JPH0525192B2 - - Google Patents
Info
- Publication number
- JPH0525192B2 JPH0525192B2 JP60167813A JP16781385A JPH0525192B2 JP H0525192 B2 JPH0525192 B2 JP H0525192B2 JP 60167813 A JP60167813 A JP 60167813A JP 16781385 A JP16781385 A JP 16781385A JP H0525192 B2 JPH0525192 B2 JP H0525192B2
- Authority
- JP
- Japan
- Prior art keywords
- waveguide region
- mode
- semiconductor laser
- array
- gain
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/40—Arrangement of two or more semiconductor lasers, not provided for in groups H01S5/02 - H01S5/30
- H01S5/4025—Array arrangements, e.g. constituted by discrete laser diodes or laser bar
- H01S5/4031—Edge-emitting structures
Landscapes
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Optics & Photonics (AREA)
- Semiconductor Lasers (AREA)
Description
【発明の詳細な説明】
〔産業上の利用分野〕
この発明は位相同期集積型レーザの横モード制
御に関するものである。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] This invention relates to transverse mode control of a phase-locked integrated laser.
第3図は例えばアプライドフイジクスレターズ
46巻136〜138頁(Appl.Phys.Lett.vol.16pp.136―
138)に示された従来の集積型半導体レーザの断
面図で、図において、1はn+―InP基板、2は2
―Inp下クラツド層、3はInGaAsP活性層、4は
3本のストライプ状の溝を有するp―InP上クラ
ツド層、5は活性層3とInPとの中間の禁制帯幅
をもつp―InGaAsP埋込み層、6はp側電極、
7はn側電極、8はストライプ状の溝埋込み部、
9は活性層3のうち溝埋込み部8の直下部分にで
きる導波領域である。
Figure 3 is an example of Applied Physics Letters.
Volume 46, pp. 136-138 (Appl.Phys.Lett.vol.16pp.136-
138) is a cross-sectional view of the conventional integrated semiconductor laser shown in Figure 1, where 1 is an n + -InP substrate and 2 is a 2
- Inp lower cladding layer, 3 is InGaAsP active layer, 4 is p-InP upper cladding layer with three striped grooves, 5 is p-InGaAsP buried layer with forbidden band width between active layer 3 and InP. layer, 6 is a p-side electrode,
7 is an n-side electrode, 8 is a striped groove embedded part,
Reference numeral 9 denotes a waveguide region formed in a portion of the active layer 3 directly below the buried trench portion 8 .
次に動作について説明する。p側電極6に正、
n側電極7に負の電圧を印加すると、活性層3に
は上クラツド層4から正孔が、下クラツド層2か
ら電子が注入され、両者は2重ヘテロ構造のバリ
アにより活性層3内に閉じ込められ、放射再結合
する。発生した光はpn接合に垂直及び水平方向
に形成された屈折率分布により導波領域9の近傍
に閉じ込められる。 Next, the operation will be explained. positive to the p-side electrode 6;
When a negative voltage is applied to the n-side electrode 7, holes are injected into the active layer 3 from the upper cladding layer 4 and electrons are injected from the lower cladding layer 2, and both are injected into the active layer 3 by the barrier of the double heterostructure. trapped and radiatively recombines. The generated light is confined near the waveguide region 9 by the refractive index distribution formed in the vertical and horizontal directions of the pn junction.
ここで、3つのストライプが約10μm以内に隣
接していると、3つのレーザは独立ではなく光学
的に結合し、その結果同じ波長で一定の位相関係
を保つて、いわゆる位相同期発振をする。このよ
うに複数個の導波路が結合している場合には、各
導波路単体としては基本モードのみを伝搬する条
件にあつても、複合導波路の固有モード(アレイ
モード)は導波路の数だけ存在する。第4図a,
bは、各々、3連導波路の電界分布と光強度分布
を示す。同図において、νはアレイモードの番号
で、ν=1が基本アレイモードである。集積型レ
ーザにおいては、各モードに対する利得が等しけ
れば、これらの3つのうち何れのモードでも発振
し得。 Here, when the three stripes are adjacent to each other within about 10 μm, the three lasers are not independent but optically coupled, and as a result, maintain a constant phase relationship at the same wavelength, resulting in so-called phase-locked oscillation. When multiple waveguides are coupled in this way, even if each waveguide alone propagates only the fundamental mode, the eigenmode (array mode) of the composite waveguide is the number of waveguides. only exists. Figure 4a,
b shows the electric field distribution and light intensity distribution of the triple waveguide, respectively. In the figure, ν is the number of the array mode, and ν=1 is the basic array mode. An integrated laser can oscillate in any of these three modes if the gain for each mode is equal.
従来の集積型レーザは、電流が複合導波領域全
体にわたつてほぼ均一に流れるので、各アレイモ
ードに対するモード利得はほぼ等しく、その結果
3つのアレイモードで発振し得る。高次のアレイ
モードで発振すると遠視野像が双峰性となり出射
ビーム角が広くなつてしまい、アレイ化した方向
(pn接合に平行な方向)の出射角が非常に狭くで
きるという位相同期集積型レーザ本来の特徴を出
せないという問題点があつた。
Conventional integrated lasers can oscillate in three array modes because the current flows approximately uniformly across the complex waveguide region, so that the modal gain for each array mode is approximately equal. When oscillating in a high-order array mode, the far-field pattern becomes bimodal and the output beam angle becomes wide, making the output angle in the array direction (parallel to the pn junction) extremely narrow. There was a problem that the original characteristics of the laser could not be brought out.
この発明は上記のような問題点を解決するため
になされたもので、基本アレイモードで発振する
とともに、動作電流を低減することができる集積
型半導体レーザを得ることを目的とする。 The present invention has been made to solve the above-mentioned problems, and an object of the present invention is to obtain an integrated semiconductor laser that can oscillate in a fundamental array mode and can reduce operating current.
この発明に係る集積型半導体レーザは、複合導
波領域の幅より狭い幅の、上記導波領域のストラ
イプ方向に沿つたストライプ状の分離部が上記複
合導波領域の中央部分に対向する位置に設けられ
た電流阻止層を備え、該電流阻止層により複合導
波領域に注入される電流を制限し、ストライプに
垂直な面内での利得の分布が、複合導波領域の中
央部分で高くその両側で充分に低い山型の形状を
持つようにしたものである。
In the integrated semiconductor laser according to the present invention, a stripe-shaped separating portion having a width narrower than the width of the composite waveguide region and extending along the stripe direction of the waveguide region is located at a position opposite to the central portion of the composite waveguide region. The current blocking layer limits the current injected into the composite waveguide region, and the gain distribution in the plane perpendicular to the stripes is high in the central part of the composite waveguide region. It has a chevron-shaped shape that is sufficiently low on both sides.
この発明においては、電流阻止層により複合導
波領域に注入される電流を制限し、ストライプに
垂直な面内での利得の分布が、複合導波領域の中
央部分で高くその両側で充分に低い山型の形状を
持つようにしたから、複合導波領域の両端の部分
に光強度分布のピークをもつ高次のアレイモード
はその利得が制限され、複合導波領域の中央部分
で光強度分布の大きなピークをもつ基本アレイモ
ードのモード利得が複数のアレイモード中最大と
なるため、基本アレイモードでの発振を実現でき
る。
In this invention, the current injected into the composite waveguide region is limited by the current blocking layer, and the gain distribution in the plane perpendicular to the stripes is high in the center of the composite waveguide region and sufficiently low on both sides. Because it has a mountain-shaped shape, the gain of high-order array modes that have peaks of light intensity distribution at both ends of the composite waveguide region is limited, and the light intensity distribution is reduced at the center of the composite waveguide region. Since the mode gain of the fundamental array mode having a large peak is the largest among the plurality of array modes, oscillation in the fundamental array mode can be realized.
以下、この発明の一実施例を図について説明す
る。第1図において、21はp+―InPからなり、
アレイの中央部に中心線を持ちかつアレイ全体の
幅より狭い幅のストライプ状の分離部22を有す
る電流阻止層である。また1〜9は第3図の従来
例の場合と同等部分を示す。
An embodiment of the present invention will be described below with reference to the drawings. In Figure 1, 21 consists of p + -InP,
This is a current blocking layer having a centerline in the center of the array and striped separation portions 22 having a width narrower than the width of the entire array. Further, numerals 1 to 9 indicate parts equivalent to those of the conventional example shown in FIG.
次に動作について説明する。 Next, the operation will be explained.
電圧印加、活性層へのキヤリアの注入、活性層
での発光・導波から位相同期発振に至る動作に関
しては従来例の場合と同様である。本実施例にお
いては、n―InP下クラツド層2とp+―InP電流
阻止層21との間のpn接合は逆バイアスされる
ので、電流は分離部22のみを通つて流れる。即
ち電流は、アレイの中央部近傍に狭窄される。分
離部22の幅及び下クラツド層の厚さを適当に選
べば、活性層3における横方向の電流分布、従つ
て利得分布を第2図のような山型に形成すること
ができる。これにより、複合導波領域の両端の部
分に光強度分布のピークをもつ高次のアレイモー
ドはその利得が制限され、複合導波領域の中央部
分で光強度分布の大きなピークをもつ基本アレイ
モードのモード利得が複数のアレイモード中最大
となるため、アレイモードは基本モードが選択さ
れる。従つて本装置では横モードを基本モードに
制御でき、狭い出射ビームを持つ高出力半導体レ
ーザが得られる。 The operations from voltage application, carrier injection into the active layer, light emission and waveguide in the active layer to phase synchronized oscillation are the same as in the conventional example. In this embodiment, the pn junction between the n-InP lower cladding layer 2 and the p + -InP current blocking layer 21 is reverse biased, so that current flows only through the isolation portion 22. That is, the current is confined near the center of the array. By appropriately selecting the width of the separation portion 22 and the thickness of the lower cladding layer, the lateral current distribution and therefore the gain distribution in the active layer 3 can be formed into a mountain shape as shown in FIG. As a result, the gain of the high-order array mode, which has a peak in the optical intensity distribution at both ends of the composite waveguide region, is limited, and the fundamental array mode, which has a large peak in the optical intensity distribution at the center of the composite waveguide region, is limited in gain. The basic mode is selected as the array mode because the mode gain is the largest among the plurality of array modes. Therefore, with this device, the transverse mode can be controlled to the fundamental mode, and a high-power semiconductor laser with a narrow output beam can be obtained.
なお、上記実施例では3連の集積型半導体レー
ザについて説明したが、4連以上の場合において
も、基本アレイモードの光強度分布の包絡線に近
い利得分布を形成するならば、同様の効果を奏す
る。 In the above embodiment, a triple integrated semiconductor laser has been described, but the same effect can be obtained even in the case of four or more, if the gain distribution is close to the envelope of the light intensity distribution of the fundamental array mode. play.
また、上記実施例ではクラツド層及び活性層が
InPとInGaAsPとから成る場合について説明した
が、GaAs基板上にAlxGa1-xAs結晶(0<x<
1)を用いて同じ構造を形成しても良い。 In addition, in the above embodiment, the cladding layer and the active layer are
Although we have explained the case of InP and InGaAsP, Al x Ga 1-x As crystal (0<x<
1) may be used to form the same structure.
以上のように、この発明によれば、ストライプ
に垂直な面内での利得分布を、基本アレイモード
に対するモード利得が最大となるよう複合導波領
域の中央部分で高くその両側で充分に低い山型の
形状を持つように構成したので、横モードを基本
モードに制御でき、狭い出射ビームを持つ高出力
集積型半導体レーザが得られる効果がある。
As described above, according to the present invention, the gain distribution in the plane perpendicular to the stripes has a peak that is high at the center of the composite waveguide region and sufficiently low on both sides so that the mode gain for the fundamental array mode is maximized. Since it is configured to have a mold shape, the transverse mode can be controlled to the fundamental mode, and a high-power integrated semiconductor laser with a narrow output beam can be obtained.
第1図はこの発明の一実施例による集積型半導
体レーザを示す断面正面図、第2図は上記実施例
装置の利得分布を示す図、第3図は従来の集積型
半導体レーザを示す断面正面図、第4図は上記実
施例装置及び該従来装置のアレイモードの電界分
布、及び光強度分布を示す図である。
9…導波領域、21…電流阻止層、22…分離
部。なお図中同一符号は同一又は相当部分を示
す。
FIG. 1 is a cross-sectional front view showing an integrated semiconductor laser according to an embodiment of the present invention, FIG. 2 is a cross-sectional front view showing the gain distribution of the device of the above embodiment, and FIG. 3 is a cross-sectional front view showing a conventional integrated semiconductor laser. 4 are diagrams showing the electric field distribution and light intensity distribution in the array mode of the above embodiment device and the conventional device. 9... Waveguide region, 21... Current blocking layer, 22... Separation part. Note that the same reference numerals in the figures indicate the same or equivalent parts.
Claims (1)
形成された複合導波領域を有する位相同期型の集
積型半導体レーザにおいて、 上記複合導波領域の幅より狭い幅の、上記導波
領域のストライプ方向に沿つたストライプ状の分
離部が上記複合導波領域の中央部分に対向する位
置に設けられた電流阻止層を備えたことを特徴と
する集積型半導体レーザ。[Scope of Claims] 1. In a phase-locked integrated semiconductor laser having a composite waveguide region in which a plurality of striped waveguide regions are formed adjacent to each other, a semiconductor laser having a width narrower than the width of the composite waveguide region is provided. An integrated semiconductor laser comprising: a current blocking layer in which a stripe-shaped separating portion along the stripe direction of the waveguide region is provided at a position facing a central portion of the composite waveguide region.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16781385A JPS6230391A (en) | 1985-07-31 | 1985-07-31 | Integrated semiconductor laser |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16781385A JPS6230391A (en) | 1985-07-31 | 1985-07-31 | Integrated semiconductor laser |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6230391A JPS6230391A (en) | 1987-02-09 |
| JPH0525192B2 true JPH0525192B2 (en) | 1993-04-12 |
Family
ID=15856579
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP16781385A Granted JPS6230391A (en) | 1985-07-31 | 1985-07-31 | Integrated semiconductor laser |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6230391A (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3678075B2 (en) | 1998-12-09 | 2005-08-03 | セイコーエプソン株式会社 | Power supply device and control method thereof, portable electronic device, timing device and control method thereof |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61113294A (en) * | 1984-11-07 | 1986-05-31 | Sharp Corp | Semiconductor laser array device |
-
1985
- 1985-07-31 JP JP16781385A patent/JPS6230391A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6230391A (en) | 1987-02-09 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |