JPH047808B2 - - Google Patents
Info
- Publication number
- JPH047808B2 JPH047808B2 JP59021538A JP2153884A JPH047808B2 JP H047808 B2 JPH047808 B2 JP H047808B2 JP 59021538 A JP59021538 A JP 59021538A JP 2153884 A JP2153884 A JP 2153884A JP H047808 B2 JPH047808 B2 JP H047808B2
- Authority
- JP
- Japan
- Prior art keywords
- light
- defect
- photoelectric conversion
- conversion means
- lens
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/002—Recording, reproducing or erasing systems characterised by the shape or form of the carrier
- G11B7/0037—Recording, reproducing or erasing systems characterised by the shape or form of the carrier with discs
- G11B7/00375—Recording, reproducing or erasing systems characterised by the shape or form of the carrier with discs arrangements for detection of physical defects, e.g. of recording layer
Landscapes
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Manufacturing Optical Record Carriers (AREA)
Description
【発明の詳細な説明】
〔発明の技術分野〕
この発明は例えばビデオデイスクの案内溝のよ
うに、基本パターンが略規則的に配列されている
パターンの欠陥を検出するもので、特に測定面に
歪や面かぶれがある場合でも検査可能とするよう
にした欠陥検査装置に関するものである。[Detailed Description of the Invention] [Technical Field of the Invention] The present invention detects defects in a pattern in which basic patterns are arranged substantially regularly, such as guide grooves of a video disk, and is particularly applicable to a measurement surface. The present invention relates to a defect inspection device that is capable of inspecting even when there is distortion or surface blur.
従来、上記のようなパターンの検査には、レー
ザ光を照射して、その回折光より検査する装置が
本発明者らによつて提案されている。（特開昭57
−187604号公報）。しかし、従来の装置において
は被測定面が、傾いていたり、歪んでいると、そ
れだけで欠陥となつてしまう場合があつたり、逆
に欠陥があつても検出出来ない場合があるなどの
欠点を有していた。
Conventionally, the present inventors have proposed an apparatus for inspecting the above-mentioned patterns by irradiating laser light and inspecting the diffracted light. (Unexamined Japanese Patent Publication 1987)
−187604). However, with conventional devices, if the surface to be measured is tilted or distorted, this alone may cause a defect, or conversely, even if there is a defect, it may not be detected. had.
この発明は上記の欠点を除去し、被測定面の傾
きや、面ぶれに影響されずに欠陥を検出すること
のできる欠陥検査装置を提供することを目的とす
る。
SUMMARY OF THE INVENTION An object of the present invention is to eliminate the above-mentioned drawbacks and to provide a defect inspection device that can detect defects without being affected by the inclination or surface wobbling of the surface to be measured.
この発明は、被検体からの反射光又は、回折光
等を受光分析して被検体の欠陥部を検出する欠陥
検出装置において、同一被検体上の異なる点から
の光に対応した出力値の差を取つた後に、所定の
処理を施すことを特徴とする。
This invention relates to a defect detection device that detects defective parts of a test object by receiving and analyzing reflected light or diffracted light from the test object, and the difference in output values corresponding to light from different points on the same test object. It is characterized in that a predetermined process is performed after the
すなわち、近接する複数の部分より回折する光
で第ｎ次回折光と第ｎ＋１次回折光との間に回折
する光をレンズで受け、このレンズにより複数の
検出器に再結像させる。次にこの複数の検出器の
出力値の差を取ることで表面の傾きの影響を除い
て、欠陥検出を行う。さらにその差信号の高域周
波数成分よりキズやホコリ等の欠陥検出を行い、
低域周波数成分よりピツチムラやミゾ幅のムラ等
の欠陥を検出する。 That is, the light diffracted from a plurality of adjacent parts is received by a lens, and is re-imaged on a plurality of detectors. Next, defects are detected by taking the difference between the output values of the plurality of detectors to remove the influence of the surface inclination. Furthermore, defects such as scratches and dust are detected from the high frequency components of the difference signal.
Detects defects such as uneven pitch and groove width from low frequency components.
上記の欠陥検出方法においては、近接する微小
複数の部分からの回折光を同一の光学系を通して
複数の検出器で信号を検出している。この上記の
近接する微小な複数の部分間での面の傾変動はほ
とんどなく、同一の傾きと考えられる。そこでこ
の微小な複数の部分からの面の傾きによる出力信
号への影響は同一となる。したがつてこれらの出
力信号の差分をとればこの共通な部分の信号成分
は０となり、傾きの影響を除くことが可能とな
る。
In the above defect detection method, signals are detected by a plurality of detectors using diffracted light from a plurality of adjacent minute portions through the same optical system. There is almost no change in the inclination of the surfaces between the plurality of minute portions that are close to each other, and the inclinations are considered to be the same. Therefore, the influence on the output signal due to the inclination of the surface from the plurality of minute portions is the same. Therefore, if the difference between these output signals is taken, the signal component of this common portion becomes 0, making it possible to eliminate the influence of the slope.
以下、図面を参照してこの発明の一実施例を説
明する。第１図において、１は基本パターンを規
則的に配列した被検体で、図示例では比較的単純
な基本パターンである多数の溝を規則的に配列し
たビデオ・デイスクである。２はこのビデイオ・
デイスク１を回転させる回転駆動装置で、この装
置２は回転モータ２ａとモータ２ａの回転軸に設
けられたビデオ・デイスク１を着脱可能に保持さ
せる保持部２ｂとにより構成されている。この回
転駆動装置２の側方に路コヒーレントな光例えば
HeNeレーザ装置よりなるレーザ光源３を配設す
る。この光源３から発射されたレーザ光Ｒを、ミ
ラー４で反射させて、前記ビデイオ・デイスク１
の規則パターンに照射させる。
Hereinafter, one embodiment of the present invention will be described with reference to the drawings. In FIG. 1, reference numeral 1 denotes an object on which basic patterns are regularly arranged, and in the illustrated example, it is a video disk on which a large number of grooves, which are relatively simple basic patterns, are regularly arranged. 2 is this video
This device 2 is a rotary drive device for rotating a disk 1, and is composed of a rotary motor 2a and a holding portion 2b that removably holds the video disk 1, which is provided on the rotating shaft of the motor 2a. A coherent light beam is applied to the side of this rotary drive device 2, for example.
A laser light source 3 consisting of a HeNe laser device is provided. The laser beam R emitted from this light source 3 is reflected by a mirror 4 to
irradiate it in a regular pattern.
このとき、ビデイオ・デイスク１の規則パター
ンにレーザ光Ｒを照射して得られる規則パターン
による回折光は、強め合い、整数次回折光に集中
する。また規則パターンからずれた欠陥部の回折
光は強め合わず、例えば凹凸の欠損、ゴミなどの
ような弧立した欠陥部から発生する回折光は全体
に広がる。 At this time, the diffracted lights from the regular pattern obtained by irradiating the regular pattern of the video disc 1 with the laser beam R are reinforced and concentrated into integer-order diffracted lights. Furthermore, the diffracted lights from defective parts that deviate from the regular pattern do not intensify each other, and the diffracted lights generated from erected defective parts, such as defects in unevenness, dust, etc., spread over the entire area.
このことから、レーザ光Ｒを規則パターンに照
射して得られる回折パターンの中の第ｎ次回折光
と第ｎ＋１次回折光、例えば第０次回折光５ａと
第１次回折光５ｂとの間にビデイオ・デイスク１
の欠陥部により発生した回折光６を受光する対物
レンズ７を配設する。この対物レンズ７により受
光された回折光６はピンホール８を介して光電変
換器９に再結像される。この回折光６は、光電変
換器９により光量に応じた電気信号に変換され
る。 From this, it can be seen that a video disk is formed between the n-th order diffraction light and the n+1-th order diffraction light, for example, the 0th-order diffraction light 5a and the first-order diffraction light 5b, in the diffraction pattern obtained by irradiating the laser beam R in a regular pattern. 1
An objective lens 7 is provided to receive diffracted light 6 generated by the defective portion. Diffracted light 6 received by objective lens 7 is reimaged on photoelectric converter 9 via pinhole 8 . This diffracted light 6 is converted by a photoelectric converter 9 into an electrical signal according to the amount of light.
一方、ハーフミラー１０により反射された光は
ピンホール８′を介して光電変換器９′に再結像さ
れ光変換器９′により電気信号に変換される。そ
こでこれら２つの光変換器９，９′からの電気信
号を差動増幅器１１に入力しその差分を出力す
る。なおこのときのピンホール８と８′との関係
は光デイスク面上で第２図に示されたようになつ
ている。この差分を取つた電気信号はアナログデ
ジタル変換器１２によりデジタル信号に変換され
た後、信号処理計算機（CPU）１３に送られる。
この信号をCPU１３で高域周波数成分と低域周
波数成分とに分離し、さらにそれぞれ分離された
信号に対して所定の値以上のものを欠陥としてい
き値処理され高域周波数成分からの出力はゴミ欠
陥として低周波数成分からの欠陥はムラ欠陥とし
て区別して表示部１４に表示される。ここで１５
は回転モータ２ａを回転させながら一周分検査ご
とにビデイオ・デイスク１を平均移動させるパル
スモータである。このパルスモータ１５に信号を
繰返して送り回転駆動装置２を順次平行移動させ
ることによりビデイオ・デイスク１の規則パター
ンの全面を検査することができる。ここに用いら
れる被検体は第３図に示すように基板１ａ上に多
数の溝１ｂを規則的に配列したビデイオ・デイス
ク１であり、溝の幅寸法をａ、深さ寸法をｈ、ピ
ツチ寸法をｐとし一部の溝に欠陥（例えば規則パ
ターン上からτだけはずれたピツチムラ）がある
ものとする。 On the other hand, the light reflected by the half mirror 10 is re-imaged on the photoelectric converter 9' via the pinhole 8' and converted into an electrical signal by the optical converter 9'. Therefore, the electrical signals from these two optical converters 9 and 9' are input to a differential amplifier 11, and the difference thereof is output. The relationship between the pinholes 8 and 8' at this time is as shown in FIG. 2 on the optical disk surface. The electrical signal from which this difference has been taken is converted into a digital signal by an analog-to-digital converter 12, and then sent to a signal processing computer (CPU) 13.
This signal is separated into a high frequency component and a low frequency component by the CPU 13, and each separated signal is subjected to threshold value processing with a signal exceeding a predetermined value as a defect, and the output from the high frequency component is garbage. As defects, defects from low frequency components are distinguished and displayed on the display unit 14 as unevenness defects. here 15
is a pulse motor that moves the video disc 1 on average for each round of inspection while rotating the rotary motor 2a. By repeating a signal to the pulse motor 15 and sequentially moving the feed rotation drive device 2 in parallel, the entire surface of the regular pattern on the video disc 1 can be inspected. The test object used here is a video disk 1 in which a large number of grooves 1b are regularly arranged on a substrate 1a as shown in FIG. 3, and the width dimension of the grooves is a, the depth dimension is h, and the pitch dimension is Assume that p is a defect in some of the grooves (for example, pitch unevenness deviated from the regular pattern by τ).
このときピンホール面８，８′で観測した光の
輝点は欠陥によるものとして考えられ、その光量
は対物レンズ７の遠視野座標をζ0とし、対物レン
ズ７の開口が充分に小さいものとすれば特開昭57
−187604号公報と同様の解析により次式で与えら
れる。 At this time, the bright spots of light observed at the pinhole surfaces 8 and 8' are considered to be due to defects, and the amount of light is determined by assuming that the far-field coordinate of the objective lens 7 is ζ 0 and the aperture of the objective lens 7 is sufficiently small. Then, JP-A-57
It is given by the following equation using the same analysis as in the -187604 publication.
Ｉ＝｜Ｇ（ζ0）｜2
＝８／π2ζ0 2sin2（πτξ0）sin2（πζ0）
×｛１−cos（4h／λπ）｝ ……(1)
またゴミ、キズなどによる弧立欠陥がある場合
にも前述と同様に結像面で観測した光の輝点は欠
陥によるものとして考えられ、その光量は対物
レンズ７の遠視野座標をζ0、欠陥の大きさをｄと
し、対物レンズ７の開口が充分に小さいものとす
れば次式により与えられる。 I = | G (ζ 0 ) | 2 = 8/π 2 ζ 0 2 sin 2 (πτξ 0 ) sin 2 (πζ 0 ) × {1−cos (4h/λπ)} ...(1) Also, dust and scratches Even if there is an erect defect caused by such as If d is assumed and the aperture of the objective lens 7 is sufficiently small, it is given by the following equation.
この第(1)，(2)式から欠陥の大きさを求めること
ができる。しかしながら、実際の検査においては
欠陥の大きさ正確に知る必要はなく、ある大きさ
以上の欠陥の個数を求めることのほうが重要視さ
れる。このため第(1)，(2)式によりいき値をあらか
じめ求めておいて比較すれば良い。 The size of the defect can be determined from equations (1) and (2). However, in actual inspection, it is not necessary to know the exact size of a defect, and more importance is placed on determining the number of defects larger than a certain size. Therefore, it is sufficient to obtain the threshold values in advance using equations (1) and (2) and compare them.
次に測定面が傾いた場合を含めてこのようすを
図でより詳細に説明する。第４図のａは欠陥のあ
る入力パターンを示している。この場合には傾き
がないとする。第４図のｂはこのときの回折光の
分布を示している。実線４０は欠陥のないパター
ンからの回折光の分布であり、一点破線４１はピ
ツチムラの欠陥部からの回折光分布であり、また
破線４２はゴミ・キズ欠陥からの回折光分布であ
る。レンズの中心軸がζ0であるレンズ７により再
結像を行うと、第４図のｃに示されたような欠陥
出力パターンが得られる。ここで４３は欠陥出力
であり、４４は欠陥のないパターンからの光であ
る。このような場合には、単に一定レベルで比較
することにより容易に欠陥検出が可能となる。 Next, this situation will be explained in more detail using figures, including the case where the measurement surface is tilted. Figure 4a shows a defective input pattern. In this case, it is assumed that there is no slope. FIG. 4b shows the distribution of the diffracted light at this time. A solid line 40 is a distribution of diffracted light from a pattern without defects, a dotted line 41 is a distribution of diffracted light from a defective portion of unevenness, and a broken line 42 is a distribution of diffracted light from a dust/scratch defect. When reimaging is performed by the lens 7 whose central axis is ζ 0 , a defective output pattern as shown in FIG. 4c is obtained. Here, 43 is the defect output, and 44 is the light from the defect-free pattern. In such a case, defects can be easily detected by simply comparing at a constant level.
しかしながら、第５図に示されたように光デイ
スク１面がθkだけ傾いた場合には前記のように
容易に検出することは出来ない。この場合には第
５図により回折光分布は2θkだけシフトする。こ
のときの欠陥検出のようすを、第４図と同様にし
て第６図に示す。第６図のａは第４図のａと同じ
入力パターンであるが、ただし面がθkだけ傾い
ている。 However, if the surface of the optical disk is tilted by θk as shown in FIG. 5, it cannot be detected as easily as described above. In this case, the diffracted light distribution shifts by 2θk as shown in FIG. The state of defect detection at this time is shown in FIG. 6 in the same manner as FIG. 4. A in FIG. 6 is the same input pattern as a in FIG. 4, except that the plane is tilted by θk.
このとき回折光分布は第６図のｂとなり、第４
図のｂに対して、2θk相当分だけシフトしてい
る。するとレンズ７の中心位置と回折光分布の関
係が図のようになり、欠陥のないパターンからの
回折光４０を多く通過するようになり、その結
果、再結像パターンは第６図のｃのようになる。
ここで６０は欠陥出力であり、６１は欠陥のない
部分からのフイルタリング出力である。この出力
６１は光デイスク１の面の傾きθkが変化すると、
大きく変化する。したがつて単に一定レベルでい
き値を決めて検出することは不可能となる。たと
えばいき値を小さく設定すると、欠陥がなくても
欠陥と判定されたり、又逆にいき値レベルを高く
設定すると小さな欠陥を検出することが出来なく
なることがある。 At this time, the diffracted light distribution becomes b in Figure 6, and the fourth
With respect to b in the figure, it is shifted by an amount equivalent to 2θk. Then, the relationship between the center position of the lens 7 and the diffracted light distribution becomes as shown in the figure, and more of the diffracted light 40 from the defect-free pattern passes through, and as a result, the re-imaged pattern becomes as shown in c in Figure 6. It becomes like this.
Here, 60 is the defective output, and 61 is the filtered output from the defect-free portion. When the inclination θk of the surface of the optical disk 1 changes, this output 61 becomes as follows.
Changes greatly. Therefore, it is impossible to simply determine and detect a threshold value at a constant level. For example, if the threshold level is set low, a defect may be determined even if there is no defect, and conversely, if the threshold level is set high, a small defect may not be detected.
そこで第６図のｄに示されたように２個のピン
ホール８，８′と２個の検出器９，９′を設けて、
それらの出力を差動増幅器１１に入れる。すると
欠陥のない部分からのフイルタリング出力である
６１は近接する部分では同一レベルの出力である
のでキヤンセルされ、ほぼ欠陥のみが第６図のｄ
のように出力される。この状態で第４図のｃと同
様となるので一定レベルで比較することにより欠
陥検出することが可能となる。 Therefore, as shown in FIG. 6d, two pinholes 8, 8' and two detectors 9, 9' are provided.
Their outputs are input to a differential amplifier 11. Then, the filtering output 61 from the defect-free part is canceled because the output is at the same level in the adjacent part, and almost only the defect is shown as d in Fig. 6.
The output is as follows. Since this state is similar to that shown in FIG. 4c, defects can be detected by comparing at a constant level.
このようにして、測定面の小さな傾きの変化に
対しては影響をあまり受けずに欠陥検出すること
が可能となる。 In this way, it is possible to detect defects without being affected by small changes in the slope of the measurement surface.
先の実施例では２つの検出器９，９′の出力を
差動増幅器１１に入れ、その出力をＡ／Ｄ変換器
１２によりデジタル信号に変換した後、CPU１
３に入力し、CPUの内部で高域周波数成分と低
域周波数成分とに分離したが、第７図では差動増
幅器１１の出力信号をローパスフイルタ７１によ
り低域周波数成分を検出し、ハイパスフイルタ７
２によつて高域周波数成分を検出する。これらの
信号をアナログマルチプレクサー７３に入力し
て、CPU１３より切替信号を受けて、両者を切
替えて、その切替えた信号をＡ／Ｄ変換器１２に
入力しデジタル信号に変換し、CPU１３に入力
する。このようにすることにより高速に処理する
ことが可能となる。
In the previous embodiment, the outputs of the two detectors 9 and 9' are input to the differential amplifier 11, and after the output is converted into a digital signal by the A/D converter 12, the CPU 1
3 and separated into high frequency components and low frequency components inside the CPU, but in FIG. 7
2 to detect high frequency components. These signals are input to the analog multiplexer 73, which receives a switching signal from the CPU 13, switches between the two, inputs the switched signal to the A/D converter 12, converts it into a digital signal, and inputs it to the CPU 13. . By doing so, high-speed processing becomes possible.
第１図はこの発明の一実施例を示す図、第２図
は２つのピンホール８，８′の相対位置を示す図、
第３図は実施例に用いられる被検体の一部分を拡
大して示す断面図、第４図はフイルタリングによ
り欠陥検出されることを説明する図、第５図は被
検体が傾いた時の光路を示す図、第６図は被検体
が傾いた時にも欠陥検出されることを説明する
図、第７図は他の実施例の一例で、回路により高
域周波数成分と低域周波数成分とに分離する回路
を示す図である。
１……ビイデオ・デイスク、２……回転駆動装
置、３……レーザ光源、４……ミラー、５……回
折光、６……欠陥の回折光、７……レンズ、８，
８′……ピンホール、９，９′……検出器、１０…
…ハーフミラー、１１……差動増幅器、１２……
Ａ／Ｄ変換器、１３……CPU、１４……表示装
置、１５……水平移動装置。
FIG. 1 is a diagram showing an embodiment of the present invention, FIG. 2 is a diagram showing the relative positions of two pinholes 8, 8',
Figure 3 is an enlarged cross-sectional view of a part of the test object used in the example, Figure 4 is a diagram explaining how defects are detected by filtering, and Figure 5 is the optical path when the test object is tilted. Figure 6 is a diagram explaining that defects are detected even when the object is tilted, and Figure 7 is an example of another embodiment, in which high frequency components and low frequency components are separated by a circuit. FIG. 3 is a diagram showing a circuit for separation. DESCRIPTION OF SYMBOLS 1... Video disk, 2... Rotation drive device, 3... Laser light source, 4... Mirror, 5... Diffracted light, 6... Diffracted light of defect, 7... Lens, 8,
8'...pinhole, 9,9'...detector, 10...
...Half mirror, 11...Differential amplifier, 12...
A/D converter, 13...CPU, 14...Display device, 15...Horizontal movement device.
Claims (1)
基本パターンに略コヒーレントな光を照射する光
源と、前記基本パターンのピツチ、前記光源から
発生される光の波長、前記被検体の測定面と前記
照射される光の入射光軸とのなす角とから定まる
第１次回折光方向と前記光源から照射される光が
被検体から反射される第０次回折光方向との間に
設けられるレンズと、このレンズにより再結像さ
れた光を被検体の再結像面で電気信号に変換する
光電変換手段とを具備した欠陥検査装置におい
て、前記被検体の複数の部分より発生する回折光
を、レンズを介して複数個の光電変換手段に結像
し、被検体の前記レンズの再結像面に互いに隣接
して配置された複数個の光電変換手段により電気
信号に変換し、この複数個の光電変換手段の出力
信号の差により欠陥を検出することを特徴とする
欠陥検査装置。 ２ 光電変換手段の出力信号から得られる信号に
おいて、高域周波数成分と低域周波数成分とに分
離し、これらの成分により、欠陥の種類の判別を
することを特徴とする特許請求の範囲第１項記載
の欠陥検査装置。[Scope of Claims] 1. A light source that irradiates substantially coherent light onto a basic pattern of a subject in which the basic patterns are regularly arranged, the pitch of the basic pattern, the wavelength of the light generated from the light source, and the subject. between the first-order diffracted light direction determined by the angle between the measurement surface of the specimen and the incident optical axis of the irradiated light and the 0th-order diffracted light direction in which the light irradiated from the light source is reflected from the specimen; In a defect inspection apparatus equipped with a lens provided and a photoelectric conversion means for converting light re-imaged by the lens into an electrical signal on a re-imaging surface of the object, The diffracted light is imaged on a plurality of photoelectric conversion means through a lens, and converted into an electric signal by the plurality of photoelectric conversion means arranged adjacent to each other on the reimaging surface of the lens of the subject; A defect inspection device characterized in that a defect is detected based on the difference between the output signals of the plurality of photoelectric conversion means. 2. Claim 1, characterized in that the signal obtained from the output signal of the photoelectric conversion means is separated into a high frequency component and a low frequency component, and the type of defect is determined based on these components. Defect inspection device as described in section.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2153884A JPS60166809A (en) | 1984-02-10 | 1984-02-10 | Defect inspecting device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2153884A JPS60166809A (en) | 1984-02-10 | 1984-02-10 | Defect inspecting device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS60166809A JPS60166809A (en) | 1985-08-30 |
| JPH047808B2 true JPH047808B2 (en) | 1992-02-13 |
Family
ID=12057741
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2153884A Granted JPS60166809A (en) | 1984-02-10 | 1984-02-10 | Defect inspecting device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS60166809A (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| AU2006315202A1 (en) | 2005-11-10 | 2007-05-24 | Checkflix, Inc. | Apparatus and method for analysis of optical storage media |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS51112183A (en) * | 1974-08-12 | 1976-10-04 | Mitsubishi Electric Corp | Diffraction pattern detector |
| JPS5414789A (en) * | 1977-07-05 | 1979-02-03 | Mitsubishi Electric Corp | Surface inspecting apparatus |
| DE3118646A1 (en) * | 1981-05-11 | 1982-12-02 | Ernst Leitz Wetzlar Gmbh, 6330 Wetzlar | Method and device for automatically detecting defects in planar patterns |
| JPS58108423U (en) * | 1982-11-11 | 1983-07-23 | 富士通株式会社 | Pattern feature extraction device |
-
1984
- 1984-02-10 JP JP2153884A patent/JPS60166809A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS60166809A (en) | 1985-08-30 |
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| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |