JPH0555566B2 - - Google Patents
Info
- Publication number
- JPH0555566B2 JPH0555566B2 JP59048145A JP4814584A JPH0555566B2 JP H0555566 B2 JPH0555566 B2 JP H0555566B2 JP 59048145 A JP59048145 A JP 59048145A JP 4814584 A JP4814584 A JP 4814584A JP H0555566 B2 JPH0555566 B2 JP H0555566B2
- Authority
- JP
- Japan
- Prior art keywords
- annealing
- shadow mask
- manufacturing
- oxide film
- metal plate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000000137 annealing Methods 0.000 claims description 28
- 238000000034 method Methods 0.000 claims description 9
- 238000004519 manufacturing process Methods 0.000 claims description 8
- 229910052751 metal Inorganic materials 0.000 claims description 5
- 239000002184 metal Substances 0.000 claims description 5
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 4
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 4
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 4
- 238000001816 cooling Methods 0.000 claims description 3
- 229910052742 iron Inorganic materials 0.000 claims description 2
- 229910052759 nickel Inorganic materials 0.000 claims description 2
- 238000005553 drilling Methods 0.000 claims 1
- 229910001030 Iron–nickel alloy Inorganic materials 0.000 description 12
- 239000000463 material Substances 0.000 description 8
- 229910001209 Low-carbon steel Inorganic materials 0.000 description 7
- 229910045601 alloy Inorganic materials 0.000 description 7
- 239000000956 alloy Substances 0.000 description 7
- 239000013078 crystal Substances 0.000 description 7
- 230000006866 deterioration Effects 0.000 description 6
- 230000005855 radiation Effects 0.000 description 5
- 229910052782 aluminium Inorganic materials 0.000 description 4
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 4
- 238000005260 corrosion Methods 0.000 description 4
- 230000007797 corrosion Effects 0.000 description 4
- 238000010894 electron beam technology Methods 0.000 description 4
- 239000012535 impurity Substances 0.000 description 4
- 230000007423 decrease Effects 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 229910052739 hydrogen Inorganic materials 0.000 description 3
- 239000001257 hydrogen Substances 0.000 description 3
- 239000010410 layer Substances 0.000 description 3
- 229910003271 Ni-Fe Inorganic materials 0.000 description 2
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000011109 contamination Methods 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 229910000975 Carbon steel Inorganic materials 0.000 description 1
- 229910000655 Killed steel Inorganic materials 0.000 description 1
- 229910000990 Ni alloy Inorganic materials 0.000 description 1
- 229910001327 Rimmed steel Inorganic materials 0.000 description 1
- 239000010962 carbon steel Substances 0.000 description 1
- 239000012141 concentrate Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- UGKDIUIOSMUOAW-UHFFFAOYSA-N iron nickel Chemical compound [Fe].[Ni] UGKDIUIOSMUOAW-UHFFFAOYSA-N 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C21—METALLURGY OF IRON
- C21D—MODIFYING THE PHYSICAL STRUCTURE OF FERROUS METALS; GENERAL DEVICES FOR HEAT TREATMENT OF FERROUS OR NON-FERROUS METALS OR ALLOYS; MAKING METAL MALLEABLE, e.g. BY DECARBURISATION OR TEMPERING
- C21D6/00—Heat treatment of ferrous alloys
- C21D6/001—Heat treatment of ferrous alloys containing Ni
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
- H01J9/02—Manufacture of electrodes or electrode systems
- H01J9/14—Manufacture of electrodes or electrode systems of non-emitting electrodes
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Thermal Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Mechanical Engineering (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Heat Treatment Of Articles (AREA)
- Electrodes For Cathode-Ray Tubes (AREA)
Description
〔発明の技術分野〕
本発明はカラー受像管用シヤドウマスクの製造
法に係り、特にその素材が鉄−ニツケル合金の場
合の焼鈍法に関するものである。
〔発明の技術的背景及びその問題点〕
カラー受像管用シヤドウマスクの素材には一般
にリムド鋼又はアルミキルド鋼などの高純度の低
炭素鋼板が用いられているが、これは素材の供給
能力、コスト、加工性、強度などにより総合的に
決められたものである。しかし乍らその最大の欠
点は熱膨張係数が大きい(0〜100℃、約12×
10-6/℃)ことである。通常のシヤドウマスクの
電子ビーム通過率は15〜25%で多くの電子ビーム
がシヤドウマスクに衝突し、シヤドウマスク自体
の温度が30〜80℃に上昇する。この結果シヤドウ
マスクは熱変形を起し螢光面に対向する曲面の曲
率が崩れることによりピユリテイードリフト
(PD)と呼ばれる色純度の劣化を引起す。マスク
孔ピツチの粗い一般のカラー受像管は螢光体層と
電子ビームとの幾何学的な位置関係のずれに対す
る余裕度(以下ガードバンド量と称す)が大き
く、シヤドウマスクがある量熱変形を起しても色
純度の劣化が起りにくい。しかし乍ら文字や図形
の表示装置としての高精細度カラー受像管や、一
般民生管では画面の平坦性を向上させ且つ文字放
送に対応させ細かなピツチを有したカラー受像管
の場合、上記余裕度は必らずしも充分ではない。
即ち高精細度カラー受像管の場合、孔ピツチが細
かなため孔寸法も小さく(例えば0.3mmピツチで
は140μ、0.2mmピツチでは85μ)必然的にガードバ
ンド量が少なく、且つ通常のフオトエツチングに
て孔寸法の小さなものを得ようとした場合マスク
板厚を薄くしなければならぬため熱容量が減少
し、一定条件下における熱膨張量が板厚の厚いも
のに比較し多くなり色純度が劣化し易い問題点を
有する。一方画面の平坦性を向上させたカラー受
像管の場合、マスクの曲率半径が一般管に比較し
大きいので、同じ量マスクが同じ量の熱膨張を起
してもマスク孔を通過した電子ビームの目的とす
る螢光体層への射突位置ずれ量が多く、且つピツ
チの細かな分ガードバンド量も少なく色純度が劣
化し易い問題点を有する。これを解決するために
種々の方法が検討されているが、特公昭42−
25446号公報、特開昭50−58977号公報、特開昭50
−68650号公報に示されているように熱膨張係数
の小さな鉄−ニツケル合金例えば36%Ni−Feア
ンバー合金(0〜100℃、約0〜2.0×10-6/℃)
又は42%Ni−Fe合金(0〜100℃、約5.0×
10-6/℃)を素材として使用するシヤドウマスク
が提案されているが未だ実用条件を満足するに到
つていない。この原因の一つとして鉄−ニツケル
合金からなるマスクの加工の困難さが挙げられ
る。シヤドウマスクの曲面は高精度が要求され、
1000mmの曲率半径(R)に対し許容公差は±5mmと非
常に厳しいしのである。しかし乍ら鉄−ニツケル
合金は従来の鉄を主成分とするものに比べ同様の
焼鈍を施しても機械的強度が高くプレス等による
球面成形性が劣る欠点を有している。例えば第1
図に示すように厚さ0.2mmの鉄−ニツケルマスク
を球面成形し標準Rに対して局部的な凹みを生じ
た場合、この凹み量(d)は20μm以下であれば実質
的に色純度の劣化は許容し得る。この凹み量をシ
ヤドウマスク素材の降伏点強度について、例えば
14吋型シヤドウマスクの場合第2図に示す特性を
示す。即ち凹み量を20μm以下とするためには降
伏点強度を20Kg/mm2以下に抑える必要がある。し
かし乍ら鉄−ニツケル系合金を素材とするシヤド
ウマスクを従来のアルミキルド低炭素鋼を素材と
するシヤドウマスクと同様の水素雰囲気における
アニール炉で焼鈍した場合、得られる降伏点強度
は第3図に示すように、アルミキルド低炭素鋼の
特性aに比較し鉄−ニツケル合金の特性bは非常
に高い。即ち900℃もの高温で焼鈍しても降伏点
強度は29〜30Kg/mm2までしか低下しない。尚、第
2図において、鉄−ニツケル合金の降伏点強度は
炭素鋼に特有の降伏現象を呈しないため、0.2%
伸びた時の引張強度にて代用している。このよう
に鉄−ニツケル系合金を素材とするシヤドウマス
クは特に有効部周辺部の変形と凹みが大きいた
め、変形による色純度劣化が大きな問題となる。
一方管内に組込まれるシヤドウマスクは耐蝕性及
び熱輻射性を向上させるため、プレス成形にて目
的とする曲面を得た後マスク表面に黒色酸化膜層
を形成する。しかし鉄−ニツケル合金は耐蝕性の
良いニツケルが含まれているため、アルミキルド
低炭素鋼に比較し黒色酸化膜を形成しにくい。こ
の結果マスクからの熱輻射が悪くなり、且つ熱伝
導率がアルミキルド低炭素鋼に比べて小さなこと
もあいまつて熱がこもり易い。同一映像条件下に
おけるマスク温度は、低炭素鋼を使用したマスク
に比べて高くなり易いため熱膨張量も目的とした
値より多くなり熱輻射の良好な黒色酸化膜を形成
しなければ低熱膨張という素材の長所が生かされ
ず熱変形による色純度劣化が問題になる。
〔発明の目的〕
本発明は鉄−ニツケル合金よりなるシヤドウマ
スクのプレス成形性が良く、且つ耐蝕性及び熱輻
性の優れた黒色酸化膜の形成が容易なシヤドウマ
スクの製造方法を提供するもので、最終的には画
面のホワイトユニフオーミテイ(WU)品位が良
く、PD問題のないカラー受像管を提供すること
を目的とする。
〔発明の概要〕
本発明は、鉄−ニツケル合金よりなるシヤドウ
マスクのプレス成形前の焼鈍を真空中で行ない、
焼鈍後の冷却を還元雰囲気中の炉内で行なうこと
によつて、シヤドウマスクの降伏点強度を低下せ
しめてプレス成形時の変形量を抑制すると同時
に、シヤドウマスク表面のステンレス化を抑制し
良好な酸化膜の成長を得るものである。
〔発明の実施例〕
鉄−ニツケル合金を主成分とするシヤドウマス
ク用素材としてアンバー合金を用いた実施例に関
し以下説明する。第1表にアンバー合金とアルミ
キルド低炭素鋼の素材組成を示す。
[Technical Field of the Invention] The present invention relates to a method for manufacturing a shadow mask for a color picture tube, and particularly to an annealing method when the material is an iron-nickel alloy. [Technical background of the invention and its problems] High-purity, low-carbon steel plates such as rimmed steel or aluminum-killed steel are generally used as materials for shadow masks for color picture tubes, but this is limited by material supply capacity, cost, and processing. It is determined comprehensively based on characteristics, strength, etc. However, its biggest drawback is its large coefficient of thermal expansion (0 to 100℃, approximately 12×
10 -6 /℃). The electron beam passage rate of a typical shadow mask is 15 to 25%, and many electron beams collide with the shadow mask, raising the temperature of the shadow mask itself to 30 to 80 degrees Celsius. As a result, the shadow mask undergoes thermal deformation and the curvature of the curved surface facing the fluorescent surface collapses, causing a deterioration in color purity called purity drift (PD). A general color picture tube with a rough mask hole pitch has a large margin for deviations in the geometric positional relationship between the phosphor layer and the electron beam (hereinafter referred to as the guard band amount), and the shadow mask is subject to thermal deformation to a certain extent. However, deterioration of color purity is less likely to occur. However, in the case of high-definition color picture tubes used as display devices for characters and graphics, and color picture tubes for general consumer use that have improved screen flatness and have a finer pitch to accommodate teletext broadcasting, the above margin is required. Degree is not always sufficient.
In other words, in the case of high-definition color picture tubes, the hole size is small (for example, 140μ for 0.3mm pitch, 85μ for 0.2mm pitch) because the hole pitch is small (for example, 140μ for 0.3mm pitch, 85μ for 0.2mm pitch). When trying to obtain a mask with small hole dimensions, the mask plate thickness must be made thinner, resulting in a decrease in heat capacity, and the amount of thermal expansion under certain conditions is greater than in a thicker plate, resulting in a deterioration of color purity. There are some easy problems. On the other hand, in the case of a color picture tube with improved screen flatness, the radius of curvature of the mask is larger than that of a regular tube, so even if the same amount of mask undergoes the same amount of thermal expansion, the electron beam passing through the mask hole will The problem is that there is a large amount of deviation in the position of the target phosphor layer, and the amount of the guard band is also small due to the small pitch, so that color purity tends to deteriorate. Various methods are being considered to solve this problem, but the
Publication No. 25446, Japanese Patent Application Laid-Open No. 1983-58977, Japanese Patent Application Publication No. 1973
Iron-nickel alloy with a small coefficient of thermal expansion, such as 36% Ni-Fe amber alloy (0 to 100°C, approximately 0 to 2.0×10 -6 /°C) as shown in Publication No. 68650
Or 42% Ni-Fe alloy (0~100℃, approx. 5.0×
10 -6 /℃) has been proposed as a material, but it has not yet reached the point where it satisfies practical conditions. One of the reasons for this is the difficulty in processing masks made of iron-nickel alloy. The curved surface of the shadow mask requires high precision,
For a radius of curvature (R) of 1000mm, the allowable tolerance is ±5mm, which is extremely strict. However, iron-nickel alloys have the disadvantage that, compared to conventional alloys whose main component is iron, they have high mechanical strength and poor spherical formability by pressing etc. even when subjected to similar annealing. For example, the first
As shown in the figure, when an iron-nickel mask with a thickness of 0.2 mm is molded into a spherical surface and a local dent is created with respect to the standard radius, if the amount of dent (d) is less than 20 μm, it will substantially affect the color purity. Deterioration is acceptable. This amount of depression can be calculated as the yield point strength of the shadow mask material, for example.
A 14-inch shadow mask exhibits the characteristics shown in Figure 2. That is, in order to make the amount of depression 20 μm or less, it is necessary to suppress the yield point strength to 20 Kg/mm 2 or less. However, when a shadow mask made of an iron-nickel alloy is annealed in an annealing furnace in the same hydrogen atmosphere as a conventional shadow mask made of aluminum-killed low carbon steel, the yield point strength obtained is as shown in Figure 3. Furthermore, property b of the iron-nickel alloy is much higher than property a of aluminum killed low carbon steel. That is, even when annealed at a high temperature of 900°C, the yield point strength decreases only to 29 to 30 kg/mm 2 . In addition, in Figure 2, the yield point strength of the iron-nickel alloy is 0.2% because it does not exhibit the yield phenomenon peculiar to carbon steel.
The tensile strength when stretched is used as a substitute. As described above, a shadow mask made of an iron-nickel alloy has large deformations and dents, especially around the effective area, so deterioration of color purity due to deformation becomes a major problem.
On the other hand, in order to improve the corrosion resistance and heat radiation of the shadow mask incorporated into the tube, a black oxide film layer is formed on the mask surface after obtaining the desired curved surface by press molding. However, since iron-nickel alloy contains nickel, which has good corrosion resistance, it is less likely to form a black oxide film than aluminum killed low carbon steel. As a result, heat radiation from the mask deteriorates, and combined with the fact that the thermal conductivity is lower than that of aluminum killed low carbon steel, heat tends to accumulate. The temperature of the mask under the same imaging conditions tends to be higher than that of a mask made of low carbon steel, so the amount of thermal expansion will be higher than the desired value, and unless a black oxide film with good heat radiation is formed, it will be called low thermal expansion. The advantages of the material are not utilized, and color purity deterioration due to thermal deformation becomes a problem. [Object of the Invention] The present invention provides a method for manufacturing a shadow mask made of an iron-nickel alloy, which has good press formability, and facilitates the formation of a black oxide film with excellent corrosion resistance and thermal radiation resistance. The ultimate goal is to provide a color picture tube with good screen white uniformity (WU) quality and no PD problems. [Summary of the Invention] The present invention involves annealing a shadow mask made of an iron-nickel alloy in a vacuum before press forming.
By performing cooling after annealing in a furnace in a reducing atmosphere, the yield point strength of the shadow mask is lowered and the amount of deformation during press forming is suppressed, and at the same time, the formation of stainless steel on the surface of the shadow mask is suppressed and a good oxide film is created. growth. [Embodiments of the Invention] Examples in which an amber alloy is used as a material for a shadow mask whose main component is an iron-nickel alloy will be described below. Table 1 shows the material compositions of the amber alloy and aluminum killed low carbon steel.
【表】
上記組成の36Niアンバー合金を素材とするシ
ヤドウマスクに関し、水素雰囲気(露点10℃)の
アニール炉を使用し焼鈍温度を上げた時の降伏点
強度を第4図に示す。第4図から明らかな如く、
1200℃の高温で焼鈍しても降伏点強度は24Kg/mm2
までしか低下しない。従つて降伏点強度を成形性
に問題のない20Kg/mm2以下にするには第4図から
外挿して焼鈍温度を1500〜1700℃とする必要があ
る。しかしアンバー合金の融点が1440〜1450℃で
あることを考えると実行不可能である。
本発明者らは特開昭59−27433号公報に示され
ているように焼鈍による金属板の結晶組織を観察
した結果、水素焼鈍処理の場合には断面の結晶粒
が焼鈍温度の上昇に伴いよく成長するのに反し、
表面の結晶粒の成長がごくわずかであることを見
出した。この表面結晶粒の成長不足は降伏点強度
と関連があり、断面と同様の結晶成長を施すこと
ができるなら降伏点強度は20Kg/mm2に近づくと考
えた。この為には表面の結晶粒界に濃化する不純
物で特に蒸気圧の高いMn、P、S等を結晶粒界
より蒸発させることにより表面結晶粒の成長を促
進できると推定し真空中での焼鈍を実施した。真
空度は10-2Torr、温度は900〜1200℃で夫々10分
間の焼鈍を行つた。この結果第5図に示すよう
に、20Kg/mm2以下の降伏点強度が1000℃以上の焼
鈍温度にて得られた。また表面の結晶粒の成長は
内部と差がなく、厚さ1/20以下の表面層の不純物
の分析結果を示す第2表からも判る如く、Mn、
P及びS等の不純物が大幅に減少している。上記
真空焼鈍時の真空度は10-2Torrで行つたが、焼
鈍時間を更に長くとることで真空焼鈍時の真空度
を10-1Torrまで低下させることができる。結晶
粒の成長は結晶粒界の汚染状態によつて変化し、
汚染されているとその成長が阻害される。これを
真空状態の雰囲気で焼鈍することにより、濃化し
た不純物は表面から抜け出して除去される。この
速度は雰囲気温度は勿論のこと真空度に依存する
が、そのとき必要な真空度は10-1Torr以下であ
ることがわかつた。[Table] Figure 4 shows the yield point strength of a shadow mask made of 36Ni amber alloy with the above composition when the annealing temperature is increased using an annealing furnace in a hydrogen atmosphere (dew point 10°C). As is clear from Figure 4,
Even when annealed at a high temperature of 1200℃, the yield point strength is 24Kg/mm 2
It only decreases to. Therefore, in order to set the yield point strength to 20 Kg/mm 2 or less without causing problems in formability, it is necessary to extrapolate from FIG. 4 and set the annealing temperature to 1500 to 1700°C. However, considering that the melting point of the amber alloy is 1440-1450°C, this is not practicable. The present inventors observed the crystal structure of a metal plate after annealing as shown in JP-A No. 59-27433, and found that in the case of hydrogen annealing, the crystal grains in the cross section change as the annealing temperature increases. Although it grows well,
It was found that the growth of crystal grains on the surface was negligible. This insufficient growth of surface crystal grains is related to the yield point strength, and we thought that if the same crystal growth as in the cross section could be achieved, the yield point strength would approach 20 Kg/mm 2 . For this purpose, it is assumed that the growth of surface grains can be promoted by evaporating impurities that concentrate at the surface grain boundaries, such as Mn, P, and S, which have particularly high vapor pressure, from the grain boundaries. Annealing was performed. Annealing was performed at a vacuum degree of 10 -2 Torr and a temperature of 900 to 1200°C for 10 minutes each. As a result, as shown in FIG. 5, a yield point strength of 20 kg/mm 2 or less was obtained at an annealing temperature of 1000° C. or higher. In addition, the growth of crystal grains on the surface is the same as that inside, and as can be seen from Table 2 showing the analysis results of impurities in the surface layer with a thickness of 1/20 or less, Mn,
Impurities such as P and S are significantly reduced. Although the degree of vacuum during the vacuum annealing was performed at 10 -2 Torr, the degree of vacuum during vacuum annealing can be lowered to 10 -1 Torr by increasing the annealing time. The growth of crystal grains changes depending on the contamination state of the grain boundaries.
Contamination inhibits its growth. By annealing this in a vacuum atmosphere, the concentrated impurities escape from the surface and are removed. This speed depends on the degree of vacuum as well as the ambient temperature, but it was found that the required degree of vacuum was 10 -1 Torr or less.
以上のように本発明によれば、プレス成形性が
良好で且つ耐蝕性及び熱輻射性の優れた黒色酸化
膜を容易に形成でき、ホワイトユニフオーミテイ
品位が良好で、PD問題のない鉄−ニツケル合金
からなるシヤドウマスクを得ることができる。
As described above, according to the present invention, it is possible to easily form a black oxide film that has good press formability and excellent corrosion resistance and thermal radiation properties, has good white uniformity quality, and has no PD problem. A shadow mask made of nickel alloy can be obtained.
第1図はシヤドウマスクの変形を説明するため
の要部の概略図、第2図はシヤドウマスクの変形
量と降伏点強度との関係を示す特性図、第3図及
び第4図はシヤドウマスクの焼鈍温度と降伏点温
度との関係を示す特性図、第5図は真空焼鈍温度
と降伏点強度との関係を示す特性図である。
Figure 1 is a schematic diagram of the main parts to explain the deformation of the shadow mask, Figure 2 is a characteristic diagram showing the relationship between the amount of deformation of the shadow mask and the yield point strength, and Figures 3 and 4 are the annealing temperature of the shadow mask. FIG. 5 is a characteristic diagram showing the relationship between vacuum annealing temperature and yield point strength.
Claims (1)
に多数の開孔を穿設する工程と、前記多数の開孔
の穿設された金属板を焼鈍する工程と、前記焼鈍
された金属板を成形する工程と、前記成形された
金属板に黒色酸化皮膜を形成する工程とを少なく
とも備えたシヤドウマスクの製造方法において、
前記焼鈍を真空中で行ない、焼鈍後の冷却を還元
雰囲気中の炉内で行うことを特徴とするシヤドウ
マスクの製造方法。 2 前記焼鈍が10-1torr以下の圧力の真空中で行
なわれることを特徴とする特許請求の範囲第1項
記載のシヤドウマスクの製造方法。 3 前記焼鈍後の炉冷却時水素ガスの投入を炉温
が500℃に下るまで続け、焼鈍処理終了後黒色酸
化皮膜を形成することを特徴とする特許請求の範
囲第1項記載のシヤドウマスクの製造方法。 4 前記焼鈍が1000℃以上の温度で行なわれるこ
とを特徴とする特許請求の範囲第2項記載のシヤ
ドウマスクの製造方法。 5 前記焼鈍終了後黒色酸化皮膜を形成するまで
の間脱酸雰囲気中でシヤドウマスクを保管してお
くことを特徴とする特許請求の範囲第3項記載の
シヤドウマスクの製造方法。[Scope of Claims] 1. A step of drilling a large number of holes in a thin metal plate mainly composed of iron and nickel, a step of annealing the metal plate in which the large number of holes have been drilled, and A method for manufacturing a shadow mask, comprising at least the steps of forming an annealed metal plate and forming a black oxide film on the formed metal plate,
A method for manufacturing a shadow mask, characterized in that the annealing is performed in a vacuum, and the cooling after the annealing is performed in a furnace in a reducing atmosphere. 2. The method of manufacturing a shadow mask according to claim 1, wherein the annealing is performed in a vacuum at a pressure of 10 -1 torr or less. 3. Production of a shadow mask according to claim 1, characterized in that hydrogen gas is continued to be introduced during furnace cooling after the annealing until the furnace temperature drops to 500°C, and a black oxide film is formed after the annealing process is completed. Method. 4. The method for manufacturing a shadow mask according to claim 2, wherein the annealing is performed at a temperature of 1000° C. or higher. 5. The method of manufacturing a shadow mask according to claim 3, wherein the shadow mask is stored in a deoxidizing atmosphere until the black oxide film is formed after the annealing.
Priority Applications (7)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59048145A JPS60194012A (en) | 1984-03-15 | 1984-03-15 | Production of shadow mask |
| KR1019840008581A KR890002363B1 (en) | 1984-03-15 | 1984-12-31 | Manufacturing method of shadow mask |
| US06/710,979 US4612061A (en) | 1984-03-15 | 1985-03-12 | Method of manufacturing picture tube shadow mask |
| EP85103032A EP0155010B1 (en) | 1984-03-15 | 1985-03-15 | Method of manufacturing picture tube shadow mask |
| DE8585103032T DE3565191D1 (en) | 1984-03-15 | 1985-03-15 | Method of manufacturing picture tube shadow mask |
| SG954/90A SG95490G (en) | 1984-03-15 | 1990-11-23 | Method of manufacturing picture tube shadow mask |
| HK1093/90A HK109390A (en) | 1984-03-15 | 1990-12-27 | Method of manufacturing picture tube shadow mask |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59048145A JPS60194012A (en) | 1984-03-15 | 1984-03-15 | Production of shadow mask |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS60194012A JPS60194012A (en) | 1985-10-02 |
| JPH0555566B2 true JPH0555566B2 (en) | 1993-08-17 |
Family
ID=12795183
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP59048145A Granted JPS60194012A (en) | 1984-03-15 | 1984-03-15 | Production of shadow mask |
Country Status (2)
| Country | Link |
|---|---|
| JP (1) | JPS60194012A (en) |
| KR (1) | KR890002363B1 (en) |
-
1984
- 1984-03-15 JP JP59048145A patent/JPS60194012A/en active Granted
- 1984-12-31 KR KR1019840008581A patent/KR890002363B1/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| KR890002363B1 (en) | 1989-07-01 |
| JPS60194012A (en) | 1985-10-02 |
| KR850006967A (en) | 1985-10-25 |
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| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |