JPH0526161B2 - - Google Patents

Description

DETAILED DESCRIPTION OF THE INVENTION Field of Industrial Application The present invention relates to a method for manufacturing a mosaic or stripe-like spectral color filter used in color imaging devices and color displays.

Conventional Structure and Problems Conventionally, there have been broadly two methods for manufacturing color filters.

That is, there is a method of forming a dyed base pattern in advance and repeating the process of dyeing to the required spectral characteristics, or a method of forming a dyed base over the entire surface, leaving the necessary parts and bleaching the rest.

However, in the former method, the methods shown in FIGS. 1A to 1D have generally been used. That is, a photosensitive liquid made by imparting photosensitivity to polyvinyl alcohol, greens, gelatin, casein, etc. with ammonium dichromate, etc. is uniformly applied onto an optically polished glass substrate 1 using a roller coat, tapering, spinner, etc. After drying, only the pattern portion of the first color is photocured using a mask exposure method, and the pattern other than the required pattern is removed to form the dyed base film 2. After that, the dyeing base film 2 is formed using a dye having predetermined spectral characteristics. Dye the pattern. Next, a transparent anti-dye film 3 that cannot be dyed with dye is applied to the entire surface (FIG. 1A).

Next, as shown in FIG. 1B, the same photosensitive solution as above is applied uniformly, dried, and then exposed using a mask exposure method to form a dyed base film 4 of the second color. Dyeing with a second dye having properties. Furthermore, the transparent resist dyeing film 5 is applied to the entire surface.

Next, in the same manner, as shown in FIG. 1C, the same photosensitive liquid as above is uniformly applied, dried, and exposed using a mask exposure method to form a third color dyed base film 6. Dyeing with a third dye having predetermined spectral properties.

Finally, apply top coat 7 and
A color filter as shown in is manufactured.

Therefore, in this method of manufacturing a color filter, the dyed base film of each layer is formed and then dyed to form the color filter portion. It was necessary to control the film thickness with extremely high precision.

In other words, if the dyeing base film thickness is too thin than the set value, dyeing with the desired density cannot be obtained, and if it is too thick, it is likely to be dyed, making it difficult to control the dyeing density, that is, control the spectral characteristics. This was a major drawback in filter manufacturing.

The latter also has the same drawback as the former in that the color filters are formed by dyeing.

Purpose of the Invention The present invention eliminates variations in the dyed base film thickness in the conventional color filter manufacturing process, and
To provide a method for easily obtaining a color filter without color overlap or gaps between colors, and to obtain a technology for safely and easily manufacturing a color filter having predetermined spectral characteristics. The purpose is to

The method of the present invention includes a step of forming a transparent conductive film on a predetermined substrate, a step of selectively forming a first register pattern on the transparent conductive film, and a step of forming a first register pattern between the conductive film and another electrode. said first through a direct current
forming a first colored pattern by coagulating and precipitating an electrodeposition paint having predetermined spectral characteristics on the transparent conductive film in the resist pattern opening, and removing the first resist pattern to form a removed portion. a second colored pattern covering the first colored pattern and the transparent conductive film other than the second colored pattern formation area of the removal part and having a larger opening than the second colored pattern formation area; forming a resist pattern, and applying a direct current between the conductive film and another electrode on the conductive film in the predetermined portion in the opening of the second resist pattern to coagulate and deposit the electrodeposition paint on the first conductive film. A mosaic or striped color filter is formed by forming a second colored pattern that is in contact with the colored pattern.

Description of examples An embodiment of the present invention will be described using FIG. 2.

First, a transparent conductive film 22 such as an ITO film is formed on a glass substrate 21 which has been optically polished in advance by a vapor deposition method or a coating method (FIG. 2A).

Next, apply a photoresist 23 on the entire surface, for example, if it is a positive type, AZ1350J (Shipley), if it is a negative type,
KMR747 (Kodak Co., Ltd.) or the like is applied, exposed using a predetermined photomask 24 (FIG. 2B), and further developed to form a first resist pattern 25 (FIG. 2C). FIG. 2C shows the case where a positive type resist is used.

Next, as shown in FIG. 3, the substrate 21 is immersed in an electrodeposition tank 27 containing an electrodeposition paint 26, and a DC electric field is applied between the transparent conductive film 22 and the cathode 28 to form the first resist pattern. Transparent conductive film 22 at opening 25
The electrodeposition paint is deposited and solidified to form the first colored pattern 3.
form 0. This pattern 30 has electrical insulation properties and can be used as a mask for the next electrodeposition coating. If the color of the electrodeposition paint used at this time, that is, the transmission spectral characteristics, is set to a predetermined value, for example, red, a first colored pattern 30 serving as a red filter can be formed on the surface of the glass substrate (FIG. 2D).

Next, after removing the first resist pattern 25, a second resist pattern 31 is formed by exposure and development. The pattern 31 is formed so as to cover the transparent conductive film 22 and the first colored pattern 30 other than the area where the second colored pattern is planned to be formed (between the colored patterns 30 ), and
The opening of the first resist pattern 31 may be larger than the second colored pattern forming part, and the opening of the second resist pattern 31 does not need to match the part where the second colored pattern is to be formed. is easy.

That is, as is clear from FIG. 2E, the opening of the second resist pattern 31 is larger than the removed portion of the first resist pattern 25, and the removed portion of the first resist pattern 25 is larger than the removed portion of the second resist pattern 31. It is in the form of being contained within. That is, the second resist pattern 31 covers the first colored pattern 30 other than the area where the second colored pattern is planned to be formed.
and on the transparent conductive film 22,
There is no need to strictly form openings between the first colored patterns 30 (need not to completely cover the first colored patterns 30 with the second resist pattern 31). Therefore, the formation of the second resist pattern 31 does not require precision and can be easily performed.

Next, a second electrodeposition paint, for example, green, is coagulated and precipitated in the same manner as the first time, and a second electrodeposition paint is applied on the transparent conductive film 22 in the opening of the second resist pattern 31, that is, on the area where the second colored pattern is to be formed. A second colored pattern 32 is formed using the resist pattern 31 and the first colored pattern 30 as a mask (FIG. 2E).

In this step, as mentioned above, the second resist pattern 25 is directly applied to the removed portion of the first resist pattern 25 itself.
The first coloring pattern 30 is the first coloring pattern 30.
The resist pattern 31 and the colored pattern 3 are formed without any gaps or unnecessary overlaps.
0 as a mask, it is possible to reliably form the so-called self-alignment, and the colored pattern 3
The film thicknesses of 0 and 32 can also be made the same. The second resist pattern 31 may cover a portion of the colored pattern 30 other than the portion where the colored pattern 32 is planned to be formed and the transparent conductive film 22.
It is not necessary to match the opening of the coloring pattern 32 with the area where the colored pattern 32 is to be formed, and alignment etc. when forming the resist pattern 31 are extremely easy.

Repeat the same method above and use the third method as necessary.
A desired mosaic or striped color filter may be manufactured by forming a coloring pattern.

The above-mentioned electrodeposition paints include maleated oils, vinyl-modified maleated oils, cyclopentadiene-modified maleated oils, alkyd resins, acrylic resins, phenolic resins, melanin resins, etc., with pigments and dyes that exhibit predetermined spectral characteristics. Can be used in combination. For example, a blue pigment is Phthalocyanine Blue, a green pigment is Phthalocyanine Green, and a red dye is Orazole Pink.
5B2G (Ciba Geigy product name) may also be used. Also,
Instead of a liquid, a fine powder electrostatic toner may be used and the toner may be directly sprinkled.

Effects of the Invention When the method of the present invention is used, the spectral characteristics can be controlled only by the coating thickness of the electrodeposition coating, so the film thickness can be made uniform among each color, and the spectral characteristics can be easily controlled. Further, since the electric field can be applied uniformly within the substrate, variations in spectral characteristics within the substrate are also reduced even when manufacturing a large area color filter. Furthermore, in the present invention, the colored coating film cured after application is electrically insulating and can be used as a mask for the next electrodeposition coating, so that the mask for the next electrodeposition coating can be formed in self-alignment. In the present invention, a second resist pattern having an opening larger than the area where the second colored pattern is to be formed is formed, and the second colored pattern is formed using the second resist pattern and the first colored pattern as a mask. Since this is a method of forming by electrodeposition coating, there is no need to completely cover the first colored pattern with the second resist pattern, and there is no need for high precision in forming the second resist pattern. Overlapping of the second colored pattern,
It becomes possible to form a high-density and uniform color filter pattern without creating gaps. In this way, in the present invention, the second, third and subsequent paints do not get on top of the paint film from the previous process, and there are no gaps between the paints, there is no color overlap, no gaps occur, and there is no variation. It is possible to easily manufacture high-performance color filters without

[Brief explanation of the drawing]

Figures 1A to 1C are process cross-sectional views for explaining a conventional color filter manufacturing method, Figure 1D is a top view of the completed color filter, and Figure 2A is a top view of the completed color filter.
-E are process cross-sectional views for explaining a method for manufacturing a color filter according to an embodiment of the present invention, and FIG. 3 is a conceptual diagram of electrodeposition coating when used in the method of the present invention. 21... Glass substrate, 22, 32... Transparent conductive film, 23... Photoresist, 25, 31... Resist pattern, 26... Electrodeposition paint, 30... Colored pattern.

Claims (1)

[Claims] 1. A step of forming a transparent conductive film on a predetermined substrate, a step of selectively forming a first resist pattern on the transparent conductive film, and a step of passing a direct current between the conductive film and another electrode. a step of coagulating and precipitating an electrodeposition paint having predetermined spectral characteristics on the transparent conductive film in the first resist pattern opening to form a first colored pattern; and removing the first resist pattern. a step of forming a part;
forming a second resist pattern that covers the transparent electrode film and the first colored pattern other than the area where the second colored pattern is planned to be formed in the removal section and has an opening larger than the area where the second colored pattern is planned to be formed; and applying a direct current between the conductive film and another electrode on the conductive film in the predetermined portion in the second resist pattern opening to solidify and deposit an electrodeposition paint to form the first colored pattern. A method of manufacturing a color filter, comprising the step of forming a second colored pattern that is in contact with the colored pattern.