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JPH0527854B2 - - Google Patents
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JPH0527854B2 - - Google Patents

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Publication number
JPH0527854B2
JPH0527854B2 JP59029657A JP2965784A JPH0527854B2 JP H0527854 B2 JPH0527854 B2 JP H0527854B2 JP 59029657 A JP59029657 A JP 59029657A JP 2965784 A JP2965784 A JP 2965784A JP H0527854 B2 JPH0527854 B2 JP H0527854B2
Authority
JP
Japan
Prior art keywords
voltage
recording
electrode
ion flow
ion
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP59029657A
Other languages
Japanese (ja)
Other versions
JPS60175062A (en
Inventor
Makoto Mentani
Tomoaki Tanaka
Takashi Nishimura
Hiroyuki Hoshino
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NTT Inc
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP2965784A priority Critical patent/JPS60175062A/en
Publication of JPS60175062A publication Critical patent/JPS60175062A/en
Publication of JPH0527854B2 publication Critical patent/JPH0527854B2/ja
Granted legal-status Critical Current

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  • Printers Or Recording Devices Using Electromagnetic And Radiation Means (AREA)
  • Electrophotography Using Other Than Carlson'S Method (AREA)

Description

【発明の詳細な説明】 〔発明の技術分野〕 この発明は、イオン流を制御して記録する方法
において、イオンビーム径を制御して階調記録を
行う記録方法に関するものである。
DETAILED DESCRIPTION OF THE INVENTION [Technical Field of the Invention] The present invention relates to a recording method that performs gradation recording by controlling the ion beam diameter in a recording method by controlling an ion flow.

〔従来技術〕[Prior art]

まず、イオン流を用いた静電記録の原理を第1
図により説明する。
First, we will explain the principle of electrostatic recording using ion flow.
This will be explained using figures.

第1図a,bに示すように、イオン発生器1と
コロナワイヤ2の間に数KVの高圧をかけること
によりコロナワイヤ2から発生したイオンは、コ
ロナワイヤ2と対向電極3が形成する電界によつ
て、例えば径100〜500μm程度のイオン流制御孔
4を通過するが、その通過量はアパーチヤ電極5
を形成する上部制御電極6および下部制御電極7
が形成する電界によつて制御される。すなわち、
第1図aに示すように、上部制御電極6と下部制
御電極7が形成する電界を、コロナワイヤ2と対
向電極3で形成する電界と同方向に設定すれば、
イオンはイオン流制御孔4をイオン流10aのよ
うに通過し、対向電極3上の誘電体からなる記録
媒体8上に静電潜像9を形成する。また、第1図
bのように、上部制御電極6と下部制御電極7が
形成する電界を逆にすると、イオンはイオン流1
0bのように上部制御電極6に吸収され静電潜像
9は形成されない。なお、第1図a,bではアパ
ーチヤ電極5を1個のみ示したが実際には1ライ
ンに多数個設けられる。
As shown in Fig. 1a and b, ions generated from the corona wire 2 by applying a high voltage of several KV between the ion generator 1 and the corona wire 2 are exposed to the electric field formed by the corona wire 2 and the counter electrode 3. For example, the ion flow passes through the ion flow control hole 4 with a diameter of about 100 to 500 μm, but the amount of the ion flow is limited to the aperture electrode 5.
Upper control electrode 6 and lower control electrode 7 forming
controlled by the electric field formed by the That is,
As shown in FIG. 1a, if the electric field formed by the upper control electrode 6 and the lower control electrode 7 is set in the same direction as the electric field formed by the corona wire 2 and the counter electrode 3,
The ions pass through the ion flow control hole 4 like an ion flow 10a, and form an electrostatic latent image 9 on the recording medium 8 made of a dielectric material on the counter electrode 3. Moreover, as shown in FIG. 1b, if the electric fields formed by the upper control electrode 6 and the lower control electrode 7 are reversed, the ions will be
0b, the electrostatic latent image 9 is not formed because it is absorbed by the upper control electrode 6. Although only one aperture electrode 5 is shown in FIGS. 1a and 1b, in reality, a large number of aperture electrodes 5 are provided in one line.

上記従来のイオン流を制御して階調記録を行う
方法には、上部制御電極6と下部制御電極7の間
に記録信号に対応したパルス幅の電圧を印加する
パルス幅制御方法と、同じく記録信号に対応した
大きさの電圧を印加する電圧制御方法がある。
The conventional method of performing gradation recording by controlling the ion flow includes a pulse width control method in which a voltage with a pulse width corresponding to the recording signal is applied between the upper control electrode 6 and the lower control electrode 7; There is a voltage control method that applies a voltage of a magnitude corresponding to a signal.

前者の方法はパルス幅を制御するためにデイジ
タル回路で実現しやすいという利点があるが、形
成される静電潜像を現像する点を考えると階調再
現性がよくないという欠点がある。また、後者の
方式は電圧を制御してイオンビーム径を制御して
いるため階調再現性がよいという利点があるが、
各電極ごとに電圧制御する回路が複雑、高価とな
るという欠点がある。
The former method has the advantage of being easy to implement with a digital circuit in order to control the pulse width, but has the disadvantage of poor gradation reproducibility when considering the development of the electrostatic latent image formed. In addition, the latter method has the advantage of good gradation reproducibility because the ion beam diameter is controlled by controlling the voltage.
The disadvantage is that the voltage control circuit for each electrode is complicated and expensive.

〔発明の概要〕[Summary of the invention]

この発明は、これらの欠点を除去するため、記
録周期と同じ周期で変化する電圧を記録信号に対
応したパルス幅でON、OFFさせることによりイ
オンビーム径を変化させて記録するようにしたも
のである。以下図面についてこの発明を詳細に説
明する。
In order to eliminate these drawbacks, this invention records by changing the ion beam diameter by turning on and off a voltage that changes at the same period as the recording period with a pulse width corresponding to the recording signal. be. The present invention will be explained in detail below with reference to the drawings.

〔発明の実施例〕[Embodiments of the invention]

第2図はこの発明の一実施例であつて、11は
アパーチヤ電極に印加する電圧を発生する電圧発
生回路、121,122,123,……はON、OFF
信号入力部(なお、以下総称するときは単に12
という。他の符号についても同じとする)、13
,132,133,……は制御信号出力部、14
,142,143,……はトランジスタ、151
152,153,……は抵抗器である。なお、制御
信号出力部13はそれぞれアパーチヤ電極に印加
されるが、アパーチヤ電極は省略してある。
FIG. 2 shows an embodiment of the present invention, in which 11 is a voltage generation circuit that generates a voltage to be applied to the aperture electrode, 12 1 , 12 2 , 12 3 , . . . are ON and OFF.
Signal input section (hereinafter collectively referred to as simply 12
That's what it means. The same applies to other symbols), 13
1 , 13 2 , 13 3 , ... are control signal output sections, 14
1 , 14 2 , 14 3 , ... are transistors, 15 1 ,
15 2 , 15 3 , ... are resistors. Note that the control signal output section 13 is applied to each aperture electrode, but the aperture electrode is omitted.

第3図は電圧発生回路11からの出力例で、横
軸は時間t、縦軸は電圧V、Tは記録周期、つま
り、1ラインのドツトから次のラインのドツトと
の記録間隔である。図示のように出力は記録周期
Tと同じ周期で変化している。
FIG. 3 shows an example of the output from the voltage generating circuit 11, where the horizontal axis is time t, the vertical axis is voltage V, and T is the recording period, that is, the recording interval from one line of dots to the next line. As shown in the figure, the output changes at the same cycle as the recording cycle T.

次に、第2図の動作について説明する。電圧発
生回路11から発生した電圧は各トランジスタ1
4のコレクタに加えられ、ON、OFF信号入力部
12でON、OFF制御されているために、出力電
圧としてはON、OFF信号のタイミングおよび
ON信号のパルス幅によつて各種の電圧波形、例
えば第3図で時間t0〜t1,t0〜t2,t0〜t3の幅の電
圧を出力することができる。
Next, the operation shown in FIG. 2 will be explained. The voltage generated from the voltage generation circuit 11 is applied to each transistor 1.
4 collector and is controlled ON and OFF by the ON and OFF signal input section 12, the output voltage depends on the timing of the ON and OFF signals and
Depending on the pulse width of the ON signal, it is possible to output various voltage waveforms, for example voltages with widths of times t 0 -t 1 , t 0 -t 2 , and t 0 -t 3 in FIG. 3.

特に、低い記録濃度を表現する場合、例えば第
3図で時間t0〜t1の幅の電圧を使用するとイオン
ビーム径をしぼつた状態のON状態を選ぶことが
できるために、再現性に優れた記録を行うことが
可能である。
In particular, when expressing low recording density, for example, if you use a voltage with a width of time t 0 to t 1 in Figure 3, you can select an ON state with a narrowed ion beam diameter, which improves reproducibility. It is possible to make excellent records.

次に、上記の動作原理を説明する。第4図a,
b,cは第1図に示したアパーチヤ電極5、つま
り上部、下部制御電極6,7に印加する電圧変化
によるイオンビーム径の変化を示したもので、イ
オン流制御孔4の中心から半分のみ示してある。
イオンビーム径は第4図に示されるように、アパ
ーチヤ電極5に加える電圧で制御できる。
Next, the above operating principle will be explained. Figure 4a,
b and c show changes in the ion beam diameter due to changes in the voltage applied to the aperture electrode 5 shown in FIG. 1, that is, the upper and lower control electrodes 6 and 7. It is shown.
The ion beam diameter can be controlled by the voltage applied to the aperture electrode 5, as shown in FIG.

すなわち、第4図a,b,cで、E1,E2,E3
はそれぞれ上部制御電極6の近傍の電界、上部制
御電極6と下部制御電極7との間の電界、および
下部制御電極7の近傍の電界を示している。
That is, in Figure 4 a, b, c, E 1 , E 2 , E 3
represent the electric field near the upper control electrode 6, the electric field between the upper control electrode 6 and the lower control electrode 7, and the electric field near the lower control electrode 7, respectively.

第4図aは、E2/E1=−0.5,E3/E1=4の場
合で、イオン流10Aはイオン流制御孔4を通過
できず記録は行われない。
FIG. 4a shows a case where E 2 /E 1 =−0.5 and E 3 /E 1 =4, and the ion flow 10A cannot pass through the ion flow control hole 4, so no recording is performed.

第4図bは、E2/E1=0,E3/E1=4の場合
であり、細いイオン流10Bによつて記録が行わ
れることを示している。
FIG. 4b shows the case where E 2 /E 1 =0 and E 3 /E 1 =4, and recording is performed by the thin ion flow 10B.

第4図cは、E2/E1=2,E3/E1=4の場合
であり、太いイオン流10Cによつて記録が行わ
れることを示している。
FIG. 4c shows the case where E 2 /E 1 =2 and E 3 /E 1 =4, and recording is performed with a thick ion flow 10C.

第5図、第6図はこの発明と、従来の電圧を変
化させないでパルス幅のみを変化させた場合の静
電潜像をそれぞれ示す。第5図、第6図における
#1〜#4の波形はパルス幅が1〜4の順に大き
くなつている波形を示し、Lは現像スライスレベ
ルを示し、横軸は位置(記録の大きさ)、縦軸は
電荷密度を示す。
FIGS. 5 and 6 show electrostatic latent images in the case of the present invention and in the conventional case, respectively, when only the pulse width is changed without changing the voltage. Waveforms #1 to #4 in FIGS. 5 and 6 indicate waveforms in which the pulse width increases in the order of 1 to 4, L indicates the development slice level, and the horizontal axis is the position (recording size) , the vertical axis shows the charge density.

第6図の従来例では現像のスライスレベルLで
切つてみると、#1,#2の波形のような低い電
荷密度のときは記録が全くなされず、#3,#4
の波形になつてはじめて記録が行われる。
In the conventional example shown in FIG. 6, when cutting at the development slice level L, no recording is made at all when the charge density is low like the waveforms #1 and #2, and
Recording is performed only when the waveform becomes .

これに対し、第5図のこの発明では、#1の波
形のときでもスライスレベルL以上となり、細い
イオンビーム径により記録が行われることがわか
る。
On the other hand, in the present invention shown in FIG. 5, even in the case of waveform #1, the slice level is higher than L, and it can be seen that recording is performed with a narrow ion beam diameter.

第5図と第6図を比較すれば明らかなように、
この発明の方が階調表現に優れている。
As is clear from comparing Figures 5 and 6,
This invention has better gradation expression.

なお、上記実施例ではアパーチヤ電極5への電
圧印加を上部制御電極6と下部制御電極7との間
に行うようにしたが、これは一方の電極のみに加
え他方の電極を一定電位に保つようにしてもよ
い。
In the above embodiment, the voltage was applied to the aperture electrode 5 between the upper control electrode 6 and the lower control electrode 7, but this was done by applying voltage to only one electrode and keeping the other electrode at a constant potential. You can also do this.

さらに、電圧発生回路11の出力電圧波形は、
第3図のように直線状に変化するもののみでな
く、上に凹、または上に凸の曲線状に変化するも
の等他の電圧波形を用いることもできる。
Furthermore, the output voltage waveform of the voltage generation circuit 11 is
It is also possible to use other voltage waveforms, such as a voltage waveform that changes linearly as shown in FIG. 3, or one that changes in an upwardly concave or upwardly convex curve.

〔発明の効果〕〔Effect of the invention〕

以上説明したように、この発明はイオンビーム
径が変調されるように記録周期と同じ周期で変化
する電圧を用い、この電圧を記録信号に対応した
パルス幅でON、OFFさせるようにしたので、容
易に実現できる回路で階調再現性に優れた記録が
できるという利点がある。
As explained above, this invention uses a voltage that changes at the same period as the recording period so that the ion beam diameter is modulated, and turns this voltage on and off with a pulse width corresponding to the recording signal. It has the advantage of being able to record with excellent gradation reproducibility using a circuit that can be easily implemented.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図a,bはイオン流を用いた静電記録の原
理を説明する図、第2図はこの発明の一実施例の
要部の回路図、第3図は電圧発生回路の電圧出力
例を示す図、第4図a〜cはイオンビーム径の制
御例を示す図、第5図はこの発明による静電潜像
を示す図、第6図は同じく従来のパルス幅変調方
式による静電潜像を示す図である。 図中、10はイオン流、11は電圧発生回路、
12はON、OFF信号入力部、13は制御信号出
力部、14はトランジスタ、15は抵抗器であ
る。
Figures 1a and b are diagrams explaining the principle of electrostatic recording using ion flow, Figure 2 is a circuit diagram of the main part of an embodiment of this invention, and Figure 3 is an example of voltage output from a voltage generation circuit. Figures 4a to 4c are diagrams showing an example of controlling the ion beam diameter, Figure 5 is a diagram showing an electrostatic latent image according to the present invention, and Figure 6 is a diagram showing an electrostatic latent image using the conventional pulse width modulation method. FIG. 3 is a diagram showing a latent image. In the figure, 10 is an ion flow, 11 is a voltage generation circuit,
12 is an ON/OFF signal input section, 13 is a control signal output section, 14 is a transistor, and 15 is a resistor.

Claims (1)

【特許請求の範囲】[Claims] 1 イオン流をアパーチヤ電極で制御する記録方
法において、前記アパーチヤ電極に印加する電圧
として記録周期と同じ周期で変化する電圧を用
い、この電圧を記録信号に対応したパルス幅で
ON、OFFし前記イオン流のイオンビーム径を変
調して記録を行うことを特徴とするイオン流制御
階調記録方法。
1 In a recording method in which ion flow is controlled by an aperture electrode, a voltage that changes at the same period as the recording period is used as the voltage applied to the aperture electrode, and this voltage is applied with a pulse width corresponding to the recording signal.
An ion flow control gradation recording method characterized in that recording is performed by turning on and off the ion beam and modulating the ion beam diameter of the ion flow.
JP2965784A 1984-02-21 1984-02-21 Gradation recording method of ion current control Granted JPS60175062A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2965784A JPS60175062A (en) 1984-02-21 1984-02-21 Gradation recording method of ion current control

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2965784A JPS60175062A (en) 1984-02-21 1984-02-21 Gradation recording method of ion current control

Publications (2)

Publication Number Publication Date
JPS60175062A JPS60175062A (en) 1985-09-09
JPH0527854B2 true JPH0527854B2 (en) 1993-04-22

Family

ID=12282182

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2965784A Granted JPS60175062A (en) 1984-02-21 1984-02-21 Gradation recording method of ion current control

Country Status (1)

Country Link
JP (1) JPS60175062A (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4792860A (en) * 1987-02-27 1988-12-20 Kuehrle Manfred R Thermodynamic printing method and means
US5687001A (en) 1992-01-22 1997-11-11 Dai Nippon Printing Co., Ltd. Halftone image ion printer

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5540430B2 (en) * 1973-03-28 1980-10-17
JPS54103046A (en) * 1978-01-30 1979-08-14 Ricoh Co Ltd Half tone recorder
JPS5617276A (en) * 1979-07-20 1981-02-19 Mitsubishi Electric Corp Heat-sensitive recording system
JPS57136665A (en) * 1981-02-18 1982-08-23 Sony Corp Ion flow electrostatic recorder
JPS57136950U (en) * 1981-02-18 1982-08-26

Also Published As

Publication number Publication date
JPS60175062A (en) 1985-09-09

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