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JPH0473844B2 - - Google Patents
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JPH0473844B2 - - Google Patents

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Publication number
JPH0473844B2
JPH0473844B2 JP14205984A JP14205984A JPH0473844B2 JP H0473844 B2 JPH0473844 B2 JP H0473844B2 JP 14205984 A JP14205984 A JP 14205984A JP 14205984 A JP14205984 A JP 14205984A JP H0473844 B2 JPH0473844 B2 JP H0473844B2
Authority
JP
Japan
Prior art keywords
lens
refractive power
lens group
meniscus
convex
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP14205984A
Other languages
Japanese (ja)
Other versions
JPS6120919A (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP14205984A priority Critical patent/JPS6120919A/en
Priority to GB08432300A priority patent/GB2153543B/en
Priority to DE3447489A priority patent/DE3447489C2/en
Publication of JPS6120919A publication Critical patent/JPS6120919A/en
Priority to US07/212,081 priority patent/US4891663A/en
Priority to US07/212,148 priority patent/US4977426A/en
Publication of JPH0473844B2 publication Critical patent/JPH0473844B2/ja
Granted legal-status Critical Current

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Description

【発明の詳細な説明】[Detailed description of the invention]

本発明は投影露光装置によつてIC、LSI等の集
積回路を製造するときの投影レンズに関し、特に
波長150nm〜400nmの範囲内の短波長の輝線に
近い発光スペクトルを放射する光源を用いて集積
回路のパターンをシリコンウエハー等に焼付ける
ときに有効な投影レンズに関するものである。 従来より投影露光装置を用いIC、LSI等の集積
回路のパターンをシリコンウエハーに焼付ける為
の投影レンズには非常に高い解像力が要求されて
いる。 一般に投影レンズによる投影像の解像力は使用
する波長が短かくなればなる程良くなる為に、な
るべく短波長を放射する光源が用いられている。
例えば現在水銀灯による波長436nm又は365nm
の光が投影露光装置に多く用いられている。そし
て投影レンズには高い解像力を得る為に収差を完
全に補正した理論限界値に近い解像力が得られる
ような光学系が要求されてきている。特にパター
ンを焼付ける為に解像力は画面中心に限らず全画
面にわたり理論的な限界値に近い解像力が得られ
るように収差補正がなされている。例えば集積回
路の製造においては集積回路のパターンの焼付工
程を複数回行う為に光学的な諸収差のうち歪曲収
差はほぼ完全に補正された投影レンズが用いられ
ている。 本発明は波長150nm〜400nm程度の範囲内で
の比較的狭い発光スペクトル分布を有する光源を
用いた投影露光装置における高性能な投影レンズ
の提供を目的とする。 特に本発明においては波長248.5nmを主たる発
光スペクトルとするエキシマレーザーを用いイン
ジエクシヨンロツキング等の手段によつて波長幅
を狭くした場合に特有の効果を発揮する投影レン
ズの提供を目的としている。 本発明の目的を達成する為の投影レンズの主た
る特徴は物体側より順に正、負そして正の屈折力
の第1、第2そして第3レンズ群の3つのレンズ
群を有し、前記第1レンズ群は負の屈折力の第1
−1レンズ群と正の屈折力の第1−2レンズ群の
2つのレンズ群を有しており、前記第1−1レン
ズ群は少なくとも2枚の物体側の面が凹面の負の
屈折力のレンズL111、L112を有し、前記第1−2
レンズ群は両レンズ面が凸面のレンズL121と物体
側の面が凸面の正の屈折力のレンズL122を有し、
前記第2レンズ群は物体側に凸面を向けた負の屈
折力のメニスカス形状のレンズL21と両レンズ面
が凹面のレンズL22と像面側に凸面を向けた負の
屈折力のメニスカス形状のレンズL23を有し、前
記第3レンズ群は像面側に凸面を向けた正の屈折
力のメニスカス形状のレンズL31と両レンズ面が
凸面のレンズL32と少なくとも2枚の物体側に凸
面を向けた正の屈折力のレンズL33と物体側の面
が凸面の少なくとも1枚の正屈折力のメニスカス
形状のレンズL34を有していることである。 本発明は前述のような構成を採ることにより良
好に収差補正を行つた投影レンズを達成してい
る。特に投影倍率1/10、撮影画角10×10mmの範囲
内において良好なる結像性能を得ている。 次に本発明の各構成要件について詳述する。 第1−1レンズ群を少なくとも2枚の像側画が
凹面の負の屈折力のレンズL111、L112、ことに望
ましくは物体側に凸面を向けた負の屈折力のメニ
スカス形状のレンズL111、L112で構成することに
より画面全体にわたり歪曲収差を良好に補正しマ
スクパターンを歪みなく焼付けることを可能とし
ている。そして第1−1レンズ群の有する負の屈
折力を2つのレンズL111、L112に適切に分担させ
ることにより広画角化を図り焼付範囲を拡大させ
てスループツトの向上を図つている。 第1−2レンズ群を両レンズ面が凸面のレンズ
L121と正の屈折力のレンズL122で構成することに
より第1−1レンズ群で発生する内向性のコマ収
差とハロー収差を補正し高解像力化を図つてい
る。 第2レンズ群を物体側に凸面を向けた負の屈折
力のメニスカス形状のレンズL21と両レンズ面が
凹面のレンズL22そして像面側に凸面を向けた負
の屈折力のメニスカス形状のレンズL23で構成す
ることにより第1−2レンズ群で発生する負の球
面収差及び画面中間から周辺にかけてのサジタル
フレアーを補正している。特にレンズL22により
第1−2レンズ群で発生する負の球面収差及びハ
ロー収差を、又レンズL21とレンスL23により画面
周辺でのサジタルフレアーを補正している。 第2レンズ群を前述の如く構成すると軸外光線
の主光線より上方側の光束が補正過剰となり外向
性のコマ収差を発生させる原因となる。そこで第
3レンズ群を像面側に凸面を向けた正の屈折力の
メニスカス形状のレンズL31と両レンズ面が凸面
のレンズL32そして少なくとも2枚の正の屈折力
のメニスカス形状のレンズL33、L34で構成するこ
とにより第2レンズ群で発生した外向性のコマ収
差と画面中間から周辺にかけての像面湾曲及び歪
曲収差を合わせてバランス良く補正している。 本発明においては更に次の諸条件を満足するの
が好ましい。 前記第1、第2そして第3レンズ群の焦点距離
を各々f1、f2、f3とし、前記第1−1レンズ群と
前記第1−2レンズ群の焦点距離を各々f11、f12
とし、前記レンズL111の焦点距離をf111としたと
き 1.9<|f1/f2|<3.7 ……(1) 0.8<|f2/f3|<1.2 ……(2) 1.1<|f11/f12|<2.3 ……(3) 1.4<f111/f11<2.2 ……(4) なる諸条件を満足することである。 条件(1)、(2)はレンズ性能の基本の1つとしての
各レンズ群の屈折力を適切に設定することにより
画面全体の画面湾曲を良好に補正するためであり
下限値を越えるとペツツバール和が大となり像面
が補正不足となり、上限値を越えると像面湾曲が
補正過剰となり画面全体の収差を良好に補正する
のが困難となる。 条件(3)は条件(1)、(2)の屈折力配置のもとで第1
−1レンズ群による歪曲収差の補正と第1−2レ
ンズ群による内向性のコマ収差とハロー収差の補
正と共に画面全体の像面湾曲を少なくして高解像
力化を図る為のものである。条件(3)の下限値を越
えると像面湾曲が補正不足となり又上限値を越え
ると像面湾曲が補正過剰となつてくる。 条件(4)は負の屈折力の第1−1レンズ群の物体
側のレンズL111に対する負の屈折力の分担を適切
に設定し歪曲収差を良好に補正する為である。条
件(4)の下限値を越えると歪曲収差は補正不足とな
り又上限値を越えると歪曲収差は補正過剰となつ
てくる。 尚本発明においてレンズL122は両レンズ面が凸
面であつても良く又物体側に凸面を向けたメニス
カス形状であつても良い。 本発明において第1−1レンズ群を3つ以上の
物体側に凸面を向けた負の屈折力のメニスカス形
状のレンズで構成すれば各レンズの屈折力の分担
が少なくなりコマ収差の発生が少なくなり又他の
諸収差への影響も少ないので好ましい。 第3レンズ群のレンズL33とレンズ34を3つ以
上のレンズに分割して各レンズの屈折力の負担を
少なくすれば画面全体にわたりコマ収差及び像画
湾曲を更に良好に補正することが出来より高解像
力化が達成出来る。 後述する数値実施例では使用波長幅が非常に狭
い為に単一のガラスで構成した場合を示したが使
用波長幅に応じて複数のガラス例えばCaF2
MgF2等で構成しても良いことは当然である。 以上説明したように本発明によれば投影露光装
置において高解像力を有した高性能な投影レンズ
を達成することができる。 次に本発明の数値実施例1〜5の諸数値を示
す。数値実施例においてRiは物体側より順に第i
番目のレンズ面の曲率半径、Diは物体側より順に
第i番目のレンズ厚及び空気間隔、Niは物体側
より順に第i番目のレンズのガラスの屈折率であ
る。 硝材のSIO2は溶融石英であり波長248.5nmでの
屈折率は1.521130である。 数値実施例は投影倍率1/10、NA−0.35、画面
範囲10×10である。又前述の各条件式と数値実施
例における諸数値との関係を表−1に示す。 数値実施例 1
The present invention relates to a projection lens used when manufacturing integrated circuits such as ICs and LSIs using a projection exposure apparatus, and in particular, the present invention relates to a projection lens used when manufacturing integrated circuits such as ICs and LSIs using a projection exposure apparatus, and in particular, the present invention relates to a projection lens used when manufacturing integrated circuits such as ICs and LSIs using a projection exposure apparatus. This invention relates to a projection lens that is effective when printing circuit patterns onto silicon wafers and the like. Conventionally, extremely high resolution has been required of projection lenses used to print patterns of integrated circuits such as ICs and LSIs onto silicon wafers using projection exposure equipment. Generally, the shorter the wavelength used, the better the resolution of the image projected by the projection lens, so a light source that emits as short a wavelength as possible is used.
For example, the current wavelength of mercury lamps is 436nm or 365nm.
This light is often used in projection exposure equipment. In order to obtain high resolving power, a projection lens is required to have an optical system that can completely correct aberrations and obtain resolving power close to the theoretical limit value. In particular, in order to print a pattern, aberrations are corrected so that resolving power close to the theoretical limit can be obtained over the entire screen, not just at the center of the screen. For example, in the manufacture of integrated circuits, the process of printing the integrated circuit pattern is performed multiple times, so a projection lens whose distortion among various optical aberrations is almost completely corrected is used. An object of the present invention is to provide a high-performance projection lens for a projection exposure apparatus using a light source having a relatively narrow emission spectrum distribution within a wavelength range of about 150 nm to 400 nm. In particular, the present invention aims to provide a projection lens that exhibits a unique effect when the wavelength width is narrowed by means such as injection locking using an excimer laser whose main emission spectrum is 248.5 nm. . The main feature of the projection lens for achieving the object of the present invention is that it has three lens groups, first, second, and third lens groups, each having positive, negative, and positive refractive powers in order from the object side. The first lens group has negative refractive power.
It has two lens groups, a -1 lens group and a 1-2 lens group with positive refractive power, and the 1-1 lens group has at least two lenses with negative refractive power and whose object-side surfaces are concave. lenses L 111 and L 112 , and the first-second lens
The lens group includes a lens L 121 whose both lens surfaces are convex, and a lens L 122 whose object side surface is convex and has a positive refractive power.
The second lens group includes a meniscus-shaped lens L 21 with a negative refractive power with a convex surface facing the object side, a lens L 22 with a concave surface on both lens surfaces, and a meniscus-shaped lens with a negative refractive power with a convex surface facing the image plane side. The third lens group includes a meniscus-shaped lens L 31 with a positive refractive power with a convex surface facing the image side, a lens L 32 with both lens surfaces convex, and at least two objects-side lenses. The lens L 33 has a positive refractive power and has a convex surface facing toward the object side, and at least one meniscus-shaped lens L 34 has a positive refractive power and has a convex surface on the object side. The present invention achieves a projection lens that satisfactorily corrects aberrations by employing the above-described configuration. Particularly good imaging performance was obtained within the range of projection magnification of 1/10 and shooting angle of view of 10 x 10 mm. Next, each component of the present invention will be explained in detail. The 1-1 lens group includes at least two lenses L 111 , L 112 with negative refractive power whose image side image is concave, preferably a meniscus-shaped lens L with negative refractive power with a convex surface facing the object side. 111 and L 112 , it is possible to satisfactorily correct distortion over the entire screen and print the mask pattern without distortion. By appropriately distributing the negative refractive power of the 1-1st lens group to the two lenses L 111 and L 112 , the angle of view is widened, the printing range is expanded, and the throughput is improved. The 1st-2nd lens group is a lens with both lens surfaces convex.
By configuring the lens L 121 and the lens L 122 with positive refractive power, inward coma aberration and halo aberration occurring in the 1-1st lens group are corrected, and high resolution is achieved. The second lens group consists of a meniscus-shaped lens L 21 with negative refractive power with its convex surface facing the object side, a lens L 22 with concave surfaces on both lens surfaces, and a meniscus-shaped lens L 22 with negative refractive power with its convex surface facing the image plane side. By configuring the lens L 23 , negative spherical aberration occurring in the first and second lens groups and sagittal flare from the center to the periphery of the screen are corrected. In particular, the lens L 22 corrects negative spherical aberration and halo aberration occurring in the first and second lens groups, and the lenses L 21 and L 23 correct sagittal flare at the periphery of the screen. If the second lens group is configured as described above, the light flux above the principal ray of the off-axis rays will be overcorrected, causing extroverted coma aberration. Therefore, the third lens group includes a meniscus-shaped lens L 31 with positive refractive power with its convex surface facing the image plane side, a lens L 32 with both lens surfaces convex, and at least two meniscus-shaped lenses L with positive refractive power. 33 and L 34 , the extroverted coma aberration generated in the second lens group and the field curvature and distortion from the center to the periphery of the screen are corrected in a well-balanced manner. In the present invention, it is preferable that the following conditions are further satisfied. The focal lengths of the first, second, and third lens groups are f 1 , f 2 , and f 3 , respectively, and the focal lengths of the 1-1 lens group and the 1-2 lens group are f 11 , f , respectively. 12
When the focal length of the lens L 111 is f 111 , 1.9<|f 1 /f 2 |<3.7 ...(1) 0.8<|f 2 /f 3 |<1.2 ...(2) 1.1<| It is to satisfy the following conditions: f 11 /f 12 |<2.3 ...(3) 1.4<f 111 /f 11 <2.2 ...(4) Conditions (1) and (2) are necessary to properly correct the screen curvature of the entire screen by appropriately setting the refractive power of each lens group, which is one of the basics of lens performance. If the sum becomes large, the image plane will be under-corrected, and if the upper limit is exceeded, the field curvature will be over-corrected, making it difficult to satisfactorily correct the aberrations of the entire screen. Condition (3) is the first condition under the refractive power arrangement of conditions (1) and (2).
This is to correct distortion aberration by the -1 lens group, correct introverted coma aberration and halo aberration by the 1-2 lens group, and reduce the field curvature of the entire screen to achieve high resolution. If the lower limit of condition (3) is exceeded, the field curvature will be under-corrected, and if the upper limit is exceeded, the field curvature will be over-corrected. Condition (4) is for appropriately setting the share of the negative refractive power for the object-side lens L 111 of the 1-1 lens group having negative refractive power, and for satisfactorily correcting distortion. When the lower limit of condition (4) is exceeded, distortion becomes under-corrected, and when the upper limit is exceeded, distortion becomes over-corrected. In the present invention, the lens L 122 may have both lens surfaces convex or may have a meniscus shape with the convex surface facing the object side. In the present invention, if the 1-1st lens group is composed of three or more meniscus-shaped lenses with negative refractive power with convex surfaces facing the object side, the sharing of refractive power between each lens will be reduced, and the occurrence of comatic aberration will be reduced. This is also preferable because it has less influence on other aberrations. By dividing lens L 33 and lens 34 of the third lens group into three or more lenses to reduce the burden on the refractive power of each lens, it is possible to better correct coma aberration and image curvature over the entire screen. Higher resolution can be achieved. In the numerical examples described later, since the wavelength range used is very narrow, a case is shown in which a single glass is used.However, depending on the wavelength width used, multiple glasses such as CaF2 ,
It goes without saying that it may be composed of MgF 2 or the like. As described above, according to the present invention, a high-performance projection lens with high resolution can be achieved in a projection exposure apparatus. Next, various numerical values of numerical examples 1 to 5 of the present invention are shown. In the numerical example, R i is the i-th i in order from the object side.
The radius of curvature of the ith lens surface, D i is the thickness and air gap of the ith lens in order from the object side, and N i is the refractive index of the glass of the ith lens in order from the object side. The glass material SIO 2 is fused silica and has a refractive index of 1.521130 at a wavelength of 248.5 nm. The numerical example has a projection magnification of 1/10, NA-0.35, and a screen range of 10×10. Further, Table 1 shows the relationship between each of the above-mentioned conditional expressions and various numerical values in the numerical examples. Numerical example 1

【表】【table】

【表】【table】

【表】【table】

【表】【table】

【表】【table】

【表】【table】

【表】【table】

【表】【table】 【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明の数値実施例1のレンズ断面
図、第2図〜第6図は各々本発明の数値実施例1
〜5の諸収差図である。 図中,,は各々第1、第2、第3レンズ
群、11,I12は各々第1−1、第1−2レンズ
群、Yは像高、Mはメリデイオナル像面、Sはサ
ジタル像面である。
FIG. 1 is a sectional view of a lens according to numerical example 1 of the present invention, and FIGS. 2 to 6 are numerical example 1 of the present invention.
5 is a diagram of various aberrations. In the figure, , are the first, second, and third lens groups, 11 and I12 are the 1-1 and 1-2 lens groups, respectively, Y is the image height, M is the meridional image surface, and S is the sagittal image. It is a surface.

Claims (1)

【特許請求の範囲】 1 物体側より順に正、負そして正の屈折力の第
1、第2そして第3レンズ群の3つのレンズ群を
有し、前記第1レンズ群は負の屈折力の第1−1
レンズ群と正の屈折力の第1−2レンズ群の2つ
のレンズ群を有しており、前記第1−1レンズ群
は少なくとも2枚の像側の面が凹面の負の屈折力
のレンズL111、L112を有し、前記第1−2レンズ
群は両レンズ面が凸面のレンズL121と物体側の面
が凸面の正の屈折力のレンズL122を有し、前記第
2レンズ群は物体側に凸面を向けた負の屈折力の
メニスカス形状のレンズL21と両レンズ面が凹面
のレンズL22と像面側に凸面を向けた負の屈折力
のメニスカス形状のレンズL23を有し、前記第3
レンズ群は像面側に凸面を向けた正の屈折力のメ
ニスカス形状のレンズL31と両レンズ面が凸面の
レンズL32と物体側に凸面を向けた正の屈折力の
レンズL33と物体側の面が凸面の少なくとも1枚
の正の屈折力のメニスカス形状のレンズL34を有
しており、前記第1、第2そして第3レンズ群の
焦点距離を各々f1、f2、f3とし、前記第1−1レ
ンズ群と前記第1−2レンズ群の焦点距離を各々
f11、f12とし、前記レンズL111の焦点距離をf111
したとき 1.9<|f1/f2|<3.7 0.8<|f2/f3|<1.2 1.1<|f11/f12|<2.3 1.4<f111/f11<2.2 なる諸条件を満足することを特徴とする投影レン
ズ。
[Claims] 1. In order from the object side, there are three lens groups: positive, negative, and first, second, and third lens groups with positive refractive power, and the first lens group has negative refractive power. 1-1
It has two lens groups, a lens group and a 1-2 lens group with positive refractive power, and the 1-1 lens group includes at least two lenses with negative refractive power whose image side surfaces are concave. L 111 and L 112 , the first-second lens group includes a lens L 121 whose both lens surfaces are convex, and a positive refractive power lens L 122 whose object side surface is a convex surface, and the second lens The group consists of a meniscus-shaped lens L 21 with a negative refractive power with a convex surface facing the object side, a lens L 22 with concave surfaces on both lens surfaces, and a meniscus-shaped lens L 23 with a negative refractive power with a convex surface facing the image side. and the third
The lens group consists of a meniscus-shaped lens L 31 with a positive refractive power with a convex surface facing the image side, a lens L 32 with convex surfaces on both lens surfaces, a lens L 33 with a positive refractive power with a convex surface facing the object side, and the object. It has at least one meniscus-shaped lens L 34 with a positive refractive power and a convex side surface, and the focal lengths of the first, second, and third lens groups are f 1 , f 2 , and f , respectively. 3 , and the focal lengths of the 1-1st lens group and the 1-2nd lens group are each
When f 11 and f 12 and the focal length of the lens L 111 is f 111 , 1.9<|f 1 /f 2 |<3.7 0.8<|f 2 /f 3 |<1.2 1.1<|f 11 /f 12 A projection lens characterized by satisfying the following conditions: |<2.3 1.4<f 111 /f 11 <2.2.
JP14205984A 1983-12-28 1984-07-09 Projection lens Granted JPS6120919A (en)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP14205984A JPS6120919A (en) 1984-07-09 1984-07-09 Projection lens
GB08432300A GB2153543B (en) 1983-12-28 1984-12-20 A projection exposure apparatus
DE3447489A DE3447489C2 (en) 1983-12-28 1984-12-27 Projection exposure method and apparatus
US07/212,081 US4891663A (en) 1983-12-28 1988-06-24 Projection exposure apparatus
US07/212,148 US4977426A (en) 1983-12-28 1988-06-24 Projection exposure apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14205984A JPS6120919A (en) 1984-07-09 1984-07-09 Projection lens

Publications (2)

Publication Number Publication Date
JPS6120919A JPS6120919A (en) 1986-01-29
JPH0473844B2 true JPH0473844B2 (en) 1992-11-24

Family

ID=15306459

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14205984A Granted JPS6120919A (en) 1983-12-28 1984-07-09 Projection lens

Country Status (1)

Country Link
JP (1) JPS6120919A (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5031245B2 (en) * 2006-02-23 2012-09-19 三菱重工環境・化学エンジニアリング株式会社 Rotary atomizer

Also Published As

Publication number Publication date
JPS6120919A (en) 1986-01-29

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