JPH0553866B2 - - Google Patents

Description

[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to a vapor deposition apparatus that evaporates a vapor deposition material using a light beam, and particularly relates to an evaporation source (a vapor deposition material).
This invention relates to a vapor deposition apparatus that prevents evaporated vapor from adhering to a window for introducing a light beam.

[Prior Art] In general, in vacuum evaporation, evaporated vapor from an evaporation source travels not only toward the substrate but also in all directions, so there is a problem that it adheres to observation windows, etc., making observation impossible. There is. For this reason, attempts have been made to reduce the amount of adhesion by installing a shutter in the viewing window and opening the shutter only when observing. However, it is impossible to provide this type of shutter in a vapor deposition apparatus that introduces a light beam such as laser or lamp light through a window and evaporates the vapor deposition material with the energy of the light beam. During vapor deposition, vapor deposition adheres to the light beam introduction window, and as the film thickness increases, absorption of light energy and reflection loss increase. Also,
Because the vapor deposition film attached to the light beam introduction window absorbs light energy, the window locally becomes hot and breaks, which is a major problem in the practical application of vapor deposition equipment that uses light beams. I was getting used to it.

Recently, the following method has been proposed as a means to solve such problems (Japanese Patent Application Laid-Open No. 1983-1999).
No. 42770). FIG. 3 is a diagram for explaining this method, in which 31 is a vapor deposition container, 32 is a vapor deposition material, 3
3 is a sample substrate, 34 is an exhaust port, 35 is a laser oscillator, 36 is a laser beam, 37 is a laser beam 3
6 is a lens for condensing light, 38 is a slit, 3
9 is a window for introducing a light beam, and 40 is a gas inlet. In this method, a slit 38 is provided, gas is introduced from a gas inlet 39 to generate a gas flow between the slit 38 and the window 39, and this gas flow passes through the slit 38 and passes through the window. The purpose is to block the steam flow incident in 39 directions.

[Problems to be Solved by the Invention] However, this type of method has the following problems. That is, since the density of the steam heading toward the window 39 is high, it is difficult to prevent the steam flow only by the gas flow. Furthermore, if it is attempted to completely block the flow of steam, it is necessary to significantly increase the amount of gas introduced, leading to an increase in the amount of gas used.
Furthermore, since the pressure within the deposition container inevitably increases, there is a problem in that the capacity of the exhaust pump increases.

The present invention has been made to solve such problems, and its purpose is to reliably prevent evaporation vapor from the deposition source from adhering to the light introduction window, and to prevent the light beam from adhering to the light introduction window. An object of the present invention is to provide a vapor deposition apparatus that can contribute to the practical application of vapor deposition using the present invention.

[Means for Solving the Problems] The gist of the present invention is to provide a protective tube connected to the window in the light beam introduction path in order to prevent vapor deposition substances from adhering to the window, and to introduce gas into the protective tube from the window side. It is to flow.

That is, the present invention provides a vapor deposition apparatus that places a vapor deposition material and a sample in a container, irradiates the vapor deposition material with a light beam introduced into the container through a window, and forms a vapor deposited film on the sample by evaporating the material. ,
a reflecting mirror arranged in the container to reflect the light beam introduced into the container and irradiate the reflected beam onto the vapor deposition material; and a reflecting mirror surrounding the path of the light beam from the window to the reflecting mirror. A protective tube is provided with a slit through which the light beam passes near the reflecting mirror, and a gas is introduced into the vicinity of the window of the protective tube, and the gas is introduced from the window in the direction of the slit ( A means for causing gas to flow in the direction of the reflecting mirror) is provided.

[Operation] With the above structure, the evaporated substance that reaches the light beam introduction window needs to pass through the slit and further advance against the flow of gas in the protection tube.
Therefore, the amount of evaporated substances reaching the window is extremely small.

[Effects of the Invention] Therefore, according to the present invention, it is possible to reliably prevent deposition material from adhering to the light beam introduction window without increasing the amount of gas flowing into the protective tube. Therefore, it is extremely effective for practical application of a vapor deposition apparatus using a light beam.

[Examples] Hereinafter, details of the present invention will be explained with reference to illustrated examples.

FIG. 1 is a schematic configuration diagram showing one embodiment of the present invention, in which 11 is a vapor deposition container, 12 is a vapor deposition material (evaporation source), 13 is a sample substrate, 14 is an exhaust port, 15 is a laser oscillator, and 16 is a laser beam. 17 is a concave reflecting mirror, 18 is a protection tube, 18' is a slit provided at the end of the protection tube 18, 19 is a laser beam introduction window,
20 indicates a gas inlet.

The operation of this embodiment is as follows. Laser beam 16 emitted from laser oscillator 15
The light beam passes through the introduction window 19 into the deposition container 11.
After being guided into the interior and condensed by the concave mirror 17,
The vapor deposition material 12 is irradiated. The vapor deposition material 12 is evaporated by this light irradiation, and the evaporated vapor is deposited on the substrate 13 to form a vapor deposition film. At this time, in order for the evaporated steam to reach the window 19, the slit 18'
However, due to the geometry, very little steam passes through the slit 18'. Moreover, protection tube 1
Inside the window 8, there is a gas flow in the opposite direction to the direction in which the steam travels, so the probability that the steam will reach the window 19 is extremely low, and from an industrial perspective, it can be said that there is no problem at all with the window 19 becoming dirty.

On the other hand, some of the steam reaches the reflecting mirror 17,
A slit 18' is provided in the area to be irradiated with the laser beam.
The more outflow gas is blown, it is possible to prevent vapor deposition. This reflecting mirror 17
For example, for CO ₂ laser (wavelength 10.6 μm), a glass substrate coated with Au or Cu or a metal material (e.g. Cu, A) is used. It is possible, but
Unlike the window 19, the reflector 17 can be cooled with water, so even if a small amount of steam adheres to it and generates heat, it will not be damaged and can withstand long-term use.

As described above, according to this embodiment, it is possible to reliably prevent evaporated vapor from adhering to the light beam introduction window 19. Moreover, the amount of gas flowing into the protection space 18 can be reduced. Therefore, it is extremely effective for practical application of a vapor deposition apparatus using a light beam.

FIG. 2 is a diagram showing another embodiment of the present invention.
The same parts as in Fig. 1 are given the same reference numerals.
A detailed explanation thereof will be omitted. 17' is a flat reflector;
Reference numeral 21 indicates a lens for condensing laser light.
This embodiment differs from the previously described embodiments in the following points:
Instead of the concave reflecting mirror 17, a lens 21 is used to focus the light beam.

In this embodiment, as in the previous embodiment, no evaporated vapor is seen adhering to the window 19 or the reflecting mirror 17'; however, in this embodiment, the light is focused by the lens 21; The reflecting mirror 17' may be a plane mirror,
Furthermore, since the slit 18' can be made smaller, the pressure of the gas blown onto the reflecting mirror 17' can be increased, and it is possible to further reduce the adhesion of vapor on the reflecting mirror 17'.

It should be noted that the present invention is not limited to the above-mentioned embodiments, and may be modified without departing from the scope of the invention.
Various modifications can be made. For example, the light irradiated onto the vapor deposition material is not limited to laser light, but may be any light that can sufficiently heat the vapor deposition material. Further, the amount of gas flowing into the protective tube may be appropriately determined depending on conditions such as the length of the protective tube and the pressure inside the vapor deposition container.

[Brief explanation of drawings]

FIG. 1 is a schematic diagram showing a vapor deposition apparatus according to one embodiment of the present invention, FIG. 2 is a schematic diagram showing another embodiment, and FIG. 3 is a schematic diagram showing a conventional apparatus. 11... Evaporation container, 12... Vapor deposition material, 13...
... Sample substrate, 14 ... Exhaust port, 15 ... Laser oscillator, 16 ... Laser beam, 17 ... Concave reflecting mirror, 17' ... Plane reflecting mirror, 18 ... Protection tube, 1
8'...Slit, 19...Light beam introduction window, 2
0... Gas inlet, 21... Lens.

Claims (1)

[Claims] 1. In a vapor deposition apparatus that places a vapor deposition material and a sample in a container, and irradiates the vapor deposition material with a light beam introduced into the container through a window to evaporate the material to form a vapor deposited film on the sample, a reflecting mirror disposed in the container that reflects the light beam introduced into the container and irradiates the reflected beam onto the vapor deposition material; and a reflecting mirror arranged to surround the path of the light beam from the window to the reflecting mirror. and a protective tube provided with a slit through which the light beam passes near the reflecting mirror, and introducing gas into the vicinity of the window of this protective tube, and causing the gas to flow from the window in the direction of the slit within the protective tube. A vapor deposition apparatus comprising: means.