JPH0541700B2 - - Google Patents
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- Publication number
- JPH0541700B2 JPH0541700B2 JP30297286A JP30297286A JPH0541700B2 JP H0541700 B2 JPH0541700 B2 JP H0541700B2 JP 30297286 A JP30297286 A JP 30297286A JP 30297286 A JP30297286 A JP 30297286A JP H0541700 B2 JPH0541700 B2 JP H0541700B2
- Authority
- JP
- Japan
- Prior art keywords
- laser
- laser beam
- irradiated
- vacuum chamber
- detection sensor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
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- Physical Vapour Deposition (AREA)
Description
【発明の詳細な説明】
〔産業上の利用分野〕
この発明は、例えばレーザ光を用いてセラミツ
クスなどを金属基板などに蒸着するレーザ蒸着装
置に関するものである。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a laser vapor deposition apparatus for vapor depositing ceramics or the like onto a metal substrate or the like using, for example, a laser beam.
第2図は、特開昭59−116373号公報に示された
従来のレーザ蒸着装置を示す構成図である。図に
おいて、1はレーザ発振器(図示せず)から放射
されるレーザ光、2は第1平面鏡、3は集光レン
ズ、4は透過窓、5は真空チヤンバ、6は第2平
面鏡、7は例えばセラミツクスなどの被照射物、
8は例えば金属基板、9は予熱ヒータである。第
1平面鏡2、集光レンズ3、透過窓4、及び第2
平面鏡6でレーザ発振器から放射されたレーザ光
1を被照射物7に導く光学系を構成している。図
中、矢印Aはレーザ光1の放射方向、矢印Bは被
照射物7の回転方向、矢印Cは被照射物7の蒸発
粒子の飛散方向を示している。
FIG. 2 is a configuration diagram showing a conventional laser vapor deposition apparatus disclosed in Japanese Patent Application Laid-open No. 116373/1983. In the figure, 1 is a laser beam emitted from a laser oscillator (not shown), 2 is a first plane mirror, 3 is a condenser lens, 4 is a transmission window, 5 is a vacuum chamber, 6 is a second plane mirror, 7 is, for example Irradiated objects such as ceramics,
8 is a metal substrate, and 9 is a preheater. A first plane mirror 2, a condensing lens 3, a transmission window 4, and a second
The plane mirror 6 constitutes an optical system that guides the laser beam 1 emitted from the laser oscillator to the object 7 to be irradiated. In the figure, arrow A indicates the radiation direction of the laser beam 1, arrow B indicates the rotational direction of the irradiated object 7, and arrow C indicates the scattering direction of the evaporated particles of the irradiated object 7.
レーザ発振器(図示せず)から放射される平行
なレーザ光1は第1平面鏡2で水平方向に光路転
換され、集光レンズ3を通過した後、透過窓4を
通して真空チヤンバ5内に導き、第2平面鏡6に
より再び光路転換された後に、リング状もしくは
円柱状に形成された被照射物7にリングもしくは
円柱外周面の接線方向から照射される。集光レン
ズ3は被照射物7上の照射点付近で焦点が結ばれ
るように、その焦点距離および配置位置を選定す
る。また、リング状もしくは円柱状の被照射物7
は任意速度でリングもしくは円柱中心軸を中心に
矢印B方向に回転し、さらにリングもしくは円柱
中心軸方向に被照射物7の厚みだけ揺動運動が可
能な構造にして、被照射物7の外周全体を一様に
蒸発させる。レーザ光1の照射により、被照射物
7の外周上の被照射領域が蒸発し、矢印Cに示す
ように蒸発粒子が基板8の方向へ飛び出し、基板
8上に蒸着し、堆積する。また、被照射物7が極
めて熱割れの生じやすい材質のものである場合に
は、被照射物7の外周部近傍に予熱ヒータ9を設
け、この予熱ヒータ9にて被照射物7の予熱を行
なうことにより被照射物7の破損を防ぐようにし
ている。 A parallel laser beam 1 emitted from a laser oscillator (not shown) is horizontally diverted by a first plane mirror 2, passes through a condensing lens 3, and is guided into a vacuum chamber 5 through a transmission window 4. After the optical path is changed again by the biplane mirror 6, the object 7 to be irradiated, which is formed in the shape of a ring or cylinder, is irradiated from the tangential direction of the outer peripheral surface of the ring or cylinder. The focal length and arrangement position of the condenser lens 3 are selected so that the focus is formed near the irradiation point on the object 7 to be irradiated. In addition, a ring-shaped or cylindrical irradiated object 7
rotates in the direction of arrow B around the center axis of the ring or cylinder at an arbitrary speed, and further swings in the direction of the center axis of the ring or cylinder by the thickness of the object 7 to be irradiated. Evaporate everything evenly. By irradiating the laser beam 1, the irradiated area on the outer periphery of the irradiated object 7 is evaporated, and evaporated particles fly out in the direction of the substrate 8 as shown by arrow C, and are deposited on the substrate 8. In addition, if the irradiated object 7 is made of a material that is extremely susceptible to thermal cracking, a preheater 9 is provided near the outer periphery of the irradiated object 7, and the preheater 9 preheats the irradiated object 7. By doing so, damage to the object 7 to be irradiated is prevented.
従来のレーザ蒸着装置は以上のように構成され
ているので、被照射物の蒸発粒子の一部が透過窓
4や平面鏡6などの光学部品にも付着するので、
この付着物にレーザ光が吸収され、光学部品が損
傷するという問題があつた。
Since the conventional laser evaporation apparatus is configured as described above, some of the evaporated particles of the irradiated object also adhere to optical components such as the transmission window 4 and the plane mirror 6.
There was a problem in that the laser beam was absorbed by this deposit and the optical components were damaged.
この発明は上記のような問題点を解消するため
になされたもので、被照射物に照射されるレーザ
光強度を必要に応じて測定し、光学部品によるレ
ーザ光の吸収を検出することによつて、光学部品
の汚染状態をモニタリングできるレーザ蒸着装置
を得ることを目的としたものである。 This invention was made to solve the above-mentioned problems, and it measures the intensity of the laser beam irradiated onto the object as necessary and detects the absorption of the laser beam by optical components. Therefore, the object of the present invention is to obtain a laser evaporation apparatus that can monitor the contamination state of optical components.
この発明に係るレーザ蒸着装置は、真空チヤン
バ、この真空チヤンバ内に配置される被照射物、
レーザ発振器からのレーザ光を上記被照射物に導
く光学系、レーザ光による被照射物の蒸発粒子が
蒸着される位置に配置される基板、レーザ発振器
から出射され、真空チヤンバに入射する前のレー
ザ光の強度を検出する第1検出センサ、真空チヤ
ンバ内に導かれたレーザ光の強度を検出する第2
検出センサを備えたものである。
A laser vapor deposition apparatus according to the present invention includes a vacuum chamber, an object to be irradiated placed in the vacuum chamber,
An optical system that guides the laser beam from the laser oscillator to the object to be irradiated, a substrate placed at a position where vaporized particles of the object to be irradiated by the laser beam are deposited, and a laser emitted from the laser oscillator before entering the vacuum chamber. A first detection sensor detects the intensity of the light, and a second detection sensor detects the intensity of the laser light guided into the vacuum chamber.
It is equipped with a detection sensor.
この発明におけるレーザ蒸着装置は、真空チヤ
ンバに入射する前のレーザ光の強度と、真空チヤ
ンバ内に導かれたレーザ光の強度を検出し、この
間における光学部品などのレーザ光の吸収による
エネルギ損失を検出できる。このエネルギ損失の
検出から、光学部品などの劣化状態を検出し、光
学部品などの損傷を防止することができる。
The laser evaporation apparatus according to the present invention detects the intensity of the laser beam before entering the vacuum chamber and the intensity of the laser beam guided into the vacuum chamber, and eliminates energy loss due to absorption of the laser beam by optical components, etc. Can be detected. By detecting this energy loss, it is possible to detect the state of deterioration of optical components and prevent damage to the optical components.
以下、この発明の一実施例を図について説明す
る。第1図はこの発明の一実施例によるレーザ蒸
着装置を示す構成図で、1〜9は従来と同様又は
相当部分を示す。20は真空チヤンバ5内に導か
れたレーザ光の強度を検出する検出センサ、30
は平面鏡6を矢印Dの方向に動かすための駆動機
構、31は駆動機構30の駆動制御器、35はレ
ーザ発振器から出射され、真空チヤンバ5に入射
する前のレーザ光の強度を検出する検出センサ、
40は駆動制御器31に制御信号を送る制御装置
である。制御装置40は、駆動制御器31に信号
を送り、平面鏡6を位置6aから位置6bに移動
させ、検出センサ20で被照射物7に照射される
レーザ光の強度を測定する。これと同時に検出セ
ンサ35で真空チヤンバ5に入射する前のレーザ
光の強度を測定する。
An embodiment of the present invention will be described below with reference to the drawings. FIG. 1 is a configuration diagram showing a laser vapor deposition apparatus according to an embodiment of the present invention, and numerals 1 to 9 indicate parts similar to or equivalent to conventional ones. 20 is a detection sensor 30 that detects the intensity of the laser beam guided into the vacuum chamber 5;
3 is a drive mechanism for moving the plane mirror 6 in the direction of arrow D; 31 is a drive controller for the drive mechanism 30; 35 is a detection sensor that detects the intensity of the laser light emitted from the laser oscillator and before it enters the vacuum chamber 5. ,
40 is a control device that sends a control signal to the drive controller 31. The control device 40 sends a signal to the drive controller 31 to move the plane mirror 6 from the position 6a to the position 6b, and the detection sensor 20 measures the intensity of the laser beam irradiated onto the object 7. At the same time, the detection sensor 35 measures the intensity of the laser beam before it enters the vacuum chamber 5.
この2つの測定結果を制御装置40で比較し、
検出センサ20,35に配置されている光学部品
のレーザの吸収率を算出し、この値が設定値以上
になつた場合に制御信号41を出力する。一般に
は、この制御信号41に基づいて警報が発せられ
る。 These two measurement results are compared by the control device 40,
The laser absorption rate of the optical components arranged in the detection sensors 20 and 35 is calculated, and when this value exceeds a set value, a control signal 41 is output. Generally, an alarm is issued based on this control signal 41.
以上のモニタリングは、実際には、例えば1回
の蒸着が終了するたびに、即ち、30分から1時間
に1回の割合でオフラインで行うようにしてい
る。 The above monitoring is actually performed off-line, for example, every time one vapor deposition is completed, that is, once every 30 minutes to an hour.
これにより、検出センサ20,35間の光学部
品、この場合は第1平面鏡2、集光レンズ3、透
過窓4、及び第2平面鏡6、主には透過窓4と第
2平面鏡6の汚染、劣化の状態をモニタリングで
きるので、これらの光学部品の状態を常に把握で
き、この状態に応じて清掃するなどの管理を行う
ことによつて、光学部品の破損が防止できるよう
になり、この結果、光学部品の寿命が大幅に伸び
た。また、光学部品の状態が正確に把握できるよ
うになつたので、蒸着条件などの補正も容易にで
き、より安定な蒸着ができるようになつた。 As a result, the optical components between the detection sensors 20 and 35, in this case the first plane mirror 2, the condenser lens 3, the transmission window 4, and the second plane mirror 6, mainly the transmission window 4 and the second plane mirror 6, are contaminated. Since the state of deterioration can be monitored, the state of these optical parts can be constantly grasped, and damage to the optical parts can be prevented by cleaning and managing them according to the state. The lifespan of optical components has been significantly extended. Furthermore, since the state of optical components can now be accurately grasped, it is now easier to correct the deposition conditions, etc., making it possible to perform more stable deposition.
なお、上記実施例では、真空チヤンバ5内に導
びかれたレーザ光の強度を検出するために、第2
平面鏡6を駆動機構30によつてレーザ光の反射
方向を変化させて検出センサ20で検出するよう
にしているが、これに限るものではなく、例えば
検出したい時に検出センサ20を移動して検出す
ることもできる。 In the above embodiment, in order to detect the intensity of the laser beam guided into the vacuum chamber 5, the second
Although the plane mirror 6 is configured to change the direction in which the laser beam is reflected by the drive mechanism 30 and is detected by the detection sensor 20, the present invention is not limited to this. For example, the detection sensor 20 may be moved to detect when a detection is desired. You can also do that.
また、検出センサ20,35の配置位置は、上
記実施例に限らず、損傷、汚染状態をモニタリン
グしたい部品の前後のレーザ光の強度を検出でき
る位置に配置すればよい。 Furthermore, the positions of the detection sensors 20 and 35 are not limited to those in the above embodiments, and may be placed at positions where the intensity of the laser light before and after the component whose damage or contamination state is to be monitored can be detected.
また、制御装置40を設けずに、検出センサ2
0,35のそれぞれの検出値を表示しておき、こ
れらの検出値の比によつて2つの検出センサ2
0,35間の部品の損傷、汚染状態をモニタリン
グすることができる。また検出値の比をとらなく
ても、検出値の差によつてモニタリングしてもよ
い。 Moreover, the detection sensor 2 can be used without providing the control device 40.
The detection values of 0 and 35 are displayed, and the two detection sensors 2 are selected according to the ratio of these detection values.
It is possible to monitor damage and contamination of parts between 0.35 and 0.35. Furthermore, monitoring may be performed based on the difference between the detected values, without taking the ratio of the detected values.
また、上記実施例では、30分から1時間毎にオ
フラインでモニタリングする場合について説明し
たが、駆動機構30を高速で制御し、レーザ光を
パルス制御することによりオンラインでモニタリ
ングすることもできる。 Further, in the above embodiment, a case has been described in which offline monitoring is performed every 30 minutes to one hour, but online monitoring can also be performed by controlling the drive mechanism 30 at high speed and controlling the laser beam in pulses.
また、レーザ出力値がレーザ発振器から得られ
る場合には、検出センサ35が不用であることは
いうまでもない。 Furthermore, it goes without saying that the detection sensor 35 is unnecessary when the laser output value is obtained from a laser oscillator.
以上のように、この発明によれば、真空チヤン
バ、この真空チヤンバ内に配置される被照射物、
レーザ発振器からのレーザ光を被照射物に導く光
学系、レーザ光による被照射物の蒸発粒子が蒸着
される位置に配置される基板、レーザ発振器から
出射され真空チヤンバに入射する前のレーザ光の
強度を検出する第1検出センサ、真空チヤンバ内
に導かれたレーザ光の強度を検出する第2検出セ
ンサを備えたことにより、第1,第2検出センサ
間に配置された光学部品などのレーザ光吸収率を
知り、このレーザ光吸収率から光学部品などの汚
染・劣化の状態をモニタリングでき、光学部品の
破損を防止し、寿命の長い光学部品を有するレー
ザ蒸着装置が得られる効果がある。
As described above, according to the present invention, a vacuum chamber, an irradiated object placed in the vacuum chamber,
An optical system that guides the laser beam from the laser oscillator to the object to be irradiated, a substrate that is placed at a position where vaporized particles of the object to be irradiated by the laser beam are deposited, and an optical system that guides the laser beam from the laser oscillator to the object to be irradiated; By providing a first detection sensor that detects the intensity of the laser beam and a second detection sensor that detects the intensity of the laser beam guided into the vacuum chamber, laser light such as an optical component placed between the first and second detection sensors is provided. By knowing the light absorption rate, it is possible to monitor the state of contamination and deterioration of optical components etc. from this laser light absorption rate, preventing damage to the optical components, and providing a laser vapor deposition apparatus having optical components with a long life.
第1図はこの発明の一実施例によるレーザ蒸着
装置を示す構成図、第2図は従来のレーザ蒸着装
置を示す構成図である。
1……レーザ光、2……第1平面鏡、3……集
光レンズ、4……透過窓、5……真空チヤンバ、
6……第2平面鏡、7……被照射物、8……基
板、20……第2検出センサ、35……第1検出
センサ。(第1平面鏡2、集光レンズ3、透過窓
4、第2平面鏡6で光学系を構成する。)なお、
図中、同一符号は同一、又は相当部分を示す。
FIG. 1 is a block diagram showing a laser vapor deposition apparatus according to an embodiment of the present invention, and FIG. 2 is a block diagram showing a conventional laser vapor deposition apparatus. 1... Laser light, 2... First plane mirror, 3... Condensing lens, 4... Transmission window, 5... Vacuum chamber,
6... Second plane mirror, 7... Irradiated object, 8... Substrate, 20... Second detection sensor, 35... First detection sensor. (The first plane mirror 2, condensing lens 3, transmission window 4, and second plane mirror 6 constitute an optical system.)
In the figures, the same reference numerals indicate the same or corresponding parts.
Claims (1)
れる被照射物、レーザ発振器からのレーザ光を上
記被照射物に導く光学系、レーザ光による上記被
照射物の蒸発粒子が蒸着される位置に配置される
基板、上記レーザ発振器から出射され上記真空チ
ヤンバに入射する前のレーザ光の強度を検出する
第1検出センサ、上記真空チヤンバ内に導かれた
レーザ光の強度を検出する第2検出センサを備え
たレーザ蒸着装置。1 a vacuum chamber, an object to be irradiated placed in the vacuum chamber, an optical system that guides a laser beam from a laser oscillator to the object to be irradiated, and a vacuum chamber arranged at a position where evaporated particles of the object to be irradiated by the laser beam are deposited. a first detection sensor that detects the intensity of the laser beam emitted from the laser oscillator and before it enters the vacuum chamber, and a second detection sensor that detects the intensity of the laser beam guided into the vacuum chamber. Laser deposition equipment.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP30297286A JPS63157861A (en) | 1986-12-19 | 1986-12-19 | Vapor deposition apparatus by laser |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP30297286A JPS63157861A (en) | 1986-12-19 | 1986-12-19 | Vapor deposition apparatus by laser |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS63157861A JPS63157861A (en) | 1988-06-30 |
| JPH0541700B2 true JPH0541700B2 (en) | 1993-06-24 |
Family
ID=17915379
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP30297286A Granted JPS63157861A (en) | 1986-12-19 | 1986-12-19 | Vapor deposition apparatus by laser |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS63157861A (en) |
-
1986
- 1986-12-19 JP JP30297286A patent/JPS63157861A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS63157861A (en) | 1988-06-30 |
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