JPH0531464B2 - - Google Patents

Description

DETAILED DESCRIPTION OF THE INVENTION (Field of Industrial Application) This invention relates to a metallic luster molding, and more particularly, to an insulating molding that is particularly useful when used as a decorative molding for the outer frame of electronic equipment such as televisions and VCRs. The present invention relates to a metallic luster molding with a glossy finish.

(Prior art) Metallic luster moldings, which are made by laminating molded molding resin and Al foil or Al vapor-deposited film, have been known as decorative moldings for the outer frames of electronic devices such as televisions and VTRs. .

(Problem to be solved by the invention) However, the conventional metallic luster molding can be
When used for the outer frame of electronic equipment such as a VTR, the Al foil or Al vapor deposited film forms a conductive layer or film that is continuously connected in the plane direction. When a person comes in contact with an electric charge, an electric shock may occur, and conversely, the electric charge on the human body may destroy electronic equipment.

Therefore, when using Al foil, it is usually grounded, and since the Al vapor deposited layer of Al vapor deposited film is so thin, it is practically difficult to ground it, and there is always a risk of electric shock. Therefore, it is almost never used in practice.

Therefore, as a result of intensive research, the inventor of the present invention discovered that a metal vapor deposited layer with a specific structure has insulating properties, and completed this invention. It eliminates defects and has a beautiful metallic luster that is continuous in the plane direction, and also has insulating properties, so even when used for the outer frame of electronic equipment such as TVs and VCRs, the electric shock described above will not occur. The purpose of the present invention is to provide a metallic luster molding with insulation properties, which does not require any grounding.

(Means for Solving the Problems) The present invention provides a metallic luster molding formed by laminating a molded molding resin and a metallized film, in which the metallized layer of the metallized film has an island size of 200 Å to The distance between islands is 1 μm.
This is a metallic luster molding with insulation properties, characterized by an island-like structure of 100 Å to 5000 Å.

The present invention is a metallic luster molding in which a molded molding resin, that is, a molded article made of the molding resin and a metallized film are bonded together.

In order to impart metallic luster to the molded resin for molding, the present invention proposes that the resin for molding, such as vinyl chloride resin, be bonded together at the same time as the molding, or that the molding resin be formed into a film or sheet. A particularly significant feature is that the metal-deposited layer of the metal-deposited film, which is used when bonding in advance to molding resin such as vinyl chloride resin and then molding, has an island-like structure with insulation properties. It has the following.

As the molding resin, resins conventionally used as molding resins, such as vinyl chloride resin, can be used.

The molding molding resin and the metallized film may be bonded together so that either the film side of the metallized film or the metallized layer side is on the outside or inside.

A colored or uncolored protective layer may be provided on the metallized layer of the metallized film.

Further, the metallized film may be attached to another plastic film or the like.

As the film used for the metallized film, polyethylene terephthalate film, polypropylene film, polyethylene film, polyvinyl chloride film, and other various plastic films can be used.

The metal vapor deposition layer is formed on the film by a conventionally known thin film forming method such as vacuum evaporation, sputtering, or ion plating.

In terms of the thin film production process, the metal vapor deposition layer is formed on the film so that it becomes an island-like structure after passing through "nucleation", "nuclear bonding", and "initial island-like structure".

A protective layer may be provided on the metal vapor deposited layer having an island-like structure, and a base layer may be provided as a pretreatment under the metal vapor deposited layer having an island structure.

Further, in the present invention, the metal vapor deposited layer having an island-like structure may be formed partially, and in this case, the parts where the metal vapor deposited layer having the island-like structure exists and the parts where it does not exist coexist. Appropriate patterns, designs, etc. can be made to appear.

In this invention, the structure of the metal vapor deposited layer is made into an island structure, thereby making the metal vapor deposited layer insulating even though the metal vapor deposit layer is used.

The island-like structure of the metal vapor deposited layer has an island size of 200 Å.
An island-like structure with a thickness of ~1 μm and an island spacing of 100 Å to 5000 Å is formed.

The size of the island in the island-like structure of the metal vapor deposited layer is
If it is smaller than 200 Å, the islands are too small and a beautiful metallic luster that is continuous in the plane direction cannot be obtained. When the size of the islands is larger than 1 μm, the islands are so large that they come into contact with each other and become a single piece, resulting in a decrease in insulation properties.

The spacing between islands in the island-like structure of the metal vapor deposited layer is 100
When the thickness is smaller than Å, a tunnel current of charged charges flows, resulting in a decrease in insulation properties. If the spacing between the islands is greater than 5000 Å, the overall amount of metal will decrease, making it impossible to obtain a beautiful metallic luster that is continuous in the plane direction.

The metal vapor deposited layer with an island-like structure contains Sn, Pb,
Various metals such as Zn, Bi, Ti, Cr, Fe, C, Ni, Si, Ge, etc. can be used.

The metal vapor deposition layer having an island-like structure according to the present invention can be formed by controlling the evaporation rate, the thickness of the vapor deposition layer, etc. in vacuum vapor deposition or the like.

In terms of the thin film production process, control in vacuum evaporation and the like is controlled so that an island-like structure is formed after passing through "nucleation", "nuclear bonding", and "initial island-like structure".

Control is difficult depending on the metal used. Generally speaking, metals and noble metals with low melting points are relatively easy to control, and among them, Sn, Pb, Zn, Bi, etc. are particularly easy to control. Furthermore, control of transition metals such as Ti, Cr, Fe, Co, and Ni, and semiconductor metals such as Si and Ge is relatively difficult.

In controlling the formation of a metal vapor deposited layer having an island-like structure, generally speaking, the faster the evaporation rate, the smaller the size of the islands tends to be. However, the influence of the deposited layer thickness is particularly large, and when the deposited layer thickness is converted into a light process rate, a light transmittance of about 1% to 15% is optimal for obtaining the island-like structure of the metal deposited layer of this invention. . Of course, this also varies depending on the metal; Sn, Pb,
This range is fine for Zn, Bi, etc., but this range may not necessarily be optimal for other metals.

In the case of Sn, which is a typical metal used in this invention, if the light transmittance of the Sn vapor deposited layer is lower than 3 to 10%, the dielectric breakdown voltage will not reach 1000V, and if the light transmittance exceeds 15%, the insulation Although the breakdown voltage is 12,000V or more, a beautiful metallic luster that is continuous in the plane direction cannot be obtained.

In order to obtain a beautiful metallic luster that is continuous in the plane direction, the Sn vapor deposited layer requires a gloss level of approximately 350 or higher, but the light transmittance of the Sn vapor deposited layer is approximately 350 or higher.
If it is 15% or less, the gloss level will be approximately 350 or higher.

However, if the light transmittance of the Sn vapor-deposited layer is less than 3 to 10%, the gloss will be 450 or more.
The dielectric breakdown voltage should not reach 1000V.

(Examples and Comparative Examples) Example 1 A semi-continuous vacuum evaporator was used to coat one side of a long polyethylene terephthalate film with a thickness of 12 μm, and the evaporation rate was controlled at 0.5 g/min and the light transmittance was controlled at 15%. At the same time, a Sn vapor-deposited layer was formed to obtain a metal-deposited film (light transmittance was controlled by controlling the film winding speed).

Note that the light transmittance is the total light transmittance according to JISK-
Measured by the method of 6714.

When we measured the size and spacing of the islands in the Sn vapor deposition layer, the island size was 0.4μm and the spacing between the islands was 500Å.
It was hot.

The size of the islands can be determined using an electron microscope.
Observe the Sn deposition layer and display the average size.
Regarding the spacing between the islands, the Sn vapor deposition layer was observed using an electron microscope and the average spacing was displayed.

Furthermore, the dielectric breakdown voltage and glossiness of the Sn vapor deposited layer were also measured.

Next, a vinyl chloride-vinyl acetate copolymer resin was applied to a thickness of 2 μm on the Sn vapor-deposited layer of the obtained metal-deposited film using a roll coater, and with the vinyl chloride-vinyl acetate copolymer resin side facing inside, it was heated and pressurized. It was laminated with a 200 μm thick vinyl chloride film.

Thereafter, the material obtained in this way was slit into 10 mm width, and at the same time as the polyvinyl chloride resin (molding resin) was molded, the vinyl chloride resin was molded with the vinyl chloride film on the inside and the polyethylene terephthalate film on the outside. By laminating them together, a metallic lustrous molding with insulation properties was obtained.

Example 2 A metal-deposited film was obtained in the same manner as in Example 1, except that the evaporation rate was 1.0 g/min and the light transmittance was 10%.

The size of the islands in the Sn vapor deposition layer is 1.0μm, and the spacing between the islands is
It was 500Å.

Furthermore, the dielectric breakdown voltage and glossiness of the Sn vapor deposited layer were also measured.

Next, in the same manner as in Example 1, a metallic lustrous molding with insulation properties was obtained.

Comparative Example 1 A metal vapor deposited film was obtained by forming an Al vapor deposited layer with a thickness of 500 Å on one side of a long polyethylene terephthalate film with a thickness of 12 μm using a semi-continuous vacuum evaporator.

The Al vapor-deposited layer did not have an island-like structure but had a continuous layer in the plane direction, and had a beautiful metallic luster that was continuous in the plane direction.

Note that the Al deposited layer was observed using an electron microscope.

Furthermore, the dielectric breakdown voltage and glossiness of the Al deposited layer were also measured.

Next, a metallic luster molding was obtained in the same manner as in Example 1.

The dielectric breakdown voltage was measured using some of the metal-deposited films of Example 1, Example 2, and Comparative Example 1 before laminating the 200 μm thick vinyl chloride film as samples.

The dielectric breakdown voltage was measured using a 50mmφ cylindrical electrode on the surface of the metal vapor deposited layer of the sample and a 70mφ wall thickness of 50mm.
A voltage was applied between the two electrodes, and the voltage was measured when a hole was formed in the metal vapor deposited layer due to discharge and the polyethylene terephthalate film was exposed.

Furthermore, the glossiness of the metal vapor deposited layer was also measured for each sample.

In addition, the glossiness was measured by the method of JIS Z-874.

The results of dielectric breakdown voltage and gloss measurements for Example 1, Example 2, and Comparative Example 1 are shown in the following table.

Dielectric breakdown voltage Glossiness Example 1 12000V or more 350 Example 2 1000V 450 Comparative example 1 300V 800 (Effects of the invention) This invention provides a metal vapor deposited layer of a metal vapor deposited film with an island size of 200 Å to 1 μm and an island spacing. 100Å～
Because it has an island-like structure with a thickness of 5000 Å, it has a beautiful metallic luster that continues in the plane direction, and it also has insulating properties, making it possible to easily obtain a dielectric breakdown voltage of 1000 V or more.

Therefore, unlike those using conventional Al foil or Al vapor-deposited film, when used for the outer frame of electronic equipment such as TVs and VTRs, electric shock occurs because there is no electricity even if you touch it. It can be used with confidence without any problems, and of course there is no need for grounding.

Claims (1)

[Claims] 1. In a metallic luster molding made by laminating molded molding molding resin and a metallized film, the metallized layer of the metallized film has an island size of 200 Å to 1 μm and an island spacing of 100 Å to 5000 μm.
A shiny metallic molding with insulation properties, characterized by an island-like structure.