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JPH0475462B2 - - Google Patents
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JPH0475462B2 - - Google Patents

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Publication number
JPH0475462B2
JPH0475462B2 JP58085928A JP8592883A JPH0475462B2 JP H0475462 B2 JPH0475462 B2 JP H0475462B2 JP 58085928 A JP58085928 A JP 58085928A JP 8592883 A JP8592883 A JP 8592883A JP H0475462 B2 JPH0475462 B2 JP H0475462B2
Authority
JP
Japan
Prior art keywords
support
time
temperature
sample
buffer solution
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP58085928A
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Japanese (ja)
Other versions
JPS59212754A (en
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Filing date
Publication date
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Priority to JP58085928A priority Critical patent/JPS59212754A/en
Publication of JPS59212754A publication Critical patent/JPS59212754A/en
Publication of JPH0475462B2 publication Critical patent/JPH0475462B2/ja
Granted legal-status Critical Current

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Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N27/00Investigating or analysing materials by the use of electric, electrochemical, or magnetic means
    • G01N27/26Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating electrochemical variables; by using electrolysis or electrophoresis
    • G01N27/416Systems
    • G01N27/447Systems using electrophoresis
    • G01N27/44704Details; Accessories

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  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Molecular Biology (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Physics & Mathematics (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Sampling And Sample Adjustment (AREA)

Description

【発明の詳細な説明】 本発明は、電気泳動で用いる湿潤した支持体に
検体を塗布するための制御方法の改良に関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to an improved control method for applying an analyte to a moist support used in electrophoresis.

電気泳動装置においては、セルロースアセテー
ト膜等でできている支持体を緩衝液で一旦湿潤
し、湿潤した支持体に均一に検体を塗布した後泳
動操作が行なわれる。そして、正確な電気泳動分
析を行なうには支持体に均一に検体を塗布すると
ともに、支持体が一定の湿潤度にある時に検体を
塗布することが要求される。特に支持体の湿潤度
が不均一であつたり、又は変動したりすると、支
持体の検体吸収能力が変化してしまい検体が一様
に塗布されず、泳動像が歪む不具合を生じてしま
う。支持体の湿潤度は、湿潤後の経過時間及び周
囲雰囲気の温湿度により大きく変動するため、支
持体を緩衝液で湿潤した後常に一定時間後に検体
を塗布したのでは検体塗布時における支持体の湿
潤度が還境条件により大きく変動する欠点があ
る。この問題点を解決する方法として緩衝液で湿
潤した後の支持体の電気抵抗を測定して制御する
方法を本願人は特開昭56−70454号公報で提案し
ている。しかし、湿潤した支持体の電気抵抗は緩
衝液のわづかなPH値の変化等により大きく変動す
るため、支持体の湿潤度を正確に制御することは
困難である。また、操作者が周囲の温湿度を測定
しながら制御する方法では、再現性に難点がある
ばかりでなく、自動的に分析操作を行なえない欠
点がある。
In an electrophoresis apparatus, a support made of a cellulose acetate membrane or the like is once wetted with a buffer solution, a sample is uniformly applied to the wet support, and then an electrophoresis operation is performed. In order to perform accurate electrophoretic analysis, it is required to uniformly apply the specimen to the support and to apply the specimen when the support is at a certain degree of humidity. In particular, if the wettability of the support is non-uniform or fluctuates, the sample absorption capacity of the support will change, causing problems such as the sample not being applied uniformly and distorting the electrophoretic image. The degree of wetting of the support varies greatly depending on the time elapsed after wetting and the temperature and humidity of the surrounding atmosphere. Therefore, if the sample is always applied after a certain period of time after wetting the support with a buffer solution, the degree of wettability of the support at the time of sample application may be affected. The disadvantage is that the wettability varies greatly depending on the environmental conditions. As a method for solving this problem, the applicant has proposed in Japanese Patent Laid-Open No. 70454/1983 a method of measuring and controlling the electrical resistance of the support after it has been wetted with a buffer solution. However, since the electrical resistance of a wet support varies greatly due to slight changes in the pH value of the buffer solution, it is difficult to accurately control the wettability of the support. Furthermore, the method in which the operator controls the temperature while measuring the ambient temperature and humidity not only has problems with reproducibility, but also has the disadvantage that analysis operations cannot be performed automatically.

本発明の目的は、上述した欠点を解消し、周囲
の温湿度に拘わらず支持体が常に一定の湿潤度の
時に検体を自動的に塗布できる検体塗布方法を提
供することにある。
SUMMARY OF THE INVENTION An object of the present invention is to provide a method for applying a specimen, which eliminates the above-mentioned drawbacks and allows automatic application of a specimen when a support always has a constant humidity level, regardless of the ambient temperature and humidity.

本発明による検体塗布方法は、予め緩衝液で湿
潤した支持体に検体を塗布するにあたり、湿潤後
の支持体の温度とこの支持体の周囲温度との温度
差を検出し、該温度差と支持体中に含まれる緩衝
液の蒸発速度との関係を予め求めて、該関係にお
ける蒸発終了時間に基いて検体塗布タイミングを
決定することを特徴とするものである。
The method for applying a sample according to the present invention involves detecting the temperature difference between the temperature of the support after wetting and the ambient temperature of the support when applying the sample to a support that has been wetted with a buffer solution in advance, and comparing this temperature difference with the support. This method is characterized in that the relationship between the evaporation rate and the buffer solution contained in the body is determined in advance, and the sample application timing is determined based on the evaporation end time in this relationship.

以下図面を参照して本発明を詳細に説明する。 The present invention will be described in detail below with reference to the drawings.

第1図は種々の環境条件下において、支持体を
緩衝液で湿潤した後の経過時間と支持体と周囲雰
囲気との温度差の関係を表わす線図である。縦軸
は温度差を、横軸は経過時間を夫々示し、曲線
、及びは例えば高温低湿、高温常湿及び高
温高湿条件下における特性を夫々表わしている。
曲線、及びともに、支持体温度は緩衝液に
よる湿潤の直後は雰囲気温度に等しく、時間が経
過するに従い緩衝液の蒸発に伴ない支持体の温度
が低下し、温度差が生じくる。そしてこの温度差
は、徐々に大きくなりピーク値に達する。その後
は逆に温度差が小さくなり雰囲気温度に漸近して
くる。さらに時間が経過するに従い緩衝液の蒸発
が進行して部分的に緩衝液が蒸発しきつて白斑点
が支持体に生ずる。この白斑点が発生する時間を
夫々tp1、tp2及びtp3で示す。高温低湿条件下にお
いては蒸発速度が速いために曲線で示すように
温度差のピーク値が大きく、しかも短時間で白斑
点が発生し、高温高湿条件下では蒸発速度が遅い
ために逆にピーク値は小さく長時間経過後に白斑
点が発生している。ピーク値の発生時間は環境条
件下により若干差異が認められるが、白斑点の発
生時間と対比して考えると無視できる程度であ
る。支持体上に発生する白斑点は緩衝液が局部的
に支持体から蒸発し切るため発生するものであ
り、白斑点が発生した後検体を塗布したのでは検
体が不均一になり泳動像に歪みを生じてしまい正
確な泳動分析ができない不具合を生ずる。従つ
て、検体塗布はこの白斑点が発生する前に行なわ
ねばならない。
FIG. 1 is a diagram showing the relationship between the elapsed time after wetting the support with a buffer solution and the temperature difference between the support and the surrounding atmosphere under various environmental conditions. The vertical axis shows the temperature difference, and the horizontal axis shows the elapsed time, and the curves and characteristics under, for example, high temperature and low humidity, high temperature and normal humidity, and high temperature and high humidity conditions are respectively represented.
The support temperature is equal to the ambient temperature immediately after wetting with the buffer solution, and as time passes, the temperature of the support decreases as the buffer solution evaporates, creating a temperature difference. Then, this temperature difference gradually increases and reaches a peak value. After that, the temperature difference becomes smaller and approaches the ambient temperature. Further, as time passes, evaporation of the buffer solution progresses, and the buffer solution partially evaporates, resulting in white spots on the support. The times at which these white spots occur are indicated by t p1 , t p2 and t p3 , respectively. Under high temperature and low humidity conditions, the evaporation rate is fast, so the peak value of the temperature difference is large as shown in the curve, and white spots appear in a short time, whereas under high temperature and high humidity conditions, the evaporation rate is slow, so the peak value of the temperature difference is large. The value is small and white spots appear after a long period of time. Although there are slight differences in the time at which the peak value occurs depending on the environmental conditions, this is negligible when compared with the time at which white spots occur. White spots that appear on the support are caused by the buffer solution evaporating locally from the support, and if the sample is applied after the white spots have occurred, the sample will become non-uniform and the electrophoretic image will be distorted. This causes a problem in which accurate migration analysis cannot be performed. Therefore, sample application must be performed before these white spots appear.

第2図は、各種環境条件下において、支持体を
湿潤した後の白斑点が発生するまでの時間と、支
持体と雰囲気との温度差のピーク値との関係を表
わすグラフである。縦軸は白斑点が発生するまで
の時間tpを示し、横軸は温度差のピーク値Tpを示
している。第2図から理解されるようにtpとTp
関係は温度、湿度等の環境条件下に拘わらず同一
曲線上にあり、以下の関係が成立する。
FIG. 2 is a graph showing the relationship between the time until white spots appear after the support is wetted and the peak value of the temperature difference between the support and the atmosphere under various environmental conditions. The vertical axis shows the time t p until white spots appear, and the horizontal axis shows the peak value T p of the temperature difference. As understood from FIG. 2, the relationship between t p and T p lies on the same curve regardless of environmental conditions such as temperature and humidity, and the following relationship holds true.

Tp×tp=const 周囲雰囲気の温湿度の変化に対して上式が成立
することは以下のように定性分析される。支持体
を緩衝液で湿潤すると支持体に含漬された緩衝液
が蒸発をおこし支持体から潜熱を奪うことにな
る。よつて、蒸発速度が速く、温度差のピーク値
が大きい条件下では蒸発が短時間で進行するため
短時間で白斑点が発生する。一方蒸発速度が低
く、温度差のピーク値が小さい条件下では蒸発の
進行速度が遅く、長時間経過した後に白斑点が発
生する。この結果、湿潤した支持体とその周囲雰
囲気の温度差のピーク値を検出すれば、支持体か
らの緩衝液の蒸発状態を容易かつ正確に予測で
き、これにより種々の環境条件に対して検体を塗
布すべき最適時間を予測することができることに
なる。即ち緩衝液と支持体の種類に応じてピーク
値Tpと白斑点発生時間tpとの関係を求めることに
よりピーク値Tpと検体を塗布すべき最適時間Δtp
との関係を表わす理想曲線Rが求められる。従つ
て、各種の緩衝液と支持体に応じて上記理想曲線
を予め作成しておけば、ピーク値Tpを検出する
ことにより自動的に検体を塗布すべき最適の時間
を定めることが可能になる。しかも、ピーク値の
発生時間は各種温湿度条件に対してほぼ同一であ
るから、ピーク値が発生する時間も予め正確に知
ることができ、このピーク値が発生する時間を予
め検出し定めることにより、湿潤した支持体温度
と雰囲気温度とを一点で検出することによりこの
検出値をもつてピーク値とすることができる。
T p ×t p = const The fact that the above equation holds true with respect to changes in temperature and humidity of the surrounding atmosphere can be qualitatively analyzed as follows. When the support is wetted with a buffer solution, the buffer impregnated in the support causes evaporation and takes away latent heat from the support. Therefore, under conditions where the evaporation rate is high and the peak value of the temperature difference is large, evaporation progresses in a short time and white spots occur in a short time. On the other hand, under conditions where the evaporation rate is low and the peak value of the temperature difference is small, the evaporation progresses slowly and white spots appear after a long period of time. As a result, by detecting the peak value of the temperature difference between a wet support and its surrounding atmosphere, the state of buffer evaporation from the support can be easily and accurately predicted, which allows for the determination of the analyte for various environmental conditions. It will be possible to predict the optimum time for application. That is, by determining the relationship between the peak value T p and the white spot generation time t p according to the type of buffer solution and support, the peak value T p and the optimal time Δt p for applying the specimen can be determined.
An ideal curve R representing the relationship between . Therefore, by creating the above ideal curve in advance according to various buffer solutions and supports, it is possible to automatically determine the optimal time for applying the specimen by detecting the peak value T p . Become. Moreover, since the time at which the peak value occurs is almost the same under various temperature and humidity conditions, the time at which the peak value occurs can also be accurately known in advance, and by detecting and determining the time at which the peak value occurs in advance. By detecting the wet support temperature and the ambient temperature at one point, this detected value can be used as a peak value.

理想曲線Rの設定に際し、支持体中の湿潤度を
考慮する。すなわち、適正な電気永動を行なうた
めにはある程度の均一な湿潤度が必要であるが、
支持体中に含まれる緩衝液の量が大すぎると、検
体を塗布する際に検体が緩衝液によつて邪魔され
てしまい、検体を均一に塗布し得なくなつてしま
う。従つて、検体塗布時における支持体の湿潤度
は比較的低い方が望ましく、従つて白斑点が発生
する時点よりも若干時間的余裕をもたせた時点に
検体を塗布することが望ましい。一方、支持体中
の緩衝液の蒸発の局部的終了点すなわち白斑点が
発生する時点にはバラツキがあるため、これらの
バラツキ等を考慮して理想曲線Rを定める。具体
的には、支持体中の緩衝液の蒸発速度を規定する
関係式Tp×tp=一定を基準とし、湿潤の余裕度及
び白斑点の発生時のバラツキ等を考慮し、これら
の量に相当する時間だけ減少させてプロツトして
理想曲線Rを設定する。このようにして理想曲線
Rを規定することにより、環境条件が変化しても
白斑点が発生せず且つ一定の湿潤度となる時点を
正確に求めることができる。
When setting the ideal curve R, the degree of wettability in the support is taken into account. In other words, a certain degree of uniform moisture is necessary for proper electrodynamics, but
If the amount of buffer solution contained in the support is too large, the sample will be obstructed by the buffer solution when the sample is applied, making it impossible to apply the sample uniformly. Therefore, it is desirable that the degree of wettability of the support at the time of applying the specimen is relatively low, and therefore it is desirable to apply the specimen a little more time than the point at which white spots occur. On the other hand, since there are variations in the local end point of evaporation of the buffer solution in the support, that is, the point at which white spots appear, the ideal curve R is determined taking these variations into account. Specifically, based on the relational expression T p × t p = constant that defines the evaporation rate of the buffer solution in the support, these amounts are An ideal curve R is set by plotting a time corresponding to . By defining the ideal curve R in this manner, it is possible to accurately determine the point in time when white spots do not occur and the humidity level is constant even if the environmental conditions change.

第3図は本発明の一実施例の構成を示す線図で
ある。支持体1は一対のローラ2を介して緩衝液
が満されている緩衝液槽3に浸漬され、その後再
びローラ2を介して検体塗布部4に搬送される。
この一対のローラ2は液絞りローラとしての機能
も果しているからローラ2で搬送された支持体1
はほぼ均一に緩衝液で湿潤される。検体塗布部4
はカバー5によりおおわれていて温湿度変化の影
響を受けにくくされている。このカバー5内には
入口開口5aと出口開口5bの位置と対応して一
対の駆動ローラ6が配置されていて、この駆動ロ
ーラ6には長手方向の両端部に2本のエンドレス
ベルト7が掛けられている。またカバー5内には
カバー5内の雰囲気温度を測定するためのサーミ
スタ8と、支持体の温度を測定するためのサーミ
スタ9が設けられ、これら2個のサーミスタの接
続線は後述する制御回路に接続されている。さら
にカバー5内には、駆動装置(図示せず)により
上下動可能に配設されている検体塗布具10がベ
ルト7の上方に配置されていて、この検体塗布具
10の上下動により支持体1上に検体が塗布され
る。緩衝液槽3で湿潤された支持体は入口開口5
aを通りベルト7により検体塗布部4内の所定の
塗布位置まで搬送されて停止する。停止位置にお
いて支持体を湿潤した後ピーク発生時間経過後
(このピーク発生時間は予め測定しておく)の温
度をサーミスタ9で検出し、同時に雰囲気温度を
サーミスタ8で検出し、この温度差を後述する制
御回路に供給して、この値を用いて制御回路に記
憶されている最適検体塗布時間を算出し、この時
間経過後に検体塗布器駆動(図示せず)を介して
検体塗布具を上下動させ支持体1上に検体を塗布
する。第4図は検体塗布制御回路のブロツク線図
である。ローラ2の回転に伴ない支持体1の湿潤
時刻が支持体湿潤検出回路11により検出され、
この信号が中央処理装置12に入力される。温度
差のピーク値が発生する予め定められた時刻に支
持体温度と雰囲気温度とがサーミスタ9と8によ
り検出され、この検出された温度信号が比較器1
3に入力され、支持体1と周囲雰囲気との温度差
が中央処理装置12に入力される。メモリ14に
は温度差のピーク値Tpと最適検体塗布時間Δtと
の関係が記憶されており、検出されたTpの値に
基きメモリ14から最適検体塗布時間が中央処理
装置12に指示され、最適時間経過後に検体塗布
器駆動装置15を介して検体塗布器10が駆動し
支持体に検体が塗布されることになる。
FIG. 3 is a diagram showing the configuration of an embodiment of the present invention. The support 1 is immersed in a buffer solution tank 3 filled with a buffer solution via a pair of rollers 2, and then conveyed via the rollers 2 again to the sample application section 4.
This pair of rollers 2 also functions as liquid squeezing rollers, so the support 1 transported by the rollers 2
is almost uniformly wetted with buffer. Sample application section 4
is covered with a cover 5, making it less susceptible to changes in temperature and humidity. A pair of drive rollers 6 are disposed in the cover 5 in correspondence with the positions of the inlet opening 5a and the outlet opening 5b, and two endless belts 7 are hung on each end of the drive roller 6 in the longitudinal direction. It is being Furthermore, a thermistor 8 for measuring the ambient temperature inside the cover 5 and a thermistor 9 for measuring the temperature of the support are provided inside the cover 5, and the connecting wires of these two thermistors are connected to a control circuit to be described later. It is connected. Furthermore, within the cover 5, a sample applicator 10 is disposed above the belt 7, which is movable up and down by a drive device (not shown). A specimen is applied onto 1. The support moistened with the buffer bath 3 has an inlet opening 5.
a, the specimen is conveyed by the belt 7 to a predetermined application position in the specimen application section 4, and then stopped. After wetting the support at the stop position, the temperature after the peak generation time has elapsed (this peak generation time is measured in advance) is detected by thermistor 9, and at the same time, the ambient temperature is detected by thermistor 8, and this temperature difference will be described later. This value is used to calculate the optimal sample application time stored in the control circuit, and after this time elapses, the sample applicator is moved up and down via a sample applicator drive (not shown). A sample is applied onto the support 1. FIG. 4 is a block diagram of the sample application control circuit. The wetting time of the support 1 as the roller 2 rotates is detected by the support wetting detection circuit 11;
This signal is input to the central processing unit 12. The support body temperature and the ambient temperature are detected by thermistors 9 and 8 at a predetermined time when the peak value of the temperature difference occurs, and the detected temperature signal is sent to the comparator 1.
3, and the temperature difference between the support 1 and the surrounding atmosphere is input to the central processing unit 12. The memory 14 stores the relationship between the peak value T p of the temperature difference and the optimum sample application time Δt, and the optimum sample application time is instructed from the memory 14 to the central processing unit 12 based on the detected value of T p . After the optimum time has elapsed, the sample applicator 10 is driven via the sample applicator driving device 15, and the sample is applied to the support.

尚、本例においては2個のサーミスタを用いて
いるが、支持体1が検体塗布部4から排出され、
次の支持体が搬入される間における雰囲気温度を
測定しこの値を一旦記憶しておき、その後に検体
塗布部4内に搬入される支持体温度を検出して記
憶されている雰囲気温度と比較するようにすれば
1個のサーミスタで済む構成にすることができ
る。
Although two thermistors are used in this example, the support 1 is discharged from the sample application section 4,
Measure the ambient temperature while the next support is being carried in, temporarily store this value, and then detect the temperature of the support being carried into the sample coating section 4 and compare it with the stored ambient temperature. By doing so, it is possible to create a configuration that requires only one thermistor.

以上説明したように本発明によれば環境条件が
大きく変動した場合であつても常に最適の湿潤状
態で支持体に検体を塗布することができ、周囲の
環境条件の変化による影響を受けない正確な泳動
分析が可能になる。しかも、支持体を湿潤した後
の所定時間後における支持体温度と雰囲気温度を
検出するだけで最適塗布条件も定められるから、
タイマー等が不要となり、制御回路の簡素化を図
ることも可能になる。
As explained above, according to the present invention, even when the environmental conditions vary greatly, it is possible to apply the specimen to the support in an optimally moist state, and it is possible to apply the specimen to the support accurately without being affected by changes in the surrounding environmental conditions. This makes it possible to conduct electrophoretic analysis. Moreover, the optimum coating conditions can be determined simply by detecting the support temperature and ambient temperature after a predetermined period of time after wetting the support.
There is no need for a timer or the like, and it is also possible to simplify the control circuit.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は支持体を湿潤した後の経過時間に対す
る支持体の周囲雰囲気との温度差の関係を表わす
線図、第2図は支持体と周囲雰囲気との温度差の
ピーク値と白斑点発生時間との関係を表わす線
図、第3図は本発明の一実施例の構成を示す線
図、第4図は本発明の一実施例の制御回路部を表
わすブロツク図である。 1……支持体、2……ローラ、3……緩衝液
槽、4……検体塗布部、5……カバー、6……駆
動ローラ、7……ベルト、8,9……サーミス
タ、10……検体塗布具、11……支持体湿潤検
出回路、12……中央処理装置、13……比較
器、14……メモリ、15……検体塗布器駆動回
路。
Figure 1 is a diagram showing the relationship between the temperature difference between the support and the surrounding atmosphere and the elapsed time after wetting the support, and Figure 2 is the peak value of the temperature difference between the support and the surrounding atmosphere and the occurrence of white spots. FIG. 3 is a diagram showing the relationship with time, FIG. 3 is a diagram showing the configuration of an embodiment of the present invention, and FIG. 4 is a block diagram showing the control circuit section of an embodiment of the invention. DESCRIPTION OF SYMBOLS 1...Support body, 2...Roller, 3...Buffer solution tank, 4...Sample application part, 5...Cover, 6...Drive roller, 7...Belt, 8, 9...Thermistor, 10... ...Specimen applicator, 11...Support wetness detection circuit, 12...Central processing unit, 13...Comparator, 14...Memory, 15...Specimen applicator drive circuit.

Claims (1)

【特許請求の範囲】[Claims] 1 予め緩衝液で湿潤した支持体に検体を塗布す
るにあたり、湿潤後の支持体の温度とこの支持体
の周囲温度との温度差を検出し、該温度差と支持
体中に含まれる緩衝液の蒸発速度との関係を予め
求めて、該関係における蒸発終了時間に基いて検
体塗布タイミングを決定することを特徴とする検
体塗布方法。
1. When applying a specimen to a support that has been wetted with a buffer solution in advance, the temperature difference between the temperature of the support after wetting and the ambient temperature of this support is detected, and the temperature difference and the buffer solution contained in the support are detected. A method for applying a specimen, characterized in that the relationship between the evaporation rate and the evaporation rate is determined in advance, and the timing of applying the specimen is determined based on the evaporation end time in the relationship.
JP58085928A 1983-05-18 1983-05-18 Inspecting object coating method Granted JPS59212754A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58085928A JPS59212754A (en) 1983-05-18 1983-05-18 Inspecting object coating method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58085928A JPS59212754A (en) 1983-05-18 1983-05-18 Inspecting object coating method

Publications (2)

Publication Number Publication Date
JPS59212754A JPS59212754A (en) 1984-12-01
JPH0475462B2 true JPH0475462B2 (en) 1992-11-30

Family

ID=13872411

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58085928A Granted JPS59212754A (en) 1983-05-18 1983-05-18 Inspecting object coating method

Country Status (1)

Country Link
JP (1) JPS59212754A (en)

Also Published As

Publication number Publication date
JPS59212754A (en) 1984-12-01

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