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JPH0573073B2 - - Google Patents
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JPH0573073B2 - - Google Patents

Info

Publication number
JPH0573073B2
JPH0573073B2 JP60251359A JP25135985A JPH0573073B2 JP H0573073 B2 JPH0573073 B2 JP H0573073B2 JP 60251359 A JP60251359 A JP 60251359A JP 25135985 A JP25135985 A JP 25135985A JP H0573073 B2 JPH0573073 B2 JP H0573073B2
Authority
JP
Japan
Prior art keywords
discharge
main discharge
ionization
parabolic reflector
light
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP60251359A
Other languages
Japanese (ja)
Other versions
JPS62111490A (en
Inventor
Naoya Horiuchi
Takuhiro Ono
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP60251359A priority Critical patent/JPS62111490A/en
Publication of JPS62111490A publication Critical patent/JPS62111490A/en
Publication of JPH0573073B2 publication Critical patent/JPH0573073B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09Processes or apparatus for excitation, e.g. pumping
    • H01S3/097Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
    • H01S3/0971Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser transversely excited
    • H01S3/09713Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser transversely excited with auxiliary ionisation, e.g. double discharge excitation

Landscapes

  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Lasers (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)

Description

【発明の詳細な説明】 産業上の利用分野 本発明は希ガスハライド放電励起を利用したエ
キシマレーザ装置に関する。
DETAILED DESCRIPTION OF THE INVENTION Field of Industrial Application The present invention relates to an excimer laser device using rare gas halide discharge excitation.

従来の技術 エキシマレーザは紫外線を放射するレーザ装置
で、半導体プロセス、化学工業、医療、エネルギ
ー分野などへの応用展開が期待されている。
Conventional Technology Excimer lasers are laser devices that emit ultraviolet light, and are expected to find application in semiconductor processing, chemical industry, medical care, energy fields, and other fields.

エキシマレーザはレーザ上準位寿命が約1nsと
短いことと、グロー放電の安定期間が負性イオン
の形成によつて安定化に寄与するハロゲン分子の
枯渇により高々1000nsと短いために、立上り約
10ns、パルス巾数10nsの短パルス放電励起を必要
とする。ところがこの様な短時間のうちには2次
電子の発生やアバランシエ電離など通常の正規グ
ロー放電形成のために要求される素現象が発生し
得ないので、グロー放電を行わせる為には紫外光
(UV光)、コロナ、X線などを用い予備電離が必
要である。
Eximer lasers have a short laser upper level lifetime of approximately 1 ns, and the stable period of glow discharge is short at most 1000 ns due to the depletion of halogen molecules that contribute to stabilization through the formation of negative ions.
It requires short pulse discharge excitation with a pulse width of 10 ns and a pulse width of 10 ns. However, in such a short period of time, the elementary phenomena required for normal glow discharge formation, such as generation of secondary electrons and avalanche ionization, cannot occur, so ultraviolet light is needed to generate glow discharge. Preliminary ionization is required using (UV light), corona, X-rays, etc.

従来のUV光予備電離法は、主放電電極の片側
にUV光予備電離用電極を配置し、主放電より一
定時間前に予備電離用放電を行わせる。この方法
は2度の放電を行わせるので二重放電法と呼ばれ
る。予備電離用電極にも、切れ目のある電極に沿
つて直列に沿面放電を行わせる直列式とマルチピ
ンを並列に配置した並列式のものとがある。
In the conventional UV light preionization method, a UV light preionization electrode is placed on one side of a main discharge electrode, and a preionization discharge is performed a certain period of time before the main discharge. This method is called a double discharge method because it causes two discharges. Pre-ionization electrodes also include a series type in which creeping discharge occurs in series along an electrode with cuts, and a parallel type in which multi-pins are arranged in parallel.

発明が解決しようとする問題点 予備電離方法においては、予備電離の量が少い
と主放電は不均一なアークになりやすいが、ある
閾値を越えていれば安定なグロー放電が得られ、
その閾値は約105電子/c.c.とされている。しかし
従来の方法では十分な予備電離量が得られない。
Problems to be Solved by the Invention In the pre-ionization method, if the amount of pre-ionization is small, the main discharge tends to become an uneven arc, but if it exceeds a certain threshold, a stable glow discharge can be obtained.
The threshold value is said to be approximately 10 5 electrons/cc. However, with conventional methods, a sufficient amount of pre-ionization cannot be obtained.

また、主放電は前記した様に数10nsと云う極め
て短時間の内に行われるので放電中に電子のドリ
フトが生ずる事は考えられない。したがつて、予
備電離による電離電子の発生が主放電にとつて最
も望ましい所に行われる事が必要である。ところ
が従来の方法ではせいぜい予備電離電極の配置に
よつてしか、この位置の適正化を行うことは出来
ず、十分な位置制御をすることができない。
Further, as mentioned above, since the main discharge is carried out within an extremely short period of several tens of nanoseconds, it is unlikely that electron drift will occur during the discharge. Therefore, it is necessary that the generation of ionized electrons by pre-ionization be performed at the most desirable location for the main discharge. However, in the conventional method, this position can only be optimized by arranging the pre-ionization electrode at best, and sufficient position control cannot be achieved.

本発明は以上の点に鑑みてなされたもので、予
備電離効果を促進させて多量の電離電子を発生さ
せ、レーザ出力の増大を図ることを目的とするも
のである。
The present invention has been made in view of the above points, and an object of the present invention is to promote the pre-ionization effect and generate a large amount of ionized electrons, thereby increasing the laser output.

問題点を解決するための手段 本発明は予備放電により発生させたUX光をパ
ラボラ反射鏡によりほぼ平行にビームし、これを
主放電領域内に通過させ、そこに電離を発生させ
るようにしたエキシマレーザ装置である。
Means for Solving the Problems The present invention is an excimer that beams the UX light generated by preliminary discharge almost in parallel using a parabolic reflector, passes it into the main discharge region, and generates ionization there. It is a laser device.

作 用 上記構成によれば、予備放電によつて発生した
UV光の大半が主放電領域内の電離に寄与し、小
さい予備放電によつても安定なグロー放電を得る
ことができ、エキシマレーザ出力が増大する。
Effect According to the above configuration, the
Most of the UV light contributes to ionization in the main discharge region, and even with a small preliminary discharge, a stable glow discharge can be obtained, increasing the excimer laser output.

実施例 以下本発明の実施例について、図面とともに詳
細に説明する。
Embodiments Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings.

第1図は本発明によるエキシマレーザ装置の実
施例を示す斜視図、第2図はそのA−A′線断面
図である。図において、主放電は主放電電極1及
び2間で行われグロー領域3を生ずる。一方予備
電離は予備放電電極4及び5間で発生し、UV光
6を発生する。予備放電電極4,5はレーザ管の
長さ方向に数10対設けられ、長さ方向の各所にお
いてUV光6を発生させる。7及び8は電極4及
び5へのリードを兼ねた支持体である。予備電離
6で発生するUV光6はその背後に設置したパラ
ボラ反射鏡9により平行ビーム11にされ、主放
電電極1,2間の主放電領域であるグロー領域3
を通過する。このとき、グロー領域3に電離を発
生させ多量の電離電子を発生させることができ
る。この結果安定なグロー放電を得ることがで
き、レーザ出力を増大させることができる。パラ
ボラ反射鏡9は支持柱10のまわりに回転しうる
様にしておくとUV光ビーム11は主電極1及び
2間の望ましい位置に来る様調整することができ
る。実際にはレーザ出力が最大になる様にこの回
転量を実験的に調整してやればよい。12は出力
結合鏡、13は全反射鏡、14は出力ビームであ
る。なお、実際のレーザでは真空容器、送風装
置、冷却装置等のその他の部品や装置が必要であ
るが、それらはエキシマレーザの分野では既知の
技術であるし、本発明での本質的な部分でないの
で図示を省略した。
FIG. 1 is a perspective view showing an embodiment of an excimer laser device according to the present invention, and FIG. 2 is a sectional view taken along line A-A'. In the figure, a main discharge takes place between main discharge electrodes 1 and 2, producing a glow region 3. On the other hand, pre-ionization occurs between the pre-discharge electrodes 4 and 5, generating UV light 6. Several ten pairs of preliminary discharge electrodes 4 and 5 are provided along the length of the laser tube, and UV light 6 is generated at various locations along the length. 7 and 8 are supports that also serve as leads to the electrodes 4 and 5. The UV light 6 generated by the pre-ionization 6 is converted into a parallel beam 11 by a parabolic reflector 9 installed behind it, and the UV light 6 is converted into a parallel beam 11 by a parabolic reflector 9 installed behind the UV light 6, which is transmitted to a glow region 3 which is the main discharge region between the main discharge electrodes 1 and 2.
pass through. At this time, ionization can be generated in the glow region 3 to generate a large amount of ionized electrons. As a result, stable glow discharge can be obtained and laser output can be increased. If the parabolic reflector 9 is rotatable around the support column 10, the UV light beam 11 can be adjusted to a desired position between the main electrodes 1 and 2. In practice, this amount of rotation may be adjusted experimentally so that the laser output is maximized. 12 is an output coupling mirror, 13 is a total reflection mirror, and 14 is an output beam. Note that actual lasers require other parts and devices such as a vacuum container, blower device, and cooling device, but these are known technologies in the field of excimer lasers and are not essential parts of the present invention. Therefore, illustration is omitted.

上記構成において、主放電電極1,2間の全長
域にわたつて主放電が行なわれる。一方、各予備
電離電極4,5間に発生したUV光6はパラボラ
反射鏡9によつて平行ビーム11となつて主放電
電極1,2間の全長域にわたる放電領域を通過す
る。この通過位置はパラボラ反射鏡9を支持柱1
0のまわりに回転させることにより最大出力が得
られる適正位置を通過するよう調整することがで
きる。
In the above configuration, the main discharge is performed over the entire length region between the main discharge electrodes 1 and 2. On the other hand, the UV light 6 generated between each of the pre-ionization electrodes 4 and 5 is turned into a parallel beam 11 by a parabolic reflector 9 and passes through a discharge region spanning the entire length between the main discharge electrodes 1 and 2. This passing position places the parabolic reflector 9 on the supporting column 1.
By rotating it around 0, it can be adjusted to pass through the appropriate position where maximum output is obtained.

第3図は第1図に示した予備電離用放電電極
4,5およびパラボラ反射鏡9を主放電部をはさ
んで左右両側に対称的に配置した実施例であり、
予備電離の効果が一層大きくなる。各部の構成お
よび動作は第1図、第2図の場合と本質的に同一
であるので同一符号を付し説明を省略する。
FIG. 3 shows an embodiment in which the pre-ionization discharge electrodes 4, 5 and the parabolic reflector 9 shown in FIG. 1 are arranged symmetrically on both the left and right sides with the main discharge section in between.
The effect of pre-ionization becomes even greater. The configuration and operation of each part are essentially the same as those in FIGS. 1 and 2, so the same reference numerals are given and explanations will be omitted.

発明の効果 以上のように、本発明はエキシマレーザ装置の
主放電極間の適正位置に予備放電によるUV光を
パラボラ反射鏡によつて平行ビームとして通過さ
せるようにしたもので、予備電離効果を促進させ
て安定なグロー放電を行なわせ、レーザ出力の増
大化を図るとともに、予備電離用放電電力の低減
を実現することができる。
Effects of the Invention As described above, the present invention allows UV light from a pre-discharge to pass through a parabolic reflector as a parallel beam at an appropriate position between the main discharge electrodes of an excimer laser device, thereby reducing the pre-ionization effect. By promoting stable glow discharge, it is possible to increase the laser output and reduce the pre-ionization discharge power.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明によるエキシマレーザ装置の実
施例における要部斜視図、第2図は第1図のA−
A′線断面図、第3図は本発明によるエキシマレ
ーザ装置の他の実施例を示す要部断面側面図であ
る。 1,2……主放電電極、3……主放電グロー領
域、4,5……予備電離用放電電極、6……UV
光、9……パラボラ反射鏡、11……平行ビー
ム。
FIG. 1 is a perspective view of essential parts of an embodiment of an excimer laser device according to the present invention, and FIG.
A cross-sectional view taken along the line A' and FIG. 3 are cross-sectional side views of essential parts showing another embodiment of the excimer laser device according to the present invention. 1, 2... Main discharge electrode, 3... Main discharge glow area, 4, 5... Discharge electrode for preliminary ionization, 6... UV
Light, 9... Parabolic reflector, 11... Parallel beam.

Claims (1)

【特許請求の範囲】 1 主放電電極と、その長さ方向に複数個配列さ
れた予備放電電極を備え、予備放電によつて発生
した紫外光をパラボラ反射鏡によつて平行ビーム
とし、主放電電極間を通過させることを特徴とす
るエキシマレーザ装置。 2 パラボラ反射鏡が主放電電極の長さ方向に平
行な軸に対して回転可能である特許請求の範囲第
1項記載のエキシマレーザ装置。 3 予備放電電極とパラボラ反射鏡が主放電電極
の両側に対称的に配置された特許請求の範囲第1
項記載のエキシマレーザ装置。
[Claims] 1. A main discharge electrode and a plurality of pre-discharge electrodes arranged in the length direction of the main discharge electrode, ultraviolet light generated by the pre-discharge is converted into a parallel beam by a parabolic reflector, and the main discharge An excimer laser device characterized by passing the laser between electrodes. 2. The excimer laser device according to claim 1, wherein the parabolic reflector is rotatable about an axis parallel to the length direction of the main discharge electrode. 3. Claim 1, in which the preliminary discharge electrode and the parabolic reflector are arranged symmetrically on both sides of the main discharge electrode.
The excimer laser device described in Section 1.
JP60251359A 1985-11-08 1985-11-08 excimer laser equipment Granted JPS62111490A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60251359A JPS62111490A (en) 1985-11-08 1985-11-08 excimer laser equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60251359A JPS62111490A (en) 1985-11-08 1985-11-08 excimer laser equipment

Publications (2)

Publication Number Publication Date
JPS62111490A JPS62111490A (en) 1987-05-22
JPH0573073B2 true JPH0573073B2 (en) 1993-10-13

Family

ID=17221652

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60251359A Granted JPS62111490A (en) 1985-11-08 1985-11-08 excimer laser equipment

Country Status (1)

Country Link
JP (1) JPS62111490A (en)

Also Published As

Publication number Publication date
JPS62111490A (en) 1987-05-22

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