JPH0573072B2 - - Google Patents
Info
- Publication number
- JPH0573072B2 JPH0573072B2 JP60251335A JP25133585A JPH0573072B2 JP H0573072 B2 JPH0573072 B2 JP H0573072B2 JP 60251335 A JP60251335 A JP 60251335A JP 25133585 A JP25133585 A JP 25133585A JP H0573072 B2 JPH0573072 B2 JP H0573072B2
- Authority
- JP
- Japan
- Prior art keywords
- discharge
- ionization
- main discharge
- reflecting mirror
- excimer laser
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
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Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/09—Processes or apparatus for excitation, e.g. pumping
- H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
- H01S3/0971—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser transversely excited
- H01S3/09713—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser transversely excited with auxiliary ionisation, e.g. double discharge excitation
Landscapes
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Lasers (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Optics & Photonics (AREA)
Description
【発明の詳細な説明】
産業上の利用分野
本発明は希ガスハライド放電励起を利用したエ
キシマレーザ装置に関する。DETAILED DESCRIPTION OF THE INVENTION Field of Industrial Application The present invention relates to an excimer laser device using rare gas halide discharge excitation.
従来の技術
エキシマレーザは紫外線を放射するレーザ装置
で、半導体プロセス、化学工業、医療、エネルギ
ー分野などへの応用展開が期待されている。Conventional Technology Excimer lasers are laser devices that emit ultraviolet light, and are expected to find application in semiconductor processing, chemical industry, medical care, energy fields, and other fields.
エキシマレーザはレーザ上準位寿命が約1nsと
短いことと、グロー放電の安定期間が負性イオン
の形成によつて安定化に寄与するハロゲン分子の
枯渇により高々1000nsと短いために、立上り約
10ns、パルス巾数10nsの短パルス放電励起を必要
とする。ところがこの様な短時間のうちには2次
電子の発生やアバランシエ電離など通常の正規グ
ロー放電形成のために要求される素現象が発生し
得ないので、グロー放電を行わせる為には紫外光
(UV光)、コロナ、X線などを用いた予備電離が
必要である。 Eximer lasers have a short laser upper level lifetime of approximately 1 ns, and the stable period of glow discharge is short at most 1000 ns due to the depletion of halogen molecules that contribute to stabilization through the formation of negative ions.
It requires short pulse discharge excitation with a pulse width of 10 ns and a pulse width of 10 ns. However, in such a short period of time, the elementary phenomena required for normal glow discharge formation, such as generation of secondary electrons and avalanche ionization, cannot occur, so ultraviolet light is needed to generate glow discharge. Pre-ionization using (UV light), corona, X-rays, etc. is required.
従来のUV光予備電離法は、主放電電極の片側
にUV光予備電離用電極を配置し、主放電より一
定時間前に予備電離用放電を行わせる。この方法
は2度の放電を行わせるので二重放電法と呼ばれ
る。予備電離用電極にも、切れ目のある電極に沿
つて直列に沿面放電を行わせる直列式とマルチピ
ンを並列に配置した並列式のものとがある。 In the conventional UV light preionization method, a UV light preionization electrode is placed on one side of a main discharge electrode, and a preionization discharge is performed a certain period of time before the main discharge. This method is called a double discharge method because it causes two discharges. Pre-ionization electrodes also include a series type in which creeping discharge occurs in series along an electrode with cuts, and a parallel type in which multi-pins are arranged in parallel.
発明が解決しようとする問題点
予備電離方法においては、予備電離の量が少い
と主放電は不均一なアークになりやすいが、ある
閾値を越えていれば安定なグロー放電が得られ、
その閾値は約105電子/c.c.とされている。しかし
従来の方法では十分な予備電離量が得られない。Problems to be Solved by the Invention In the pre-ionization method, if the amount of pre-ionization is small, the main discharge tends to become an uneven arc, but if it exceeds a certain threshold, a stable glow discharge can be obtained.
The threshold value is said to be approximately 10 5 electrons/cc. However, with conventional methods, a sufficient amount of pre-ionization cannot be obtained.
また主放電は前記した様に数10nsと云う極めて
短時間の内に行われるので放電中に電子のドリフ
トが生ずる事は考えられない。したがつて、予備
電離による電離電子の発生が主放電にとつて最も
望ましい所に行われる事が必要である。ところが
従来の方法ではせいぜい予備電離電極の配置によ
つてしか、この位置の適正化を行うことは出来
ず、十分な位置制御をすることができない。 Furthermore, as mentioned above, since the main discharge is carried out within an extremely short period of several tens of nanoseconds, it is unlikely that electron drift will occur during the discharge. Therefore, it is necessary that the generation of ionized electrons by pre-ionization be performed at the most desirable location for the main discharge. However, in the conventional method, this position can only be optimized by arranging the pre-ionization electrode at best, and sufficient position control cannot be achieved.
本発明は以上の点に鑑みてなされたもので、予
備電離効果を促進させて多量の電離電子を発生さ
せレーザ出力の増大を図ることを目的とするもの
である。 The present invention has been made in view of the above points, and an object of the present invention is to promote the pre-ionization effect, generate a large amount of ionized electrons, and increase laser output.
問題点を解決するための手段
本発明は予備放電により発生したUV光を回動
可能な鏡面により主放電領域内の望ましい位置に
集光させ、そこに電離を発生させるようにしたエ
キシマレーザ装置である。Means for Solving the Problems The present invention is an excimer laser device in which UV light generated by preliminary discharge is focused on a desired position within the main discharge area using a rotatable mirror surface, and ionization is generated there. be.
作 用
上記構成によれば、予備放電によつて発生した
UV光の大半が主放電領域内の電離に寄与し、小
さい予備放電によつても安定なグロー放電を得る
ことができ、エキシマレーザ出力が増大する。Effect According to the above configuration, the
Most of the UV light contributes to ionization in the main discharge region, and even with a small preliminary discharge, a stable glow discharge can be obtained, increasing the excimer laser output.
実施例
以下本発明の実施例について、図面とともに詳
細に説明する。Embodiments Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings.
第1図は本発明によるエキシマレーザ装置の実
施例を示す斜視図、第2図はそのA−A′線断面
図である。図において、主放電は主放電電極1及
び2間で行われグロー領域3を生ずる。一方予備
電離は予備放電電極4及び5間で発生し、UV光
6を発生する。予備放電電極4,5はレーザ管の
長さ方向に数10対設けられ、長さ方向の各所にお
いてUV光6を発生させる。7及び8は電極4及
び5へのリードを兼ねた支持体である。予備電離
6で発生するUV光6はその背後に配置した反射
鏡9、たとえば楕円鏡により集光されて点11に
焦点を結ぶ。反射鏡9は楕円鏡として第1焦点を
UV光6を発生する部分に、第2焦点を点11に
すれば小さい放電電力によるUV光でも効率的に
主放電領域に集光し、十分な量の電離電子が得ら
れる。この反射鏡9は支持柱10のまわりに回転
しうる様にしておくと、焦点11は主電極1及び
2間の望ましい位置に来る様調整することができ
る。実際にはレーザ出力が最大になる様にこの回
転量を実験的に調整してやればよい。12は出力
結合鏡、13は全反射鏡、14は出力ビームであ
る。なお、実際のレーザでは真空容器、送風装
置、冷却装置等のその他の部品や装置が必要であ
るが、それらはエキシマレーザの分野では既知の
技術であるし、本発明での本質的な部分でないの
で図示を省略した。 FIG. 1 is a perspective view showing an embodiment of an excimer laser device according to the present invention, and FIG. 2 is a sectional view taken along line A-A'. In the figure, a main discharge takes place between main discharge electrodes 1 and 2, producing a glow region 3. On the other hand, pre-ionization occurs between the pre-discharge electrodes 4 and 5, generating UV light 6. Several ten pairs of preliminary discharge electrodes 4 and 5 are provided along the length of the laser tube, and UV light 6 is generated at various locations along the length. 7 and 8 are supports that also serve as leads to the electrodes 4 and 5. The UV light 6 generated by the pre-ionization 6 is condensed by a reflecting mirror 9, for example an elliptical mirror, placed behind it and focused on a point 11. The reflecting mirror 9 is an elliptical mirror with a first focal point.
If the second focal point is set at point 11 in the part where UV light 6 is generated, even UV light generated by a small discharge power can be efficiently focused on the main discharge region, and a sufficient amount of ionized electrons can be obtained. By allowing the reflecting mirror 9 to rotate around the support column 10, the focal point 11 can be adjusted to a desired position between the main electrodes 1 and 2. In practice, this amount of rotation may be adjusted experimentally so that the laser output is maximized. 12 is an output coupling mirror, 13 is a total reflection mirror, and 14 is an output beam. Note that actual lasers require other parts and devices such as a vacuum container, blower device, and cooling device, but these are known technologies in the field of excimer lasers and are not essential parts of the present invention. Therefore, illustration is omitted.
上記構成において、主放電電極1,2間の全長
域にわたつて主放電が行なわれる。一方、各予備
電離電極4,5間に発生したUV光6は反射鏡9
によつて主放電電極1,2間の全長域にわたつて
集光される。この集光位置は反射鏡9を支持柱1
0のまわりに回転させることにより最大出力が得
られる適正位置に集光するよう調整することがで
きる。 In the above configuration, the main discharge is performed over the entire length region between the main discharge electrodes 1 and 2. On the other hand, the UV light 6 generated between each pre-ionization electrode 4 and 5 is reflected by a reflecting mirror 9.
The light is focused over the entire length region between the main discharge electrodes 1 and 2. This condensing position is such that the reflecting mirror 9 is placed on the supporting column 1.
By rotating it around 0, it is possible to adjust the light to be focused at an appropriate position where maximum output can be obtained.
第3図は第1図に示した予備電離用放電電極
4,5および反射鏡9を主放電部をはたんで左右
両側に対称的に配置した実施例であり、予備電離
の効果が一層大きくなる。各部の構成および動作
は第1図、第2図の場合と本質的に同一であるの
で同一符号を付し説明を省略する。 FIG. 3 shows an embodiment in which the discharge electrodes 4, 5 for pre-ionization and the reflecting mirror 9 shown in FIG. 1 are arranged symmetrically on both the left and right sides across the main discharge part, and the effect of pre-ionization is even greater. Become. The configuration and operation of each part are essentially the same as those in FIGS. 1 and 2, so the same reference numerals are given and explanations will be omitted.
発明の効果
以上のように、本発明はエキシマレーザ装置の
主放電電極間の適正位置に予備放電によるUV光
を反射鏡によつて集光させるようにしたもので、
予備電離効果を促進させて安定なグロー放電を行
なわせ、レーザ出力の増大化を図るとともに、予
備電離用放電電力の低減を実現することができ
る。Effects of the Invention As described above, the present invention focuses UV light from a preliminary discharge at an appropriate position between the main discharge electrodes of an excimer laser device using a reflecting mirror.
It is possible to promote the pre-ionization effect to perform stable glow discharge, increase the laser output, and reduce the discharge power for pre-ionization.
第1図は本発明によるエキシマレーザ装置の実
施例における要部斜視図、第2図は第1図のA−
A′線断面図、第3図は本発明によるエキシマレ
ーザ装置の他の実施例を示す要部断面側面図であ
る。
1,2……主放電電極、3……主放電グロー領
域、4,5……予備電離用放電電極、6……UV
光、9……反射鏡。
FIG. 1 is a perspective view of essential parts of an embodiment of an excimer laser device according to the present invention, and FIG.
A cross-sectional view taken along the line A' and FIG. 3 are cross-sectional side views of essential parts showing another embodiment of the excimer laser device according to the present invention. 1, 2... Main discharge electrode, 3... Main discharge glow area, 4, 5... Discharge electrode for preliminary ionization, 6... UV
Light, 9...reflector.
Claims (1)
れた予備放電電極を備え、予備放電によつて発生
した紫外光を反射鏡により主放電電極間に集光さ
せることを特徴とするエキシマレーザ装置。 2 反射鏡が楕円鏡であり、その第1焦点に予備
放電位置を、第2焦点に集光位置を配した特許請
求の範囲第1項記載のエキシマレーザ装置。 3 反射鏡が主放電電極の長さ方向に平行な軸に
対して回転可能である特許請求の範囲第1項記載
のエキシマレーザ装置。 4 予備放電電極と反射鏡が主放電電極の両側に
対称的に配置された特許請求の範囲第1項記載の
エキシマレーザ装置。[Claims] 1. A main discharge electrode and a plurality of preliminary discharge electrodes arranged in the length direction thereof, and ultraviolet light generated by the preliminary discharge is focused between the main discharge electrodes using a reflecting mirror. An excimer laser device featuring: 2. The excimer laser device according to claim 1, wherein the reflecting mirror is an elliptical mirror, the preliminary discharge position is located at the first focal point, and the condensing position is located at the second focal point. 3. The excimer laser device according to claim 1, wherein the reflecting mirror is rotatable about an axis parallel to the length direction of the main discharge electrode. 4. The excimer laser device according to claim 1, wherein the preliminary discharge electrode and the reflecting mirror are arranged symmetrically on both sides of the main discharge electrode.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60251335A JPS62111489A (en) | 1985-11-08 | 1985-11-08 | excimer laser equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60251335A JPS62111489A (en) | 1985-11-08 | 1985-11-08 | excimer laser equipment |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62111489A JPS62111489A (en) | 1987-05-22 |
| JPH0573072B2 true JPH0573072B2 (en) | 1993-10-13 |
Family
ID=17221292
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP60251335A Granted JPS62111489A (en) | 1985-11-08 | 1985-11-08 | excimer laser equipment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62111489A (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7123872B2 (en) | 2002-09-11 | 2006-10-17 | Ricoh Company, Ltd. | Cleaning device and method, image forming apparatus, and process cartridge |
-
1985
- 1985-11-08 JP JP60251335A patent/JPS62111489A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS62111489A (en) | 1987-05-22 |
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