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JPH0553752B2 - - Google Patents
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JPH0553752B2 - - Google Patents

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Publication number
JPH0553752B2
JPH0553752B2 JP63261749A JP26174988A JPH0553752B2 JP H0553752 B2 JPH0553752 B2 JP H0553752B2 JP 63261749 A JP63261749 A JP 63261749A JP 26174988 A JP26174988 A JP 26174988A JP H0553752 B2 JPH0553752 B2 JP H0553752B2
Authority
JP
Japan
Prior art keywords
setter
silicon carbide
sintered body
resistance
weight
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP63261749A
Other languages
Japanese (ja)
Other versions
JPH02111662A (en
Inventor
Hisashi Kinugasa
Yutaka Shuzo
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Pillar Packing Co Ltd
Original Assignee
Nippon Pillar Packing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Pillar Packing Co Ltd filed Critical Nippon Pillar Packing Co Ltd
Priority to JP63261749A priority Critical patent/JPH02111662A/en
Publication of JPH02111662A publication Critical patent/JPH02111662A/en
Publication of JPH0553752B2 publication Critical patent/JPH0553752B2/ja
Granted legal-status Critical Current

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  • Porous Artificial Stone Or Porous Ceramic Products (AREA)
  • Furnace Charging Or Discharging (AREA)

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、セラミツクス焼成処理や金属熱処理
を行う場合に使用される棚板等の熱処理用セツタ
ーに関するものである。
DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a setter for heat treatment such as shelf boards used when performing ceramic firing treatment or metal heat treatment.

〔従来の技術〕[Conventional technology]

従来のこの種熱処理用セツターとしては、アル
ミナ質、ムライト質等の酸化物焼結体からなるも
の(以下「第1従来セツター」という)、セラミ
ツクフアイバー質のもの(以下「第2従来セツタ
ー」という)及び炭化ケイ素質のものが知られて
いる。かかる炭化ケイ素質のものとしては、再結
晶質のもの(以下「第3従来セツター」という)、
ケイ酸塩等の酸化物結合のもの(以下「第4従来
セツター」という)、Si3N4で結合したもの(以
下「第5従来セツター」という)がある。
Conventional setters for heat treatment of this type include those made of sintered oxides such as alumina and mullite (hereinafter referred to as "first conventional setter"), and those made of ceramic fiber (hereinafter referred to as "second conventional setter"). ) and silicon carbide are known. Such silicon carbide materials include recrystallized materials (hereinafter referred to as "third conventional setter");
There are those bonded with oxides such as silicate (hereinafter referred to as "fourth conventional setter") and those bonded with Si 3 N 4 (hereinafter referred to as "fifth conventional setter").

〔発明が解決しようとする課題〕 しかし、第1従来セツターは、高密度のもので
あるため、熱容量が大きく被焼成物に対する熱効
率が劣る。また、高温加熱によつて熱収縮やクリ
ープが発生し易い。しかも、耐スポーリング性に
劣るため、急加熱、急冷却が困難で、焼成サイク
ルの短縮化を図り難い。また、高密度の重量物で
あるため、取扱性、作業性に劣る。
[Problems to be Solved by the Invention] However, since the first conventional setter has a high density, it has a large heat capacity and is inferior in thermal efficiency to the object to be fired. Further, thermal shrinkage and creep are likely to occur due to high temperature heating. Moreover, since it has poor spalling resistance, it is difficult to rapidly heat and cool it, and it is difficult to shorten the firing cycle. In addition, since it is a heavy object with high density, it is inferior in handling and workability.

第2従来セツターは、耐スポーリング性の向
上、軽量化を図つたものであるが、強度的に劣る
ため、セツターとしては厚肉のものとなつてお
り、炉内空間でのセツター占有率が高まり、被焼
成物の処理量が少なくなる。
The second conventional setter is designed to improve spalling resistance and reduce weight, but because it is inferior in strength, it is a thick setter, and the setter occupies less space in the furnace. As a result, the amount of material to be fired decreases.

第3〜第5従来セツターは、耐熱性、耐スポー
リング性、高熱間強度等に優れたものであるが、
第3従来セツターは製造上高純化が可能なもので
あるものの極めて高価である。
The third to fifth conventional setters are excellent in heat resistance, spalling resistance, high hot strength, etc.
Although the third conventional setter can be manufactured with high purity, it is extremely expensive.

また、第4及び第5従来セツターは安価なもの
ではあるが、耐酸化性を重視して、構成粒子を粗
くし且つ高密度化(2.4〜2.6g/cm3)しているた
め、繰返しの耐スポーリング性に問題がある。ま
た、構成粒子が粗いため、強度が不足して軽薄化
が困難なものである。
In addition, although the fourth and fifth conventional setters are inexpensive, they emphasize oxidation resistance, making the constituent particles coarser and having a higher density (2.4 to 2.6 g/cm 3 ), so they can be used repeatedly. There is a problem with spalling resistance. Furthermore, since the constituent particles are coarse, the strength is insufficient and it is difficult to make it lighter and thinner.

本発明は、このような従来セツターにおける問
題をすべて解決し、耐酸化性、耐クリープ性、強
度に優れ、且つ軽量化、軽薄化を図りうる熱処理
用セツターを提供することを目的とするものであ
る。
The purpose of the present invention is to solve all of the problems with conventional setters, and to provide a setter for heat treatment that has excellent oxidation resistance, creep resistance, and strength, and can be made lighter and thinner. be.

〔課題を解決するための手段〕[Means to solve the problem]

この課題を解決した本発明の熱処理用セツター
は、粒径1μm以下のα型炭化ケイ素微粒子を20
重量%以上(より好ましくは50重量%以上)含有
し且つ残部が粒径1〜20μmのα型炭化ケイ素粗
粒子と5重量%以下の不可避不純物とである原料
粉を成形、焼成して得られる多孔質の炭化ケイ素
焼結体からなるものである。
The setter for heat treatment of the present invention, which solves this problem, uses 20% α-type silicon carbide fine particles with a particle size of 1 μm or less.
Obtained by molding and firing a raw material powder containing at least 50% by weight (more preferably at least 50% by weight), with the remainder being α-type silicon carbide coarse particles with a particle size of 1 to 20 μm and 5% or less by weight of unavoidable impurities. It is made of porous silicon carbide sintered body.

具体的には、セツターの主体をなす多孔質の炭
化ケイ素焼結体は、原料粉に適宜の成形助材を添
加して所望形状に成形した後、脱ワツクス処理を
行つた上で焼成することによつて得られる。本発
明のセツターは、この炭化ケイ素焼結体のみをも
つて構成するようにしてもよいし、この炭化ケイ
素焼結体を骨材としてセツターを構成するように
してもよい。例えば、炭化ケイ素焼結体の表面に
アルミナ被覆層を形成して、セツターを構成す
る。
Specifically, the porous silicon carbide sintered body that forms the main body of the setter is formed into a desired shape by adding appropriate shaping aids to the raw material powder, then subjected to wax removal treatment, and then fired. obtained by. The setter of the present invention may be constructed using only this silicon carbide sintered body, or the setter may be constructed using this silicon carbide sintered body as an aggregate. For example, a setter is constructed by forming an alumina coating layer on the surface of a silicon carbide sintered body.

原料粉としては、例えば、不二見研磨材社製の
研磨粉GC# 8000(平均粒径1μm)とGC# 4000(平
均粒径3μm)とを50重量%づつ混合させたもの
を使用する。かかる原料粉には、SiO2、カーボ
ン、Fe2O3等の不可避不純物が混在するが、かか
る不純物量は上述する如く5重量%以下とする。
As the raw material powder, for example, a mixture of 50% by weight of polishing powders GC#8000 (average particle size 1 μm) and GC#4000 (average particle size 3 μm) manufactured by Fujimi Abrasives Co., Ltd. is used. Such raw material powder contains unavoidable impurities such as SiO 2 , carbon, and Fe 2 O 3 , but the amount of such impurities is set to 5% by weight or less as described above.

成形助材としては、例えば、2重量%のPEG
及び1重量%のステアリン酸を溶解させたメタノ
ールを使用する。
As a molding aid, for example, 2% by weight of PEG
and methanol in which 1% by weight of stearic acid is dissolved.

焼成処理は、真空雰囲気、不活性雰囲気又は
CO、N2等の雰囲気下で行なわれるが、その焼成
温度は1600〜2200℃としておくことが好ましい。
The firing process is carried out in a vacuum atmosphere, inert atmosphere or
The firing is carried out in an atmosphere of CO, N2, etc., and the firing temperature is preferably 1600 to 2200°C.

上記の如くして得られる炭化ケイ素焼結体は、
密度1.6〜2.3g/cm3、気孔率30〜50%のものであ
り、500〜2500Kg/cm2の高抗析力を有するもので
あることが好ましい。また、この炭化ケイ素焼結
体は自己結合体であり、2〜20μmで低アスペク
ト比のSiC結晶組織と1〜5μmの微細な気孔とを
有するものであることが好ましい。
The silicon carbide sintered body obtained as above is
It is preferable that the material has a density of 1.6 to 2.3 g/cm 3 , a porosity of 30 to 50%, and a high anti-deposition strength of 500 to 2500 Kg/cm 2 . Moreover, this silicon carbide sintered body is a self-assembly body, and preferably has a SiC crystal structure with a low aspect ratio of 2 to 20 μm and fine pores of 1 to 5 μm.

〔作用〕[Effect]

粒径1μm以下の炭化ケイ素微粒子と粒径1〜
20μmの炭化ケイ素粗粒子とが混在することか
ら、成形段階での充填密度が高められ、粒子間の
接触度合が高まる。このため、焼成段階では、微
粒子間の焼結粒子成長及び粗粒子間の結合が促進
されることになる。この場合、結晶粒の接合によ
る表面エネルギーの緩和効果のみであり、収縮、
緻密化の駆動力を有していないため、粒間の気孔
は微細紅の状態で分散される。
Silicon carbide fine particles with a particle size of 1μm or less and particles with a particle size of 1~
Since silicon carbide coarse particles of 20 μm are mixed, the packing density at the molding stage is increased and the degree of contact between the particles is increased. Therefore, in the firing stage, sintered particle growth between fine particles and bonding between coarse particles are promoted. In this case, the only effect is the relaxation of surface energy due to bonding of crystal grains, and shrinkage and
Since it does not have a driving force for densification, the pores between grains are dispersed in a fine red state.

したがつて、炭化ケイ素焼結体は、極めて低密
度であるにも拘らず、高強度である。すなわち、
α型炭化ケイ素微粒子の粗成長による自己結合力
及び下記反応によつて生じる炭化ケイ素の自己結
合力によつて高強度化する。
Therefore, although the silicon carbide sintered body has extremely low density, it has high strength. That is,
High strength is achieved by the self-bonding force due to coarse growth of α-type silicon carbide fine particles and the self-bonding force of silicon carbide generated by the following reaction.

SiO2+SiC→2SiO↑+C SiO+2C→SiO+CO↑ また、この炭化ケイ素焼結体は、その自己結合
力と気孔の微細化によつて、耐熱性、耐酸化性、
耐クリープ性を著しく向上させ得る。
SiO 2 +SiC→2SiO↑+C SiO+2C→SiO+CO↑ Also, this silicon carbide sintered body has heat resistance, oxidation resistance,
Creep resistance can be significantly improved.

〔実施例〕〔Example〕

不二見研磨材社製の研磨粉GC# 8000(平均粒径
1μm)50重量%と同社製の研磨粉GC# 4000(平均
粒径3μm)50重量%とをボールミルに入れ、こ
の原料粉に2重量%のPEG及び1重量%のステ
アリン酸を溶解したメタノールを原料粉と同量
(100重量%)添加した上、これらを撹拌混合し
た。なお、原料粉における不可避不純物は5重量
%以下である。
Polishing powder GC#8000 (average particle size) manufactured by Fujimi Abrasives Co., Ltd.
1μm) and 50% by weight of the company's polishing powder GC# 4000 (average particle size 3μm) were placed in a ball mill, and methanol in which 2% by weight of PEG and 1% by weight of stearic acid were dissolved in this raw material powder was added. The same amount (100% by weight) as the raw material powder was added, and these were stirred and mixed. Note that the amount of unavoidable impurities in the raw material powder is 5% by weight or less.

次いで、このスラリーをスプレードライヤーに
より乾燥造粒した上、キヤビテイ寸法40mm×90mm
の金型を用いて成形圧力1000Kg/cm2で加圧成形し
て、3mm×40mm×90mmの成形体を得た。
Next, this slurry was dried and granulated using a spray dryer, and the cavity size was 40 mm x 90 mm.
Pressure molding was performed using a mold with a molding pressure of 1000 kg/cm 2 to obtain a molded product measuring 3 mm x 40 mm x 90 mm.

そして、この成形体を500℃の大気中で脱ワツ
クス処理した上、真空雰囲気とした焼成炉におい
て1700℃で1時間焼成して、多孔質の炭化ケイ素
焼結体つまり本発明に係るセツターを得た。こ
の炭化ケイ素焼結体は、密度2.00g/cm3のもので
あり、0.1%の収縮が認められた。また、その構
成粒子径は5〜15μmで、気孔径は1〜2μmであ
つた。
Then, this molded body was dewaxed in the air at 500°C, and then fired at 1700°C for 1 hour in a vacuum atmosphere firing furnace to obtain a porous silicon carbide sintered body, that is, a setter according to the present invention. Ta. This silicon carbide sintered body had a density of 2.00 g/cm 3 and a shrinkage of 0.1% was observed. Moreover, the constituent particle diameter was 5 to 15 μm, and the pore diameter was 1 to 2 μm.

また、比較例として、セツターと同一寸法の
セツター、、を得た。
In addition, as a comparative example, a setter having the same dimensions as the setter was obtained.

セツターは、原料粉を上記研磨粉GC# 8000
のみからなるものとした以外、上記実施例と同一
にして得られた炭化ケイ素焼結体である。この炭
化ケイ素焼結体は、密度1.98g/cm3のものであ
り、2.1%の収縮が認められた。また、その構成
粒子径は1〜2μmで、気孔径は1μm以下であつ
た。
Setter polishes the raw material powder above with GC#8000
This is a silicon carbide sintered body obtained in the same manner as in the above example except that it consisted of only This silicon carbide sintered body had a density of 1.98 g/cm 3 and a shrinkage of 2.1% was observed. Further, the constituent particle diameter was 1 to 2 μm, and the pore diameter was 1 μm or less.

セツターは、原料粉を上記研磨粉GC# 4000
のみからなるものとした以外、上記実施例と同一
にして得られた炭化ケイ素焼結体である。この炭
化ケイ素焼結体は、セツターと同一の密度2.00
g/cm3を有するものであるが、粒子間結合が極め
て弱く、曲げ強度も0.5〜3Kg/mm2程度であり、
明らかにセツターとして適しないものであつた。
Setter polishes the raw material powder above with GC#4000
This is a silicon carbide sintered body obtained in the same manner as in the above example except that it consisted of only This silicon carbide sintered body has a density of 2.00, which is the same as the setter.
g/cm 3 , but the interparticle bonds are extremely weak and the bending strength is about 0.5 to 3 Kg/mm 2 .
It was clearly not suitable as a setter.

セツターは、冒頭で述べた第4従来セツター
に相当する市販のセツターを上記各セツターと同
一寸法に切り出したものである。
The setter is obtained by cutting a commercially available setter corresponding to the fourth conventional setter mentioned at the beginning into the same size as each setter described above.

そして、各セツター、、の耐酸化性等に
ついて比較試験を行なつた。なお、セツターに
ついては、上述した如く明らかにセツター不適格
なものであるから、かかる試験は行なわないこと
とした。
Comparative tests were then conducted on the oxidation resistance, etc. of each setter. As for the setter, as mentioned above, it was clearly not suitable as a setter, so it was decided not to conduct such a test.

すなわち、各セツター、、を酸化炉内に
セツトして、時間当り500℃の昇温速度で1400℃
に加熱し、該温度に2時間保持した後、自然放冷
し、爾後かかる加熱、冷却を繰返し、各サイクル
毎に酸化増率等を測定した。
That is, each setter is set in an oxidation furnace and heated to 1400℃ at a heating rate of 500℃ per hour.
The sample was heated to a temperature of 100.degree. C., maintained at that temperature for 2 hours, allowed to cool naturally, and then the heating and cooling steps were repeated, and the oxidation increase rate and the like were measured for each cycle.

その結果、セツターについては、第1図に実
線で示す如く、3〜5サイクル経過までは、約10
%の酸化増が認められたが、30サイクル経過後も
クリープ、クラツク等の発生は全く認められず、
セツターとして極めて良好な結果を示すことが確
認された。
As a result, as for the setter, as shown by the solid line in Figure 1, the setter is about 10
% increase in oxidation was observed, but no creep, cracks, etc. were observed even after 30 cycles.
It was confirmed that it showed extremely good results as a setter.

また、セツターについては、第1図に破線で
示す如く、3サイクル経過後にクリープが生じ、
5サイクル経過後に割れが生じた。しかも、5サ
イルク後25%の酸化増が認められ、耐酸化性に劣
ることが判明した。ところで、セツターの如く
原料粉にSiC粗粒子を含有させない場合には、成
形段階での充填密度が低く、粒子間の接触度合い
が小さい。その結果、結晶粒の接合、粒子成長が
抑えられて、焼結体の構成粒子は小粒で表面積も
大きくなり、酸化に対する抵抗が小さくなる。な
お、かかる場合においても、焼成エネルギーを高
めると、粒子成長も促進され、耐酸化性も向上す
るが、エネルギーコストが高くなり欠点がある。
Regarding the setter, as shown by the broken line in Figure 1, creep occurs after 3 cycles.
Cracking occurred after 5 cycles. Furthermore, an increase in oxidation of 25% was observed after 5 cycles, indicating that the oxidation resistance was poor. By the way, when the raw material powder does not contain coarse SiC particles such as in a setter, the packing density at the molding stage is low and the degree of contact between particles is small. As a result, bonding of crystal grains and grain growth are suppressed, and the constituent particles of the sintered body become smaller and have a larger surface area, resulting in lower resistance to oxidation. In such a case, increasing the firing energy also promotes particle growth and improves oxidation resistance, but has the disadvantage of increasing energy cost.

また、セツターについては、第1図に鎖線で
示す如く、5サイクル経過後15%の酸化増とな
り、且つ表面が明らかにガラス状となつた。ま
た、30サイクル経過後にはクリープが発生した。
As for the setter, as shown by the chain line in FIG. 1, the oxidation increased by 15% after 5 cycles, and the surface clearly became glassy. In addition, creep occurred after 30 cycles.

なお、セツターについては、これを酸化炉内
にセツトし且つその上に100gの炭化ケイ素焼結
体を載せた状態で、上記したと同一条件で加熱、
冷却を繰返し行なつたところ、20サイクル経過後
も全くクリープせず、優れた耐クリープ性を示し
た。また、炭化ケイ素焼結体に対する熱効率も極
めて高いことが確認された。
Regarding the setter, it was set in an oxidation furnace and 100 g of silicon carbide sintered body was placed on it, and heated under the same conditions as above.
When cooling was repeated, no creep occurred even after 20 cycles, showing excellent creep resistance. It was also confirmed that the thermal efficiency of the silicon carbide sintered body was extremely high.

さらに、各セツター、、から3mm×4mm
×40mmを試験片を切り出して、各試験片について
熱間強度(曲げ強度)を測定したところ、第2図
に示す如き結果が得られた。すなわち、セツター
では17〜23Kg/mm2の高強度を示した(第2図実
線)。セツターではこれより若干低い値(15〜
20Kg/mm2)を示した(同図破線)が、セツター
では極めて低い値を示し(同図鎖線)、強度に劣
ることが判明した。
Furthermore, from each setter, 3mm x 4mm
When test pieces were cut out to a size of 40 mm and the hot strength (flexural strength) of each test piece was measured, the results shown in FIG. 2 were obtained. That is, the setter exhibited a high strength of 17 to 23 kg/mm 2 (solid line in Figure 2). In Setter, the value is slightly lower (15~
20Kg/mm 2 ) (dashed line in the same figure), but the setter showed an extremely low value (dashed line in the same figure), indicating that the strength was inferior.

〔発明の効果〕〔Effect of the invention〕

以上の説明から容易に理解されるように、本発
明の熱処理用セツターは、低密度、高気孔率、高
強度のもので軽量化、軽薄化、低価格化を図りう
るものであり、耐酸化性、耐クリープ性、耐スポ
ーリング性に優れたものである。したがつて、本
発明のセツターによれば、焼成炉の炉詰効率及び
熱効率を大幅に向上させ得て、焼成、熱処理を極
めて効率良く行なうことができる。
As can be easily understood from the above explanation, the setter for heat treatment of the present invention has low density, high porosity, and high strength, and can be made lighter, thinner, and lower in price. It has excellent hardness, creep resistance, and spalling resistance. Therefore, according to the setter of the present invention, the packing efficiency and thermal efficiency of the firing furnace can be greatly improved, and firing and heat treatment can be performed extremely efficiently.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は耐酸化性の試験結果を示すグラフであ
り、第2図は熱間強度の試験結果を示すグラフで
ある。
FIG. 1 is a graph showing the oxidation resistance test results, and FIG. 2 is a graph showing the hot strength test results.

【特許請求の範囲】[Claims]

1 窒化ケイ素を主成分とする成形体を一次焼結
し、次いで一次焼結よりも高温高圧下で二次焼結
する方法において、一次焼結を10気圧以下の窒素
雰囲気中温度1500〜1800℃で行い、一次焼結段階
での相対密度を88%以上とし二次焼結を10気圧を
超え、1800℃を超える温度で行うことを特徴とす
る窒化ケイ素焼結体の製造方法。
1. A method in which a molded body containing silicon nitride as a main component is primarily sintered and then secondary sintered at a higher temperature and pressure than the primary sintering, the primary sintering being performed at a temperature of 1500 to 1800°C in a nitrogen atmosphere of 10 atmospheres or less. A method for producing a silicon nitride sintered body, characterized in that the relative density in the primary sintering step is 88% or more, and the secondary sintering is performed at a temperature exceeding 1800°C at a pressure exceeding 10 atmospheres.

JP63261749A 1988-10-18 1988-10-18 Setter for heat treatment Granted JPH02111662A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP63261749A JPH02111662A (en) 1988-10-18 1988-10-18 Setter for heat treatment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP63261749A JPH02111662A (en) 1988-10-18 1988-10-18 Setter for heat treatment

Publications (2)

Publication Number Publication Date
JPH02111662A JPH02111662A (en) 1990-04-24
JPH0553752B2 true JPH0553752B2 (en) 1993-08-10

Family

ID=17366174

Family Applications (1)

Application Number Title Priority Date Filing Date
JP63261749A Granted JPH02111662A (en) 1988-10-18 1988-10-18 Setter for heat treatment

Country Status (1)

Country Link
JP (1) JPH02111662A (en)

Also Published As

Publication number Publication date
JPH02111662A (en) 1990-04-24

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