a negative refractive power, and a negative refractive power with a convex surface facing the image plane side. It has a meniscus shaped lens L 23 ,
The third lens group includes a meniscus-shaped lens L 31 with a positive refractive power with a convex surface facing the image side, a lens L 32 with both lens surfaces convex, and a lens L with a positive refractive power with a convex surface facing the object side. 33 and at least one meniscus-shaped lens with a positive refractive power whose object-side surface is convex
L 34 , the radius of curvature of the object-side and image-side lens surfaces of the lens L 22 are R 2F and R 2R , respectively, and the focal lengths of the first, second, and third lens groups are respectively
f 1 , f 2 , f 3 , the 1-1st lens group and the 1-1st lens group;
The focal lengths of the two lens groups are f 11 and f 12 respectively, the focal length of the lens L 111 is f 111 , the radius of curvature of the object-side and image-side lens surfaces of the lens L 111 is R 1F , respectively.
When R 1R | R 2F | < | R 2R | 0.85 < | f 1 / f 2 | < 2.2 0.75 < | f 3 / f 2 | < 1.4 1.4 < | f 11 / f 12 | < 2.5 1.2 < f 111 /f 11 <2.1 | R 1F | > | R 1R | A projection lens characterized by satisfying the following condition.
JP14206084A 1983-12-28 1984-07-09 projection lens Granted JPS6120920A (en)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP14206084A JPS6120920A (en) 1984-07-09 1984-07-09 projection lens
GB08432300A GB2153543B (en) 1983-12-28 1984-12-20 A projection exposure apparatus
DE3447489A DE3447489C2 (en) 1983-12-28 1984-12-27 Projection exposure method and apparatus
US07/212,081 US4891663A (en) 1983-12-28 1988-06-24 Projection exposure apparatus
US07/212,148 US4977426A (en) 1983-12-28 1988-06-24 Projection exposure apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14206084A JPS6120920A (en) 1984-07-09 1984-07-09 projection lens

Publications (2)

Publication Number Publication Date
JPS6120920A JPS6120920A (en) 1986-01-29
JPH0472204B2 true JPH0472204B2 (en) 1992-11-17

Family

ID=15306485

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14206084A Granted JPS6120920A (en) 1983-12-28 1984-07-09 projection lens

Country Status (1)

Country Link
JP (1) JPS6120920A (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102004026291A1 (en) * 2004-05-28 2005-12-15 Fag Kugelfischer Ag & Co. Ohg Cage with rollers
JP5757703B2 (en) 2009-12-25 2015-07-29 Ntn株式会社 Tapered roller bearing

Also Published As

Publication number Publication date
JPS6120920A (en) 1986-01-29

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